Transparent Conductive Layer (e.g., Transparent Conductive Oxide (tco), Indium Tin Oxide (ito) Layer) (epo) Patents (Class 257/E31.126)
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Patent number: 8035108Abstract: A liquid crystal display panel capable of preventing flicker and improving reflectance include a thin film transistor substrate having a gate line, a data line, a thin film transistor connected to the gate and data lines, and a reflective electrode connected to the thin film transistor and covering at least part of the gate line, a color filter substrate having a color filter and a common electrode forming an electric field with the reflective electrode. Liquid crystals are disposed between the thin film transistor substrate and the color filter substrate. The reflective electrode shields the liquid crystals from a gate signal.Type: GrantFiled: January 12, 2007Date of Patent: October 11, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Seung Kyu Lee, Won Sang Park, Jae Hyun Kim, Yong Seok Cho, Yong Suk Yeo
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Publication number: 20110240115Abstract: A solar cell with a doped buffer layer includes silicon and tin.Type: ApplicationFiled: March 18, 2011Publication date: October 6, 2011Inventors: Benyamin Buller, Dale Roberts, Rui Shao
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Publication number: 20110240090Abstract: A photovoltaic module includes at least two photovoltaic cells in series, each rectangular cell including, respectively, a first rear thin film electrode, a photovoltaic stack having at least two active materials included between the rear electrode and a transparent conductive electrode made of a thin film, the electrode TC being capable of collecting and transmitting an electric current generated by the photovoltaic stack, the two photovoltaic cells being electrically connected in series by an electrical contact strip that is included between the electrode TC of the first cell and the rear electrode of the second cell. The local thickness of the electrode TC of the cell varies as a function of the distance to the electrical contact strip. Also described are methods for depositing and etching the transparent conductive film so as to simultaneously manufacture a plurality of cells for a single module.Type: ApplicationFiled: December 3, 2009Publication date: October 6, 2011Applicants: ECOLE POLYTECHNIQUE, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, TOTAL SAInventors: Erik V. Johnson, Pere Roca I Cabarrocas
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Publication number: 20110240104Abstract: The present invention relates to a solar cell that can recycle a substrate, and a manufacturing method thereof. The solar cell includes: i) a plurality of nano-structures distanced from each other and extended in one direction; ii) a first conductive layer covering a first end of at least one of the plurality of nano-structures; iii) a second conductive layer distanced from the first conductive layer and covering a second end of the nano-structure; and iv) a dielectric layer disposed between the first conductive layer and the second conductive layer.Type: ApplicationFiled: October 27, 2009Publication date: October 6, 2011Applicant: IUCF-HYC (Industry-University Cooperation Foundation Hanyang University)Inventors: Jung-Ho Lee, Han-Don Um, Sang-Won Jee, Kwang-Tae Park, Hong-Seok Seo, Jin-Young Jung
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Publication number: 20110240112Abstract: Provided are a flexible dye-sensitized solar cell and a method for producing the same.Type: ApplicationFiled: October 4, 2010Publication date: October 6, 2011Applicant: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATIONInventors: SUNG-HOON AHN, DOO-MAN CHUN, MIN-SAENG KIM
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Publication number: 20110237024Abstract: A method for processing an edge of a photovoltaic panel is described. A first electrically-conductive film, a photovoltaic film and a second electrically-conductive film are serially formed as a stack of three films over a surface of a substrate. An edge section of the stack of three films is removed from the surface of the substrate by sandblasting. At least two separate grooves are formed by laser scribing on all the three films adjacent to the removed edge section of the stack of three films.Type: ApplicationFiled: March 21, 2011Publication date: September 29, 2011Applicant: Du Pont Apollo LimitedInventors: Chang-Han CHIANG, Chih-Ming Lin, Cheng-Hsin Chen
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Publication number: 20110232731Abstract: Devices including photovoltaic cells and methods of manufacture are disclosed. A photovoltaic cell includes a first electrode layer, at least one photoactive layer disposed on first electrode layer, a second electrode layer disposed on the photoactive layer, at least one first carrier collector structure with a first work function electrically coupled to the first electrode layer and extending partially in to the photoactive layer, and at least one second carrier collector structure with a second work function electrically coupled to the second electrode layer and extending partially into the photoactive layer. In the cell, the first carrier collector structure extends towards the second electrode layer without physically contacting the second carrier collector structure, and the second carrier collector structure extends towards the first electrode layer without physically contacting the first carrier collector structure.Type: ApplicationFiled: October 5, 2010Publication date: September 29, 2011Inventors: Gon NAMKOONG, Helmut BAUMGART, Keejoo LEE
