Including Application Of Electrical Radiant Or Wave Energy To Work Patents (Class 134/1)
  • Patent number: 11370703
    Abstract: Described is a method of processing an antimicrobial glass substrate. More particularly, described is a method of removing one or more of silver nitrate or silver oxide on the surface of an antimicrobial glass substrate. Also described is a method of manufacturing a glass substrate that is substantially free of yellow discoloration.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: June 28, 2022
    Assignee: CORNING INCORPORATED
    Inventors: Tien San Chi, Chih Yuan Lu, Cheng-Da Tsai, Yu Ying Tsai, Shan Zhu
  • Patent number: 11361975
    Abstract: A method of fabricating an integrated circuit is disclosed. The method of removing excess metal of a metal interconnection layer during integrated circuit fabrication process comprises the steps of: plasma etching an excess metal portion of the metal interconnection layer using plasma comprising a noble gas, for an etch duration. The method further comprises stopping the etch process prior to the excess metal portion being completely removed and thus prior to a dielectric surface upon which the metal interconnection is formed, becoming completely exposed. The remaining excess metal portion comprising excess metal residues is subsequently removed using a second etch step.
    Type: Grant
    Filed: October 14, 2019
    Date of Patent: June 14, 2022
    Assignee: SPTS Technologies Limited
    Inventors: Tony Wilby, Steve Burgess
  • Patent number: 11352694
    Abstract: A drawing apparatus includes: a drawing part; a cleaning-gas generator; a first valve between the cleaning-gas generator and the drawing part and adjusting a supply amount of gas to the drawing part; a first pressure gauge measuring a pressure in the drawing part; a compensation-gas introducing part introducing compensation-gas to be supplied between the cleaning-gas generator and the first valve; a second valve between the compensation-gas introducing part and the first valve and adjusting a supply amount of the compensation-gas; and a valve controller controlling the first and second valves, wherein the valve controller controls the first valve to supply the cleaning-gas at a predetermined flow rate to the drawing part and controls the second valve to cause a pressure in the drawing part to be a predetermined pressure when the first pressure gauge detects a pressure reduction due to a reduction in a supply flow rate of the cleaning-gas.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: June 7, 2022
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventors: Satoshi Nakahashi, Kaoru Tsuruta
  • Patent number: 11344824
    Abstract: The embodiments of the present disclosure disclose an ultrasonic microbubble generation method, apparatus and system. The apparatus comprises a horn-shaped conductor including an upper horn-shaped body and a lower cylindrical body; the horn-shaped body is provided with a cavity having an upper opening, an upper end of the cavity is fixedly connected with a micropore vibration thin sheet, a micropore array of the micropore vibration thin sheet is corresponding to the upper opening of the cavity, and a side wall of the cavity is provided with a through hole for external gas to enter the cavity; the cylindrical body is provided with a transducing ring and an electrode sheet, an outer side of the cylindrical body is insulated and sealed, and a connection wire of the electrode sheet is led out by a steel pipe and connected with an external ultrasonic oscillation controller.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: May 31, 2022
    Assignee: PetroChina Company Limited
    Inventors: Xinglong Chen, Hongwei Yu, Shi Li, Haishui Han, Zemin Ji
  • Patent number: 11311917
    Abstract: Method and apparatus for identifying a contaminant on a substrate. Identification of a contaminant removed from a substrate can be useful in identifying and eliminating or reducing the source of the contamination and tailoring the removal method to minimize the potential for substrate damage. The methods and apparatus for identification of the contaminant provide liberation of molecules of the contaminant from the surface of the substrate, accounting for different geometries and substrate materials, sample preparation, and chemical analysis of the contaminant.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: April 26, 2022
    Assignee: Bruker Nano, Inc.
    Inventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley, Alexander M. Figliolini
  • Patent number: 11299801
    Abstract: A physical vapor deposition (PVD) target that includes a body composed of material that is reactive with an oxygen containing atmosphere; and a non-reactive cap layer encapsulating at least a sputter surface of the body. The non-reactive cap layer is a barrier obstructing the diffusion of oxygen containing species to the body of the PVD target.
