Insulated Gate Field-effect Transistor (epo) Patents (Class 257/E51.006)
  • Publication number: 20110315967
    Abstract: The present invention provides a semiconductor device, especially an organic field effect transistor, comprising a layer comprising a polymer comprising repeating units having a diketopyrrolopyrrole skeleton (DPP polymer) and an acceptor compound having an electron affinity in vacuum of 4.6 eV, or more. The doping of the DPP polymer with the acceptor compound leads to an organic field effect transistor with improved hole mobility, current on/off ratio and controllable threshold shift.
    Type: Application
    Filed: June 22, 2011
    Publication date: December 29, 2011
    Applicant: BASF SE
    Inventors: Beat Schmidhalter, Natalia Chebotareva, Pascal Hayoz
  • Publication number: 20110309366
    Abstract: The present invention is a method for manufacturing an organic thin-film transistor substrate including an organic thin-film transistor as a transistor element, and an object of the invention is to provide a manufacturing method capable of forming a bank in a smaller number of steps.
    Type: Application
    Filed: August 30, 2011
    Publication date: December 22, 2011
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Kenji KASAHARA
  • Patent number: 8076681
    Abstract: A high-efficiency, white organic electroluminescent device has such a structure that its emission layer is obtained by laminating sub-emission layers of red, green, and blue, respectively. The green sub-emission layer contacting a hole transport layer has a delayed fluorescent material, and the red sub-emission layer has a phosphorescent light emitting material.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: December 13, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshifumi Mori, Koichi Suzuki, Akira Tsuboyama, Satoru Shiobara, Kenichi Ikari
  • Patent number: 8071976
    Abstract: The invention relates to an organic field-effect transistor, in particular an organic thin film field-effect transistor comprising a gate electrode, a drain electrode and a source electrode, a dielectric layer which is formed in contact with the gate electrode, an active layer made from an organic material which is in contact with the drain electrode and the source electrode and which is configured electrically undoped, a dopant material layer which contains a dopant material that is an electrical dopant for the organic material of the active layer, and a border surface region in which a planar contact is formed between the active layer and the dopant material layer, wherein mobility of similar electrical charge carriers, namely electrons or holes, in the dopant material layer is no more than half as great as in the active layer.
    Type: Grant
    Filed: August 3, 2009
    Date of Patent: December 6, 2011
    Assignee: Novaled AG
    Inventors: Qiang Huang, Tobias Canzler, Ulrich Denker, Ansgar Werner, Karl Leo, Kentaro Harada
  • Publication number: 20110291078
    Abstract: An organic thin film transistor (OTFT) using paper as a substrate and silk protein as an insulating material and methods for manufacturing the same are disclosed. The OTFT of the present invention comprises: a paper substrate; a gate disposed on the paper substrate; a gate insulating layer containing silk protein, which is disposed on the paper substrate and covers the gate; an organic semiconductor layer; and a source and a drain, wherein the organic semiconductor layer, the source and the drain are disposed over the gate insulating layer.
    Type: Application
    Filed: July 23, 2010
    Publication date: December 1, 2011
    Inventors: Jenn-Chang HWANG, Chung Hwa Wang, Chao Ying Hsieh
  • Publication number: 20110291076
    Abstract: An article includes a flexible or rigid substrate and dry layer comprising an aromatic, non-polymeric amic acid salt that can be thermally converted to a corresponding arylene diimide. Upon conversion of the aromatic, non-polymeric amic acid salt, the dry layer has semiconductive properties and can be used in various devices including thin-film transistor devices.
    Type: Application
    Filed: May 27, 2010
    Publication date: December 1, 2011
    Inventors: Deepak Shukla, Dianne M. Meyer, Wendy G. Ahearn
  • Publication number: 20110291077
    Abstract: Methods and apparatus provide for a transistor, including: a semiconductor layer including molecules, protons, and/or ions, etc. diffused therein from a photoactive material; a channel disposed on or in the semiconductor layer; a source disposed on or in the semiconductor layer; a drain disposed on or in the semiconductor layer; and a gate electrically coupled to the semiconductor layer.
    Type: Application
    Filed: May 28, 2010
    Publication date: December 1, 2011
    Inventors: Hon Hang Fong, Mingqian He
  • Patent number: 8067264
    Abstract: An electronic device containing a polythiophene wherein R represents a side chain, m represents the number of R substituents; A is a divalent linkage; x, y and z represent, respectively, the number of Rm substituted thienylenes, unsubstituted thienylenes, and divalent linkages A, respectively, in the monomer segment subject to z being 0 or 1, and n represents the number of repeating monomer segments in the polymer or the degree of polymerization.
