Abstract: A method of forming an integrated circuit including forming a dielectric film is described. The forming of the dielectric film includes: providing a substrate, providing a carbon doped oxide film on the substrate, and treating the carbon doped oxide film with an electron beam. The carbon doped oxide film can be provided by chemical vapor deposition.

Abstract: A power distribution system for distributing external power across a die is disclosed, wherein the die has horizontal and vertical centerlines. The system and method include providing a power mesh that includes a plurality of V-shaped trunks patterned as concentric diagonal trunks extending from the horizontal and vertical centerlines of the die towards the periphery of the die.

Abstract: In a semiconductor integrated circuit having a functional macro, plural first and second power lines extending over the functional macro and supplying first-level and second-level voltages respectively to the functional macro are electrically connected through plural first and second power terminal patterns to plural third and fourth power lines extending over the semiconductor integrated circuit in the second direction and supplying the first-level and second-level voltages respectively to the semiconductor integrated circuit.

Abstract: A cavity-down ball grid array package includes a substrate having a through cavity provided therein. A heat sink is attached to the substrate and a semiconductor chip in the cavity is attached to the heat sink and electrically connected to the substrate. A ball grid array is on the substrate and on the semiconductor chip.

Abstract: The present invention is a dielectric film and its method of fabrication. The dielectric film of the present invention includes silicon oxygen fluorine and nitrogen wherein the interlayer dielectric comprises between 0.01-0.1 atomic percent nitrogen.

Abstract: A flip-chip transition interface structure is suitable for use in high speed applications that require low return losses. The transition interface includes a conductive signal element and two conductive reference elements formed on a flip-chip die substrate. A signal solder bump is located at a signal bond pad formed at an end of the conductive signal element, and a reference solder bump is located at each conductive reference element. The conductive elements are configured to form a substantially round cutout region surrounding the signal bond pad. The positions of the solder bumps on the respective conductive elements are selected in a manner that enhances the impedance matching of the transition interface structure.

Abstract: In order to make a charge couple device including an interconnect layer to contact active areas, a first layer of a first titanium nitride layer on the active areas, and then a series of alternating titanium and titanium nitride layers are deposited to form a composite sandwich structure. This structure is less prone flaking while able to withstand high temperature treatment during fabrication of backside illuminated sensors to improve quantum efficiency and reduce dark current.

Abstract: A multichip module that utilizes an angled interconnect to electrically interconnect chips in the module that are positioned at an angle relative to each other. The multichip module may comprise a first and second chips that are positioned in an orthogonal manner. The first and second chips are electrically interconnected via an interconnect structure comprising a first conductive pillar that extends from an outer surface of the first chip. A distal end of the first pillar is electrically connected to an outer surface of the second chip via a solder ball or another conductive pillar that is interposed between the distal end of the first conductive pillar and the second chip.

Abstract: A combination edge- and broadside-coupled transmission line element formed in an integrated circuit chip, using semiconductor processes, in a stack of metal layers separated by dielectric layers. Each of the metal layers includes a number of transmission lines. Interconnects between the transmission lines are formed at predetermined locations, each interconnect electrically connecting together a group of the transmission lines to form a conductor. The efficiency of the coupling between the lines in the different conductor is increased by positioning the lines such that both edge- and broadside-coupling is realized. For example, at least one of the transmission lines in one of the conductors is positioned either above or below a transmission line in the other conductor to achieve broadside-coupling and laterally adjacent to another transmission line in the other conductor to achieve edge-coupling.

Abstract: A metal interconnect structure and method of making the same implants ions of an alloy elements into a copper line through a via. Then ion implantation of the alloy elements in the copper line through the via provides improved electromigration properties at the copper line at a critical electromigration failure site, without attempting to provide alloy elements throughout the entire copper line.

