Plural Magnetic Deposition Layers Patents (Class 29/603.14)
  • Publication number: 20100037453
    Abstract: Concerns about inadequate electromigration robustness in CCP CPP GMR devices have been overcome by adding magnesium to the current confining structures that are presently in use. In one embodiment the alumina layer, in which the current carrying copper regions are embedded, is fully replaced by a magnesia layer. In other embodiments, alumina is still used but a layer of magnesium is included within the structure before it is subjected to ion assisted oxidation.
    Type: Application
    Filed: October 20, 2009
    Publication date: February 18, 2010
    Inventors: Kunliang Zhang, Daniel Gabels, Min Li, Yu-Hsia Chen
  • Patent number: 7657992
    Abstract: A method of making a perpendicular magnetic recording (PMR) head with single or double coil layers and with a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
    Type: Grant
    Filed: December 11, 2007
    Date of Patent: February 9, 2010
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Kenichi Takano
  • Publication number: 20100024201
    Abstract: A method for manufacturing a manufacturing a magnetoresistive sensor that allows the sensor to be constructed with a very narrow and well controlled track width. The method includes depositing a layer of diamond like carbon over a series of sensor layers. A first mask is then formed to define a sensor, and an ion milling is performed to remove sensor material not protected by the first mask. Then, a second mask is formed, and a hard bias layer is deposited to the thickness of the sensor layers. The second mask is then lifted off and a CMP is performed to remove the first mask structure. Because the all areas other than the area directly over the sensor are substantially planar (due to the removal of the second mask and the low level of the hard bias material) a quick, gentle CMP can be used to remove the first mask layer even if the first mask is small, such as for definition of a very narrow track-width sensor.
    Type: Application
    Filed: July 31, 2008
    Publication date: February 4, 2010
    Inventors: Quang Le, Jui-Lung Li
  • Patent number: 7650684
    Abstract: A method for fabricating a magnetic head including a spin valve sensor having a sensor layer stack that includes a pinned magnetic layer, a spacer layer formed on the pinned magnetic layer, and a free magnetic layer formed on the spacer layer. In a preferred embodiment the spacer layer is comprised of CuOx. The method includes the plasma smoothing of the upper surface of the pinned magnetic layer prior to depositing the spacer layer, and a preferred plasma gas is a mixture of argon and oxygen.
    Type: Grant
    Filed: July 16, 2004
    Date of Patent: January 26, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Wen-Yaung Lee, Tsann Lin, Danielle Mauri, Alexander Michael Zeltser
  • Patent number: 7652854
    Abstract: A tunneling magneto-resistive element includes: a tunneling magneto-resistive film including an antiferromagnetic layer, a pinned layer, a barrier layer and a free layer; and a lower magnetic shielding film disposed below the tunneling magneto-resistive film with respect to a lamination direction. The barrier layer is constituted of magnesium oxide. The lower magnetic shielding film has a multi-layer structure including a crystalline layer and an amorphous layer disposed above the crystalline layer with respect to the lamination direction. The crystalline layer contains at least one crystal grain having a grain size of 500 nm or more.
    Type: Grant
    Filed: August 8, 2006
    Date of Patent: January 26, 2010
    Assignee: TDK Corporation
    Inventors: Takeo Kagami, Naoki Ohta, Kazuki Sato, Satoshi Miura
  • Patent number: 7640650
    Abstract: A method of making a magnetoresistive sensor includes defining a track width of a magnetoresistive element stack of the sensor. Further, processes of the method enable depositing of hard magnetic bias material on each side of the stack. These processes may permit both milling of excess depositions of the material outside of regions where the hard magnetic bias material is desired via use of a photoresist and making the material have a planar surface via chemical mechanical polishing, which also removes the material on top of the stack. The method includes removing excess material outside of the photoresist, wherein the excess material includes part of the hard bias layer, while a portion of the hard bias layer remains directly above the MR sensor stack.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: January 5, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Satoru Araki, Ying Hong, Wipul Jayasekara, Ming Jiang
  • Patent number: 7637001
    Abstract: A method of manufacturing a thin-film magnetic head, the thin-film magnetic head including a recording head, includes the steps of: forming a first magnetic layer; forming a recording gap layer on the first magnetic layer; forming a second magnetic layer on the recording gap layer; and forming a thin-film coil. The recording gap layer is formed by stacking a plurality of insulating films formed by chemical vapor deposition.