    Type: Grant
    Filed: July 25, 2007
    Date of Patent: November 29, 2011
    Assignee: Xerox Corporation
    Inventors: Beng S. Ong, Ping Liu, Lu Jiang, Yu Qi, Yiliang Wu
  • Patent number: 8062774
    Abstract: There is provided an organic electroluminescence display includes a lower electrode formed on a substrate, a device separation film formed on the lower electrode, an organic compound layer formed on the device separation film and including a light emission layer, and an upper electrode formed on the organic compound layer, wherein the device separation film is a polyimide film having an imidation ratio in a range of 65% or more to less than 90%. The display is expected to have longer operating life.
    Type: Grant
    Filed: March 23, 2010
    Date of Patent: November 22, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventor: Katsumi Nakagawa
  • Patent number: 8058113
    Abstract: A method of depositing elongated nanostructures that allows accurate positioning and orientation is described. The method involves printing or otherwise depositing elongated nanostructures in a carrier solution. The deposited droplets are also elongated, usually by patterning the surface upon which the droplets are deposited. As the droplet evaporates, the fluid flow within the droplets is controlled such that the nanostructures are deposited either at the edge of the elongated droplet or the center of the elongated droplet. The described deposition technique has particular application in forming the active region of a transistor.
    Type: Grant
    Filed: October 8, 2010
    Date of Patent: November 15, 2011
    Assignee: Palo Alto Research Center Incorporated
    Inventors: Michael L. Chabinyc, William S. Wong
  • Patent number: 8053761
    Abstract: Disclosed are methods of fabricating organic thin film transistors composed of a substrate, a gate electrode, a gate insulating film, metal oxide source/drain electrodes, and an organic semiconductor layer. The methods include applying a sufficient quantity of a self-assembled monolayer compound containing a live ion to the surfaces of the metal oxide electrodes to form a self-assembled monolayer. The presence of the live ion at the interface between the metal oxide electrodes and the organic semiconductor layer modifies the relative work function of these materials. Further, the presence of the self-assembled monolayer on the gate insulating film tends to reduce hysteresis. Accordingly, organic thin film transistors fabricated in accord with the example embodiments tend to exhibit improved charge mobility, improved gate insulating film properties and decreased hysteresis associated with the organic insulator.
    Type: Grant
    Filed: November 28, 2006
    Date of Patent: November 8, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung Seok Hahn, Bon Won Koo, Joo Young Kim, Kook Min Han, Sang Yoon Lee
  • Patent number: 8053763
    Abstract: An organic semiconductor light emitting device wherein efficiency of injecting a carrier from an organic semiconductor active layer to an organic semiconductor light emitting part is improved. The organic semiconductor light emitting device includes the organic semiconductor active layer having a source area and a drain area set at an interval of a channel length, a source electrode joined to the source area, the organic semiconductor light emitting part joined to the drain area, a drain electrode joined to the organic semiconductor light emitting part, and a gate electrode arranged to face the organic semiconductor active layer with an insulating film interposed. The organic semiconductor light emitting part includes an organic semiconductor light emitting layer which receives electrons and holes from the drain electrode and holes from the drain electrode and the organic semiconductor active layer and generates light by recombination of the electrons and the holes.
    Type: Grant
    Filed: August 26, 2005
    Date of Patent: November 8, 2011
    Assignee: Rohm Co., Ltd.
    Inventor: Naotoshi Suganuma
  • Publication number: 20110266523
    Abstract: An amic acid or amic ester precursor can be applied to a substrate to form a thin film, and is then thermally converted into a semiconducting layer of the corresponding arylene diimide. This semiconducting thin film can be used in various articles including thin-film transistor devices that can be incorporated into a variety of electronic devices. In this manner, the arylene diimide need not be coated onto the substrate but is generated in situ from a solvent-soluble, easily coated precursor compound.
    Type: Application
    Filed: April 30, 2010
    Publication date: November 3, 2011
    Inventors: Deepak Shukla, Dianne M. Meyer, Wendy G. Ahearn
  • Publication number: 20110269265
    Abstract: An amic acid or amic ester precursor can be applied to a substrate and thermally converted into a semiconducting layer of the corresponding arylene diimide. This semiconducting thin film can be used in various articles including thin-film transistor devices that can be incorporated into a variety of electronic devices. In this manner, the arylene diimide need not be coated but is generated in situ from a solvent-soluble, easily coated precursor compound.
