Abstract: A method of and an apparatus for measuring the strength of ultrasonic waves are provided. They are capable of measuring the strength of ultrasonic waves easily and at low cost without using a sound pressure meter. The ultrasonic wave strength measuring apparatus has a particle source soaked in a cleaning liquid, an oscillator to generate the ultrasonic waves whose strength is going to be measured to vibrate the particle source so that particles are eluted from the particle source into the cleaning liquid, a counter to count the number of particles in the cleaning liquid, and an operation unit to find the strength of the applied ultrasonic waves based on the counted number of particles.

Abstract: Embodiments of the present disclosure relate to methods and apparatus for reduction of particle defects from a semiconductor surface, such as for example the reduction of sub 100 micron defects. Methods and apparatus of the present disclosure are particularly useful in the manufacture of semiconductor devices when employing extreme ultraviolet photolithography. In some embodiments, a fluid stream is provided through a nozzle at conditions such that cavitation bubbles are formed, the cavitation bubbles being present in a stable cavitation state or regime. The fluid stream is flowed over at least a portion of the surface. A shockwave is generated or created in the fluid stream. The shockwave momentarily increases acoustic pressure in the fluid causing the cavitation bubbles to collapse and produce a jet or pulse of high fluid flow which removes particle defects from the surface.

Abstract: In a thin plate member washing apparatus, when a rotary arm member supporting a mesh member holding portion is rotated using a rotary handle, tap water flows over the surface of a mesh member, and medicinal fluid residue deposited on the mesh member is removed.

Abstract: Provided is a film washout device includes a housing defining a rinsing chamber and a drain in fluid communication with the rinsing chamber. A drum is rotatably coupled to the housing and is configured to be engageable with the photosensitive material for washout thereof. A booster pump is operatively coupled to the housing and includes a pump inlet and a pump outlet, the pump inlet being fluidly connectable to the pressurized fluid source to receive fluid therefrom at an inlet pressure, the pump being configured to elevate the pressure of the fluid exiting the pump via the pump outlet. A plurality of nozzles are coupled to the housing and in fluid communication with the pump to receive fluid therefrom. The plurality of nozzles are configured to direct fluid into the rinsing chamber for washout of the photosensitive material.

Abstract: Methods and apparatus for liquid, gas, and gas plasma sterilization of items. The apparatus includes two chambers and a holder to connectorlessly secure a lumened instrument such that a first portion of the lumened instrument lies in the first chamber and a second portion of the instrument lies in the second chamber, a liquid medium contained within the two chambers, and pumping means for simultaneously increasing fluid pressure within the first chamber of said container while decreasing fluid pressure within the second chamber of the container in a reciprocating fashion. The pumping means displaces at least a total internal volume of the liquid medium through the lumen for a given highest volume of a lumened instrument during a stroke.

Abstract: In a thin plate member washing apparatus, when a rotary arm member supporting a mesh member holding portion is rotated using a rotary handle, tap water flows over the surface of a mesh member, and medicinal fluid residue deposited on the mesh member is removed.

Abstract: The present invention is disclosed an array-type-transducer-based high-power ultrasound delivery system which includes a support bracket, an array-type ultrasound transducer, and a plurality of containers. The support bracket includes a plurality of grooves, and the array-type ultrasound transducer includes a clamp and N ultrasound transducers. The clamp includes a plurality of wedges configured for engaging in the grooves of the support bracket and thereby connecting the array-type ultrasound transducer to the support bracket. The containers are arranged in a two-dimensional matrix so that the ultrasound transducers of the array-type ultrasound transducer can dip into and leave the ultrasound-conducting medium in the containers vertically. The disclosed system features high operation speed and low labor requirement. Moreover, the depth by which and the time for which the ultrasound transducers dip into the ultrasound-conducting medium in the containers can be controlled and quantified.

Abstract: A pump (22) includes a pump casing (34) having a pump chamber (40), an impeller (30) received in the pump chamber (40), an electric motor (28) for driving the impeller (30), a detector (96) being configured for detecting a load on the pump (22), and a speed regulator (98) coupled to the detector. The speed regulator (98) is configured for decreasing the speed of the motor (28) to a speed greater than zero in response to the detector (96) detecting an unload condition of the drain pump (22).