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Publication number: 20110232748Abstract: In a solar cell module and a manufacturing method thereof according to an embodiment of the present invention, a solar cell (55) composed of a transparent electrode film, a photoelectric conversion layer and a back face electrode film is laminated on a light-transmitting insulating substrate (51). On the back face electrode film of the solar cell (55), an insulated lead wire (62, 63) and a back film (65) having an opening (65a) for drawing out an output lead portion (62a, 63a) of the lead wire (62, 63) are sequentially laminated. In such a solar cell module, an insulating sheet (11) is disposed between the back face electrode film of the solar cell (55) and the back film (65) so as to completely cover the opening (65a) of the back film (65). The insulating sheet (11) is disposed so as to cover the entire perimeter of the edge of the opening (65a) of the back film (65).Type: ApplicationFiled: November 25, 2009Publication date: September 29, 2011Inventors: Akira Shimizu, Katsuyuki Naitoh
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Publication number: 20110237017Abstract: A thin film solar cell having an active area and a dead area is provided. The thin film solar cell includes a first substrate, a first conductive layer, an photovoltaic layer, a second conductive layer, a first passivation layer, and a second passivation layer. The first conducting layer, the photovoltaic layer, the second conductive layer, and the first passivation layer are respectively disposed on the first substrate, the first conductive layer, the photovoltaic layer, and the second conductive layer, and all of them are located in the active area. The second passivation layer is disposed on a peripheral of the photovoltaic layer and located in the dead area, so as to avoid the photovoltaic layer from contacting with moisture in air. A fabrication method of the thin film solar cell is also provided.Type: ApplicationFiled: June 8, 2011Publication date: September 29, 2011Inventor: Chin-Yao Tsai
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Publication number: 20110226320Abstract: A solar cell includes a first electrode located over a substrate, at least one first conductivity type semiconductor layer located over the first electrode, at least one second conductivity type semiconductor layer located over the first conductivity semiconductor layer, and a transparent conductive oxide contact layer located over the second conductivity semiconductor layer. The first surface of the transparent conductive oxide contact layer may be located closer to the second conductivity type semiconductor layer than the second surface of the transparent conductive oxide contact layer, and the transparent conductive oxide contact layer may have an oxygen concentration that decreases continuously or in at least two discrete steps as a function of thickness for at least a first portion of the contact layer thickness in a direction from the first surface to the second surface.Type: ApplicationFiled: March 18, 2010Publication date: September 22, 2011Inventors: Patrick LITTLE, Neil M. Mackie, Korhan Demirkan
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Patent number: 8022390Abstract: A photodetector for detecting infrared light in a wavelength range of 3-25 ?m is disclosed. The photodetector has a mesa structure formed from semiconductor layers which include a type-II superlattice formed of alternating layers of InAs and InxGa1-xSb with 0?x?0.5. Impurity doped regions are formed on sidewalls of the mesa structure to provide for a lateral conduction of photo-generated carriers which can provide an increased carrier mobility and a reduced surface recombination. An optional bias electrode can be used in the photodetector to control and vary a cut-off wavelength or a depletion width therein. The photodetector can be formed as a single-color or multi-color device, and can also be used to form a focal plane array which is compatible with conventional read-out integrated circuits.Type: GrantFiled: August 17, 2007Date of Patent: September 20, 2011Assignee: Sandia CorporationInventors: Jin K. Kim, Malcolm S. Carroll
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Publication number: 20110223711Abstract: A process for fabricating a silicon-based thin-film photovoltaic cell, applicable for example in the energy generation field. The fabrication process includes a) depositing a p-doped or n-doped amorphous silicon film, the X-ray diffraction spectrum of which has a line centered at 28° that has a mid-height width, denoted by a, such that 4.7°?a<6.0°, on a substrate.Type: ApplicationFiled: April 20, 2009Publication date: September 15, 2011Inventors: Cédric Ducros, Frédéric Sanchette, Christophe Secouard
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Publication number: 20110223707Abstract: A backside illuminated image sensor includes a substrate, a backside passivation layer disposed on backside of the substrate, and a transparent conductive layer disposed on the backside passivation layer.Type: ApplicationFiled: December 15, 2010Publication date: September 15, 2011Inventors: Jaroslav Hynecek, Leonard Forbes, Homayoon Haddad, Thomas Joy
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Publication number: 20110220198Abstract: A method for forming a bifacial thin film photovoltaic cell includes providing a glass substrate having a surface region covered by an intermediate layer and forming a thin film photovoltaic cell on the surface region. Additionally, the thin film photovoltaic cell includes an anode overlying the intermediate layer, an absorber over the anode, and a window layer and cathode over the absorber mediated by a buffer layer. The anode comprises an aluminum doped zinc oxide (AZO) layer forming a first interface with the intermediate layer and a second interface with the absorber. The AZO layer is configured to induce Fermi level pinning at the first interface and a strain field from the first interface to the second interface.Type: ApplicationFiled: March 16, 2011Publication date: September 15, 2011Applicant: Stion CorporationInventors: Ashish Tandon, Fred Mikulec