Abstract: In a non-volatile semiconductor memory having a peripheral circuit zone and a memory zone including plural memory cells each having a floating gate and a control gate, an interlayer insulator is formed over the control gate of the memory cells and a gate electrode in the peripheral circuit zone. A groove is formed in the interlayer insulator film to longitudinally extend along a word line which constitutes the control gate for a plurality of memory cells arranged in one line. This groove penetrates through the interlayer insulator film to reach the word line over the whole length of the word line. A conducting material is deposited on the interlayer insulator film to fill up the groove so that a plate-shaped contact is formed in the groove. The conducting material is patterned to form an overlying interconnection extending on the interlayer insulator film along the word line.

Abstract: A wire width and a wiring space of each of signal wires 1 and ground/power wires 2 are determined to be a wire width W1 (the minimum wire width) and a wiring space S1, respectively. A wire width and a wiring space of the via-hole neighboring region 1a or 2a are determined to be a wire width W2 (>W1) and a wiring space S2 (<S1), respectively. The wire widths W1 and W2 and the wiring spaces S1 and S2 are respectively determined so as to maintain the minimum wiring pitch P. The wiring space S1 is determined also so as to satisfy {S1/P≧0.6}. Further, the signal wires 1 and the ground/power wires 2 have the same wire thickness of a wire thickness T1 which allows an aspect ratio (T1/W1) to be equal to, or higher than, 2.

Abstract: A semiconductor device is made up of a first insulating layer having a through hole; a first interconnection which comprises a first conductive layer, a first barrier layer, and a first main interconnection, and a second interconnection connected to one of the first conductive layer and the first barrier layer. Accordingly, the semiconductor device can avoid a problem so that the Cu of the first main interconnection transfers from a portion connected to the second interconnection due to cause electromigration, the connected portion becomes a void, and the first interconnection is disconnected to the second interconnection.

Abstract: An object of the invention is to provide a thin-film electronic component and a motherboard in which coupling strength of an external terminal to a supporting substrate is improved. The thin-film electronic component comprising: a supporting substrate; a lower electrode formed on part of the supporting substrate; an insulation layer formed on the lower electrode; an upper electrode formed on the insulation layer; a connection electrode which is formed on part of the supporting substrate located on a bottom surface of a through hole formed on the insulation layer, and is electrically connected to the lower electrode; and an external terminal disposed on the connection electrode within the through hole.

Abstract: It is intended to lower an increase of an area of an unused area or a wiring area, which is caused due to addition or enhancement of a particular function of a semiconductor device without significantly changing layout of the semiconductor device which has been previously designed. A semiconductor device (100A) has a layout in which a wiring area (102) is surrounded by an extension block (103) as a second semiconductor region and is completely sandwiched between a block (101) and the extension block (103). A plurality of wires (104) are laid across the wiring area (102) only at a single position between two adjacent ones of a plurality of pads (102a) in the wiring area (102), to connect a CPU (201c) in the block (101) and each of a ROM (301), a RAM (302) and an A/D converter (303) in the extension block (103) with each other.

Abstract: A semiconductor device in a computer system is disclosed that includes a die having an active surface bearing integrated circuitry, the die including a plurality of bond pads thereon connected to the integrated circuitry. At least one electrically conductive wire bond is made between first and second bond pads of the plurality of bond pads for providing external electrical connection between the two bond pads, which are not interconnected via the integrated circuitry within the die. The first bond pad can be a lead finger on the active surface and the second bond pad can be an option bond pad electrically connected to a third bond pad selected from the plurality of bond pads on the active surface via the integrated circuitry. Further, the third bond pad can connect to a fourth bond pad selected from the plurality of bond pads via a wire bond.

Abstract: A dummy pattern layer, which has not been effectively used, included in upper wire layers of a memory part of a system LSI chip is utilized as a large-scale wire TEG (test element group) region while leaving a dummy pattern function. Thus, the system LSI chip is provided with the wire TEG region independent of a product region while keeping the product region.

Abstract: A high density wordline strapping arrangement is obtained by routing three primary metal-2 wordline straps in the same space as four polysilicon wordline, and routing the fourth wordline strap in a metal-4 layer over the primary metal-2 wordline straps. Stitches in metal-3 connect metal-2 primary wordline straps to metal-4 wordline straps. Therefore, contact spacing and metal pitch limitations are relaxed to allow four metal wordline straps to occupy the same pitch as four polysilicon wordlines. The wordlines are twisted to keep the fully balanced and to minimise coupling between wordline straps and neighbouring power and signal lines. Hence, a smaller memory cell array can be formed according to the wordline packing arrangement of the present invention.

