Abstract: The present disclosure provides a method for cleaning a chlorine membrane electrochemical cell.

Abstract: A cleaning composition suitable for removing soil from a variety of surfaces and a method of using the same are provided. Cleaning compositions according to embodiments of the present invention include at least one carbonate ester, including, for example, ethylene carbonate, propylene carbonate, trimethylene carbonate, and combinations thereof. Depending on the specific application, the compositions may also include at least one surfactant and/or at least one thickener. Cleaning compositions as described herein may be particularly useful for removing soil from surfaces of pipes, vessels, and other equipment associated with the production and/or processing of oil and/or natural gas, such as, for example, equipment associated with a hydraulic fracturing process.

Abstract: A wafer cleaning method includes dispensing liquid chemicals at two flow rates to start a chemical reaction, with the second flow rate being lower than the first. The method also includes dispensing liquid waters at two flow rates to stop a chemical reaction, with the second flow rate being lower than the first.

Abstract: A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.

Abstract: A substrate is moved below a substrate cleaning module in a direction extending from a leading edge to a trailing edge of the substrate cleaning module. A cleaning material is dispensed downward toward a top surface of the substrate along the leading edge of the substrate cleaning module. A rinsing material is dispensed downward toward the top surface of the substrate along the trailing edge of the substrate cleaning module to generate a rinsing meniscus. Vacuum suction is applied at a vacuum suction location along a bottom surface of the substrate cleaning module and parallel to the leading and trailing edges of the substrate cleaning module. The vacuum location is positioned between a dispense location of the cleaning material and a dispense location of the rinsing material. A plenum region located between the dispense location of the cleaning material and the vacuum location is vented.

Abstract: A composition of matter and method to remove excess material during the manufacturing of semiconductor devices includes providing a substrate; applying a metal chelator mixture to the substrate, where the metal chelator mixture comprising a metal chelator and a solvent, where the metal chelator binds to the platinum residue, to render the platinum residue soluble; and rinsing the metal chelator mixture from the substrate to remove the platinum residue from the silicide.

Abstract: After a substrate is cleaned, a liquid layer of a rinse liquid is formed so as to cover one surface of the substrate. Then, a liquid supply nozzle moves outward from above the center of the substrate. The liquid supply nozzle is stopped once at the time point where it moves by a predetermined distance from above the center of the substrate. In this time period, the liquid layer is divided within a thin layer region by a centrifugal force, so that a drying core is formed at the center of the liquid layer. Thereafter, the liquid supply nozzle moves outward again, so that a drying region where no rinse liquid exists expands on the substrate with the drying core as its starting point.

Abstract: To provide a method of manufacturing a semiconductor device, including: forming a thin film different from a silicon oxide film on a substrate by supplying a processing gas into a processing vessel in which the substrate is housed; removing a deposit including the thin film adhered to an inside of the processing vessel by supplying a fluorine-containing gas into the processing vessel after executing forming the thin film prescribed number of times; and forming a silicon oxide film having a prescribed film thickness on the inside of the processing vessel by alternately supplying a silicon-containing gas, and an oxygen-containing gas and a hydrogen-containing gas into the heated processing vessel in which a pressure is set to be less than an atmospheric pressure after removing the deposit.

Abstract: A solid controlled release composition according to the present invention includes at least one cellulosic material, water, at least one active ingredient, and optionally at least one of a saccharide, sugar alcohol or salt. The active ingredient can be a polycarboxylic acid.

Abstract: A medical instrument cleaning concentrate and method for cleaning medical equipment. The method includes contacting the equipment with a cleaning concentrate dissolved in water. The cleaning concentrate contains (i) a biofilm permeation agent, (ii) a nonionic alkoxylated alcohol surfactant having an HLB ranging from about 5 to less than 8, wherein a weight ratio of (i) to (ii) in the cleaning concentrate based on 100 wt. % active ingredients ranges from about 0.5:1 to about 1.5:1, and (iii) and an inert diluents. After contacting the equipment with the cleaning concentrate dissolved in water, the contacted surfaces are rinsed to substantially remove detectible traces of the ingredients of the cleaning concentrate from the surfaces.

