Abstract: A mounting structure of an electronic component includes: a substrate having a terminal and the electronic component which is mounted on the substrate; and a bump electrode included in the electronic component. This bump electrode has an underlying resin provided on an active surface of the electronic component, and a conductive film covering part of a surface of the underlying resin and exposing the rest so as to be electrically continued to an electrode terminal. In this mounting structure, the conductive film of the bump electrode makes direct conductive contact with the terminal, and the underlying resin of the bump electrode elastically deforms so that at least part of an exposed area which is exposed without being covered by the conductive film directly adheres to the substrate. Further, the substrate and the electronic component retain a state of the bump electrode making conductive contact with the terminal by adhesivity of the exposed area of the underlying resin to the substrate.

Abstract: A wiring substrate of the present invention includes such a structure that a plurality of connection pads and leading wiring portions connected to the plurality of connection pads respectively are arranged to an insulating layer of a surface layer side, and the leading wiring portions are arranged to be bended from the connection pads, and a solder layer to protrude upward is provided on the connection pads respectively. A solder on the leading wiring portions moves to the bend portion side, and thus the solder layer to protrude upward is formed on the connection pads.

Abstract: A packaged electronic device including a package substrate having a top substrate surface including a die attach region including at least one land pad thereon and a first dielectric layer positioned lateral to the land pad and a non-die attach region. The non-die attach region includes a second dielectric layer, wherein a thickness of the second dielectric layer is>a thickness of the first dielectric layer by at least 5 ?m. An IC die has a top semiconductor surface including active circuitry and at least one bonding conductor formed on the top semiconductor surface, and a bottom surface, wherein the bonding conductor of the IC die is joined to the land pad of the package substrate. An underfill layer is between the IC die and the die attach region.

Abstract: An integrated circuit (IC) device is provided. The IC device includes an IC die having opposing first and second surfaces, a carrier coupled to the first surface of the IC die, a laminate coupled to the carrier and the second surface of the IC die, and a trace located on a surface of the laminate and electrically coupled to a bond pad located on the second surface of the IC die. The trace is configured to couple the bond pad to a circuit board.

Abstract: A hardwired switch of a die stack including eight landing pads is provided. A first, a second, a third, and a fourth landing pads are disposed on a first surface of a die. The second and the fourth landing pads are electrically connected to the first and the third landing pads respectively. A fifth, a sixth, a seventh, and an eighth landing pads are disposed on a second surface of the die. The seventh and the eighth landing pads are electrically connected to the sixth and the fifth landing pads respectively. In a vertical direction of the die, the first, the second, the third, and the fourth landing pads overlap partially or fully with the fifth, the sixth, the seventh, and the eighth landing pads respectively. In addition, an operating method of a hardwired switch is also provided.

Abstract: A semiconductor package and method of forming the same is described. The semiconductor package is formed from a semiconductor die cut from a semiconductor wafer that has a passivation layer. The semiconductor wafer is exposed to ionized gas causing the passivation layer to roughen. The semiconductor wafer is cut to form a plurality of semiconductor dies each with a roughened passivation layer. The plurality of semiconductor dies are placed on an adhesive layer to form a reconstituted wafer, and an encapsulation layer is formed enclosing the adhesive layer and the plurality of semiconductor dies. The passivation layer is removed and the semiconductor package formed includes electrical contacts for establishing electrical connections external to the semiconductor package.

Abstract: The present disclosure involves a semiconductor device. The semiconductor device includes a substrate and an interconnect structure that is formed over the substrate. The interconnect structure has a plurality of metal layers. A first region and a second region each extend through both the interconnect structure and the substrate. The first and second regions are mutually exclusive. The semiconductor device includes a plurality of bond pads disposed above the first region, and a plurality of probe pads disposed above the second region. The semiconductor device also includes a plurality of conductive components that electrically couple at least a subset of the bond pads with at least a subset of the probe pads. Wherein each one of the subset of the bond pads is electrically coupled to a respective one of the subset of the probe pads through one of the conductive components.