Abstract: Vertically oriented nano-circuits including fuses and resistors allow for significant densities to be achieved. The vertically oriented nano-circuits can be fabricated using standard known processes such as Damascene, wet etching, reactive etching, etc. Thus little additional capital expenditure is required other than to acquire present state-of-the-art equipment. Devices using these vertically oriented nano-circuits are also inexpensive to manufacture.

Abstract: The present invention relates to semiconductor devices.

Abstract: A new class of electronic systems, wherein microelectronic semiconductor integrated circuit devices are integrated on a common substrate with molecular electronic devices.

Abstract: The invention involves a method of packaging and interconnecting four power transistor dies to operate at a first frequency without oscillation at a second frequency higher than the first frequency but lower than a cutoff frequency of the transistors. The method comprises mounting the dies on a substrate with a lower side (drain) of each die electrically and thermally bonded to a first area of a conductive layer on the substrate; electrically connecting a source of each die to a second area of the conductive layer on the substrate; and electrically connecting a gate of each die to a third, common interior central area of the conductive layer on the substrate via separate electrical leads.

Abstract: A method is described for fabricating an encapsulated metal structure in a feature formed in a substrate. The sidewalls and bottom of the feature are covered by a barrier layer and the feature is filled with metal, preferably by electroplating. A recess is formed in the metal, and an additional barrier layer is deposited, covering the top surface of the metal and contacting the first barrier layer. The additional barrier layer is planarized, preferably by chemical-mechanical polishing. The method may be used in fabricating a MIM capacitor, with the encapsulated metal structure serving as the lower plate of the capacitor. A second substrate layer is deposited on the top surface of the substrate, with an opening overlying the encapsulated metal structure. A dielectric layer is deposited in the opening, covering the encapsulated metal structure at the bottom thereof. An additional layer, serving as the upper plate of the capacitor, is deposited to cover the dielectric layer and to fill the opening.

Abstract: A novel bi-level DRAM architecture is described which achieves significant reductions in die size while maintaining the noise performance of traditional folded architectures. Die size reduction results primarily by building the memory arrays with 6F2 or smaller memory cells in a type of cross point memory cell layout. The memory arrays utilize stacked digitlines and vertical digitline twisting to achieve folded architecture operation and noise performance.

Abstract: Coplanar waveguides having a deep trench between a signal line and a ground plane and methods of their fabrication are disclosed. An oxide layer is provided over a silicon substrate and a photoresist is applied and patterned to define areas where the signal line and the ground plane will be formed. A barrier layer is provided over the oxide layer in the defined areas. A metal layer is then deposited over the barrier layer. An etch mask is deposited over the metal layer for the subsequent trench formation. The photoresist and the underlying portion of the oxide and barrier layers are removed and a deep trench is formed in the substrate between the signal line and the ground plane using etching through the mask.

Abstract: A device having a landing pad structure on an underside of a device and method for fabricating same. The device is formed from a device layer with at least one landing pad protruding from an underside thereof. The landing pad is attached to the device layer by a plug passing through an opening in the device layer. The device may be attached to the device layer by one or more compliant flexures, which allow the device to rotate in and out of a plane defined by the device layer. The landing pads are fabricated by forming one or more vias through the device layer. An underlying sacrificial layer is then partially etched to form one or more depressions at locations corresponding to locations of the vias in the device layer. The vias and depressions are then filled with a landing pad material to form a structure having one or more landing pads protruding from an underside of the device layer. The sacrificial layer is subsequently removed to release the device.

Abstract: A semiconductor device comprising element regions formed in a semiconductor substrate, conductor plugs embedded in an interlayer insulation film, and wiring layers connected to the plugs, wherein the plugs are arranged on a straight line orthogonal to a longitudinal direction of the wiring layer in the same pitch as the wiring layers such that the straight line and upper surfaces of the plugs are superposed each other, and when the plugs are viewed in a cross section parallel to a main surface of the substrate and a distance which is between those two edge points of each of the plugs where a split line which passes through a center of each of the plugs passes is defined as a contact diameter, the contact diameter has three or more maximum values and three or more minimum values while the split line is rotated in the cross section by 360 degrees.