    Type: Grant
    Filed: August 21, 2007
    Date of Patent: December 29, 2009
    Assignee: TDK Corporation
    Inventors: Yoshitaka Sasaki, Tohru Inoue
  • Patent number: 7639458
    Abstract: A system, method and computer program product provide an annealing process for setting a magnetization condition of a read head. An amount of heat for stabilizing magnetization condition of a read head is calculated. A width and amplitude of a voltage pulse that generates the calculated amount of heat in the read head are calculated. A voltage pulse of the calculated width and amplitude is applied to the read head for generating Joule heating in the read head. The width of the voltage pulse is less than one second.
    Type: Grant
    Filed: July 9, 2004
    Date of Patent: December 29, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Lydia Baril, Ciaran A. Fox, Jih-Shiuan Luo, Peter J. Melz, Chin-Yu Yeh
  • Patent number: 7634850
    Abstract: Embodiments of the present invention allow control over the element height of read and write heads without damage to a lapping surface table when an air-bearing surface is lapped with a row bar or magnetic head slider tilted. According to one embodiment, the air-bearing surface is lapped with the row bar tilted in the longitudinal direction of a slider to compensate element height-wise positional deviations of the read head and the write head. The lapping is performed while changing an inclination angle stepwise and swinging the row bar in the longitudinal direction of the slider centering around an inclination angle at each step. Thus, the element heights of the magnetic pole piece and the read element can be controlled without damage to a lapping surface table.
    Type: Grant
    Filed: July 20, 2007
    Date of Patent: December 22, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Koji Tanaka
  • Patent number: 7634851
    Abstract: A method of forming a magnetic tunnel junction memory element and the resulting structure are disclosed. A magnetic tunnel junction memory element comprising a thick nonmagnetic layer between two ferromagnetic layers. The thick nonmagnetic layer has an opening in which a thinner tunnel barrier layer is disposed. The resistance of a magnetic tunnel junction memory element may be controlled by adjusting the surface area and/or thickness of the tunnel barrier layer without regard to the surface area of the ferromagnetic layers.
    Type: Grant
    Filed: June 28, 2006
    Date of Patent: December 22, 2009
    Assignee: Micron Technology, Inc.
    Inventor: Mark E. Tuttle
  • Patent number: 7631418
    Abstract: A manufacturing process is provided where aggressive (i.e. tight tolerance) stitching offers several advantages for magnetic write heads but at the cost of some losses during pole trimming. This problem has been overcome by replacing the alumina filler layer, that is used to protect the stitched pole during trimming, with a layer of electroplated material. Because of the superior step coverage associated with the plating method of deposition, pole trimming can then proceed without the introduction of stresses to the stitched pole while it is being trimmed.
    Type: Grant
    Filed: July 26, 2007
    Date of Patent: December 15, 2009
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Han, Mao-Min Chen, Laurie Lauchlan, Lei Zhang
  • Patent number: 7621038
    Abstract: A method for fabricating a three terminal magnetic (TTM) sensor of a magnetic head according to one embodiment includes fabricating a P-type semiconductor material; fabricating an N-type semiconductor material at an upper surface of a portion of said P-type semiconductor material; fabricating a spin valve structure upon said N-type semiconductor material; engaging a collector lead to said P-type semiconductor material; engaging a base lead to said N-type semiconductor material; and engaging an emitter lead to said spin valve structure.
    Type: Grant
    Filed: January 17, 2008
    Date of Patent: November 24, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Jeffrey S. Lille
  • Patent number: 7617588
    Abstract: Methods for making devices comprise forming a plurality of transducers on a major surface of a wafer, including forming a plurality of solid layers each having a thickness that is less than one micron; dividing the wafer and the attached transducers into a plurality of units such that each of the units includes a portion of the layers and a substantially planar surface that is substantially perpendicular to the portion of the layers; and removing at least part of the substantially planar surface, including creating, for each transducer, at least one flexible element that is attached the transducer. Conventional problems of connecting a head to the flexure and/or gimbal are eliminated. The heads can be made thinner than is conventional and gimbals and flexures can be more closely aligned with forces arising from interaction with the media surface and from seeking various tracks, reducing torque and dynamic instabilities.
