Abstract: The preparation of graphene, mono-, bi- and multi-layers from graphite-based precursor materials, for example, pencil lead or graphite, by a method of mechanical thinning on the surface of a planar substrate with controlled roughness, followed by sonication in order to collect the graphene deposited on the substrate in a liquid medium. The bearing force during thinning by mechanical friction enables the number of graphene sheets deposited on the surface of the substrate to be controlled.

Abstract: A method for collecting a liquid surface residual film floating on the surface of the liquid after transfer, and a transfer tank that includes a film holding mechanism, provided at inner sides of both right and left side walls, for holding both sides of the transfer film and conveying the transfer film to an immersion area. When a film that is no longer needed after the transfer is collected, dividing means divides the liquid surface residual film so as to split the liquid surface residual film in a longitudinal direction of the transfer tank before the object is removed from the transfer liquid, and the divided films are moved closer to the both side walls of the transfer tank. At the side wall portions, the film holding mechanism is canceled, and from this canceled portion, the divided liquid surface residual films are discharged out of the tank.

Abstract: The present invention relates to a method and an apparatus for liquefying natural gas.

Abstract: A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO2 laser as an excitation source of the solid tin; and imparting, to the scattered matter no larger than the nanosize adhered to the optical element, an effect of overcoming the adherence of the scattered matter.

Abstract: Embodiments include a dishwasher to be connected to pressurized supply water is further improved by the dishwasher comprising a pump driven by at least a first part of the supply water, the pump being adapted to produce pressurized washing water for a washing process from a second part of the supply water, wherein the pressurized washing water has a higher pressure than the supply water. Embodiments of the invention provide a dishwasher which achieves a high cleaning effect even at a pressure of the supply water common in the household.

Abstract: A sensor system that measures at least one parameter of water includes an electronics subsystem and includes a sensor housing electrically and mechanically coupled to the electronics subsystem. The sensor housing encloses a chamber that receives water via at least one inlet and that releases water via at least one outlet. At least one sensor has at least one electrode exposed to water in the chamber. A flow generator causes water to flow through the chamber. A plurality of objects within the chamber move in response to the water flow and abrasively clean the at least one electrode. Preferably, the sensor system includes a chlorine sensor having at least two electrodes. The electronics subsystem applies a first differential voltage between the two electrodes during a measurement interval and then applies a second differential voltage between the two electrodes during an interval following the measurement interval.

Abstract: A pump for a high-pressure cleaning appliance for delivering cleaning liquid is provided. The pump has a pump housing with at least one pump chamber into which at least one piston plunges. The pump chamber is connected via at least one inlet valve to a suction line and via at least one outlet valve to a pressure line. A bypass line leads from the pressure line to the suction line. An overflow valve is arranged in the bypass line. The valve body of the overflow valve is connected to a control element which, in dependence upon the flow rate of the cleaning liquid, displaces the valve body to a closed or an open position. A rear housing component and a front housing component of the pump housing are joined together. The bypass line opens into a suction line section of the suction line, which extends between the housing components.

Abstract: The present application provides a pulsed detonation cleaning system for cleaning an enclosed structure. The pulsed detonation cleaning system may include a pulsed detonation combustor cleaner and an external fuel-air flow. The pulsed detonation combustor cleaner delivers the external fuel-air flow into the enclosed structure and ignites the external fuel-air flow to clean the enclosed structure.

Abstract: Gravity and flow operated diverter valves are disclosed for diverting liquid flow from one source to either of two output destinations, the valves including a housing defining an inlet opening through a base wall, a first outlet opening through a first upper wall and a second outlet opening through a second upper wall. A valve member is movably suspended within the housing by a first end when no liquid is flowing into the inlet opening. The valve member is pivotable in a first direction to seal the first outlet opening and pivotable in a second direction to seal the second outlet opening. On successive liquid flows into the inlet opening the valve member automatically and alternatingly seals the first outlet opening and the second outlet opening. Related dishwasher designs are also disclosed.

