Abstract: Provided is a cleaning agent composition for use in an adhesion process for applying an adhesive to a surface of a first member subjected to a dry treatment without a primer, and adhering a second member to the surface of the first member. The cleaning agent comprises a compound (A) having a (meth)acryloyl group and a liquid (B) having a boiling point of not higher than 200° C.

Abstract: An apparatus for removing particles from a clamp, the apparatus being arrangeable in proximity of the clamp and comprising an insulating portion, a supporting portion, at least a part or all of the insulating portion being arranged on the supporting portion, wherein the supporting portion is configured such that when a voltage is applied to the supporting portion of the apparatus and/or to an electrode of the clamp, the supporting portion acts as an electrode to allow an electric field to be generated between the apparatus and the clamp for removal of the particles from the clamp.

Abstract: An optical waveguide structure includes an optical waveguide, a reflection film provided on the optical waveguide and reflecting a light propagating in the optical waveguide, a metal film provided on the reflection film, and a surface oxidized film provided on the metal film and generated by surface oxidation of the metal film.

Abstract: A semiconductor fabrication apparatus includes a processing chamber; a wafer stage configured in the processing chamber; and a chemical delivery mechanism configured in the processing chamber to provide a chemical to a reaction zone in the processing chamber. The chemical delivery mechanism includes an edge chemical injector, a first radial chemical injector, and a second radial chemical injector configured on three sides of the reaction zone.

Abstract: Materials and methods for degrading a microcystin compound, and filtering microcystin from water, are described.

Abstract: Photoactive cleaning hearing assistance devices and methods of cleaning hearing assistance devices are described. Photoactive nanoparticles may be disposed on or in the hearing assistance devices. The photoactive nanoparticles provide a localized surface plasmon resonance effect when illuminated with light.

Abstract: A wire and a stripping method thereof, and a light strip are provided. The stripping method includes the following steps: holding a wire by a holder, the wire including an insulation layer and a conductor covered by the insulation layer; mounting the holder on a worktable of a an optical device; and activating a light emitter of the optical device to emit a light beam irradiating onto the insulation layer to ablate a portion of the insulation layer to form at least one through hole that penetrates the insulation layer to expose a portion of the conductor.

Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged par

Abstract: A magnet extension, magnetic test assembly, and probe card assembly includes a magnet having a first end and a second end, the first end of the magnet being geometrically configured to provide a selected magnetic field. A resilient member 5 is disposed around the magnet between the first end and the second end. A retaining member is disposed between the first end and the second end. The retaining member surrounds at least a portion of the resilient member.

Abstract: A method for treating a substrate includes a substrate treating step of treating the substrate by dispensing a treating liquid onto the substrate supported on a support plate in a processing space of a processing vessel and a vessel cleaning step of cleaning the processing vessel by dispensing a cleaning solution onto a jig supported on the rotating support plate. In the vessel cleaning step, the jig is located such that the center of the jig is offset from the center of the support plate.

Abstract: The present disclosure provides a method for cleaning a lanthanum gallium silicate wafer which comprises the following steps: at a step of 1, a cleaning solution constituted of phosphorous acid, hydrogen peroxide and deionized water is utilized to clean the lanthanum gallium silicate wafer with a megahertz sound wave; at a step of 2, the cleaned lanthanum gallium silicate wafer is rinsed and dried by spinning; at a step of 3, a cleaning solution constituted of ammonia, hydrogen peroxide and deionized water is utilized to clean the lanthanum gallium silicate wafer with the megahertz sound wave; at a step of 4, the cleaned lanthanum gallium silicate wafer is rinsed and dried by spinning; and at a step of 5, the rinsed and dried wafer is placed in an oven to be baked.

Abstract: Provided is a production method for a film laminate by which a tough film can be bonded to a brittle film while the breakage of the brittle film is prevented. The production method for a film laminate of the present invention includes bonding a tough film having an elongated shape to a brittle film having an elongated shape while conveying the brittle film, wherein the method includes bonding the tough film and the brittle film to each other by bringing the tough film close to the brittle film, followed by blowing of a gas from a side of the tough film opposite to the brittle film.

