Abstract: A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being cleaned, even at high rotational speeds. The rotatable wafer supporting assembly may include wafer holding mechanisms with pivotable confining members that are configured to hold the substrate using centrifugal force when the wafer supporting assembly is rotated. In an embodiment, the cleaning system may include a positioning system operatively connected to an acoustic transducer to provide meaningful control of the acoustic energy applied to a surface of the substrate by selectively changing the distance between the acoustic transducer and the substrate surface so that the substrate can be cleaned more effectively.

Abstract: The dispensing end of a concrete handling mechanism is positioned over a catch basin while a stream of washing water is directed at the working surfaces thereof so that the wash residue falls into the basin. The agitated liquid portion containing the reactive constituents of the concrete entrained therein are then passed into a collection enclosure through slotted filter housings that exclude the larger constituents of the concrete including sand and aggregate which further accumulate at the slots to form decanting weirs over which the liquid passes. The liquid collected in the enclosure may be concurrently pumped out while the accumulated aggregate residue is collected and disposed.

Abstract: The invention concerns an arrangement for ultrasound cleaning of several strandlike articles (4) traveling next to each other, such as, e.g., wires, profiles and pipes, by means of a liquid excited by ultrasound in a borehole (3), which is only slightly, i.e., around 5-50%, larger than the diameter of the article being cleaned, wherein the cleaning liquid is supplied to the boreholes (3) in such a way that it fills them completely.

Abstract: An ultrasonic cleaner is provided with a user interface, display, and a solution timer unit that tracks the amount of time cleaning solution has been in use. The solution life is displayed in hours and minutes that can be adjusted or reset by an operator. The ultrasonic cleaner includes a solution reset key conspicuously located on a control panel that is mounted on a housing of the ultrasonic cleaner. An operator may periodically check how long the solution has been in use by simply looking at a screen displaying the time elapsed since the beginning of the period. The display may also indicate cleaning cycle times and status, such as the completion of a cleaning cycle; and the user interface may allow the operator to set cleaning cycle parameters, such as cleaning cycle time.

Abstract: A substrate cleaning method can uniformly removing particles from substrates at a high removing efficiency. The substrate cleaning method includes the steps of immersing substrates W in a cleaning liquid in a cleaning tank 12, and generating ultrasonic waves in the cleaning liquid contained in the cleaning tank. A region in the cleaning tank toward which the cleaning liquid is supplied is varied with respect to a vertical level in the step of generating ultrasonic waves in the cleaning liquid while the cleaning liquid is being supplied into the cleaning tank.

Abstract: A system for cleaning and sanitizing a food preparation area is provided. The system includes a retractable hose device, including a hose and a device for retracting the hose, and a fluid directing nozzle connected to the hose. A proportioning device is connected to the hose which includes a first input for receiving one or more of a cleaning agent and a sanitizing agent, and a second input for connection to a supply of diluent.

Abstract: A megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate is provided. The apparatus includes a megasonic probe, a transducer configured to energize the probe, and a heat transfer element disposed between the transducer and the probe. The heat transfer element may be configured to direct the sonic energy from the transducer toward specific areas of the probe so as to reduce the effect of normal-incident waves relative to shallow-angle waves. Alternatively, a rear end face of the probe may be configured for this purpose. Another embodiment provides a coupler disposed between the heat transfer element and the rear end face of the probe for directing the sonic energy from the transducer toward specific areas of the probe.

Abstract: A domestic appliance includes a pump that establishes and directs a flow of washing fluid into a tub during a washing operation. The pump includes a pump housing having a rigid main body portion that defines an inlet section and an outlet section, as well as a plurality of resilient members that are over-molded onto the inlet and outlet sections. The rigid main body portion includes a mounting element for supporting the pump. An insulation grommet is positioned in the mounting element to minimize any transfer of vibration from the pump to the appliance. The inlet nipple, outlet nipple and insulation grommet are joined through a plurality of web members. The rigid main body also includes a secondary outlet section that is adapted to directly receive a hose or is connected to a hose through a secondary outlet nipple.

