Abstract: A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The debris collected on the cleaning wafer working surfaces is removed by the particle removal film allowing the debris and foreign matter to be discarded. The use of the cleaning film allows the operator to refresh the cleaning wafer without use of an outside vendor and eliminates wet washing and the use of solvents in the cleaning process.

Abstract: During a first period, pure water used as a low-volatile liquid is supplied onto a substrate while the substrate is rotated. After discharge of the low-volatile liquid is stopped, the low-volatile liquid remains in a large region on a DSA film. The low-volatile liquid is held on the DSA film without reacting with the DSA film. During a subsequent second period, an organic solvent is supplied to the substrate while the substrate is rotated. The organic solvent supplied to the substrate is mixed with the low-volatile liquid remaining on the DSA film. In this case, volatilization of the organic solvent is inhibited on the DSA film.

Abstract: A wireless power transmission device includes a power-supplying coil configured to wirelessly transmit power to an electric vehicle (EV) serving as a vehicle, be installed in a slanted state or perpendicularly to a horizontal plane, and form an electromagnetic coupling circuit along with a power-receiving coil provided in the EV.

Abstract: A kit for mechanically cleaning and/or disinfecting medical and/or surgical instruments and/or devices, the kit containing a first component containing at least 15 wt. % alkanolamine and at least 10 wt. % complexing agent, and a second component containing at least one enzyme; and a method of cleaning such instruments and devices using the components of the kit.

Abstract: A multi-stage separation heat-exchange type drying system is provided. A plurality of first heat exchange blocks of the first main body are installed to be spaced from each other at a predetermined interval, and first vortex generating blocks are installed between the first heat exchange blocks. Also, a plurality of second heat exchange blocks of the second main body are installed to be spaced apart from each other at a predetermined interval, and second vortex generating blocks are installed between the second heat exchange blocks. The heat exchange occurs in a manner that the first heat exchange blocks and the second heat exchange blocks corresponding to each other, positioned up and down, exchange a heat medium therebetween.

Abstract: A system and methods are provided for removal of undesired portions of a fruit or vegetable, such as removal of calyxes from strawberries before they are flash frozen. An automated process for high-throughput fruit or vegetable calyx removal includes a loading system, an identification system, and a removal system. The loading system is configured to transport the fruit or vegetable through the automated process. The loading system may also orient the fruits or vegetables along an axis of the fruit and or align the fruit or vegetables in a desired pattern, orientation, and/or arrangement. The identification system is configured to locate the calyx and determines calyx position data and an optimal cutting path for individual fruit. The removal system uses data received from the identification system to separate the calyx from the fruit or vegetable.

Abstract: A liquid hard surface detergent composition comprising a liquid mixed alkoxylate fatty alcohol non-ionic surfactant comprising a greater number of the lower higher alkoxylate group than the higher alkoxylate group in the molecule and a builder. The compositions provide good shine/anti-spotting characteristics on hard surfaces and are especially suitable for use as automatic dishwashing compositions.

Abstract: According to one embodiment, a planarization method and a planarization apparatus are provided. In the planarization method, a work surface of a work piece is planarized by bringing the work surface of the work piece containing a silicon oxide film and a surface of a solid plate onto which hydrogen ions are adsorbed, into contact or extremely close proximity with one another in a state in which a process liquid containing fluorine ions is supplied to the surface of the solid plate.

Abstract: The present invention relates to compositions comprising protease variants suitable for use in cleaning or detergent compositions, such as laundry detergent compositions and dish wash compositions, including automatic dish wash compositions.

Abstract: Disclosed is a method for drying endoscope channels, including the following steps: a) connecting the endoscope, particularly via a specific connection, to a plasma drying unit; b) injecting a neutral gas into the endoscope channels for a duration of 10 to 60 seconds, the flow rate of the gas being low, the gas being injected at a temperature of 10° C. to 30° C. such as to eliminate residual water; then c) drying the endoscope channels, for a duration of 30 to 150 seconds, by injecting a gas at a high flow rate, the gas being injected at a temperature of 30° C. to 60° C.

Abstract: A novel element, a novel formation method of a film, or a novel formation method of an element is provided. Alternatively, a film including graphene is formed at low cost and high yield. A formation method of a film including graphene includes a first step of forming a film including graphene oxide that includes a first region and a second region by application of a dispersion liquid in which graphene oxide is dispersed over a substrate and removal of dispersion medium from the applied dispersion liquid, a second step of forming a film including graphene by light irradiation to the first region to reduce the first region, and a third step of removing the second region by washing.