Abstract: Disclosed is a method of cleaning a substrate processing apparatus in which a substrate having a surface wet by a liquid is brought into contact with a supercritical fluid so as to perform a drying process of drying the substrate. The method includes a cleaning gas filling process and an exhausting process. The cleaning gas filling process fills a cleaning gas containing isopropyl alcohol in the substrate processing apparatus. The exhausting process exhausts the cleaning gas from an inside of the substrate processing apparatus after the cleaning gas filling process.

Abstract: Disclosed is a laser beam processing device, the main part of which is a coupling device (1) for coupling a focused laser beam (2) into a fluid jet (3) of a defined cross-section. The coupling device (1) comprises a housing (4), in which a fluid nozzle is configured for forming the fluid jet (3). In addition, an outlet opening (6) is provided in the housing, through which the fluid jet (3) exits from the housing (4) and the cross-section of which is larger than the cross-section of the fluid jet (3). A passage chamber is provided between the fluid nozzle (5) and the outlet opening (6) for the fluid jet (3).

Abstract: A water treatment equipment includes a reaction chamber, a waveform generator, and a controller. The reaction chamber includes a pipe having a first electrode and a second electrode. The first and second electrodes are coupled to a waveform generator. The reaction chamber includes a water inlet, and a water outlet. The waveform generator is coupled to the first and second electrodes. The waveform generator is configured to generate an electrical current with a frequency that is substantially equal to the electrical resonance of the pipe of the reaction chamber. The controller is configured to control the waveform generator, wherein the reaction chamber is configured to enable a flow of ozone and water to be treated through the pipe.

Abstract: A processing apparatus includes: a holding unit that holds a workpiece; a processing mechanism that processes the workpiece held by the holding unit; a processing liquid supplying mechanism that supplies a processing liquid containing an oxidizing agent to at least the workpiece held by the holding unit at the time of processing the workpiece by the processing means; a processing waste liquid recovery section that recovers a processing waste liquid containing the processing liquid supplied from the processing liquid supplying mechanism to the workpiece; a discharge passage through which the processing waste liquid is discharged from the processing waste liquid recovery section to the outside of the processing apparatus; and a waste liquid treatment mechanism that is disposed in the discharge passage and that decomposes the processing liquid contained in the processing waste liquid while the processing waste liquid flows through the discharge passage.

Abstract: The present disclosure generally relates to methods and apparatuses for additive manufacturing (AM) that utilize compression chambers to reduce pressure on grown objects. In one aspect, the disclosure provides a method for fabricating an object. The method includes (a) irradiating a layer of powder in a build area above a build platform to form a fused region; (b) providing a subsequent layer of powder over the build area; and (c) repeating steps (a) and (b) until at least a portion of the object, at least one chamber, and a tube are formed in the build area. The chamber encloses a region of unfused powder and the tube extends from a passage within the build platform to the chamber. The method also includes (d) removing unfused powder from within the chamber via the tube and the passage. The disclosure also provides an apparatus for forming compression chambers within an object.

Abstract: Provided is an endless metal ring manufacturing method for manufacturing an endless metal ring by carrying out a barrel polishing step for polishing the endless metal ring by using a barrel of a resin material, a rolling step for rolling the endless metal ring which was cleaned, and a nitriding step for nitriding the endless metal ring which was rolled, wherein after the barrel polishing step and before the rolling step, provided is a resin removing step for removing resin that has adhered to the endless metal ring.

Abstract: Embodiments described herein generally relate to methods of depositing thin films and, more particularly, to depositing metal thin films. The methods herein provide a nucleation free conversion (NFC) approach which involves forming an amorphous silicon layer over the dielectric layer, and performing an NFC process which acts to convert the amorphous silicon layer into a thin metal film. In some embodiments, the NFC process is performed multiple times until the resulting thin metal film is continuous. A bulk metal is formed over the thin metal film.

