Abstract: The present invention relates to a cleaning apparatus. The cleaning apparatus according to the present invention includes a first cleaner for spraying a first detergent through a first nozzle, a second cleaner for discharging a second detergent to an outside of a second nozzle, and a vibration unit for vibrating the second cleaner when the second cleaner discharges the second detergent.

Abstract: Examples of a substrate processing apparatus include a stage, an outer peripheral ring that surrounds the stage while provided with a gap between a side surface of the stage and the outer peripheral ring, a gas supply unit configured to supply gas from a lower side of the gap to an upper side of the gap, and an upper electrode provided above the stage.

Abstract: Disclosed herein is an environmentally safe etching composition and method for a concrete or mortar surface. The composition includes, in some embodiments, an aqueous solution of urea, acetic acid, a buffering agent, an anticorrosive agent, and a surfactant with no more than about 30% (w/v) urea and at least about 10% (v/v) acetic acid. The method includes, in some embodiments, obtaining the etching composition; applying the etching composition to the concrete or mortar surface at a prescribed ratio of the etching composition to the concrete or mortar surface; allowing the etching composition to stand on the concrete or mortar surface for a prescribed amount of time; and washing the concrete or mortar surface with water to produce an etched surface of the concrete or mortar.

Abstract: A system for performing a Chemical Mechanical Polishing (CMP) process is provided. The system includes a CMP module configured to polish a semiconductor wafer. The system further includes a cleaning brush assembly configured to clean the semiconductor wafer. The cleaning brush includes a rotation shaft and a brush member surrounding a segment of the rotation shaft. The system also includes an agitation transducer arranged to be distant from the brush member and configured to produce an agitated cleaning liquid to clean the cleaning brush assembly.

Abstract: Disclosed herein is a sonic cleaning insert. In one example, the sonic cleaning insert includes a carousel configured to rotate about a central axis. The carousel further includes a platform having an outer perimeter. The platform is radially disposed about the central axis. The carousel has an inner ring and an outer ring circumscribing the inner ring. A plurality of partitions couple the inner ring and the outer ring to the platform. The plurality of partitions are arranged at a predetermined angle about the central axis. The carousel further includes a plurality of holders. Each holder is formed from a portion of the platform, a portion of each of the inner ring and outer ring, and a first sidewall and a second sidewall formed from the plurality of partitions. The carousel is configured for immersion in an ultrasonic vibrating fluid.

Abstract: An integrated additive manufacturing system includes: (a) at least one resin supply (41); (b) a plurality of additive manufacturing machines (43) on which parts may be produced, each of the additive manufacturing machines (43) operatively associated with the at least one resin supply (41); and (c) at least one peripheral machine (200, 48, 220) operatively associated with each of the additive manufacturing machines and the at least one resin supply.

Abstract: The present disclosure provides a cleaning machine, including: a cleaning chamber; a turn table having a plurality of areas arranged around a rotary axis, configured to turn one area of the plurality of areas to the cleaning station and another area to the transport station, each of the plurality of areas having: a cleaning tank including a closable opening, a rotating device arranged at the cleaning tank, and a cleaning table on which the object is placed, and which is arranged on the rotating device and rotatably arranged in the cleaning tank; a nozzle moving device arranged in the cleaning station; a cleaning nozzle arranged on the nozzle moving device; a shutter arranged in the cleaning station and closing the closable opening; and a shutter moving device configured to move the shutter toward the closable opening.

Abstract: A cleaning system and method includes suspending and exploding, adjacent a bank of HRSG finned-tubing, a plurality of generally uniformly spaced detonation cords. Each detonation cord has an explosive grain loading of 18-50 grains per foot. A detonation delay assembly attached to each of the plurality of detonation cords creates a predetermined delay between each detonation cord explosion. After the detonation cords are exploded, a suspended elongated beam, having a transport assembly and a pressurized air blower assembly directs pressurized air towards an adjacent the bank of HRSG finned-tubing as the pressurized air blower assembly is moved along a portion of the beam. A suspension assembly moves the beam, the transport assembly, and the pressurized air blower assembly up or down so that a next portion of the bank of HRSG finned-tubing may be cleaned by the pressurized air.