Abstract: A low surface tension liquid is supplied from a low surface tension liquid supplying unit to a heated substrate to replace a processing liquid by the low surface tension liquid. The heating of the substrate is weakened and the low surface tension liquid is supplied from the low surface tension liquid supplying unit to the substrate, so that a liquid film of the low surface tension liquid is formed. The liquid film on the substrate is removed by strengthening the heating of the substrate without supplying the low surface tension liquid from the low surface tension liquid supplying unit to a central region of the substrate.

Abstract: An apparatus and a method for treating a substrate with liquid are disclosed. The substrate treating apparatus comprises a substrate supporting unit for supporting the substrate, a liquid supply unit for supplying a liquid to the substrate supported on the substrate supporting unit, and a controller for controlling the liquid supply unit, wherein the liquid supply unit comprises a first nozzle for supplying a first liquid and a second nozzle for supplying a second liquid, and a second area where the second liquid is supplied on the substrate is provided within a first area where the first liquid is supplied on the substrate. The first liquid and the second liquid supplied with a hydrophobic film are discharged with different ways from each other. Thereby, particles with various sizes may be removed depending on each discharge methods.

Abstract: A floor cleaning apparatus, comprises a head, the head having a downward facing cleaning element for downward facing cleaning of a ground surface; and a handle for holding; wherein a portion or a whole of the handle is removably attachable from the head and comprises a spraying system, the spraying system itself comprising a spray outlet; the spraying system operable in a first or a second mode, the portion or a whole of the handle attached to the head in the first mode; and the portion or a whole of the handle removed from the head in the second mode, wherein in the first mode spray is sprayable from the spray outlet upwardly with regard to the ground surface. In an alternate aspect, a floor cleaning apparatus, comprises a head, the head having a downward facing cleaning element for downward facing cleaning of a ground surface; and an upward spraying system, the upward spraying system comprising an upward spraying spray outlet.

Abstract: The present invention provides a transparent or translucent, self-standing, automatic dishwashing gel, comprising a water-soluble C14-C22 fatty acid salt, at least 50 wt % liquid non-ionic surfactant, less than 15 wt % water, and optionally a polar organic solvent.

Abstract: Foamed, opacifying element comprising a thermal colorant image is prepared using a porous substrate having an opposing external surface and an internal surface, and a dry foamed composition disposed on the internal surface of the porous substrate as a dry opacifying layer that has a light blocking value of at least 4 as well as a luminous reflectance that is greater than 40% as measured by the Y tristimulus value. A thermal colorant image is provided on either the opposing external surface, the dry opacifying layer, or both the opposing external surface and the dry opacifying layer, by thermal colorant transfer from a thermal donor element comprising a colorant donor layer having one or more thermal colorants.

Abstract: Foamable aqueous compositions can be foamed and applied to porous substrates to make light-blocking dry opacifying elements. Such compositions have 0.05-15 weight % of porous particles; at least 20 weight % of a binder; at least 0.0001 weight % of additives (including a surfactant); water; and at least 0.001 weight % of an opacifying colorant. Each porous particle includes a continuous polymeric phase and discrete pores; a mode particle size of 2-50 ?m; and a porosity of 20-70 volume %. The continuous polymeric phase Tg is >80° C. and has a polymer viscosity of 80-500 centipoises at an ethyl acetate shear rate of 100 sec?1 at a concentration of 20 weight % at 25° C. The dry opacifying element light blocking value is at least 4 and has a luminous reflectance >40% as measured by the Y tristimulus value. The foamed aqueous composition has a foam density of 0.1-0.5 g/cm3.

Abstract: A foamed, opacifying element has a thermal colorant image on either an opposing external surface and an internal surface of a porous substrate. The internal surface has a dry foamed composition disposed thereon as a dry opacifying layer that comprises: (a) 0.1-40 weight % of porous particles; (b) at least 10 weight % of an at least partially cured binder material; (c) at least 0.2 weight % of one or more additives comprising a surfactant; (d) less than 5 weight % of water; and (e) at least 0.002 weight % of an opacifying colorant different from all of the one or more (c) additives, which opacifying colorant absorbs predetermined electromagnetic radiation. The thermal colorant image is derived from thermal colorant transfer of sublimable colorants from a thermal donor element.

