Abstract: A chip package structure including a chip, a lead frame, first bonding wires and second bonding wires is provided. The chip has an active surface and chip bonding pads disposed thereon. The lead frame is fixed on the chip and the lead frame includes inner leads, at least one bus bar, an insulating layer and transfer bonding pads. The bus bar is located between the chip bonding pads and the inner leads. The insulating layer is disposed on the bus bar and the transfer bonding pads are disposed thereon. The inner leads and the bus bar are located above the active surface. The chip and the insulating layer are located respectively on two opposite surfaces of the bus bar. The first bonding wires respectively connect the chip bonding pads and the transfer bonding pads. The second bonding wires respectively connect the transfer bonding pads and the inner leads.

Abstract: A semiconductor device includes a first pad, a second pad and a third pad. The first pad and the third pad are electrically connected to each other. The first pad and the second pad are used for bonding. The second pad and the third pad are used for probing. According to this structure, Small size semiconductor device having high reliability even after a probing test can be provided.

Abstract: An arrangement scheme for a power/ground (P/G) network of an integrated circuit is provided. Rows of standard cells in the integrated circuit are horizontally arranged. The P/G network has horizontal and vertical metal lines arranged in different metal layers. The horizontal metal lines have horizontal power metal lines and horizontal ground lines. The vertical metal lines have vertical power metal lines and vertical ground lines. The power lines and the ground lines in the horizontal metal lines are respectively interconnected with the power lines and the ground lines of the vertical metal lines. The width of the horizontal metal wires in the P/G network is such that the horizontal power metal lines only cover the power lines in the rows of the standard cells, while the horizontal ground metal lines only cover the ground lines of the rows of the standard cells.

Abstract: As a power feed route in a semiconductor chip, a power feed route which reduces antiresonance impedance in the frequency range of tens of MHz is to be realized thereby to suppress power noise in a semiconductor device. By inserting structures which raise the resistance in the medium frequency band into parts where the resistance is intrinsically high, such as power wiring in a semiconductor package and capacitor interconnecting electrode parts, the antiresonance impedance in the medium frequency band can be effectively reduced while keeping the impedance low at the low frequency.

Abstract: A zipper structure includes a first contiguous full-dense-mesh (FDM) array of a first supply in top metal and a second contiguous FDM array of a second supply in top-1 metal, a third contiguous FDM array of the second supply in top metal and a fourth contiguous FDM array of the first supply in top-1 metal, and a signal line, such that portions of the first contiguous FDM array and the second contiguous FDM array overlap and portions of the third contiguous FDM array and the fourth contiguous FDM array overlap. The Zipper structure facilitates connecting the first contiguous FDM array to the fourth contiguous FDM array by VIAs and a first connector lines and the second contiguous FDM array to the third contiguous FDM array by VIAs and a second connector lines, such that portion of the signal line overlaps with the first connector lines and the second connector lines.

Abstract: Disclosed is a semiconductor silicon wafer having an electric power supply affixed to the backside of the wafer. By fabricating the electric power supply onto the backside of the wafer that has been left unused, the semiconductor chip can have a self-supplied power, realizing the self-powered semiconductor chip with an increased efficiency. Further, since the electric power supply is installed on the wafer, not the semiconductor chip, the fabrication procedure becomes very simple, and the battery can be mounted on any type of chip.

Abstract: In a semiconductor device according to an aspect of the invention, a direction in which a fourth metal interconnection layer located on a semiconductor layer is extended is orthogonal to a direction in which third interconnection layers ML30 and ML37 located on the fourth interconnection layer are extended. Thus, even in a case where a stress is applied from outside to bonding pads BP1 and BP2 located above, the stress is wholly dispersed by the third interconnection layers and the fourth interconnection layer which are laminated to intersect with each other, and stress concentration on a particular point can be relieved to restrain deterioration in semiconductor device strength to a minimum. Accordingly, it is possible to provide the semiconductor device having a structure in which productivity of the semiconductor device can be improved while the stress concentration applied from outside on the particular point of the bonding pad is relieved.

Abstract: A semiconductor package apparatus comprises: at least one semiconductor chip; and a circuit board on which the semiconductor chip is installed, wherein at least one conductive plane for improving power and/or ground characteristics is positioned on a side of the semiconductor chip. In this manner, fabrication cost for the semiconductor package apparatus can be mitigated, and power and/or ground characteristics can be improved so as to readily control impedance of signal lines. As a result, reliability of the operation of the semiconductor package apparatus can be improved, and noise and malfunction can be prevented.