Abstract: Disclosed is an ultraviolet (UV) light cleaning device. By providing an energy conversion component between an UV light source and a supporting platform, the UV light cleaning device can convert the energy of the UV light to specific energy by the energy conversion component. When the energy of the UV light is higher, the energy of the UV light is converted to specific energy lower than the energy of the UV light, thereby avoiding damage to the substrate while cleaning the substrate to solve the technical problem that the conventional UV light cleaning damages the substrate in a cleaning process.

Abstract: A resist composition is disclosed which comprises a perovskite material with a structure having a chemical formula selected from ABX3, A2BX4, or ABX4, wherein A is a compound containing an NH3 group, B is a metal and X is a halide constituent. The perovskite material may comprise one or more of the following components: halogen-mixed perovskite material; metal-mixed perovskite material, and organic ligand mixed perovskite material.

Abstract: A household dishwasher includes a washing compartment receiving items to be washed, a control device configured to carry out a washing program selected from a number of washing programs for washing the items to be washed in the washing compartment, an optical sensor configured to acquire an optical sensor signal of the items to be washed in the washing compartment, and an evaluation unit configured to identify a drying state of the items to be washed in the washing compartment as a function of the acquired optical sensor signal.

Abstract: Pressure vessels that operate at elevated temperatures and pressures (e.g., 600° F./316° C., 20000 psig), and ultrasonic transducers and signal connectors for use therein, are described. The pressure vessels include a housing defining a cavity. The housing includes a cylindrical body with plugs positioned within openings of the cylindrical body. Each plug has a recess extending from an external surface to a location ultrasonically adjacent the cavity. The pressure vessels additionally include transducer assemblies positioned within respective plug recesses. Each transducer assembly includes a signal connector positioned within the recess adjacent the external surface, a transducer having a piezoceramic element positioned within the recess at the location ultrasonically adjacent the cavity, and a metallic interconnection spring interconnecting the transducer to the signal connector.

Abstract: A substrate processing apparatus includes a chamber to accommodate a substrate. The apparatus includes a stage to support the substrate in the chamber. The apparatus includes an electrode disposed above the stage and containing aluminum. The electrode generates plasma from gas supplied into the chamber to form a first film on the substrate by the plasma. The apparatus further includes a second film formed on a surface of the electrode and containing aluminum and fluorine or containing aluminum and oxygen.

Abstract: Described is a method of processing an antimicrobial glass substrate. More particularly, described is a method of removing one or more of silver nitrate or silver oxide on the surface of an antimicrobial glass substrate. Also described is a method of manufacturing a glass substrate that is substantially free of yellow discoloration.

Abstract: A method of fabricating an integrated circuit is disclosed. The method of removing excess metal of a metal interconnection layer during integrated circuit fabrication process comprises the steps of: plasma etching an excess metal portion of the metal interconnection layer using plasma comprising a noble gas, for an etch duration. The method further comprises stopping the etch process prior to the excess metal portion being completely removed and thus prior to a dielectric surface upon which the metal interconnection is formed, becoming completely exposed. The remaining excess metal portion comprising excess metal residues is subsequently removed using a second etch step.

Abstract: A drawing apparatus includes: a drawing part; a cleaning-gas generator; a first valve between the cleaning-gas generator and the drawing part and adjusting a supply amount of gas to the drawing part; a first pressure gauge measuring a pressure in the drawing part; a compensation-gas introducing part introducing compensation-gas to be supplied between the cleaning-gas generator and the first valve; a second valve between the compensation-gas introducing part and the first valve and adjusting a supply amount of the compensation-gas; and a valve controller controlling the first and second valves, wherein the valve controller controls the first valve to supply the cleaning-gas at a predetermined flow rate to the drawing part and controls the second valve to cause a pressure in the drawing part to be a predetermined pressure when the first pressure gauge detects a pressure reduction due to a reduction in a supply flow rate of the cleaning-gas.

Abstract: The embodiments of the present disclosure disclose an ultrasonic microbubble generation method, apparatus and system. The apparatus comprises a horn-shaped conductor including an upper horn-shaped body and a lower cylindrical body; the horn-shaped body is provided with a cavity having an upper opening, an upper end of the cavity is fixedly connected with a micropore vibration thin sheet, a micropore array of the micropore vibration thin sheet is corresponding to the upper opening of the cavity, and a side wall of the cavity is provided with a through hole for external gas to enter the cavity; the cylindrical body is provided with a transducing ring and an electrode sheet, an outer side of the cylindrical body is insulated and sealed, and a connection wire of the electrode sheet is led out by a steel pipe and connected with an external ultrasonic oscillation controller.

