Abstract: In a particle beam apparatus and a method for operating a particle beam apparatus, the particle beam apparatus has a column having a particle-beam optical system for generating a particle beam, to thereby expose a desired pattern in a vacuum sample chamber in an exposure operation. In a cleaning operation, a regulable gas stream having photodissociatable gas is fed to the column and/or the vacuum sample chamber via a gas-feed system. The photodissociation of the supplied gas is brought about in the cleaning operation with the aid of a plurality of light sources distributed spatially in the column and/or in the vacuum sample chamber. In the cleaning operation, individual light sources are able to be switched on and off selectively with respect to time via a control unit connected to the light sources, in order to clean individual elements in the column and/or in the vacuum sample chamber in targeted fashion.

Abstract: The invention relates to a method for treating surfaces of an electronic card (4) by means of a plasma torch (1), said card (4) comprising a plurality of electronic components (C1a, C1b, C1c, C2a, C2b, C3a) and a plurality of surfaces to be treated, arranged at various heights relative to a reference plane (Ref) of the electronic card (4). At least one region to be treated (Zn) containing the surfaces to be treated is determined, strata (S1, S2, S3) which are parallel to said reference plane (Ref) and each contain at least one surface to be treated are determined, and then a torch movement path is generated such that: the surfaces are treated, stratum by stratum; for each stratum, the torch is exclusively moved in parallel with the reference plane (Ref); during the projection of the plasma flow (2), each treated surface is exclusively placed in the ideal working zone (Pt).

Abstract: A method is provided for dry cleaning a plate used in an additive manufacturing process involving a powder. According to the method, unconsolidated powder is separated from a plate and collected by imposing vibrations on the plate and causing the plate to experience shocks.

Abstract: The present disclosure discloses a method and an apparatus for removing a conductive film. The method includes: providing a display panel with the conductive film to be removed; treating the conductive film to be removed on the display panel by using a laser; and cleaning the display panel after the treating by using the laser.

Abstract: The mobile non-destructive testing inspection system includes a mobile platform, a robotic arm mounted on the mobile platform, and an end effector for the robotic arm. The end effector includes a non-destructive testing (NDT) probe. As a non-limiting example, the NDT probe may be an eddy current testing probe. The mobile platform may be a robotic mobile platform under external control by a remote operator. The robotic arm is mounted on the mobile platform using a mounting plate, which is secured to an upper surface of the mobile platform, and includes a bracket or the like for attachment to a base of the robotic arm. The end effector is connected to an end connector of the robotic arm. The NDT probe of the end effector may be mounted on a support member, which may be selectively rotatable with respect to the end connector of the robotic arm.

Abstract: The invention provides an object (10), that during use is at least partly submerged in water, wherein the object (100) is selected from the group consisting of a vessel (1) and an infrastructural object (15), the object (10) further comprising an anti-biofouling system (200) comprising an UV emitting element (210), wherein the UV emitting element (210) is configured to irradiate with UV radiation (221) during an irradiation stage one or more of (i) a first part (111) of an external surface (11) of said object (10) and (ii) water adjacent to said first part (111) of said external surface (11) of said object (10), wherein the object (10) further comprises protruding elements (100) with the UV emitting element (210) configured between the protruding elements (100) and configured depressed relative to the protruding elements (100).

Abstract: In some embodiments, a method for cleaning a processing chamber is provided. The method may be performed by introducing a processing gas into a processing chamber that has a by-product disposed along sidewalls of the processing chamber. A plasma is generated from the processing gas using a radio frequency signal. A lower electrode is connected to a first electric potential. Concurrently, a bias voltage having a second electric potential is applied to a sidewall electrode to induce ion bombardment of the by-product, in which the second electric potential has a larger magnitude than the first electric potential. The processing gas is evacuated from the processing chamber.

Abstract: A part processing apparatus and method is disclosed that includes a media-blasting apparatus and a cleaning apparatus. The media-blasting apparatus is configured to blast a stream of media against a surface of a part, and the cleaning apparatus is configured to clean debris or particles from the surface of the part. The cleaning apparatus includes a first spray-and-wash unit, a first ultrasonic wash unit, a second ultrasonic wash unit, and a second spray-and-wash unit. The first ultrasonic wash unit is configured to ultrasonically vibrate a liquid in the first ultrasonic wash unit at a first frequency, and the second ultrasonic wash unit is configured to ultrasonically vibrate a liquid in the second ultrasonic wash unit at a second frequency. The first and second frequencies may be different from each other, such that vibration at the second frequency causes additional debris or particles to be removed from the surface of the part.