Abstract: In one or more embodiments, a method of producing a stacked integrated circuit assembly includes providing a substrate having a top surface with at least one substrate connection pad. A first flip chip integrated circuit (FFIC) is disposed above the substrate, and a second flip chip integrated circuit (SFIC) is disposed above the FFIC. The FFIC may be disposed between the substrate and the SFIC. The method includes making at least one solder connection between the substrate connection pad and the FFIC and at least one solder connection between the FFIC and the SFIC.

Abstract: With embodiments disclosed herein, the distribution of gated power is done using on-die layers without having to come back out and use package layers.

Abstract: Structures including a refractory metal collar at a copper wire and dielectric layer liner-less interface, and a related method, are disclosed. In one embodiment, a structure includes a copper wire having a liner-less interface with a dielectric layer thereabove; a via extending upwardly from the copper wire through the dielectric layer; and a refractory metal collar extending from a side of the via and partially along the liner-less interface. Refractory metal collar prevents electromigration induced slit voiding by improving the interface around the via, and prevents void nucleation from occurring near the via. Also, the refractory metal collar provides electrical redundancy in the presence of voids around the via and dielectric layer liner-less interface.

Abstract: Disclosed is a power supply line in which a voltage drop generated in a resistance component of a metal line which delivers a power voltage is minimized so that the level of the power supply voltage delivered to a semiconductor chip becomes constant in the entire area of the semiconductor chip. The semiconductor chip includes: at least two power supply pads to which a power voltage applied from an external unit of the semiconductor chip is supplied; power supply main metal lines connected to each of the power supply pads; power supply branch metal lines extended from each of the power supply main metal lines to deliver a power voltage to a circuit in the semiconductor chip; and at least an electrostatic discharge (ESD) improvement dummy pad, wherein the ESD improvement dummy pad is electrically connected to the corresponding power supply main metal line and the corresponding power supply branch metal line to minimize a voltage drop.

Abstract: While a semiconductor device is provided with a plurality of element electrodes 5 formed on a semiconductor element 4 and a plurality of lead terminal electrodes 6 formed on a lead frame, the semiconductor device is equipped with a coupling conductor which electrically connects at least one electrode among the above-described element electrodes 5 to at least one electrode among the above-described lead terminal electrodes 6; the above-described coupling conductor is manufactured by a first conductor 1 and a second conductor 2, the major components of which are metals; the first conductor 1 has been electrically connected to the second conductor 2; and the element electrodes 5 and the lead terminal electrodes 6 have been electrically connected to the second conductor 2 respectively.

Abstract: A semiconductor device (601) is provided which comprises a substrate (603); a semiconductor device (605) disposed on said substrate and having a first major surface; a first metal strap (615) which is in electrical contact with said substrate and which is adapted to provide power to a first region (608) of said semiconductor device; and a second metal strap (616) which is in electrical contact with said substrate and which is adapted to provide ground to a second region (609) of said semiconductor device.

Abstract: An integrated circuit package includes a package substrate, a die attach pad formed on the package substrate for securing a die to the package substrate, a ground bonding ring formed on the package substrate for attaching core and I/O ground bond wires between the die and the package substrate, and a first plurality of bond fingers formed immediately adjacent to the ground bonding ring for attaching a first set of I/O signal bond wires between the package substrate and the die.

Abstract: A power semiconductor circuit has a power semiconductor module (2) embodied as a flat assembly. A particularly compact and space-saving production of a power semiconductor circuit may be achieved with the possibilities provided by an embodiment of the power semiconductor module, whereby the power semiconductor module (2) is arranged directly on a top track (3) of a power supply and/or output tracking (11) and a cooling device (5) is integrated in the tracking (11).

Abstract: It is an object of the present invention to provide a semiconductor integrated circuit having a chip layout that reduces line length to achieve faster processing. A cache comprises a TAG memory module and a cache data memory module. The cache data memory module is divided into first and second cache data memory modules which are disposed on both sides of the TAG memory module, and input/output circuits of a data TLB are opposed to the input/output circuit of the TAG memory module and the input/output circuits of the first and second cache data memory modules across a bus area to reduce the line length to achieve faster processing.