Abstract: A dishwasher incorporates a dampened pump assembly including a housing having a base to which is mounted a pump and motor unit configured to develop a flow of washing fluid during operation of the dishwasher. A mass damper is mounted to the housing, with the mass damper substantially conforming to the shape, directly abutting and being rigidly fixed to a portion of the housing at a position offset from the pump and motor unit. The mass damper provides added weight, generally in the order of 1-6 lbs, to the pump assembly which reduces vibrations throughout the dishwasher caused by operation of the pump and motor unit.

Abstract: An inlet grate cleaning system for a water jet propulsion system to be used in a watercraft. The water jet propulsion system has a water passage, the water passage has an inlet and the inlet has a forward area and a rearward area with respect to the watercraft. The inlet grate cleaning system comprises a pump and at least one water intake fluidly connected to the pump. At least one water outlet is also fluidly connected to the pump. The pump is adapted for pumping water from the at least one water intake to the at least one water outlet to create at least one jet of water. The at least one water outlet is positioned so as to direct the at least one jet of water toward an inlet grate.

Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.

Abstract: A system is disclosed. The system includes a fluid reservoir containing a volume of fluid, a bell housing that forms a chamber, a workpiece having a first surface portion and a second surface portion, and a pressure manipulating sub-system in fluid communication with the chamber of the bell housing. The bell housing is arranged relative to the fluid reservoir such that a lower end of the bell housing is at least partially submerged in the fluid thereby sealing the chamber of the bell housing from atmosphere. The bell housing is arranged relative to the fluid reservoir such that the second surface portion of the workpiece is disposed within the chamber of the bell housing that is sealed from atmosphere. A method is also disclosed. An apparatus is also disclosed.

Abstract: Embodiments of the current invention describe a megasonic processing tool. A substrate support is positioned within a housing and is configured to support a substrate. A first liquid container is moveably coupled to the housing within the testing chamber to be positioned on a first location on the substrate and configured to hold a first body of liquid adjacent to the first location on the substrate. A second liquid container is moveably coupled to the housing within the testing chamber to be positioned on a second location on the substrate and configured to hold a second body of liquid adjacent to the second location on the substrate. The second body of liquid is isolated from the first body of liquid. At least one megasonic transducer is coupled to the housing and configured to perform at least one megasonic process on the first body of liquid and the second body of liquid.

Abstract: An acoustic cleaning system includes an operating device having an interior portion. An acoustic cleaning device provides for the passage of a sound wave into the interior portion of the operating device. The acoustic cleaning device includes a horn section attached to an elongated section having a linear or non-linear shape. Sound waves are configured to pass from the elongated section to the horn section and into the interior portion of the operating device. The elongated section is removable from the horn section such that the elongated section is interchangeable with an elongated section having a different length, such that the sound waves are configured to have a frequency between 55 Hz to 75 Hz depending on a temperature of the operating device.

Abstract: A portable manual vehicle wash assembly including a base removably attachable to a top exterior surface of a vehicle. A hollow pipe is attached to the base and includes an inlet formed at a first end thereof, and an outlet at a second end thereof. The inlet is adapted to receive an end of a first hose in fluid communication with a water source. The outlet is generally directed away from the exterior surface of the vehicle, and has a swivel member attached thereto. The swivel member is connected to a water emitter, typically in the form of a second hose or a spray nozzle.

Abstract: A pet waste disposal device having a motor driving a set of cutting blades inside of an open ended plenum. A water supply such as a garden hose provides water to a nozzle or jet inside of the plenum, the water washes away the waste as it is chopped by the blades. The motor may be electrical, gasoline driven, or water driven. The plenum may have a safety screen across the open end. In preferred embodiments, the device may be mounted on an elongated support with a hand grip at one end and the plenum and motor at the other end.

Abstract: A treatment liquid permeation unit comprises: at least one vibration unit; and a vibration transmission unit for transmitting a vibration from the vibration unit. The vibration transmission unit is positioned between an adhesive with which a wafer is combined to a supporting plate or an adhesive adhered to a surface of the wafer and the vibration unit. A vibration from the vibration unit is transmitted via the vibration transmission unit. This promotes the treatment liquid for dissolving the adhesive to permeate the adhesive to which the treatment liquid is supplied. Therefore, the treatment liquid can more uniformly permeate the adhesive in a shorter time. This allows the treatment liquid for dissolving the adhesive to permeate the adhesive with which the wafer is combined to the supporting plate or to permeate the adhesive adhered to the surface of the wafer in a shorter time.