Abstract: The present invention provides a semiconductor device and manufacturing method of the semiconductor device which can prevent breaks in an interlayer insulation film (12) and electrode (13) that arise with bonding while maintaining bonding strength. A semiconductor element (1) mounted on a semiconductor device including an interlayer insulation film (12) which has an aperture part (123) having an opening shape which is defined by an extension part (121) which covers the gate electrode (116) and extends in the first direction, a connection part (122), the extension part (121) and the connection part (122) which connects at fixed intervals in the first direction a pair of extension parts (121) which are adjacent to the second direction, and which exposes a main surface of a base region (112) and a main surface of an emitter region (113).

Abstract: Methods of forming gold-aluminum electrical interconnects are described. The method may include interposing a diffusion retardant layer between the gold and the aluminum, the diffusion retardant layer including regions containing and regions substantially devoid of a diffusion retardant material; bringing into contact the diffusion retardant layer, the gold, and the aluminum; forming alloys of gold and the diffusion retardant material in regions containing the material and forming gold-aluminum intermetallic compounds in regions substantially devoid of the material; and forming a continuous electrically conducting path between the aluminum and the gold. A structure for gold-aluminum interconnect is provided. The structure may include an aluminum alloy bond pad and a diffusion retardant layer in contact with the bond pad, the diffusion retardant layer including regions containing and regions substantially devoid of a diffusion retardant material.

Abstract: A semiconductor device package is provided. The semiconductor device package includes a package body, a plurality of electrodes, a paste member, and a semiconductor device. The electrodes includes a first electrode disposed on the package body. The paste member is disposed on the first electrode and includes at least one of an inorganic filler and metal powder. The semiconductor device is die-bonded on the paste member.

Abstract: Provided is an IC package.

Abstract: A method of forming a compressible contact structure on a semi-conductor chip which comprises bonding a compressible polymer layer to the chip's surface, forming a plurality of openings within the layer, depositing electrically conductive material within the openings to form electrical connections with the chip's contacts, forming a plurality of electrically conductive line elements on the polymer layer extending from a respective opening and each including an end portion, and forming a plurality of contact members each on a respective one of the line segment end portions. The compressible polymer layer allows the contact members to deflect toward (compress) the chip when the contact members are engaged by an external force or forces. A semi-conductor chip including such a compressible contact structure is also provided.

Abstract: A semiconductor package has an interconnection substrate including a first conductive lead and a second longer conductive lead, and a semiconductor chip including a first cell region, a second cell region, a first conductive pad electrically connected to the first cell region and a second conductive pad electrically connected to the second cell region. The semiconductor chip is mounted to the interconnection substrate with the first and second conductive pads both disposed on and connected to the second conductive lead.

Abstract: A manufacturing method of a substrate for a semiconductor package includes a resist layer forming step to form a resist layer on a surface of a conductive substrate; an exposure step to expose the resist layer using a glass mask with a mask pattern including a transmission area, a light shielding area, and an intermediate transmission area, wherein transmittance of the intermediate transmission area is lower than that of the transmission area and is higher than that of the light shielding area; a development step to form a resist pattern including a hollow with a side shape including a slope part decreasing in hollow circumference as the hollow circumference approaches the substrate; and a plating step to plate on an exposed area to form a metal layer with a side shape including a slope part decreasing in circumference as the circumference approaches the substrate.

Abstract: A semiconductor integrated circuit includes N pad rows in which pads are respectively arranged, and electrostatic discharge protection elements disposed in a lower layer of the N pad rows and connected with each pad in the N pad rows. The electrostatic discharge protection elements are disposed in a lower layer of regions at least partially including each of the N pads.

Abstract: There is provided a method of fabricating a semiconductor device including: forming an insulating film on a semiconductor substrate; forming a pad electrode on the insulating film; forming a protective film on the pad electrode; forming, on the protective film, a resist equipped with an open portion in a first region corresponding to part of the pad electrode; by using the resist as a mask, etching the protective film and etching the first region of part of the pad electrode to a predetermined depth; etching the protective film on a second region that surrounds the first region of the pad electrode; and removing the resist.