Abstract: A flux residue cleaning system includes first and second immersion chambers, first and second spray chambers, and a drying chamber. The first immersion chamber softens an outer region of a flux residue formed around microbumps interposed between a wafer and a die when the wafer is immersed in a first chemical. The first spray chamber removes the outer region of the flux residue when the wafer is impinged upon by a first chemical spray in order to expose an inner region of the flux residue. The second immersion chamber softens the inner region of the flux residue when the wafer is immersed in a second chemical. The second spray chamber removes the inner region of the flux residue when the wafer is impinged upon by a second chemical spray in order to clean the wafer to a predetermined standard. The drying chamber dries the wafer.

Abstract: A dishwasher includes a hydraulically actuated dispenser for dispensing an additive into a treating chamber of the dishwasher. The dispenser includes a storage chamber, a lid, and a hydraulic cylinder that is fluidly connected to a water source external to the dishwasher. The hydraulic cylinder opens the dispenser lid at a predetermined point in a washing operation such that the additive is released into the treating chamber.

Abstract: A substrate processing apparatus comprising a substrate holding rotating mechanism, a process liquid supply mechanism having a nozzle for dispensing a process liquid toward a principal face of the substrate, a processing liquid reservoir for holding sufficient process liquid to form a liquid film covering the whole principal face of the substrate, a liquid film forming unit for forming the liquid film by supplying the process liquid onto the principal face of the substrate in a single burst, and a control unit for controlling the liquid film forming unit and the process liquid supply mechanism such that the process liquid is dispensed from the process liquid nozzle toward the principal face of the substrate after formation of the liquid film covering the whole area of the principal face of the substrate by the liquid film forming unit.

Abstract: A recyclable article having an external surface with an image printed thereon by droplets of ink is provided. The droplets of ink comprise a composition that includes a hydrophilic component. In embodiments, the hydrophilic component can facilitate the separation or loosening of the image from the external surface of the container when the image is exposed to a liquid-based solution at an elevated temperature. Methods for facilitating recycling of recyclable articles having printed images are also disclosed.

Abstract: A method for in-line cleaning of ultrasonic welding tools is described. The method includes applying cleaning solution onto a work surface of a welding tool to be cleaned using an application device. Then the method involves removing residue dissolved in the cleaning solution from the work surface using a cleaning device. Next, the work surface is neutralized and rinsed using purified water and polished with a cleaning cloth. Finally, the work surface is rinsed using cleaning alcohol and blow-dried with compressed air.

Abstract: An object is to reduce changes in mechanical properties of a gas turbine blade base material during repair or regeneration of a gas turbine blade. For this purpose, a gas turbine blade after being operated is washed by being immersed into a strong alkaline washing solution, and the gas turbine blade after being washed with the strong alkaline washing solution is washed with water. The gas turbine blade after being washed with water is then washed by being immersed into a weak acid washing solution, and the gas turbine blade after being washed with the weak acid washing solution is subjected to heat treatment. The gas turbine blade after the heat treatment is then immersed into a strong acid washing solution, whereby the coating formed on the surface of the gas turbine blade is removed.

Abstract: Disclosed is a method of washing ware in an automatic institutional warewashing machine wherein the method includes contacting ware with a cleaning composition containing a surfactant and further includes contacting the washed ware in a rinse step with a potable aqueous rinse, the aqueous rinse being substantially free of an intentionally added rinse agent. A surfactant is employed in the wash step in an amount not to exceed 15 wt % based on weight of the detergent. The amount of surfactant is sufficient to provide a layer of surfactant on the ware so as to afford a sheeting action in an aqueous rinse step without any added rinse agent.

Abstract: Process and system for removing printing in metallic packages used in drinks, food and other applications in general, comprising the removal of ink before the cure thereof, by means of spray with ink remover liquid and non abrasive friction. Preferably, said liquid is an alkaline aqueous solution, which is sprayed onto the package surface simultaneously with the friction thereof with a soft and non abrasive element. In a preferred embodiment, said friction results in the rotation of the package around the longitudinal axis thereof, which is mounted on a rotative support, and the soft non abrasive element in contact with the surface thereof keeps motionless.

Abstract: A sputter target assembly comprising a Si target and a backing plate is provided wherein the backing plate is bonded to the target. The Si target comprises a smooth, mirror-like surface and has a surface roughness of less than about 15.0 Angstroms. Methods are provided for producing silicon target/backing plate assemblies wherein a silicon blank is processed to remove scratches from the blank surface resulting in a mirror like surface on the target, and a surface roughness of 15.0 Angstroms or less. The method comprises a first and second cleaning step with the first step being performed before the scratch removal step, and the second step being performed after the scratch removal.