    Type: Grant
    Filed: September 26, 2005
    Date of Patent: November 17, 2009
    Inventor: Mark A. Lauer
  • Patent number: 7616410
    Abstract: There are provided a magnetic detecting element capable of maintaining large ?RA and of reducing magnetostriction by improving a material forming a free magnetic layer, and a method of manufacturing the same. An NiFeX alloy layer is formed in a free magnetic layer. For example, the element X is Cu. The NiFeX alloy layer formed in the free magnetic layer makes it possible to maintain large ?RA and to more reduce the magnetostriction of the free magnetic layer, compared with a structure in which an NiFe alloy layer is formed in the free magnetic layer.
    Type: Grant
    Filed: February 21, 2006
    Date of Patent: November 10, 2009
    Assignee: TDK Corporation
    Inventors: Masahiko Ishizone, Yosuke Ide, Masamichi Saito, Naoya Hasegawa
  • Patent number: 7610674
    Abstract: Concerns about inadequate electromigration robustness in CCP CPP GMR devices have been overcome by adding magnesium to the current confining structures that are presently in use. In one embodiment the alumina layer, in which the current carrying copper regions are embedded, is fully replaced by a magnesia layer. In other embodiments, alumina is still used but a layer of magnesium is included within the structure before it is subjected to ion assisted oxidation.
    Type: Grant
    Filed: February 13, 2006
    Date of Patent: November 3, 2009
    Assignee: Headway Technologies, Inc.
    Inventors: Kunliang Zhang, Daniel G Abels, Min Li, Yu-Hsia Chen
  • Patent number: 7612969
    Abstract: A magnetic memory device includes a pinning layer, a pinned layer, an insulation layer, which are sequentially stacked on a semiconductor substrate. The magnetic memory device further includes a free layer disposed on the insulation layer, a capping layer disposed on the free layer and an MR (magnetoresistance) enhancing layer interposed between the free layer and the capping layer. The MR enhancing layer is formed of at least one anti-ferromagnetic material.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: November 3, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Se-Chung Oh, Jang-Eun Lee, Hyun-Jo Kim, Kyung-Tae Nam, Jun-Ho Jeong
  • Patent number: 7603763
    Abstract: A method for manufacturing a magnetoresistive multilayer film. An antiferromagnetic layer, a pinned-magnetization layer, a nonmagnetic spacer layer and a free-magnetization layer are laminated on a substrate in this order. A film for the antiferromagnetic layer is deposited by a sputtering process as oxygen gas is added to a gas for sputtering. A film for an extra layer interposed between the substrate and the antiferromagnetic layer is deposited by a sputtering process as oxygen gas is added to a gas for sputtering. A film for the antiferromagnetic layer is deposited by a sputtering process with a gas mixture of argon and another gas of larger atomic number than argon.