    Type: Grant
    Filed: November 13, 2019
    Date of Patent: April 12, 2022
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Stephen L. Brown, Bruce B. Doris, Mark C. Reuter
  • Patent number: 11302519
    Abstract: Methods of patterning low-k dielectric films are described. In an example, a method of patterning a low-k dielectric film involves forming and patterning a mask layer above a low-k dielectric layer, the low-k dielectric layer disposed above a substrate. The method also involves modifying exposed portions of the low-k dielectric layer with a nitrogen-free plasma process. The method also involves removing, with a remote plasma process, the modified portions of the low-k dielectric layer selective to the mask layer and unmodified portions of the low-k dielectric layer.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: April 12, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Srinivas D. Nemani, Jeremiah T. Pender, Qingjun Zhou, Dmitry Lubomirsky, Sergey G. Belostotskiy
  • Patent number: 11297994
    Abstract: An unattended extraction cleaning machine includes a housing with a bottom portion that is adapted to rest on a surface to be cleaned, a fluid delivery system including a fluid distributor, a fluid extraction system including a suction nozzle, at least one carriage assembly mounting the suction nozzle to the housing for movement with respect thereto and with respect to the surface to be cleaned, and an ultraviolet light mounted on at least one of the housing and the carriage assembly to emit ultraviolet light onto the surface to be cleaned.
    Type: Grant
    Filed: October 2, 2019
    Date of Patent: April 12, 2022
    Assignee: BISSELL Inc.
    Inventors: Phong Hoang Tran, Charles A. Reed, Jr., Jeremy Moog, Eric C. Huffman
  • Patent number: 11298729
    Abstract: The present disclosure relates to a sub-frame cleaning and blow-drying device, comprising a rack, a water tank, a bottom lifting assembly, supporting assemblies, a top lifting assembly, a rotating assembly, an expanding and cleaning-off assembly and a blow-drying device. Expanding assemblies expand to be connected with vehicle body mounting holes, compressed air is blown into the vehicle body mounting holes by air outlets and is blown into a cavity of a sub-frame to clean off aluminum scraps and residual sand in the cavity of the sub-frame, the rotating assembly drives the expanding and cleaning-off assembly and the sub-frame to do rotation movement to perform secondary cleaning, so that the aluminum scraps and the sand remaining inside the cavity can be cleaned off, and the sub-frame cleaning and blow-drying device can be flexibly adjusted by a position adjusting assembly according to different types of sub-frames and is strong in universality.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: April 12, 2022
    Assignee: CITIC Dicastal Co., Ltd.
    Inventors: Huiying Liu, Baojun Shi, Junmeng Li
  • Patent number: 11285539
    Abstract: Provided are methods for preparing iron nanoparticles and to iron nanoparticles produced by those methods. The invention also provides methods for coating the iron nanoparticles with oxides and functionalizing the iron nanoparticles with organic and polymeric ligands. Additionally, the invention provides methods of using such iron nanoparticles.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: March 29, 2022
    Assignees: University of Maryland, College Park, University of Maryland, Baltimore
    Inventors: Zhihong Nie, Radi Masri
  • Patent number: 11286849
    Abstract: A cleaning system and method use an ultrasound probe, a coupling mechanism, and a controller to clean equipment of a vehicle system. The ultrasound probe enters into an engine. The ultrasound probe emits ultrasound pulses and the coupling mechanism provides an ultrasound coupling medium between the ultrasound probe and one or more components of the engine. The controller drives the ultrasound probe to deliver the ultrasound pulse through the coupling medium to a surface of the one or more components of the engine. The ultrasound probe delivers the ultrasound pulse to remove deposits from the one or more components of the engine.
    Type: Grant
    Filed: June 5, 2018
    Date of Patent: March 29, 2022
    Assignee: GENERAL ELECTRIC COMPANY
    Inventors: Bernard Patrick Bewlay, Waseem Ibrahim Faidi, Peter William Lorraine, Mohamed Ahmed Ali, Siavash Yazdanfar, Ying Fan, Edward James Nieters, David Mills, Nicole Jessica Tibbetts, Jr.
  • Patent number: 11273523
    Abstract: A work table for laser processing includes an upper plate including a plurality of cell regions and at least one groove region that divides the plurality of cell regions. The upper plate includes a plurality of absorption holes that fix a substrate in the plurality of cell regions. A plurality of suction holes collect particles generated during a cutting process performed on the substrate. A lower plate is disposed under the upper plate. The lower plate forms an absorption path that is coupled to the plurality of absorption holes. A suction path is coupled to the plurality of suction holes by combining the lower plate with the upper plate.