Abstract: Controllable electromechanical adhesive devices including three-dimensional dielectrically-coated microstructures that are mechanically compliant are provided. The microstructures can be controlled to provide tunable electromechanical surface adhesion, allowing for dexterous gripping of microscale and/or macroscale objects. For example, the devices can tune the surface adhesion strength of one or more microstructures without complex mechanical actuation in a wide range of on/off ratios with low voltage. The devices can be configured as a force sensor capable of providing tactile feedback for determining the load applied against the microstructures by the surface of an object. For example, the devices can provide output indicative of changes in an electrical property of one or more microstructures for determining the applied load of an object. The devices can be pixelated or otherwise configured to provide localized force sensing and/or surface adhesion.

Abstract: A surface side is irradiated with an SF6 gas plasma to etch a semiconductor wafer which has been peeled off in street portions, and divide the semiconductor wafer into a plurality of individual semiconductor chips. A removing agent is subsequently supplied from the surface side. At that time, it is preferable that the semiconductor wafer divided into the plurality of chips is rotated at high speed. Accordingly, a mask material layer remaining on the surface is removed by the removing agent. Moreover, the removing agent is preferably an organic solvent, and more preferably, methyl ethyl ketone, ethanol, and ethyl acetate, or a combination of these.

Abstract: A laser machining apparatus that allows efficient machining of a workpiece includes a nozzle for jetting a jet liquid column, a rectifying chamber attenuating disturbances in flow of liquid, a liquid oscillating chamber guiding the liquid flowing from the rectifying chamber to a nozzle inlet opening, a laser oscillator generating a laser beam, a focusing optical system focusing the laser beam generated by the laser oscillator above the nozzle inlet opening so that the laser beam is guided by the jet liquid column, and a window opposed to the nozzle inlet opening so that the laser beam transmitting from the focusing optical system enters the liquid oscillating chamber. The liquid oscillating chamber increases a surface wave on an outer surface of the jet liquid column so that the jet liquid column jetted from the nozzle onto a workpiece is easily atomized at a machining point.

Abstract: The invention provides a light guide element (1300) comprising a light guide (300), wherein the light guide (300) in comprises a first light guide face (301) and a second light guide face (302) with UV radiation transmissive light guide material (305) between the first light guide face (301) and the second light guide face (302), wherein the light guide element (1300) further comprises one or more of: (i) a first layer element (30) in contact with the first light guide face (301), wherein the first layer element (30) is transmissive for UV radiation; and (ii) a second layer element (130) in contact with the second light guide face (301), wherein the second layer element (130) has one or more functionalities selected from the group consisting of (a) reflective for UV radiation, (b) adhesive for adhering the light guide (300) to an object, (c) reinforcing the light guide element (1300), and (d) protective for the light guide (300).

Abstract: A method for removing a coating of a surface of a wheel. The wheel is provided with screw channels and with a centrally positioned hub opening. Each of the screw channels and the central opening is delimited by an area from which the coating is to be removed. Each of the areas extends annularly around one of the screw channels or around the hub opening. The method is implemented using a laser beam generated by a laser source. The method comprises the steps of positioning an extraction opening directly beneath a center of one of the screw channels or the central opening surrounded by the area, moving the laser beam over the area without masking the area (7) from which the coating is to be removed, and extracting gases and particles produced during the step of removing the coating directly through one of the screw channels or the central opening.

Abstract: Methods are disclosed that illuminate etch solutions to provide controlled etching of materials. An etch solution (e.g., gaseous, liquid, or combination thereof) with a first level of reactants is applied to the surface of a material to be etched. The etch solution is illuminated to cause the etch solution to have a second level of reactants that is greater than the first level. The surface of the material is modified (e.g., oxidized) with the illuminated etch solution, and the modified layer of material is removed. The exposing and removing can be repeated or cycled to etch the material. Further, for oxidation/dissolution embodiments the oxidation and dissolution can occur simultaneously, and the oxidation rate can be greater than the dissolution rate. The material can be a polycrystalline material, a polycrystalline metal, and/or other material. One etch solution can include hydrogen peroxide that is illuminated to form hydroxyl radicals.