Abstract: An integrated circuit package has a substrate; a discrete capacitor coupled to a first surface of the substrate; an integrated circuit die coupled to the first surface of the substrate over the discrete capacitor; and a lid coupled to the substrate, the lid encapsulating the integrated circuit die and the discrete capacitor.

Abstract: A semiconductor device includes a protected circuit and an electrostatic-discharge protection circuit. The electrostatic-discharge protection circuit includes a first well of a first conductivity type and a second well of a second conductivity type formed in contact with each other in a semiconductor substrate, a first impurity diffusion layer of the first conductivity type and a third impurity diffusion layer of the second conductivity type formed apart from each other in the first well, and a second impurity diffusion layer of the second conductivity type and a fourth impurity diffusion layer of the first conductivity type formed apart from each other in the second well. The second and the third impurity diffusion layers are formed adjacent to each other interposing an element isolation region provided across a border between the first and the second wells.

Abstract: A memory cell for reducing the cost and complexity of modifying a revision identifier (ID) or default register values associated with an integrated circuit (IC) chip, and a method for manufacturing the same. The cell, which may be termed a “Meta-Memory Cell” (MMCEL), is implemented on metal layers only and utilizes a dual parallel metal ladder structure that traverses and covers each metal and via layer from the bottom to the top of the metal layer structure of the chip. One of the metal ladders is connected to a power supply at the bottom metal layer, corresponding to a logic 1, and another metal ladder is connected to ground at the bottom metal layer, corresponding to a logic 0. The output of the MMCEL can thus be inverted at any metal or via layer and can be inverted as often as required. Significant cost savings are achieved because a revision ID or default register bits may be modified by altering only those metal layers where design changes are necessary.

Abstract: An integrated clock and power distribution network in a semiconductor device includes assigning a first tile to a location on a placement grid corresponding to a top metal layer. An orientation is assigned to the first tile relative to the top metal layer placement grid. The first tile is placed on a representation corresponding to the top metal layer in accordance with the assignments. A second tile is assigned to a location on a placement grid corresponding to a top-1 metal layer. The orientation is assigned to the second tile relative to the top-1 metal layer placement grid. The second tile is placed on a representation corresponding to the top-1 metal layer in accordance with the assignments. The first and second tile are arranged as a full-dense-mesh distribution structure. The first tile includes an integrated clock and power distribution structure. The second tile includes a low impedance underpass structure.

Abstract: In a semiconductor wafer substrate (20) for power semiconductor components (1) and in a method for producing the same, the semiconductor wafer substrate (20) has a large-area, buried rear side electrode (3) in form of a layer arranged between a self-supporting wafer substrate (4) and a non-self-supporting monocrystalline silicon wafer layer (5) arranged on the rear side electrode (3). The rear side electrode (3) has a ternary carbide and/or a ternary nitride and/or carbon.

Abstract: A main wall part is provided so as to surround an integrated circuit part. A sub-wall part which is in “L” shape is provided between each corner of the main wall part and the integrated circuit part. Therefore, even if the stress is concentrated due to heat treatment or the like, the stress is dispersed to the main wall part and the sub-wall part, and hence peeling between layers and a crack are unlikely to occur, as compared with the conventional art. Further, even if the crack and the like occur at the corner, moisture from the outside hardly reaches the integrated circuit part when the main wall part and the sub-wall part are coupled to each other. For this reason, it is possible to ensure an extremely high moisture resistance.

Abstract: A hybrid integrated circuit device having high mount reliability comprises a module substrate which is a ceramic wiring substrate, a plurality of electronic component parts laid out on the main surface of the module substrate, a plurality of electrode terminals laid out on the rear surface of the module substrate, and a cap which is fixed to the module substrate to cover the main surface of the module substrate. The electrode terminals include a plurality of electrode terminals which are aligned along the edges of the module substrate and power voltage supply terminals which are located inner than these electrode terminals. The electrode terminals aligned along the substrate edges are coated, at least in their portions close to the substrate edge, with a protection film having a thickness of several tens micrometers or less. Connection reinforcing terminals consist of a plurality of divided terminals which are independent of each other, and are ground terminals.

Abstract: This invention discloses a integrated circuit (IC) chip having a plurality of modular cells, the chip comprises a first modular cell having a first metal layer, which contains at least two power lines independent of each other; and a second modular cell, juxtaposed to the first modular cell, also having the first metal layer, which contains at least two power lines independent of each other, wherein all the power lines on the first metal layer serving the first modular cell do not extend into the second modular cell, and all the power lines on the first metal layer serving the second modular cell do not extend into the first modular cell.