    Type: Grant
    Filed: September 19, 2017
    Date of Patent: March 15, 2022
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Sungyong Lee, Jaeha Lim, Gyoowan Han
  • Patent number: 11264260
    Abstract: A method is for cleaning an edge ring. The edge ring includes an inner edge ring provided near a substrate mounted on an electrostatic chuck in a processing chamber, a central edge ring that is provided at an outer side of the inner edge ring and vertically movable by a moving mechanism, and an outer edge ring provided at an outer side of the central edge ring. The method includes applying a direct current voltage to the electrostatic chuck, and moving the central edge ring upward or downward.
    Type: Grant
    Filed: May 10, 2019
    Date of Patent: March 1, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Takehiro Tanikawa
  • Patent number: 11253134
    Abstract: A dishwasher includes: a dishwasher body including a tub that defines a washing space and a sump disposed vertically below the tub and configured to accommodate washing water; a heat pump including a compressor, a condenser, an expansion apparatus, and an evaporator; a drain storage unit connected to a drain pipe of the sump and configured to receive washing water discharged from the sump; a drain pipe open-close valve that opens and closes the drain pipe; and a controller that controls the heat pump and the drain pipe open-close valve. The evaporator is configured to exchange heat with the drain storage unit, and the controller controls the drain pipe open-close valve to open the drain pipe to move washing water of the sump to the drain storage unit when the sump is drained.
    Type: Grant
    Filed: November 27, 2019
    Date of Patent: February 22, 2022
    Assignee: LG Electronics Inc.
    Inventors: Sangheon Yoon, Changyoon Jung
  • Patent number: 11235359
    Abstract: Methods, systems, and apparatuses are disclosed for the selective and controlled removal of debris from specific areas of a substrate outer surface without adversely impacting the substrate outer surface, including substrate outer surface coatings, and returning an actual substrate outer surface profile containing affixed debris to a predetermined substrate outer surface profile by comparing a library of predetermined profiles to an actual substrate outer surface profile in real time.
    Type: Grant
    Filed: February 11, 2019
    Date of Patent: February 1, 2022
    Assignee: The Boeing Company
    Inventors: Joseph Andrew Bolton, Keith Daniel Humfeld
  • Patent number: 11239071
    Abstract: A method of processing a semiconductor device including following operation is provided. A substrate is provided. The substrate is then processed with a treating solution, in which the treating solution includes liquid carbon dioxide and an additive. The treating solution is then displaced by a supercritical fluid carbon dioxide. The substrate is then dried by transforming the supercritical fluid carbon dioxide to gaseous carbon dioxide.
    Type: Grant
    Filed: December 3, 2020
    Date of Patent: February 1, 2022
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Jen-I Lai, Chun-Heng Wu
  • Patent number: 11224847
    Abstract: Disclosed is an apparatus and method for providing asymmetric oscillations to a container. The container may include a fluid, a particle, and/or a gas. A vibration driver attached to the container provides asymmetric oscillations. A controller connected to the vibration driver controls an amplitude, frequency, and shape of the asymmetric oscillations. An amplifier amplifies the asymmetric oscillations in response to the controller. A sensor disposed on the vibration driver provides feedback to the controller.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: January 18, 2022
    Inventor: Andrew E. Bloch
  • Patent number: 11225633
    Abstract: A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0×10?10 to 1.0×10?4.