Abstract: The semiconductor package includes: a semiconductor chip module having multiple adjacently arranged or integrally formed semiconductor chips each with a bonding pad group and a connection member electrically connecting each of the bonding pads included in the first bonding pad group to the corresponding bonding pad in the second bonding pad group. In the present invention pad parts can be formed on the outside of the semiconductor chip module to conform with the standards of JEDEC. These pad parts are then connected to the semiconductor chips bonding pads through re-distribution layers. The pad parts of the semiconductor package can then conform to the JEDEC standards even while having a semiconductor chip with bonding pads smaller than the standards.

Abstract: An electronic system is provided including forming a substrate having a radiating patterned pad, mounting an electrical device having an external interconnect over the radiating patterned pad with the external interconnect offset from the radiating patterned pad, and aligning the external interconnect with the radiating patterned pad.

Abstract: A bonding pad structure is provided that includes two conductive layers and a connective layer interposing the two conductive layers. The connective layer includes a contiguous, conductive structure. In an embodiment, the contiguous conductive structure is a solid layer of conductive material. In other embodiments, the contiguous conductive structure is a conductive network including, for example, a matrix configuration or a plurality of conductive stripes. At least one dielectric spacer may interpose the conductive network. In an embodiment, the conductive density of the connective layer is between approximately 20% and 100%.

Abstract: An MEMS sensor package includes an MEMS sensor and a driving IC that controls driving of the MEMS sensor, which are fixed onto the same mounting surface made of a given package material, wherein an MEMS sensor mounting area and a driving IC mounting area are set on the mounting surface, a die attach metalized layer is formed on a package material of the driving IC mounting area, the driving IC is mounted on the die attach metalized layer, and the MEMS sensor is mounted on a package material of the MEMS sensor mounting area.

Abstract: A contact pad array is provided. The contact pad array includes a plurality of first contact pads and a plurality of second contact pads. The first contact pads are arranged along the first direction. Each first contact pad includes two first lengthwise sides and two widthwise sides. The second contact pads are arranged along the first direction. Each second contact pad includes two second lengthwise sides and two second widthwise sides. The length of the second lengthwise side is substantially shorter than that of the first lengthwise side, and the width of the second widthwise side is substantially larger than that of the first widthwise side. The projection of the first widthwise side of each first contact pad on the first direction is completely within the projection of the second widthwise side of the corresponding second contact pad on the first direction.

Abstract: An IO cell with multiple IO ports and related techniques are provided. The IO cell has a plurality of IO ports for transmitting signal of a same IO pin, and each IO port corresponds to a predetermined region for containing an IO pad, wherein at least one of the plural predetermined regions of the plural IO ports partially overlaps with active circuit layout region of the IO cell. In a chip, if a given IO cell has a predetermined region of an IO port overlapping an IO pad location of another adjacent IO cell, then a predetermined region of another IO port is selected for implementing an IO pad of the given IO cell, such that the IO cells can be arranged more compactly for chip layout area saving.

Abstract: A pad structure of a semiconductor integrated circuit apparatus includes a semiconductor substrate upon which circuit patterns forming a device are disposed, a pad disposed on an uppermost part of the semiconductor substrate, and a plurality of fixing parts, each disposed along opposing edge portions of the pad to fix the pad and the semiconductor substrate to each other.

Abstract: A semiconductor device may include a substrate and a dielectric layer may be formed on the substrate. A multi-layered interconnection structure may be embedded in the dielectric layer. A plurality of bonding pads, which may be connected to an uppermost interconnection layer of the multi-layered interconnection structure, may be spaced apart in a first direction. A passivation layer may have a plurality of bonding pad openings that may be defined by a plurality of slits and respectively expose the bonding pads. The slits may overlap isolations of the bonding pads. Each of the slits may have an edge width that may be larger than a center width thereof.

Abstract: A laser release and glass chip removal process for a integrated circuit module avoiding carrier edge cracking is provided.

