Abstract: An integrated circuit with a SAR SRAM cell with power routed in metal-1. An integrated circuit with a SAR SRAM cell that has power routed in Metal-1 and has metal-1 and metal-2 integrated circuit and SAR SRAM cell patterns which are DPT compatible. A process of forming an integrated circuit with a SAR SRAM cell with DPT compatible integrated circuit and SAR SRAM cell metal-1 and metal-2 patterns.

Abstract: Apparatuses, methods, and systems for power supply stacking of an array of devices are disclosed. For an embodiment, each device is specified by a location (i,j), each device includes a Vdd terminal, and a Vss terminal, at least a plurality of the devices further including at least one other V_Terz terminal. For an embodiment, the Vss terminal of the device at location (i,j), for i=2:N, j=1:M, is connected to the Vdd terminal of the device at location (i?1,j) resulting in a voltage between the Vdd and Vss terminals of at least a majority of the devices in the array to be a substantially same voltage VDD, wherein the potential of the Vss terminal of the each device at any location (i,j+1) is generated to be higher than the potential of the Vss terminal for another device at location (i,j) by a voltage Xj, for i=1:N, j=1:M?1.

Abstract: A method and system for guided power grid augmentation determines a minimum resistance path for cells within an integrated circuit (IC) design. The minimum resistance path traces a conducting wire connecting a pin of a cell to an IC tap within the IC design. A voltage drop value for each of the cells is determined so as to identify target cells having a voltage drop value that satisfies a voltage drop criteria. Polygons have defined size characteristics are defined around the minimum resistance paths of the target cells, and conductors, such as additional conductors, are generated within the defined polygons.

Abstract: An integrated circuit structure includes a cell on a metal level, the cell defined by a cell boundary. A plurality of substantially parallel interconnect lines are inside the cell boundary. A first power track and a second power track are both dedicated to power and are located completely inside the cell boundary without any power tracks along the cell boundary on the metal level.

Abstract: A semiconductor storage device of an embodiment includes a wiring layer M1 and a wiring layer M2. The wiring layer M1 includes a signal line through which a data signal is transferred, and a plurality of dummy patterns formed of a material same as a material of the signal line. The wiring layer M2 includes a voltage supply line through which voltage Vdd is supplied and another voltage supply line through which voltage Vss is supplied. Each of the dummy patterns is electrically connected with any one of the voltage supply lines. In a dummy pattern disposed adjacent to the signal line, a surface facing the signal line is constituted by a first surface positioned at a first distance to the signal line and a second surface positioned at a second distance to the signal line, the second distance being different from the first distance.

Abstract: A semiconductor structure includes a power grid layer (including a first metallization layer) and a set of cells. The first metallization layer includes: conductive first and second portions which provide correspondingly a power-supply voltage and a reference voltage, and which have corresponding long axes oriented substantially parallel to a first direction; and conductive third and fourth portions which provide correspondingly the power-supply voltage and the reference voltage, and which have corresponding long axes oriented substantially parallel to a second direction substantially perpendicular to the first direction. The set of cells is located below the PG layer. Each cell lacks a conductive structure which is included in the first metallization layer. The cells are arranged to overlap at least one of the first and second portions in a repeating relationship with respect to at least one of the first or second portions of the first metallization layer.

Abstract: A method of manufacturing a semiconductor package includes: coupling a semiconductor die to a protection layer; forming a first redistribution layer over the semiconductor die, wherein the first redistribution layer includes a first conductive plate and a first dielectric material laterally surrounding the first conductive plate; forming a recess in the first redistribution layer, wherein the recess is over the first conductive plate and defined by the first dielectric material; depositing an insulating film in the recess with a second dielectric material of a dielectric constant greater than a dielectric constant of the first dielectric material; and forming a second redistribution layer including a second conductive plate over the insulating film. The insulating film electrically isolates the first conductive plate from the second conductive plate, and one of the first conductive plate and the second conductive plate is configured to radiate or receive electromagnetic wave.

