Substrate Is Glass Patents (Class 216/97)
  • Patent number: 11267750
    Abstract: The present invention relates to a translucent structure having a surface unevenness shape which has: an area ratio of surface flat regions in which an angle formed with a flat surface is in a range of 0° to 0.5° of in a range of 0% to 5.8%; a projection density of in a range of 0.0001/?m2 to 0.05/?m2; a projection area ratio of in a range of 5.5% to 50%; a skewness Ssk which represents the degree of non-symmetry of in a range of ?0.5 to 1.1; a load area factor Smr1 at a boundary between a projected mountain portion and a core portion of in a range of 0% to 14.5%; and an arithmetic average surface roughness Sa of in a range of 0.06 ?m to 0.143 ?m.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: March 8, 2022
    Assignee: AGC INC.
    Inventors: Masanobu Isshiki, Toru Ikeda, Takaaki Murakami, Yosuke Takeda, Minoru Tamada
  • Patent number: 10295705
    Abstract: Provided is an anti-reflection glass substrate comprising an anti-reflection layer having a predetermined thickness from the surface, the anti-reflection glass substrate being characterized in that the anti-reflection layer has at least two layers of a first layer and a second layer successively provided in the depth direction from the surface, each of the first layer and the second layer has a plurality of pores, and the porosity of the first layer is smaller than the porosity of the second layer. In addition, provided is a method for manufacturing an anti-reflection glass substrate, the method successively comprising a step of etching a glass substrate using a first etching liquid and a step of etching the glass substrate using a second etching liquid, the method being characterized in that the molarity of multivalent metal ions of the first etching liquid is larger than the molarity of multivalent metal ions of the second etching liquid.
    Type: Grant
    Filed: January 5, 2015
    Date of Patent: May 21, 2019
    Assignee: Corning Precision Materials Co., Ltd.
    Inventors: Jin Su Nam, Seon Ki Kim, Jung Keun Oh, Su Yeon Lee, Myeong Jin Ahn, Jae Ho Lee
  • Patent number: 10065884
    Abstract: A method of forming a glass container including forming a glass container having a sidewall at least partially enclosing an interior volume, at least a portion of an interior surface of the sidewall having an interior surface layer; and contacting the glass container with a substantially fluoride-free aqueous treating medium to remove a thin layer of the interior surface layer having a thickness of from about 100 nm to about 1.0 ?m from the interior surface of the sidewall. The interior surface is resistant to delamination. Before contacting the glass container with the substantially fluoride-free aqueous treating medium, the exterior surface of the sidewall comprises strength-limiting surface flaws having a first shape, and after the contacting the exterior surface of the sidewall with the substantially fluoride-free aqueous treating medium, the strength-limiting surface flaws have a second shape.
    Type: Grant
    Filed: November 23, 2015
    Date of Patent: September 4, 2018
    Assignee: CORNING INCORPORATED
    Inventors: Dana Craig Bookbinder, Richard Michael Fiacco, Timothy Michael Gross
  • Patent number: 9745220
    Abstract: A method etching a glass material comprises providing an etchant comprising 10-30% HF, 5-15% HNO3,and at least 10% H3PO4 by volume constituted such that the ratio HF:HNO3 by volume is in the range of 1.7:1 to 2.3:1, providing a glass material to be etched, and contacting the glass material with the etchant. The etchant desirably has no other acid components. The method may be performed with the etchant temperature within the range of 20-30° C. The glass material may be an aluminosilicate glass. Ultrasound energy may be applied to the etchant, to the glass material, or both.
    Type: Grant
    Filed: June 20, 2014
    Date of Patent: August 29, 2017
    Assignee: Corning Incorporated
    Inventors: Robert Carl Burket, Benedict Yorke Johnson, Samuel Odei Owusu, Tammy Lynn Petriwsky
  • Patent number: 9718728
    Abstract: In one aspect, a method for use in preparing a glass comprises: performing a first ion exchange process to replace at least a first ion in the glass with at least a second ion, the second ion being smaller than the first ion; and performing a second ion exchange process to replace at least the second ion in the glass with at least a third ion, the third ion being larger than the first ion. In another aspect, a glass is prepared at least in part by: performing a first ion exchange process to replace at least a first ion in the glass with at least a second ion, the second ion being smaller than the first ion; and performing a second ion exchange process to replace at least the second ion in the glass with at least a third ion, the third ion being larger than the first ion.