Abstract: A pad structure in a semiconductor wafer for wafer testing is described. The pad structure includes at least two metal pads connected there-between by a plurality of conductive vias in one or more insulation layers. A plurality of contact bars in contact with the bottom-most metal pad extends substantially vertically from the bottom-most metal pad into the substrate. An isolation structure substantially surrounds the plurality of contact bars to isolate the pad structure.

Abstract: A pad in a semiconductor device and fabricating method thereof are disclosed. The pad includes an uppermost metal layer first to Nth intermediate metal layers, wherein capacitors configured or formed by the uppermost metal layer and the first to Nth intermediate metal layers are serially connected. Accordingly, the pad reduces total parasitic capacitance components by connecting MIM type capacitors in series, and not necessarily overlapping with each other, thereby minimizing design errors attributed to the pad by reducing parasitic factors generated from the integrated circuit design. The pad may also minimize capacitance attributed to resonance at a specific frequency. Moreover, the pad avoids affecting an adjacent pad or circuit without additional processing, despite maintaining the above-mentioned effects, thereby reducing cost.

Abstract: A semiconductor chip has a main surface, a back surface and a plurality of side surfaces. A plurality of electrodes is provided on the main surface of the semiconductor chip so as to be arranged in a plurality of lines. An insulating film is formed on the main surface of the semiconductor chip so as to expose at least one of the plurality of electrodes. A plurality of leads are formed on the insulating film, each of the plurality of leads having a first end and a second end, and the first end of the lead being connected to the one of the plurality of electrodes. A base resin film is formed on the insulting film and the plurality of leads, the base resin film having a plurality of electrodes holes exposing a part of the second end of each of the leads and a device hole in which the first end of the lead and the one of the plurality of electrodes are located.

Abstract: In one embodiment, the present invention includes a semiconductor package having a substrate with a first surface to support a semiconductor die. A second surface of the substrate includes compliant conductive pads to provide electrical connections to the semiconductor die. In this way, improved connection between the semiconductor package and a socket is provided. Other embodiments are described and claimed.

Abstract: This invention relates to a packaging structure and method for manufacturing the packaging structure. The packaging structure comprises a substrate film, a plurality of chips, a compound resin layer and a support layer. The substrate film is formed with circuits having a plurality of terminals exposed from a solder mask. The chips, each of which has a plurality of pads, under bump metals (UBMs) formed on the pads, and composite bumps disposed onto the UBMs, are bonded onto the substrate film to form the first tape. The second tape comprises the support layer and the compound resin layer formed on the support layer. The first tape and the second tape are both in reel-form and are expanded towards a pair of rollers to be heated and pressurized for encapsulating the chips.

Abstract: The present invention provides an integrated-type LED and method for manufacturing the same. This integrated-type LED comprises a base board which having a preplaced circuit and at least one LED chip. P electrode and N electrode of the LED chip are respectively connected, conducting and fixing on the base board; The manufacturing method is a) making and arranging circuit on the base board, b) installing at least one LED chip on the base board, aligned P electrode and N electrode of LED chip with the corresponding circuit on the base board, c) directly connecting P electrode and N electrode of LED chip, conducting and fixing on the base board. The present invention has the advantage of good dispersing heat effect, low cost, high lifetime and high luminescent efficiency.

Abstract: A device includes a semiconductor material having a first surface. A first material is applied to the first surface and a fiber material is embedded in the first material.

Abstract: A device including two mounting surfaces. One embodiment provides a power semiconductor chip and having a first electrode on a first surface and a second electrode on a second surface opposite to the first surface. A first external contact element and a second external contact element, are both electrically coupled to the first electrode of the semiconductor chip. A third external contact element and a fourth external contact element, both electrically coupled to the second electrode of the semiconductor chip. A first mounting surface is provided on which the first and third external contact elements are disposed. A second mounting surface is provided on which the second and fourth external contact elements are disposed.

