Including Application Of Electrical Radiant Or Wave Energy To Work Patents (Class 134/1)
  • Patent number: 11504750
    Abstract: A cleaning process (blasted-particles cleaning process) includes performing, a plural number of consecutive cycles, an ultrasonic cleaning treatment including immersing a turbine rotor blade in a water basin and conducting an ultrasonic wave into the water basin to clean the turbine rotor blade, and a pressurized-water cleaning treatment including spraying pressurized water into an internal cooling flow channel after the ultrasonic cleaning treatment is performed. The cleaning process is performed after a bonding coat layer removing process of removing a bonding coat layer (first coating layer) by chemical treatment, and a cleaning process of cleaning the turbine blade by blast treatment. Heat tinging process is then performed.
    Type: Grant
    Filed: December 13, 2016
    Date of Patent: November 22, 2022
    Inventors: Yasushi Takeuchi, Yosuke Kawachi, Yoshiyuki Inoue
  • Patent number: 11504751
    Abstract: A substrate processing device includes a processing container; a substrate holder configured to hold a substrate arranged within the processing container; a gas nozzle configured to spray gas within the processing container; a controller configured to control collision of the gas with the substrate held by the substrate holder. The controller is configured to remove particles adhering to the main surface of the substrate, by causing the vertical shock waves to collide with the main surface of the substrate.
    Type: Grant
    Filed: November 20, 2019
    Date of Patent: November 22, 2022
    Assignee: Tokyo Electron Limited
    Inventors: Kyoko Ikeda, Kazuya Dobashi, Tsunenaga Nakashima, Kenji Sekiguchi, Shuuichi Nishikido, Masato Nakajo, Takahiro Yasutake
  • Patent number: 11491517
    Abstract: The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 ?g/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 M?·cm.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: November 8, 2022
    Inventors: Daisaku Yano, Masami Murayama, Yukinari Yamashita, Koji Yamanaka
  • Patent number: 11491476
    Abstract: The present invention provides a regeneration method and a regeneration device of a poisoning honeycomb catalyst, and belongs to the field of catalyst regeneration. The regeneration method of the poisoning honeycomb catalyst provided by the present invention includes the following steps: carrying out microwave heating treatment on the poisoning honeycomb catalyst, and then spraying liquid nitrogen into cells of the poisoning honeycomb catalyst so that the poisoning honeycomb catalyst is regenerated. The regeneration method provided by the present invention is simple, and the efficiency of the regenerated catalyst can be increased by 90% more than the original efficiency. According to the regeneration device of a poisoning honeycomb catalyst provided by the present invention, the catalyst regeneration is carried out by using the regeneration device provided by the present invention, the regeneration operation is simple, and the catalytic efficiency of the regenerated catalyst is improved.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: November 8, 2022
    Inventor: Boxiong Shen
  • Patent number: 11488831
    Abstract: A method for treating a substrate includes arranging a substrate in a processing chamber. At least one of a vaporized solvent and a gas mixture including the solvent is supplied to the processing chamber to form a conformal liquid layer of the solvent on exposed surfaces of the substrate. The at least one of the vaporized solvent and the gas mixture is removed from the processing chamber. A reactive gas including a halogen species is supplied to the processing chamber. The conformal liquid layer adsorbs the reactive gas to form a reactive liquid layer that etches the exposed surfaces of the substrate.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: November 1, 2022
    Inventors: Ji Zhu, Mark Kawaguchi, Nathan Musselwhite
  • Patent number: 11479852
    Abstract: A method for dry cleaning a susceptor is performed after a substrate is removed from a processing chamber of a substrate processing apparatus. In the method, a cleaning gas for dry cleaning is supplied to a first region including a substrate receiving region in the susceptor. The cleaning gas is regionally supplied to a second region where the cleaning gas is difficult to reach when the cleaning gas is supplied to the first region.
    Type: Grant
    Filed: May 21, 2019
    Date of Patent: October 25, 2022
    Assignee: Tokyo Electron Limited
    Inventors: Jun Sato, Shigehiro Miura, Takashi Chiba
  • Patent number: 11471974
    Abstract: According to one embodiment, a laser lift-off apparatus (1) which irradiates with laser light (16) from a side of a substrate (11) an interface between the substrate (11) and a separating layer (12) of a workpiece (10) including the substrate (11) and the separating layer (12) formed over the substrate (11), and separates the separating layer (12) from the substrate (11) includes: an injection unit (22) which blows a gas (35) onto the workpiece (10) and blows away dusts existing on a surface of the workpiece (10), and a dust collecting unit (23) which includes an opening (52) at a position meeting an irradiation position of the laser light (16), and sucks and collects the blown dusts through the opening (52).