    Type: Grant
    Filed: November 5, 2018
    Date of Patent: January 18, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Tetsuya Kamimura, Tomonori Takahashi
  • Patent number: 11224901
    Abstract: The present invention relates to systems and methods for cleaning of devices, such as heat exchangers. According to the invention, controlled cavitation is created at predetermined positions within a device. The cavitation is done by mechanical waves, such as ultrasound waves, generated by transducers, wherein the waves are based on output of time-reversal wave form analysis of the device structures.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: January 18, 2022
    Assignee: ALTUM TECHNOLOGIES OY
    Inventors: Edward Haeggström, Timo Rauhala, Petro Moilanen, Ari Salmi
  • Patent number: 11228276
    Abstract: A system for ultrasonic cleaning of a solar panel includes a plurality of microelectromechanical systems (MEMS) ultrasonic transducers arranged on a side wall of the solar panel and/or under transparent glass on a surface of the solar panel; a hydraulic sun tracking mechanism configured to move the solar panel into a plurality of positions; a valve connected to a water source; and a controller which controls the plurality MEMS ultrasonic transducers, the sun tracking mechanism, and the valve, wherein the controller is configured to activate a cleaning protocol comprising the steps of moving the solar panel into a substantially horizontal position; opening the valve to allow a water flow over the surface of the solar panel; activating the plurality of MEMS ultrasonic transducers to apply ultrasonic waves to the water on the surface of the solar panel, wherein signal interference from different transducers are controlled to generate a rotating focused ultrasound signal over the surface of the solar panel; and m
    Type: Grant
    Filed: July 27, 2021
    Date of Patent: January 18, 2022
    Assignee: KING ABDULAZIZ UNIVERSITY
    Inventors: Ahmed Elseddawy, Hatem Sindi, Maher Azzouz
  • Patent number: 11222794
    Abstract: The present disclosure provides a semiconductor fabrication apparatus. The semiconductor apparatus includes a processing chamber for etching; a substrate stage integrated in the processing chamber and being configured to secure a semiconductor wafer; a reflective mirror configured inside the processing chamber to reflect thermal energy from the heating mechanism toward the semiconductor wafer; and a heating mechanism embedded in the process chamber and is operable to perform a baking process to remove a by-product generated during the etching. The heating mechanism is integrated between the reflective mirror and a gas distribution plate of the processing chamber.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: January 11, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Han-Yu Lin, Yi-Ruei Jhan, Fang-Wei Lee, Li-Te Lin, Pinyen Lin, Tze-Chung Lin
  • Patent number: 11205658
    Abstract: Embodiments of a three-dimensional (3D) memory device with a corrosion-resistant composite spacer and method for forming the same are disclosed. In an example, a 3D memory device includes a substrate, a memory stack disposed on the substrate and including a plurality of conductor/dielectric layer pairs, a plurality of memory strings each extending vertically through the memory stack, a slit contact disposed laterally between the plurality of memory strings, and a composite spacer disposed laterally between the slit contact and at least one of the memory strings. The composite spacer includes a first silicon oxide film, a second silicon oxide film, and a dielectric film disposed laterally between the first silicon oxide film and the second silicon oxide film.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: December 21, 2021
    Assignee: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
    Inventors: Bo Xu, Ping Yan, Chuan Yang, Jing Gao, Zongliang Huo, Lu Zhang
  • Patent number: 11198626
    Abstract: An apparatus for producing conditioned water configured to add a pH adjuster and/or a redox potential regulator to ultrapure water to produce conditioned water, the generator including: a chemical tank configured to store a chemical solution containing the pH adjuster and/or the redox potential regulator; a chemical injection pipe configured to inject the chemical solution in the chemical tank into the ultrapure water; and a degassing device configured to degas the chemical solution injected into the ultrapure water. When producing conditioned water useful as wash water for semiconductor wafers by adding a pH adjuster and/or a redox potential regulator into ultrapure water, the present invention can solve problems such as incorporation of DO from the chemical solution, injection failure and measurement failure of the flow meter due to foaming of the chemical solution, thereby enabling stable production of conditioned water with a low DO concentration and high water quality.
    Type: Grant
    Filed: September 12, 2017
    Date of Patent: December 14, 2021
    Assignee: KURITA WATER INDUSTRIES LTD.
    Inventor: Tooru Masaoka
  • Patent number: 11195731
    Abstract: A substrate processing device includes a substrate holding table, an ultraviolet irradiator, a tubular member, a first gas supplying unit, and a second gas supplying unit. The ultraviolet irradiator is disposed facing to the substrate through an active space and configured to irradiate the substrate with ultraviolet light. The tubular member includes an inner surface surrounding a side surface of the substrate holding table, and at least one opening at a position facing to the side surface on the inner surface. The first gas supplying unit supplies gas to a space between the side surface of the substrate holding table and the inner surface of the tubular member through the at least one opening. The second gas supplying unit supplies gas to an active space between the substrate and the ultraviolet irradiator.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: December 7, 2021