    Type: Grant
    Filed: January 20, 2016
    Date of Patent: August 1, 2017
    Assignee: International Business Machines Corporation
    Inventors: Qiang Huang, Kenneth P. Rodbell, Asli Sahin
  • Patent number: 9506021
    Abstract: To maintain a uniform etching rate during cleaning of a responsive glass in a glass electrode, a responsive-glass cleaning liquid for a glass electrode 1 serves to clean a responsive glass 2 used in the glass electrode 1, is used with a hydrated-layer forming solution for forming a hydrated layer on the surface of the responsive glass 2, and contains ammonium hydrogen fluoride having a predetermined concentration, or a salt of a strong base containing hydrofluoric acid and a fluoride ion.
    Type: Grant
    Filed: September 2, 2014
    Date of Patent: November 29, 2016
    Assignee: HORIBA, LTD.
    Inventors: Manabu Shibata, Nahoko Nishimura, Takeshi Mori, Hisashi Yamanouchi, Katsuaki Ogura
  • Patent number: 9169437
    Abstract: A layer of a metal selected from titanium, niobium, tungsten, molybdenum, ruthenium, rhodium, arsenic, aluminum and gallium, an oxide of the metal, a nitride of the metal, silicon nitride, hafnium nitride, tantalum nitride, or an alloy of these metals, the layer being provided on an underlying base material selected from glass, silicon, copper and nickel, is selectively etched with an alkaline etching solution containing a predefined complexing agent.
    Type: Grant
    Filed: September 3, 2012
    Date of Patent: October 27, 2015
    Assignee: JCU CORPORATION
    Inventors: Christopher Cordonier, Mitsuhiro Nabeshima, Shingo Kumagai, Naoki Takahashi
  • Patent number: 9139470
    Abstract: The invention relates to a chemical process for obtaining glass with a total or partial satin/matte finish, comprising immersion in an acid solution, for the simultaneous and continuous production of one or more parts and/or sheets of glass having standard, special or variable dimensions, thicknesses, colours, uses and applications. The inventive process can be used to obtain glass with a total or partial satin/matte finish in a simultaneous and continuous manner either on one or both sides of the glass (atmospheric side and tinned side) or of several glass sheets and/or parts at the same time, with different thicknesses, measurements, colours, uses, specifications and characteristics, said process being performed simultaneously by means of immersion. According to the invention, containers of glass sheets are immersed in containers of chemical solutions using a variable-speed transport immersion crane.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: September 22, 2015
    Inventor: Juan Luis Rendon Granados
  • Patent number: 9126858
    Abstract: A method for manufacturing a glass substrate for a display includes a step of producing a glass substrate and a step of performing a surface treatment on one glass surface of major surfaces of the glass substrate to form surface unevenness. The surface treatment is performed such that protruded portions having a height of 1 nm or more from the surface roughness central plane of the surface unevenness are dispersedly provided on the glass surface after the surface treatment and the area ratio of the protruded portions with respect to the area of the glass surface is 0.5-10%. Using this glass substrate, semiconductor elements are formed on a major surface of the glass substrate opposite to the glass surface. Accordingly, a display panel is produced.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: September 8, 2015
    Assignee: AvanStrate Inc.
    Inventor: Young Tae Park
  • Patent number: 9112076
    Abstract: A glass substrate manufacturing method of the present invention comprises forming a multi-porous structure layer which comprises nano-size pores at a surface of a glass substrate by etching the surface of the glass substrate with hydrofluoric (HF) acid or an etchant substituting for fluoride. Unlike related art methods, the glass substrate forms no additional coating layer, uses no harmful chemical material, and is given anti-reflection, anti-fogging, and super-hydrophilic characteristics through a simple process at a relatively low temperature. The glass substrate is effectively applied to various applications requiring high light transmission such as a protective filter for a display device, a solar cell, a mobile communication device, glass of a building structure, and an optical element lens.
    Type: Grant
    Filed: August 10, 2011
    Date of Patent: August 18, 2015
    Assignee: INDUSTRY-ACADEMIC COOPERATION FOUNDATION YONSEI UNIVERSITY
    Inventors: Jae Min Myoung, Jun Jie Xiong, Tae Il Lee
  • Publication number: 20150136736
    Abstract: The disclosure is directed to a method for controlling the sludge that is generated during the wet acid etching of glass articles. The four Factors that need to be controlled are (i) the dissolved glass level A; (ii) the HF concentration B; (iii) the second acid concentration C, the second acid being a strong acid, and (iv) the solubility constant D of the precipitate, Ksp, which is controlled by changing temperature or ionic strength. The disclosed method utilized HF as the etchant and a strong acid selected from the group consisting of HCI, H2SO4.HNO3 and HCIO4.