Abstract: A substrate cooling method is for, using a load-lock mechanism for controlling a pressure therein between a first pressure close to an atmospheric pressure and a second pressure in a vacuum state, cooling a substrate transferred from the second module to the first module. The method includes maintaining a pressure in the chamber to the second pressure, allowing the chamber to communicate with a second module, and loading the substrate into the chamber; locating the substrate to a cooling position close to the cooling member; exhausting the chamber such that the pressure in the chamber becomes a third pressure where a region between a surface of the cooling member and a backside of the substrate satisfies a molecular flow condition. The method further includes introducing a purge gas into the chamber to increase the pressure in the chamber to the first pressure, and cooling the substrate by the cooling member.

Abstract: The object of the present invention relates to the use of an branched alkoxylated non-ionic surfactant as an additive to an aqueous membrane cleaning composition, wherein the surfactant has an HLBd value of 9 to 12.5 and an average degree of branching Bs?1.5 and wherein the surfactant has the following formula: wherein R is a C8-C18 linear or branched hydrocarbon chain, X is O or N, R1, R2 and R3 independently of one another are hydrogen, methyl, ethyl, propyl, isopropyl, or a mixture of these, n has a value of from 1 to 8, m has a value of from 1 to 8, p has a value of from 0 to 8.

Abstract: The present disclosure provides chemical mechanical polishing (CMP) slurry, including an abrasive, a chelator, an oxidizing agent, and a surface modificator. The surface modificator is configured to modify a surface from hydrophobic to hydrophilic. The present disclosure also provides a method for reducing chemical mechanical polishing (CMP) surface defects. The method includes adding an additive into CMP slurry by at least 0.0001 wt %, wherein the additive modifies a surface to be polished from hydrophobic to hydrophilic.

Abstract: The present invention relates to a laundry machine and a controlling method, which can remove allergens on the laundry. A controlling method of a laundry machine includes a mite-killing step of supplying seam to a drum to make laundry exposed to a hot environment at or over a temperature and for or over a duration of time, wherein the temperature and the duration are predetermined enough to kill house dust mites on the laundry; a rinsing step of rinsing the laundry; and a spin-drying step of spin-drying the rinsed laundry. The present invention has an advantageous effect of removing allergens including house dust mites, animal hair and pollens efficiently. In addition, if the house dust mites are killed by using steam, energy efficiency is high and an effect of mite-killing is great.

Abstract: The invention relates to a surface-treated calcium carbonate for binding and bioremediating hydrocarbon-containing compositions, to a method for binding and bioremediating hydrocarbon-containing compositions as well as to the use of surface-treated calcium carbonate for binding and bioremediating hydrocarbon-containing compositions and to a composite material comprising the surface-treated calcium carbonate and a hydrocarbon-containing composition.

Abstract: A substrate liquid treatment apparatus includes: at least one processing unit that processes a substrate with a treatment liquid; a storage tank that stores the treatment liquid; a circulation line through which the treatment liquid discharged from the storage tank into the circulation line is returned to the storage tank; a branch supply line that is branched from the circulation line to supply the treatment liquid to the processing unit; a recovery line that returns to the storage tank the treatment liquid having been supplied to the substrate in the processing unit; a distribution line connecting the circulation line and the recovery line; and a shutoff valve, provided on the distribution line, that is opened when cleaning of the recovery line is performed.

Abstract: The present invention concerns compound of formula in the form of any one of its stereoisomers or a mixture thereof, and wherein R1 and R1?, independently from each other, represent a hydrogen atom or a methyl group provided that one of said groups represent a hydrogen atom and the other a methyl group; R2 and R3, independently from each other, represent substituents of the saturated ring and are a hydrogen atom or a C1-3 alkyl group; and n is an integer varying between 1 and 4; and their use in perfumery to impart odor notes of the floral, rosy type.

