Abstract: A system and method for treating a substrate is described. In particular, the system and method for treating a substrate include techniques for removing particles from the surface of a microelectronic substrate. The system includes: a vacuum process chamber; a substrate stage for supporting a microelectronic substrate within the vacuum process chamber; a cryogenic fluid supply system that can provide a fluid or fluid mixture through one or more nozzles arranged within the vacuum process chamber to inject a fluid spray into the process chamber in a direction towards an upper surface of the microelectronic substrate; and a process monitoring system coupled to the vacuum process chamber, and arranged to collect fluid spray data corresponding to at least one measured attribute of the injected fluid spray downstream of an exit of the one or more nozzles.

Abstract: A low volume showerhead in a semiconductor processing apparatus can include a porous baffle to improve the flow uniformity and purge time during atomic layer deposition. The showerhead can include a plenum volume, one or more gas inlets in fluid communication with the plenum volume, a faceplate including a plurality of first through-holes for distributing gas onto a substrate in the semiconductor processing apparatus, and a porous baffle positioned in a region between the plenum volume and the one or more gas inlets. The one or more gas inlets can include a stem having a small volume to improve purge time. The baffle can be porous and positioned between the stem and the plenum volume to improve flow uniformity and avoid jetting.

Abstract: A downhole production assembly includes a downhole pump that can be positioned at a downhole location in a wellbore, and a cavitation chamber located upstream of an inlet of the downhole pump in the wellbore. The cavitation chamber can induce cavitation in a wellbore fluid pumped in the uphole direction by the downhole pump to prevent scaling on the downhole pump.

Abstract: An optical cap that protects a camera lens of the inspection assembly is disclosed herein. The disclosed optical cap for an inspection assembly may include an optically clear dome-shaped window element and a metal collar attached to the window element, the collar including means for securing the optical cap to said inspection assembly, wherein the collar is bonded to the window element by means of brazing or welding.

Abstract: A cleaning apparatus and a cleaning method are provided. The cleaning apparatus is used for removing a residue on a substrate, and includes: a deformable device arranged on the substrate; and an excitation device configured to generate an excitation source for the deformable device, so as to enable the deformable device to be deformed under the effect of the excitation source, thereby to drive the substrate to vibrate and enable the residue to fall off from the substrate.

Abstract: A system for cleaning an object may include an acoustic device configured to deliver acoustic waves to the object, a cleaning medium dispenser configured to deliver a cleaning medium to a surface of the object, a rinsing medium dispenser configured to deliver a rinsing medium to the surface, a vacuum configured to deliver a vacuum airflow proximate the surface, wherein the acoustic waves generate acoustic vibrations in the object to dislodge debris from the surface, acoustically treat the cleaning medium and the rinsing medium, and atomize the cleaning medium, the debris collected by the cleaning medium and the rinsing medium.

Abstract: The present technology is directed to fluid filtration systems having enhanced momentum cleaning devices for filter belts and associated systems and methods. In some embodiments, for example, a filtering system includes a fluid channel having a continuous-loop filter belt positioned therein. The filter belt can be configured to trap contaminants while allowing fluid to pass through the filter belt. The system further includes a first cleaning device proximate to the filter belt and a second cleaning device proximate to the filter belt and downstream of the first cleaning device. In particular embodiments the first cleaning device is a scraping blade that presses against the filter belt and the second cleaning device is one of a wave form, vibrational, or mixed-phase stream energy delivery device.

Abstract: A roller brush bed and a fluid delivery system are provided. The fluid deliver system includes a fluid source, a fluid supply tube connected to the fluid source, a movable fluid delivery bar in fluid communication with the fluid supply tube and a drive system attached to the movable fluid delivery bar and configured to move the movable fluid delivery bar relative to the at least one roller brush and along the roller brush bed, wherein the movable fluid delivery bar is configured to spray fluid toward the at least one roller brush as the movable fluid delivery bar is moved along the roller brush bed.

Abstract: A door assembly for a horizontal axis washing machine includes a door rotatably mounted to a front panel to permit selective access to an opening of the washing machine appliance. A sub-door is rotatably mounted to the door and is movable between an open position and a closed position. The sub-door defines a pretreat basin for collecting wash fluid from a wash fluid supply when the sub-door is in the open position for pretreating an article of clothing. After the pretreatment procedure is complete, the sub-door may be pivoted toward the closed position such that the article of clothing and the collected wash fluid are passed directly into the tub through a door opening and drain conduit.