Abstract: The present disclosure provides a method that includes receiving a semiconductor substrate that includes an integrated circuit (IC) cell and a well tape cell surrounding the IC cell; forming first fin active regions in the well tape cell and second fin active regions in the IC cell; forming a hard mask within the well tape cell, wherein the hard mask includes openings that define first source/drain (S/D) regions on the first fin active region of the well tape cell; forming gate stacks on the second fin active regions within the IC cell and absent from the well tape cell, wherein the gate stacks define second S/D regions on the second fin active regions; epitaxially growing first S/D features in the first S/D regions using the hard mask to constrain the epitaxially growing; and forming contacts landing on the first S/D features within the well tape cell.

Abstract: A semiconductor package device includes a passivation layer, a conductive element, a redistribution layer (RDL) and an electronic component. The passivation layer has a first surface and second surface opposite to the first surface. The conductive element is within the passivation layer. The conductive element defines a recess facing the second surface of the passivation layer. The RDL is on the passivation layer and electrically connected with the conductive element. The electronic component is disposed on the RDL and electrically connected with the RDL.

Abstract: A method of modifying a power mesh includes measuring distances between end cap blocks included in a standard cell in a chip sub-block. The end cap blocks are located at edges of the chip sub-block and edges of the macro cell. The method includes searching a logic circuit block located between the first and second end cap blocks of the end cap blocks. A distance between the first and second end cap blocks is shorter than a predetermined length. It is determined whether a power supply voltage line and a ground voltage line exist at a partial region of the first power mesh layer. When the power supply voltage line or the ground voltage line is determined not to exist at the partial region, the power mesh data are modified to supplement the power supply voltage line or the ground voltage line at the partial region.

Abstract: Multi-processor core three-dimensional (3D) integrated circuits (ICs) (3DICs) and related methods are disclosed. In aspects disclosed herein, ICs are provided that include a central processing unit (CPU) having multiple processor cores (“cores”) to improve performance. To further improve CPU performance, the multiple cores can also be designed to communicate with each other to offload workloads and/or share resources for parallel processing, but at a communication overhead associated with passing data through interconnects which have an associated latency. To mitigate this communication overhead inefficiency, aspects disclosed herein provide the CPU with its multiple cores in a 3DIC.

Abstract: A module containing a plurality of active capacitors and a sacrificial capacitor is provided. The active capacitors and sacrificial capacitor are aligned along a horizontal direction so that the side surfaces of their cases are parallel to each other. The particular arrangement of the active capacitors and sacrificial capacitor results in a module configuration where the anode terminations for the active capacitors and an external component of the lead frame for the sacrificial capacitor are coplanar so that the module can be mounted to a circuit board via the anode terminations and the external component of the lead frame in a mechanically and electrically stable manner. Further, the center of gravity of the module in the length and/or width directions can be located at a midpoint of the overall module length and/or width, which enhances the stability of the module when mounted to a circuit board.

Abstract: One example discloses an apparatus for charge recycling between a first power-domain operating at a first voltage and a second power-domain operating at a second voltage, including: a first power-delivery circuit configured to supply the first voltage to the first power-domain; and a second power-delivery circuit coupled to receive power from both the first power-delivery circuit and the first power-domain; wherein the second power-delivery circuit is configured to supply the second voltage to the second power-domain.

Abstract: An electrostatic protection circuit may include a test pad configured to receive a first signal in a test mode. The electrostatic protection circuit may include a bump array configured to receive a second signal in a normal mode. The electrostatic protection circuit may include a buffer array configured to transmit the first signal or the second signal into a semiconductor device. The electrostatic protection circuit may include an electrostatic protection unit coupled with the test pad and the bump array, and configured to block static electricity included in the first signal and the second signal.

Abstract: This invention provides a semiconductor device with high speed operation and reduced size. A circuit includes a circuit including a memory circuit and a circuit including a logic circuit; thus, the circuit functions as a memory device having a function of storing data and a function of performing logic operation. The circuit can output, in addition to data stored in the circuit, data corresponding to a result of logic operation performed using data stored in the circuit as an input signal. The circuit can directly obtain a result of logic operation from the circuit, and thus, the frequency of input/output of a signal performed between the circuit and the circuit can be reduced.

Abstract: One aspect is a method that includes identifying, by a power via placement tool executing on a processor of a circuit design system, a source and a sink of a voltage domain of a multi-layer circuit board based on a design file defining a layout of the multi-layer circuit board. A number of power vias to support a maximum current demand from the source to the sink is determined. Positions of a plurality of the power vias are determined at locations of the multi-layer circuit board forming paths through the power vias between the source and the sink and having a substantially equal total path length through each total path defined between the source and the sink through at least one of the power vias. The design file is modified to include the power vias at the positions.