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Masafumi Inoue, Akihiko Taki, Hiroki Taniguchi, Takayoshi Tanaka, Yuta Nakano
  • Patent number: 11191873
    Abstract: A method for processing a biomedical material using a supercritical fluid includes introducing the supercritical fluid into a cavity. The supercritical fluid is doped with a hydrogen isotope-labeled compound, an organic metal compound, an element selecting from a halogen element, oxygen, sulfur, selenium, phosphorus or arsenic, or a compound containing the element. The biomedical material in the cavity is modified by the supercritical fluid at a temperature above a critical temperature of the supercritical fluid and a pressure above a critical pressure of the supercritical fluid.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: December 7, 2021
    Assignee: NATIONAL SUN YAT-SEN UNIVERSITY
    Inventors: Ting-Chang Chang, Kuan-Chang Chang, Chih-Cheng Shih, Chih-Hung Pan, Chih-Yang Lin
  • Patent number: 11173518
    Abstract: An in-line process for reusing printed cans is disclosed. The process includes positioning a printed can in front of a laser, the printed can having existing-print on an outer surface of the printed can. And, irradiating the outer surface of the printed can with laser radiation to remove 10% to 90% of the existing-print from the printed can and thereby form a lightened-printed can. And further, coating the outer surface of the lightened-printed can with a masking agent to form a blank-reprintable can. Finally, optionally, printing a new print-pattern on the outer surface of the blank-reprintable can to form a newly-printed can.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: November 16, 2021
    Assignee: WilCraft Can, LLC
    Inventors: Sean P. Kingston, Matthew L. Koele, Benjamin T. White
  • Patent number: 11173526
    Abstract: In one embodiment, systems and methods include using an automated laser system to remove a portion of a coating for nutplate installation. An automated laser system comprises a laser scanner and a laser head, wherein the laser head is coupled to the laser scanner. The laser head comprises a containment unit and a vacuum connector wherein the vacuum connector is disposed on a first side of the containment unit. The laser head further comprises a camera system, a light source, a first actuator, and a second actuator all disposed on a top surface of the containment unit. The laser head further comprises an end piece, wherein the second actuator is configured to displace the end piece.
    Type: Grant
    Filed: January 30, 2020
    Date of Patent: November 16, 2021
    Assignee: Lockheed Martin Corporation
    Inventors: David Haynes Coleman, Michael Bryan Stoddard, Jeffrey P. Langevin, Steven E. Twaddle, Alexandria Zoe Arthur
  • Patent number: 11154914
    Abstract: An ultrasonic transducer includes: a piezoelectric element having a plate-like shape and an area expansion vibration mode; and a vibration surface separated from main surfaces thereof and arranged in parallel to the main surfaces so as to be brought into contact with a liquid; a piezoelectric element receiving portion held in contact with a side surface of the piezoelectric element and configured to fix the piezoelectric element; and a vibration transmitting portion; and the vibration member having a space for surrounding the main surface formed by the vibration surface, the piezoelectric element receiving portion, and the vibration transmitting portion, wherein a vibration generated by the piezoelectric element is transmitted to the vibration surface through the piezoelectric element receiving portion and the vibration transmitting portion, and the vibration surface is vibrated in a direction orthogonal to a vibration direction in the area expansion vibration mode.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: October 26, 2021
    Assignee: KAIJO CORPORATION
    Inventor: Akihisa Nakano
  • Patent number: 11154913
    Abstract: A substrate processing method includes a vapor atmosphere filling step of filling surroundings of a liquid film of a processing liquid with a vapor atmosphere containing a vapor of a low surface tension liquid that has a lower surface tension than the processing liquid, a dry region forming step of forming a dry region in the liquid film of the processing liquid by partially excluding the processing liquid while spraying a gas containing the vapor of the low surface tension liquid onto the liquid film of the processing liquid in parallel with the vapor atmosphere filling step, and a dry region expanding step of expanding the dry region toward an outer periphery of a substrate while rotating the substrate in parallel with the vapor atmosphere filling step.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: October 26, 2021
    Inventor: Masayuki Otsuji
  • Patent number: 11150210
    Abstract: Methods and systems for identifying contamination of an electrochemical sensor (10) and cleaning the electrochemical sensor (10) are provided. A method may comprise scanning the sensor (10) for the first time using CV to generate a reference set of readings; scanning the sensor (10) for the second time after the sensor (10) has been employed; comparing a second set of readings from the second CV scan to the reference set of readings; when the second set of readings is different from the reference set of readings, determining that the sensor (10) potential has shifted; scanning the sensor (10) for the third time to clean one or more elements of the sensor (10); scanning the sensor (10) for the fourth time; comparing a fourth set of readings from the fourth CV scan to the second set of readings; and determining that the potential of the sensor (10) has shifted due to pollution of the sensor (10), and/or that the sensor (10) can be further cleaned.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: October 19, 2021
    Assignee: Honeywell International Inc.