Abstract: An ultrasonic treatment apparatus including: an ultrasonic bath for performing an ultrasonic treatment on a treatment target object; a first ultrasonic vibrator provided on the front surface side of the treatment target object; and a second ultrasonic vibrator provided on the back surface side of the treatment target object; wherein the first ultrasonic vibrator does not face the second ultrasonic vibrator.

Abstract: A method and apparatus for disinfecting a lavatory inside a vehicle in response to a set of criteria being met. A determination is made as to whether a set of criteria for activation of a disinfection system that emits far-ultraviolet radiation to perform a disinfection process inside a lavatory has been met. In response to a determination that the set of criteria has been met, the disinfection system is activated to perform the disinfection process inside the lavatory using the far-ultraviolet radiation.

Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.

Abstract: Steam assisted gravity drainage (SAGD) equipment including steam generating equipment may be cleaned using supercritical carbon dioxide. Supercritical carbon dioxide is a fluid state of carbon dioxide where it is held at or above its critical temperature and critical pressure. Supercritical carbon dioxide has exceptional solvent qualities that can dissolve, soften, or dislodge the refractory fouling deposits in the SAGD equipment.

Abstract: A system and method for treating a substrate is described. In particular, the system and method for treating a substrate include techniques for removing particles from the surface of a microelectronic substrate. The system includes: a vacuum process chamber; a substrate stage for supporting a microelectronic substrate within the vacuum process chamber; a cryogenic fluid supply system that can provide a fluid or fluid mixture through one or more nozzles arranged within the vacuum process chamber to inject a fluid spray into the process chamber in a direction towards an upper surface of the microelectronic substrate; and a process monitoring system coupled to the vacuum process chamber, and arranged to collect fluid spray data corresponding to at least one measured attribute of the injected fluid spray downstream of an exit of the one or more nozzles.

Abstract: An apparatus and a method for forming a leveled surface of at least one pasty mass in a mold are described. Thereby, the mold is particularly adapted to mold lipstick mines, wherein the mold was filled with the pasty mass and the pasty mass was at least partially cooled in the mold. The apparatus comprises a means for at least partially melting the surface of the at least one cooled pasty mass in the mold to level the surface by heat introduction, wherein the heat introduction takes place via focused optical photo emission.

Abstract: A low volume showerhead in a semiconductor processing apparatus can include a porous baffle to improve the flow uniformity and purge time during atomic layer deposition. The showerhead can include a plenum volume, one or more gas inlets in fluid communication with the plenum volume, a faceplate including a plurality of first through-holes for distributing gas onto a substrate in the semiconductor processing apparatus, and a porous baffle positioned in a region between the plenum volume and the one or more gas inlets. The one or more gas inlets can include a stem having a small volume to improve purge time. The baffle can be porous and positioned between the stem and the plenum volume to improve flow uniformity and avoid jetting.

Abstract: A downhole production assembly includes a downhole pump that can be positioned at a downhole location in a wellbore, and a cavitation chamber located upstream of an inlet of the downhole pump in the wellbore. The cavitation chamber can induce cavitation in a wellbore fluid pumped in the uphole direction by the downhole pump to prevent scaling on the downhole pump.

Abstract: An optical cap that protects a camera lens of the inspection assembly is disclosed herein. The disclosed optical cap for an inspection assembly may include an optically clear dome-shaped window element and a metal collar attached to the window element, the collar including means for securing the optical cap to said inspection assembly, wherein the collar is bonded to the window element by means of brazing or welding.

Abstract: A cleaning apparatus and a cleaning method are provided. The cleaning apparatus is used for removing a residue on a substrate, and includes: a deformable device arranged on the substrate; and an excitation device configured to generate an excitation source for the deformable device, so as to enable the deformable device to be deformed under the effect of the excitation source, thereby to drive the substrate to vibrate and enable the residue to fall off from the substrate.