Abstract: A cleaning system for an electric shaver having a body and a shaving head generally includes a cradle configured to receive the shaving head of the shaver, and a reservoir positioned beneath the cradle and configured to retain cleaning fluid therein. The cleaning system also includes a drive assembly operable to move the reservoir between a raised position and a lowered position. In the raised position, the reservoir is positioned relative to the cradle such that at least a portion of the shaving head is submerged in cleaning fluid within the reservoir. In the lowered position, the reservoir is positioned relative to the cradle such that no portion of the shaving head is submerged in cleaning fluid.

Abstract: The present invention relates to a system and method for washing gas turbine engines comprising a manifold comprising one or more tubes; a pumping system for providing pressurized washing liquid to the manifold, the pumping system comprising a pump, and one or more valves; and a control unit for regulating the pumping system according to washing parameters associated to a particular engine.

Abstract: There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The cleaning system comprises: a cleaning carriage comprising at least one cleaning element for contact with at least a portion of the exterior of the radiation source assembly; a rodless cylinder comprising an elongate housing having a first longitudinal axis; a slidable element disposed on an exterior surface of the elongate housing; and an elongate motive element coupled to the driving element. The slidable element is: (i) coupled to the cleaning carriage, and (ii) magnetically coupled to a driving element disposed within the elongate housing. The elongate motive element has a second longitudinal axis that is oriented in a substantially parallel, non-coaxial relationship with respect to the first longitudinal axis.

Abstract: There is described a fluid treatment system particularly suited for radiation treatment of a flow of fluid (preferably water). The system comprises a fluid treatment zone for receiving a flow of fluid in contact with a surface of the fluid treatment zone. At least one elongate radiation source assembly is disposed in the fluid treatment zone. The elongate radiation source assembly has a longitudinal axis disposed transverse to a direction of fluid flow through the fluid treatment zone. The system further comprises a cleaning apparatus having at least one cleaning element in contact with an exterior surface of the at least one elongate radiation source assembly. A first motive element is provided and is operable to cause relative movement between a distal end of the at least one elongate radiation source assembly and the surface of the fluid treatment zone to define a gap therebetween. A second motive element is provided and is coupled to the cleaning system.

Abstract: In order to remove treatment liquid (21) from a planar material to be treated (10), which is transported in an assembly for the electrolytic or wet-chemical treatment of the material to be treated (10), or to promote the exchange of material on the surface of the material to be treated (10), a roll with a roll surface (4, 14) is provided. The roll surface (4, 14) is arranged relative to a transport path of the material to be treated (10) so that a gap (8, 18) remains between the roll surface (4, 14) and a useful region of the material to be treated (10) opposing the roll surface (4, 14), which extends over the useful region. The roll is driven rotatably so that at the gap (8, 18) a relative speed is produced between the roll surface (4, 14) and the material to be treated (10).

Abstract: A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.

Abstract: A vibration device separates foreign particles from a semiconductor device, and a suction interface of a suction device covers an opening portion of the semiconductor device. A space connected with a vacuum passage and a communication passage is formed between the semiconductor device and the suction interface. The suction device suctions the space, and fresh air is introduced into the space through the communication passage. As a result, a current of air is generated from the communication passage to the vacuum passage, and foreign particles are suctioned and removed from the space.

Abstract: A method of detecting a wavelength includes inserting at least two sound pressure sensors in parallel with each other into a liquid to which waves are applied, the sound pressure sensors formed into a bar-like shape and having the same sensitivity, establishing a first synchronized state in which waves detected by the sound pressure sensors are synchronized with each other, moving the sound pressure sensors relative to each other in a longitudinal direction, to break the first synchronized state and then establish a second synchronized state in which the waves detected by the sound pressure sensors are again synchronized with each other, and detecting a wavelength of the detected waves according to a quantity of the relative movement of the sound pressure sensors between the first and second synchronized states. The method easily detects a wavelength of waves applied to the liquid and the detected wavelength is usable to evaluate and control a total amount of dissolved gases in the liquid.