Abstract: A layout for placing a circuit having a plurality of transistors in a small-width region. A search section inputs data on a circuit and searches for a set of routes formed so that passage through a transistor occurs only one time and so that the combination of routes covers the entire circuit network. An extraction section extracts a set of routes having the smallest number of routes. A width determination section determines the layout width from source and drain electrodes, the region between the source and drain electrodes, the region between adjacent pairs of the transistors not combined into a common electrode, the number of transistors, and the smallest number of routes. A layout determination section forms a layout in which the source, drain and gate electrodes of the transistor included in the circuit are placed in a small-width region.

Abstract: Wiring of a PDP address driver IC is disclosed which affords an adequate permitted current capacity. In the PDP address driver IC that drives the PDP, a layer, in which a planar high voltage ground wiring layer and a planar high voltage power wiring layer are formed, is provided atop a layer in which planar high voltage ground wiring layers that supply a ground potential to the active element that is formed within the PDP address driver IC and in which planar high voltage power wiring layers that supply a source potential to the active element are formed. Accordingly, the PDP address driver IC can comprise an adequate permitted current capacity while maintaining a compact size and comprising a multiplicity of output bit portions.

Abstract: The present invention is generally directed to intermeshed guard bands for multiple voltage supply regions or structures on an integrated circuit, and methods of making same. In one illustrative embodiment, an integrated circuit is provided that comprises a plurality of voltage supply structures formed above a substrate, the plurality of voltage supply structures being at differing voltage levels, and a guard band comprised of at least one doped region formed in the substrate under each of the plurality of voltage supply regions, each of the guard bands being comprised of a plurality of fingers extending from each end of the guard bands.

Abstract: An apparatus includes a first substrate having a set of semiconductor devices formed within it. The apparatus also includes a second substrate. A third substrate has a data conductor coupled between first and second connections to the second substrate. The data conductor is coupled to the set of semiconductor devices at respective connection points.

Abstract: A power module includes a heat radiation layer having the first main surface and the second main surface of reverse side opposed to the first main surface, an insulation layer disposed on the first main surface of a radiation layer, a wiring portion of current circuit disposed on the insulation layer and a plurality of switching elements disposed on the insulation layer and electrically connected to the wiring portion of current circuit. A plurality of external terminals are electrically connected to the wiring portions of current circuit. Furthermore, the module has a resin sealing all of the insulation layer, a wiring portion for current circuit, switching elements and the first main surface of the radiation layer, and a resin sealing a portion of the second main surface of the radiation layer with the resin.

Abstract: Provided are a semiconductor integrated circuit including a power supply, a semiconductor system including the semiconductor integrated circuit, and a method of forming the semiconductor integrated circuit. The semiconductor integrated circuit includes: a semiconductor substrate on a surface of which a plurality of electrical circuits and a plurality of power pads are mounted; an insulation layer stacked on the semiconductor substrate; a first conductive layer connected to a first power pad by a first via and stacked on the insulation layer; a second conductive layer connected to a second power pad by a second via, stacked on the insulation layer, and separated from the first insulation layer; and a power generation layer stacked on the first conductive layer and the second conductive layer and that generates voltage.

Abstract: A semiconductor device includes a first pad, a second pad and a third pad. The first pad and the third pad are electrically connected to each other. The first pad and the second pad are used for bonding. The second pad and the third pad are used for probing. According to this structure, Small size semiconductor device having high reliability even after a probing test can be provided.

Abstract: A semiconductor circuit in which low impedance characteristics required for a decoupling circuit are ensured up to a band of several hundreds of MHz or above in the situation where digital circuits are rushing into GHz age, and a semiconductor circuit exhibiting low impedance characteristics even in a band of several hundreds of MHz or above. A line element comprising a power supply line and a ground line or a ground plane arranged oppositely through a dielectric, characterized in that a dielectric covering the line element is provided.

Abstract: A semiconductor die includes a plurality of drivers and a plurality of bonding pads. Each driver is formed by a plurality of interconnected modules and has an associated bonding pad to which at least one of the modules of the driver is electrically connected. The modules of some of the drivers are positioned outside of the associated bonding pad toward a periphery of the die. The bonding pads may be arranged, for example, in a double- or triple-staggered pattern around the periphery of the die.