    Type: Application
    Filed: April 30, 2010
    Publication date: November 3, 2011
    Inventors: Deepak Shukla, Dianne M. Meyer, Wendy G. Ahearn
  • Patent number: 8049216
    Abstract: A thin film transistor for a thin film transistor liquid crystal display (TFT-LCD), an array substrate and manufacturing method thereof are provided. The thin film transistor comprises a source, a drain, and a channel region between the source and drain. A source extension region is connected with the source, a drain extension region is connected with the drain, and the source extension region is disposed opposite to the drain extension region to form a channel extension region therebetween.
    Type: Grant
    Filed: April 17, 2008
    Date of Patent: November 1, 2011
    Assignee: Beijing Boe Optoelectronics Technology Co., Ltd.
    Inventors: Xinxin Li, Wei Wang, Chunping Long
  • Publication number: 20110260249
    Abstract: An organic transistor includes an insulating substrate, a gate electrode on the substrate, a gate insulating layer disposed over the substrate and the gate electrode, a source and a drain electrode on the gate insulating layer, a nonpolar macromolecular insulating underlayer disposed on the gate insulating layer at least between the source electrode and the drain electrode, and an organic semiconductor layer disposed on the source electrode and the drain electrode and on the insulating underlayer between the source electrode and the drain electrode.
    Type: Application
    Filed: April 20, 2011
    Publication date: October 27, 2011
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Kiyoshi NAKAMURA
  • Publication number: 20110253984
    Abstract: An electronic grade silk solution, an organic thin film transistor (OTFT) and a metal-insulator-metal capacitor with silk protein as the insulating material manufactured by use of the silk solution, and methods for manufacturing the same are disclosed. The OTFT of the present invention comprises: a substrate; a gate disposed on the substrate; a gate insulating layer containing silk protein, which is disposed on the substrate and covers the gate; an organic semiconductor layer; and a source and a drain, wherein the organic semiconductor layer, the source and the drain are disposed over the gate insulating layer.
    Type: Application
    Filed: July 22, 2010
    Publication date: October 20, 2011
    Inventors: Jenn-Chang HWANG, Chung Hwa Wang, Chao Ying Hsieh
  • Publication number: 20110248243
    Abstract: Methods and devices for manufacturing carbon nanotube based field effect transistors are disclosed including providing a substrate; printing a gate electrode layer onto the substrate and sintering and/or UV curing; printing a gate isolation layer onto the gate electrode and air drying and/or UV curing; printing one or more carbon nanotube channel layers onto the gate isolation layer, wherein each carbon nanotube channel layer is air dried prior to subsequent printings; and printing a source and drain electrode layer onto the one or more carbon nanotube channel layers and sintering and/or UV curing. Other embodiments are described and claimed.
    Type: Application
    Filed: November 30, 2009
    Publication date: October 13, 2011
    Applicant: Omega Optics, Inc.
    Inventors: Yihong Chen, Ray T. Chen
  • Publication number: 20110248248
    Abstract: An organic semiconductor device includes a gate electrode above a substrate. A gate insulation film is over the gate electrode. A first electrode is above the gate insulation film. A second electrode is above the gate insulation film. The second electrode is annular and surrounds the first electrode. An organic semiconductor layer is above the gate insulation film and over the first electrode. The second electrode surrounds the organic semiconductor layer and defines an outer periphery of the organic semiconductor layer. A conductive guiding member is above the gate insulation film. The conductive guiding member is annular and surrounds the second electrode. A protective film is above the gate insulation film and over the organic semiconductor layer and the second electrode. The conductive guiding member surrounds the protective film and defines an outer periphery of the protective film.
    Type: Application
    Filed: April 14, 2011
    Publication date: October 13, 2011
    Applicant: PANASONIC CORPORATION
    Inventor: Takaaki UKEDA
  • Publication number: 20110240980
    Abstract: In accordance with various embodiments, an organic electronic device includes an n-type dopant material including an imidazole-based material having a hydrogen-based material bonded between nitrogen atoms. The n-type dopant material n-dopes an organic material, and can be used to mitigate degradation in mobility due to conditions such as exposure to ambient atmosphere, which can effect an undesirable reduction in charge transport. Other embodiments are directed to carbon nanotubes or graphene structures with this type of n-type dopant, wherein the Fermi level for the carbon nanotubes or graphene structures is below ?2.5 eV to effect such n-type doping.
    Type: Application
    Filed: April 5, 2011
    Publication date: October 6, 2011
    Inventors: Peng Wei, Zhenan Bao
  • Patent number: 8030648
    Abstract: Disclosed is a stable organic thin film transistor having good switching property and a process for manufacturing an organic thin film transistor by a simple method. The organic thin film transistor comprises a substrate and provided thereon, at least a source electrode, a drain electrode, an organic semiconductor connecting the source electrode and the drain electrode, a gate electrode, and an insulating layer composed of a plurality of layers, the insulating layer being provided between the gate electrode and the organic semiconductor, wherein the organic thin film transistor comprises a mercapto group-containing compound represented by the following formula (I), (R)n—Si(A)3-n-(B)??Formula (I) wherein R represents an alkyl group having a carbon atom number of not more than 8; A represents an alkoxy group or a halogen atom; B represents a substituent containing an SH group; and n is an integer of from 0 to 2.
