Including Application Of Electrical Radiant Or Wave Energy To Work Patents (Class 134/1)
  • Patent number: 10322270
    Abstract: An applicator for use with a skin care composition, comprising a magnetic element disposed inside the applicator and a cover that at least partially covers the magnetic element. The cover has a thickness of between 0.1 mm and 0.55 mm and is formed of a material having a thermal conductivity of at least 50 W/mK.
    Type: Grant
    Filed: September 17, 2015
    Date of Patent: June 18, 2019
    Assignee: The Procter & Gamble Company
    Inventors: Lucas Boalem Nanini-Maury, Jeffrey David Edwards
  • Patent number: 10315180
    Abstract: There is provided a method of producing a localized concentration of energy. The method includes creating at least one shockwave propagating through a non-gaseous medium so as to be incident upon a pocket of gas suspended within the medium. The pocket of gas is spaced from a surface shaped so as, at least partially, to reflect said shockwave in such a way as to direct it onto said gas pocket.
    Type: Grant
    Filed: July 1, 2016
    Date of Patent: June 11, 2019
    Assignee: OXFORD UNIVERSITY INNOVATION LIMITED
    Inventors: Yiannis Ventikos, Nicholas Hawker
  • Patent number: 10312114
    Abstract: This substrate processing method includes supplying a chemical liquid to an upper surface of a substrate and rinsing away the chemical liquid adhering to the upper surface of the substrate by holding a puddled rinse liquid on the substrate while maintaining a rotation speed of the substrate at a zero or low speed, and a chemical liquid puddle step of holding a liquid film of a puddled chemical liquid on the upper surface of the substrate while maintaining the rotation speed of the substrate at a zero or low speed, and the rinsing step is performed subsequent to finishing the chemical liquid puddle step, and the rinsing step includes supplying a rinse liquid to the upper surface of the substrate and then replacing the liquid film of the chemical liquid held on the upper surface of the substrate with the rinse liquid.
    Type: Grant
    Filed: October 8, 2014
    Date of Patent: June 4, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Asuka Yoshizumi, Ayumi Higuchi
  • Patent number: 10286424
    Abstract: A cleaning system includes a first container. The first container includes an interior surface and an opening. The interior surface and the opening define a volume. The opening extends along a plane. The interior surface defines at least a portion of a curved surface. The curved surface defines a first focus point. The first focus point is positioned below the plane such that the first focus point is coincident with a portion of the curved surface. The cleaning system further includes a support member and a surgical instrument. The surgical instrument is configured to deliver ultrasonic energy upon activation of the instrument. The surgical instrument comprises an end effector having a distal tip. The support member is configured to support the surgical instrument such that the distal tip is positioned substantially at the first focus point.
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: May 14, 2019
    Assignee: Ethicon LLC
    Inventors: Foster B. Stulen, Eitan T. Wiener
  • Patent number: 10286430
    Abstract: Reversibly switchable (transformable) surface layer changeable from (super)hydrophobic to (super)hydrophilic surface states are described. Methods of decontamination of surfaces exposed to contaminate are provided. The reversibly switchable properties of the surface layer can be controlled by an external stimulus.
    Type: Grant
    Filed: January 17, 2017
    Date of Patent: May 14, 2019
    Assignee: The Boeing Company
    Inventor: Leora Peltz
  • Patent number: 10286425
    Abstract: After hydrophobization of surfaces of patterns, a liquid film of pure water or the like is formed on the surfaces of the substrate. At this stage, the liquid of the liquid film cannot be present between the patterns because of hydrophobization, and gas is present there. With the front surface of the substrate covered with the liquid film, a liquid to which ultrasonic waves are applied is supplied to the back surface of the substrate, whereby the back surface of the substrate is cleaned due to the cavitation collapse energy in the liquid caused by the ultrasonic waves. While collapse of cavitation occurs at the front surface of the substrate, the presence of the gas between the patterns prohibits collapse of cavitation between the patterns, the liquid film can prevent contamination while preventing collapse of the patterns, and the back surface of the substrate is cleaned favorably.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: May 14, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Yuta Sasaki, Yosuke Hanawa, Katsuhiko Miya
  • Patent number: 10272522
    Abstract: A liquid-jet-guided laser system can be used to generate functional slots having different depth and sidewall profiles by applying active control of laser beam parameters. Blinds slots can be processed onto a workpiece, such as a tire mold or a turbine vane, for an insertion of a sipe or a sealing element, respectively. Through slots can also be processed onto a workpiece, such as a turbine element for cooling during operation or a semiconductor wafer for singulation purpose. The processing of the workpiece can include a two-step procedure, wherein the first step comprises a pre-cut. The pre-cut cuts a contour outline of a slot onto a workpiece corresponding to an element that is to be inserted into the slot. The second step comprises a removal cut to remove excess workpiece material in between the contour outline. The liquid-jet-guided laser system can employ multiple-wavelength processing of a multiple-material workpiece.