Abstract: The present technology is directed to fluid filtration systems having enhanced momentum cleaning devices for filter belts and associated systems and methods. In some embodiments, for example, a filtering system includes a fluid channel having a continuous-loop filter belt positioned therein. The filter belt can be configured to trap contaminants while allowing fluid to pass through the filter belt. The system further includes a first cleaning device proximate to the filter belt and a second cleaning device proximate to the filter belt and downstream of the first cleaning device. In particular embodiments the first cleaning device is a scraping blade that presses against the filter belt and the second cleaning device is one of a wave form, vibrational, or mixed-phase stream energy delivery device.

Abstract: A system for cleaning an object may include an acoustic device configured to deliver acoustic waves to the object, a cleaning medium dispenser configured to deliver a cleaning medium to a surface of the object, a rinsing medium dispenser configured to deliver a rinsing medium to the surface, a vacuum configured to deliver a vacuum airflow proximate the surface, wherein the acoustic waves generate acoustic vibrations in the object to dislodge debris from the surface, acoustically treat the cleaning medium and the rinsing medium, and atomize the cleaning medium, the debris collected by the cleaning medium and the rinsing medium.

Abstract: A roller brush bed and a fluid delivery system are provided. The fluid deliver system includes a fluid source, a fluid supply tube connected to the fluid source, a movable fluid delivery bar in fluid communication with the fluid supply tube and a drive system attached to the movable fluid delivery bar and configured to move the movable fluid delivery bar relative to the at least one roller brush and along the roller brush bed, wherein the movable fluid delivery bar is configured to spray fluid toward the at least one roller brush as the movable fluid delivery bar is moved along the roller brush bed.

Abstract: A door assembly for a horizontal axis washing machine includes a door rotatably mounted to a front panel to permit selective access to an opening of the washing machine appliance. A sub-door is rotatably mounted to the door and is movable between an open position and a closed position. The sub-door defines a pretreat basin for collecting wash fluid from a wash fluid supply when the sub-door is in the open position for pretreating an article of clothing. After the pretreatment procedure is complete, the sub-door may be pivoted toward the closed position such that the article of clothing and the collected wash fluid are passed directly into the tub through a door opening and drain conduit.

Abstract: Disclosed is a thin film type solar cell which prevents short circuit from occurring between a first electrode and a second electrode due to a burr produced in a separation part, thereby preventing an output from being reduced. The thin film type solar cell includes a substrate, a first electrode disposed over the substrate and being apart from an adjacent first electrode by a first separation part, a semiconductor layer disposed over the first electrode and being apart from an adjacent semiconductor layer by a contact part and a second separation part, and a second electrode disposed over the semiconductor layer and being apart from an adjacent second electrode by the second separation part. The semiconductor layer contacts the substrate through the first separation part, and the second electrode contacts the first electrode through the contact part. A height of a burr produced in the second separation part is lower than a height between the first electrode and the second electrode.

Abstract: A method performed by a film deposition apparatus including a process chamber and a rotary table that is disposed in the process chamber and includes a substrate-mounting surface on which a substrate is placeable. The method includes a first cleaning process of supplying a cleaning gas from above the substrate-mounting surface of the rotary table while rotating the rotary table in a first cleaning position, and a second cleaning process of supplying the cleaning gas from above the substrate-mounting surface of the rotary table while rotating the rotary table in a second cleaning position that is lower than the first cleaning position.

Abstract: The present invention provides DMSO-containing foamable formulations, methods for preparation, and methods of treatment. The formulations can provide good permeability and bioavailability at the target site. Preferably, the formulations are useful for treating osteoarthritis. In one embodiment, the invention provides a foamable formulation for topical use, said formulation comprising DMSO, polyalkylene glycol alkyl ether, an active agent, a monohydric lower alcohol, a diol, and water. Preferably, the active agent is a non-steroidal anti-inflammatory drug, such as diclofenac sodium or ibuprofen.

Abstract: A disinfecting system includes a housing. An ultraviolet light (UV) source is secured to the housing and configured to emit UV light for disinfection of a target. A processor is secured to the housing in communication with the UV light source. The processor is configured to activate the UV light source for a selected amount of time suitable for disinfection of the target.