Abstract: A substrate processing method of performing a predetermined processing by supplying a processing liquid to a processing region on a surface of a substrate, includes: supplying an alignment liquid to an alignment region on the surface of the substrate formed at a position different from that of the processing region; aligning a template disposed facing the substrate and including a processing liquid passage configured to pass the processing liquid and an alignment liquid passage configured to pass the alignment liquid, with respect to the substrate with the alignment liquid supplied to the alignment region such that the processing liquid passage is positioned above the processing region; and performing the predetermined processing on the substrate by supplying the processing liquid to the processing region through the processing liquid passage.

Abstract: A method of processing a substrate having a transparent conductive oxide disposed thereon, including: exposing the substrate to a first cleaning solution comprising hydrogen peroxide and ammonium citrate; exposing the substrate to a second cleaning solution having a pH within a range from about 6 to about 7, the second cleaning solution different than the first cleaning solution; agitating the second cleaning solution; and depositing a silicon-containing film on the transparent conductive oxide.

Abstract: A method for cleaning a ceramic component includes generating a computer solid model of a component, converting the computer solid model to a stereo-lithographic instruction file, and preparing the component in a stereo-lithography machine in response to the stereo-lithographic instruction file. The method further includes providing an amount of solvent, where a residue left from preparing the component is at least partially soluble in the solvent. The method includes immersing at least part of the component in the solvent, heating the solvent in a liquid state, and reducing a pressure of the solvent sufficiently to boil the solvent. The method further includes heat-curing the component.

Abstract: Internal cleaning of inverted cans includes engaging a can's cylindrical wall with a wall-conforming vacuum or adhesive gripper, causing a spraying unit to travel axially in and out of the can's opening while the can is inverted on a circular conveyor, and using a supporting arm or bottom stop to subject the can to a counterforce against a flushing force from sprayed cleaning medium. This prevents the can from being pressed out of a receptacle in which it sits during cleaning.

Abstract: A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.

Abstract: A substrate processing apparatus includes: a storage tank configured to store a liquid; a substrate support unit 10 configured to rotatably, horizontally support a substrate W; and a plate driving unit 30a configured to move the substrate support unit 10 between an immersion position at which the substrate W is immersed into the liquid stored in the storage tank, and a separation position located above the immersion position, at which the substrate W is separated from the liquid stored in the storage tank. The substrate processing apparatus also includes a rotary drive unit 30M configured to rotate the substrate W supported by the substrate support unit 10, and liquid supply units 10n, 20m and 20n configured to supply a liquid to the substrate W that is being rotated by the rotary drive unit in the separation position.

Abstract: Disclosed is a liquid processing apparatus including first and second cups installed so as to surround a rotation holding unit of a substrate and guide a processing liquid scattered from the rotating substrate downwards. A first driving unit and a second driving unit elevate the first cup and the second cup between a position receiving the processing liquid and the lower position thereof. A controller controls that the first cup and the second cup are ascended at the same time by transferring the driving force of the first driving unit while the first cup or a first elevating member thereof is overlapped with the second cup or a second elevating member thereof from the lower side by setting the ascending speed of the first cup to be higher than the ascending speed of the second cup when the first and second cups are ascended at the same time.

Abstract: A hydrophobizing agent is supplied to a substrate and a surface of the substrate is hydrophobized. Thereafter, the substrate is dried. The substrate to be processed is maintained in a state of not contacting water until it is dried after being hydrophobized. Collapse of a pattern formed on the substrate surface is thereby suppressed or prevented.

Abstract: A dishwashing detergent composition is provided for consumer use for in cleaning of alkaline sensitive metals such as aluminum or aluminum containing alloys. The compositions include alternatives to sodium tripolyphosphate and/or other phosphorus containing raw materials, while retaining cleaning performance and corrosion prevention. According to the invention, a phosphinosuccinic acid oligomer or mixture thereof is used as a corrosion inhibitor and can be included for aluminum protection in a number of different detergent compositions.

Abstract: A substrate processing device 10 includes a suction drying unit 65 drying a surface of a substrate W by absorbing and removing a liquid droplet of volatile solvent formed on the surface of the substrate W by a heating operation of a heating unit 64.

Abstract: The present invention relates, in part, to cleaning methods and solvent cleaning compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent for use in connection with cleaning of metal parts, and in certain preferred embodiments cleaning metal parts to be used in an aircraft.