    Type: Grant
    Filed: October 18, 2004
    Date of Patent: October 20, 2009
    Assignee: Canon Anelva Corporation
    Inventors: David Djulianto Djayaprawira, Koji Tsunekawa, Motonobu Nagai
  • Patent number: 7596853
    Abstract: The method of manufacturing a thin film magnetic head includes forming a first recessed portion for insulation and a second recessed portion for contact that reach the substrate through the first insulating layer from a side of the first insulating layer of the substrate having the first insulating layer thereon; forming a second insulating layer on the substrate in the first recessed portion; and forming the lower shield layer in the first recessed portion and a contact portion in the second recessed portion.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: October 6, 2009
    Assignee: TDK Corporation
    Inventors: Kenji Ichinohe, Yosuke Goto
  • Patent number: 7587811
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording having a write pole with a very narrow track width and well controlled critical dimensions. The write pole is formed by depositing an electrically conductive seed layer over a substrate, and then depositing a photo resist layer over the seed layer. The photo resist layer is photolithographically exposed and developed to form an opening or trench in the photoreist layer, the opening defining the pattern of the write pole. A magnetic material is then plated into the opening in the photoresist layer. The photo resist layer can then be removed by a chemical lift off, and portions of the seed layer that are not covered by the write pole can be removed by ion milling.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: September 15, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hamid Balamane, Christian Rene Bonhote, Yimin Hsu, Aaron Neuhaus, Aron Pentek, Yi Zheng
  • Patent number: 7578049
    Abstract: A method for manufacturing a write pole for a perpendicular magnetic write head. The method includes forming a mask structure over a full film layer of magnetic write pole material. A layer of hard mask material such as conformally deposited alumina is then deposited full film over the mask and write pole material. An ion mill, such as in an Ar or CHF3 chemistry is then used to preferentially remove horizontally disposed portions of the alumina layer (hard mask layer), thereby forming vertical hard mask walls at the sides of the mask structure. An ion mill is then used to form the write pole, with the alumna side walls providing excellent masking for forming well defined write pole edges. A relatively gentle clean up process can then be performed to remove the remaining mask material and side walls.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: August 25, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yimin Hsu, Vladimir Nikitin, Aron Pentek
  • Patent number: 7574791
    Abstract: A method for fabricating magnetic side shields for an MR sensor of a magnetic head. Following the deposition of MR sensor layers, a first DLC layer is deposited. Milling mask layers are then deposited, and outer portions of the milling mask layers are removed such that a remaining central portion of the milling mask layers is formed having straight sidewalls and no undercuts. Outer portions of the sensor layers are then removed such that a relatively thick remaining central portion of the milling mask resides above the remaining sensor layers. A thin electrical insulation layer is deposited, followed by the deposition of magnetic side shields. A second DLC layer is deposited and the remaining mask layers are then removed utilizing a chemical mechanical polishing (CMP) liftoff step. Thereafter, the first DLC layer and the second DLC layer are removed and a second magnetic shield layer is then fabricated thereabove.
    Type: Grant
    Filed: May 10, 2005
    Date of Patent: August 18, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Satoru Araki, Robert Stanley Beach, Marie-Claire Cyrille, Wipul Pemsiri Jayasekara, Quang Le, Jui-Lung Li, David John Seagle, Howard Gordon Zolla
  • Patent number: 7562437
    Abstract: A method for constructing a magnetic write head for use in perpendicular magnetic recording, the write head having a write pole with a trailing shield that wraps around the write pole. The method allows the trailing shield to be constructed with a very well controlled trailing gap thickness and also allows the write pole to be constructed with a well controlled track width and a straight, flat trailing edge. The method includes depositing a magnetic write pole over a substrate and forming a mask structure over the write pole layer. The mask structure includes an end point detection layer that can be removed by reactive ion etching. An ion mill is performed to form a write pole by removing magnetic write pole material that is not covered by the mask layer. A layer of non-magnetic material is deposited and is ion milled to expose the end point detection layer.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: July 21, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Aron Pentek, Yi Zheng
  • Patent number: 7552523
    Abstract: A method and system for manufacturing a perpendicular magnetic recording transducer by a process that includes plating is described. The method and system include forming a chemical mechanical planarization (CMP) uniformity structure around a perpendicular magnetic recording pole. The CMP uniformity structure has a height substantially equal to a desired pole height. The method and system also include fabricating an insulator on the CMP uniformity structure and performing a CMP to remove a portion of the insulator. The CMP exposes a portion of the perpendicular magnetic recording pole and planarizes an exposed surface of the perpendicular magnetic recording transducer.
    Type: Grant
    Filed: July 1, 2005
    Date of Patent: June 30, 2009
    Assignee: Western Digital (Fremont), LLC
    Inventors: Li He, Jun Liu, Danning Yang, Yining Hu
  • Patent number: 7549215
    Abstract: A structure and method for performing magnetic inductance testing of write heads formed on a wafer. The structure and method allows for the effective inductive testing of magnetic write heads at wafer level even if the write heads have an inductance that is too low to be effectively measured directly. A test head is constructed having a structure similar to that of the write heads, but having a significantly higher magnetic inductance. The higher magnetic inductance of the write head can be provided by extending the shaping layer to or beyond the air bearing surface plane ABS. The inductance of the test head can be further increased by increasing the width of the portion of the shaping layer that extends to the ABS (ie. shaping layer throat) and by increasing the width of the write pole throat.