Abstract: A system and method for the collection of waste water generated in the course of maintenance or washing of a large object in an open-air, outdoor environment. The system, in its simplest form, includes a wash deck having a drain located within a valley of the deck, an interceptor drain for separation of particulates and sludge from the wash fluid, an actuator, that is responsive to changes in hydraulic pressure of wash water supply, for opening and closing a waste stream control valve and a waste steam control valve intermediate between the interceptor drain and a sanitary sewer connection. The system of this invention operates independent of elaborate controls and any external power source. Thus, it can be used in relatively remote locations and/or installed in areas where electricity is unavailable, or the presence of electrical current would be incompatible with safety of livestock or thoroughbred race horse.

Abstract: A method of treating an instrument after contamination of a surface thereof includes the steps of covering the surface with a foam and maintaining the foam on the surface to keep the surface moist prior to cleaning the instrument to prevent foreign matter thereon from becoming dried on and more difficult to remove during cleaning. The foam includes hydrogen peroxide, dissolves blood and provides antimicrobial effect.

Abstract: This invention is related to an apparatus for treating substrates. According to the present invention, the substrate is cleaned by injecting high temperature and high pressure steam on substrate. A steam generator is configured to continually provide steam on substrate. After cleaning by steam, cleaning by brush may be followed.

Abstract: Embodiments in accordance with the present invention provide straightening plates at the upstream side of a cleaning tank and a straightening plate at the downstream side of the object to be cleaned. Apertures are arranged in the planes of the respective straightening plates. An aperture ratio of the upstream straightening plates is set larger than the ratio of the downstream straightening plate. For example, the aperture ratio of the upstream straightening plate may be set at a value between 10% and 25%, and the aperture ratio of the downstream straightening plate is set at a value between 2.5% and 10%. With this, the flow of liquid in the cleaning chamber sandwiched between the upstream and downstream straightening plates can be brought to a pseudo-laminar flow. Contaminants separated from the object to be cleaned are moved quickly to the discharge chamber and are removed by a filter.

Abstract: A surface cleaning system having a storage container, debris collection apparatus and debris conduit is disclosed. Water discharged from spray nozzles configured in a circular arrangement forces debris into a debris collection ring and then a debris conduit. An auger, water pressure or air pressure is used to force the debris through debris conduit into the storage container for disposal. The design of the debris collection apparatus also facilitates the capture of most of the water used to force the debris into the debris collection apparatus. Accordingly, the system is able to reuse the water thereby extending the surface area that may be cleaned with a specified amount of water.

Abstract: A device for washing and storing machinery is provided. This device includes a storage apparatus and a washing apparatus formed integrally with the storage apparatus. The storage apparatus further includes: a housing defining an internal chamber therein; a base attached to the bottom portion of the housing, wherein the base further includes at least one aperture formed therein; a debris tray attached to the base, wherein a portion of the tray is positionable beneath the aperture formed in the base; and a door for gaining access to the internal chamber, wherein the door further includes a floating upper portion and a lower portion connected to the base. The washing apparatus further includes: a plurality of directional sprayers, wherein the plurality of directional sprayers are located within the housing and the base; and plumbing for connecting the plurality of sprayers to one another and to a source of pressurized fluid.

Abstract: A shockwave cleaning apparatus cleans one or more surfaces within a vessel. A sensor senses one or more thermodynamic properties associated with the vessel. A control system is coupled to an initiator and a fuel/oxidizer source to control the firing of the apparatus responsive to input from the sensor.

Abstract: The lift/immersion system for treating, particularly cleaning, workpieces, comprises a housing into which a treatment liquid, particularly a cleaning liquid, can be filled which forms an immersion bath in the housing, further comprising a lift device and a lift table connected thereto and provided with passage openings, on which the workpieces can be placed, and which during the treatment process is movable upwards and downwards through the immersion bath. The lift/immersion bath is characterized in that under the lift table a baffle plate is attached which during the treatment process is moved upwards and downwards in a section of the immersion bath with a small lateral play, so that treatment liquid is displaced during the downward movement and directed onto the workpieces with formation of turbulences in the immersion bath. This considerably intensifies the action of the immersion bath on the articles.