    Type: Grant
    Filed: June 7, 2017
    Date of Patent: October 18, 2022
    Inventors: Yuichi Nakada, Takahiro Fuji, Tomoya Oda
  • Patent number: 11473194
    Abstract: A method of cleaning a deposition apparatus is provided. The method includes cleaning, with a cleaning gas formed into a plasma, an interior of a processing vessel on which a silicon nitride film is deposited. The cleaning gas includes a fluorine-containing gas and oxygen gas.
    Type: Grant
    Filed: March 11, 2020
    Date of Patent: October 18, 2022
    Assignee: Tokyo Electron Limited
    Inventors: Jun Ogawa, Hiroyuki Wada, Akihiro Kuribayashi, Takeshi Oyama
  • Patent number: 11465185
    Abstract: The present invention has as an object the provision of a light irradiation device capable of performing optical cleaning with high stability regardless of the transport speed of a workpiece. The light irradiation device of the present invention emits ultraviolet light to one surface of a band-shaped workpiece transported along a transport path, and includes a lamp house having an opening along a passing plane on a side of the one surface of the workpiece in the transport path, an ultraviolet lamp provided in the lamp house so as to extend in a width direction of the workpiece, gas supplier configured to supply a treatment-space gas into the lamp house, and an exhaust space forming member having an opening along a passing plane on a side of the other surface of the workpiece in the transport path.
    Type: Grant
    Filed: July 10, 2018
    Date of Patent: October 11, 2022
    Assignee: Ushio Denki Kabushiki Kaisha
    Inventors: Kenji Yamamori, Kiyoto Omata
  • Patent number: 11458492
    Abstract: The present invention relates to a cleaning apparatus. The cleaning apparatus according to the present invention includes a first cleaner for spraying a first detergent through a first nozzle, a second cleaner for discharging a second detergent to an outside of a second nozzle, and a vibration unit for vibrating the second cleaner when the second cleaner discharges the second detergent.
    Type: Grant
    Filed: January 5, 2018
    Date of Patent: October 4, 2022
    Inventors: Sungho Song, Sungmin Ye
  • Patent number: 11462387
    Abstract: Examples of a substrate processing apparatus include a stage, an outer peripheral ring that surrounds the stage while provided with a gap between a side surface of the stage and the outer peripheral ring, a gas supply unit configured to supply gas from a lower side of the gap to an upper side of the gap, and an upper electrode provided above the stage.
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: October 4, 2022
    Assignee: ASM IP Holding B.V.
    Inventor: Yukihiro Mori
  • Patent number: 11459505
    Abstract: Disclosed herein is an environmentally safe etching composition and method for a concrete or mortar surface. The composition includes, in some embodiments, an aqueous solution of urea, acetic acid, a buffering agent, an anticorrosive agent, and a surfactant with no more than about 30% (w/v) urea and at least about 10% (v/v) acetic acid. The method includes, in some embodiments, obtaining the etching composition; applying the etching composition to the concrete or mortar surface at a prescribed ratio of the etching composition to the concrete or mortar surface; allowing the etching composition to stand on the concrete or mortar surface for a prescribed amount of time; and washing the concrete or mortar surface with water to produce an etched surface of the concrete or mortar.
    Type: Grant
    Filed: January 24, 2020
    Date of Patent: October 4, 2022
    Inventors: Lee Shaw, Linda S. Shaw
  • Patent number: 11446712
    Abstract: A system for performing a Chemical Mechanical Polishing (CMP) process is provided. The system includes a CMP module configured to polish a semiconductor wafer. The system further includes a cleaning brush assembly configured to clean the semiconductor wafer. The cleaning brush includes a rotation shaft and a brush member surrounding a segment of the rotation shaft. The system also includes an agitation transducer arranged to be distant from the brush member and configured to produce an agitated cleaning liquid to clean the cleaning brush assembly.