Abstract: Disclosed is a thin film type solar cell which prevents short circuit from occurring between a first electrode and a second electrode due to a burr produced in a separation part, thereby preventing an output from being reduced. The thin film type solar cell includes a substrate, a first electrode disposed over the substrate and being apart from an adjacent first electrode by a first separation part, a semiconductor layer disposed over the first electrode and being apart from an adjacent semiconductor layer by a contact part and a second separation part, and a second electrode disposed over the semiconductor layer and being apart from an adjacent second electrode by the second separation part. The semiconductor layer contacts the substrate through the first separation part, and the second electrode contacts the first electrode through the contact part. A height of a burr produced in the second separation part is lower than a height between the first electrode and the second electrode.

Abstract: The present invention provides DMSO-containing foamable formulations, methods for preparation, and methods of treatment. The formulations can provide good permeability and bioavailability at the target site. Preferably, the formulations are useful for treating osteoarthritis. In one embodiment, the invention provides a foamable formulation for topical use, said formulation comprising DMSO, polyalkylene glycol alkyl ether, an active agent, a monohydric lower alcohol, a diol, and water. Preferably, the active agent is a non-steroidal anti-inflammatory drug, such as diclofenac sodium or ibuprofen.

Abstract: A method performed by a film deposition apparatus including a process chamber and a rotary table that is disposed in the process chamber and includes a substrate-mounting surface on which a substrate is placeable. The method includes a first cleaning process of supplying a cleaning gas from above the substrate-mounting surface of the rotary table while rotating the rotary table in a first cleaning position, and a second cleaning process of supplying the cleaning gas from above the substrate-mounting surface of the rotary table while rotating the rotary table in a second cleaning position that is lower than the first cleaning position.

Abstract: A disinfecting system includes a housing. An ultraviolet light (UV) source is secured to the housing and configured to emit UV light for disinfection of a target. A processor is secured to the housing in communication with the UV light source. The processor is configured to activate the UV light source for a selected amount of time suitable for disinfection of the target.

Abstract: The present disclosure relates to a method and apparatus for cleaning a 3D printed article, in particular a 3D printed heat exchanger. After 3D printing, an article may have internal passages formed from bonded powder and said passages may contain unbonded powder that needs to be removed before further use of/processing of the article. To remove this unbonded powder, the article is filled with a cleaning fluid and vibrated. The cleaning fluid is then pumped out of the article and past a sensor that generates a magnetic field. The sensor detects the presence of powder particles in the fluid by detecting a perturbation of the magnetic field caused by said particles. The fluid is then filtered and returned to a reservoir for use. The sensor may indicate the article is sufficiently clean when a detected concentration of particles in the fluid drops below a threshold.

Abstract: The invention relates to a method for determining the thickness of a contaminating layer and/or the type of a contaminating material on a surface (7) in an optical system, in particular on a surface (7) in an EUV lithography system, comprising: irradiating the surface (7) on which plasmonic nanoparticles (8a,b) are formed with measurement radiation (10), detecting the measurement radiation (10a) scattered at the plasmonic nanoparticles (8a,b), and determining the thickness of the contaminating layer and/or the type of the contaminating material on the basis of the detected measurement radiation (10a). The invention also relates to an optical element (1) for reflecting EUV radiation (4), and to an EUV lithography system.

Abstract: Disclosed herein is a method. The method includes applying a fluid to a perforated upper layer. The perforated upper layer forms an exposed surface of a multi-layer structure. The method also includes allowing the fluid to pass through the perforated upper layer and contact a contaminant within a core layer of the multi-layer structure. The core layer is disposed beneath the perforated upper layer, opposite the expose surface, and is coupled to the perforated upper layer. The method also includes applying ultrasonic energy to the exposed surface of the multi-layer structure using an ultrasonic generator to loosen the contaminant into the fluid. The method also includes removing the fluid with the loosened contaminant from the multi-layer structure.