Abstract: The present invention relates to a test film for detecting surface particles in a clean room in order to prevent inferior products by measuring the contamination level of the clean room using the surface particles. The present invention provides a test film for detecting surface particles in a cleanroom, the test film comprising a substrate which has a predetermined thickness and is formed of a transparent synthetic resin material; a first adhesive layer which is formed at one side of the substrate and collects the surface particles; a release film which is adhered to the first adhesive layer and is separated from the first adhesive layer when the surface particles are collected; a second adhesive layer which is formed at the other side of the substrate; and a protective film which is adhered to the second adhesive layer so as to protect the substrate and has gradations indicated thereon.

Abstract: A substrate processing method includes a substrate holding step of holding a substrate horizontally, a liquid droplet discharging step wherein liquid droplets of an organic solvent, formed by mixing the organic solvent and a gas, are discharged from a double-fluid nozzle toward a predetermined discharge region within an upper surface of the substrate, and a liquid film forming step, executed before the liquid droplet discharging step, of supplying the organic solvent to the double fluid nozzle without supplying the gas, so as to discharge the organic solvent in a continuous stream mode from the double-fluid nozzle to form a liquid film of the organic solvent covering the discharge region on the upper surface of the substrate.

Abstract: A laundry system can have a washing machine that receives a wash mixture and at least one laundry item to be laundered during a washing operation. The washing machine may wash the at least one laundry item in the wash mixture during the washing operation to separate one or more contaminants from the at least one laundry item. The laundry system also can have an extraction system in communication with the washing machine, which extraction system can include a filtration system with a plurality of filtration stages. Each filtration stage of the plurality of filtration stages may comprise one or more filters that filter at least part of the wash mixture during the washing operation.

Abstract: A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The debris collected on the cleaning wafer working surfaces is removed by the particle removal film allowing the debris and foreign matter to be discarded. The use of the cleaning film allows the operator to refresh the cleaning wafer without use of an outside vendor and eliminates wet washing and the use of solvents in the cleaning process.

Abstract: A substrate processing apparatus includes a rotating holder for a substrate, a first nozzle used to eject a jet flow, a second nozzle used to discharge a continuous flow, and a nozzle moving unit integrally moving the first and second nozzles. A landing position of the continuous flow is located closer to a rotation center than a landing position of the jet flow is. At least movement paths of the landing positions of the jet flow and the continuous flow or flow directions of the continuous flow and the jet flow are different from each other. The movement paths are made to be different from each other by locating the landing position of the continuous flow downstream of the movement path of the landing position of the jet flow. The flow directions are made to be different from each other by tilting the continuous flow.

Abstract: An endoscope reprocessor includes: an endoscope housing portion; a medicinal solution tank in which a medicinal solution is stored; a medicinal solution transfer portion that transfers the medicinal solution from the medicinal solution tank to the endoscope housing portion; a comparison portion that compares the concentration of the medicinal solution and a first reference concentration; a first adjustment portion that increases a reaction rate of the medicinal solution in a state in which the concentration of the medicinal solution is lower than the first reference concentration; and a control portion to which the comparison portion and the first adjustment portion are connected, and which drives the first adjustment portion in a case where the comparison portion determines that the concentration of the medicinal solution is lower than the first reference concentration.

Abstract: A method enabling a used superabsorbent polymer recovered from used absorbent, etc., to be readily and inexpensively recovered without using acids or alkalies. The used superabsorbent polymer is treated with an aqueous solution of a multivalent metal salt such as calcium chloride, etc., the superabsorbent polymer treated with the aqueous solution of a multivalent metal salt is treated with an aqueous solution of an alkali metal salt such as sodium chloride, etc., the superabsorbent polymer treated with the aqueous solution of an alkali metal salt is washed with water, and the superabsorbent polymer washed with water is then dried.

Abstract: The invention relates to the use of an acidic aqueous composition for pretreating cans, wherein an inorganic-organic conversion layer is formed in the course of the pretreatment, said conversion layer, as such, offering an excellent adhesive base for wax which improves sliding of the formed can and for the subsequent coating. The invention relates to a wet-chemical pretreatment method in which a can cylinder is first contacted with an acidic aqueous composition that contains water-soluble inorganic compounds of Zr, Ti, Si, Hf or Ce, and water-soluble polymers comprising carboxyl groups or hydroxyl groups; and subsequently is contacted with an aqueous wax dispersion. The invention further relates to an acidic aqueous composition suitable for the pretreatment method comprising water-soluble polymers selected from condensation products of glycoluril and aldehydes. The invention further relates to a method for producing can cylinders, said method including the pretreatment according to the invention.