Abstract: Embodiments of the invention include a semiconductor integrated circuit package that includes a substrate which can have an integrated circuit die attached thereto. The package includes a dedicated high-speed ground plane that is electrically isolated from the ground plane used to ground the low speed circuitry of the package.

Abstract: A power semiconductor module having a housing, a substrate with conductor tracks and power semiconductor components arranged on the conductor tracks, and a connecting device. The connecting device comprises a film composite with first and second conductive layers, which are respectively patterned and thus form conductor tracks, and an insulating layer disposed between the two conductive layers. The first conductive layer has first contacts, formed as spot-welded joints, for power connecting areas of power semiconductor components, second contacts for control connecting areas of power semiconductor components and third contacts for the load connection to a printed circuit board. The second conductive layer connects to the first conductive layer and fourth contacts for providing control connection to an external printed circuit board. The film composite also has film sections between the first and second contacts and between the third and fourth contacts, which are arranged in guide sections of the housing.

Abstract: A semiconductor integrated circuit device includes a functional circuit block, a power supply for supplying power to the functional circuit block, a power supply interruption circuit disposed between the functional circuit block and the power supply and including a plurality of switching elements, and a power supply interruption control circuit for individually driving the switching elements. The functional circuit block is formed by integrating functional circuits, such as a logic circuit and a memory circuit. The functional circuits are formed with power supply terminals, respectively, and the power supply terminals are electrically connected through power supply interconnects to the switching elements. The power supply interconnects have the same length.

Abstract: A semiconductor device is composed of a power supply interconnection extending from a certain starting point in a first direction and also extending from the starting point in a second direction orthogonal to the first direction, a plurality of power pads, and connecting interconnections providing electrical connection between the power supply interconnection and the power pads. The power supply interconnection, the power pads, and the connecting interconnections are arranged in a symmetrical manner with respect to a symmetry line crossing the starting point and extending in a direction at an angle of 45 degree to the first and second directions.

Abstract: A rectangular-shaped interlevel connection structure is defined to electrically connect a first structure in a first chip level with a second structure in a second chip level. The rectangular-shaped interlevel connection structure is defined by an as-drawn cross-section having at least one dimension larger than a corresponding dimension of either the first structure, the second structure, or both the first and second structures. A dimension of the rectangular-shaped interlevel connection structure can exceed a normal maximum size in one direction in exchange for a reduced size in another direction. The rectangular-shaped interlevel connection structure can be placed in accordance with a gridpoint of a virtual grid defined by two perpendicular sets of virtual lines. Also, the first and/or second structures can be spatially oriented and/or placed in accordance with one or both of the two perpendicular sets of virtual lines.

Abstract: Provided are embodiments of semiconductor chips having a redistributed metal interconnection directly connected to power/ground lines of an internal circuit are provided. Embodiments of the semiconductor chips include an internal circuit formed on a semiconductor substrate. A chip pad is disposed on the semiconductor substrate. The chip pad is electrically connected to the internal circuit through an internal interconnection. A passivation layer is provided over the chip pad. A redistributed metal interconnection is provided on the passivation layer. The redistributed metal interconnection directly connects the internal interconnection to the chip pad through a via-hole and a chip pad opening, which penetrate at least the passivation layer. Methods of fabricating the semiconductor chip are also provided.

Abstract: The semiconductor device, including an electrode formed on the surface of a semiconductor element; and a metallic ribbon connected to the electrode. The metallic ribbon has a depressed portion on a surface contacting to the electrode, and the metallic ribbon is connected to the electrode in such a state that the metallic ribbon is deformed toward the inside of the depressed portion.

Abstract: Wiring lines for the supply of a voltage to feed a drive voltage to an integrated circuit formed in a semiconductor chip are disposed so as to cover a main surface of the semiconductor chip, so that, if the wiring lines are removed for the purpose of analyzing information stored in the semiconductor chip, the integrated circuit does not operates and it is impossible to analyze the information. Further, there is provided a processing detector circuit for detecting that the wiring lines have been tampered with. When the processing detector circuit detects a change in the sate of the wiring lines, the integrated circuit is reset. Thus, it is possible to improve the security of information stored on the card.