Abstract: The present disclosure relates to a method and apparatus for cleaning a 3D printed article, in particular a 3D printed heat exchanger. After 3D printing, an article may have internal passages formed from bonded powder and said passages may contain unbonded powder that needs to be removed before further use of/processing of the article. To remove this unbonded powder, the article is filled with a cleaning fluid and vibrated. The cleaning fluid is then pumped out of the article and past a sensor that generates a magnetic field. The sensor detects the presence of powder particles in the fluid by detecting a perturbation of the magnetic field caused by said particles. The fluid is then filtered and returned to a reservoir for use. The sensor may indicate the article is sufficiently clean when a detected concentration of particles in the fluid drops below a threshold.

Abstract: The invention relates to a method for determining the thickness of a contaminating layer and/or the type of a contaminating material on a surface (7) in an optical system, in particular on a surface (7) in an EUV lithography system, comprising: irradiating the surface (7) on which plasmonic nanoparticles (8a,b) are formed with measurement radiation (10), detecting the measurement radiation (10a) scattered at the plasmonic nanoparticles (8a,b), and determining the thickness of the contaminating layer and/or the type of the contaminating material on the basis of the detected measurement radiation (10a). The invention also relates to an optical element (1) for reflecting EUV radiation (4), and to an EUV lithography system.

Abstract: Disclosed herein is a method. The method includes applying a fluid to a perforated upper layer. The perforated upper layer forms an exposed surface of a multi-layer structure. The method also includes allowing the fluid to pass through the perforated upper layer and contact a contaminant within a core layer of the multi-layer structure. The core layer is disposed beneath the perforated upper layer, opposite the expose surface, and is coupled to the perforated upper layer. The method also includes applying ultrasonic energy to the exposed surface of the multi-layer structure using an ultrasonic generator to loosen the contaminant into the fluid. The method also includes removing the fluid with the loosened contaminant from the multi-layer structure.

Abstract: The invention relates to a method for cleaning of indoor or outdoor areas by operating a dirt stop surface, comprising the steps of dividing the dirt stop surface (1) into surface units (4), dispensing a fluid flow on the surface to be cleaned, while the proximity of the surface to be cleaned is sensed separately for each surface unit (4), and the fluid is dispensed from the surface units (4) of the dirt stop surface in a selective manner such that only the surface units (4) in the proximity of which the presence of the surface to be cleaned has been sensed are applied for dispensing the fluid. The invention relates further to a dirt stop surface unit and a dirt stop surface assembled therefrom that is capable of carrying out the method.

Abstract: A dish washing machine having a structure allowing wash water to be evenly sprayed into a washing tub. The dish washing machine includes a cabinet forming an external appearance of the dish washing machine, a washing tub arranged in the cabinet and allowing dishes to be washed therein, a dish basket arranged in the washing tub to accommodate the dishes, a spray unit to spray wash water into the washing tub, a diversion unit arranged inside a flow passage of wash water to divert the wash water sprayed from the spray unit, and a guide member coupled to one side of the diversion unit to allow the diversion unit to move within the washing tub. As the spray unit and the diversion unit are provided, a dead zone which wash water does not reach may be eliminated, and divided and intensive washing may be implemented in the washing tub.

Abstract: A lens structure system. The system comprises a lens structure and a multi-segmented transducer coupled to the lens structure. The multi-segmented transducer comprises a plurality of segments. For each segment in the plurality of segments, there also is a first conductor and a second conductor electrically coupled to the segment.

Abstract: A method of producing a hot-stamped article includes: a forming process of heating a galvanized steel sheet (1) on which a galvanized layer (12) is formed and forming the heated galvanized steel sheet (1) by hot stamping; a removal process of irradiating, after the forming step, an oxide film (13) formed on a surface of the galvanized layer (12) with laser light to remove the oxide film (13); and a coating process of performing, after the removal process, a coating treatment on the galvanized steel sheet (1) formed by hot stamping.