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Publication number: 20110220189Abstract: A thin film solar cell device of higher power generation efficiency, having a tandem structure in which a transparent electrode layer is inserted between a back surface electrode layer and a photoelectric conversion layer and between a plurality of stacked photoelectric conversion layers. A first electricity conducting path is obtained by forming a thin film made of a conductive material (with specific resistance<10?4 ?km) in a micropore penetrating an intermediate transparent electrode layer and a first insulating layer, for electrically connecting first and second photoelectric conversion layers to each other. A second electricity conducting path having the same structure also electrically connects the second photoelectric conversion layer and a back surface electrode layer to each other. The gross area of an electricity conducting path of the first and second electricity conducting paths is set in a range not less than 1×10?7 and not more than 4×10?6 relative to the area of the cell.Type: ApplicationFiled: September 17, 2008Publication date: September 15, 2011Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Mikio Yamamuka, Tae Orita, Hiroya Yamarin
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Publication number: 20110221026Abstract: Disclosed is a photovoltaic device. The photovoltaic device of the present invention includes: a first electrode and a second electrode, which are sequentially placed on a substrate; a first photoelectric conversion layer being placed between the first electrode and the second electrode, and including an n-type semiconductor layer, an intrinsic semiconductor layer and a p-type semiconductor layer, which are sequentially stacked; a second photoelectric conversion layer being placed between the first photoelectric conversion layer and the second electrode, and including an n-type semiconductor layer, an intrinsic semiconductor layer and a p-type semiconductor layer, which are sequentially stacked; and light transmitting particles placed within the second electrode.Type: ApplicationFiled: March 15, 2011Publication date: September 15, 2011Inventor: Seung-Yeop Myong
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Publication number: 20110203660Abstract: The present invention provides improved devices such as transparent solar cells. This patent teaches a particularly efficient method of device manufacture based on incorporating the solar cell fabrication into the widely used, high temperature, Float Glass manufacture process.Type: ApplicationFiled: February 22, 2010Publication date: August 25, 2011Applicant: PVOptixInventors: James P. Campbell, Harry R. Campbell, Ann B. Campbell, Joel F. Farber
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Publication number: 20110197958Abstract: A tin-cadmium oxide film having an amorphous structure and a ratio of tin atoms to cadmium atoms of between 1:1 and 3:1. The tin-cadmium oxide film may have an optical band gap of between 2.7 eV and 3.35 eV. The film may also have a charge carrier concentration of between 1×1020 cm?3 and 2×1020 cm?3. The tin cadmium oxide film may also exhibit a Hall mobility of between 40 cm2V?1 s?1 and 60 cm2V?1 s?1. Also disclosed is a method of producing an amorphous tin-cadmium oxide film as described and devices using same.Type: ApplicationFiled: February 12, 2010Publication date: August 18, 2011Applicant: ALLIANCE FOR SUSTAINABLE ENERGY, LLCInventors: XIAONAN LI, Timothy A. Gessert
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Publication number: 20110197952Abstract: A photovoltaic device has a first photovoltaic cell unit and a second photovoltaic cell unit stacked on either side of a conductive intermediate layer, between a first electrode and a second electrode, the first electrode and second electrode being electrically connected by a channel formed through the first photovoltaic cell unit, the second photovoltaic cell unit, and the intermediate layer as far as the surface of the first electrode, and a PN junction being formed at an end section of the intermediate layer that contacts the second electrode by adding dopant.Type: ApplicationFiled: November 25, 2009Publication date: August 18, 2011Applicant: Sanyo Electric Co., LtdInventors: Toshie Kunii, Shigeo Yata
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Publication number: 20110197967Abstract: On a p-type conductive light absorption layer provided by a chalcopyrite structure compound that is layered bridging a pair of backside electrode layers provided on a side of a glass substrate, a light-transmissive n-type buffer layer that forms a p-n junction with the light absorption layer is layered. A light-transmissive transparent electrode layer is layered on the buffer layer to extend from a side of the light absorption layer and the buffer layer to one of the pair of backside electrode layers. The transparent electrode layer is formed in an amorphous film containing indium oxide and zinc oxide as primary components, the transparent electrode layer exhibiting a film stress of ±1×109 Pa or less. A photovoltaic element can be favorably processed without causing cracking and damage even by an easily processable mechanical scribing, so that productivity can be enhanced and yield rate can be improved.Type: ApplicationFiled: October 19, 2009Publication date: August 18, 2011Applicant: IDEMITSU KOSAN CO., LTDInventors: Akira Kaijo, Masashi Oyama