Abstract: The invention relates to a method for cleaning of indoor or outdoor areas by operating a dirt stop surface, comprising the steps of dividing the dirt stop surface (1) into surface units (4), dispensing a fluid flow on the surface to be cleaned, while the proximity of the surface to be cleaned is sensed separately for each surface unit (4), and the fluid is dispensed from the surface units (4) of the dirt stop surface in a selective manner such that only the surface units (4) in the proximity of which the presence of the surface to be cleaned has been sensed are applied for dispensing the fluid. The invention relates further to a dirt stop surface unit and a dirt stop surface assembled therefrom that is capable of carrying out the method.

Abstract: A method for cleaning a process chamber of a processing apparatus including the process chamber and a gas supply mechanism. The gas supply mechanism includes a flow splitter, a first flow path communicating with an upstream end of the flow splitter, a first valve provided in the first flow path, a second flow path communicating with a downstream end of the flow splitter and connected to the process chamber, a second valve provided in the second flow path, a bypass flow path connecting the first flow path and the second flow path, and a bypass valve provided in the bypass flow path. The method includes a step of closing the first valve and the second valve and opening the bypass valve, and a step of cleaning the process chamber by introducing a gas through the bypass flow path into the process chamber after opening the bypass valve.

Abstract: A dish washing machine having a structure allowing wash water to be evenly sprayed into a washing tub. The dish washing machine includes a cabinet forming an external appearance of the dish washing machine, a washing tub arranged in the cabinet and allowing dishes to be washed therein, a dish basket arranged in the washing tub to accommodate the dishes, a spray unit to spray wash water into the washing tub, a diversion unit arranged inside a flow passage of wash water to divert the wash water sprayed from the spray unit, and a guide member coupled to one side of the diversion unit to allow the diversion unit to move within the washing tub. As the spray unit and the diversion unit are provided, a dead zone which wash water does not reach may be eliminated, and divided and intensive washing may be implemented in the washing tub.

Abstract: A lens structure system. The system comprises a lens structure and a multi-segmented transducer coupled to the lens structure. The multi-segmented transducer comprises a plurality of segments. For each segment in the plurality of segments, there also is a first conductor and a second conductor electrically coupled to the segment.

Abstract: A method of producing a hot-stamped article includes: a forming process of heating a galvanized steel sheet (1) on which a galvanized layer (12) is formed and forming the heated galvanized steel sheet (1) by hot stamping; a removal process of irradiating, after the forming step, an oxide film (13) formed on a surface of the galvanized layer (12) with laser light to remove the oxide film (13); and a coating process of performing, after the removal process, a coating treatment on the galvanized steel sheet (1) formed by hot stamping.

Abstract: A spherical-confocal-split array with dual frequency of fundamental and harmonic superimposition includes: array elements which are spherically confocal, whose quantity is an even number, wherein a half of the array elements operate with a lower frequency, and the other half of the array elements operate with a higher frequency; both the lower frequency and the higher frequency are MHz high-frequencies; each of the array elements corresponds to a frequency drive; array element beams don't superimpose outside the focal region; each of the array elements is connected to a channel amplifier (3) through corresponding impedance matching (2); and a multi-channel waveform controller (4) is connected to the channel amplifier (3) for controlling amplitudes and phases of all channels. The dual-frequency spherical sectorial split array is able to generate split multi-foci of the focal plane with the dual frequencies; and control strong interference of transient cavitation clouds at the adjacent foci.

Abstract: A method of installing a fixture or bracket in a fuselage structure of an aircraft or spacecraft. The method includes arranging an apparatus in, on or adjacent the structure, pre-treating a surface region of the structure by heat ablation using the apparatus and forming the fixture in situ on the structure at the pre-treated surface region using the apparatus based on a digital model of the fixture. The fixture is installed by connecting the fixture to the structure at the pre-treated surface region as the fixture is formed.

Abstract: The present invention relates to a method of, and an apparatus for, rinsing materialographic samples. The method includes the steps of: arranging one or more materialographic samples in a sample holder; connecting the sample holder (10) to a rotation head of a rinsing device; placing the sample holder connected to the rotation head in the vessel of the rinsing device; rotating the sample holder relative to the vessel; filling the vessel with a rinsing liquid; and subjecting the materialographic samples in the sample holder to ultrasonic waves.