Abstract: A method of aligning a plurality of empty-spaced buried patterns formed in semiconductor monocrystalline substrates is disclosed. In an exemplary embodiment, high-temperature metal marks are formed to include a conductive material having a melting temperature higher than an annealing temperature used to form such empty-spaced buried patterns. The high-temperature metal marks are formed prior to the formation of the empty-spaced buried patterns formed in a monocrystalline substrate, so that the empty-space buried patterns are aligned to the marks. Subsequent semiconductor structures that are formed as part of desired semiconductor devices can be also aligned to the marks.

Abstract: The lithographic template is formed having a substrate, an optional etch stop layer formed on a surface of the substrate, and a patterning layer formed on a surface of the etch stop layer. The template is used in the fabrication of a semiconductor device for affecting a pattern in the device by positioning the template in close proximity to the semiconductor device having a radiation sensitive material formed thereon and applying a pressure to cause the radiation sensitive material to flow into the relief image present on the template. Radiation is then applied through the template so as to further cure portions of the radiation sensitive material and further define the pattern in the radiation sensitive material. The template is then removed to complete fabrication of the semiconductor device.

Abstract: An embodiment of the present invention discloses a memory device having an array with digit lines arranged in complementary pairs, the array comprising; a substantially planar layer having trenches therein; a first level of digit lines residing at least partially in the trenches; a second level of digit lines residing on the surface of the layer, the second level extending in generally parallel relation to the digit lines in the first level. The first level of digit lines are in alternating positions with the second level of digit lines and the alternating positions comprise a repeating pattern of a first complementary pair of digit lines at the first level adjacent a second complementary pair of digit lines at the second level.

Abstract: A structure for selectively programming interconnections between an input contact and an output contact segment in a multilayer semiconductor, comprising a first group of metal segments each being formed on successive layers of the semiconductor and being interconnected by vias, the first group including the output contact segment; a second group of metal segments each formed on successive layers of the semiconductor and being interconnected by vias, the second group including the input contact segment; and means for connecting a metal segment in the first group to a metal segment in a corresponding layer in the second group, thereby connecting the input contact to the output contact.

Abstract: In the semiconductor device having a structure in which a plurality of layers are built-up by layers made of different materials or layers including various formed patterns, it is an object to provide a method which smoothing surface can be achieved without a polishing treatment by CMP method or a smoothing process by depositing a SOG film, a substrate material is not chosen, and the smoothing is simple and easy. In the semiconductor device in which a plurality of different layers are formed, smoothing surface can be achieved without the polishing treatment by the CMP method or the smoothing process by depositing the SOG film to a dielectric film formed on a dielectric film and a wring (electrode) or a semiconductor layer in a manner that an aperture portion is formed in the dielectric film, the wring (electrode) or the semiconductor layer is formed in the aperture portion.

Abstract: A semiconductor device includes a bonding pad formed on a substrate and a mark region formed on the substrate right underneath the bonding pad, such that the mark region is covered by the bonding pad.

Abstract: Methods of forming contacts, methods of contacting lines, methods of operating integrated circuitry, and related integrated circuitry constructions are described. In one embodiment, a plurality of conductive lines are formed over a substrate and diffusion regions are formed within the substrate elevationally below the lines. The individual diffusion regions are disposed proximate individual conductive line portions and collectively define therewith individual contact pads with which electrical connection is desired. Insulative material is formed over the conductive line portions and diffusion regions, with contact openings being formed therethrough to expose portions of the individual contact pads. Conductive contacts are formed within the contact openings and in electrical connection with the individual contact pads. In a preferred embodiment, the substrate and diffusion regions provide a pn junction which is configured for biasing into a reverse-biased diode configuration.

Abstract: A semiconductor device includes a semiconductor chip carrying a plurality of contact electrodes on a principal surface thereof, wherein the contact electrodes are arranged symmetrically about an axis of symmetry according to the types of the contact electrodes.