    Type: Grant
    Filed: December 13, 2014
    Date of Patent: April 30, 2019
    Assignee: Avonisys AG
    Inventors: Jens Guenter Gaebelein, Jeroen Hribar
  • Patent number: 10268119
    Abstract: An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.
    Type: Grant
    Filed: April 4, 2018
    Date of Patent: April 23, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Atsushi Ueda, Takashi Saito
  • Patent number: 10258931
    Abstract: The present invention discloses a polyvinylidene fluoride hollow fiber membrane and a preparation method thereof. The hollow fiber membrane comprises 30%-50% of polyvinylidene fluoride resin, 40%-60% of inorganic molecular solution in-situ pore-forming agent and 5%-20% of organic diluent.
    Type: Grant
    Filed: July 20, 2017
    Date of Patent: April 16, 2019
    Assignee: UNITED ENRIRONTECH (XIAMEN) CO., LTD.
    Inventors: Jianchun Hong, Songhua Huang, Xueping Ling, Shiwei Wu
  • Patent number: 10254774
    Abstract: A temperature control method is provided for controlling a plasma processing apparatus that is capable of changing a temperature setting for each step of a plasma process including multiple steps. The method includes a transfer step of performing an entry process for transferring a workpiece into a processing chamber of the plasma processing apparatus and/or an exit process for transferring the workpiece out of the processing chamber, a process execution step of executing the plasma process including multiple steps, and a temperature control step of performing a first temperature control and/or a second temperature control. The first temperature control includes controlling a temperature to a temperature setting of a next process according to a time execution of the plasma process is completed, and the second temperature control includes controlling the temperature to the temperature setting of the next process in parallel with the entry process and/or the exit process.
    Type: Grant
    Filed: October 30, 2012
    Date of Patent: April 9, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Tatsuya Miura, Wataru Ozawa, Kimihiro Fukasawa, Kazunori Kazama
  • Patent number: 10256069
    Abstract: Processes and systems for carbon ion implantation include utilizing phosphorous trifluoride (PF3) as a co-gas with carbon oxide gas, and in some embodiments, in combination with the lanthanated tungsten alloy ion source components advantageously results in minimal oxidation of the cathode and cathode shield. Moreover, acceptable levels of carbon deposits on the arc chamber internal components have been observed as well as marked reductions in the halogen cycle, i.e., WFx formation.
    Type: Grant
    Filed: November 9, 2017
    Date of Patent: April 9, 2019
    Assignee: AXCELIS TECHNOLOGIES, INC.
    Inventors: Neil Colvin, Tseh-Jen Hsieh
  • Patent number: 10256159
    Abstract: A method is presented for forming a semiconductor structure. The method includes forming a silicon (Si) channel for a first device, forming a first interfacial layer over the Si channel, forming a silicon-germanium (SiGe) channel for a second device, forming a second interfacial layer over the SiGe channel, and selectively removing germanium oxide (GeOX) from the second interfacial layer by applying a combination of hydrogen (H2) and hydrogen chloride (HCl). The second interfacial is silicon germanium oxide (SiGeOX) and removal of the GeOX results in formation of a pure silicon dioxide (SiO2) layer.
    Type: Grant
    Filed: January 23, 2017
    Date of Patent: April 9, 2019
    Assignee: International Business Machines Corporation
    Inventors: Ruqiang Bao, Hemanth Jagannathan, ChoongHyun Lee, Shogo Mochizuki
  • Patent number: 10253412
    Abstract: A deposition apparatus for processing substrates includes a vacuum chamber including a processing zone in which a substrate may be processed. First and second gas sources are in fluid communication with the vacuum chamber. The first gas source is operable to supply a first gas into the vacuum chamber and the second gas source is operable to supply a second gas into the vacuum chamber. A showerhead assembly includes a face plate and back plate. The back plate includes a first gas inlet in fluid communication with the first gas source and a second gas inlet in fluid communication with the second gas source. The face plate includes a lower wall and an outer wall extending vertically upwardly from an outer periphery of the lower wall. The outer wall is sealed to an outer periphery of the back plate such that an inner plenum and an edge plenum are formed between the face plate and the back plate.