Abstract: An accessory drive device includes a housing, a fluid inlet, a fluid outlet, a drive mechanism, and an output drive member. The output drive member may be driven by the drive mechanism and engage with an input drive member on a transmission mechanism of a surgical instrument. The drive mechanism may be configured to be driven by a motive force produced by fluid flowing through the housing from the inlet to the outlet, with the fluid being delivered by a fluid source of a reprocessing device. A portable, accessory drive device for a surgical instrument includes a portable housing to be removably coupled to a transmission mechanism of an instrument and a drive mechanism to drive an input drive member of the transmission mechanism. A method of reprocessing a surgical instrument includes converting a force associated with a flow of fluid for reprocessing to drive an instrument input drive member.

Abstract: A cleaning device is provided with a three-dimensional circulation route for circulating workpiece holding tools that hold a workpiece, and this three-dimensional circulation route is formed by an endless conveyor chain bendable in various directions being disposed within a rectangular parallelepiped space following along the upper and lower sides thereof. The conveyor chain circulates from an upper side horizontal transport path portion via a falling side transport path portion, a lower side horizontal transport path portion, and a rising side transport path portion, and the workpiece held in the workpiece holding tools is treated by ultrasonic cleaning, shower cleaning, steam cleaning, drying and the like. Thus, it is possible to suitably dispose a workpiece transport route in a limited rectangular parallelepiped space, and carry out cleaning operations for the workpiece efficiently.

Abstract: A method and apparatus for reproducing a component of a semiconductor manufacturing apparatus, and a reproduced component are provided. The method may include a preparing step of preparing a damaged component of a semiconductor manufacturing apparatus, a first cleaning step of cleaning the damaged component, a masking step of masking at least one of areas including an undamaged part of the damaged component, a reproduced part forming step of forming a reproduced part on the damaged component using a chemical vapor deposition (CVD), a post-grinding step of grinding the damaged component with the reproduced part, and a second cleaning step of cleaning the damaged component with the reproduced part.

Abstract: A physical vapor deposition (PVD) target that includes a body composed of material that is reactive with an oxygen containing atmosphere; and a non-reactive cap layer encapsulating at least a sputter surface of the body. The non-reactive cap layer is a barrier obstructing the diffusion of oxygen containing species to the body of the PVD target.

Abstract: A method and a dishwasher utilize a dock detection system to determine when a connector of a spray device is docked to a docking port provided on a manifold of the dishwasher. A dock detector is coupled to the docking port and is electrically coupled to a controller of the dishwasher through electrical conductors that extend along the manifold, thereby enabling a dishwasher controller to detect when spray devices are coupled to the manifold, e.g., to optimize a wash cycle to use a particular spray device docked to the docking port.

Abstract: The rate of rod fallover in the production of polycrystalline silicon by the Siemens process is sharply reduced by cleaning the Siemens reactor base plate by at least a two-step procedure comprising suctioning the base plate in one step, and subsequently cleaning with liquid or solid cleaning medium in a second step, between each phase of rod removal and new support body installation.

Abstract: This invention provides systems and methods for treating electrodes used in batteries and electrochemical cells upon battery/cell shutdown and prior to battery standby mode. Systems and methods of this invention are directed toward the use of aerosol to treat the electrode and to protect the electrode and/or the environment from undesired reactions.

Abstract: Systems and methods of producing a solid fuel composition are disclosed. In particular, systems and methods for producing a solid fuel composition by heating and mixing a solid waste mixture below atmospheric pressure to a maximum temperature sufficient to melt the mixed plastics within the solid waste mixture is disclosed.

Abstract: A substrate processing method includes a substrate holding step of horizontally holding a substrate, a substrate rotating step of rotating the substrate held horizontally around a rotational axis along a vertical direction, a liquid-film forming step of forming a liquid film of a first organic solvent that is used to process an upper surface of the substrate on the upper surface of the substrate by supplying the first organic solvent to the upper surface of the substrate held horizontally, a vapor supplying step of supplying a vapor of a second organic solvent to a space between a facing surface of a heater unit that has the facing surface facing a lower surface of the substrate held horizontally and the lower surface of the substrate, a substrate heating step of heating the substrate being in a rotational state by means of the vapor of the second organic solvent in parallel with the substrate rotating step and the liquid-film forming step, and a substrate drying step of, after the substrate heating step, exc

Abstract: The invention features methods and apparatuses for thermally regulating a laser processing head. A thermal regulation device includes a body shaped to matingly engage a laser processing nozzle and to define a fluid flow boundary of a liquid flow passage between the body and an exterior surface of the laser processing nozzle when the thermal regulation device is affixed to the laser processing nozzle. The thermal regulation device also includes an inlet formed in a first end of the body and configured to provide liquid to the liquid flow passage, the liquid remaining external to an exterior surface of the laser processing nozzle. The thermal regulation device also includes an outlet formed in a second end of the body opposite the first end. The outlet is configured to exhaust liquid from the liquid flow passage.