Abstract: The portable, compact, silverware washing apparatus is disclosed. The apparatus is manufactured so as to easily mount on top of a kitchen countertop or to be easily portable to other locales. The appliance is designed so as to not be connected to a water supply within a home or apartment, but rather rely upon the user to pour in an independent supply of water. The device includes a motor and pump assembly to fill a washing chamber with water and detergent, while a sonic transducer bombards the silverware loaded therein with sonic vibrations. The pump assembly automatically drains the water and waste after completion of the washing cycle. The appliance is configured with a specialized basket for holding the silverware in individualized compartments.

Abstract: A substrate processing apparatus includes a substrate holding unit holding a substrate, a cleaning liquid supplying unit supplying, to the substrate held by the substrate holding unit, a cleaning liquid containing a foaming agent that foams due to application of foaming energy, and a foaming energy supplying unit applying the foaming energy to the cleaning liquid in contact with the substrate held by the substrate holding unit.

Abstract: Apparatuses are provided for cleaning a processing component using megasonic energy including megasonic tanks, scanning megasonic plates, megasonic jets, and megasonic sweeping beams etc., in combination with selective chemistries to remove sub-micron particulate contaminants from the surfaces of the processing component that is used in cleaning semiconductor, medical, or any other processing substrates. The apparatus includes a processing chamber having a carrier element that is configured to support the processing component. The carrier element includes a mechanism to flip the processing component within the processing chamber during cleaning. A fluid supply assembly supplies a fluid to a surface of the processing component and a beam assembly equipped with a megasonic transducer is used to provide high frequency megasonic acoustic energy to the fluid during cleaning.

Abstract: Provided are an apparatus and a method of cleaning a substrate. The apparatus includes a substrate supporting unit supporting a substrate, a container surrounding the substrate supporting unit and collecting an organic solvent scattered from the substrate, and a fluid supplying unit provided on one side of the container and spraying a liquid organic solvent with bubbles to the substrate. The fluid supplying unit includes a nozzle head ejecting the organic solvent to the substrate, an organic solvent supplying line supplying the organic solvent from an organic solvent storage tank to the nozzle head, and a bubble providing element provided on the organic solvent supplying line and providing bubbles to the liquid organic solvent.

Abstract: An ultrasonic cleaning method for cleaning an object in a liquid in which a gas is dissolved includes preparing the liquid in which the gas is dissolved. The object is cleaned while applying ultrasonic waves to the liquid so that a ratio determined by dividing a vibration strength of the liquid at a fourth-order frequency of the ultrasonic waves by a vibration strength of the liquid at a fundamental frequency of the ultrasonic waves is larger than 0.8/1000.

Abstract: An ultrasonic cleaning method for cleaning an object in a liquid in which a gas is dissolved includes preparing the liquid in which the gas is dissolved and stirring the liquid while irradiating the liquid with the ultrasonic waves so as to realize a state where bubbles containing the gas dissolved in the liquid continue to be generated. The object is cleaned in the state where the bubbles containing the gas continue to be generated.

Abstract: There are provided an ultrasonic cleaning apparatus and an ultrasonic cleaning method capable of suppressing occurrence of damage on a substrate to be cleaned and capable of performing cleaning at a high cleaning level for highly precise substrates and the like used in an electronics industry. Occurrence of damage on the substrate to be cleaned is suppressed by holding an object to be cleaned so as to be positioned out of a region where perpendiculars extend from an oscillating surface of an ultrasonic transducer to a liquid surface (an ultrasonic-irradiated region) under and in the vicinity of the liquid surface of a cleaning solution, exciting a capillary wave on a surface of the cleaning solution by an ultrasonic wave, and separating particulate contamination of the object to be cleaned by an acoustic pressure generated by the capillary wave without irradiating the object to be cleaned directly with the ultrasonic wave.