Abstract: A method for processing a substrate is provided that includes generating a fluid meniscus on a surface of the substrate and applying acoustic energy to the fluid meniscus. The method also includes moving the fluid meniscus over the surface the substrate to process the surface of the substrate.

Abstract: A stirring nozzle used in an apparatus for abrasive wire cleaning. The stirring nozzles can be used in series to create multiple cleaning steps wherein fresh cleaning compound contacts the wire to be cleaned. The cleaning apparatus moves both the wire and an abrasive cleaning compound through the interior of the stirring nozzles. At the exit end of each stirring nozzle, cleaning compound is moved outward from the wire path. At the inlet end of each stirring nozzle, cleaning compound is moved inward toward the wire path. The sequential in-and-out movement mixes the cleaning compound.

Abstract: An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry the wafers, a liquid supply nozzle for supplying cleaning liquid into the chamber and a discharge system. The spray pipe of the bubbler has a liquid retention portion that keeps condensate of the alcohol vapor from issuing into the chamber. The gas supply nozzle has a spray outlet configured to spray the same amount of the drying gas onto all of the wafers in the chamber. The liquid supply nozzle has liquid supply openings only in a side portion thereof so that liquid alcohol will not become trapped therein.

Abstract: A circuit board processing system includes a wash tank configured to contain cleaning fluid, and a positioning subsystem configured to immerse a set of circuit boards into the wash tank. The system further includes a flow control subsystem having (i) a first set of nozzles disposed within the wash tank, (ii) a second set of nozzles disposed within the wash tank, and (iii) a controller. The controller is configured to direct the cleaning fluid through the first set of nozzles to provide a flow of the cleaning fluid in a first direction relative to the set of circuit boards. The controller is further configured to direct the cleaning fluid through a second set of nozzles to provide a flow of the cleaning fluid in a second direction relative to the set of circuit boards after providing the flow of the cleaning fluid in the first direction.

Abstract: An apparatus to produce acoustic cavitation by controlling cavitation events in a liquid insonification medium utilizing a waveform to excite a transducer with a series of bipolar inharmonic tone bursts having medium recovery intervals between respective bursts so that the medium repeatedly recovers from cavitation events between bursts. The apparatus may be used to clean a semiconductor wafer, to de-coat a painted surface having, to induce a chemical reaction, and/or to provide recycled paper made from inked paper de-inked by cavitation. Cavitation events are generated using a transducer and a waveform generator, e.g., square wave tone bursts, to excite the transducer with a signal controlled in frequency, burst repetition rate, duty-cycle and/or amplitude, e.g., utilizing bursts having a frequency between 500 KHz and 10 MHz, and a duty cycle between 0.1% and 70%.

Abstract: An ultrasonic cleaner apparatus is disclosed which includes a support housing, a tub supported by the housing and an ultrasound and sensor transducer contacting the bottom of the cleaning tank. A fixture assembly for holding items to be cleaned is configured for insertion into the cleaning tank. The fixture assembly comprises a predetermined number of slots, which are positioned around the perimeter of a pair of end disks disposed on the fixture assembly. The slots are configured to receive the distal ends of slats or other items to be cleaned. Rotation of the fixture assembly in the cleaning solution and ultrasonic energy effectively cleans the items while the fixture assembly securely holds the items during cleaning, rinsing and drying.

Abstract: A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion.

Abstract: A system, apparatus and method for processing this flat articles, such as semiconductor wafers, with acoustical energy. In a cleaning process, the inventive system, apparatus and method can remove particles from both sides of a wafer more efficiently and effectively.

Abstract: A method for making a solution for use in preparing a surface of a substrate is provided. The method includes providing a continuous medium that adds a polymer material to the continuous medium. A fatty acid is adding to the continuous medium having the polymer material, and the polymer material defines a physical network that exerts forces in the solution that overcome buoyancy forces experienced by the fatty acid, thus preventing the fatty acids from moving within the solution until a yield stress of the polymer material is exceeded by an applied agitation. The applied agitation is from transporting the solution from a container to a preparation station that applies the solution to the surface of the substrate.