    Type: Grant
    Filed: November 12, 2020
    Date of Patent: September 20, 2022
    Inventors: Chia-Ying Tien, Chia-Lin Hsueh
  • Patent number: 11433436
    Abstract: Disclosed herein is a sonic cleaning insert. In one example, the sonic cleaning insert includes a carousel configured to rotate about a central axis. The carousel further includes a platform having an outer perimeter. The platform is radially disposed about the central axis. The carousel has an inner ring and an outer ring circumscribing the inner ring. A plurality of partitions couple the inner ring and the outer ring to the platform. The plurality of partitions are arranged at a predetermined angle about the central axis. The carousel further includes a plurality of holders. Each holder is formed from a portion of the platform, a portion of each of the inner ring and outer ring, and a first sidewall and a second sidewall formed from the plurality of partitions. The carousel is configured for immersion in an ultrasonic vibrating fluid.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: September 6, 2022
    Inventors: Michael J. Coughlin, Allen L. D'Ambra
  • Patent number: 11433613
    Abstract: An integrated additive manufacturing system includes: (a) at least one resin supply (41); (b) a plurality of additive manufacturing machines (43) on which parts may be produced, each of the additive manufacturing machines (43) operatively associated with the at least one resin supply (41); and (c) at least one peripheral machine (200, 48, 220) operatively associated with each of the additive manufacturing machines and the at least one resin supply.
    Type: Grant
    Filed: March 12, 2018
    Date of Patent: September 6, 2022
    Assignee: Carbon, Inc.
    Inventors: Joseph M. DeSimone, Roy Goldman, Steven Kenneth Pollack
  • Patent number: 11426771
    Abstract: The present disclosure provides a cleaning machine, including: a cleaning chamber; a turn table having a plurality of areas arranged around a rotary axis, configured to turn one area of the plurality of areas to the cleaning station and another area to the transport station, each of the plurality of areas having: a cleaning tank including a closable opening, a rotating device arranged at the cleaning tank, and a cleaning table on which the object is placed, and which is arranged on the rotating device and rotatably arranged in the cleaning tank; a nozzle moving device arranged in the cleaning station; a cleaning nozzle arranged on the nozzle moving device; a shutter arranged in the cleaning station and closing the closable opening; and a shutter moving device configured to move the shutter toward the closable opening.
    Type: Grant
    Filed: September 11, 2020
    Date of Patent: August 30, 2022
    Inventors: Yoshiteru Kawamori, Toyoaki Mitsue, Takuya Kanemoto
  • Patent number: 11421951
    Abstract: A cleaning system and method includes suspending and exploding, adjacent a bank of HRSG finned-tubing, a plurality of generally uniformly spaced detonation cords. Each detonation cord has an explosive grain loading of 18-50 grains per foot. A detonation delay assembly attached to each of the plurality of detonation cords creates a predetermined delay between each detonation cord explosion. After the detonation cords are exploded, a suspended elongated beam, having a transport assembly and a pressurized air blower assembly directs pressurized air towards an adjacent the bank of HRSG finned-tubing as the pressurized air blower assembly is moved along a portion of the beam. A suspension assembly moves the beam, the transport assembly, and the pressurized air blower assembly up or down so that a next portion of the bank of HRSG finned-tubing may be cleaned by the pressurized air.
    Type: Grant
    Filed: March 17, 2021
    Date of Patent: August 23, 2022
    Assignee: Dos Viejos Amigos, LLC
    Inventors: Bradley A. McGinnis, Rodrick E. Hall
  • Patent number: 11413663
    Abstract: Disclosed is an ultraviolet (UV) light cleaning device. By providing an energy conversion component between an UV light source and a supporting platform, the UV light cleaning device can convert the energy of the UV light to specific energy by the energy conversion component. When the energy of the UV light is higher, the energy of the UV light is converted to specific energy lower than the energy of the UV light, thereby avoiding damage to the substrate while cleaning the substrate to solve the technical problem that the conventional UV light cleaning damages the substrate in a cleaning process.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: August 16, 2022
    Inventor: Pan Gao
  • Patent number: 11415886
    Abstract: A resist composition is disclosed which comprises a perovskite material with a structure having a chemical formula selected from ABX3, A2BX4, or ABX4, wherein A is a compound containing an NH3 group, B is a metal and X is a halide constituent. The perovskite material may comprise one or more of the following components: halogen-mixed perovskite material; metal-mixed perovskite material, and organic ligand mixed perovskite material.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: August 16, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Frederik Wuister, Oktay Yildirim, Gijsbert Rispens, Alexey Olegovich Polyakov
  • Patent number: 11399695
    Abstract: A household dishwasher includes a washing compartment receiving items to be washed, a control device configured to carry out a washing program selected from a number of washing programs for washing the items to be washed in the washing compartment, an optical sensor configured to acquire an optical sensor signal of the items to be washed in the washing compartment, and an evaluation unit configured to identify a drying state of the items to be washed in the washing compartment as a function of the acquired optical sensor signal.