Abstract: This invention discloses a method and system for washing a sedimentation device in a water treatment system using ultrasonic waves. The system includes an ultrasonic transmitting device for transmitting the ultrasonic of a predetermined power and transmitting frequency to the sedimentation device, a carrying device positioned inside or outside of the water treatment system for moving the ultrasonic transmitting device over the sedimentation device. The carrying device may include an operation track, a moving car body erected over the operation track, a driving device, and a car body position detection and control device. The effects of the invention are greatly better than that of manual washing with high pressure water. The consumption of water, treatment reagents and manpower can be decreased, thereby decreasing effectively the cost of water production.

Abstract: A method for removing particles or deposits from a surface having particles or deposits thereon. The method involves contacting a surface with a chemical composition sufficient to selectively dissolve and remove at least a portion of the particles or deposits from the surface. The chemical composition is compatible with the surface. This disclosure also relates to a system of specially designed equipment for removing particles or deposits from a surface having particles or deposits thereon. The disclosure is useful, for example, in cleaning porous surfaces, media for cartridge, pleated and membrane surfaces, and internal walls of tanks or filter housings.

Abstract: Disclosed herein is a segmental ultrasonic cleaning apparatus configured to remove scales and/or sludge deposited on a tube sheet. The segmental ultrasonic cleaning apparatus includes a plurality of segment groups arranged in a ring shape on a top surface of a tube sheet along an inner wall of the steam generator, in which each of the segment groups includes an ultrasonic element segment and a guide rail support segment loosely connected to each other by metal wires through hand holes located at a lower portion of the steam generator, such that ultrasound waves radiated from an ultrasonic transducer in each of the ultrasonic element segments travels along the surface of the tube sheet, with the segment groups tightly connected in the ring shape by tightening the metal wires via wire pulleys of flange units.

Abstract: A rotating and telescoping cleaning system improves high pressure water cleaning of the inner surfaces of vessels or tanks. Vessels can be vertically divided with dividing plates with centered through-holes. Synchronized and controlled transverse and rotary movements of water jets result in a controlled spiral or helical cleaning track along the vessel walls. The water jets are directed at a pre-adjusted distance from the vessel wall and the travel speed of the water nozzle jets is exactly controlled allowing the removal of very hard deposits. One pass with the tool carrier with operating water jets along the length axis of the vessel results in a thoroughly cleaned vessel wall. The tool unfolds and folds inside of the vessel powered by the flow of the high pressure cleaning water.

Abstract: An apparatus is provided for supplying a plurality of chemicals or gases to the surface of a substrate to clean and dry the substrate. The apparatus includes a substrate support unit with a chuck on which a substrate is loaded, a bottom chamber having an open top and configured to surround the circumference of the chuck, a top chamber configured to open or close the top of the bottom chamber such that a drying treatment for the substrate is performed while the substrate is isolated from the outside, and an indirect injection nozzle installed at the edge of the top chamber and configured to inject drying fluid toward the center of the top chamber such that the drying fluid is indirectly injected to the substrate. According to the apparatus, it is possible to enhance a substrate drying efficiency, suppress external contamination, and prevent the formation of an oxide layer.

Abstract: Disclosed herein is a cleaning apparatus using ultrasonic waves. The cleaning apparatus to separate contaminations from a wafer includes a housing receiving an oscillator therein, and a rod coupled to a surface of the oscillator to transmit ultrasonic waves produced from the oscillator to a cleaning solution applied onto an upper surface of the wafer. The oscillator includes a piezoelectric device bonded to a diffusive layer consisting of a near-field region and a far-field region. The rod has a diameter-reduced portion to amplify the ultrasonic waves produced from the oscillator, thereby enabling the efficient removal of the contaminations on the wafer to be cleaned.

Abstract: An apparatus, system, and method for a Gigasonic Brush for cleaning surfaces is presented. One embodiment of the system includes an array of acoustic transducers coupled to a substrate where the individual acoustic transducers have sizes in the range of 9 um2 to 250,000 um2. The system may include a positioning mechanism coupled to at least one of a target surface or the array of acoustic transducers, and configured to position the array of acoustic transducers within 1 millimeter of a target surface. The system may also include a cleaning liquid supply arranged to provide cleaning liquid for coupling the array of acoustic transducers to the target surface. The system may further include a controller coupled to the array of acoustic transducers and configured to activate the array of acoustic transducers.