Abstract: Method and apparatus for identifying a contaminant on a substrate. Identification of a contaminant removed from a substrate can be useful in identifying and eliminating or reducing the source of the contamination and tailoring the removal method to minimize the potential for substrate damage. The methods and apparatus for identification of the contaminant provide liberation of molecules of the contaminant from the surface of the substrate, accounting for different geometries and substrate materials, sample preparation, and chemical analysis of the contaminant.

Abstract: The present disclosure relates to a sub-frame cleaning and blow-drying device, comprising a rack, a water tank, a bottom lifting assembly, supporting assemblies, a top lifting assembly, a rotating assembly, an expanding and cleaning-off assembly and a blow-drying device. Expanding assemblies expand to be connected with vehicle body mounting holes, compressed air is blown into the vehicle body mounting holes by air outlets and is blown into a cavity of a sub-frame to clean off aluminum scraps and residual sand in the cavity of the sub-frame, the rotating assembly drives the expanding and cleaning-off assembly and the sub-frame to do rotation movement to perform secondary cleaning, so that the aluminum scraps and the sand remaining inside the cavity can be cleaned off, and the sub-frame cleaning and blow-drying device can be flexibly adjusted by a position adjusting assembly according to different types of sub-frames and is strong in universality.

Abstract: An unattended extraction cleaning machine includes a housing with a bottom portion that is adapted to rest on a surface to be cleaned, a fluid delivery system including a fluid distributor, a fluid extraction system including a suction nozzle, at least one carriage assembly mounting the suction nozzle to the housing for movement with respect thereto and with respect to the surface to be cleaned, and an ultraviolet light mounted on at least one of the housing and the carriage assembly to emit ultraviolet light onto the surface to be cleaned.

Abstract: A physical vapor deposition (PVD) target that includes a body composed of material that is reactive with an oxygen containing atmosphere; and a non-reactive cap layer encapsulating at least a sputter surface of the body. The non-reactive cap layer is a barrier obstructing the diffusion of oxygen containing species to the body of the PVD target.

Abstract: Methods of patterning low-k dielectric films are described. In an example, a method of patterning a low-k dielectric film involves forming and patterning a mask layer above a low-k dielectric layer, the low-k dielectric layer disposed above a substrate. The method also involves modifying exposed portions of the low-k dielectric layer with a nitrogen-free plasma process. The method also involves removing, with a remote plasma process, the modified portions of the low-k dielectric layer selective to the mask layer and unmodified portions of the low-k dielectric layer.

Abstract: A cleaning system and method use an ultrasound probe, a coupling mechanism, and a controller to clean equipment of a vehicle system. The ultrasound probe enters into an engine. The ultrasound probe emits ultrasound pulses and the coupling mechanism provides an ultrasound coupling medium between the ultrasound probe and one or more components of the engine. The controller drives the ultrasound probe to deliver the ultrasound pulse through the coupling medium to a surface of the one or more components of the engine. The ultrasound probe delivers the ultrasound pulse to remove deposits from the one or more components of the engine.

Abstract: Provided are methods for preparing iron nanoparticles and to iron nanoparticles produced by those methods. The invention also provides methods for coating the iron nanoparticles with oxides and functionalizing the iron nanoparticles with organic and polymeric ligands. Additionally, the invention provides methods of using such iron nanoparticles.

Abstract: A work table for laser processing includes an upper plate including a plurality of cell regions and at least one groove region that divides the plurality of cell regions. The upper plate includes a plurality of absorption holes that fix a substrate in the plurality of cell regions. A plurality of suction holes collect particles generated during a cutting process performed on the substrate. A lower plate is disposed under the upper plate. The lower plate forms an absorption path that is coupled to the plurality of absorption holes. A suction path is coupled to the plurality of suction holes by combining the lower plate with the upper plate.