Abstract: A flash memory is disclosed. A core array stores data. A peripheral circuit accesses the data stored in the core array to generate read data. A off-chip driver (OCD) processes the read data to generate output data. An interconnect structure is electrically connected to the core array, the peripheral circuit, and the OCD and includes three conductive layers. The conductive layers are electrically connected to each other. An uppermost conductive layer is formed over the interconnect structure, electrically connected to the interconnect structure, and includes a first power pad and first power tracks. The first power pad is electrically connected to a power pin via a first bonding wire to receive an operation voltage. The first power tracks are electrically connected between the first power pad and the interconnect structure to transmit the operation voltage to at least one of the core array, the peripheral circuit and the OCD.

Abstract: A semiconductor package includes a plurality of electrical connectors, a semiconductor die having core logic, at least two pairs of core logic input-power and output-power pads, and a plurality of input/output signal pads that carry signals to and from the core logic. Each pad of the semiconductor die has an electrical connector of the plurality of electrical connectors extending therefrom. The semiconductor package also includes a package substrate having at least two pairs of input-power and output-power contact pads, a plurality of input/output signal contact pads, a first metal redistribution layer, and a second metal redistribution layer. The first metal redistribution layer provides a first electrical potential to each of the input-power contact pads, and the second metal redistribution layer provides a second electrical potential to each of the output-power contact pads. Each contact pad has an electrical connector of the plurality of electrical connectors extending therefrom.

Abstract: A pad for a line which supplies an electric power potential is disposed on a semiconductor integrated circuit and a pad which is not electrically connected to any other electric circuit is disposed on a semiconductor integrated circuit board, and the two pads are connected through a bonding wire. An LC resonant circuit is configured with ease using a floating capacitance C of the pad which is in an electrically open state and which is disposed in a vacant region and an inductance value L of the bonding wire which is disposed in a three-dimensional manner. High-frequency noise is filtered and high-density implementation is realized.

Abstract: Also in a semiconductor integrated circuit device including a copper embedded wiring as a main wiring layer, generally, the uppermost-layer wiring layer is often an aluminum-based pad layer in order to ensure wire bonding characteristics. The aluminum-based pad layer is also generally used as a wiring layer (general intercoupling wiring such as power source wiring or signal wiring). However, such a general intercoupling wiring has a relatively large wiring length. This causes a demerit for the device to be susceptible to damages during a plasma treatment due to the antenna effect, and other demerits. With the present invention, in a semiconductor integrated circuit device including a metal multilayer wiring system having a lower-layer embedded type multilayer wiring layer and an upper-layer non-embedded type aluminum-based pad metal layer, the non-embedded type aluminum-based pad metal layer substantially does not have a power supply ring wiring.

Abstract: An organic light emitting display apparatus and method of manufacturing the organic light emitting display apparatus including a lower substrate having power lines in a non-display region that is outside a display region whereon an image is realized; and a functional layer formed between the power lines and an encapsulation substrate.

Abstract: A semiconductor integrated circuit device includes plural circuit units each having plural logic circuits; and plural power terminals supplying power source from outside to the semiconductor integrated circuit device, in which the plural circuit units each having plural logic circuits have common packaging design with each other, and lengths in a vertical direction and a lateral direction of the circuit units each having plural logic circuits are equal to an even multiple of a distance between the power terminals adjacent to each other.

Abstract: To protect victim bondwires in a packaged electronic component from crosstalk induced by noisy aggressor bondwires, shielding bondwires are configured between the victim bondwires and the aggressor bondwires. The shielding bondwires, on either side of the victim bondwires, are connected to the same reference voltage on the package side of the component and to each other on the die side of the component, e.g., via a metal connection mounted on the die. As configured in one embodiment, the shielding bondwires and metal connection form a two-dimensional Faraday cage that shields the victim bondwires from crosstalk induced by the aggressor bondwires.