Abstract: A hand carried, manually operated apparatus for cleaning flooring, carpet, upholstery, and the like includes a cleansing fluid chamber, a waste fluid chamber, a pump and an applicator. A first fluid passageway connects the pump and cleansing fluid chamber, a second passageway connects the cleansing fluid chamber and applicator, a third passageway connects the applicator and waste fluid chamber, and a fourth passageway connects the waste fluid chamber and pump. A first one-way valve permits flow from the pump to the cleansing fluid chamber but inhibits reverse flow; and a second one-way valve permits flow from the applicator to the waste fluid chamber but inhibits reverse flow. Air is transferred through the pump from the waste fluid chamber to the cleansing fluid chamber as cleansing fluid is transferred to the applicator from the cleansing fluid chamber and waste fluid is transferred from the applicator to the waste fluid chamber.

Abstract: There is provided an ultrasonic cleaning method capable of reliably cleaning to remove adhesive components even when the adhesive components adhere to a rigid substrate. The ultrasonic cleaning method comprises performing the following steps (1) to (5), in this order: (1) a step of immersing a rigid substrate having an adhesive adhering to a surface thereof in an aromatic alcohol-based cleaning liquid at 25 to 60° C.; (2) a step of cleaning off the adhesive on the rigid substrate by ultrasonic oscillation while keeping the state where the rigid substrate is immersed in the step (1); (3) a step of subsequently immersing the rigid substrate in a glycol ether-based cleaning liquid at 25 to 60° C.

Abstract: Disclosed is a method and a respective apparatus for ultrasonic wet treatment of a plate-like article, which comprises: bringing a solid element, which is connected to a transducer in close proximity to a surface of a plate-like article so that a gap is formed between the solid element and the plate-like article, the gap having a distance d2 between 0.1 mm and 5 mm, dispensing liquid for filling the gap between the solid element and the plate-like article, and detecting ultrasonic waves and/or controlling the distance d2, by measuring the distance d2, comparing the measured distance with a desired distance d0 and adjusting the distance accordingly.

Abstract: A substrate cleaning systems are provided. One system includes a proximity head system for applying a meniscus to a surface of a substrate during a cleaning operation. Also provided is a container for holding the solution, the solution being mixed from at least a continuous medium, a polymer material, and a solid material, the polymer material in the solution imparting a finite yield stress to the material, such that the solution is maintained in a stable elastic gel form. A pump coupled to the container is also provided for moving the solution from the container to the proximity head system, where the pump applies at least a minimum shear stress on the solution. The pump provides agitation that exceeds the finite yield stress causing the solution to flow. A conduit is provided between the container and the proximity head system.

Abstract: There is disclosed a system for cleaning and disinfecting allograft material. In an embodiment, the system includes a sterile bag and a motorized paddle blender. The sterile bag having an outer wall configured to withstand blending forces, at least one paddle contact section, and an allograft retaining section separate from the at least one paddle contact section. The motorized paddle blender having at least one paddle configured to apply blending forces on the sterile bag on the at least one paddle contact area, a motorized portion to actuate the at least one paddle, and a door component configured to hold the sterile bag adjacent the at least one paddle. The at least one paddle and the allograft retaining section are configured to prevent the paddle from contacting the allograft material when the blending forces are applied on the sterile bag on the at least one paddle contact area.

Abstract: A method and apparatus is disclosed for treating and processing an oil, water or oil and water-contaminated substrate such as oil field waste. The substrate may be pretreated with water and/or surfactant and may be mixed under low shear conditions with a base such as a compound containing alkaline earth or lime and an optional catalyst. Mixing the substrate with the base creates a heat. Next, the substrate may be mixed with an acid such as sulfuric acid. As the substrate is mixed, it causes an exothermic reaction with a heat that vaporizes the oil, reaction products and water. Recoverable constituents in the vapor can be condensed in a vapor collection system. The treated substrate may be essentially free of oil and has a controlled water content and pH that can be adjusted according to the use of the end dry product.