Abstract: A method for cleaning a process chamber of a processing apparatus including the process chamber and a gas supply mechanism. The gas supply mechanism includes a flow splitter, a first flow path communicating with an upstream end of the flow splitter, a first valve provided in the first flow path, a second flow path communicating with a downstream end of the flow splitter and connected to the process chamber, a second valve provided in the second flow path, a bypass flow path connecting the first flow path and the second flow path, and a bypass valve provided in the bypass flow path. The method includes a step of closing the first valve and the second valve and opening the bypass valve, and a step of cleaning the process chamber by introducing a gas through the bypass flow path into the process chamber after opening the bypass valve.

Abstract: A method of installing a fixture or bracket in a fuselage structure of an aircraft or spacecraft. The method includes arranging an apparatus in, on or adjacent the structure, pre-treating a surface region of the structure by heat ablation using the apparatus and forming the fixture in situ on the structure at the pre-treated surface region using the apparatus based on a digital model of the fixture. The fixture is installed by connecting the fixture to the structure at the pre-treated surface region as the fixture is formed.

Abstract: A spherical-confocal-split array with dual frequency of fundamental and harmonic superimposition includes: array elements which are spherically confocal, whose quantity is an even number, wherein a half of the array elements operate with a lower frequency, and the other half of the array elements operate with a higher frequency; both the lower frequency and the higher frequency are MHz high-frequencies; each of the array elements corresponds to a frequency drive; array element beams don't superimpose outside the focal region; each of the array elements is connected to a channel amplifier (3) through corresponding impedance matching (2); and a multi-channel waveform controller (4) is connected to the channel amplifier (3) for controlling amplitudes and phases of all channels. The dual-frequency spherical sectorial split array is able to generate split multi-foci of the focal plane with the dual frequencies; and control strong interference of transient cavitation clouds at the adjacent foci.

Abstract: The present invention relates to a method of, and an apparatus for, rinsing materialographic samples. The method includes the steps of: arranging one or more materialographic samples in a sample holder; connecting the sample holder (10) to a rotation head of a rinsing device; placing the sample holder connected to the rotation head in the vessel of the rinsing device; rotating the sample holder relative to the vessel; filling the vessel with a rinsing liquid; and subjecting the materialographic samples in the sample holder to ultrasonic waves.

Abstract: An accessory drive device includes a housing, a fluid inlet, a fluid outlet, a drive mechanism, and an output drive member. The output drive member may be driven by the drive mechanism and engage with an input drive member on a transmission mechanism of a surgical instrument. The drive mechanism may be configured to be driven by a motive force produced by fluid flowing through the housing from the inlet to the outlet, with the fluid being delivered by a fluid source of a reprocessing device. A portable, accessory drive device for a surgical instrument includes a portable housing to be removably coupled to a transmission mechanism of an instrument and a drive mechanism to drive an input drive member of the transmission mechanism. A method of reprocessing a surgical instrument includes converting a force associated with a flow of fluid for reprocessing to drive an instrument input drive member.

Abstract: A cleaning device is provided with a three-dimensional circulation route for circulating workpiece holding tools that hold a workpiece, and this three-dimensional circulation route is formed by an endless conveyor chain bendable in various directions being disposed within a rectangular parallelepiped space following along the upper and lower sides thereof. The conveyor chain circulates from an upper side horizontal transport path portion via a falling side transport path portion, a lower side horizontal transport path portion, and a rising side transport path portion, and the workpiece held in the workpiece holding tools is treated by ultrasonic cleaning, shower cleaning, steam cleaning, drying and the like. Thus, it is possible to suitably dispose a workpiece transport route in a limited rectangular parallelepiped space, and carry out cleaning operations for the workpiece efficiently.

Abstract: A method and apparatus for reproducing a component of a semiconductor manufacturing apparatus, and a reproduced component are provided. The method may include a preparing step of preparing a damaged component of a semiconductor manufacturing apparatus, a first cleaning step of cleaning the damaged component, a masking step of masking at least one of areas including an undamaged part of the damaged component, a reproduced part forming step of forming a reproduced part on the damaged component using a chemical vapor deposition (CVD), a post-grinding step of grinding the damaged component with the reproduced part, and a second cleaning step of cleaning the damaged component with the reproduced part.

Abstract: A physical vapor deposition (PVD) target that includes a body composed of material that is reactive with an oxygen containing atmosphere; and a non-reactive cap layer encapsulating at least a sputter surface of the body. The non-reactive cap layer is a barrier obstructing the diffusion of oxygen containing species to the body of the PVD target.