Abstract: Scale formation on the electrode(s) of a liquor sensor can be prevented by continuously delivering a water-soluble scale inhibitor or dispersant into the vicinity of the electrodes of a liquor sensor device. Scale inhibitors include, for instance, polymers that are derived from acrylic acid, maleic acid, acrylamide acid, phosphonate, and combinations thereof. An aqueous mixture of scaling inhibitor continuously delivered to the probe tip of the liquor sensor that was placed in a kraft pulping liquor allowed the sensor to operate accurately for over a month without having to be cleaned of scale.

Abstract: A method for cleaning objects made of organic or inorganic materials, wherein the relevant material is brought into contact with a composition in the form of a fluid nanophase system, comprising a) at least one water-insoluble substance having a water solubility of less than 4 grams per liter, b) at least one amphiphilic substance (NP-MCA) which has no surfactant structure, is not structure-forming on its own, the solubility of which in water or oil ranges between 4 g and 1000 g per liter and which does not preferably accumulate at the oil-water interface, c) at least one anionic, cationic, amphoteric and/or non-ionic surfactant, d) at least one polar protic solvent, in particular having hydroxy functionality, e) if necessary one or more auxiliary substance.

Abstract: A method of operating a dishwasher having multiple wash chambers, with each wash chamber executing a different cycle of operation, and liquid from one chamber may be reused in the other chamber.

Abstract: Provided is a substrate treatment apparatus. The apparatus includes a chuck supporting a substrate and being rotatable, a container surrounding the chuck and collecting chemicals scattered due to rotations of the substrate, and a first spray nozzle spraying the chemicals to the substrate.

Abstract: Caustic-free detergent compositions are provided. Detergent compositions including an aminocarboxylate, water conditioning agent, non-caustic source of alkalinity and water beneficially do not require the use of additional surfactants and/or polymers to provide suitable detergency and prevent scale build-up on treated surfaces and enhance protein removal from the treated surfaces. Beneficially the detergent compositions have a concentrate pH less than about 11.5. The detergent compositions are used with a sanitizer to employ the low alkaline detergent compositions are particularly suitable for use as low temperature ware wash detergents that beneficially reduce scale build-up. Methods of employing the low alkaline detergent compositions are also provided.

Abstract: This disclosure dramatically extends by a factor of 5 to 7, the effective service-life of steel shaving blades by chelating mineral molecules in common tap water, thus preventing them from accumulating and attaching to the blade surfaces.

Abstract: A method of preconditioning soils on wares in a dishwasher between successive wash cycles of the dishwasher includes retaining a fluid containing a rinse aid from an initial wash cycle of a dishwasher and applying at least a portion of the fluid containing the rinse aid to soils on wares in the dishwasher before the start of a subsequent wash cycle of the dishwasher. Application of at least a portion of the fluid containing the rinse aid to soils on wares in the dishwasher may be in response to the occurrence of an event. Dishwashers which retain a fluid containing a rinse aid from an initial wash cycle and apply at least a portion of the fluid containing the rinse aid to soils on wares before the start of a subsequent wash cycle are also disclosed.

Abstract: A method for restoring a vehicle headlight lens by removing contaminants begins with wiping the lens surface of a vehicle headlight clean. An alcohol-saturated cleaning substance is used to remove debris and pollution from the surface. The alcohol is specifically selected to also remove moisture from the surface of the lens to the greatest extent possible. For optimal cleaning conditions the headlight is heated either by illumination or direct sunlight to a temperature of about 70 to 110 degrees Fahrenheit. A lens restoration solution that includes a dissolving chemical compound such as acetone, methyl ethyl ketone, cyclohexanone and/or tetrahydrofuran is applied to the lens surface, either with an applicator or by spraying. After the lens surface has been restored to a smooth, transparent condition, and adequately hardened, a UV protectant is applied to maintain the lens surface.

Abstract: A method and device for wet treating a peripheral area of a wafer-shaped article uses rollers for driving the wafer-shaped article at its edge. First and second liquid treatment units supply liquid towards the peripheral area. Each of the liquid treatment units comprises a liquid carrier, a liquid supply nozzle for supplying liquid to the liquid carrier and a liquid discharging channel for removing liquid from the liquid carrier. The second liquid treatment unit includes a gas treatment section with a gas supply nozzle for removing most of the second liquid from the peripheral area, and with a gas discharge channel for discharging gas and removed liquid.