Abstract: A cleaning material is disposed over a substrate. The cleaning material includes solid components dispersed within a liquid medium. A force is applied to the solid components within the liquid medium to bring the solid components within proximity to contaminants present on the substrate. The force applied to the solid components can be exerted by an immiscible component within the liquid medium. When the solid components are brought within sufficient proximity to the contaminants, an interaction is established between the solid components and the contaminants. Then, the solid components are moved away from the substrate such that the contaminants having interacted with the solid components are removed from the substrate.

Abstract: A dissolved nitrogen concentration monitoring method is used for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped. The method includes measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by ultrasonic wave irradiation. A dissolved nitrogen concentration of the cleaning liquid is calculated from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between a dissolved nitrogen concentration and an amount of increase of dissolved oxygen concentration.

Abstract: A motor pump unit for a high-pressure cleaning appliance is provided, in which the cleaning liquid conveyed by the pump assembly is used for cooling the motor, comprising a motor housing which surrounds the motor, and a cooling channel which surrounds the motor and through which the cleaning liquid can flow for heat dissipation. To provide a motor pump unit having a level of electrical safety which is higher than that of a conventional motor pump unit, the cooling channel surround the motor housing, and the motor pump unit comprise at least one thermally conductive spacer element by way of which the cooling channel is spaced from the motor housing. A high-pressure cleaning appliance is also provided.

Abstract: An apparatus, system, and method for a Gigasonic Brush for cleaning surfaces is presented. One embodiment of the system includes an array of acoustic transducers coupled to a substrate where the individual acoustic transducers have sizes in the range of 9 um2 to 250,000 um2. The system may include a positioning mechanism coupled to at least one of a target surface or the array of acoustic transducers, and configured to position the array of acoustic transducers within 1 millimeter of a target surface. The system may also include a cleaning liquid supply arranged to provide cleaning liquid for coupling the array of acoustic transducers to the target surface. The system may further include a controller coupled to the array of acoustic transducers and configured to activate the array of acoustic transducers.

Abstract: A transportable wash unit comprises a wash fluid delivery system for delivering wash fluid to a desired washing location; a power supply for providing power to components of the transportable washing unit; a unit controller for controlling one or more components of the transportable wash unit; and a mobility unit for mobilizing the transportable wash unit.

Abstract: A washing/drying machine according to the present invention is capable of efficiently performing a drying operation to reduce a drying period. The washing/drying machine includes a tank (11) for storing used water, and the water is circulated from the tank (11) for dehumidification of air circulated through a drying air duct (20). Since the water is circulated from the tank (11), a great amount of water can be supplied as dehumidification water for higher dehumidification efficiency. The amount of the circulated water (the amount of cooling water (dehumidification water)) is reduced in a first half of a drying process, and increased in a second half of the drying process. As a result, the drying efficiency is improved during the drying operation, thereby reducing the drying period.

Abstract: A system for ultrasonically cleaning one or more wires of a wire saw for slicing semiconductor or solar material into wafers. The system includes an ultrasonic transducer connected to a sonotrode. The system also includes a sonotrode plate adjacent to one or more of the wires. The sonotrode plate has an opening that exposes the sonotrode to one or more of the wires. The system further includes a tank for delivering a flow of liquid to contact the sonotrode and one or more of the wires. The tank is positioned on the same side of the wires as the sonotrode plate. The ultrasonic transducer is configured to vibrate and form cavitations in the liquid for the removal of contaminants from a surface of one or more of the wires.

Abstract: A dishwasher having a tub defining a wash chamber and at least one dish rack located within the wash chamber. The dishwasher also has at least one spray arm located in the wash chamber and at least one nozzle located in the wash chamber and configured to provide a spray of liquid into the dish rack. A diverter valve controls the supply of liquid from a liquid supply to the at least one nozzle.

Abstract: This invention relates to apparatuses and methods for cleaning surfaces, including the surfaces of semiconductor wafers, with ultrasonic and megasonic energies of defined profiles, capable of achieving said cleaning without causing damage to nanodimensioned features of the substrates.