    Type: Application
    Filed: May 28, 2013
    Publication date: May 21, 2015
    Inventors: Yuhui Jin, Jun Hou, Mehmet Derya Tetiker, Shyamala Shanmugam
  • Patent number: 9023229
    Abstract: A double ITO structure, containing sequential layers of indium tin oxide (ITO), silicon dioxide (SiO2) (which may include a dopant material) and ITO, is selectively protected by a patterned photo-resist mask. The sequential layers are etched together in a single etching step using an etchant composition which is an acidic solution containing a transition metal chloride and hydrochloric acid (HCl). Thus, the double ITO structure is etched using a substantially fluoride-free etchant composition.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: May 5, 2015
    Assignee: 3M Innovative Properties Company
    Inventors: Muthu Sebastian, Fong Liang Tan
  • Patent number: 9017566
    Abstract: A glass article including: at least one anti-glare surface having haze, distinctness-of-image, surface roughness, and uniformity properties, as defined herein. A method of making the glass article includes, for example: depositing deformable particles on at least a portion of a glass surface of the article; causing the deposited deformable particles on the surface to deform and adhere to the surface; and contacting the surface having the adhered particles with an etchant to form the anti-glare surface. A display system that incorporates the glass article, as defined herein, is also disclosed.
    Type: Grant
    Filed: October 11, 2011
    Date of Patent: April 28, 2015
    Assignee: Corning Incorporated
    Inventors: Charles Warren Lander, Timothy Edward Myers, Kelvin Nguyen, Alan Thomas Stephens, II
  • Patent number: 8999446
    Abstract: The present disclosure is directed to systems and methods for adjusting adhesion strength between materials during semiconductor sensor processing. One or more embodiments are directed to using various surface treatments to a substrate to adjust adhesion strength between the substrate and a polymer. In one embodiment, the surface of the substrate is roughened to decrease the adhesive strength between the substrate and the polymer. In another embodiment, the surface of the substrate is smoothed to increase the adhesive strength between the substrate and the polymer.
    Type: Grant
    Filed: July 9, 2012
    Date of Patent: April 7, 2015
    Assignee: STMicroelectronics Pte Ltd.
    Inventors: Ying Yu, TienChoy Loh, ShianYeu Kam
  • Patent number: 8993446
    Abstract: A method for flowable oxide deposition is provided. An oxygen source gas is increased as a function of time or film depth to change the flowable oxide properties such that the deposited film is optimized for gap fill near a substrate surface where high aspect ratio shapes are present. The oxygen gas flow rate increases as the film depth increases, such that the deposited film is optimized for planarization quality at the upper regions of the deposited film.
    Type: Grant
    Filed: April 23, 2013
    Date of Patent: March 31, 2015
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Hung-Wei Liu, Tsung-Liang Chen, Huang Liu, Zhiguo Sun
  • Patent number: 8992786
    Abstract: A glass article including: at least one anti-glare surface having haze, distinctness-of-image, surface roughness, and uniformity properties, as defined herein. A method of making the article having an anti-glare surface includes, for example, forming a protective film on selected portions of at least one surface of the article; contacting the at least one surface with a liquid etchant; and removing the protective film from the surface of the article to form the anti-glare surface. A display system that incorporates the glass article, as defined herein, is also disclosed.
    Type: Grant
    Filed: April 20, 2011
    Date of Patent: March 31, 2015
    Assignee: Corning Incorporated
    Inventors: Jeffrey Todd Kohli, Kelvin Nguyen, Lu Zhang
  • Publication number: 20150079346
    Abstract: Satin-matte finish glass products having a uniform finish perfectly homogeneous, a soft and smooth touch with a pleasant aspect to the eye are disclosed and described. Such products may in some aspects have finish characteristics defined by values of transmittance, absorbance, reflectance, roughness and a series of micrographs taken with an atomic force microscope to see the morphology and structure of satin-glass.
    Type: Application
    Filed: August 20, 2014
    Publication date: March 19, 2015
    Inventor: Juan Luis Rendón Granados
  • Patent number: 8980115
    Abstract: A cover glass element can extend to the edges of an electronic device while maintaining the optical flatness and thickness needed for the cover glass. A first glass sheet with the desired thickness and flatness can be thermally bonded to a second glass sheet machined to include an opening to be received by the edges of the electronic device. The resulting three-dimensional cover element forms a uni-body frame that is significantly stiffer than a single sheet of glass, and the larger surface area of the edge provides for enhances pressure distribution, particularly after chemical strengthening, thus enhancing the durability of the electronic device. Further, the thermal bonding process uses lower temperatures than processes such as slumping or pressing, which could potentially affect the flatness and optical clarity of the original sheet glass.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: March 17, 2015
    Assignee: Amazon Technologies, Inc.