Abstract: Methods, systems, and apparatuses for integrated circuit package substrates, integrated circuit packages, and processes for assembling the same, are provided. A substrate for a flip chip integrated circuit package includes a substrate body having opposing first and second surfaces. A solder mask layer covers at least a portion of the first surface of the substrate body. First and second electrically conductive features are formed on the substrate body. The first electrically conductive feature is a portion of a first electrical signal net, and the second electrically conductive feature is a portion of a second electrical signal net. The first and second electrically conductive features are configured to be selectively electrically coupled together by application of an electrically conductive material. The electrically conductive material may be a conductive epoxy, a jumper, a solder paste, a solder ball, or a solder bump that couples a flip chip die to the substrate.

Abstract: A semiconductor device including: a semiconductor substrate including an electrode; a resin protrusion formed on the semiconductor substrate and including a plurality of first portions and a second portion disposed between two of the first portions adjacent to each other; and an interconnect electrically connected to the electrode and extending over one of the first portions of the resin protrusion. A lower portion of a side surface of the second portion includes a portion which extends in a direction intersecting a direction in which the resin protrusion extends.

Abstract: Methods for forming an edge contact on a die and edge contact structures are described. The edge contacts on the die do not increase the height of the die. The edge contacts are positioned on the periphery of a die. The edge contacts are positioned in the saw streets. Each edge contact is connected to one bond pad of each die adjacent the saw street. The edge contact is divided into contacts for each adjacent die when the dies are separated. In an embodiment, a recess is formed in the saw street. In an embodiment, the recess is formed by scribing the saw street with a mechanical cutter. The recess is patterned and contact material is deposited to form the edge contacts.

Abstract: A semiconductor device and manufacturing method thereof improving moisture resistance of a FeRAM. After a probe test using a pad, a metal film is formed to cover the pad in an opening of a protective film and a region from the pad to an opening outer periphery of the protective film. On the metal film, a metal bump is formed. The metal film is formed to have a two-layer structure of the first and second metal films. Materials of the lower and upper layers are selected mainly in consideration of adhesion to the protective film and adhesion to the metal bump, respectively. Film formation conditions thereof are set to provide metal films with a desired quality and thickness. Thus, penetration of moisture from the pad or the periphery into a ferroelectric capacitor can be prevented and therefore, occurrence of potential inversion abnormalities due to penetrated moisture can be effectively suppressed.

Abstract: A semiconductor device has a pad structure with a ring-shaped stress buffer layer between a metal pad and an under-bump metallization (UBM) layer. The stress buffer layer is formed of a dielectric layer with a dielectric constant less than 3.5, a polymer layer, or an aluminum layer. The stress buffer layer is a circular ring, a square ring, an octagonal ring, or any other geometric ring.

Abstract: A semiconductor device includes a die with at least one electrode on a surface thereof, at least one solderable contact formed on the electrode, and a passivation layer formed over the electrode and including an opening that exposes the solderable contact. The passivation layer opening may be wider than the solderable contact such that a gap extends between the contact and the passivation layer. The device also includes a barrier layer disposed on the top surface of the electrode, and along the underside of the solderable contact and across the gap. The barrier layer may also extend under the passivation layer and may cover the entire top surface of the electrode. The barrier layer may also extend along the sidewalls of the electrode. The barrier layer may include a titanium layer or a titanium layer and nickel layer. The barrier layer protects the electrode and underlying die from acidic fluxes found in lead-free solders.

Abstract: A bonding pad includes a conductive layer formed over an insulation layer, and a dummy pattern penetrating the insulation layer and stuck in the conductive layer, wherein a bonding process is performed.

Abstract: An integrated circuit includes a number of probe pads arranged in a staggered manner in a core region of the integrated circuit and a number of bond pads in an Input/Output (I/O) region surrounding the core region. The core region includes logic circuitry therein, and the I/O region is configured to enable the core region to communicate with one or more external circuit(s) through the number of bond pads. The integrated circuit also includes a die metal interconnect separating a bond pad area in the I/O region from a probe pad area in the core region. A dimension of the die metal interconnect and/or a position of the die metal interconnect between the probe pad area and the bond pad area is variable.