Abstract: A method for reducing level of contaminants from an object, the method comprises introducing the object into an ultrasonic (US) bath carrying an aqueous medium that holds, suspended therein, insoluble nanoparticles and activating said bath to apply US waves only said object while the object is at least partially submerged within said aqueous medium.

Abstract: A shielded containment cabinet device for use for the cleaning under high visibility and high protection for user, while using reduction flow pressurized water for cleaning of materials.

Abstract: Methods and systems are provided which project germicidal light from a lamp toward an individual donned in outerwear to disinfect the outerwear. In specific embodiments, germicidal light is projected toward an individual situated greater than approximately 1 foot from the light source. Some systems include sensor/s for detecting presence of an individual within a target area a set distance from the disinfection apparatus comprising the light source and program instructions for commencing operation of the disinfection apparatus based on information from the sensor/s. In addition or alternatively, some systems include reflective panel/s exhibiting greater than approximately 85% reflectance.

Abstract: Disclosed is an apparatus and method for providing asymmetric oscillations to a container. The container may include a fluid, a particle, and/or a gas. A vibration driver attached to the container provides asymmetric oscillations. A controller connected to the vibration driver controls an amplitude, frequency, and shape of the asymmetric oscillations. An amplifier amplifies the asymmetric oscillations in response to the controller. A sensor disposed on the vibration driver provides feedback to the controller.

Abstract: A method of driving a vibration device including a light-transmitting body and a piezoelectric element connected to the light-transmitting body is provided to vibrate the light-transmitting body. The method atomizes and removes liquid drops sticking to the light-transmitting body. A driving voltage to vibrate the piezoelectric element is swept at a sweep speed in a range of about 1 Hz to about 50 Hz so as to sweep a vibration frequency of the piezoelectric element to cover a frequency range including both of a resonant frequency of the light-transmitting body without liquid drops sticking to the light-transmitting body and a resonant frequency of the light-transmitting body with the liquid drops sticking to the light-transmitting body.

Abstract: An appliance and method utilize a context-sensitive fixed-position user interface including cycle type controls used to select a cycle type and cycle configuration controls used to configure settings associated with particular cycle types. Indicators of the cycle type and cycle configuration controls are selectively set to active or inactive states during cycle type selection and cycle configuration phases to facilitate user configuration of settings for the appliance prior to performing an appliance cycle.

Abstract: An apparatus for finishing a component includes at least one articulating arm, at least one plasma gun disposed at an end of a first articulating arm of the at least one articulating arm, at least one shot peen nozzle maintained in a fixed positioned relative to the plasma gun, and a controller controllably coupled to the articulating arm such that output signals from the controller control motions of the articulating arm.

Abstract: An ion beam device according to the present invention suppresses the fluctuation of an ion emission current by cleaning the inside of a chamber without entailing wear damage to an emitter electrode. The ion beam device includes a GFIS including an emitter electrode having a needle-shaped tip; an extraction electrode having an opening at a position spaced apart from the tip of the emitter electrode; and a chamber encapsulating the emitter electrode therein. The GFIS includes an ionizable gas introduction path for introducing an ionizable gas into the chamber in a state where a voltage equal to or more than a beam generating voltage is applied to the emitter electrode; and a cleaning gas introduction path for introducing a cleaning gas into the chamber in either a state where a voltage less than the beam generating voltage is applied to the emitter electrode or a state where no voltage is applied to the emitter electrode.

Abstract: A method of removing material from a surface of a workpiece includes discharging a flow of fluid towards a workpiece at a pressure and a flow rate that facilitates forming a plurality of cavitation bubbles, and introducing abrasive media. The method includes exciting the abrasive media with the cavitation bubbles, removing material from the workpiece by an interaction between the cavitation bubbles and the abrasive media, and the surface of the workpiece.