Abstract: An LDMOS array includes an array of alternating source regions and drain regions formed in a semiconductor substrate to define a checkerboard pattern of source and drain regions. A source contact is formed in electrical contact with each of the source regions in the array to connect the source regions in parallel. A drain contact is formed in electrical contact with each of the drain regions in the array to connect the drain regions in parallel. A drain ring is formed around the periphery of the checkerboard pattern and in electrical contact with the drain contact, providing redistribution of the current flow within the LDMOS array and thereby allowing safer hot carrier operation at higher biases than with the conventional layout.

Abstract: A novel bi-level DRAM architecture is described which achieves significant reductions in die size while maintaining the noise performance of traditional folded architectures. Die size reduction results primarily by building the memory arrays with 6F2 or smaller memory cells in a type of cross point memory cell layout. The memory arrays utilize stacked digitlines and vertical digitline twisting to achieve folded architecture operation and noise performance.

Abstract: A first interconnection pattern having a comb shape is formed around a semiconductor chip on a package body. A second interconnection pattern having a comb shape is formed around the first interconnection pattern. The projections of the first interconnection pattern are engaged with the projections of the second interconnection pattern. The distances between those two groups of projections and the bonding pads of the semiconductor chip are set nearly equal to each other.

Abstract: The formation of routing traces on an external surface of a semiconductor device, such as a flip-chip, which has a plurality of ball or bump sites patterned in specific locations, wherein the ball or bump sites are in electrical communication with external communication traces which are used to route signals from the flip-chip integrated circuitry. Such external communication traces generally result in unused space on the exterior surface of the flip-chip. This unused space can be utilized for forming routing traces to connect portions of the internal circuitry of the flip-chip rather than forming such routing traces internally, for forming routing traces to connect two or more semiconductor dice, or for forming routing traces for use as repair mechanisms.

Abstract: Conductive links are provided between conductive materials, e.g., metals, separated by a non-conductive material, e.g., a silicon based glass material. In a preferred embodiment a single pulse of laser energy is applied to at least one of the conductive materials to produce mechanical strain therein which strain initiates a fracturing of the non-conductive material so as to provide at least one fissure therein extending between the conductive materials. The laser energy pulse further causes at least one of the conductive materials to flow in such fissure to provide a conductive link between the conductive materials. Preferably, the non-conductive material is formed in layers such that an interface between the layers controls the fissures.

Abstract: A structure and method thereof for providing an electrically conductive path between a first conductive point and a second conductive point. The structure includes an insulating material disposed between the first conductive point and the second conductive point. A dipole material is distributed within the insulating material. The dipole material is comprised of randomly oriented magnetic particles. The magnetic particles in a selected localized region of the insulating material are aligned to form an electrically conductive path between the first conductive point and the second conductive point through the insulating material.

Abstract: A component for mounting semiconductor chips or other microelectronic units includes a compliant, sheet-like body with arrays of sheet-like conductive pads on upper and lower surfaces of the body. Flexible leads extending through the body interconnect conductive pads on the upper and lower surfaces. The leads are desirably formed from wire, such as gold wire, that is bonded to the conductive pads using a conductive epoxy or a eutectic bonding alloy. The component is made using sacrificial base sheets having conductive terminal portions to which the leads are initially bonded. The compliant body is formed by injecting a flowable material between the base sheets, curing the material and removing the base sheets by etching. The flowable material surrounds the leads such that the leads are supported by the cured compliant layer. The component may be used as an interposer or as a test socket.

Abstract: In a scalable data processing apparatus, particularly a data storage apparatus, one or more thin-film devices which form a substantially planar layer comprise a plurality of sublayers of thin film. Two or more thin-film devices are provided as an integrated stack of the substantially planar layers which form the thin-film devices, such that the apparatus thereby forms a stacked configuration. Each thin-film device comprises one or more memory areas which form matrix addressable memories and additionally circuit areas which form electronic thin-film circuitry for controlling, driving and addressing memory cells in one or more memories. Each memory device has an interface to every other thin-film device in the apparatus, said interfaces being realized with communication and signal lines as well as supporting circuitry for processing extending vertically through dedicated interface areas in the thin-film device.