    Type: Grant
    Filed: July 6, 2018
    Date of Patent: August 2, 2022
    Assignee: BSH Hausgeräte GmbH
    Inventors: Maria Terrádez Alemany, Kai Paintner, Matthias Heckes, Daniel Hitzler
  • Patent number: 11400488
    Abstract: Pressure vessels that operate at elevated temperatures and pressures (e.g., 600° F./316° C., 20000 psig), and ultrasonic transducers and signal connectors for use therein, are described. The pressure vessels include a housing defining a cavity. The housing includes a cylindrical body with plugs positioned within openings of the cylindrical body. Each plug has a recess extending from an external surface to a location ultrasonically adjacent the cavity. The pressure vessels additionally include transducer assemblies positioned within respective plug recesses. Each transducer assembly includes a signal connector positioned within the recess adjacent the external surface, a transducer having a piezoceramic element positioned within the recess at the location ultrasonically adjacent the cavity, and a metallic interconnection spring interconnecting the transducer to the signal connector.
    Type: Grant
    Filed: February 27, 2019
    Date of Patent: August 2, 2022
    Assignee: AMETEK, INC.
    Inventor: John Jeffery Moon, Jr.
  • Patent number: 11393675
    Abstract: A substrate processing apparatus includes a chamber to accommodate a substrate. The apparatus includes a stage to support the substrate in the chamber. The apparatus includes an electrode disposed above the stage and containing aluminum. The electrode generates plasma from gas supplied into the chamber to form a first film on the substrate by the plasma. The apparatus further includes a second film formed on a surface of the electrode and containing aluminum and fluorine or containing aluminum and oxygen.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: July 19, 2022
    Inventors: Yuya Matsubara, Masayuki Kitamura, Atsuko Sakata
  • Patent number: 11370703
    Abstract: Described is a method of processing an antimicrobial glass substrate. More particularly, described is a method of removing one or more of silver nitrate or silver oxide on the surface of an antimicrobial glass substrate. Also described is a method of manufacturing a glass substrate that is substantially free of yellow discoloration.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: June 28, 2022
    Inventors: Tien San Chi, Chih Yuan Lu, Cheng-Da Tsai, Yu Ying Tsai, Shan Zhu
  • Patent number: 11361975
    Abstract: A method of fabricating an integrated circuit is disclosed. The method of removing excess metal of a metal interconnection layer during integrated circuit fabrication process comprises the steps of: plasma etching an excess metal portion of the metal interconnection layer using plasma comprising a noble gas, for an etch duration. The method further comprises stopping the etch process prior to the excess metal portion being completely removed and thus prior to a dielectric surface upon which the metal interconnection is formed, becoming completely exposed. The remaining excess metal portion comprising excess metal residues is subsequently removed using a second etch step.