Abstract: Systems and methods for cleaning a substrate include a combined treatment of hydrogen peroxide and ultraviolet (UV) irradiation. Specific embodiments include the direct irradiation with 185/254 nm UV of a spinning substrate immersed under a liquid film of dilute hydrogen peroxide solution. Such a cleaning treatment can result in about a 100% improvement of TiN strip rate compared to processing with the same hydrogen peroxide solution without UV exposure. Such method can also be executed at room temperature and still provide improved cleaning efficiency.

Abstract: Disclosed are a de-icing device for a solar panel and a method of operating the same. The de-icing device for the solar panel and the method of operating the same include a sensor unit, a power supply unit, a switching unit, and a control unit, so that it is possible to provide a high-efficiency de-icing device for the solar panel in which snow deposited on the solar penal may be dissolved by applying a reverse current to the solar panel. In addition, it is possible to provide a high-efficiency and high-precision de-icing device for the solar panel in which solar power generation and de-icing may be simultaneously performed and the amount of the reverse current may be controlled.

Abstract: A cleaning apparatus for concentration controller of coating machine may include a pulse bubble generator and a container used for cleaning a concentration controller of a coating machine and a tube thereof. The pulse bubble generator has a bubble-generating end connected to the container through a pipe, and the container is filled with a plentiful detergent. The pulse bubble generator is configured to pump air into the detergent with a pulse per time, and a large amount of detergent bubbles are adapted to be generated in the container. The detergent bubbles are configured to be pumped by the concentration controller into the tube and the concentration controller so as to complete cleaning effect of the tube and the concentration controller.

Abstract: The invention relates to a method for treating surfaces of an electronic card (4) by means of a plasma torch (1), said card (4) comprising a plurality of electronic components (C1a, C1b, C1c, C2a, C2b, C3a) and a plurality of surfaces to be treated, arranged at various heights relative to a reference plane (Ref) of the electronic card (4). At least one region to be treated (Zn) containing the surfaces to be treated is determined, strata (S1, S2, S3) which are parallel to said reference plane (Ref) and each contain at least one surface to be treated are determined, and then a torch movement path is generated such that: the surfaces are treated, stratum by stratum; for each stratum, the torch is exclusively moved in parallel with the reference plane (Ref); during the projection of the plasma flow (2), each treated surface is exclusively placed in the ideal working zone (Pt).

Abstract: In a particle beam apparatus and a method for operating a particle beam apparatus, the particle beam apparatus has a column having a particle-beam optical system for generating a particle beam, to thereby expose a desired pattern in a vacuum sample chamber in an exposure operation. In a cleaning operation, a regulable gas stream having photodissociatable gas is fed to the column and/or the vacuum sample chamber via a gas-feed system. The photodissociation of the supplied gas is brought about in the cleaning operation with the aid of a plurality of light sources distributed spatially in the column and/or in the vacuum sample chamber. In the cleaning operation, individual light sources are able to be switched on and off selectively with respect to time via a control unit connected to the light sources, in order to clean individual elements in the column and/or in the vacuum sample chamber in targeted fashion.

Abstract: A method is provided for dry cleaning a plate used in an additive manufacturing process involving a powder. According to the method, unconsolidated powder is separated from a plate and collected by imposing vibrations on the plate and causing the plate to experience shocks.

Abstract: The present disclosure discloses a method and an apparatus for removing a conductive film. The method includes: providing a display panel with the conductive film to be removed; treating the conductive film to be removed on the display panel by using a laser; and cleaning the display panel after the treating by using the laser.