Abstract: A device for keeping jellyfish and other plankton in an aquarium having a drain and a pump, the device having a panel; a first sprayer connectable to the pump and coupled to the panel at a first position, the first sprayer having a plurality of channels or holes for generating a plurality of water streams; and a second sprayer connectable to the pump and coupled to the panel at a second position, the second sprayer having a plurality of channels or holes for generating a plurality of water streams; wherein the insert is configured so that the first sprayer and the second sprayer create a rotating current within the aquarium.

Abstract: A radiation source apparatus is provided. The radiation source apparatus includes a chamber, a target droplet generator, an exhaust module, a measuring device, and a controller. The target droplet generator is configured to provide a plurality of target droplets to the chamber. The exhaust module is configured to extract debris corresponding to the target droplets out of the chamber according to a first gas flow rate. The measuring device is configured to measure concentration of the debris in the chamber. The controller is configured to adjust the first gas flow rate according to the measured concentration of the debris.

Abstract: An apparatus and method for processing substrates. The method includes positioning a substrate within a processing chamber of a substrate processing system. The substrate includes a layer of a carbon-containing material on a working surface of the substrate. The method also includes receiving hydrogen peroxide vapor in a vapor treatment region of the substrate processing system, generating hydroxyl radical vapor by treating the hydrogen peroxide vapor in the vapor treatment region, and directing the hydroxyl radical vapor and remaining hydrogen peroxide vapor to the working surface of the substrate causing the carbon-containing material to be chemically modified.

Abstract: A method performed by a processor of a plasma processing system including a transfer device and a plasma processing apparatus that includes a process chamber. The process chamber includes a mount table on a surface of which a first focus ring is placed. The method includes controlling the transfer device to transfer the first focus ring out of the process chamber without opening the process chamber to the atmosphere; after the first focus ring is transferred out of the process chamber, controlling the plasma processing apparatus to clean the surface of the mount table; and after the surface of the mount table is cleaned, controlling the transfer device to transfer a second focus ring into the process chamber and place the second focus ring on the surface of the mount table without opening the process chamber to the atmosphere.

Abstract: An apparatus for in-situ monitoring of a workpiece includes a fluidic container defining a cavity and having a peripheral portion that defines an aperture. The fluidic container contains an acoustic transmission fluid. A conformable membrane is sealably disposed about the peripheral portion of the aperture of the fluidic container. The conformable membrane is disposed to sealably contain the acoustic transmission fluid within the fluidic container and to conform to a surface of a portion of the workpiece absent an interposed fluid. An acoustic source transducer is disposed in the cavity of the fluidic container and in contact with the acoustic transmission fluid. The acoustic source transducer is disposed to generate a first acoustic wave in the direction of the workpiece. An acoustic receiving transducer is disposed to monitor a residual acoustic wave that is reflected from the workpiece in response to the first acoustic wave.

Abstract: Certain exemplary aspects of the present disclosure are directed towards apparatuses and methods which autonomously decontaminate parts. Parts to be cleaned are identified, and based on the identification of the part, a part specific cleaning program is initiated. During the cleaning, the part is manipulated about a gas supply in such a way that the drag force on the contamination particles attached to the part exceeds the contamination particles' surface adhesion force and accordingly is removed from the surface of the part. The removed contamination is then evacuated from the atmospheric environment near the part by a low pressure zone of a second gaseous material near the part.

Abstract: A conveyor dishwasher (1) has at least one wash zone (11, 12) in which wash liquid is sprayed onto the washware, at least one final rinse zone (14) in which final rinse liquid is sprayed onto the washware and a waste air system (20) for discharging waste air from the conveyor dishwasher (1). To save energy and maintain hygiene performance, a waste water heat recovery system (25) is provided for transferring at least a portion of the thermal energy in the waste water from the conveyor dishwasher (1) as useful heat to the final rinse liquid and a waste air heat recovery system is further provided for transferring at least a portion of the thermal energy in the waste air which is discharged or is to be discharged from the conveyor dishwasher (1) as useful heat to at least the final rinse.