    Type: Grant
    Filed: May 22, 2015
    Date of Patent: April 9, 2019
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Timothy Scott Thomas, Karl Leeser
  • Patent number: 10245333
    Abstract: A plasma generating apparatus according to embodiments of the inventive concept, which provides plasma to a biological material, includes a housing configured to provide an inner space in which plasma is generated, a ground electrode coupled to one side of the housing, a power electrode coupled to the other side of the housing, and a controller configured to control a generation mode of the plasma. The generation mode includes a first mode in which the plasma is provided to the biological material while generating the plasma and a second mode in which the plasma is generated in the housing, and then the generated plasma is provided to the biological material.
    Type: Grant
    Filed: August 19, 2016
    Date of Patent: April 2, 2019
    Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Han Young Yu, Yark Yeon Kim, Won Ick Jang, Yong Sun Yoon, Bong Kuk Lee
  • Patent number: 10246781
    Abstract: A method for removing a metallic deposit disposed on a surface in a chamber, including the following steps: a) a step of oxidizing the metallic deposit; b) a step of injecting chemical species adapted to volatilized the oxidized metallic deposit, the step b) being implemented during at least a part of step a); and in step b), the chemical species are injected according to a sequence of pulses.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: April 2, 2019
    Inventors: Julien Vitiello, Jean-Luc Delcarri, Fabien Piallat
  • Patent number: 10232329
    Abstract: A generating method for generating one of mist and fine-bubbles or fine-bubbles is provided. The generating method includes arranging a piezoelectric substrate equipped thereon with an excitation source in a liquid, generating a flow of the liquid using a liquid flow generator that generates the flow of the liquid relative to the piezoelectric substrate, exciting a surface acoustic wave on the excitation source, propagating the excited surface acoustic wave so as to generate mist on a gas side and to generate fine-bubbles on a liquid side of the piezoelectric substrate, carrying the generated fine-bubbles away from the piezoelectric substrate with the generated flow of the liquid, and drawing the liquid containing the fine-bubbles from a liquid container which contains the liquid.
    Type: Grant
    Filed: January 20, 2017
    Date of Patent: March 19, 2019
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Masanori Okano, Shigeki Fujiwara, Youhei Ishigami
  • Patent number: 10215729
    Abstract: The proposed invention provides a method of monitoring the dry cleaning progress of a transcutaneous sensor having an electrode for measuring pCO2 and an electrode for measuring pO2, both electrodes opening into a measuring surface of the sensor. The method comprises receiving an AC signal from the pCO2 electrode, initiating a cleaning of the sensor, and monitoring the cleaning progress by analyzing AC signals subsequently received from the pCO2 electrode.
    Type: Grant
    Filed: September 6, 2016
    Date of Patent: February 26, 2019
    Assignee: Radiometer Basel AG
    Inventors: Florian Krayss, Hansruedi Vogt, Dominik Liechty, Christian Bochud
  • Patent number: 10199202
    Abstract: Provided are a plasma irradiation apparatus and plasma irradiation method capable of converting a silica precursor to a high quality silica film in a short time without thermal effects on the object being processed. This plasma irradiation apparatus 1 is provided with a plasma-generating unit 12 and an irradiation unit 80 for irradiating the plasma generated by the plasma-generating unit 12 on an object to be processed, and is characterized in that irradiation unit 80 comprises a coating part 85 capable of coating a liquid on the object being processed.
    Type: Grant
    Filed: April 9, 2015
    Date of Patent: February 5, 2019
    Assignee: Oral 28 Inc.
    Inventors: Toyohiko Shindo, Yumino Genba, Masuji Yamaguchi
  • Patent number: 10186436
    Abstract: Provided are a substrate processing system and a substrate processing method that can obtain expected etching rate and selection ratio, and perform stable processing. A substrate (11) is soaked in processing liquid (12) stored in a processing bath (14). The processing bath (14) is sealed by cover members (21a and 21b), and the inside is pressurized by water vapor from the heated processing liquid (12). Pure water is consecutively added to the processing liquid (12). Internal pressure of the processing bath (14) is measured, a degree of opening of an exhaust valve (41) is increased or decreased based on the internal pressure (Pa), the internal pressure is kept at constant, a water addition amount of the pure water is increased or decreased based on the internal pressure (Pa), and the substrate (11) is processed using the processing liquid (12) at constant concentration and constant temperature.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: January 22, 2019
    Assignee: J.E.T. CO., LTD.