Abstract: A transducer for use in an acoustic energy cleaner is provided. The transducer includes a resonator and a plurality of crystals bonded to a surface of the resonator. The plurality of crystals is configured to be bonded to the surface of the resonator in a staggered arrangement with respect to each other. In one embodiment, the plurality of crystals is bonded to the surface of the resonator in a horizontally staggered arrangement. In another embodiment, the plurality of crystals is bonded to the surface of the resonator in a vertically staggered arrangement.

Abstract: A supercritical CO2 cleaning system is provided, comprising: a closed high-pressure cleaning trough, which is a funnel-shaped vessel tapered from top to bottom; a bearer platform, located within the closed high-pressure cleaning trough and rotated with respect to an object to be cleaned and used for bearing the object to be cleaned; and a movable nozzle set, disposed within the closed high-pressure cleaning trough and above the bearer platform, wherein the object to be cleaned can be cleaned via the movable nozzle set and impurity pollutants will be easily deposited at the bottom of the closed high-pressure cleaning trough after cleaning.

Abstract: A method of washing dishes in a dishwasher that includes a Start Stop sequence in a wash segment of one or more of the dishwashing cycles. The Stop Start sequence includes the steps of pausing the operation of the wash pump, operating the wash pump to circulate wash water in the dishwasher for a short period of time, and repeating the steps of pausing and operating the wash pump for a short period of time a predetermined number of times. The Stop Start sequence is preceded by, and may be followed by, a period of continuous operation of the wash pump.

Abstract: A cleansing apparatus comprising: a table 3 for supporting a semiconductor substrate 30 horizontally; a high frequency solution injector 20 capable of injecting a solution to the upper surface 30a and the side surface 30c of the semiconductor substrate 30 supported by the table 3 with the application of vibration at high frequency; a cover 2 capable of tightly enclosing the semiconductor substrate 30 supported by the table 3; and pressure reducing means 18 for reducing the pressure in a space, in which the semiconductor substrate 30 is enclosed with the cover 2. The semiconductor substrate can be cleansed efficiently at a low cost and kept in clean state after the cleansing until it is dried.

Abstract: An apparatus and a method is provided for using high-frequency acoustic energy with a supercritical fluid to perform a semiconductor wafer (“wafer”) cleaning process. High-frequency acoustic energy is applied to the supercritical fluid to impart energy to particulate contamination present on the wafer surface. Energy imparted to particulate contamination via the high-frequency acoustic energy and supercritical fluid is used to dislodge and remove the particulate contamination from the wafer. Additionally, the wafer cleaning process benefits from the supercritical fluid properties of near zero surface tension, high diffusivity, high density, and chemical mixing capability.

Abstract: A method of cleaning a substrate comprises placing the substrate on a rotating fixture, placing a liquid on at least one side of the substrate, and creating a standing wave of megasonic energy oriented generally parallel to the substrate. The standing wave generates an associated pattern of high-agitation regions in the liquid. The method further comprises moving the standing wave back-and-forth so as to move the pattern of high-agitation regions about with respect to the substrate. An apparatus for cleaning substrates comprises a support to rotate the substrate about a first axis, and a transmitter extending generally parallel to a surface of the substrate. The apparatus further comprises a megasonic transducer in acoustically coupled relation to the transmitter, and a reciprocation drive in fixed relation to the transmitter. The reciprocation drive moves the transmitter back-and-forth within a plane generally parallel to the surface of the substrate.

Abstract: A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid throughout the wash chamber. A drain conduit can be provided, alone or in combination with the recirculation system, for draining liquid from the wash chamber when the drain is closed. A fill control system is provided to ensure that the dishwashing cycle is not started with liquid in the wash chamber and that the sink drain is properly closed. One or more sensors can be provided for enabling the fill control system. The sensors can be located within the drain above the location where the drain is plugged.

Abstract: An apparatus and a method is provided for decoupling a cavitation in a liquid from an acoustic energy used to induce the cavitation. Broadly speaking, a pressure adjustment is used to control an acoustically induced cavitation in a liquid contained within a wafer cleaning apparatus, wherein the cavitation is defined by an amount and a size of gas bubbles. An increase in a pressure within the wafer cleaning apparatus results in a suppression of the cavitation. Conversely, a decrease in the pressure within the wafer cleaning apparatus results in an enhancement of the cavitation. Thus, independent control of the cavitation is provided without regard to the acoustic energy or a chemistry of the liquid. Controlling the cavitation allows for a safe and efficient wafer cleaning operation that can be customized to address specific requirements dictated by a particular wafer configuration.