    Type: Grant
    Filed: January 30, 2008
    Date of Patent: October 4, 2011
    Assignee: Konica Minolta Holdings, Inc.
    Inventor: Takeshi Hakii
  • Publication number: 20110227075
    Abstract: There is provided a backplane for an organic electronic device. The backplane has a TFT substrate having a multiplicity of electrode structures thereon. There are spaces around the electrode structures and a layer of organic filler in the spaces. The thickness of the layer of organic filler is the same as the thickness of the electrode structures.
    Type: Application
    Filed: December 4, 2009
    Publication date: September 22, 2011
    Applicant: DUPONT DISPLAYS, INC.
    Inventors: Matthew Stainer, Yaw-Ming A. Tsai
  • Patent number: 8022442
    Abstract: A semiconductor device has: a silicon substrate; trench formed downward from the surface of the silicon substrate, the trench defining active regions on the surface of the silicon substrate; a first liner layer of a silicon nitride film covering an inner wall of the trench; a second liner layer of a silicon nitride layer formed on the first liner layer; an element isolation region of an insulator formed on the second liner layer; a p-channel MOS transistor formed in and on one of the active regions; a contact etch stopper layer of a silicon nitride layer not having a ultraviolet shielding ability, formed above the silicon substrate, and covering the p-channel MOS transistor; and a light shielding film of a silicon nitride layer having the ultraviolet shielding ability and formed above the contact etch stopper layer.
    Type: Grant
    Filed: October 26, 2004
    Date of Patent: September 20, 2011
    Assignee: Fujitsu Semiconductor Limited
    Inventor: Yoshiyuki Ookura
  • Publication number: 20110220884
    Abstract: A compound for an organic thin film transistor having a structure represented by the following formula (1): wherein R1 and R2, and R3 and R4 are respectively combined with each other to form an aromatic hydrocarbon ring having 6 to 60 carbon atoms or an aromatic heterocyclic ring having 3 to 60 carbon atoms; the ring being fused to the ring to which the groups are bonded, whereby the structure of the formula (1) has 5 or more aromatic rings that are fused; and the fused rings formed by R1 and R2, and R3 and R4 each may have a substituent.
    Type: Application
    Filed: August 20, 2009
    Publication date: September 15, 2011
    Inventors: Masatoshi Saito, Yuki Nakano, Hiroaki Nakamura, Hirofumi Kondo
  • Publication number: 20110220883
    Abstract: A compound for an organic thin film transistor having a structure of the following formula (1): wherein R1 to R6 are independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 30 carbon atoms, a haloalkyl group having 1 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a haloalkoxy group having 1 to 30 carbon atoms, an alkylthio group having 1 to 30 carbon atoms, a haloalkylthio group having 1 to 30 carbon atoms, an alkylamino group having 1 to 30 carbon atoms, a dialkylamino group having 2 to 60 carbon atoms (the alkyl groups may be combined with each other to form a ring structure containing the nitrogen atom), an alkylsulfonyl group having 1 to 30 carbon atoms, a haloalkylsulfonyl group having 1 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 60 carbon atoms, an aromatic heterocyclic group having 3 to 60 carbon atoms, an alkylsilyl group having 3 to 20 carbon atoms, an alkylsilylacetylene group having 5 to 60 carbon atoms or a cyano group, which each may have
    Type: Application
    Filed: August 5, 2009
    Publication date: September 15, 2011
    Applicant: IDEMITSU KOSAN CO., LTD.
    Inventors: Yuki Nakano, Masatoshi Saito, Hiroaki Nakamura
  • Publication number: 20110215315
    Abstract: A switching element comprises a source electrode, a drain electrode arranged apart from the source electrode, an active layer in contact with the electrodes, and a gate electrode arranged apart from the source and drain electrodes and being in contact with the active layer with a gate insulating layer interposed therebetween. The active layer is formed of a dispersion film containing predetermined carbon nanotubes and a predetermined polyether compound.