Abstract: A lithography system includes a load lock chamber comprising an opening configured to receive a mask, an exposure module configured to expose a semiconductor wafer to a light source through use of the mask, and a cleaning module embedded inside the lithography tool, the cleaning module being configured to clean carbon particles from the mask.

Abstract: A method and apparatus for forming a flowable film are described. The method includes providing an oxygen free precursor gas mixture to a processing chamber containing a substrate. The oxygen free precursor gas is activated by exposure to UV radiation in the processing chamber. Molecular fragments resulting from the UV activation are encouraged to deposit on the substrate to form a flowable film on the substrate. The substrate may be cooled to encourage deposition. The film may be hardened by heating and/or by further exposure to UV radiation.

Abstract: Described herein is a fluid dispensing system, a system for processing waste material and a fluid monitoring system and a method of monitoring the quality of a fluid. One embodiment provides a fluid dispensing system (1) including a fluid dispenser (3) in fluid communication with at least one source of a first fluid. An identification device identifies a user of the system and generates a user identifier. A processor (19) is responsive to the user identifier to access a database (27) to retrieve user data indicative of one or more user preferences and, in response, generate a control signal. One or more electrical sensors (25) are configured to sense a gesture motion from the user and, in response, generate a local input signal. An actuator system (29) is responsive to the control signal and the local input signal to dispense the first fluid from the fluid dispenser with predefined characteristics.

Abstract: A biological filtration system for the neutralization of urine and other pool biologicals within a water filtration system of a pool or spa, providing for the neutralization of urine, bacteria, viruses and other biologicals, using a UVC lamp, a urease reaction chamber, a nitrifying bacteria reaction chamber and a nitrate filter prior to return to the water inlet supply line of the pool or spa.

Abstract: The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 ?g/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 M?·cm.

Abstract: A shoe sole cleaning device may include a fluid reservoir capsule having an inner chamber for containing a cleaning solution. The shoe cleaning device may also include a trough and a fluid pump operably connected to a fluid exit port of the fluid reservoir capsule to pump the cleaning solution from the fluid exit port to the trough. A brush may be disposed partially within the trough such that some of its bristles are at least partially submersible in the cleaning solution in the trough. A motor may cause the brush to rotate about an axial shaft picking up the cleaning solution from the trough to clean a shoe's sole. A fluid recycle conduit may transport the cleaning solution from the trough back to the inner chamber of the fluid reservoir capsule when the cleaning solution in the trough reaches a predetermined height.

Abstract: Methods of decontaminating bone tissue and an apparatus or system for the same are provided. The methods can be multi-batch processes and include contacting the bone tissue having contaminants with carbon dioxide to decontaminate the bone tissue and to form carbon dioxide having contaminants. The contaminated carbon dioxide is collected and the contaminants are removed to obtain purified carbon dioxide which can be recycled to treat contaminated bone tissue. The contaminated carbon dioxide can be purified by bubbling it through water and/or an organic solvent followed by acid treatment, filtering and liquefying the carbon dioxide. Contaminants that can be removed from contaminated bone tissue, and in turn, from contaminated carbon dioxide include infectious organisms, bacteria, viruses, protozoa, parasites, fungi and mold or a mixture thereof.

Abstract: A composition for pretreating surfaces of equipment for use with an uncured cementitious material, such as uncured concrete, and/or for cleaning cured cementitious material from the surfaces of such equipment includes an aqueous solution with colloidal silica. Pretreatment of a surface with such an aqueous solution may reduce or eliminate adhesion of uncured cementitious material to the surface. Cured cementitious material may be removed from equipment surfaces by wetting the cured cementitous material with the aqueous solution to chemically soften the cured cementitious material, along with abrading the cured cementitious material to mechanically remove the same from the equipment surfaces. Systems for removing cured cementitious material from the surfaces of equipment configured to use with uncured cementitious material include an abrasive element and an aqueous solution with colloidal silica.

Abstract: An apparatus for forming a metal workpiece having a first surface is described herein. The apparatus includes a trough containing a liquid. The apparatus also includes a support for positioning the metal workpiece in an impact-receiving position. In the impact-receiving position, the first surface is submerged in the liquid. The apparatus includes a driven member for applying multiple impacts to the first surface of the metal workpiece while the metal workpiece is in the impact-receiving position.