Abstract: In a first aspect, a first apparatus is provided. The first apparatus includes (1) a tank adapted to contain fluid; (2) at least one support component mounted in the tank and adapted to support a substrate in a supported position at least partially submerged in the fluid; (3) a transducer adapted to output sonic energy into the fluid; and (4) a reflector positioned at a side of the substrate and adapted to reflect the sonic energy toward an edge of the substrate so as to provide a 100% duty cycle. The reflector is positioned such that the reflector does not obstruct a path employed to load the substrate into the supported position and to unload the substrate from the supported position. Numerous other aspects are provided.

Abstract: An industrial parts washer system includes washing fluid, an assembly operable to apply the washing fluid to the part, a turbidity sensor coupled to the assembly operable to sense a condition of the washing fluid after the fluid washes the part, and a control unit connected to the sensor that compares the sensed condition of the washing fluid to a value and thereby determines whether the part should be washed further.

Abstract: The invention provides an apparatus and method for cleaning a plurality of electronic components. A tank is provided for containing a cleaning fluid and an ultrasonic resonator is mounted in communication with the cleaning fluid for charging ultrasonic energy thereto. A support platform positionable over a top surface of the cleaning fluid supports the electronic components such that the electronic components are in contact with said top surface of the cleaning fluid in use. Further, a cleaning fluid supply system is configured to generate a continuous flow of cleaning fluid into the tank for cleaning the electronic components in contact with said top surface of the cleaning fluid.

Abstract: It is possible to obtain a clean high-quality circuit board by removing affected material and foreign matter produced when a hole is formed. A manufacturing method of the circuit board includes (a) preparing a film-coated board material by bonding a film material as a mask to a board material, (b) forming a hole in the film-coated board material by applying a laser beam thereto, and (c) selectively removing the unnecessary material sticking to the film-coated board material from the film-coated board material by supersonic cleaning without peeling the film material off the board material. Unnecessary material such as foreign matter is produced when the hole is formed, and the unnecessary material sticks to the board material. After removal of such unnecessary material, a conductive material is disposed in the hole, using the film material as a mask, and the film material is later removed from the board material.

Abstract: An adjustable detection apparatus. The apparatus includes a first holding member and a second holding member and a detection device. The first holding member has a first sliding area, in which the second holding member is moveable. The second holding member has a second sliding area. The detection device comprises a detachable detector, wherein the detection device is moveable in the second sliding area.

Abstract: A cleaning apparatus includes a tank housing and a partition disposed in the tank housing so as to divide the interior thereof into pumping and cleaning chambers as the only chambers within the tank housing adapted to contain cleaning liquid. A submersible pump mounted inside the pumping chamber has an outlet connected to a first end of at least one tubular member, which defines a flow path extending from the first end and through an opening in the partition to an opposing second end inside the cleaning chamber and connected to a respiratory device for cleaning thereof. Cleaning liquid is pumped from the pumping chamber along the flow path, through the device for interior cleaning, and into the cleaning chamber to fill such chamber to an upper end portion of the partition defining an overflow weir, thereby immersing ad the device for exterior cleaning and allowing overflow into the pumping chamber.

Abstract: The invention relates to a method for cleaning a washing device (5) of an offset printing machine, according to which at least one washing device of said offset machine, which comprises a spray bar (11), is removed prior to the cleaning process and placed in a cleaning bath (17). The aim of the invention is to achieve improved cleaning results in a shorter time, in particular using fewer personnel. To achieve this, ultrasonic waves are directed onto the washing device in the cleaning bath that is filled with a liquid medium and during the cleaning of the washing device using said ultrasonic waves, the liquid medium is conducted through each spray bar. The invention also relates to a cleaning device (16) for carrying out said method.