Abstract: When a phase shift method is used as lithography where sense amplifiers are alternately placed in a one intersecting-point memory capable of implementing a reduction in the area of a DRAM, it was difficult to layout data lines in a boundary region between sense amplifiers and each memory array. Therefore, there is provided a semiconductor device according to the present invention. In the semiconductor device, two data lines continuous within the sub memory arrays or interposed therebetween are connected to the adjacent sense amplifiers as a system for drawing data lines from sub memory arrays (SMA) to sense amplifiers (SA) when the sense amplifiers are alternately placed. Namely, the number of data lines interposed between data lines respectively connected to two adjacent sense amplifiers is set to even numbers (0, 2, 4, . . . ).

Abstract: A semiconductor device 100 includes wiring layers 12 disposed in a specified pattern on a base 10, and an interlayer dielectric layer 20 that covers the wiring layers 12. The interlayer dielectric layer 20 includes a stress relieving dielectric layer 22 disposed in a specified pattern on the base 10, and a planarization dielectric layer 26 that covers the wiring layers 12 and the stress relieving dielectric layers 22, and is formed from a liquid dielectric member. The interlayer dielectric layer 20 may further include a base dielectric layer 24 and a cap dielectric layer 28.

Abstract: A semiconductor device includes a SAW device chip. The SAW device chip is provided on a passive element chip in which a passive element circuit including a transmission line is formed on a semi-insulating compound substrate having one surface set to have a ground potential electrode. In the semiconductor device, even when the width of the transmission line is increased, a high characteristic impedance can be maintained by increasing the thickness of the substrate. This can reduce the resistance of the transmission line and can facilitate matching with the SAW device.

Abstract: A structure and method of mounting semiconductor devices which can cope with miniaturization and high-speed transmission by embedding a semiconductor device within a wiring layer or transmission path formed between opposite sides of a substrate even when a plurality of semiconductor devices are mounted on the substrate. A semiconductor device is interposed between wiring layers or transmission paths formed on opposite sides of a substrate, thereby shortening the distance between the wiring layers and rendering a structural body compact oerall. As a result of shortening of the distance between the wiring layers, the electrical resistance value of the structural body can also be diminished. Consequently, the electrical characteristic of the mount structural body can be improved, and high-speed transmission becomes feasible. Alternatively, a semiconductor device is cylindrically formed so as to enclose a conductive wire, thereby realizing a high electrical characteristic.

Abstract: An amorphous dielectric material having a dielectric constant of 10 or greater is provided herein for use in fabricating capacitors in integrated circuit applications. The amorphous dielectric material is formed using temperatures below 450° C.; therefore the BEOL metallurgy is not adversely affected. The amorphous dielectric material of the present invention exhibits good conformality and a low leakage current. Damascene devices containing the capacitor of the present invention are also disclosed.

Abstract: A wafer level fabricated chip scale integrated circuit package having an air gap formed between the integrated circuit die of the package and compliant leads located over and conductively attached to the die is described. Contact bumps offset on the compliant leads provide for connection of the integrated circuit package to other substrates. In some embodiments, the compliant leads include a conductive layer overlaid with an outer resilient layer, and may further include an inner resilient layer beneath the conductive layer. The outer resilient layer has a via formed through it exposing the underlying conductive layer. The via is offset along the compliant lead a horizontal distance from the bond pad to which the compliant lead is conductively coupled. The chip scale package provides a highly compliant connection between the die and any substrate that the die is attached to.

Abstract: Integrated circuits having multi-level wiring layouts designed to inhibit the capacitive-resistance effect, and a method for fabricating such integrated circuits, is described. The integrated circuits have at least two planes of wiring adjacent to each other and extending in the same direction. One embodiment may further include a larger than normal insulator material between planes of wiring extending in one direction and at least one plane of wiring extending in a second direction transverse to the first direction. Each of the wiring channels in a wiring plane may be offset relative to a respective wiring channel in the next adjacent wiring plane which extends in the same direction.