Abstract: A method is for cleaning an edge ring. The edge ring includes an inner edge ring provided near a substrate mounted on an electrostatic chuck in a processing chamber, a central edge ring that is provided at an outer side of the inner edge ring and vertically movable by a moving mechanism, and an outer edge ring provided at an outer side of the central edge ring. The method includes applying a direct current voltage to the electrostatic chuck, and moving the central edge ring upward or downward.

Abstract: A dishwasher includes: a dishwasher body including a tub that defines a washing space and a sump disposed vertically below the tub and configured to accommodate washing water; a heat pump including a compressor, a condenser, an expansion apparatus, and an evaporator; a drain storage unit connected to a drain pipe of the sump and configured to receive washing water discharged from the sump; a drain pipe open-close valve that opens and closes the drain pipe; and a controller that controls the heat pump and the drain pipe open-close valve. The evaporator is configured to exchange heat with the drain storage unit, and the controller controls the drain pipe open-close valve to open the drain pipe to move washing water of the sump to the drain storage unit when the sump is drained.

Abstract: Methods, systems, and apparatuses are disclosed for the selective and controlled removal of debris from specific areas of a substrate outer surface without adversely impacting the substrate outer surface, including substrate outer surface coatings, and returning an actual substrate outer surface profile containing affixed debris to a predetermined substrate outer surface profile by comparing a library of predetermined profiles to an actual substrate outer surface profile in real time.

Abstract: A method of processing a semiconductor device including following operation is provided. A substrate is provided. The substrate is then processed with a treating solution, in which the treating solution includes liquid carbon dioxide and an additive. The treating solution is then displaced by a supercritical fluid carbon dioxide. The substrate is then dried by transforming the supercritical fluid carbon dioxide to gaseous carbon dioxide.

Abstract: Disclosed is an apparatus and method for providing asymmetric oscillations to a container. The container may include a fluid, a particle, and/or a gas. A vibration driver attached to the container provides asymmetric oscillations. A controller connected to the vibration driver controls an amplitude, frequency, and shape of the asymmetric oscillations. An amplifier amplifies the asymmetric oscillations in response to the controller. A sensor disposed on the vibration driver provides feedback to the controller.

Abstract: A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0×10?10 to 1.0×10?4.

Abstract: A system for ultrasonic cleaning of a solar panel includes a plurality of microelectromechanical systems (MEMS) ultrasonic transducers arranged on a side wall of the solar panel and/or under transparent glass on a surface of the solar panel; a hydraulic sun tracking mechanism configured to move the solar panel into a plurality of positions; a valve connected to a water source; and a controller which controls the plurality MEMS ultrasonic transducers, the sun tracking mechanism, and the valve, wherein the controller is configured to activate a cleaning protocol comprising the steps of moving the solar panel into a substantially horizontal position; opening the valve to allow a water flow over the surface of the solar panel; activating the plurality of MEMS ultrasonic transducers to apply ultrasonic waves to the water on the surface of the solar panel, wherein signal interference from different transducers are controlled to generate a rotating focused ultrasound signal over the surface of the solar panel; and m

Abstract: The present invention relates to systems and methods for cleaning of devices, such as heat exchangers. According to the invention, controlled cavitation is created at predetermined positions within a device. The cavitation is done by mechanical waves, such as ultrasound waves, generated by transducers, wherein the waves are based on output of time-reversal wave form analysis of the device structures.

Abstract: The present disclosure provides a semiconductor fabrication apparatus. The semiconductor apparatus includes a processing chamber for etching; a substrate stage integrated in the processing chamber and being configured to secure a semiconductor wafer; a reflective mirror configured inside the processing chamber to reflect thermal energy from the heating mechanism toward the semiconductor wafer; and a heating mechanism embedded in the process chamber and is operable to perform a baking process to remove a by-product generated during the etching. The heating mechanism is integrated between the reflective mirror and a gas distribution plate of the processing chamber.

Abstract: Embodiments of a three-dimensional (3D) memory device with a corrosion-resistant composite spacer and method for forming the same are disclosed. In an example, a 3D memory device includes a substrate, a memory stack disposed on the substrate and including a plurality of conductor/dielectric layer pairs, a plurality of memory strings each extending vertically through the memory stack, a slit contact disposed laterally between the plurality of memory strings, and a composite spacer disposed laterally between the slit contact and at least one of the memory strings. The composite spacer includes a first silicon oxide film, a second silicon oxide film, and a dielectric film disposed laterally between the first silicon oxide film and the second silicon oxide film.