    Inventors: Hirofumi Shomori, Atsuo Kimura
  • Patent number: 10180075
    Abstract: Technologies for engine fluid quality monitoring are disclosed herein. An engine system includes a gas turbine engine having one or more mechanical components, a fluid quality sensing system, and an engine controller. Each mechanical component includes a tracer material embedded in the mechanical component during manufacture. The fluid quality sensing system applies a laser beam to debris captured in an engine fluid of the gas turbine engine and detects a light signature generated by tracer material in the debris in response to application of the laser beam. The engine controller identifies the tracer material as a function of the light signature. The engine controller determines a potential wear state of a mechanical component as a function of the tracer material. The engine controller may select the mechanical component from multiple mechanical components based on the tracer material. Each mechanical component has a predetermined association with a corresponding tracer material.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: January 15, 2019
    Assignee: Rolls-Royce Corporation
    Inventors: Dawn K. Andrus, Michael T. Elliott, John Costello, Anthony Fulford, John Gebhard
  • Patent number: 10181559
    Abstract: There is provided an workpiece etching method executed in manufacturing a magneto-resistive effect element, the workpiece including first and second multilayer films, the first multilayer film including first and second magnetic layers and a tunnel barrier layer formed between the first and second magnetic layers, and the second multilayer film being a multilayer film constituting a pinning layer in the magneto-resistive effect element. The method includes: etching the first multilayer film; generating plasma of a first gas including hydrocarbon and noble gases inside a chamber of a plasma processing apparatus to etch the second multilayer film inside the chamber; and generating plasma of a second gas including gas containing carbon and oxygen, an oxygen gas and a noble gas and not containing hydrogen inside the chamber to remove a carbon-containing deposit formed on the workpiece in the generating the plasma of the first gas.
    Type: Grant
    Filed: December 14, 2017
    Date of Patent: January 15, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takuya Kubo, Song yun Kang
  • Patent number: 10167552
    Abstract: An apparatus for processing wafer-shaped articles comprises a spin chuck for holding a wafer-shaped article in a predetermined orientation, and a rotating shower head for supplying process gas to a surface of a wafer-shaped article when held by the spin chuck. The rotating shower head comprises an outlet plate having plural openings formed in each of a central and a peripheral region thereof. A process gas feed is provided so as to supply process gas to a gas distribution chamber. The gas distribution chamber is in fluid communication with a plurality of openings formed in the shower head.
    Type: Grant
    Filed: February 5, 2015
    Date of Patent: January 1, 2019
    Assignee: LAM RESEARCH AG
    Inventors: Andreas Gleissner, Markus Junk, Bhaskar Bandarapu
  • Patent number: 10168627
    Abstract: An exposure apparatus and manufacturing methods using the exposure apparatus are disclosed. An exposure apparatus includes a light source system generating light, an optical system controlling and patterning the light, a substrate system on which an exposure process is performed on a substrate by the patterned light, and a control unit controlling the light source system, the optical system and the substrate system. The optical system includes a chamber, a reflection member disposed in the chamber to control the light, and a first on-off valve installed on one side of the chamber opposite to the substrate system. The control unit controls the optical system such that the first on-off valve is opened during the exposure process and is closed during a cleaning process performed to the inside of the chamber.
    Type: Grant
    Filed: April 22, 2016
    Date of Patent: January 1, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sungjoo Kim, Yun kyeong Jang, Jinhong Park, Dohyun Seo, HyunHoon Lee
  • Patent number: 10170286
    Abstract: An ion source assembly and method is provided for improving ion implantation performance. The ion source assembly has an ion source chamber and a source gas supply provides a molecular carbon source gas such as toluene to the ion source chamber. A source gas flow controller controls a flow of the molecular carbon source gas to the ion source chamber. An excitation source excites the molecular carbon source gas, forming carbon ions and atomic carbon. An extraction electrode extracts the carbon ions from the ion source chamber, forming an ion beam. A hydrogen peroxide co-gas supply provides a predetermined concentration of hydrogen peroxide co-gas to the ion source chamber, and a hydrogen peroxide co-gas flow controller controls a flow of the hydrogen peroxide gas to the ion source chamber. The hydrogen peroxide co-gas decomposes within the ion source chamber and reacts with the atomic carbon from the molecular carbon source gas in the ion source chamber, forming hydrocarbons within the ion source chamber.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: January 1, 2019
    Assignee: Axcelis Technologies, Inc.
    Inventors: Neil K. Colvin, Tseh-Jen Hsieh
  • Patent number: 10160015
    Abstract: An apparatus for removing at least one foreign substance includes a detection unit detecting the at least one foreign substance adhered to a holding surface of a suction holding unit configured to suck and hold a substrate, a removal unit removing the at least one foreign substance adhered to the holding surface using fluid, and a movement mechanism configured to move the detection unit and the removal unit.