    Inventors: David N. Bibl, Leo B. Baldwin
  • Publication number: 20150072130
    Abstract: The present invention relates to an alkali-free glass substrate with a thickness of 0.4 mm or less, which has been reduced in thickness by 5 ?m or more by a hydrofluoric acid (HF) etching treatment, in which the alkali-free glass substrate contains an alkali-free glass described below, and the alkali-free glass substrate after reduced in thickness has a specific modulus of 32 MNm/kg or more and a photoelastic constant of 31 nm/MPa/cm or less, the alkali-free glass having a strain point of 710° C. or higher, an average thermal expansion coefficient at 50 to 350° C. of from 30×10?7to 43×10?7/° C., a temperature T2 at which a glass viscosity reaches 102 dPa·s of 1710° C. or lower, a temperature T4 at which the glass viscosity reaches 104 dPa·s of 1320° C. or lower.
    Type: Application
    Filed: November 14, 2014
    Publication date: March 12, 2015
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Hirofumi TOKUNAGA, Tomoyuki TSUJIMURA, Manabu NISHIZAWA, Akio KOIKE
  • Patent number: 8974685
    Abstract: Provided is a fine-processing agent which, when fine-processing a laminated film stacked at least with a silicon dioxide film and a silicon nitride film, can selectively fine-process the silicon dioxide film. Also provided is a fine-processing method utilizing the fine-processing agent. The fine-processing agent is characterized by including: (a) 0.01-15.0 weight % hydrogen fluoride and/or 0.1-40.0 weight % ammonium fluoride, (b) water, and (c) 0.001-10.00 weight % water-soluble polymer selected from among a group consisting of acrylic acid, ammonium acrylate, acrylic acid ester, acrylamide, styrenesulfonic acid, ammonium styrenesulfonate, and styrenesulfonic acid ester.
    Type: Grant
    Filed: May 21, 2009
    Date of Patent: March 10, 2015
    Assignee: Stella Chemifa Corporation
    Inventors: Masayuki Miyashita, Takanobu Kujime, Keiichi Nii
  • Patent number: 8969218
    Abstract: Disclosed is a technique for attaining high etching selectivity of a silicon nitride film to a silicon oxide film. The etching method includes a step of supplying a silylating agent to a substrate having a silicon nitride film and a silicon oxide film exposed on the surface thereof to thereby form a silylated film as a protective film over the surface of the silicon oxide film. After this step, an etching solution is supplied to the substrate. It is thus possible to selectively etch only the silicon nitride film.
    Type: Grant
    Filed: April 10, 2012
    Date of Patent: March 3, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Tsukasa Watanabe, Keisuke Egashira, Miyako Kaneko, Takehiko Orii
  • Publication number: 20150048053
    Abstract: A layer of a metal selected from titanium, niobium, tungsten, molybdenum, ruthenium, rhodium, arsenic, aluminum and gallium, an oxide of the metal, a nitride of the metal, silicon nitride, hafnium nitride, tantalum nitride, or an alloy of these metals, the layer being provided on an underlying base material selected from glass, silicon, copper and nickel, is selectively etched with an alkaline etching solution containing a predefined complexing agent.
    Type: Application
    Filed: September 3, 2012
    Publication date: February 19, 2015
    Applicant: JCU CORPORATION
    Inventors: Christopher Cordonier, Mitsuhiro Nabeshima, Shingo Kumagai, Naoki Takahashi
  • Publication number: 20150049498
    Abstract: In implementations, a glass-based multichip package includes a photodefinable glass-based substrate, at least one electronic component disposed on the photodefinable glass-based substrate, and a portion of the photodefinable glass-based substrate that has been exposed to ultraviolet light, where the portion of the photodefinable glass-based substrate includes ceramic. Additionally, the sensor package may include additional electronic components, a glass touch panel, and/or a printed circuit board. In implementations, fabricating the sensor package device includes receiving a photodefinable glass-based substrate, etching the photodefinable glass-based substrate, and forming a ceramic portion of the photodefinable glass-based substrate.
    Type: Application
    Filed: December 20, 2013
    Publication date: February 19, 2015
    Applicant: Maxim Integrated Products, Inc.
    Inventor: Tiao Zhou
  • Publication number: 20150041435
    Abstract: Methods provide for post processing at least one flexible glass sheet with the step of providing the glass sheet with an initial shape. The method then further includes the step of flexing the glass sheet into a secondary shape from the initial shape. The method then further includes the step of post processing the glass sheet while biasing the glass sheet into the secondary shape. The method then still further includes the step of releasing the glass sheet to at least partially return to the initial shape.