    Inventors: Yuzhong Yu, Ling Liu, Feng Liang
  • Patent number: 11141815
    Abstract: Laser processing systems and methods are capable of moving a laser beam while maintaining consistent laser beam characteristics at processing locations. The laser processing systems generate a collimated laser beam having a consistent Z axis power density along at least a portion of a length of the laser beam and dither the collimated laser beam along one of the X and Y axes. The dithering of the collimated laser beam facilitates consistent laser processing on a three-dimensional surface, for example, to provide consistent deposition of a coating in a laser cladding process. A laser processing system may include a beam delivery system that provides both the collimation and the dithering of the collimated laser as well as an adjustment of the beam diameter of the collimated beam.
    Type: Grant
    Filed: September 24, 2014
    Date of Patent: October 12, 2021
    Assignee: IPG PHOTONICS CORPORATION
    Inventors: Joseph Leo Dallarosa, Ben Amar, David Squires
  • Patent number: 11145427
    Abstract: A particle removal tool includes a workpiece holder and an optical tweezer. The workpiece holder is configured to support a workpiece. The optical tweezer is configured to emit a plurality of focused light beams to the workpiece, wherein the plurality of focused light beams are respectively converged to focal points between the optical tweezer and the workpiece, and are configured to take particles away from the workpiece.
    Type: Grant
    Filed: July 1, 2020
    Date of Patent: October 12, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventor: Yu-Liang Tseng
  • Patent number: 11139151
    Abstract: A method is disclosed, which comprises estimating a first value of a parameter of a component, prior to a use of the component in a reactor. In an example, the parameter of the component is to change during the use of the component in the reactor. The component may be treated, subsequent to the use of the component in the reactor. A second value of the parameter of the component may be estimated, subsequent to treating the component. The second value may be compared with the first value, where a reuse of the component in the reactor is to occur in response to the second value being within a threshold range of the first value.
    Type: Grant
    Filed: March 15, 2018
    Date of Patent: October 5, 2021
    Assignee: Intel Corporation
    Inventors: Patrick Whiting, Jeffrey L. Young, Ryan Wood, Eric Scott, David Laube, Alex Collins
  • Patent number: 11135761
    Abstract: The invention provides a method for producing a transfer target which is less likely to separate from a substrate or adhere to a mold even when transfer is repeated. The production method includes the steps of: (1) applying a composition containing a fluoropolyether to a release layer of a mold having an uneven pattern on a surface thereof; (2) pressing the mold to a transfer target and transferring the uneven pattern; and (3) releasing the mold from the transfer target, thereby providing the transfer target having a transferred pattern.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: October 5, 2021
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo Yamashita, Eiji Sakamoto, Kakeru Hanabusa, Saya Nil, Takayuki Araki
  • Patent number: 11123773
    Abstract: An apparatus (300) for removing contaminant particles (205) from a component (202, 204) of an apparatus (140, MT), the contaminant particles giving rise to an ambient electric field (E), the apparatus comprising: a collection region (301) for attracting the particles, wherein the ambient electric field is at least between the component and the collection region; and an electric field generator configured to establish an applied electric field between the collection region and the component to cause the particles to be transported from the component to the collection region, wherein the electric field generator is configured to determine the polarity of the applied electric field based on the ambient electric field.
    Type: Grant
    Filed: December 27, 2018
    Date of Patent: September 21, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Tim Peter Johan Gerard Maas, Bartolomeus Martinus Johannes Van Hout, Henricus Wilhelmus Maria Van Buel, Floris Zoethout
  • Patent number: 11119421
    Abstract: An extreme ultraviolet light condensation mirror includes: a substrate; a multi-layer reflective film on the substrate and configured to reflect extreme ultraviolet light having a wavelength of 13.5 nm; and a protective film on the multi-layer reflective film. The protective film includes an oxide silicon layer on the multi-layer reflective film and a titanium oxide layer on the oxide silicon layer having one surface exposed. When x represents the thickness of the titanium oxide layer, the phase of standing wave of the extreme ultraviolet light at the position of the one surface for the maximum reflectance of the extreme ultraviolet light is defined to be zero, and a direction from the one surface toward the multi-layer reflective film is defined to be negative, the position of the one surface is a position at which the phase y of standing wave satisfies the expression below. ?0.313x3+1.44x2+2.57x?51.0?y<0.
    Type: Grant
    Filed: August 27, 2020
    Date of Patent: September 14, 2021
    Assignee: Gigaphoton Inc.
    Inventor: Tomoyoshi Toida
  • Patent number: 11111657
    Abstract: A disinfecting drain trap system for reducing the growth of microorganisms in drain traps, the disinfecting drain trap system comprising at least one heating module, one mechanical vibration module; and an off-centered drain trap, wherein the off-centered drain trap comprises at least one collection portion.