    Type: Grant
    Filed: April 4, 2016
    Date of Patent: December 25, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Osamu Hirakawa, Yoshitaka Otsuka
  • Patent number: 10156784
    Abstract: A method includes directing an acoustically agitated fluid stream at a first surface of a substrate to cause the substrate to vibrate mechanically thereby dislodging contaminant particles on the substrate. The first surface of the substrate is opposite a second surface of the substrate. The second surface of the substrate includes a pattern. An amplitude of the acoustically agitated fluid stream is configured to produce an acoustic response along an entirety of the second surface.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: December 18, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ching-Wei Shen, Chi-Lun Lu, Kuan-Wen Lin
  • Patent number: 10149598
    Abstract: A debris collection device for sanitary collection of debris onto an adhesive strip includes a housing that defines an internal space. A pair of rollers is rotationally coupled to and extends perpendicularly from a side of the housing. The rollers are positioned singly proximate to a first end and a second end of the housing. A drive is coupled to the housing and is positioned in the internal space. The drive is operationally coupled to the rollers such that the rollers rotate coincidentally. Each opposing end of a strip is couplable to a respective roller. An adhesive is coupled to a face of the strip. A handle is coupled to and extends from the second end of the housing. A respective roller is configured to position and roll upon a surface to adhesively collect debris onto the strip.
    Type: Grant
    Filed: September 27, 2016
    Date of Patent: December 11, 2018
    Inventor: Fred Doane
  • Patent number: 10153216
    Abstract: Degradation of reliability of a semiconductor device is prevented. An electrode pad included mainly of aluminum is formed over amain surface of a semiconductor wafer. Subsequently, a first insulating member and a second insulating member are formed over the main surface of the semiconductor wafer so as to cover the electrode pad, and thereafter an opening portion that exposes a surface of the electrode pad is formed in the first insulating member and the second insulating member by a dry etching method using an etching gas including a halogen-based gas. Thereafter, an oxide film with a thickness of 2 nm to 6 nm is formed over the exposed surface of the electrode pad by performing a heat treatment at 200° C. to 300° C. in an air atmosphere, and then the semiconductor wafer is stored.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: December 11, 2018
    Assignee: Renesas Electronics Corporation
    Inventor: Takehiro Oura
  • Patent number: 10137632
    Abstract: A method of manufacturing a three-dimensional object is disclosed. The method includes operating a first ejector of a three-dimensional object printer to eject a first material towards a platen to form an object. The method further includes operating a second ejector of the three-dimensional object printer to eject a second material towards the platen to form support for portions of the object, the support being configured to provide support for portions of the object during the operation of the first ejector to form the object, at least one portion of the support having a body with at least one fluid path that connects at least one opening in the body to at least one other opening in the body. The method further includes connecting a fluid source to the at least one fluid path of the support to enable fluid to flow through the at least one fluid path to remove at least an inner portion the support from the object.
    Type: Grant
    Filed: November 11, 2015
    Date of Patent: November 27, 2018
    Assignee: Xerox Corporation
    Inventors: David A. Mantell, Andrew W. Hays, Linn C. Hoover, Ron E. Dufort, Erwin Ruiz, Patrick J. Howe
  • Patent number: 10137612
    Abstract: A method of removing an ophthalmic lens from a lens mold portion is provided and includes reciprocally displacing a region of the mold portion and thereby causing an edge portion of the ophthalmic lenses to become detached from the mold portion. Related apparatus, methods of manufacturing ophthalmic lenses, delensing stations, and manufacturing times are provided.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: November 27, 2018
    Assignee: CooperVision International Holding Company, LP
    Inventors: John Robert Gibson, Terence Michael Cook, James Bryan Cook
  • Patent number: 10139162
    Abstract: An acoustic energy-transfer system includes: an acoustic chest arranged circumferentially around a container configured to receive a material to be processed; and an ultrasonic transducer arranged circumferentially inside the acoustic chest, the ultrasonic transducer defining an acoustic slot extending through the ultrasonic transducer, the acoustic slot angled with respect to a central axis of the acoustic chest.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: November 27, 2018
    Assignee: Heat Technologies, Inc.
    Inventors: Zinovy Zalman Plavnik, Jason Lye
  • Patent number: 10134784
    Abstract: To eliminate electric discharge when an element formation layer including a semiconductor element is peeled from a substrate used for manufacturing the semiconductor element, a substrate over which an element formation layer and a peeling layer are formed and a film are made to go through a gap between pressurization rollers. The film is attached to the element formation layer between the pressurization rollers, bent along a curved surface of the pressurization roller on a side of the pressurization rollers, and collected. Peeling is generated between the element formation layer and the peeling layer and the element formation layer is transferred to the film. Liquid is sequentially supplied by a nozzle to a gap between the element formation layer and the peeling layer, which is generated by peeling, so that electric charge generated on surfaces of the element formation layer and the peeling layer is diffused by the liquid.