Abstract: A semiconductor package includes a plurality of electrical connectors, a semiconductor die having core logic, at least two pairs of core logic input-power and output-power pads, and a plurality of input/output signal pads that carry signals to and from the core logic. Each pad of the semiconductor die has an electrical connector of the plurality of electrical connectors extending therefrom. The semiconductor package also includes a package substrate having at least two pairs of input-power and output-power contact pads, a plurality of input/output signal contact pads, a first metal redistribution layer, and a second metal redistribution layer. The first metal redistribution layer provides a first electrical potential to each of the input-power contact pads, and the second metal redistribution layer provides a second electrical potential to each of the output-power contact pads. Each contact pad has an electrical connector of the plurality of electrical connectors extending therefrom.

Abstract: A clock architecture for a Structured ASIC chip, manufactured using a CMOS process is shown. A via-configurable logic block (VCLB) architecture in the Structured ASIC has a core region containing memory and logic cells arranged in columns that are supplied by a clock network having a global clock network tree and a low-level clock mesh to distribute the global clock signal in a repeating pattern. The clock mesh has a fishbone configuration in outline and allows for scalable expansion of the clock network. In one embodiment 36 global clocks may be provided to the Structured ASIC, with four clocks per logic cell. The VCLB Structured ASIC chip is manufactured on a 28 nm CMOS process lithographic node, having several metal layers but preferably is programmable on a single via layer.

Abstract: A semiconductor memory device includes: a first n-type transistor; a first p-type transistor; a first wiring layer having a first interconnecting portion for connecting a drain of the first n-type transistor and a drain of the first p-type transistor; and a second wiring layer having a first conductive portion electrically connected to the first interconnecting portion.

Abstract: A method for fabricating multiple metal layers includes the following steps. An electronic component is provided with multiple contact points. A first metal layer is deposited over said electronic component. A first mask layer is deposited over said first metal layer. A second metal layer is deposited over said first metal layer exposed by an opening in said first mask layer. Said first mask layer is removed. A second mask layer is deposited over said second metal layer. A third metal layer is deposited over said second metal layer exposed by an opening in said second mask layer. Said second mask layer is removed. Said first metal layer not covered by said second metal layer is removed.

Abstract: A laterally diffused metal oxide semiconductor transistor. The laterally diffused metal oxide semiconductor transistor includes a substrate, a drain formed thereon, a source formed on the substrate, comprising a plurality of individual sub-sources respectively corresponding to various sides of the drain, a plurality of channels formed in the substrate between the sub-sources and the drain, a gate overlying a portion of the sub-sources and the channels, and a drift layer formed in the substrate underneath the drain.

Abstract: A die including a first set of power tiles arranged in a first array and having a first voltage; a second set of power tiles arranged in a second array offset from the first array and having a second voltage; a set of power mesh segments enclosed by the second set of power tiles and having the first voltage; a first power rail passing underneath the set of power mesh segments and the first set of power tiles; and a set of vias operatively connecting the power rail with the set of power mesh segments and the first plurality of power tiles.

Abstract: A method of manufacturing a semiconductor device including an integrated circuit part in which an integrated circuit is formed and a main wall part including metal films surrounding said integrated circuit part, includes the step of selectively forming a sub-wall part including metal films between the integrated circuit part and the main wall part, in parallel to formation of the integrated circuit part and the main wall part. A sub-wall part which is in an “L” shape is provided between each corner of the main wall part and the integrated circuit part of the resulting semiconductor device.

Abstract: In a semiconductor module, a first heat sink is disposed on a rear surface of a first semiconductor chip constituting an upper arm, and a second heat sink is disposed on a front surface of the first semiconductor chip through a first terminal. A third heat sink is disposed on a rear surface of a second semiconductor chip constituting a lower arm, and a fourth heat sink is disposed on a front surface of the second semiconductor chip through a second terminal. A connecting part for connecting between the upper arm and the lower arm is integral with the first terminal, and is connected to the third heat sink while being inclined relative to the first terminal.

Abstract: Integrated circuit devices include a substrate having a semiconductor substrate region therein containing multiple well regions of different conductivity type. A first semiconductor well region of first conductivity type is provided in the semiconductor substrate region. This first semiconductor well region has a first plurality of transistor regions therein arranged in a first zig-zag pattern extending across the semiconductor substrate region. A second semiconductor well region of second conductivity type is also provided in the semiconductor substrate region. This second semiconductor well region has a second plurality of transistor regions therein arranged in a second zig-zag pattern extending across the semiconductor substrate region. This second zig-zag pattern is intertwined with the first zig-zag pattern.