    Type: Grant
    Filed: April 11, 2019
    Date of Patent: September 7, 2021
    Assignee: THE GOLD KIDS TRUST
    Inventor: Mitchell K. Goldberg
  • Patent number: 11114317
    Abstract: Provided is a method for cleaning a semiconductor wafer which can effectively reduce deposits on a main surface of a wafer. A method for cleaning a semiconductor wafer of the present disclosure includes supplying ozone water into a cleaning tank from a lower part of the cleaning tank with the ozone water overflowing from the upper part of the cleaning tank to outside the cleaning tank (first step), subsequently, stopping a supply of the ozone water (second step), subsequently, immersing a semiconductor wafer into the ozone water in the cleaning tank (third step), and subsequently, resupplying the ozone water into the cleaning tank from the lower part of the cleaning tank with the ozone water overflowing again from the upper part of the cleaning tank to outside the cleaning tank (fourth step).
    Type: Grant
    Filed: June 14, 2019
    Date of Patent: September 7, 2021
    Assignee: SUMCO CORPORATION
    Inventor: Katsuro Wakasugi
  • Patent number: 11104155
    Abstract: The method and apparatus for protecting the printhead heating elements in a thermal printer includes preparing the printer for label dispensing and then covering the printhead heating elements such that the label run or thermal material passing over the same does not contact the printhead heating elements. The cover for the printhead heating elements can take various forms. In one implementation, the cover is a sleeve configured to fit over the entire printhead assembly of the thermal printer. In another implementation, the cover is a shim placed between the printhead and a label run path. The printhead cover has a low coefficient of friction.
    Type: Grant
    Filed: May 19, 2020
    Date of Patent: August 31, 2021
    Assignee: HURST INTERNATIONAL, LLC
    Inventor: Ari Lichtenberg
  • Patent number: 11101141
    Abstract: A method for reducing defects of an electronic component using a supercritical fluid includes recrystallizing and rearranging grains in the electronic component by introducing the supercritical fluid doped with H2S together with an electromagnetic wave into a cavity. The cavity has a temperature above a critical temperature of the supercritical fluid and a pressure above a critical pressure of the supercritical fluid.
    Type: Grant
    Filed: July 15, 2019
    Date of Patent: August 24, 2021
    Assignee: NATIONAL SUN YAT-SEN UNIVERSITY KZ
    Inventors: Ting-Chang Chang, Kuan-Chang Chang, Chih-Cheng Shih, Chih-Hung Pan
  • Patent number: 11102889
    Abstract: Provided are a desmearing method and a desmearing device which are able to reliably remove a smear derived from any of an inorganic substance and an organic substance, and eliminate the need to use a chemical that requires a waste liquid treatment. The desmearing method of the present invention is directed to a desmearing method for a wiring substrate material that is a laminated body of insulating layers made from resin containing a filler and a conductive layer, and includes an ultraviolet irradiation treatment step for irradiating the wiring substrate material with ultraviolet beams with a wavelength of 220 nm or less, and a physical vibration treatment step for applying physical vibrations to the wiring substrate material which has undergone the ultraviolet irradiation treatment step.
    Type: Grant
    Filed: December 26, 2013
    Date of Patent: August 24, 2021
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Kenichi Hirose, Hiroki Horibe, Tomoyuki Habu, Shinichi Endo
  • Patent number: 11084069
    Abstract: According to one embodiment, a chuck cleaner includes a support, an adhesive layer, and a support substrate. The support includes a first portion, a second portion, and a third portion provided between the first portion and the second portion. The support substrate is provided between the support and the adhesive layer. The support substrate includes a first region fixed to the first portion, a second region fixed to the second portion, a third region provided between the first region and the second region and having variable distance from the third portion, a fourth region provided between the first region and the third region and separated from the support, and a fifth region provided between the second region and the third region and separated from the support.
    Type: Grant
    Filed: November 13, 2018
    Date of Patent: August 10, 2021
    Assignee: KIOXIA CORPORATION
    Inventors: Yoshihito Kobayashi, Masamitsu Ito
  • Patent number: 11072997
    Abstract: A pressure shock wave apparatus applies shock waves to separate substances, such as oil, from a water mixture in an enclosure. The substance, such as oil, is moved toward a substance removal conduit and the water moved toward a water conduit from action of the shock wave apparatus.