    Type: Grant
    Filed: February 9, 2017
    Date of Patent: November 20, 2018
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shingo Eguchi, Yohei Monma, Atsuhiro Tani, Misako Hirosue, Kenichi Hashimoto, Yasuharu Hosaka
  • Patent number: 10126273
    Abstract: A method of detecting inconsistencies in a structure is presented. A pulsed laser beam is directed towards the structure. A plurality of types of ultrasonic signals is formed in the structure when radiation of the pulsed laser beam is absorbed by the structure. The plurality of types of ultrasonic signals is detected to form data.
    Type: Grant
    Filed: February 29, 2016
    Date of Patent: November 13, 2018
    Assignee: The Boeing Company
    Inventors: Ivan Pelivanov, William P. Motzer, Matthew O'Donnell, Steven Kenneth Brady, Gary Ernest Georgeson, Jeffrey Reyner Kollgaard, Clarence Lavere Gordon, III, Jill Paisley Bingham, Alan F. Stewart, James C. Kennedy
  • Patent number: 10112344
    Abstract: A machine for processing a part produced by a 3-D printer. The machine includes a housing having a working chamber defined therein. A support structure is disposed at the bottom of the working chamber for supporting the part. The structure has at least one opening defined therein. A spray header is disposed along at least a portion of the perimeter of the working chamber. A pump is configured and arranged to convey a fluid at varying pressures through the spray header. The fluid contacts the part and then passes through the opening in the structure where it flows to the bottom of the working chamber to a fluid outlet.
    Type: Grant
    Filed: June 16, 2016
    Date of Patent: October 30, 2018
    Assignee: Audubon Machinery Corporation
    Inventors: Joseph M. McMahon, Scott Alexander Gilmour, Adam Michael Moehlau, Joshua J. Yagy, Daniel J. Hutchinson
  • Patent number: 10112414
    Abstract: Provided are an image recording method including: subjecting a recording substrate to a surface treatment by irradiating an image recording surface of the recording substrate with light from excimer emission using a xenon gas, the recording substrate being an aggregate of non-absorbent or low-absorbent fiber materials; and applying an ink composition by an ink jet method onto the image recording surface of the recording substrate after the surface treatment; and an image recorded article.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: October 30, 2018
    Assignee: Fujifilm Corporation
    Inventor: Ryuki Kakino
  • Patent number: 10112169
    Abstract: A system and method for resolving and/or mechanically manipulating molecular bonds. A method for resolving molecular bonds includes applying ultrasound to molecules to be manipulated. A magnetic signal associated with the molecules is measured. Whether ultrasound causes dissolution of the bonds of the molecules is determined based on measurements of the magnetic signal.
    Type: Grant
    Filed: October 27, 2014
    Date of Patent: October 30, 2018
    Assignee: UNIVERSITY OF HOUSTON SYSTEM
    Inventors: Shoujun Xu, Lashan De Silva, Li Yao
  • Patent number: 10100206
    Abstract: A composition for pretreating surfaces of equipment for use with an uncured cementitious material, such as uncured concrete, and/or for cleaning cured cementitious material from the surfaces of such equipment includes an aqueous solution with colloidal silica. Pretreatment of a surface with such an aqueous solution may reduce or eliminate adhesion of uncured cementitious material to the surface. Cured cementitious material may be removed from equipment surfaces by wetting the cured cementitious material with the aqueous solution to chemically soften the cured cementitious material, along with abrading the cured cementitious material to mechanically remove the same from the equipment surfaces. Systems for removing cured cementitious material from the surfaces of equipment configured to use with uncured cementitious material include an abrasive element and an aqueous solution with colloidal silica.
    Type: Grant
    Filed: January 20, 2015
    Date of Patent: October 16, 2018
    Assignee: Arris Technologies, LLC
    Inventor: Mark Wetherell
  • Patent number: 10096492
    Abstract: A substrate cleaning apparatus capable of preventing a cleaning vessel from being corroded by a chemical liquid while constituting the cleaning vessel with a low-price material is provided. The substrate cleaning apparatus includes: a cleaning vessel for holding a substrate therein; a substrate holder arranged in the cleaning vessel; a chemical liquid nozzle for supplying a chemical liquid onto the substrate held by the substrate holder; and a plurality of cleaning liquid nozzles for supplying a cleaning liquid onto an inner surface of the cleaning vessel. The inner surface of the cleaning vessel has been subjected to a hydrophilization treatment.