Abstract: A method for cleaning piping including the steps of supplying an acid to a cleaning water to prepare a cleaning water having pH of 4 or lower, mixing ozone gas to the cleaning water, and passing the cleaning water through the piping to be cleaned, or a cleaning system for piping, the system including a reservoir which retains cleaning water, an acid providing means supplies an acid to the cleaning water, an ozone generation means which generates ozone gas, a circulation flow path including a circulation pump which connects the reservoir and the ozone generation means in the form of a closed circuit, and circulates the cleaning water between the reservoir and ozone generation means, a conduction flow path including a conveying pump which communicates the reservoir and the piping to be cleaned, and conveys the cleaning water retained in the reservoir through the piping to be cleaned.

Abstract: Embodiments of cleaning a surface of a polysilicon layer during a chemical mechanical polishing (CMP) process are provided. The method includes providing a substrate, and forming a gate structure on the substrate, and the gate structure includes a polysilicon layer. The method further includes forming an inter-layer dielectric layer (ILD) over the gate structure. The method also includes performing a CMP process to planarize the inter-layer dielectric layer (ILD) and to expose the polysilicon layer, and the CMP process includes: providing an oxidation solution to a surface of the substrate to perform an oxidation operation to form an oxide layer on the polysilicon layer; and providing a cleaning solution to the surface of the substrate to perform a cleaning operation.

Abstract: A non-Newtonian concentrate composition includes a sensitizer or irritant, a surfactant, an anti-mist component and optionally a stability component. Example sensitizers and irritants include, but are not limited to, acids, quaternary compounds, and amines, and example anti-mist components include, but are not limited to, polyethylene oxide and polyacrylamide.

Abstract: A method for cleaning a semiconductor wafer after a Chemical Mechanical Polishing (CMP) process is provided. The method includes providing the semiconductor wafer into a cleaning module. The method further includes cleaning the semiconductor wafer by rotating a cleaning brush assembly. The method also includes applying an agitated cleaning liquid to clean the cleaning brush assembly.

Abstract: It is surprisingly found that when diamond particles are embedded into an alcohol wipe, the cleansing wipe that is formed is extremely useful at cleaning diamond jewellery in the home. It is also surprising that, given the abrasive nature of diamond, the diamond particles result in a satisfactory clean without causing any damage to the surface of the diamond being cleaned. The final result is that the cleaned diamond has recovered most of its original fire, life and brilliance.

Abstract: The present invention relates, in part, to cleaning methods and solvent cleaning compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent for use in connection with cleaning of metal parts, and in certain preferred embodiments cleaning metal parts to be used in an aircraft.

Abstract: According to the invention, the compositions and methods provide for the complete removal of synthetic glues or adhesives from a plurality of surfaces through the use of amide solvents in combination with surfactants, chelants, acidulants and/or additional bottle wash additives. Beneficially, the compositions and methods are suitable for use at lower temperatures, including below 35° C., and lower pH conditions, including from 5 to 10, from 6 to 9, and from 6 to 8, in comparison to conventional caustic-based adhesive removal compositions.

Abstract: A liquid processing apparatus according to the present disclosure includes a substrate holding unit configured to be rotated and hold a substrate from a bottom side thereof with substrate being spaced apart horizontally, a rotation driving unit configured to rotate the substrate holding unit, and an air supply unit provided above the substrate and configured to supply air toward the substrate held by the substrate holding unit. The liquid processing apparatus also includes an air supply path including a suction port that inhales the air supplied from the air supply unit and supplies the air inhaled from the suction port to a space formed between the substrate holding unit and a bottom surface of the substrate held by the substrate holding unit.

Abstract: A method to improve CdTe-based photovoltaic device efficiency is disclosed, the method including steps for removing surface contaminants from a semiconductor absorber layer prior to the deposition or formation of a back contact layer on the semiconductor absorber layer, the surface contaminants removed using at least one of a dry etching process and a wet etching process.

Abstract: A method including immersing a ceramic coated article into a bath including an HF acid solution having NH4F with a molar concentration of about 0.1M to 1.0M for a time period to remove a deposition, and rinsing the ceramic coated article.