Abstract: Provided is a dishwasher. The dishwasher includes a sump case forming a space to store wash liquid, and a drain pump provided at one side of the sump case. The drain pump includes a drain impeller that induces a flow of wash liquid, and a plurality of mutually separable cases covering the drain impeller.

Abstract: A dishwasher comprises a wash chamber, a water circulation system for passing water into and out of the wash chamber, and a water-collecting sump member (12) which is fastened in a water-tight manner to an opening (14) in a lower end portion of the wash chamber. The sump member is a self-contained molded plastic unit comprising an upper portion which constitutes an interface for connecting the sump member in a water-tight manner to said opening (14), and a lower portion comprising a water collecting receptacle, wherein said upper portion comprises at least one integral fitting for connecting the sump member to a water inlet conduit and/or a drain conduit of the dishwasher.

Abstract: The invention relates to the continuous cleaning of objects, in particular of semiconductor elements, using ultrasound, wherein the objects to be cleaned are arranged within a liquid. Furthermore, the present invention relates to an apparatus for carrying out the method according to the invention. A basic idea of the invention is that the surface of an object to be cleaned (2) in a tank (5) filled with liquid passes through at least one oscillation maximum that is emitted by at least one sound source (8a) being present in the tank (5). According to one embodiment, the sound source fields (8) that are positioned within the tank (5) are arranged inclined with respect to the transport direction (4).

Abstract: A deaeration device for bubbling dissolved air in the cleaning liquid by cavitation is connected on a cleaning-liquid circulation path so as to bubble the dissolved air in the cleaning liquid flowing through the cleaning-liquid circulation path, and the bubbled dissolved air flows back to the cleaning tank together with the cleaning liquid so that the bubbled dissolved air is ejected from the liquid surface of the cleaning tank to the outside of the tank. Moreover, a propeller-type pump is used as the circulating pump, and the dissolved air concentration of the cleaning liquid is controlled within a range of 2.5 to 3.5 mg/l.

Abstract: A cleaning device includes at least: a holder, a lance having a fluid distribution device, a drive unit for a translational motion of the lance in the holder, and a fluid conducting system having a feed, a return, and flow paths starting from the feed to the return and to the fluid distribution device. At least one actuating means (or actuator) is provided in order to connect the feed to the return or to the fluid distribution device as needed. Furthermore, a method involves cleaning heating surfaces of a convection section of a thermal power plant that includes spaced heat exchanger pipes using such a cleaning device.

Abstract: A cleaning vessel (10) comprising a main chamber (12) into which can be inserted a part (34) for cleaning and one or more secondary chambers (14). An opening (30) is provided in the main chamber (12) associated with each secondary chamber (14) such that the main chamber (12) is in fluid communication with each secondary chamber (14). Rotation of the part (34) causes rotational flow of fluid in the main chamber (12) and each opening (30) is oriented such that material entrained in the rotating fluid passes from the main chamber (12) into the associated secondary chamber (14).

Abstract: A method for cleaning semiconductor substrate using ultra/mega sonic device comprising holding a semiconductor substrate by using a chuck, positioning a ultra/mega sonic device adjacent to the semiconductor substrate, injecting chemical liquid on the semiconductor substrate and gap between the semiconductor substrate and the ultra/mega sonic device, changing gap between the semiconductor substrate and the ultra/mega sonic device for each rotation of the chuck during the cleaning process. The gap can be increased or reduced by 0.5?/N for each rotation of the chuck, where ? is wavelength of ultra/mega sonic wave, N is an integer number between 2 and 1000. The gap is varied in the range of 0.5?n during the cleaning process, where ? is wavelength of ultra/mega sonic wave, and n is an integer number starting from 1.

Abstract: To provide an ultrasonic generator capable of detecting any of a state operated without a water load, abnormality of an ultrasonic transducer and abnormality of a cleaning bath.

Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.