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Patent number: 7998761Abstract: The present invention relates to a light emitting diode with enhanced luminance and light emitting performance due to increase in efficiency of current diffusion into an ITO layer, and a method of fabricating the light emitting diode. According to the present invention, there is manufactured at least one light emitting cell including an N-type semiconductor layer, an active layer and a P-type semiconductor layer on a substrate. The method of the present invention comprises the steps of (a) forming at least one light emitting cell with an ITO layer formed on a top surface of the P-type semiconductor layer; (b) forming a contact groove for wiring connection in the ITO layer through dry etching; and (c) filling the contact groove with a contact connection portion made of a conductive material for the wiring connection.Type: GrantFiled: December 8, 2006Date of Patent: August 16, 2011Assignee: Seoul Opto Device Co., Ltd.Inventors: Dae Won Kim, Yeo Jin Yoon, Duck Hwan Oh, Jong Hwan Kim
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Publication number: 20110192453Abstract: The present invention provides strategies for improving the adhesion between a barrier region, a transparent conductive region, and/or an electrically conductive grid through the use of an adhesion promoting region. The adhesion promoting region is optically transmissive and comprises a metal layer, a metal nitride layer, a metal carbide layer, or a combination thereof and preferably comprises at least one of Cr, Ti, Ta, and Zr or a combination thereof. These strategies are particularly useful in the fabrication of heterojunction photovoltaic devices such as chalcogenide-based solar cells. Adhesion is improved to such a degree that grid materials and dielectric barrier materials can cooperate to provide a hermetic seal over devices to protect against damage induced by environmental conditions, including damage due to water intrusion. The adhesion promoting region also serves as a barrier to the migration of Na, Li, and the lanthanoid series of elements.Type: ApplicationFiled: January 12, 2011Publication date: August 11, 2011Inventors: Marty W. DeGroot, Paul R. Elowe
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Publication number: 20110192454Abstract: The present invention provides strategies for providing photovoltaic devices that are more resistant to moisture and/or oxygen degradation and the accompanying migration of key elements such as Na, Li, and the lanthanoid series of elements from the absorber layer and that have enhanced service life and improved performance. These strategies are particularly useful in the fabrication of chalcogenide-based photovoltaic devices such as chalcogenide-based solar cells. These strategies incorporate a barrier region between the photovoltaic absorber region and the front side collection grid. The barrier region keeps moisture and/or oxygen from the absorber layer and contains key elements such as Na, Li, and Ln in the absorber layer. As a result, the absorber layer retains its performance capabilities for an extended period of time.Type: ApplicationFiled: January 12, 2011Publication date: August 11, 2011Inventors: Rebekah K. Feist, Marty W. DeGroot, Todd R. Bryden, Joseph George
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Publication number: 20110186120Abstract: Certain example embodiments of this invention relate to solar cell devices, and/or methods of making the same. More particularly, certain example embodiments relate to a front transparent conductive electrode for solar cell devices (e.g., micro-morph silicon thin-film solar cells), and/or methods of making the same. The electrode of certain example embodiments may include a textured transparent conductive oxide (TCO) layer. The textured layer and/or coating may include at least two feature sizes, wherein at least one type of feature is comparable in size to the wavelength of solar light absorbed by the amorphous portion of the micro-morph silicon solar cell, and the other feature size being comparable to that of micro-crystalline portion. Double-agent etchants may be used to produce such different features sizes. Using a textured TCO-based layer having different feature sizes may improve the efficiency of the solar cell.Type: ApplicationFiled: January 26, 2011Publication date: August 4, 2011Applicant: Guardian Industries Corp.Inventor: Alexey Krasnov
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Publication number: 20110186125Abstract: For production of an electrically conductive zinc oxide layered film, a substrate, at least a surface of the substrate being electrically non-conductive, is prepared. An underlayer is formed with a coating technique on the electrically non-conductive surface of the substrate, the underlayer comprising at least one kind of a plurality of fine particles containing electrically conductive zinc oxide as a principal ingredient. An electrically conductive zinc oxide thin film layer is formed with a chemical bath deposition technique on the underlayer.Type: ApplicationFiled: January 31, 2011Publication date: August 4, 2011Applicant: FUJIFILM CORPORATIONInventors: Ryouko AGUI, Tetsuo KAWANO
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Publication number: 20110189817Abstract: A manufacturing method for a solar cell including an upper electrode extracting an electrode at an incident light side, the upper electrode including a transparent conductive film, a basic structural element of the transparent conductive film being any one of an indium (In), a zinc (Zn), and tin (Sn), the manufacturing method including: a step A forming a texture on a front surface of a transparent substrate using a wet etching method, the transparent conductive film being formed on the transparent substrate, wherein in the step A, when the texture is formed, a metal thin film is formed on the transparent substrate, and an anisotropic etching is performed with the metal thin film being a mask.Type: ApplicationFiled: October 15, 2009Publication date: August 4, 2011Applicant: ULVAC, INC.Inventors: Hirohisa Takahashi, Satoru Ishibashi, Kyuzo Nakamura