    Type: Grant
    Filed: October 14, 2019
    Date of Patent: June 14, 2022
    Assignee: SPTS Technologies Limited
    Inventors: Tony Wilby, Steve Burgess
  • Patent number: 11352694
    Abstract: A drawing apparatus includes: a drawing part; a cleaning-gas generator; a first valve between the cleaning-gas generator and the drawing part and adjusting a supply amount of gas to the drawing part; a first pressure gauge measuring a pressure in the drawing part; a compensation-gas introducing part introducing compensation-gas to be supplied between the cleaning-gas generator and the first valve; a second valve between the compensation-gas introducing part and the first valve and adjusting a supply amount of the compensation-gas; and a valve controller controlling the first and second valves, wherein the valve controller controls the first valve to supply the cleaning-gas at a predetermined flow rate to the drawing part and controls the second valve to cause a pressure in the drawing part to be a predetermined pressure when the first pressure gauge detects a pressure reduction due to a reduction in a supply flow rate of the cleaning-gas.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: June 7, 2022
    Inventors: Satoshi Nakahashi, Kaoru Tsuruta
  • Patent number: 11344824
    Abstract: The embodiments of the present disclosure disclose an ultrasonic microbubble generation method, apparatus and system. The apparatus comprises a horn-shaped conductor including an upper horn-shaped body and a lower cylindrical body; the horn-shaped body is provided with a cavity having an upper opening, an upper end of the cavity is fixedly connected with a micropore vibration thin sheet, a micropore array of the micropore vibration thin sheet is corresponding to the upper opening of the cavity, and a side wall of the cavity is provided with a through hole for external gas to enter the cavity; the cylindrical body is provided with a transducing ring and an electrode sheet, an outer side of the cylindrical body is insulated and sealed, and a connection wire of the electrode sheet is led out by a steel pipe and connected with an external ultrasonic oscillation controller.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: May 31, 2022
    Assignee: PetroChina Company Limited
    Inventors: Xinglong Chen, Hongwei Yu, Shi Li, Haishui Han, Zemin Ji
  • Patent number: 11311917
    Abstract: Method and apparatus for identifying a contaminant on a substrate. Identification of a contaminant removed from a substrate can be useful in identifying and eliminating or reducing the source of the contamination and tailoring the removal method to minimize the potential for substrate damage. The methods and apparatus for identification of the contaminant provide liberation of molecules of the contaminant from the surface of the substrate, accounting for different geometries and substrate materials, sample preparation, and chemical analysis of the contaminant.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: April 26, 2022
    Assignee: Bruker Nano, Inc.
    Inventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley, Alexander M. Figliolini
  • Patent number: 11299801
    Abstract: A physical vapor deposition (PVD) target that includes a body composed of material that is reactive with an oxygen containing atmosphere; and a non-reactive cap layer encapsulating at least a sputter surface of the body. The non-reactive cap layer is a barrier obstructing the diffusion of oxygen containing species to the body of the PVD target.
    Type: Grant
    Filed: November 13, 2019
    Date of Patent: April 12, 2022
    Inventors: Stephen L. Brown, Bruce B. Doris, Mark C. Reuter
  • Patent number: 11298729
    Abstract: The present disclosure relates to a sub-frame cleaning and blow-drying device, comprising a rack, a water tank, a bottom lifting assembly, supporting assemblies, a top lifting assembly, a rotating assembly, an expanding and cleaning-off assembly and a blow-drying device. Expanding assemblies expand to be connected with vehicle body mounting holes, compressed air is blown into the vehicle body mounting holes by air outlets and is blown into a cavity of a sub-frame to clean off aluminum scraps and residual sand in the cavity of the sub-frame, the rotating assembly drives the expanding and cleaning-off assembly and the sub-frame to do rotation movement to perform secondary cleaning, so that the aluminum scraps and the sand remaining inside the cavity can be cleaned off, and the sub-frame cleaning and blow-drying device can be flexibly adjusted by a position adjusting assembly according to different types of sub-frames and is strong in universality.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: April 12, 2022
    Assignee: CITIC Dicastal Co., Ltd.
    Inventors: Huiying Liu, Baojun Shi, Junmeng Li
  • Patent number: 11297994
    Abstract: An unattended extraction cleaning machine includes a housing with a bottom portion that is adapted to rest on a surface to be cleaned, a fluid delivery system including a fluid distributor, a fluid extraction system including a suction nozzle, at least one carriage assembly mounting the suction nozzle to the housing for movement with respect thereto and with respect to the surface to be cleaned, and an ultraviolet light mounted on at least one of the housing and the carriage assembly to emit ultraviolet light onto the surface to be cleaned.
    Type: Grant
    Filed: October 2, 2019
    Date of Patent: April 12, 2022
    Assignee: BISSELL Inc.