    Type: Application
    Filed: July 30, 2014
    Publication date: February 12, 2015
    Inventors: Jianqiang Gu, Jean-Marc Martin Gerard Jouanno, William Brashear Mattingly, III, Wenchao Wang, Yoshiki Yamashita, Rui Zhang
  • Patent number: 8951434
    Abstract: A glass etching medium and a method for etching the surface of a glass sheet to modify surface flaw characteristics without degrading the optical quality of the sheet surface, wherein the etching medium is a thickened aqueous acidic fluoride-containing paste comprising at least one dissolved, water-soluble, high-molecular-weight poly (ethylene oxide) polymer thickener.
    Type: Grant
    Filed: May 8, 2013
    Date of Patent: February 10, 2015
    Assignee: Corning Incorporated
    Inventors: Timothy Edward Myers, Shyamala Shanmugam, Alan Thomas Stephens, II, Matthew John Towner, Kevin William Uhlig, Lu Zhang
  • Patent number: 8940178
    Abstract: A method of texturizing a silicon substrate comprising a) contacting the substrate with an etching solution comprising glycolic acid, b) etching a surface of the substrate thereby forming disruptions in said surface of the substrate, and c) removing the etching solution to yield a texturized substrate, said texturized substrate having a plurality of disruptions in at least one surface with a surface density of disruptions of a minimum of 60 disruptions in a 400 micron square area.
    Type: Grant
    Filed: March 18, 2009
    Date of Patent: January 27, 2015
    Assignee: E I du Pont de Nemours and Company
    Inventors: Seung Jin Lee, Hee Soo Yeo
  • Publication number: 20140348997
    Abstract: The present disclosure relates to beta-cyclodextrin immobilized on glass manufactured by method comprising: a) synthesizing mono-6-(p-toluenesulfonyl)-6-deoxy-cyclodextrin from beta-cyclodextrin and converting the mono-6-(p-toluenesulfonyl)-6-deoxy-cyclodextrin into ?-cyclodextrin-undecenyl ether; and b) etching borosilicate glass and coating the borosilicate glass with the ?-cyclodextrin-undecenyl ether and removal of cholesterol from milk using the same.
    Type: Application
    Filed: April 18, 2014
    Publication date: November 27, 2014
    Applicant: Konkuk University Industrial Cooperation Corp.
    Inventors: Seunho Jung, Muhammad Nazir Tahir, Seung Ryeoul Paik, Daham Jeong, Chanho Kwon
  • Patent number: 8894872
    Abstract: A liquid etching composition comprising: (a) at least one etching agent precursor having an activation temperature of at least 400° C., at which temperature said precursor yields an active agent suitable for chemical etching of glass, said precursor present at a concentration of at least 2.5% w/w; (b) a binder; and (c) a liquid vehicle.
    Type: Grant
    Filed: September 22, 2008
    Date of Patent: November 25, 2014
    Assignee: DIP Tech Ltd.
    Inventors: Matti Ben-Moshe, Michael Kheyfets
  • Patent number: 8894867
    Abstract: Disclosed is a method for producing ZnO contact layers for solar cells. The layers are etched using hydrofluoric acid so as to generate a texture.
    Type: Grant
    Filed: August 7, 2010
    Date of Patent: November 25, 2014
    Assignee: Forschungszentrum Juelich GmbH
    Inventors: Eerke Bunte, Jorj Owen, Juergen Huepkes
  • Patent number: 8894868
    Abstract: A method of forming an aperture (e.g., a through via, a blind via, a trench, an alignment feature, etc.) within a substrate includes irradiating a substrate with a laser beam to form a laser-machined feature having a sidewall. The laser-machined feature is then processed to change at least one characteristic (e.g., the sidewall surface roughness, diameter, taper, aspect ratio, cross-sectional profile, etc.) of the laser-machined feature. The laser-machined feature can be processed to form the aperture by performing an isotropic wet-etch process employing an etchant solution containing HNO3, HF and, optionally acetic acid.
    Type: Grant
    Filed: October 6, 2011
    Date of Patent: November 25, 2014
    Assignee: Electro Scientific Industries, Inc.
    Inventors: Andy Hooper, Daragh Finn, Tim Webb, Lynn Sheehan, Kenneth Pettigrew, Yu Chong Tai
  • Publication number: 20140339194
    Abstract: Described herein are aqueous acidic glass etching solutions or media comprising HF and H2SO4, wherein HF is present in concentrations not exceeding about 1.3M. The etching solutions are used to treat glass articles such as thin glass sheets at above-ambient temperatures to etch slight thicknesses of surface glass therefrom, the etching solutions exhibiting improved stability against dissolved glass precipitation and rapid glass removal rates at slightly elevated temperatures.