Abstract: A support removal apparatus is disclosed for removing water-soluble support material from rapid prototype parts, substantially comprising a retention tank for holding an aqueous cleaning solution; a box manifold hydraulically coupled to the retention tank and equipped with nozzle heads in hydraulic communication with a pump's discharge; a heat chamber for housing a heating element to heat the aqueous cleaning solution to a predetermined temperature range; a drain box hydraulically coupled to the retention tank and a pump's intake to convey the aqueous cleaning solution into and through the box manifold; a thermocouple for maintaining the temperature within an optimal range; a level indicator for measuring the solution level in the retention tank for safe operability of the pump and heating element; a cabinet for housing select components of the support removal apparatus and having an integral work platform, accessible compartments, and a localized water supply; and a microprocessor having communicative capabi

Abstract: A hand carried, manually operated apparatus for cleaning flooring, carpet, upholstery, and the like includes a cleansing fluid chamber, a waste fluid chamber, a pump and an applicator. A first fluid passageway connects the pump and cleansing fluid chamber, a second passageway connects the cleansing fluid chamber and applicator, a third passageway connects the applicator and waste fluid chamber, and a fourth passageway connects the waste fluid chamber and pump. A first one-way valve permits flow from the pump to the cleansing fluid chamber but inhibits reverse flow; and a second one-way valve permits flow from the applicator to the waste fluid chamber but inhibits reverse flow. Air is transferred through the pump from the waste fluid chamber to the cleansing fluid chamber as cleansing fluid is transferred to the applicator from the cleansing fluid chamber and waste fluid is transferred from the applicator to the waste fluid chamber.

Abstract: A hand carried, manually operated apparatus for cleaning flooring, carpet, upholstery, and the like includes a cleansing fluid chamber, a waste fluid chamber, a pump and an applicator. A first fluid passageway connects the pump and cleansing fluid chamber, a second passageway connects the cleansing fluid chamber and applicator, a third passageway connects the applicator and waste fluid chamber, and a fourth passageway connects the waste fluid chamber and pump. A first one-way valve permits flow from the pump to the cleansing fluid chamber but inhibits reverse flow; and a second one-way valve permits flow from the applicator to the waste fluid chamber but inhibits reverse flow. Air is transferred through the pump from the waste fluid chamber to the cleansing fluid chamber as cleansing fluid is transferred to the applicator from the cleansing fluid chamber and waste fluid is transferred from the applicator to the waste fluid chamber.

Abstract: A cleaning apparatus for cleaning an object includes a cleaning tank holding a cleaning liquid, the object being cleanable by the cleaning liquid. A coupling tank holding an intermediate medium is in contact with a portion of the cleaning tank. An ultrasonic wave generation unit is disposed at the coupling tank and configured to ultrasonically vibrate the cleaning liquid via the intermediate medium. A modification unit is configured to modify a difference in sonic velocity between the cleaning liquid and the intermediate medium.

Abstract: A device and method of use for a towed portable cleaning facility is disclosed. The device employs storage tanks for both the storage and transport of cleaning fluids. The tanks serve the additional function of surrounding and enclosing the cleaning area an area that may be used for cleaning or storage. By utilizing the tanks as walls, the present invention provides a portable cleaning station. The device may further include the ability to treat and clean used fluids in order to either reuse or safely dispose of the used fluids as well as the ability to recover heat energy from an engine compartment to heat cleaning fluids.

Abstract: A dishwasher is provided that advantageously enables reduction of the amount of water required during the rinsing cycle in order to thereby minimize operational costs and to improve environmental compatibility. A water preparation system has a water preparation container which can receive at least one part of the rinsing liquid used during operation of the dishwasher. The impurities contained in the rinsing liquid are at least partially biodegraded during a water preparation phase with the aid of microorganisms. By preparing and recycling at least one part of the used rinsing water, it is possible to reduce the requirement for fresh water. This enables the burden on the environment to be reduced since at least one part of the water used during the rinsing process is biologically cleansed while it is still in the dishwasher and the requirement for fresh water for the dishwasher is thus reduced.