    Type: Grant
    Filed: March 27, 2019
    Date of Patent: July 27, 2021
    Assignee: SANUWAVE, INC.
    Inventors: Iulian Cioanta, Cary McGhin
  • Patent number: 11073687
    Abstract: Methods and systems for cleaning an optic include cleaning an optic with ultrasonic vibrations. The locations of nodes in a standing wave of the ultrasonic vibrations are changed by changing a frequency of vibration during cleaning.
    Type: Grant
    Filed: November 1, 2019
    Date of Patent: July 27, 2021
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Guy M. Cohen, Lior Horesh, Raya Horesh, Theodore G. van Kessel, Robert L. Wisnieff
  • Patent number: 11069521
    Abstract: Various embodiments comprise apparatuses and related methods for cleaning a substrate. In one embodiment, an apparatus includes a substrate holder to hold and rotate the substrate at various speeds. An optional inner shield and an optional outer shield, when in a closed position, surround the substrate holder during operation of the apparatus. Each of the inner shield and the outer shield can operate independently in at least one of rotational speed and direction from the other shield. At least one of a front-side laser and a back-side laser are arranged to clean one or both sides of the substrate and edges of the substrate substantially concurrently or independently by impinging a light onto at least one surface of the substrate. A gas flow, combined with a high rotational-speed of the shields and substrate, assists in removing effluents from the substrate. Additional apparatuses and methods of forming the apparatuses are disclosed.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: July 20, 2021
    Assignee: Planar Semiconductor, Inc.
    Inventors: Rubinder S. Randhawa, Harry Christov
  • Patent number: 11062898
    Abstract: A particle removal apparatus is provided. The particle removal apparatus includes a reticle holder configured to hold a reticle. The particle removal apparatus further includes a robotic arm. The particle removal apparatus also includes a particle removal device disposed on the robotic arm, and the particle removal device includes a solution spraying module. In addition, the robotic arm and the particle removal device are configured to align with a particle on a backside of the reticle, and the solution spraying module is configured to spray a solution onto the particle to remove the particle.
    Type: Grant
    Filed: November 7, 2018
    Date of Patent: July 13, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Siao-Chian Huang, Po-Chung Cheng, Ching-Juinn Huang, Tzung-Chi Fu, Tsung-Yen Lee
  • Patent number: 11053464
    Abstract: A method and composition for removing contaminant material from industrial equipment are disclosed herein. The method includes providing a solvent composition having methyl soyate, N-methylpyrrolidinone, an additional solvent, and a cationic surfactant. The method also includes contacting the contaminant material with the solvent composition and allowing the solvent composition to react with the contaminant material such that at least a portion of the contaminant material is no longer attached to the industrial equipment.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: July 6, 2021
    Assignee: United Laboratories International, LLC
    Inventors: Stephen D. Matza, Dana M. Archuleta
  • Patent number: 11052567
    Abstract: The present invention relates to an improved method for impregnating a porous material, such as wood, more specifically a method in which an active ingredient to be deposited within the porous material is dissolved in condensed carbon dioxide and impregnated in the material.
    Type: Grant
    Filed: December 4, 2018
    Date of Patent: July 6, 2021
    Inventors: Benny Petersen, Finn Imsgard, Anders Westh Kjellow, João Luis Beja Fernandes
  • Patent number: 11056371
    Abstract: A method includes transmitting a radiation toward an electrostatic chuck, receiving a reflection of the radiation, analyzing the reflection of the radiation, determining whether a particle is present on the electrostatic chuck based on the analyzing the reflection of the radiation, and moving a cleaning tool to a location of the particle on the electrostatic chuck when the determination determines that the particle is present.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: July 6, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yueh-Lin Yang, Chi-Hung Liao
  • Patent number: 11043377
    Abstract: Described herein is a technique capable of selectively forming a film in a film-forming step. According to one aspect of the technique, there is provided a method of manufacturing a semiconductor device including: (a) selectively forming a film on a substrate by supplying a process gas into a process chamber accommodating the substrate, wherein an inhibitor layer is formed on a portion of the substrate such that the substrate acquires a selectivity in an adsorption of the process gas; (b) supplying a cleaning gas containing a component contained in the inhibitor layer into the process chamber accommodating no substrate; and (c) removing a residual component of the cleaning gas in the process chamber.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: June 22, 2021
    Assignee: Kokusai Electric Corporation
    Inventors: Naofumi Ohashi, Yoshiro Hirose