    Type: Application
    Filed: December 10, 2012
    Publication date: November 20, 2014
    Applicant: Corning Incorporated
    Inventors: Yunfeng Gu, Jun Hou, Timothy James Orcutt, Daniel Arthur Sternquist, Jeffery Scott Stone
  • Patent number: 8828244
    Abstract: A method for making a support of at least one substrate, including: making a stack including at least two substrates, each of the two substrates including two opposite main faces, both substrates being secured to each other such that one of the main faces of a first of the two substrates is positioned facing one of the main faces of the second of the two substrates and against an etch-stop material; etching, through the first of the two substrates and with stop on the etch-stop material, at least one location that can receive a substrate that can be supported by the support.
    Type: Grant
    Filed: May 19, 2011
    Date of Patent: September 9, 2014
    Assignee: Commissariat à l'énergie atomique et aux énergies alternatives
    Inventors: Frank Fournel, Laurent Bally, Marc Zussy, Dominique Jourde
  • Patent number: 8821747
    Abstract: A method for manufacturing a glass substrate for a magnetic disk comprises a surface grinding step of processing a mirror-surface plate glass, having a main surface in the form of a mirror surface, to a required flatness and surface roughness using fixed abrasive particles. The method comprises, before the surface grinding step using the fixed abrasive particles, a surface roughening step of roughening the surface of the mirror-surface plate glass by frosting.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: September 2, 2014
    Assignee: Hoya Corporation
    Inventors: Takanori Mizuno, Yosuke Suzuki
  • Patent number: 8821735
    Abstract: An object of the invention is to effectively remove particles on the glass substrate surfaces, even in the case wherein abrasive particles having a small particle size is used in the polishing step of the glass substrate and a supersonic treatment is performed at a high frequency at the supersonic cleaning step after the polishing step. In a manufacturing method of a glass substrate for a magnetic disk comprising a polishing step for performing polishing of the glass substrate and a supersonic cleaning step for performing supersonic cleaning of the glass substrate after the polishing step, the polishing step uses abrasive particles having a particle size of 10 nm to 30 nm and a first supersonic cleaning is performed at a frequency of 300 kHz to 1,000 kHz to form secondary particles and then a second supersonic cleaning is performed at a frequency of 30 kHz to 100 kHz in the supersonic cleaning step.
    Type: Grant
    Filed: March 31, 2011
    Date of Patent: September 2, 2014
    Assignee: Hoya Corporation
    Inventor: Yosuke Suzuki
  • Patent number: 8806738
    Abstract: A method for manufacturing a quartz crystal unit, comprising the steps of forming a quartz crystal tuning fork shape having a quartz crystal tuning fork base, and first and second quartz crystal tuning fork tines, a quartz crystal tuning fork resonator having the quartz crystal tuning fork shape, forming at least one groove in at least one of opposite main surfaces of each of the first and second quartz crystal tuning fork tines, determining each of a length of the at least one groove and an overall length of the quartz crystal tuning fork resonator so that a series resistance R1 of a fundamental mode of vibration of the quartz crystal tuning fork resonator is less than a series resistance R2 of a second overtone mode of vibration thereof, housing the quartz crystal tuning fork resonator in a case, connecting a lid to the case, and disposing a metal or a glass in a through-hole of the case.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: August 19, 2014
    Assignee: Piedek Technical Laboratory
    Inventor: Hirofumi Kawashima
  • Publication number: 20140151329
    Abstract: A foam acid glass etching media including a solvent; a source of fluorine; and a nonionic surfactant. The foam acid is in the form of a colloidal dispersion with a gas dispersed in a continuous liquid phase. The media is useful in etching or polishing glass sheets in a batch or continuous process. Described is a method for etching or polishing glass by providing a glass having at least one major surface; and contacting the at least one major surface with a foam acid.
    Type: Application
    Filed: October 28, 2013
    Publication date: June 5, 2014
    Applicant: CORNING INCORPORATED
    Inventors: John Martin Dafin, Todd Michael Harvey, Felipe Miguel Joos, Vasudha Ravichandran, Kevin William Uhlig, Kathleen Ann Wexell, Christine Coulter Wolcott
  • Patent number: 8740671
    Abstract: The present invention relates to a method for manufacturing a glass substrate for an information recording medium having a high level of cleanness and superior smoothness. The manufacturing method includes a step for washing a disk-shaped glass plate with an acid washing liquid, a step for removing at least part of a surface layer, which is formed on the surface of the glass plate, by performing grinding with diamond abrasion grains, and a step for washing the surface with a neutral or alkaline washing liquid.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: June 3, 2014
    Assignee: Hoya Corporation
    Inventors: Yasuhiro Saito, Toshiaki Hashimoto, Yuriko Kudoh
  • Patent number: 8741159
    Abstract: A method of fabricating a touch screen panel according to an embodiment of the present invention includes: forming a reinforcing layer on the top and the bottom of a glass substrate by reinforcing the entire surface of the glass substrate defining a plurality of unit cell regions; forming the touch screen panels in the unit cell regions on a side of the glass substrate with the reinforcing layers; cutting the reinforced glass substrate into the touch screen panels; forming passivation layers on the outer surfaces of the touch screen panels and sequentially stacking the touch screen panels; and simultaneously with the stacking, performing healing on the non-reinforced cut-sides of the stacked touch screen panels.