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Publication number: 20110180133Abstract: This invention provides an optically transparent electrically conductive layer with a desirable combination of low electrical sheet resistance and good optical transparency. The conductive layer comprises a multiplicity of magnetic nanostructures in a plane, aligned into a plurality of roughly parallel continuous conductive pathways, wherein the density of the magnetic nanostructures allows for substantial optical transparency of the conductive layer. The magnetic nanostructures may be nanoparticles, nanowires or compound nanowires. A method of forming the conductive layer on a substrate includes: depositing a multiplicity of magnetic nanostructures on the substrate and applying a magnetic field to form the nanostructures into a plurality of conductive pathways parallel to the surface of the substrate. The conductive layer may be used to provide an enhanced silicon to transparent conductive oxide (TCO) interface in thin film silicon solar cells.Type: ApplicationFiled: April 23, 2010Publication date: July 28, 2011Applicant: Applied Materials, Inc.Inventors: Steven VERHAVERBEKE, Roman GOUK, Kurtis LESCHKIES
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Publication number: 20110180135Abstract: A method of manufacturing a buffer layer of a photoelectric conversion device having a stacked structure in which a lower electrode, a photoelectric conversion semiconductor layer that generates a current by absorbing light, the buffer layer, and a translucent conductive layer are stacked on a substrate, in which the buffer layer is formed by a CBD method, a pH variation of reaction solution for forming the buffer layer is controlled within 0.5 while deposition of the buffer layer by the CBD method is in progress, and the reaction solution includes a Cd or Zn metal and a sulfur source.Type: ApplicationFiled: January 6, 2011Publication date: July 28, 2011Applicant: FUJIFILM CORPORATIONInventors: Takashi KOIKE, Tetsuo KAWANO
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Publication number: 20110174981Abstract: A photodiode array for a radiation detector is disclosed, including a multiplicity of photodiodes arranged in a structured fashion, the photodiodes respectively having an active pixel region for converting light into electrical signals. In at least one embodiment, a transparent oxide layer with a refractive index comparable to the photodiodes is arranged on the active pixel region of at least some of the photodiodes on a side of the photodiode array provided for arranging a scintillator array. Compared to known photodiode arrays, the oxide layer replaces an adhesive. As a result of equalizing the refractive indices, light incident on the interface between the oxide layer and the photodiode array is refracted or reflected to a lesser extent. This reduces the optical crosstalk between adjacent pixels. Moreover, the active pixel regions of the photodiodes become optically visible as a result of the oxide layer.Type: ApplicationFiled: January 14, 2011Publication date: July 21, 2011Applicant: SIEMENS AKTIENGESELLSCHAFTInventors: Michael Miess, Stefan Wirth
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Publication number: 20110168252Abstract: Certain example embodiments of this invention relate to a front electrode for solar cell devices (e.g., amorphous silicon or a-Si solar cell devices), and/or methods of making the same. Advantageously, certain example embodiments include a layer that acts as an etch-stop layer. In certain example embodiments, the blocking layer is provided between a transparent conductive oxide layer including AZO and a conductive layer. In certain example embodiments, a weak acid may be used to texture the layer including AZO. A semiconductor may be provided over the textured layer including AZO. The blocking layer provided between the layer of AZO and the IR reflecting layer may be more resistant to etching by weak acids than the layer based on AZO. Therefore, in certain example embodiments, the blocking layer may substantially reduce the risk of the semiconductor coming into contact with the conductive layer (which may be based on Ag).Type: ApplicationFiled: December 30, 2010Publication date: July 14, 2011Applicant: Guardian Industries Corp.Inventors: Alexey Krasnov, Willem Den Boer
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Publication number: 20110168246Abstract: A thin-film solar cell, comprising a light transmissive substrate, a transparent electrode, a first photovoltaic layer, a second photovoltaic layer and a back electrode, is provided. The light transmissive substrate has a light incident surface and a back surface opposite to the light incident surface, and the transparent electrode is disposed on the back surface. The first photovoltaic layer is disposed on the transparent electrode, and the material of the first photovoltaic layer is an amorphous semiconductor, and the first photovoltaic layer has a first energy gap. The second photovoltaic layer is disposed on the first photovoltaic layer and has a second energy gap lower than the first energy gap. The material of the second photovoltaic layer is a micro-crystalline semiconductor, and the crystallization ratio of the second photovoltaic layer is between 30%˜100%. The second photovoltaic layer can absorb a light ray with a wavelength between 600 nm-1100 nm.Type: ApplicationFiled: March 18, 2011Publication date: July 14, 2011Applicant: AURIA SOLAR CO., LTD.Inventor: Chin-Yao Tsai