Abstract: An ultrasonic wave generating apparatus includes: a generator including an electric power supply, a controller that generates a control signal, a liquid crystal display indicator, and a transducer drive circuit; and transducer portions. The generator includes: the controller having an internal memory or a port to which an external memory is inserted, and formed of a microcomputer to control the generator and the transducer portions; thyristor portions that are arranged respectively in the front and rear ends of the transducer portions, in which two thyristors are connected in series in the respective thyristor portions; snubber circuit portions that are connected in parallel with the respective thyristor portions; at least one transducer that is connected with the controller and is included in the transducer portions; and choke coils that are connected with one end of the respective transducers in the transducer portions.

Abstract: An extraction device for a filter element containing collected particles of target material and an extraction fluid, wherein the device may have a piston and a vibration apparatus for vibrating the filter element to cause particles to move from the filter element and into the extraction fluid. The piston may first create compressed air to urge a first amount of extraction fluid and particles out of the filter element, and may then compress the filter element to urge a second amount of extraction fluid and particles out of the filter element.

Abstract: One embodiment described herein relates to a system for removing pollutants from a flue gas. The system includes a selective catalytic reduction (SCR) system having a SCR reactor containing a NOx reducing catalyst and one or more SCR protective devices. At least one of the SCR protective devices is connected to a rapping hammer system that actively remove fly ash collected on the SCR protective devices.

Abstract: The present invention relates to a system for removing deposits from measuring instruments measuring chosen characteristics of a fluid medium contained in a pipe or container, the measuring instrument comprising a window (10) and a first surface (12) having contact with said medium, said first surface (12) being positioned on one end defining a probe head (2) of an elongated member (13) adapted to be extending through the wall (6) of said pipe or container, the outer end of said member (13) being positioned outside said wall (6), the cleaning system comprising an acoustic transducer (5) positioned on the other end of said elongated member (13), wherein said acoustic transducer (5) is acoustically coupled to the elongated member (13) so as to couple acoustic energy thereto, the acoustic energy propagating along said member (13) to the end (2,12) of the probe (1) being in contact with the fluid inside the pipe or container, the resulting vibrations of which removing any contaminations from said window (10) by i

Abstract: A cleaning liquid for an electronic material, in particular, a silicon wafer, uses ultra-pure water or hydrogen water as raw material water, and performs cleaning in combination with ultrasonic irradiation under the presence of hydrogen micro-bubbles. The method enables efficient cleaning and removal of particle components and the like on the wafer surface and prevention of re-contamination.

Abstract: The installation comprises a bath storage reservoir (4), a treatment tank (6) to receive the component that is to be treated which is carried by a support tool (10) collaborating with the tank, respective pipes (5, 7) for conveying the bath from the reservoir to the tank and for emptying the bath from the tank to the reservoir, and motion instigating means (8) for setting the bath in motion in the closed circuit. Advantageously, the tank (6) is of elongate shape with a longitudinal axis and a cross section that is substantially constant between the respectively upstream (12) and downstream (14) opposite transverse ends of the tank, said bath conveying (5) and emptying (7) pipes are respectively connected to the upstream and downstream ends of the elongate tank along the longitudinal axis thereof and the tooling (10) carrying the component (P) that is to be treated, which component is placed in the tank (6), is mounted fixedly thereon.

Abstract: A domestic appliance includes a pump that establishes and directs a flow of washing fluid into a tub during a washing operation. The pump includes a pump housing having a rigid main body portion that defines an inlet section and an outlet section, as well as a plurality of resilient members that are over-molded onto the inlet and outlet sections. The rigid main body portion includes a mounting element for supporting the pump. An insulation grommet is positioned in the mounting element to minimize any transfer of vibration from the pump to the appliance. The inlet nipple, outlet nipple and insulation grommet are joined through a plurality of web members. The rigid main body also includes a secondary outlet section that is adapted to directly receive a hose or is connected to a hose through a secondary outlet nipple.

Abstract: A dishwasher pump assembly according to one example embodiment includes a pump having a housing and a pumping chamber within the housing. The pumping chamber includes a fluid inlet and a fluid outlet. The fluid inlet has a center axis. The assembly also includes a motor having a shaft operably coupled to the pump for rotating the pump. The shaft has a center axis that is offset from the center axis of the fluid inlet. Other embodiments, assemblies and methods are also disclosed.