Abstract: A method for cleaning process apparatus used for production of liquids, especially for cleaning filters, for example membrane filters. The apparatus is contacted with a solution of periodate. It is especially preferred that the cleaning process is carried out at a temperature between 15 and 95° C.

Abstract: A silicon wafer cleaning method is provided. Firstly, a silicon wafer is provided. Then, a polymer cleaning step is performed to clean a surface of the silicon wafer. After the polymer cleaning step, a deionized water/carbon dioxide gas discharging step is performed, so that the charges accumulated on the surface of the silicon wafer can be instantly removed. After the deionized water/carbon dioxide gas discharging step, two or more particle removing steps are performed. In addition, an air-jet step is performed during the time interval between every two sub-steps of a single particle removing step. Consequently, the cleaning efficiency of removing the particles will be enhanced.

Abstract: Embodiments of the disclosure are directed to a stable cleaning composition comprising: a chelating agent, a low-foaming, temperature- and alkaline-stable surfactant, and water. Other embodiments relate to the methods of preparing the stable cleaning compositions and the methods of their use. The stable cleaning composition described here is a low cost cleaning composition for use either alone or as an additive to a cleaning agent.

Abstract: A method for cleaning platinum residues from a surface of a substrate is provided. The method initiates with exposing the surface to a first solution containing a mixture of nitric acid and hydrochloric acid. Then, the surface is exposed to a second solution containing hydrochloric acid.

Abstract: In one embodiment, a method of cleaning a semiconductor manufacturing apparatus includes supplying a cleaning gas for removing a deposition film deposited on an inside wall of a treatment chamber through a supply pipe of the treatment chamber so that a supply amount of the cleaning gas from the supply pipe per unit time is greater than an exhaust amount of the cleaning gas from an exhaust pipe of the treatment chamber per unit time. The method further includes supplying an inert gas to fill the supply pipe with the inert gas.

Abstract: A rapid and effective means for decontaminating fouled oil-control booms is provided. The process involves washing the boom with pressured washing fluid, reorienting the boom to facilitate full inspection, and drying the boom. This can be performed in an assembly-line manner, using one or more conveyors to transport the boom sequentially to a washing area, an inspection area, and a drying area. Consequently, contaminated oil-control booms can be cleaned and redeployed rapidly and inexpensively during an oil release accident.

Abstract: The present disclosure relates to compositions and methods for cleaning medical and dental instruments. The disclosed compositions are preferably non-foaming or generate low foam to allow visual inspection of the cleaning process as well as safe handling of the instruments. The disclosed compositions preferably employ select proteases, a carbonate and a nonionic surfactant.

Abstract: A method of providing a layer of a first fluid and a layer of a second fluid on a first area of a support plate of an electrowetting device includes providing an emulsion of dispersed first fluid and continuous second fluid, the emulsion including an amount of the second fluid for forming the layer of the second fluid.

Abstract: A method and system for cleaning lithography components including contacting a substrate having residue including organic compounds and graphitic carbon deposited on a surface thereof with hydrogen peroxide vapor. The hydrogen peroxide vapor is irradiated with electromagnetic radiation having a wavelength in the range of 100 nm to 350 nm forming hydroxyl radicals. The hydroxyl radicals react with the residue to remove the residue from the surface of the substrate.

Abstract: A method and cleaning solution for cleaning electronic substrates, such as a semiconductor wafers, hard disks, photomasks or imprint molds. The method comprises the steps of contacting a surface of the substrate with a cleaning solution comprised of a polyphosphate, and then removing the cleaning solution from the surface. Additional optional steps include applying acoustic energy to the cleaning solution while the cleaning solution is in contact with the surface, and removing the cleaning solution from the surface by rinsing the surface with a rinsing solution with or without the application of acoustic energy. The cleaning solution comprises a polyphosphate, such as any of the water soluble polyphosphates. Depending on the application, the cleaning solution may also comprise a base and/or a quantity of suspended particles. Complexing agents, amines, biocides, surfactants and/or other substances, may also be added to the cleaning solution.

Abstract: A method of controlling the operation of a dishwasher having a tub defining a wash chamber and at least one dish rack located within the wash chamber. The dishwasher also has at least one spray arm located in the wash chamber and at least one nozzle located in the wash chamber and configured to provide a spray of liquid toward the dish rack.