Abstract: A cleaning apparatus includes: a supply unit to supply at least an initial amount of cleaning solution to a specific portion of an object to be cleaned; an agitator to induce agitation in the cleaning solution supplied to the object; a monitoring unit to monitor an amount of the cleaning solution and to provide a signal indicative thereof; and a control unit to detect a threshold amount of reduction in the cleaning solution based on the signal from the monitoring unit and accordingly to control the supply unit to supply an additional amount of cleaning solution to the specific portion of the object.

Abstract: The invention is a method and apparatus for cleaning and disinfecting laparoscopic surgical instruments. The method comprises the introduction into the interior channels of the instruments of cleaning fluid heated at a predetermined temperature, and activated of the fluid by the introduction of sonic energy into the fluid at varying frequencies. The apparatus includes a unitary cleaning enclosure containing receptacles for holding the laparoscopic instruments in a bath, and for directing cleaning fluid from the bath through the interior of the instruments while providing a source of ultrasonic mechanical energy to the cleaning fluid both inside and outside the laparoscopic instruments.

Abstract: A method of cleaning a medical instrument, in which a medical instrument to which a body fluid adheres is subjected to ultrasonic cleaning in a cleaning solution in which chlorine dioxide is dissolved, and a cleaning apparatus including a cleaning tank constructed to be capable of ultrasonic cleaning, a mixing portion for generating the cleaning solution in which chlorine dioxide is dissolved, a first pipe for supplying the cleaning solution to the cleaning tank from the mixing portion, and a second pipe for supplying water to the cleaning tank, and constructed to dilute the cleaning solution supplied from the mixing portion through the first pipe with water supplied through the second pipe such that a prescribed concentration of chlorine dioxide dissolved in the cleaning solution is attained in the cleaning tank are provided.

Abstract: An ultrasonic cleaning device includes a drain connecting member adapted to be engaged with a drain hole of a sink, and having a valve seat, a valve member having a valve portion angularly movable relative to the valve seat between an opened position to be disengaged from the valve seat to thereby allow for liquid communication between a reservoir of the sink and the drain hole, and a closed position to be engaged with the valve seat for interrupt the liquid communication, and an ultrasonic generating unit disposed in the valve member for exerting ultrasonic vibration on liquid within the reservoir.

Abstract: An apparatus for cleaning chandeliers includes a hand-held tank for holding hot water and a base supporting the hand-held tank. The base has a hollow interior. The tank has sidewalls, at least one of which is transparent. An air and water pump and a battery are mounted in the hollow interior. The battery is in electrical communication with the pump. A first inlet admits ambient air into an inlet of the pump and a second inlet admits water into the inlet. At least one air and water-emitting nozzle is formed in a sidewall of the tank. A pump outlet is in open fluid communication with the at least one water-emitting nozzle. The at least one nozzle discharges agitating water and bubbles into the hot water or above the water line, depending upon the water depth, to help dislodge chemicals and grease from chandelier parts immersed in the hot water.

Abstract: A fill protection algorithm for determining whether the water level in a dishwasher is sufficient to enable operation of the wash pump of the dishwasher without burn-out or other damage to the wash pump and/or heating element of the dishwasher due to insufficient water level. A change in water temperature TEMPDELTA is detected and is compared to a predetermined water temperature change level or amount, TEMPMIN—DELTA, and if the detected change in water temperature TEMPMIN—DELTA is greater than or equal to the minimum water temperature change TEMPMIN—DELTA, operation of the dishwasher is allowed to proceed.

Abstract: A substrate processing apparatus (1) includes a bath body (11), cover members (12), processing liquid nozzles (31) for ejecting an SPM liquid like a shower, and gas nozzles (32) for ejecting nitrogen gas. The processing liquid nozzles eject a processing liquid (91) onto substrates (9) from sidewalls (111) of the bath body (11). By ejecting gas toward lower surfaces of the cover members from the gas nozzles before the substrates are loaded into the bath body, it is possible to remove droplets of the processing liquid deposited on the lower surfaces of the cover members during the previous processing of the substrates or during a temperature control where the processing liquid is ejected from the processing liquid nozzles. It is thereby possible to prevent or reduce deposition of droplets of the processing liquid dropped onto the substrates immediately after being loaded into the bath body.