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Publication number: 20110168243Abstract: The present invention provides strategies for improving the adhesion among two or more of transparent conducting oxides, electrically conductive grid materials, and dielectric barrier layers. As a consequence, these strategies are particularly useful in the fabrication of heterojunction photovoltaic devices such as chalcogenide-based solar cells. When the barrier is formed and then the grid is applied to vias in the barrier, the structure has improved moisture barrier resistance as compared to where the barrier is formed over or around the grid. Adhesion is improved to such a degree that grid materials and dielectric barrier materials can cooperate to provide a hermetic seal over devices to protect against damage induced by environmental conditions, including damage due to water intrusion. This allows the collection grids to be at least partially exposed above the dielectric barrier, making it easy to make electronic connection to the devices.Type: ApplicationFiled: January 12, 2011Publication date: July 14, 2011Inventors: Paul R. Elowe, Marty W. DeGroot, Michael E. Mills, Matt A. Stempki
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Publication number: 20110168250Abstract: A solar cell including a photovoltaic layer, a first electrode layer, a second electrode layer, an insulating layer and a light-transparent conductive layer is provided. The photovoltaic layer has a first surface and a second surface. The first electrode layer having at least one gap is disposed on the first surface, wherein the at least one gap exposes a portion of the photovoltaic layer. The second electrode layer is disposed on the second surface. The insulating layer having a plurality of pores is located on the photovoltaic layer exposed by the at least one gap, wherein the holes expose a portion of the photovoltaic layer. The light-transparent conductive layer covers the insulating layer and is connected with the first electrode layer. The transparent electrode is connected with the photovoltaic layer through at least a part of the pores. A method of fabricating a solar cell is also provided.Type: ApplicationFiled: March 9, 2010Publication date: July 14, 2011Applicants: TATUNG COMPANY, TATUNG UNIVERSITYInventors: Chiung-Wei Lin, Yi-Liang Chen
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Publication number: 20110163403Abstract: The present disclosure relates to modifications to nanostructure based transparent conductors to achieve increased haze/light-scattering with different and tunable degrees of scattering, different materials, and different microstructures and nanostructures.Type: ApplicationFiled: December 3, 2010Publication date: July 7, 2011Applicant: Cambrios Technologies CorporationInventors: Rimple Bhatia, Hash Pakbaz, Jelena Sepa, Teresa Ramos, Florian Pschenitzka, Michael A. Spaid, Karl Pichler
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Publication number: 20110165727Abstract: A method of fabricating a photo sensor includes the following steps. First, a substrate is provided, having a conductive layer, a buffer dielectric layer, a patterned semiconductor layer, a dielectric layer, and a planarization layer disposed thereon from bottom to top, wherein the patterned semiconductor layer comprises a first doped region, an intrinsic region, and a second doped region disposed in order. Then, the planarization layer is patterned to form an opening in the planarization layer to expose a portion of the dielectric layer, wherein the opening is positioned on the intrinsic region and portions of the first and the second doped regions. Thereafter, at least a patterned transparent conductive layer is formed in the opening, covering the boundary of the intrinsic region and the first doped region and the boundary of the intrinsic region and the second doped region.Type: ApplicationFiled: March 10, 2011Publication date: July 7, 2011Inventors: Chien-Sen Weng, Chih-Wei Chao, Chrong-Jung Lin, Ya-Chin King
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Patent number: 7972952Abstract: A compound semiconductor light-emitting device which includes an n-type semiconductor layer, a light-emitting layer and a p-type semiconductor layer, that are made of a compound semiconductor, formed on a substrate, the n-type semiconductor layer and the p-type semiconductor layer are stacked so as to interpose the light-emitting layer therebetween, a first conductive transparent electrode and a second conductive electrode. The first conductive transparent electrode is made of an IZO film containing an In2O3 crystal having a bixbyite structure. Also discussed is a method of manufacturing the device.Type: GrantFiled: December 6, 2007Date of Patent: July 5, 2011Assignee: Showa Denko K.K.Inventors: Naoki Fukunaga, Hironao Shinohara
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Publication number: 20110146779Abstract: The present invention relates to a method for fabricating a sub-wavelength structure layer, including: forming a metal film on a passivation layer, an n-GaN layer or a transparent conductive oxide layer; performing thermal treatment to form self assembled metal nano particles; using the metal nano particles as a mask to remove a partial area of the passivation layer, the n-GaN layer or the transparent conductive oxide layer to form a sub-wavelength structure of which the cross-sectional area increases along the thickness direction of the passivation layer, the n-GaN layer or the transparent conductive oxide layer; and removing the metal nano particles. In addition, the present invention further provides the obtained sub-wavelength structure layer and a photoelectric conversion device using the same.Type: ApplicationFiled: March 26, 2010Publication date: June 23, 2011Applicant: National Chiao Tung UniversityInventors: Edward Yi Chang, Kartika Chandra Sahoo, Men-Ku Lin, Yi-Yao Lu, Sheng-Ping Wang
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Publication number: 20110151611Abstract: Disclosure herein is a method for manufacturing a solar cell. The method comprises the following steps. A substrate is provided. An article having a plurality of protrusions touches the surface of the substrate and thereby forming a plurality of indentations thereon. Subsequently, a transparent conductive layer is formed on the indented surface of the substrate, a photovoltaic layer is formed on the transparent conductive layer, and then a back electrode is form above the photovoltaic layer.Type: ApplicationFiled: December 16, 2010Publication date: June 23, 2011Applicant: Du Pont Apollo LimitedInventors: Chu-Wan Huang, Ching-Yee Chak