Abstract: The mobile non-destructive testing inspection system includes a mobile platform, a robotic arm mounted on the mobile platform, and an end effector for the robotic arm. The end effector includes a non-destructive testing (NDT) probe. As a non-limiting example, the NDT probe may be an eddy current testing probe. The mobile platform may be a robotic mobile platform under external control by a remote operator. The robotic arm is mounted on the mobile platform using a mounting plate, which is secured to an upper surface of the mobile platform, and includes a bracket or the like for attachment to a base of the robotic arm. The end effector is connected to an end connector of the robotic arm. The NDT probe of the end effector may be mounted on a support member, which may be selectively rotatable with respect to the end connector of the robotic arm.

Abstract: The invention provides an object (10), that during use is at least partly submerged in water, wherein the object (100) is selected from the group consisting of a vessel (1) and an infrastructural object (15), the object (10) further comprising an anti-biofouling system (200) comprising an UV emitting element (210), wherein the UV emitting element (210) is configured to irradiate with UV radiation (221) during an irradiation stage one or more of (i) a first part (111) of an external surface (11) of said object (10) and (ii) water adjacent to said first part (111) of said external surface (11) of said object (10), wherein the object (10) further comprises protruding elements (100) with the UV emitting element (210) configured between the protruding elements (100) and configured depressed relative to the protruding elements (100).

Abstract: In some embodiments, a method for cleaning a processing chamber is provided. The method may be performed by introducing a processing gas into a processing chamber that has a by-product disposed along sidewalls of the processing chamber. A plasma is generated from the processing gas using a radio frequency signal. A lower electrode is connected to a first electric potential. Concurrently, a bias voltage having a second electric potential is applied to a sidewall electrode to induce ion bombardment of the by-product, in which the second electric potential has a larger magnitude than the first electric potential. The processing gas is evacuated from the processing chamber.

Abstract: An ultrasonic treatment apparatus including: an ultrasonic bath for performing an ultrasonic treatment on a treatment target object; a first ultrasonic vibrator provided on the front surface side of the treatment target object; and a second ultrasonic vibrator provided on the back surface side of the treatment target object; wherein the first ultrasonic vibrator does not face the second ultrasonic vibrator.

Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.

Abstract: A method and apparatus for disinfecting a lavatory inside a vehicle in response to a set of criteria being met. A determination is made as to whether a set of criteria for activation of a disinfection system that emits far-ultraviolet radiation to perform a disinfection process inside a lavatory has been met. In response to a determination that the set of criteria has been met, the disinfection system is activated to perform the disinfection process inside the lavatory using the far-ultraviolet radiation.

Abstract: A part processing apparatus and method is disclosed that includes a media-blasting apparatus and a cleaning apparatus. The media-blasting apparatus is configured to blast a stream of media against a surface of a part, and the cleaning apparatus is configured to clean debris or particles from the surface of the part. The cleaning apparatus includes a first spray-and-wash unit, a first ultrasonic wash unit, a second ultrasonic wash unit, and a second spray-and-wash unit. The first ultrasonic wash unit is configured to ultrasonically vibrate a liquid in the first ultrasonic wash unit at a first frequency, and the second ultrasonic wash unit is configured to ultrasonically vibrate a liquid in the second ultrasonic wash unit at a second frequency. The first and second frequencies may be different from each other, such that vibration at the second frequency causes additional debris or particles to be removed from the surface of the part.

Abstract: Steam assisted gravity drainage (SAGD) equipment including steam generating equipment may be cleaned using supercritical carbon dioxide. Supercritical carbon dioxide is a fluid state of carbon dioxide where it is held at or above its critical temperature and critical pressure. Supercritical carbon dioxide has exceptional solvent qualities that can dissolve, soften, or dislodge the refractory fouling deposits in the SAGD equipment.

Abstract: An apparatus and a method for forming a leveled surface of at least one pasty mass in a mold are described. Thereby, the mold is particularly adapted to mold lipstick mines, wherein the mold was filled with the pasty mass and the pasty mass was at least partially cooled in the mold. The apparatus comprises a means for at least partially melting the surface of the at least one cooled pasty mass in the mold to level the surface by heat introduction, wherein the heat introduction takes place via focused optical photo emission.