Abstract: Methods for recovering organic heteroatom compounds from a hydrocarbon feedstock include feeding into a contactor a hydrocarbon feedstock and an aqueous solvent to form an extraction mixture of the aqueous solvent with the hydrocarbon feedstock. The hydrocarbon feedstock includes a hydrocarbon and an organic heteroatom compound. The aqueous solvent includes an ionic liquid formed from pressurized carbon dioxide and water. A pressure and temperature of the extraction mixture may be established that together tune the aqueous solvent to selectively form a solvent complex with the at least one organic heteroatom compound. Then, the solvent complex is extracted to a recovery vessel from the extraction mixture in the contactor. By adjustment of a recovery temperature of the recovery vessel, a recovery pressure of the recovery vessel, or both, the solvent complex decomposes into carbon dioxide and the organic heteroatom compound. The organic heteroatom compound is then recovered from the recovery vessel.

Abstract: The present invention relates to a laundry machine and a controlling method, which can remove allergens on the laundry. A controlling method of a laundry machine includes a mite-killing step of supplying seam to a drum to make laundry exposed to a hot environment at or over a temperature and for or over a duration of time, wherein the temperature and the duration are predetermined enough to kill house dust mites on the laundry; a rinsing step of rinsing the laundry; and a spin-drying step of spin-drying the rinsed laundry. The present invention has an advantageous effect of removing allergens including house dust mites, animal hair and pollens efficiently. In addition, if the house dust mites are killed by using steam, energy efficiency is high and an effect of mite-killing is great.

Abstract: In a method of detecting an etch by-product, the method including forming a magnetic layer including palladium (Pd) on a substrate; etching the magnetic layer to form a magnetic layer pattern; depositing a mixture including an alkyl bromide compound on a surface of the magnetic layer pattern; and measuring a current difference between the substrate and the mixture to detect an etch by-product on the surface of the magnetic layer pattern.

Abstract: The present invention relates to a process for washing a polysaccharide-based material which has been subjected to oxidation by at least one oxidizing agent, the said process comprising a first stage of washing with a first densified fluid which is inert with regard to the said oxidizing agent, characterized in that the first stage is followed by a second stage of washing with a washing composition comprising at least one second inert densified fluid and at least one alcohol. The said process according to the invention can additionally comprise a third stage of washing with a third inert densified fluid in order to remove the said alcohol deposited on the said polysaccharide-based material during the said second washing stage. Preferably, the said inert densified fluids are supercritical carbon dioxide.

Abstract: The invention is directed to methods of generating carbonate in situ in a use solution under an enriched CO2 atmosphere. In another aspect, the invention is directed to methods of cleaning food processing surfaces under an enriched CO2 atmosphere comprising contacting a food processing surface with a cleaning composition comprised of an alkalinity source, a surfactant, and water, monitoring the pH during the wash cycle and adjusting the pH by recirculating a use solution, adding a secondary alkalinity source, or both recirculating a use solution and adding a secondary alkalinity source, to generate carbonate in situ in the use solution. In a particular embodiment of the invention the alkalinity source is an alkali metal carbonate and the secondary alkalinity source is an alkali metal hydroxide.

Abstract: The substrate processing apparatus includes a process chamber; a susceptor configured to support a wafer; lifter pins configured to support the wafer on the susceptor; a gas supply unit configured to supply a gas into the process chamber; a heating unit configured to heat the wafer; an excitation unit configured to excite the gas supplied into the process chamber; an exhaust unit configured to exhaust the inside of the process chamber; and a controller. The controller controls a reducing gas to be supplied into the process chamber in a state in which the wafer is supported by the lifter pins, and controls the gas supply unit to supply an oxidizing gas and a reducing gas into the process chamber in a state in which the wafer is supported by the susceptor.

Abstract: An apparatus for cleaning chandeliers includes a hand-held tank for holding hot water and a base supporting the hand-held tank. The base has a hollow interior. The tank has sidewalls, at least one of which is transparent. An air and water pump and a battery are mounted in the hollow interior. The battery is in electrical communication with the pump. A first inlet admits ambient air into an inlet of the pump and a second inlet admits water into the inlet. At least one air and water-emitting nozzle is formed in a sidewall of the tank. A pump outlet is in open fluid communication with the at least one water-emitting nozzle. The at least one nozzle discharges agitating water and bubbles into the hot water or above the water line, depending upon the water depth, to help dislodge chemicals and grease from chandelier parts immersed in the hot water.