    Type: Grant
    Filed: May 16, 2011
    Date of Patent: June 3, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Kyu-taek Lee, Kwan-Young Han
  • Patent number: 8728331
    Abstract: A method of fabricating an imprint mold is disclosed. The method includes: forming a first photo resist pattern on a substrate; etching the substrate using the first photo resist pattern as an etch mask to form a first pattern in the substrate; ashing the first photo resist pattern to form a second photo resist pattern; and etching the substrate using the second photo resist pattern to form a second pattern derived from the substrate and a third pattern derived from the first pattern.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: May 20, 2014
    Assignee: LG Display Co., Ltd.
    Inventors: Doo Hee Jang, Dhang Kwon, Hang Sup Cho, Ho Su Kim
  • Patent number: 8709271
    Abstract: The invention relates to a method for the laser marking of a support having a body and a cover sheet. A laser beam is used to etch the body of the support through the thickness of the cover sheet. The support is laminated either during or after the laser marking in order to reduce or prevent deformations in the cover sheet resulting from etching.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: April 29, 2014
    Assignee: Gemalto SA
    Inventor: Jean-Luc Lesur
  • Patent number: 8658049
    Abstract: A method for manufacturing a touch panel includes the following steps. A mother plate is provided. A plurality of adhesive materials are formed on the mother plate. A plurality of cover glasses are disposed on the adhesive materials respectively. The adhesive materials are cured, whereby the cover glasses are attached to the mother plate. A plurality of circuit units are formed on the cover glasses respectively. The cover glass having the circuit unit is removed from the mother plate, wherein the bonding strength of the cured adhesive material is within a range about between 5 g/25 mm and 600 g/25 mm, whereby the adhesive material provides enough adhesive force between the cover glass and the mother plate, and the adhesive material cannot be stayed on a surface of the cover glass during a removing process.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: February 25, 2014
    Assignee: HannStar Display Corporation
    Inventor: Tsung-Hsien Yen
  • Patent number: 8603350
    Abstract: A manufacturing method is provided for manufacturing a substrate for information storage media having various properties that are demanded for a next generation of information storage media substrate purposes exemplified by perpendicular magnetic recording systems, etc., and above all, having high fracture toughness and a smooth surface at low cost. The method of manufacturing a substrate for information storage media includes a step of preparing glass material of a plate shape containing SiO2 component, Al2O3 component, and R?2O component, R? being at least one selected from Li, Na, and K, and the step of lapping includes at least one sub-step of lapping the glass material with a diamond pad.
    Type: Grant
    Filed: July 14, 2010
    Date of Patent: December 10, 2013
    Assignee: Ohara inc.
    Inventors: Naoyuki Goto, Toshitaka Yagi, Yutaka Yamashita
  • Patent number: 8591753
    Abstract: A laser processing method of converging a laser light into an object to be processed made of glass so as to form a modified region and etching the object along the modified region so as to form a through hole in the object comprises a browning step of discoloring at least a part of the object by browning; a laser light converging step of forming the modified region in the discolored part of the object by converging the laser light into the object after the browning step; and an etching step of etching the object after the laser light converging step so as to advance the etching selectively along the modified region and form the through hole.
    Type: Grant
    Filed: July 19, 2011
    Date of Patent: November 26, 2013
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Hideki Shimoi, Keisuke Araki
  • Patent number: 8585910
    Abstract: A process for producing a micromachined tube (microtube) suitable for microfluidic devices. The process entails isotropically etching a surface of a first substrate to define therein a channel having an arcuate cross-sectional profile, and forming a substrate structure by bonding the first substrate to a second substrate so that the second substrate overlies and encloses the channel to define a passage having a cross-sectional profile of which at least half is arcuate. The substrate structure can optionally then be thinned to define a microtube and walls thereof that surround the passage.
    Type: Grant
    Filed: March 3, 2009
    Date of Patent: November 19, 2013
    Assignee: Integrated Sensing Systems Inc.