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Publication number: 20110146794Abstract: A thin-film solar cell and a manufacture method thereof are provided. The thin-film solar cell comprises a transparent substrate, a first transparent conductive layer, a photovoltaic layer, a second transparent conductive layer and a light reflecting structure. The transparent substrate has a light incident surface and a back surface opposite to the light incident surface. The first transparent conductive layer is disposed on the back surface of the transparent substrate. The photovoltaic layer is disposed on the first transparent conductive layer. The second transparent conductive layer is disposed on the photovoltaic layer. The light reflecting structure is disposed on the second transparent conductive layer. The manufacture method forms the light reflecting structure having a texture structure on the thin film to enhance utilization of light beams in the thin-film solar cell so as to further improve photoelectric conversion efficiency of the thin-film solar cell.Type: ApplicationFiled: March 2, 2011Publication date: June 23, 2011Applicant: AURIA SOLAR CO., LTD.Inventor: Chin-Yao Tsai
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Publication number: 20110146785Abstract: A photovoltaic cell with a doped buffer layer includes a metal oxide and a dopant.Type: ApplicationFiled: December 17, 2010Publication date: June 23, 2011Applicant: First Solar, Inc.Inventors: Benyamin Buller, Markus Gloeckler, Chungho Lee, Scott McWilliams, Rui Shao, Zhibo Zhao
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Publication number: 20110139240Abstract: A discontinuous or reduced thickness window layer can improve the efficiency of CdTe-based or other kinds of solar cells.Type: ApplicationFiled: December 15, 2010Publication date: June 16, 2011Applicant: First Solar, Inc.Inventors: Arnold Allenic, Benyamin Buller, Markus Gloeckler, Imran Khan, Viral Parikh, Rick C. Powell, Igor Sankin, Gang Xiong
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Publication number: 20110126899Abstract: An oxide evaporation material according to the present invention includes a sintered body containing indium oxide as a main component thereof and cerium with a Ce/In atomic ratio of 0.001 to 0.110. The L* value in the CIE 1976 color space is 62 to 95. The oxide evaporation material with the L* value of 62 to 95 has an optimal oxygen amount. Accordingly, even when a small amount of an oxygen gas is introduced into a film-formation vacuum chamber, a transparent conducting film having a low resistance and a high transmittance in the visible to near-infrared region is formed by vacuum deposition methods. Since the amount of the oxygen gas introduced is small, the difference in composition between the film and the evaporation material is made small. This reduces the variations in composition and characteristics among films formed in large quantities.Type: ApplicationFiled: November 1, 2010Publication date: June 2, 2011Applicant: SUMITOMO METAL MINING CO., LTD.Inventors: Yoshiyuki ABE, Riichiro Wake, Masakazu Kuwahara, Kentaro Sogabe, Azusa Oshiro, Hisaki Yada
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Patent number: 7952116Abstract: The present disclosure relates to a gallium nitride-based compound semiconductor light-emitting device with low driving voltage and high light emission output, which has a positive electrode comprising a transparent electrically conducting layer put into direct contact with a p-type semiconductor layer. An embodiment of the disclosure includes a gallium nitride-based compound semiconductor light-emitting device, which includes an n-type semiconductor layer, a light-emitting layer and a p-type semiconductor layer, which may be formed in this order on a substrate, wherein each layer comprises a gallium nitride-based compound semiconductor, the light-emitting device has a negative electrode and a positive electrode provided on the n-type semiconductor layer and a region having a semiconductor metal concentration of 20 at. % or more, based on all metals, is present in the transparent electrically conducting film on the semiconductor side surface of the transparent electrically conducting film.Type: GrantFiled: May 10, 2010Date of Patent: May 31, 2011Assignee: Showa Denko K.K.Inventor: Koji Kamei
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Publication number: 20110121353Abstract: Optoelectronic device modules, arrays optoelectronic device modules and methods for fabricating optoelectronic device modules are disclosed. The device modules are made using a starting substrate having an insulator layer sandwiched between a bottom electrode made of a flexible bulk conductor and a conductive back plane. An active layer is disposed between the bottom electrode and a transparent conducting layer. One or more electrical contacts between the transparent conducting layer and the back plane are formed through the transparent conducting layer, the active layer, the flexible bulk conductor and the insulating layer. The electrical contacts are electrically isolated from the active layer, the bottom electrode and the insulating layer.Type: ApplicationFiled: November 22, 2010Publication date: May 26, 2011Inventors: James R. Sheats, Sam Kao, Martin R. Roscheisen