Abstract: A method and a dishwasher utilize a dock detection system to determine when a connector of a spray device is docked to a docking port provided on a manifold of the dishwasher. A dock detector is coupled to the docking port and is electrically coupled to a controller of the dishwasher through electrical conductors that extend along the manifold, thereby enabling a dishwasher controller to detect when spray devices are coupled to the manifold, e.g., to optimize a wash cycle to use a particular spray device docked to the docking port.

Abstract: The rate of rod fallover in the production of polycrystalline silicon by the Siemens process is sharply reduced by cleaning the Siemens reactor base plate by at least a two-step procedure comprising suctioning the base plate in one step, and subsequently cleaning with liquid or solid cleaning medium in a second step, between each phase of rod removal and new support body installation.

Abstract: This invention provides systems and methods for treating electrodes used in batteries and electrochemical cells upon battery/cell shutdown and prior to battery standby mode. Systems and methods of this invention are directed toward the use of aerosol to treat the electrode and to protect the electrode and/or the environment from undesired reactions.

Abstract: The invention features methods and apparatuses for thermally regulating a laser processing head. A thermal regulation device includes a body shaped to matingly engage a laser processing nozzle and to define a fluid flow boundary of a liquid flow passage between the body and an exterior surface of the laser processing nozzle when the thermal regulation device is affixed to the laser processing nozzle. The thermal regulation device also includes an inlet formed in a first end of the body and configured to provide liquid to the liquid flow passage, the liquid remaining external to an exterior surface of the laser processing nozzle. The thermal regulation device also includes an outlet formed in a second end of the body opposite the first end. The outlet is configured to exhaust liquid from the liquid flow passage.

Abstract: Systems and methods of producing a solid fuel composition are disclosed. In particular, systems and methods for producing a solid fuel composition by heating and mixing a solid waste mixture below atmospheric pressure to a maximum temperature sufficient to melt the mixed plastics within the solid waste mixture is disclosed.

Abstract: A substrate processing method includes a substrate holding step of horizontally holding a substrate, a substrate rotating step of rotating the substrate held horizontally around a rotational axis along a vertical direction, a liquid-film forming step of forming a liquid film of a first organic solvent that is used to process an upper surface of the substrate on the upper surface of the substrate by supplying the first organic solvent to the upper surface of the substrate held horizontally, a vapor supplying step of supplying a vapor of a second organic solvent to a space between a facing surface of a heater unit that has the facing surface facing a lower surface of the substrate held horizontally and the lower surface of the substrate, a substrate heating step of heating the substrate being in a rotational state by means of the vapor of the second organic solvent in parallel with the substrate rotating step and the liquid-film forming step, and a substrate drying step of, after the substrate heating step, exc

Abstract: A device for keeping jellyfish and other plankton in an aquarium having a drain and a pump, the device having a panel; a first sprayer connectable to the pump and coupled to the panel at a first position, the first sprayer having a plurality of channels or holes for generating a plurality of water streams; and a second sprayer connectable to the pump and coupled to the panel at a second position, the second sprayer having a plurality of channels or holes for generating a plurality of water streams; wherein the insert is configured so that the first sprayer and the second sprayer create a rotating current within the aquarium.

Abstract: A radiation source apparatus is provided. The radiation source apparatus includes a chamber, a target droplet generator, an exhaust module, a measuring device, and a controller. The target droplet generator is configured to provide a plurality of target droplets to the chamber. The exhaust module is configured to extract debris corresponding to the target droplets out of the chamber according to a first gas flow rate. The measuring device is configured to measure concentration of the debris in the chamber. The controller is configured to adjust the first gas flow rate according to the measured concentration of the debris.

Abstract: An apparatus and method for processing substrates. The method includes positioning a substrate within a processing chamber of a substrate processing system. The substrate includes a layer of a carbon-containing material on a working surface of the substrate. The method also includes receiving hydrogen peroxide vapor in a vapor treatment region of the substrate processing system, generating hydroxyl radical vapor by treating the hydrogen peroxide vapor in the vapor treatment region, and directing the hydroxyl radical vapor and remaining hydrogen peroxide vapor to the working surface of the substrate causing the carbon-containing material to be chemically modified.