    Inventors: Phong Hoang Tran, Charles A. Reed, Jr., Jeremy Moog, Eric C. Huffman
  • Patent number: 11302519
    Abstract: Methods of patterning low-k dielectric films are described. In an example, a method of patterning a low-k dielectric film involves forming and patterning a mask layer above a low-k dielectric layer, the low-k dielectric layer disposed above a substrate. The method also involves modifying exposed portions of the low-k dielectric layer with a nitrogen-free plasma process. The method also involves removing, with a remote plasma process, the modified portions of the low-k dielectric layer selective to the mask layer and unmodified portions of the low-k dielectric layer.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: April 12, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Srinivas D. Nemani, Jeremiah T. Pender, Qingjun Zhou, Dmitry Lubomirsky, Sergey G. Belostotskiy
  • Patent number: 11285539
    Abstract: Provided are methods for preparing iron nanoparticles and to iron nanoparticles produced by those methods. The invention also provides methods for coating the iron nanoparticles with oxides and functionalizing the iron nanoparticles with organic and polymeric ligands. Additionally, the invention provides methods of using such iron nanoparticles.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: March 29, 2022
    Assignees: University of Maryland, College Park, University of Maryland, Baltimore
    Inventors: Zhihong Nie, Radi Masri
  • Patent number: 11286849
    Abstract: A cleaning system and method use an ultrasound probe, a coupling mechanism, and a controller to clean equipment of a vehicle system. The ultrasound probe enters into an engine. The ultrasound probe emits ultrasound pulses and the coupling mechanism provides an ultrasound coupling medium between the ultrasound probe and one or more components of the engine. The controller drives the ultrasound probe to deliver the ultrasound pulse through the coupling medium to a surface of the one or more components of the engine. The ultrasound probe delivers the ultrasound pulse to remove deposits from the one or more components of the engine.
    Type: Grant
    Filed: June 5, 2018
    Date of Patent: March 29, 2022
    Inventors: Bernard Patrick Bewlay, Waseem Ibrahim Faidi, Peter William Lorraine, Mohamed Ahmed Ali, Siavash Yazdanfar, Ying Fan, Edward James Nieters, David Mills, Nicole Jessica Tibbetts, Jr.
  • Patent number: 11273523
    Abstract: A work table for laser processing includes an upper plate including a plurality of cell regions and at least one groove region that divides the plurality of cell regions. The upper plate includes a plurality of absorption holes that fix a substrate in the plurality of cell regions. A plurality of suction holes collect particles generated during a cutting process performed on the substrate. A lower plate is disposed under the upper plate. The lower plate forms an absorption path that is coupled to the plurality of absorption holes. A suction path is coupled to the plurality of suction holes by combining the lower plate with the upper plate.
    Type: Grant
    Filed: September 19, 2017
    Date of Patent: March 15, 2022
    Inventors: Sungyong Lee, Jaeha Lim, Gyoowan Han
  • Patent number: 11264260
    Abstract: A method is for cleaning an edge ring. The edge ring includes an inner edge ring provided near a substrate mounted on an electrostatic chuck in a processing chamber, a central edge ring that is provided at an outer side of the inner edge ring and vertically movable by a moving mechanism, and an outer edge ring provided at an outer side of the central edge ring. The method includes applying a direct current voltage to the electrostatic chuck, and moving the central edge ring upward or downward.
    Type: Grant
    Filed: May 10, 2019
    Date of Patent: March 1, 2022
    Inventor: Takehiro Tanikawa
  • Patent number: 11253134
    Abstract: A dishwasher includes: a dishwasher body including a tub that defines a washing space and a sump disposed vertically below the tub and configured to accommodate washing water; a heat pump including a compressor, a condenser, an expansion apparatus, and an evaporator; a drain storage unit connected to a drain pipe of the sump and configured to receive washing water discharged from the sump; a drain pipe open-close valve that opens and closes the drain pipe; and a controller that controls the heat pump and the drain pipe open-close valve. The evaporator is configured to exchange heat with the drain storage unit, and the controller controls the drain pipe open-close valve to open the drain pipe to move washing water of the sump to the drain storage unit when the sump is drained.
    Type: Grant
    Filed: November 27, 2019
    Date of Patent: February 22, 2022
    Assignee: LG Electronics Inc.
    Inventors: Sangheon Yoon, Changyoon Jung
  • Patent number: 11235359
    Abstract: Methods, systems, and apparatuses are disclosed for the selective and controlled removal of debris from specific areas of a substrate outer surface without adversely impacting the substrate outer surface, including substrate outer surface coatings, and returning an actual substrate outer surface profile containing affixed debris to a predetermined substrate outer surface profile by comparing a library of predetermined profiles to an actual substrate outer surface profile in real time.
    Type: Grant
    Filed: February 11, 2019
    Date of Patent: February 1, 2022
    Assignee: The Boeing Company
    Inventors: Joseph Andrew Bolton, Keith Daniel Humfeld
  • Patent number: 11239071
    Abstract: A method of processing a semiconductor device including following operation is provided. A substrate is provided. The substrate is then processed with a treating solution, in which the treating solution includes liquid carbon dioxide and an additive. The treating solution is then displaced by a supercritical fluid carbon dioxide. The substrate is then dried by transforming the supercritical fluid carbon dioxide to gaseous carbon dioxide.