Abstract: A bond pad structure located over an active circuit structure is disclosed. The bond pad structure includes a bond pad, a passivation layer and a topmost metal layer in the active circuit structure. The passivation layer covers the bond pad and has an opening, and the opening exposes a part of the bond pad. The part of the topmost metal layer located under the opening serves as a supporting layer. The supporting layer has at least a slot, and the topmost metal layer is electrically connected to the bond pad through a plurality of via plugs.

Abstract: Disclosed are embodiments of a structure having a metal layer with top surface and sidewall passivation and a method of forming the structure. In one embodiment, a metal layer is electroplated onto a portion of a seed layer at the bottom of a trench. Then, the sidewalls of the metal layer are exposed and, for passivation, a second metal layer is electroplated onto the top surface and sidewalls of the metal layer. In another embodiment, a trench is formed in a dielectric layer. A seed layer is formed over the dielectric layer, lining the trench. A metal layer is electroplated onto the portion of the seed layer within the trench and a second metal layer is electroplated onto the top surface of the metal layer. Thus, in this case, passivation of the top surface and sidewalls of the metal layer is provided by the second metal layer and the dielectric layer, respectively.

Abstract: An integrated circuit includes a semiconductor substrate, a first electrical contact formed on the semiconductor substrate, and a first heat sink element bonded to the first electrical contact via a galvanic bond.

Abstract: A bonding pad includes a conductive layer formed over an insulation layer, and a dummy pattern penetrating the insulation layer and stuck in the conductive layer, wherein a bonding process is performed.

Abstract: A semiconductor die has active circuits formed on its active surface. Contact pads are formed on the active surface of the semiconductor die and coupled to the active circuits. A die extension region is formed around a periphery of the semiconductor die. Conductive through hole vias (THV) are formed in the die extension region. A wafer level conductive plane or ring is formed on a center area of the active surface. The conductive plane or ring is connected to a first contact pad to provide a first power supply potential to the active circuits, and is electrically connected to a first conductive THV. A conductive ring is formed partially around a perimeter of the conductive plane or ring and connected to a second contact pad for providing a second power supply potential to the active circuits. The conductive ring is electrically connected to a second THV.

Abstract: In a pad forming region electrically connecting an element forming region to the outside, in which a low dielectric constant insulating film is formed in association with in the element forming region, a Cu film serving as a via formed in the low dielectric constant insulating film in the pad forming region is disposed in higher density than that of a Cu film serving as a via in the element forming region. Hereby, when an internal stress occurs, the stress is prevented from disproportionately concentrating on the via, and deterioration of a function of a wiring caused thereby can be avoided.

Abstract: A pad structure 100 includes an electrode pad (a first electrically conducting film 104 and a second electrically conducting film 110) and an insulating film provided over a peripheral region of the electrode pad so as to surround the electrode pad, and the insulating film has a structure including a protective film (a cover oxide film 106) and a transparent resin film (a transparent resin 108) provided on the cover oxide film 106.

Abstract: A semiconductor integrated circuit device includes a semiconductor chip including input/output cells, pads formed on a surface of the semiconductor chip, and interconnects formed on the surface of the semiconductor chip to electrically connect at least some of the plurality of input/output cells and at least some of the plurality of pads. A first plurality of the pads located in a center portion of the semiconductor chip are arranged in a rectangular dot grid pattern, and a second plurality of the pads located in at least one of four corner portions of the semiconductor chip are arranged in a staggered dot pattern.

Abstract: A method is disclosed for attaching a bonding pad to the ohmic contact of a diode while reducing the complexity of the photolithography steps. The method includes the steps of forming a blanket passivation layer over the epitaxial layers and ohmic contacts of a diode, depositing a photoresist layer over the blanket passivation layer, opening a via through the photoresist above the ohmic contacts and on the blanket passivation layer, removing the portion of the blanket passivation layer defined by the via to expose the surface of the ohmic contact, depositing a metal layer on the remaining photoresist, and on the exposed portion of the ohmic contact defined by the via, and removing the remaining photoresist to thereby concurrently remove any metal on the photoresist and to thereby establish a metal bond pad on the ohmic contact in the via.