Abstract: An apparatus for producing conditioned water configured to add a pH adjuster and/or a redox potential regulator to ultrapure water to produce conditioned water, the generator including: a chemical tank configured to store a chemical solution containing the pH adjuster and/or the redox potential regulator; a chemical injection pipe configured to inject the chemical solution in the chemical tank into the ultrapure water; and a degassing device configured to degas the chemical solution injected into the ultrapure water. When producing conditioned water useful as wash water for semiconductor wafers by adding a pH adjuster and/or a redox potential regulator into ultrapure water, the present invention can solve problems such as incorporation of DO from the chemical solution, injection failure and measurement failure of the flow meter due to foaming of the chemical solution, thereby enabling stable production of conditioned water with a low DO concentration and high water quality.

Abstract: A method for processing a biomedical material using a supercritical fluid includes introducing the supercritical fluid into a cavity. The supercritical fluid is doped with a hydrogen isotope-labeled compound, an organic metal compound, an element selecting from a halogen element, oxygen, sulfur, selenium, phosphorus or arsenic, or a compound containing the element. The biomedical material in the cavity is modified by the supercritical fluid at a temperature above a critical temperature of the supercritical fluid and a pressure above a critical pressure of the supercritical fluid.

Abstract: A substrate processing device includes a substrate holding table, an ultraviolet irradiator, a tubular member, a first gas supplying unit, and a second gas supplying unit. The ultraviolet irradiator is disposed facing to the substrate through an active space and configured to irradiate the substrate with ultraviolet light. The tubular member includes an inner surface surrounding a side surface of the substrate holding table, and at least one opening at a position facing to the side surface on the inner surface. The first gas supplying unit supplies gas to a space between the side surface of the substrate holding table and the inner surface of the tubular member through the at least one opening. The second gas supplying unit supplies gas to an active space between the substrate and the ultraviolet irradiator.

Abstract: An in-line process for reusing printed cans is disclosed. The process includes positioning a printed can in front of a laser, the printed can having existing-print on an outer surface of the printed can. And, irradiating the outer surface of the printed can with laser radiation to remove 10% to 90% of the existing-print from the printed can and thereby form a lightened-printed can. And further, coating the outer surface of the lightened-printed can with a masking agent to form a blank-reprintable can. Finally, optionally, printing a new print-pattern on the outer surface of the blank-reprintable can to form a newly-printed can.

Abstract: In one embodiment, systems and methods include using an automated laser system to remove a portion of a coating for nutplate installation. An automated laser system comprises a laser scanner and a laser head, wherein the laser head is coupled to the laser scanner. The laser head comprises a containment unit and a vacuum connector wherein the vacuum connector is disposed on a first side of the containment unit. The laser head further comprises a camera system, a light source, a first actuator, and a second actuator all disposed on a top surface of the containment unit. The laser head further comprises an end piece, wherein the second actuator is configured to displace the end piece.

Abstract: A substrate processing method includes a vapor atmosphere filling step of filling surroundings of a liquid film of a processing liquid with a vapor atmosphere containing a vapor of a low surface tension liquid that has a lower surface tension than the processing liquid, a dry region forming step of forming a dry region in the liquid film of the processing liquid by partially excluding the processing liquid while spraying a gas containing the vapor of the low surface tension liquid onto the liquid film of the processing liquid in parallel with the vapor atmosphere filling step, and a dry region expanding step of expanding the dry region toward an outer periphery of a substrate while rotating the substrate in parallel with the vapor atmosphere filling step.

Abstract: An ultrasonic transducer includes: a piezoelectric element having a plate-like shape and an area expansion vibration mode; and a vibration surface separated from main surfaces thereof and arranged in parallel to the main surfaces so as to be brought into contact with a liquid; a piezoelectric element receiving portion held in contact with a side surface of the piezoelectric element and configured to fix the piezoelectric element; and a vibration transmitting portion; and the vibration member having a space for surrounding the main surface formed by the vibration surface, the piezoelectric element receiving portion, and the vibration transmitting portion, wherein a vibration generated by the piezoelectric element is transmitted to the vibration surface through the piezoelectric element receiving portion and the vibration transmitting portion, and the vibration surface is vibrated in a direction orthogonal to a vibration direction in the area expansion vibration mode.