Abstract: A dynamic cyclic nucleation transport (D-CNX) process is disclosed, including cyclically changing the volume of a process chamber, for example, through a piston or bellows. A D-CNX process and system can include a dynamic chamber volume that can instantly change from vacuum to pressure conditions and eliminates vacuum pumps.

Abstract: A cleaning device of a hair removing apparatus having a hair clipping unit for removing hair includes a cleaning basin for accommodating the hair clipping unit therein; a fluid circulating mechanism for supplying or recovering cleaning fluid into or from the cleaning basin; a drying mechanism for drying the hair clipping unit in the cleaning basin after the hair clipping unit is cleaned; and a controller for controlling the fluid circulating mechanism and the drying mechanism. The controller transmits a control signal to the hair removing apparatus to drive the hair clipping unit while the drying mechanism is being operated.

Abstract: A combination of ultrasonic waves causing microcavitation bubbles to form between the surface of a contact lens and an attached contaminant layer formed by microbes thereon initiates separation. However, a vigorous convective flow takes advantage of any localized breaking and separating of the contaminant layer and immediately imposes a hydrodynamic drag force on the pieces of the contaminant layer that may be separated, thus leading to greater separation, pealing, and tearing of the contaminant layer away from the surface. Thus, the combination has proven much more effective than either feature alone. The present invention may be embodied in other specific forms without departing from its fundamental functions or essential characteristics. The described embodiments are to be considered in all respects only as illustrative, and not restrictive. All changes which come within the meaning and range of equivalency of the illustrative embodiments are to be embraced within their scope.

Abstract: A modular recycling cleaning system comprising in combination: a pressure washing and control module, a vacuum motor assembly module, a reservoir module, an air/liquid separator module, a flexible hose system, a control system and a cleaning head, capable of being easily configured so as to function as any one of: a straight through pressure washer with cleaning liquid supplied from an external source; a straight through pressure washer with cleaning liquid supplied internally from an integral water reservoir; a recycling pressure washer with cleaning liquid being supplied and reused from an integral cleaning liquid reservoir replenished with cleaning liquid by means of a vacuum recovery system; a straight through pressure washer with recovery of contaminated cleaning liquid but without reuse; a conventional wet vacuum cleaning system or a conventional dry vacuum cleaning system. The appliance being capable of further configuration as a shampooing machine.

Abstract: The invention relates to a glass substrate cleaning apparatus and cleaning method. The glass substrate cleaning apparatus of the present invention includes a cleaning trough and first frequency generators for transmitting ultrasonic waves of a first frequency and second frequency generators for transmitting ultrasonic waves of a second frequency disposed at two sides of the cleaning trough. In the present invention, a cost is reduced and a good cleaning effect is reached by using the ultrasonic waves of different frequencies to clean a glass substrate.

Abstract: A support structure removal system comprising a vessel and a second component. The vessel comprises a vessel body, a porous floor configured to retain a three-dimensional part, and an impeller rotatably mounted below the porous floor. The second component comprises a surface configured to operably receive the vessel, and a rotation-inducing assembly located below the surface, where the rotation-inducing assembly is configured to rotate the impeller with magnetic fields when the vessel is received on the surface of the second component to agitate and direct flows of an aqueous fluid through the porous floor.

Abstract: A stirring nozzle used in an apparatus for abrasive wire cleaning. The stirring nozzles can be used in series to create multiple cleaning steps wherein fresh cleaning compound contacts the wire to be cleaned. The cleaning apparatus moves both the wire and an abrasive cleaning compound through the interior of the stirring nozzles. At the exit end of each stirring nozzle, cleaning compound is moved outward from the wire path. At the inlet end of each stirring nozzle, cleaning compound is moved inward toward the wire path. The sequential in-and-out movement mixes the cleaning compound.