Abstract: According to an exemplary embodiment, a bondwireless power module includes a common output pad coupling an emitter/anode node of a high side device to a collector/cathode node of a low side device. The bondwireless power module also includes a high side conductive clip connecting a collector of the high side device to a cathode of the high side device, and causing current to traverse through the high side conductive clip to another high side conductive clip in another power module. The bondwireless power module further includes a low side conductive clip connecting an emitter of the low side device to an anode of the low side device, and causing current to traverse through the low side conductive clip to another low side conductive clip in the another power module. The bondwireless power module can be a motor drive inverter module.

Abstract: Semiconductor devices and methods of forming semiconductor devices are provided in which a plurality of patterns are simultaneously formed to have different widths and the pattern densities of some regions are increased using double patterning.

Abstract: A zipper structure includes a first contiguous full-dense-mesh (FDM) array of a first circuit in top metal and a second contiguous FDM array of a second circuit in top-1 metal, a third contiguous FDM array of the second circuit in top metal and a fourth contiguous FDM array of the first circuit in top-1 metal, and a signal line, such that portions of the first contiguous FDM array and the second contiguous FDM array overlap and portions of the third contiguous FDM array and the fourth contiguous FDM array overlap. The Zipper structure facilitates connecting the first contiguous FDM array to the fourth contiguous FDM array by vias and a first connector lines and the second contiguous FDM array to the third contiguous FDM array by vias and a second connector lines, such that portion of the signal line overlaps with the first connector lines and the second connector lines.

Abstract: A semiconductor die has rows of bond pads along the edges of a major surface. The corners of the die are designated as keep out areas, with design layout rules prohibiting a probe-able bond pad from being placed in the keep out areas so that a minimum distance may be maintained between distal ends of adjacent rows of bond pads (i.e., bond pads along adjacent edges). The bond pads of each row have IO pad areas that are aligned with each other and IO probe areas that are aligned with each other. A generally L-shaped bond pad includes a first, vertical part that extends inwardly from an edge of the semiconductor die and a second, horizontal part connected to the vertical part. The L-shaped bond pad may be placed between a last bond pad in a row and a corner keep out area, and the second part of the L-shaped bond pad extends into the corner keep out area.

Abstract: A battery mounted semiconductor device is provided. A battery mounted semiconductor device comprises a semiconductor silicon wafer, an electric power supply formed on a backside of the semiconductor silicon wafer and a circuit pattern formed on a front side of the semiconductor silicon wafer.

Abstract: A semiconductor structure including a test structure for detection of a gap in a conductive layer of the semiconductor structure includes a semiconductor substrate; the test structure, the test structure being located on the semiconductor substrate, the test structure comprising a multilayer gate stack, wherein the multilayer gate stack includes a single conductive layer region including: a gate dielectric located on the semiconductor substrate; the conductive layer located on the gate dielectric; and an undoped amorphous silicon layer located on the conductive layer; and wherein the test structure is configured to detect the presence of the gap in the conductive layer.

Abstract: An integrated circuit (IC) chip includes a first memory cell array block having a first metal layer containing at least two power lines, and a second memory cell array block containing at least two power lines independent of each other, wherein all the power lines on the first metal layer serving the first memory cell array block do not extend into the second memory cell array block, and all the power lines on the first metal layer serving the second memory cell array block do not extend into the first memory cell array block.

Abstract: A semiconductor integrated circuit includes N pad rows in which pads are respectively arranged, and electrostatic discharge protection elements disposed in a lower layer of the N pad rows and connected with each pad in the N pad rows. The electrostatic discharge protection elements are disposed in a lower layer of regions at least partially including each of the N pads.

Abstract: Flexibility for the design of the pattern layout of the gate lead-out electrode and the source electrode is enhanced without increasing the chip thickness of the semiconductor device. A semiconductor device includes a cell region where plural transistor cells are arranged and a gate finger region different from a region where the cell region is formed. In the cell region, a gate electrode formed of a polysilicon (first conductive material) is formed. A polysilicon layer formed indivisibly with the gate electrode is formed in the gate finger region. An adhesion metal layer and a wiring metal layer are formed above the polysilicon layer by a lift-off method. The gate lead-out electrode is formed of a laminate structure including the polysilicon layer, the adhesion metal layer, and the wiring metal layer. A single layer of interlayer insulation film covering them is formed, on which a source electrode is formed.