    Type: Grant
    Filed: October 1, 2013
    Date of Patent: October 9, 2018
    Assignee: EBARA CORPORATION
    Inventors: Koji Maeda, Hiroshi Shimomoto, Hisajiro Nakano
  • Patent number: 10096498
    Abstract: An apparatus for radiatively scribing a planar semiconductor substrate along a scribelane that extends between opposing rows of semiconductor devices on a target surface of the substrate. The scribelane extends parallel to a first direction parallel to a second direction, these first and second directions lying respectively parallel to X and Y axes of a Cartesian coordinate system. Such an apparatus may include an illuminator for producing an array of light beams; a projection system for focusing the light beams onto the target surface; an actuator system for causing relative displacement of a substrate holder with respect to light beams parallel to an XY plane; and an adjustable spatial filter located between the illuminator and the substrate holder, and including motorized plates whose position is adjustable so as to at least partially block selectable light beams of the light beam array.
    Type: Grant
    Filed: October 14, 2014
    Date of Patent: October 9, 2018
    Assignee: ASM TECHNOLOGY SINGAPORE PTE LTD
    Inventors: Ivo Libertus Adrianus Johannes Maria Pullens, Wilhelmus Hubertus Smits, Gerardus Johannes Verhaart, Karel Maykel Richard Van Der Stam, Guido Martinus Henricus Knippels
  • Patent number: 10080370
    Abstract: A method for reducing level of contaminants from an object, the method comprises introducing the object into an ultrasonic (US) bath carrying an aqueous medium that holds, suspended therein, insoluble nanoparticles and activating said bath to apply US waves onto said object while the object is at least partially submerged within said aqueous medium.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: September 25, 2018
    Assignee: EVER CLEAN AND CLEAR TECHNOLOGIES LTD.
    Inventor: Shlomo Rotter
  • Patent number: 10076822
    Abstract: A part processing apparatus and method is disclosed that includes a media-blasting apparatus and a cleaning apparatus. The media-blasting apparatus is configured to blast a stream of media against a surface of a part, and the cleaning apparatus is configured to clean debris or particles from the surface of the part. The cleaning apparatus includes a first spray-and-wash unit, a first ultrasonic wash unit, a second ultrasonic wash unit, and a second spray-and-wash unit, which may be arranged in the listed order. Each of the units may be configured to utilize hot liquid or water to clean the part being processed. The first ultrasonic wash unit is configured to ultrasonically vibrate a liquid in the first ultrasonic wash unit at a first frequency, and the second ultrasonic wash unit is configured to ultrasonically vibrate a liquid in the second ultrasonic wash unit at a second frequency.
    Type: Grant
    Filed: October 28, 2016
    Date of Patent: September 18, 2018
    Assignee: Engineered Abrasives, Inc.
    Inventor: Michael J. Wern
  • Patent number: 10076232
    Abstract: A sheath assembly for an endoscope includes an elongate tubular body and a plug. The endoscope has a handle portion and a scope portion extending therefrom to a tip. The body includes first and second wall sections and extends along a longitudinal axis between first and second distal openings. The first wall section extends radially about the longitudinal axis to define a scope lumen. The scope portion is receivable in the scope lumen. The second wall section extends radially about a portion of the first wall section and longitudinally between second distal and proximal end openings. The first and second wall sections define an integral suction lumen in fluid communication with a first source of negative pressure. The plug is mated with the distal end opening for closing the scope lumen and includes at least one suction opening disposed in co-registration with the first distal end opening.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: September 18, 2018
    Assignees: The Cleveland Clinic Foundation, Parker Hannifin Corporation
    Inventors: Rafi Avitsian, Andrew M. Zura, Robert B. Guthrie, Douglas W. Haight, James T. Callegari, Michael Collinson
  • Patent number: 10079163
    Abstract: Disclosed is an apparatus for treating a substrate. The apparatus includes a support unit that supports the substrate, and a treatment liquid supply unit that supplies a treatment liquid to the substrate, and the treatment liquid supply unit includes an injection unit that supplies the treatment liquid to the substrate supported by the support unit, a tank that accommodates the treatment liquid, a pipe connected to the tank, and a static electricity removing member that removes static electricity from the treatment liquid.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: September 18, 2018
    Assignee: Semes Co., Ltd.
    Inventors: Raetaek Oh, Hyunwoo Lee
  • Patent number: 10072469
    Abstract: The system and method for remediation of oil-contaminated sand provides for washing and separation of sand from oil and oil-based contamination. The system includes a feed hopper for receiving a volume of oil-contaminated sand in communication with a cleaning tank for receiving the volume of oil-contaminated sand therefrom. A mechanical stirrer mixes the volume of oil-contaminated sand with a surfactant solution in the cleaning tank. An ultrasonicator ultrasonicates the volume of oil-contaminated sand and the surfactant solution in the cleaning tank to create a mixture of washed sand and oily wastewater. A collection tank then receives the mixture. A band filter covers an open upper end of the collection tank, such that the mixture of washed sand and oily wastewater is filtered to separate out the washed sand, which may then be collected. The separated oily wastewater is then collected in the collection tank.