    Type: Application
    Filed: November 9, 2009
    Publication date: September 8, 2011
    Applicant: NEC CORPORATION
    Inventors: Satoru Toguchi, Hiroyuki Endoh
  • Publication number: 20110215314
    Abstract: The present invention relates to a dual gate field-effect transistor (1) comprising a first and a second dielectric layer (6,7), a first and a second gate electrode (9,11) and an assembly (2) of at least one source electrode (3), at least one drain electrode (4) and at least one organic semiconductor (5), wherein—the source electrode (3) and the drain electrode (4) are in contact with the semiconductor (5), the assembly (2) is located between the first dielectric layer (6) and the second dielectric layer (7), the first dielectric layer (6) is located between the first gate electrode (9) and a first side (8) of the assembly (2), and the second dielectric layer (7) is located between the second gate electrode (11) and a second side (10) of the assembly (2), wherein the organic semi-conductor (5) is an organic ambipolar conduction semiconductor (12) which enables at least one electron injection area (18) at the first side (8) and at least one hole injection area (18) at the second side (19) of the assembly (2).
    Type: Application
    Filed: October 26, 2009
    Publication date: September 8, 2011
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Dagobert Michel De Leeuw, Paulus Albertus Van Hal, Gert 'T Hooft
  • Patent number: 8012791
    Abstract: The invention relates to a method for producing electronic components comprising adjacent electrodes interspaced at distances ranging between 10 nanometers and several micrometers on a substrate of any type. According to the invention, the electrodes are structured by means of overlapping edges on the deposited layer or by undercutting the deposited layers. The electronic components are then produced either in the conventional manner or using a lithographic process from the underside of the transparent substrate and finally by means of a succession of known method steps for the production of electronic components.
    Type: Grant
    Filed: September 1, 2004
    Date of Patent: September 6, 2011
    Assignee: Cantrele Telecom Co., L.L.C.
    Inventors: Theodor Doll, Susanne Scheinert, Axel Scherer, Gernot Paasch
  • Publication number: 20110210319
    Abstract: A compound for an organic thin film transistor represented by the following formula (1): wherein at least one pair of adjacent two groups of R1, R3, R5 and R7 is bonded to each other to form a substituted or unsubstituted aromatic hydrocarbon ring having 6 to 60 carbon atoms or a substituted or unsubstituted aromatic heterocyclic ring having 3 to 60 carbon atoms, the ring being fused to the ring to which the groups are bonded; and at least one pair of adjacent two groups of R2, R4, R6 and R8 is bonded to each other to form a substituted or unsubstituted aromatic hydrocarbon ring having 6 to 60 carbon atoms or a substituted or unsubstituted aromatic heterocyclic ring having 3 to 60 carbon atoms, the ring being fused to the ring to which the groups are bonded.
    Type: Application
    Filed: August 28, 2009
    Publication date: September 1, 2011
    Applicant: COMPOUND FOR ORGANIC THIN FLIM TRANSISTOR AND ORGANIC THAN FLIM TRANSITOR USING THE SAME
    Inventors: Yuki Nakano, Masatoshi Saito, Hiroaki Nakamura, Hirofumi Kondo
  • Patent number: 8008656
    Abstract: An organic light-emitting transistor having a source electrode layer; a drain electrode layer facing the source electrode layer; an organic light-emitting layer formed between the source electrode layer and the drain electrode layer; a semiconductor layer formed between the organic light-emitting layer and the source electrode layer; and a gate electrode layer deposited to face through a gate insulation film to one face of the source electrode layer opposite to the other face facing the drain electrode layer. The organic light-emitting transistor further comprises: a charge-carrier suppression layer formed between the organic light-emitting layer and the source electrode layer to have an aperture; and a relay region formed between the charge-carrier suppression layer and the source electrode layer to relay charge-carriers from the source electrode layer to the aperture.
    Type: Grant
    Filed: August 28, 2007
    Date of Patent: August 30, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Kenji Nakamura, Takuya Hata, Atsushi Yoshizawa, Katsunari Obata, Hiroyuki Endoh
  • Publication number: 20110204334
    Abstract: Provided are an organic thin film transistor and a method of forming the same. The method comprises forming a gate electrode on a substrate, forming a gate dielectric, which covers the gate electrode and includes a recess region at an upper portion, on the substrate, forming a source electrode and a drain electrode in the recess region, and forming an organic semiconductor layer between the source electrode and the drain electrode in the recess region.
    Type: Application
    Filed: August 18, 2010
    Publication date: August 25, 2011
    Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Kang Dae KIM, In-Kyu You, Jae Bon Koo, Yong Suk Yang, Seung Youl Kang
  • Patent number: 8003980
    Abstract: The present invention is drawn to a layered organic device, and a method of forming the same. The method includes steps of applying a first solvent-containing organic layer to a substrate and removing solvent from the first solvent-containing organic layer to form a first solidified organic layer. Additional steps include applying a second solvent-containing organic layer to the first solidified organic layer and removing solvent from the second solvent-containing organic layer to form a second solidified organic layer. The first solidified organic layer can be crosslinked, which suppresses negative impact to components in the first solidified organic layer when the solvent of the second solvent-containing organic layer is deposited on the first solidified organic layer.