Abstract: Dishwashing machine comprising a programme sequence control unit, at least two rotating spray arms, a circulation pump (3) capable of operating even intermittently, a distribution valve (10) arranged directly on the delivery-side section (6) of the pump (3) and having at least a first and a second outlet (11, 13) which communicate with a respective rotating spray arm. The shutter member (20) of the valve, in accordance with the flow direction of the liquor at the delivery side (6) of the pump, is adapted to selectively displace both between said first and second outlets (11, 13) and into an intermediate seat (15) situated between the same outlets. The duration of the pauses in the intermittent operation of the pump (3), as controlled by the programme sequence control unit, is correlated to the actual pressure at the inlet of the valve (10) by the action of means (21) provided to monitor the localized pressure of the liquor.

Abstract: A cleaning device for cleaning an object includes an inner vessel configured to contain a first liquid and the object. The cleaning device also includes an external vessel configured to contain a second liquid and the inner vessel. The second liquid is acoustically coupled to the first liquid. At least one transducer is acoustically coupled to the external vessel and configured to generate acoustical energy which is transferred to the object through the external vessel, a second liquid, the inner vessel and the first liquid. The first liquid has a dissolved gas concentration of a first gas and the second liquid has a dissolved gas concentration of a second gas.

Abstract: Apparatus and method are provided for in-situ measurement of vibrational energy applied to a wafer in a process bath of a vibrational cleaning system. The apparatus may be made up of a test wafer comprising an array of pressure sensing elements disposed thereon for monitoring power level variation of a time-varying pressure wave. The time-varying pressure wave is indicative of vibrational energy that would be applied to a wafer in the process bath in the position of the test wafer.

Abstract: Pluralities of ultrasonic transducers are arranged on the bottom wall of the cleaning tank. The output power of the ultrasonic oscillator is supplied to the transducers through the switching unit, which switches the drive mode between a first mode in which all the ultrasonic transducers are supplied with the output power and thus are excited, and a second mode in which only a part or parts of the ultrasonic transducers are supplied with the output power generated by the ultrasonic oscillator. The first mode is used when cleaning substrates not-resistant to vibration, and the second mode is used when cleaning substrates resistant to vibration.

Abstract: A dishwasher includes a number of spray arms, a circulation pump with a pump housing, an impeller, a suction port, and a number of discharge ports on the pump housing. The discharge ports are associated with the spray arms. A water diverter is located on a delivery side of the pump and generates a flow leading from the suction port selectably to one or more of the discharge ports. The water diverter includes a blocking element having a number of diaphragm openings positionable to one or more outlet positions by a drive via a rotation of the blocking element in a circumferential direction.

Abstract: The apparatus for cleaning a wafer includes an energy concentration relieving member positioned at the side of the wafer. An elongated portion of a probe extends over and substantially parallel to the wafer surface. A vibrator is attached to a rear end of the probe for vibrating the probe such that the elongated portion transfers acoustic vibrational energy to the wafer and dislodges debris.

Abstract: A substrate is cleaned by supplying an ultrasonically-agitated cleaning liquid onto the substrate from a nozzle provided above the substrate while spinning the substrate. The substrate being cleaned is spun at a rotational speed of 2600 rpm or more and 3500 rpm or less, or at a rotational speed of 260×V/D (rpm) or more and 350×V/D (rpm) or less, where D (mm) is a diameter of the nozzle and V (mm/sec) is a moving velocity of the nozzle.

Abstract: In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.

Abstract: The pressure reading tool includes a housing with an interior chamber and an orifice extending from the chamber to the exterior of the housing. A pulse member with a magnetostrictive ring and an excitation source are disposed within the chamber to produce a highly agitated fluid discharge through the orifice. The magnetostrictive ring, chamber volume, and orifice cooperate to induce Helmholtz resonance frequencies in the fluid in the chamber to thereby enhance the agitation of the fluid discharge. A sheathing encapsulates the pulse member to protect it from contact with the fluid. A dampening element is also interposed between the pulse member and housing to isolate vibration.

Abstract: A holding unit holds a substrate to enable a surface of the substrate to be processed. The unit has a vacuum suction member that comes into contact with a peripheral portion of the surface of the substrate and sucks the substrate. A processing apparatus holds the wafer stably and allows an edge, a bevel portion and/or a back surface of the wafer to be processed.