Abstract: Methods and systems for identifying contamination of an electrochemical sensor (10) and cleaning the electrochemical sensor (10) are provided. A method may comprise scanning the sensor (10) for the first time using CV to generate a reference set of readings; scanning the sensor (10) for the second time after the sensor (10) has been employed; comparing a second set of readings from the second CV scan to the reference set of readings; when the second set of readings is different from the reference set of readings, determining that the sensor (10) potential has shifted; scanning the sensor (10) for the third time to clean one or more elements of the sensor (10); scanning the sensor (10) for the fourth time; comparing a fourth set of readings from the fourth CV scan to the second set of readings; and determining that the potential of the sensor (10) has shifted due to pollution of the sensor (10), and/or that the sensor (10) can be further cleaned.

Abstract: Laser processing systems and methods are capable of moving a laser beam while maintaining consistent laser beam characteristics at processing locations. The laser processing systems generate a collimated laser beam having a consistent Z axis power density along at least a portion of a length of the laser beam and dither the collimated laser beam along one of the X and Y axes. The dithering of the collimated laser beam facilitates consistent laser processing on a three-dimensional surface, for example, to provide consistent deposition of a coating in a laser cladding process. A laser processing system may include a beam delivery system that provides both the collimation and the dithering of the collimated laser as well as an adjustment of the beam diameter of the collimated beam.

Abstract: A particle removal tool includes a workpiece holder and an optical tweezer. The workpiece holder is configured to support a workpiece. The optical tweezer is configured to emit a plurality of focused light beams to the workpiece, wherein the plurality of focused light beams are respectively converged to focal points between the optical tweezer and the workpiece, and are configured to take particles away from the workpiece.

Abstract: The invention provides a method for producing a transfer target which is less likely to separate from a substrate or adhere to a mold even when transfer is repeated. The production method includes the steps of: (1) applying a composition containing a fluoropolyether to a release layer of a mold having an uneven pattern on a surface thereof; (2) pressing the mold to a transfer target and transferring the uneven pattern; and (3) releasing the mold from the transfer target, thereby providing the transfer target having a transferred pattern.

Abstract: A method is disclosed, which comprises estimating a first value of a parameter of a component, prior to a use of the component in a reactor. In an example, the parameter of the component is to change during the use of the component in the reactor. The component may be treated, subsequent to the use of the component in the reactor. A second value of the parameter of the component may be estimated, subsequent to treating the component. The second value may be compared with the first value, where a reuse of the component in the reactor is to occur in response to the second value being within a threshold range of the first value.

Abstract: An apparatus (300) for removing contaminant particles (205) from a component (202, 204) of an apparatus (140, MT), the contaminant particles giving rise to an ambient electric field (E), the apparatus comprising: a collection region (301) for attracting the particles, wherein the ambient electric field is at least between the component and the collection region; and an electric field generator configured to establish an applied electric field between the collection region and the component to cause the particles to be transported from the component to the collection region, wherein the electric field generator is configured to determine the polarity of the applied electric field based on the ambient electric field.

Abstract: An extreme ultraviolet light condensation mirror includes: a substrate; a multi-layer reflective film on the substrate and configured to reflect extreme ultraviolet light having a wavelength of 13.5 nm; and a protective film on the multi-layer reflective film. The protective film includes an oxide silicon layer on the multi-layer reflective film and a titanium oxide layer on the oxide silicon layer having one surface exposed. When x represents the thickness of the titanium oxide layer, the phase of standing wave of the extreme ultraviolet light at the position of the one surface for the maximum reflectance of the extreme ultraviolet light is defined to be zero, and a direction from the one surface toward the multi-layer reflective film is defined to be negative, the position of the one surface is a position at which the phase y of standing wave satisfies the expression below. ?0.313x3+1.44x2+2.57x?51.0?y<0.

Abstract: A disinfecting drain trap system for reducing the growth of microorganisms in drain traps, the disinfecting drain trap system comprising at least one heating module, one mechanical vibration module; and an off-centered drain trap, wherein the off-centered drain trap comprises at least one collection portion.