    Type: Grant
    Filed: January 30, 2007
    Date of Patent: August 23, 2011
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Xia Sheng, Zhang-Lin Zhou, Krzysztof Nauka, Chung Ching Yang
  • Patent number: 7998787
    Abstract: Provided is a thin film transistor including a gate electrode on a substrate; a gate insulating layer on the gate electrode; source and drain electrodes including first source and drain layers on the gate insulating layer, respectively, and spaced apart from each other, wherein at lease one of the first source and drain layers includes indium-tin-oxide doped with at least one Group III element; and an organic semiconductor layer on the gate insulating layer and contacting the first source and drain layers.
    Type: Grant
    Filed: April 5, 2006
    Date of Patent: August 16, 2011
    Assignee: LG Display Co., Ltd.
    Inventors: Hyun-Sik Seo, Nack-Bong Choi
  • Patent number: 7994494
    Abstract: An organic thin film transistor array panel includes; a substrate, a data line formed on the substrate, a gate line intersecting the data line and including a gate electrode, a first interlayer insulating layer formed on the gate line and the data line and including a first opening exposing the gate electrode, a gate insulator formed in the first opening, a source electrode disposed on the gate insulator and connected to the data line, a pixel electrode disposed on the gate insulator and including a drain electrode opposing the source electrode, a insulating bank formed on the source electrode and the drain electrode, the insulating bank defining a second opening which exposes portions of the source electrode and the drain electrode, and an organic semiconductor formed in the second opening.
    Type: Grant
    Filed: August 18, 2006
    Date of Patent: August 9, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Bo-Sung Kim, Mun-Pyo Hong, Yong-Uk Lee, Joon-Hak Oh, Keun-Kyu Song, Seung-Hwan Cho
  • Publication number: 20110186830
    Abstract: The present invention provides a method of manufacturing an organic thin film transistor (TFT), comprising: providing a substrate layer; providing a gate electrode layer; providing a dielectric material layer; providing an organic semiconductor (OSC) material layer; providing a source and drain electrode layer; and wherein one or more of the layers is deposited using a laser induced thermal imaging (LITI) process. Preferably the organic TFT is a bottom gate device and the source and drain electrodes are deposited on an organic semiconductor layer, or over a dielectric material layer using LITI. Further preferably a dopant material may be provided between the OSC material and the source and drain electrode layer, wherein the dopant material may also be deposited using LITI. Also preferably, wherein the dopant may be a charge neutral dopant such as substituted TCNQ or F4TCNQ.
    Type: Application
    Filed: August 5, 2009
    Publication date: August 4, 2011
    Applicant: CAMBRIDGE DISPLAY TECHNOLOGY LIMITED
    Inventors: Jeremy Burroughes, Julian Carter, Euan Smith, Jonathan Halls, Thomas Kugler, Christopher Newsome
  • Patent number: 7989242
    Abstract: An array substrate for a liquid crystal display device includes: a gate line and a gate electrode on a substrate, the gate electrode connected to the gate line; a gate insulating layer on the gate line and the gate electrode, the gate insulating layer including an organic insulating material such that a radical of carbon chain has a composition ratio of about 8% to about 11% by weight; a semiconductor layer on the gate insulating layer over the gate electrode; a data line crossing the gate line to define a pixel region; source and drain electrodes on the semiconductor layer, the source electrode connected to the data line and the drain electrode spaced apart from the source electrode; a passivation layer on the data line, the source electrode and the drain electrode, the passivation layer having a drain contact hole exposing the drain electrode; and a pixel electrode on the passivation layer, the pixel electrode connected to the drain electrode through the drain contact hole.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: August 2, 2011
    Assignee: LG Display Co., Ltd.