    Inventors: Douglas Ray Sparks, Nader Najafi
  • Patent number: 8580127
    Abstract: An RFID based thermal bubble type accelerometer includes a flexible substrate, an embedded system on chip (SOC) unit, an RFID antenna formed on the substrate and coupled to a modulation/demodulation module in the SOC unit, a cavity formed on the flexible substrate, and a plurality of sensing assemblies, including a heater and two temperature-sensing elements, disposed along the x-axis direction and suspended over the cavity. The two temperature-sensing elements, serially connected, are separately disposed at two opposite sides and at substantially equal distances from the heater. Two sets of sensing assemblies can be connected in differential Wheatstone bridge. The series-connecting points of the sensing assemblies are coupled to the SOC unit such that an x-axis acceleration can be obtained by a voltage difference between the connecting points. The x-axis acceleration can be sent by the RFID antenna to a reader after it is is modulated and encoded by the modulation/demodulation module.
    Type: Grant
    Filed: October 9, 2012
    Date of Patent: November 12, 2013
    Assignee: Chung Hua University
    Inventor: Jium Ming Lin
  • Patent number: 8535548
    Abstract: Methods and apparatus are disclosed for etching flexible glass sheets (13) in which the sheets (13) are transported in a near vertical orientation past non-contact, liquid-ejecting bearings (3) which apply an etching solution (e.g., an aqueous NaF/H3PO4 solution) to the sheets (13). In certain embodiments, the uppermost liquid-ejecting bearing (3) is above the top edge of the sheet (13) and thus is able to apply etching solution to the top of the sheet. In other embodiments, a top shower (11), which includes a set of spray nozzles (21) located above and distributed along the length of the apparatus, is used to apply etching solution to the top of the sheet (13). Using the disclosed methods and apparatus, glass sheets (13) produced by a fusion process are provided which have areas greater than five square meters and average surface roughness values in the range of 0.5 nanometers to 1.1 nanometers.
    Type: Grant
    Filed: November 8, 2012
    Date of Patent: September 17, 2013
    Assignee: Corning Incorporated
    Inventors: Gautam Narendra Kudva, Chih Yuan Lu, Weiwei Luo, Yoshihiro Nakamura, Tetsuzou Yamada
  • Patent number: 8529780
    Abstract: The invention relates to a ceramic substrate material having a first layer having a cavity structure formed therein, and at least one sealing layer situated on at least a part of the cavity structure. The first layer comprises at least one first component made of a crystalline ceramic material and/or a glass material as a matrix, the first layer containing a second component made of a further crystalline ceramic material, with selected mantle areas of the crystals and/or crystal agglomerates of the second component being etched out in such a way that the cavity structure is provided (preferably in the form of a pore and/or tube structure). The sealing layer seals the surface of the first layer in the areas on which it is situated (e.g., above the cavity structure), allowing application of thin-film structures to the cavity structure.
    Type: Grant
    Filed: September 18, 2009
    Date of Patent: September 10, 2013
    Assignee: Micro Systems Engineering GmbH
    Inventors: Dieter Schwanke, Mirco Harnack, Achim Bittner, Ulrich Schmid
  • Patent number: 8512580
    Abstract: A method of fabricating a thin liquid crystal display device including a glass substrate having a flat surface. The method includes etching at least one surface of a liquid crystal display, panel, and grinding the surface of the liquid crystal display panel so as to planarize the etched liquid crystal display panel.
    Type: Grant
    Filed: September 19, 2002
    Date of Patent: August 20, 2013
    Assignee: LG Display Co., Ltd.
    Inventors: Gyu Su Cho, Sung Guen Park, Byung Chul Kim
  • Patent number: 8500517
    Abstract: A synthetic quartz glass substrate is prepared by (1) polishing a synthetic quartz glass substrate with a polishing slurry comprising colloidal particles, an ionic organic compound having an electric charge of the same type as the colloidal particles, and water, and (2) immersing the polished substrate in an acidic or basic solution for etching the substrate surface to a depth of 0.001-1 nm. The method produces a synthetic quartz glass substrate while preventing formation of defects of a size that is detectable by the high-sensitivity defect inspection tool, and providing the substrate with a satisfactory surface roughness.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: August 6, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daijitsu Harada, Masaki Takeuchi
  • Patent number: 8465662
    Abstract: Provided is an etching composition for electively removing silicon dioxide at a high etch rate, more particularly, a composition for wet etching of silicon dioxide, including 1 to 40 wt % of hydrogen fluoride (HF); 5 to 40 wt % of ammonium hydrogen fluoride (NH4HF2); and water, and further including a surfactant to improve selectivity of the silicon dioxide and a silicon nitride film. Since the composition for wet etching of silicon dioxide has the high etch selectivity of the silicon dioxide to the silicon nitride film, it is useful for selectively removing silicon dioxide.
    Type: Grant
    Filed: September 21, 2010
    Date of Patent: June 18, 2013
    Assignee: Techno Semichem Co., Ltd.
    Inventors: Jung Hun Lim, Dae Hyun Kim, Chang Jin Yoo, Seong Hwan Park