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Patent number: 7947895Abstract: A photovoltaic device capable of suppressing reduction of the yield in production also when a transparent conductive film has small surface roughness is obtained. This photovoltaic device comprises a photovoltaic element including a transparent conductive oxide film having arithmetic mean deviation of the profile of not more than about 2 nm and a paste electrode, formed on the transparent conductive oxide film, containing at least a metal material and a resin material, while the resin material contains at least about 60 percent by weight and not more than about 100 percent by weight of epoxy resin.Type: GrantFiled: March 24, 2004Date of Patent: May 24, 2011Assignee: Sanyo Electric Co., Ltd.Inventors: Takeshi Yamamoto, Eiji Maruyama, Yukihiro Yoshimine
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Patent number: 7947524Abstract: A method for processing a thin film photovoltaic module. The method includes providing a plurality of substrates, each of the substrates having a first electrode layer and an overlying absorber layer composed of copper indium gallium selenide (CIGS) or copper indium selenide (CIS) material. The absorber material comprises a plurality of sodium bearing species. The method maintains the plurality of substrates in a controlled environment after formation of at least the absorber layer through one or more processes up to a lamination process. The controlled environment has a relative humidity of less than 10% and a temperature ranging from about 10 Degrees Celsius to about 40 Degrees Celsius. The method subjects the plurality of substrates to a liquid comprising water at a temperature from about 10 Degrees Celsius to about 80 Degrees Celsius to process the plurality of substrates after formation of the absorber layer.Type: GrantFiled: September 29, 2009Date of Patent: May 24, 2011Assignee: Stion CorporationInventor: Robert D. Wieting
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Publication number: 20110114166Abstract: A photoelectric conversion device capable of increasing an adhesive force between substrates is provided. The photoelectric conversion device includes a first and second substrates facing each other, a photoelectrode including a first transparent conductive layer and formed on a surface of the first substrate facing the second substrate, a counter electrode including a second transparent conductive layer and formed on a surface of the second substrate facing the first substrate, a semiconductor layer formed on the photoelectrode and including a photosensitive dye that generates electrons when excited by light, an electrolyte disposed between the semiconductor layer and the counter electrode, and a sealing member disposed between the first and second transparent conductive layers. At least one of the first and second transparent conductive layers has a first stepped portion in which the sealing member is disposed. The sealing member seals a space between the first and second transparent conductive layers.Type: ApplicationFiled: April 5, 2010Publication date: May 19, 2011Applicant: Samsung SDI Co., Ltd.Inventors: Yi-Hyun Chang, Seung-Hwan Lee, Jae-Seok Lim
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Publication number: 20110114169Abstract: Dye sensitized solar cells having conductive metal oxide layers with nano-whiskers and methods of making the dye sensitized solar cells having conductive metal oxide layers with nano-whiskers are described. The method for making a dye sensitized solar cell comprises providing a conductive metal oxide layer comprising nano-whiskers, applying a porous semi-conducting layer on the conductive metal oxide layer, applying a dye to at least a portion of the porous semi-conducting layer, and applying an electrolyte adjacent to at least a portion of the dye.Type: ApplicationFiled: November 10, 2010Publication date: May 19, 2011Inventors: Curtis Robert Fekety, James Robert Matthews, Zhen Song
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Publication number: 20110108118Abstract: A thin-film solar cell in which a transparent electrode having fine surface irregularities with small surface roughness and substantially uniform in-plane resistance is realized can be obtained by forming a plurality of first transparent conductive films separated from one another in a substrate surface on a transparent insulative substrate, forming a second transparent conductive film on the first transparent conductive films, etching the second transparent conductive film in a granular shape and forming first granular members dispersed on the first transparent conductive films, forming a power generation layer on the first transparent conductive films and on the dispersed first granular members, forming a rear-side electrode layer on the power generation layer.Type: ApplicationFiled: May 22, 2009Publication date: May 12, 2011Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Hiroya Yamarin, Hidetada Tokioka, Mikio Yamamuka
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Publication number: 20110097841Abstract: A photovoltaic device including a rear electrode which may also function as a rear reflector. In certain example embodiments of this invention, the rear electrode includes a metallic based reflective film that is oxidation graded, so as to be more oxided closer to a rear substrate (e.g., glass substrate) supporting the electrode than at a location further from the rear substrate. In other words, the rear electrode is oxidation graded so as to be less oxided closer to a semiconductor absorber of the photovoltaic device than at a location further from the semiconductor absorber in certain example embodiments. In certain example embodiments, the interior surface of the rear substrate may optionally be textured so that the rear electrode deposited thereon is also textured so as to provide desirable electrical and reflective characteristics. In certain example embodiments, the rear electrode may be of or include Mo and/or MoOx, and may be sputter-deposited using a combination of MoOx and Mo sputtering targets.Type: ApplicationFiled: December 20, 2010Publication date: April 28, 2011Applicant: Guardian Industries Corp.Inventors: Alexey Krasnov, Willem den Boer, Scott V. Thomsen, Leonard L. Boyer, JR.