    Inventors: Byung-Geol Kim, Gee-Sung Chae, Jae-Seok Heo, Woong-Gi Jun
  • Patent number: 7989272
    Abstract: A conventional composition of carbon nitride has a deposition method and properties limited. In the case of using the composition of carbon nitride as a protective film, for example, a material of an object to be coated (goods) is required to satisfy with a condition in disagreement with a temperature during forming the composition of carbon nitride. Besides, in the case of using the composition of carbon nitride as an insulating film in a semiconductor device, low stress relaxation and low coverage for a step are produced since the insulating film has a low hydrogen concentration. Consequently, a composition including carbon nitride according to the present invention is formed at a deposition temperature that enables to include hydrogen in the composition at 30 to 45 atomic %, for example, at temperatures of 100° C. or less, preferably 50° C. or less, more preferably from 20° C. to 30° C., with stability and adhesiveness kept.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: August 2, 2011
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Shinji Maekawa
  • Patent number: 7985967
    Abstract: There have been problems in that a dedicated apparatus is needed for a conventional method of manufacturing an organic thin film transistor and in that: a little amount of an organic semiconductor film is formed with respect to a usage amount of a material; and most of the used material is discarded. Further, apparatus maintenance such as cleaning of the inside of an apparatus cup or chamber has needed to be frequently carried out in order to remove the contamination resulting from the material that is wastefully discarded. Therefore, a great cost for materials and man-hours for maintenance of apparatus have been required. In the present invention, a uniform organic semiconductor film is formed by forming an aperture between a first substrate for forming the organic semiconductor film and a second substrate used for injection with an insulating film formed at a specific spot and by injecting an organic semiconductor film material into the aperture due to capillarity to the aperture.
    Type: Grant
    Filed: October 26, 2009
    Date of Patent: July 26, 2011
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Yoshiharu Hirakata, Tetsuji Ishitani, Shuji Fukai, Ryota Imahayashi
  • Patent number: 7981719
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, a substituted or unsubstituted arylalkyl moiety. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: July 19, 2011
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Shelby F. Nelson, Diane C. Freeman
  • Publication number: 20110168983
    Abstract: Disclosed are a semiconductor device and a manufacturing method thereof. The semiconductor device can include a recess formed in an active area of a semiconductor substrate, an insulating layer formed in the recess, a source electrode and a drain electrode spaced apart from the source electrode on the insulating layer, a carbon nanotube layer formed between the source and drain electrodes, an oxide layer pattern covering at least the carbon nanotube layer, and a gate electrode formed on the oxide layer pattern.
    Type: Application
    Filed: October 14, 2008
    Publication date: July 14, 2011
    Inventor: Kyu Hyun Mo
  • Publication number: 20110156010
    Abstract: A semiconductor device includes a gate formed over a substrate, organic semiconductor pattern interposed between the substrate and the gate, junction regions formed in the substrate on both sides of the gate, and junction patterns formed over the junction regions to contact the organic semiconductor patterns.
    Type: Application
    Filed: June 29, 2010
    Publication date: June 30, 2011
    Inventor: Ki-Beom Choe
  • Patent number: 7968871
    Abstract: Organic thin film transistors with improved mobility are disclosed. The semiconducting layer comprises a semiconductor material of Formula (I): wherein R1 and R2 are independently selected from alkyl, substituted alkyl, aryl, and substituted aryl; and R3 and R4 are independently selected from hydrogen, alkyl, substituted alkyl, aryl, and substituted aryl. A silanized interfacial layer is also present which has alkyl sidechains extending from its surface towards the semiconducting layer.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: June 28, 2011
    Assignee: Xerox Corporation
    Inventors: Yiliang Wu, Hualong Pan, Ping Liu, Yuning Li
  • Publication number: 20110151630
    Abstract: The thin film transistor manufacturing apparatus comprises a surface modification layer forming means, which forms a surface modification layer on a substrate, an illuminating part, which irradiates light that includes ultraviolet rays, a mask, on which the patterns of the source electrode and the drain electrode are drawn, a projection optical system, which illuminates a mask using light from the illuminating part and projects the pattern of the mask to the substrate as a pattern image, and a coating part, which coats a fluid electrode material to a region in which the surface modification layer has been modified by projection of the pattern image in order to form the source electrode and the drain electrode.
    Type: Application
    Filed: December 27, 2010
    Publication date: June 23, 2011
    Inventors: Kei NARA, Tomohide Hamada
  • Publication number: 20110147724
    Abstract: There is provided an organic thin film transistor and a method of manufacturing the same. The organic thin film transistor includes: an insulating substrate on which a plurality of barrier ribs and a plurality of grooves partitioned by the barrier ribs are formed; source and drain electrodes each formed on the grooves spaced apart from each other among the plurality of grooves; a gate electrode formed on the groove between the source and drain electrodes; an opening formed by etching the barrier ribs between the source electrode and the gate electrode and between the gate electrode and the drain electrode; a gate insulating film formed on the opening; and an organic semiconductor layer formed on the gate insulating film. The organic thin film transistor is capable of mass production and has excellent electrical characteristics.