    Type: Grant
    Filed: December 3, 2020
    Date of Patent: February 1, 2022
    Inventors: Jen-I Lai, Chun-Heng Wu
  • Patent number: 11224847
    Abstract: Disclosed is an apparatus and method for providing asymmetric oscillations to a container. The container may include a fluid, a particle, and/or a gas. A vibration driver attached to the container provides asymmetric oscillations. A controller connected to the vibration driver controls an amplitude, frequency, and shape of the asymmetric oscillations. An amplifier amplifies the asymmetric oscillations in response to the controller. A sensor disposed on the vibration driver provides feedback to the controller.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: January 18, 2022
    Inventor: Andrew E. Bloch
  • Patent number: 11224901
    Abstract: The present invention relates to systems and methods for cleaning of devices, such as heat exchangers. According to the invention, controlled cavitation is created at predetermined positions within a device. The cavitation is done by mechanical waves, such as ultrasound waves, generated by transducers, wherein the waves are based on output of time-reversal wave form analysis of the device structures.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: January 18, 2022
    Inventors: Edward Haeggström, Timo Rauhala, Petro Moilanen, Ari Salmi
  • Patent number: 11225633
    Abstract: A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0×10?10 to 1.0×10?4.
    Type: Grant
    Filed: November 5, 2018
    Date of Patent: January 18, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Tetsuya Kamimura, Tomonori Takahashi
  • Patent number: 11228276
    Abstract: A system for ultrasonic cleaning of a solar panel includes a plurality of microelectromechanical systems (MEMS) ultrasonic transducers arranged on a side wall of the solar panel and/or under transparent glass on a surface of the solar panel; a hydraulic sun tracking mechanism configured to move the solar panel into a plurality of positions; a valve connected to a water source; and a controller which controls the plurality MEMS ultrasonic transducers, the sun tracking mechanism, and the valve, wherein the controller is configured to activate a cleaning protocol comprising the steps of moving the solar panel into a substantially horizontal position; opening the valve to allow a water flow over the surface of the solar panel; activating the plurality of MEMS ultrasonic transducers to apply ultrasonic waves to the water on the surface of the solar panel, wherein signal interference from different transducers are controlled to generate a rotating focused ultrasound signal over the surface of the solar panel; and m
    Type: Grant
    Filed: July 27, 2021
    Date of Patent: January 18, 2022
    Inventors: Ahmed Elseddawy, Hatem Sindi, Maher Azzouz
  • Patent number: 11222794
    Abstract: The present disclosure provides a semiconductor fabrication apparatus. The semiconductor apparatus includes a processing chamber for etching; a substrate stage integrated in the processing chamber and being configured to secure a semiconductor wafer; a reflective mirror configured inside the processing chamber to reflect thermal energy from the heating mechanism toward the semiconductor wafer; and a heating mechanism embedded in the process chamber and is operable to perform a baking process to remove a by-product generated during the etching. The heating mechanism is integrated between the reflective mirror and a gas distribution plate of the processing chamber.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: January 11, 2022
    Inventors: Han-Yu Lin, Yi-Ruei Jhan, Fang-Wei Lee, Li-Te Lin, Pinyen Lin, Tze-Chung Lin
  • Patent number: 11205658
    Abstract: Embodiments of a three-dimensional (3D) memory device with a corrosion-resistant composite spacer and method for forming the same are disclosed. In an example, a 3D memory device includes a substrate, a memory stack disposed on the substrate and including a plurality of conductor/dielectric layer pairs, a plurality of memory strings each extending vertically through the memory stack, a slit contact disposed laterally between the plurality of memory strings, and a composite spacer disposed laterally between the slit contact and at least one of the memory strings. The composite spacer includes a first silicon oxide film, a second silicon oxide film, and a dielectric film disposed laterally between the first silicon oxide film and the second silicon oxide film.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: December 21, 2021
    Inventors: Bo Xu, Ping Yan, Chuan Yang, Jing Gao, Zongliang Huo, Lu Zhang
  • Patent number: 11198626
    Abstract: An apparatus for producing conditioned water configured to add a pH adjuster and/or a redox potential regulator to ultrapure water to produce conditioned water, the generator including: a chemical tank configured to store a chemical solution containing the pH adjuster and/or the redox potential regulator; a chemical injection pipe configured to inject the chemical solution in the chemical tank into the ultrapure water; and a degassing device configured to degas the chemical solution injected into the ultrapure water. When producing conditioned water useful as wash water for semiconductor wafers by adding a pH adjuster and/or a redox potential regulator into ultrapure water, the present invention can solve problems such as incorporation of DO from the chemical solution, injection failure and measurement failure of the flow meter due to foaming of the chemical solution, thereby enabling stable production of conditioned water with a low DO concentration and high water quality.