    Type: Grant
    Filed: March 28, 2007
    Date of Patent: June 23, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Wen-Chien David Hsiao, Michael Ming Hsiang Yang
  • Patent number: 7536772
    Abstract: A method is given for the manufacture of a bottom spin valve (BSV) spin filter spin valve (SFSV) type read sensor. The sensor has a composite, ultra-thin (<20 Angstroms) laminated free layer formed as a Cu high conductance layer (HCL) between two layers of CoFe. A second HCL is formed as a layer of Ru on the composite free layer. By adjusting the thicknesses of the two HCL's, the free layer will have low coercivity and tunable magnetostriction. The sensor is capable of reading densities exceeding 60 Gb/in2.
    Type: Grant
    Filed: November 8, 2005
    Date of Patent: May 26, 2009
    Assignee: Headway Technologies, Inc.
    Inventors: Cheng T. Horng, Ru-Ying Tong
  • Patent number: 7536776
    Abstract: A fabrication method for thin film magnetic heads, comprises, forming a Current Perpendicular to a Plane (CPP) sensor film over a lower shield and a first chemical mechanical polishing (CMP) stop film over the CPP sensor film, etching the CPP sensor film and forming a track width on the CPP sensor film, and covering at least the etching section of the CPP sensor film with an insulating film. The method further comprises forming a CMP dummy film over the insulating film and a second CMP stop film over the CMP dummy film, exposing the first CMP stop film, and removing the first CMP stop film and the second CMP stop film by oxygen reactive ion etching (RIE) and the CMP dummy film by fluorine RIE, and forming an upper shield film over the insulating film and over the CPP sensor film.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Nobuo Yoshida, Taku Shintani, Hisako Takei
  • Patent number: 7536775
    Abstract: A method for sample preparation. The method includes mechanically polishing portions of an insulating layer over a main pole of a recording head embedded within a sample structure. The insulating layer is polished top down in planar layers perpendicular to an air bearing surface adjoining the main pole. The method also includes selectively wet etching the remaining portions of the insulating layer to expose the main pole, wherein the insulating layer surrounds the main pole. Etching is made without damaging the main pole.
    Type: Grant
    Filed: January 6, 2005
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Phillip J. Peterson, Monica L. Vargas
  • Patent number: 7533456
    Abstract: A free layer functions such that a magnetization direction changes depending on an external magnetic field, and is made up of a multilayer structure including a first Heusler alloy layer, and a fixed magnetization layer takes a form wherein an inner pin layer and an outer pin layer are stacked one upon another with a nonmagnetic intermediated layer sandwiched between them. The inner pin layer is made up of a multilayer structure including a second Heusler alloy layer. The first and second Heusler alloy layers are each formed by a co-sputtering technique using a split target split into at least two sub-targets in such a way as to constitute a Heusler alloy layer composition. When the Heusler alloy layer is formed, therefore, it is possible to bring up a film-deposition rate, improve productivity, and improve the performance of the device.
    Type: Grant
    Filed: June 1, 2007
    Date of Patent: May 19, 2009
    Assignee: TDK Corporation
    Inventors: Yoshihiro Tsuchiya, Tomohito Mizuno, Koji Shimazawa
  • Patent number: 7530160
    Abstract: A method for manufacturing a magnetoresistive sensor having improved free layer biasing and track width control. The method includes forming a ferromagnetic pinned layer, and depositing a ferromagnetic film thereover. A layer of Ta is deposited over the ferromagnetic film and a mask is formed over an active sensor area. A reactive ion etch process is performed to remove selected portions of said Ta layer. An etch is then performed to remove selected portions of the ferromagnetic film in unmasked areas and a ferromagnetic refill material is deposited.