Abstract: An integrated circuit with a monolithic semiconducting substrate formed in a chip, where the chip has a peripheral edge, a backside, and an opposing top on which circuitry is formed. A first ring of bonding pads is formed along at least a portion of the peripheral edge. At least one of the bonding pads is configured as a power pad, and at least one of the bonding pads is configured as a ground pad. An intermediate power bus is disposed interior to the first ring of bonding pads on the chip, and forms no direct electrical connections to any core devices. An intermediate ground bus is also disposed interior to the first ring of bonding pads on the chip, and forms no direct electrical connections to any core devices. A power pad wire forms an exclusive electrical connection between the power pad and the intermediate power bus. A ground pad wire forms an exclusive electrical connection between the ground pad and the intermediate ground bus.

Abstract: An electrical device includes electrical contact pads, a supply voltage bus and an interconnection circuit. The electrical contact pads receive a supply voltage, and the bus is electrically connected to the electrical contact pads. For each electrical contact pad, the interconnection circuit forms a redundant connection between the bus and the electrical contact pad. The electrical device may include a passivation layer that includes windows to establish electrical contact between the electrical contact pads and the supply voltage bus. This window may be elongated in a path that is generally aligned with the path along which the supply voltage bus extends.

Abstract: In one embodiment, relatively thin but wide metal bus strips overlying a high power FET are formed to conduct current to the source and drain narrow metal strips. A passivation layer is formed over the surface of the FET, and the passivation layer is etched to expose almost the entire top surface of the bus strips. A copper seed layer is then formed over the surface of the wafer, and a mask is formed to expose only the seed layer over the bus strips. The seed layer over the bus strips is then copper or gold electroplated to deposit a very thick metal layer, which effectively merges with the underlaying metal layer, to reduce on-resistance. The plating metal does not need to be passivated due to its thickness and wide line/space. Other techniques may also be used for depositing a thick metal over the exposed bus strips.

Abstract: There is a need for providing a technology capable of decreasing on-resistance of a power transistor in a semiconductor device that integrates the power transistor and a control integrated circuit into a single semiconductor chip. There is another need for providing a technology capable of reducing a chip size of a semiconductor device. A semiconductor chip includes a power transistor formation region to form a power transistor, a logic circuit formation region to form a logic circuit, and an analog circuit formation region to form an analog circuit. A pad is formed in the power transistor formation region. The pad and a lead are connected through a clip whose cross-section is larger than that of a wire. On the other hand, a bonding pad is connected through the wire 29.

Abstract: As a power feed route in a semiconductor chip, a power feed route which reduces antiresonance impedance in the frequency range of tens of MHz is to be realized thereby to suppress power noise in a semiconductor device. By inserting structures which raise the resistance in the medium frequency band into parts where the resistance is intrinsically high, such as power wiring in a semiconductor package and capacitor interconnecting electrode parts, the antiresonance impedance in the medium frequency band can be effectively reduced while keeping the impedance low at the low frequency.

Abstract: An integrated circuit including an assembly of functional blocks and an interconnection network formed of at least N levels of conductive tracks separated by conductive via levels, the interconnection network including a power supply network comprising a first assembly of substantially parallel rails placed at the N-th track level, and a second assembly of substantially parallel rails placed at the (N?1)-th track level under the first rail assembly, the rails of the first assembly being non-parallel to those of the second assembly, the power supply network further including, for each functional block, a third assembly of power supply rails placed at the (N?2)-th track level above the elements of the considered block, and in which the rails of the second assembly form an acute angle smaller than 80° with the rails of each third rail assembly.

Abstract: Consistent with an example embodiment, an electronic device comprises a semiconductor device, particularly an integrated circuit, and a carrier substrate with conductive layers on the first side and the second side, and voltage supply and ground connections mutually arranged according to a chessboard pattern. These connections extend in a direct path through vertical interconnects and bumps to bond pads at the integrated circuit, which bond pads are arranged in a corresponding chessboard pattern. As a result, an array of direct paths is provided, wherein the voltage supply connections form as much as possible the coaxial center conductors of a coaxial structure.

Abstract: Multilevel metallization layouts for an integrated circuit chip including transistors having first, second and third elements to which metallization layouts connect. The layouts minimize current limiting mechanism including electromigration by positioning the connection for the second contact vertically from the chip, overlapping the planes and fingers of the metallization layouts to the first and second elements and forming a pyramid or staircase of multilevel metallization layers to smooth diagonal current flow.