    Type: Application
    Filed: December 21, 2010
    Publication date: June 23, 2011
    Applicants: SAMSUNG ELECTRO-MECHANICS CO., LTD., SUNGKYUNKWAN UNIVERSITY Foundation for Corporate Collaboration
    Inventors: Sang Won HA, Il Sub Chung, Jin Hee Heo, Kyo Hyeok Kim, Jung Min Kwon, Kyu Hag Eum, Sang Il Yim, Chang Sup Ryu
  • Publication number: 20110147726
    Abstract: An object of the present invention is to provide an organic thin film transistor a gate insulating film of which can be formed at a low temperature. The organic thin film transistor of the present invention includes a source electrode, a drain electrode, an organic semiconductor layer which becomes a current path between the source electrode and the drain electrode, a gate electrode which controls an electric current passing through the current path, and an insulating layer which insulates the organic semiconductor layer from the gate electrode, wherein the insulating layer is formed of a cured substance of a composition containing a first compound having, in the molecule, two or more groups that produce a functional group which reacts with an active hydrogen group by electromagnetic radiations or heat, and a second compound having two or more active hydrogen groups in the molecule, where at least one of the first compound and the second compound is a polymer compound.
    Type: Application
    Filed: June 22, 2009
    Publication date: June 23, 2011
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Isao Yahagi
  • Publication number: 20110147723
    Abstract: In certain embodiments, a field effect transistor (FET) can include a substrate, a source electrode, a drain electrode, a ferroelectric material layer, a first gate electrode, and a second gate electrode to maintain an optimal polarization state of the ferroelectric material layer. In other embodiments, a FET can include a film, first and second gates on the film, a ferroelectric material layer covering the film and gates, an insulating layer substantially covering the ferroelectric material layer, a source and a drain on the insulating layer, and a pentacene layer.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 23, 2011
    Applicant: SRI INTERNATIONAL
    Inventors: John Hodges, JR., Marc Rippen, Carl Biver, JR.
  • Patent number: 7960716
    Abstract: An object of the present invention is to provide a field effect transistor showing high field-effect mobility and a high ON/OFF ratio, which can be produced simply by using a porphyrin compound with excellent crystallinity and orientation. The field effect transistor according to the present invention transistor contains at least an organic semiconductor layer, wherein the organic semiconductor layer contains at least a porphyrin compound and has a maximum diffraction intensity I1 in a Bragg angle (2?) range of 9.9° to 10.4° stronger than a maximum diffraction intensity I2 in a Bragg angle (2?) range of 23.0° to 26.0° in X-ray diffraction using CuK? radiation.
    Type: Grant
    Filed: March 8, 2005
    Date of Patent: June 14, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Daisuke Miura, Tomonari Nakayama, Toshinobu Ohnishi, Makoto Kubota, Akane Masumoto, Satomi Sugiyama
  • Patent number: 7960720
    Abstract: A transistor including a first gate electrode, a second gate electrode, a first gate insulating layer disposed between the first gate electrode and the second gate electrode, a first interlayer disposed between the first gate insulating layer and the second gate electrode and containing a first organic material, an organic semiconductor layer disposed between the first interlayer and the second gate electrode, a second gate insulating layer disposed between the organic semiconductor layer and the second gate electrode, and a source electrode and a drain electrode disposed between the first interlayer and the second gate insulating layer and injecting carriers into the organic semiconductor layer, wherein an ambipolar property is imparted to a part of the organic semiconductor layer that contacts with the first interlayer under an action of the first interlayer.
    Type: Grant
    Filed: January 22, 2008
    Date of Patent: June 14, 2011
    Assignees: Seiko Epson Corporation, Shinshu University, National University Corporation
    Inventors: Taketomi Kamikawa, Masamitsu Inoue
  • Patent number: 7960207
    Abstract: An organic thin film transistor (OTFT) and a method of fabricating the same are provided in which an organic layer and metal interconnections are formed to have certain linewidths and shapes such that a degradation of device characteristics is prevented. The method includes providing a substrate, forming a gate electrode on the substrate, forming a gate insulating layer on the gate electrode, forming source and drain electrodes on the gate insulating layer, and forming a semiconductor layer on the source and drain electrodes. The gate electrode is formed by an inkjet printing method and ablated by a laser.
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: June 14, 2011
    Assignee: Samsung Mobile Display Co., Ltd.
    Inventors: Taek Ahn, Min-Chul Suh
  • Patent number: 7960724
    Abstract: Provided are a composition for organic thin film transistors including a material including an anthracenyl group and a cross-linker including a maleimide group, an organic thin film transistor formed by using the composition, and a method for manufacturing the same.
    Type: Grant
    Filed: August 17, 2009
    Date of Patent: June 14, 2011
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Yong-Young Noh, Jae Bon Koo, In-Kyu You, Kang-Jun Baeg, Dong-Yu Kim