Abstract: A chip assembly includes a chip, a paddle, an interface layer, a frequency extending device, and lands. The chip has contacts. The interface layer is disposed between the chip and the paddle. The frequency extending device has at least a conductive layer and a dielectric layer. The conductive layer has conductive traces. The frequency extending device is disposed adjacent to the side of the chip and overlying the paddle. The lands are disposed adjacent to the side of the paddle. The contacts are connected to the conductive traces. The conductive traces are connected to the lands. The frequency extending device is configured to reduce impedance discontinuity such that the impedance discontinuity produced by the frequency extending device is less than an impedance discontinuity that would be produced by bond wires each having a length greater than or substantially equal to the distance between the contacts and the lands.

Abstract: A semiconductor power module according to the present invention includes a base member, a semiconductor power device having a surface and a rear surface with the rear surface bonded to the base member, a metal block, having a surface and a rear surface with the rear surface bonded to the surface of the semiconductor power device, uprighted from the surface of the semiconductor power device in a direction separating from the base member and employed as a wiring member for the semiconductor power device, and an external terminal bonded to the surface of the metal block for supplying power to the semiconductor power device through the metal block.

Abstract: Embodiments of the invention include a semiconductor integrated circuit package that includes a substrate which can have an integrated circuit die attached thereto. The package includes a dedicated high-speed ground plane that is electrically isolated from the ground plane used to ground the low speed circuitry of the package.

Abstract: A semiconductor device and a manufacturing method therefor wherein a wire for coupling an inner lead and a semiconductor chip with each other can be prevented from being electrically short-circuited to any other conductive part are provided. An inner lead portion has a tip arranged outside the outer circumferential end of the semiconductor chip as viewed on a plane. A power supply bar has a jutted portion extended between the outer circumferential end of the semiconductor chip and the tip of the inner lead portion as viewed on a plane. The upper face of the jutted portion is in a position lower than the upper face of the tip of the inner lead portion. A bonding wire for electrically coupling the semiconductor chip and the inner lead portion with each other has a bent portion outside the outer circumferential end of the semiconductor chip as viewed on a plane.

Abstract: A semiconductor device having a power supply wiring and a ground wiring is provided, which can suppress the occurrence of voltage drop in part of wiring and the occurrence of migration caused by voltage drop.

Abstract: A method of implementing a capacitor in an integrated circuit package is disclosed. The method comprises coupling the capacitor to a first surface of a substrate of the integrated circuit package; positioning an integrated circuit die over the capacitor, wherein the integrated circuit die has a first plurality of solder bumps and a second plurality of solder bumps separated by a region having no solder bumps; coupling the integrated circuit die to the first surface of the substrate over the capacitor, wherein the region having no solder bumps is positioned over the capacitor; and encapsulating the integrated circuit die and the capacitor.

Abstract: In a substrate power supply cell, a portion of a substrate power supply wiring is exposed by forming a power supply wiring in a U-shape, and a connection portion to an upper-layer wiring is provided at a boundary portion of the substrate power supply cell. Thereby, a leakage current is reduced without a decrease in signal wiring efficiency.

Abstract: CMOS inverters are included in a standard cell. Power supply lines are electrically connected to CMOS inverters, and include lower layer interconnects and upper layer interconnect. Lower layer interconnects extend along a boundary of standard cells adjacent to each other and on the boundary. Upper layer interconnects are positioned more inside in standard cell than lower layer interconnects, as viewed from a plane. CMOS inverters are electrically connected through upper layer interconnects to lower layer interconnects. Thus, a semiconductor device is obtained that can achieve both higher speeds and higher integration.

Abstract: Conductions and vias between different, stacked metallic layers of a semiconductor device may be mechanically damaged by mechanical strain. According to an exemplary embodiment of the present invention, this mechanical strain may be transferred through the layer structure to the substrate by a grid of grounding structures and isolation and passivation layers which are connected by the grounding structures. This may provide for an enhancement of the lifetime of the semiconductor devices.