    Type: Grant
    Filed: September 12, 2017
    Date of Patent: December 14, 2021
    Inventor: Tooru Masaoka
  • Patent number: 11191873
    Abstract: A method for processing a biomedical material using a supercritical fluid includes introducing the supercritical fluid into a cavity. The supercritical fluid is doped with a hydrogen isotope-labeled compound, an organic metal compound, an element selecting from a halogen element, oxygen, sulfur, selenium, phosphorus or arsenic, or a compound containing the element. The biomedical material in the cavity is modified by the supercritical fluid at a temperature above a critical temperature of the supercritical fluid and a pressure above a critical pressure of the supercritical fluid.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: December 7, 2021
    Inventors: Ting-Chang Chang, Kuan-Chang Chang, Chih-Cheng Shih, Chih-Hung Pan, Chih-Yang Lin
  • Patent number: 11195731
    Abstract: A substrate processing device includes a substrate holding table, an ultraviolet irradiator, a tubular member, a first gas supplying unit, and a second gas supplying unit. The ultraviolet irradiator is disposed facing to the substrate through an active space and configured to irradiate the substrate with ultraviolet light. The tubular member includes an inner surface surrounding a side surface of the substrate holding table, and at least one opening at a position facing to the side surface on the inner surface. The first gas supplying unit supplies gas to a space between the side surface of the substrate holding table and the inner surface of the tubular member through the at least one opening. The second gas supplying unit supplies gas to an active space between the substrate and the ultraviolet irradiator.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: December 7, 2021
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Masafumi Inoue, Akihiko Taki, Hiroki Taniguchi, Takayoshi Tanaka, Yuta Nakano
  • Patent number: 11173518
    Abstract: An in-line process for reusing printed cans is disclosed. The process includes positioning a printed can in front of a laser, the printed can having existing-print on an outer surface of the printed can. And, irradiating the outer surface of the printed can with laser radiation to remove 10% to 90% of the existing-print from the printed can and thereby form a lightened-printed can. And further, coating the outer surface of the lightened-printed can with a masking agent to form a blank-reprintable can. Finally, optionally, printing a new print-pattern on the outer surface of the blank-reprintable can to form a newly-printed can.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: November 16, 2021
    Assignee: WilCraft Can, LLC
    Inventors: Sean P. Kingston, Matthew L. Koele, Benjamin T. White
  • Patent number: 11173526
    Abstract: In one embodiment, systems and methods include using an automated laser system to remove a portion of a coating for nutplate installation. An automated laser system comprises a laser scanner and a laser head, wherein the laser head is coupled to the laser scanner. The laser head comprises a containment unit and a vacuum connector wherein the vacuum connector is disposed on a first side of the containment unit. The laser head further comprises a camera system, a light source, a first actuator, and a second actuator all disposed on a top surface of the containment unit. The laser head further comprises an end piece, wherein the second actuator is configured to displace the end piece.
    Type: Grant
    Filed: January 30, 2020
    Date of Patent: November 16, 2021
    Assignee: Lockheed Martin Corporation
    Inventors: David Haynes Coleman, Michael Bryan Stoddard, Jeffrey P. Langevin, Steven E. Twaddle, Alexandria Zoe Arthur
  • Patent number: 11154913
    Abstract: A substrate processing method includes a vapor atmosphere filling step of filling surroundings of a liquid film of a processing liquid with a vapor atmosphere containing a vapor of a low surface tension liquid that has a lower surface tension than the processing liquid, a dry region forming step of forming a dry region in the liquid film of the processing liquid by partially excluding the processing liquid while spraying a gas containing the vapor of the low surface tension liquid onto the liquid film of the processing liquid in parallel with the vapor atmosphere filling step, and a dry region expanding step of expanding the dry region toward an outer periphery of a substrate while rotating the substrate in parallel with the vapor atmosphere filling step.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: October 26, 2021
    Inventor: Masayuki Otsuji