    Type: Grant
    Filed: August 1, 2016
    Date of Patent: September 11, 2018
    Inventor: Meshari Almutairi
  • Patent number: 10062596
    Abstract: Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for scanning the microelectronic substrate through a cryogenic fluid mixture used to treat an exposed surface of the microelectronic substrate. The fluid mixture may be expanded through a nozzle to form an aerosol spray or gas cluster jet (GCJ) spray may impinge the microelectronic substrate and remove particles from the microelectronic substrate's surface. In one embodiment, the fluid mixture may be maintained to prevent liquid formation within the fluid mixture prior to passing the fluid mixture through the nozzle. The fluid mixture may include nitrogen, argon, helium, neon, xenon, krypton, carbon dioxide, or any combination thereof.
    Type: Grant
    Filed: October 6, 2015
    Date of Patent: August 28, 2018
    Assignee: TEL FSI, INC.
    Inventors: Jeffery W. Butterbaugh, Chimaobi W. Mbanaso, David Scott Becker
  • Patent number: 10059911
    Abstract: A method of producing washing hydrogen water in an embodiment, includes: a step of storing ammonia water in a first tank; a step of transferring the ammonia water from the first tank to a second tank; a step of diluting the transferred ammonia water with ultrapure water in the second tank; a step of mixing the diluted ammonia water into hydrogen water; and a washing step of washing an inside of the first tank by ultrapure water to remove fine particles derived from ammonia generated in the first tank.
    Type: Grant
    Filed: July 14, 2016
    Date of Patent: August 28, 2018
    Assignees: NOMURA MICRO SCIENCE CO., LTD., ACM RESEARCH (SHANGHAI), INC.
    Inventors: Takayuki Jizaimaru, David H. Wang
  • Patent number: 10056235
    Abstract: A manufacturing method of a semiconductor device includes the steps of: (a) placing a semiconductor wafer over a stage provided in a chamber, the pressure in the inside of which is reduced by vacuum pumping; and (b) after the step (a), forming plasma in the chamber in a state where the semiconductor wafer is adsorbed and held by the stage, so that desired etching processing is performed on the semiconductor wafer. Herein, before the step (a), O2 gas, negative gas having an electronegativity higher than that of nitrogen gas, is introduced into the chamber to form O2 plasma in the chamber, thereby allowing the charges remaining over the stage to be eliminated.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: August 21, 2018
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventor: Kotaro Horikoshi
  • Patent number: 10053244
    Abstract: The present invention provides a pipe for transferring powder material from a reservoir to a container e.g. prior to hot isostatic pressing. The pipe comprises a continuous outer wall and a concentric continuous inner wall enclosed within and spaced from the outer wall. The spacing between the inner and outer walls defines a flow channel extending from an inlet to an outlet. The radial cross sectional area of the outlet is greater than the cross sectional area of the inlet.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: August 21, 2018
    Assignee: ROLLS-ROYCE plc
    Inventor: Daniel Clark
  • Patent number: 10040955
    Abstract: The invention relates to a method for removing a substrate that is coated with an organic coated coating by means of ionogenic gel formation. In said method, a wet or dry organic coating that has not yet formed a film on the substrate is treated with an aqueous solution of a metal salt from main group I in the periodic table of the elements, a complexing agent and/or a basic compound having a pH value >10.
    Type: Grant
    Filed: February 3, 2015
    Date of Patent: August 7, 2018
    Assignee: Chemetall GmbH
    Inventors: Ron Eilinghoff, Michael Schwamb, Daniel Wasserfallen, Vera Sotke, Aliaksandr Frenkel, Stephanie Gerold, Wolfgang Bremser, Martin Droll, Oliver Seewald, Evgenija Niesen-Warkentin, Lars Schachtsiek, Manuel Traut
  • Patent number: 10043682
    Abstract: Disclosed is an apparatus for treating a substrate. The apparatus includes a support unit that supports the substrate, and a treatment liquid supply unit that supplies a treatment liquid to the substrate, and the treatment liquid supply unit includes an injection unit that supplies the treatment liquid to the substrate supported by the support unit, a tank that accommodates the treatment liquid, a pipe connected to the tank, and a static electricity removing member that removes static electricity from the treatment liquid.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: August 7, 2018
    Assignee: Semes Co., Ltd.
    Inventors: Raetaek Oh, Hyunwoo Lee