    Type: Grant
    Filed: September 5, 2007
    Date of Patent: May 12, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Hardayal Singh Gill
  • Patent number: 7523543
    Abstract: A magnetic memory device may include a digit line on a substrate, a first insulating layer on the digit line, and a magnetic tunnel junction memory cell on the first insulating layer so that the first insulating layer is between the digit line and the magnetic tunnel junction memory cell. A second insulating layer may be provided on the magnetic tunnel junction memory cell, wherein the second insulating layer has a hole therein exposing portions of the magnetic tunnel junction memory cell. A bit line may be provided on the second insulating layer and on portions of the magnetic tunnel junction memory cell exposed by the hole in the second insulating layer, and ferromagnetic spacers may be provided on sidewalls of at least one of the digit line and/or the bit line. Related methods are also discussed.
    Type: Grant
    Filed: July 12, 2007
    Date of Patent: April 28, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyung-Rae Byun, Sung-Lae Cho
  • Patent number: 7520048
    Abstract: A giant magnetoresistive (GMR) head is formed to include a recess in an overcoat layer that reduces stress on the poles. The process includes depositing a seed layer over the overcoat layer prior to plating a metal mask layer with an opening where the recess is to be formed, wet chemical etching the seed layer through the opening in the mask layer and performing an ion milling process to remove any remaining traces of the seed layer. With the seed layer completely removed, a trench having smooth sidewalls and bottom is etched in the overcast layer by a reactive ion etch (RIE) process. The saw that is used to separate the head elements in the wafer can be passed through the clean trench without contacting the overcoat layer, thereby avoiding the chipping and cracking that might otherwise result from the use of a silicon dioxide or silicon nitride overcoat layer.
    Type: Grant
    Filed: May 31, 2007
    Date of Patent: April 21, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yunxiao Gao, Aron Pentek, Alan J. Tam, Sue Siyang Zhang
  • Patent number: 7506431
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method allows the write head to be formed with a write pole having a concave trailing edge. The method further allows the amount of concavity of the trailing edge to be accurately and carefully controlled both within a wafer and between wafers. A write pole is formed using a mask that includes a hard mask, a RIEable layer and an endpoint detection layer. A layer of non-magnetic material (ALD layer) is deposited, and then, an ion milling process is used to remove a portion of the ALD layer disposed over the write pole and mask. A reactive ion etch process is performed to remove the RIEable layer leaving the ALD layer to form non-magnetic side walls with upper portions that extend above the write pole.
    Type: Grant
    Filed: May 3, 2007
    Date of Patent: March 24, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Wen-Chien David Hsiao, Yimin Hsu, Vladimir Nikitin, Aron Pentek, Yi Zheng
  • Patent number: 7500303
    Abstract: A read head for a disk drive and a method of fabricating the read head with overlaid lead pads that contact the top surface of the sensor between the hardbias structures to define the electrically active region of the sensor are described. The invention deposits the GMR and lead layers before milling away the unwanted material. A photoresist mask with a hole defining the active area of the sensor is preferably patterned over a layer of DLC that is formed into a mask. A selected portion of the exposed lead material is then removed using the DLC as a mask defining the active region of the sensor. A photoresist mask pad is patterned to define the full sensor width. The excess sensor and lead material exposed around the mask is milled away. The layers for the hardbias structure are deposited.
    Type: Grant
    Filed: May 19, 2006
    Date of Patent: March 10, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Tsung Yuan Chen, Kuok San Ho, Mustafa Michael Pinarbasi
  • Patent number: 7500302
    Abstract: Embodiments of the present invention recite a process for fabricating a write gap structure for a magnetic recording head. In one embodiment, at least one layer of inert material is deposited which is disposed proximate to the P2 pole of a magnetic recording head. A layer of magnetic material is deposited which is disposed between the layer of inert material and the P1 pedestal (P1P) of the magnetic recording head. In embodiments of the present invention, a second layer of inert material is deposited which is disposed between the layer of magnetic material and the P1P of the magnetic recording head. In embodiments of the present invention, the throat height of the write gap structure is defined wherein the layer of magnetic material and the inert layer only overlie a portion of the P1 pedestal of the magnetic recording head.
    Type: Grant
    Filed: April 11, 2005
    Date of Patent: March 10, 2009
    Assignee: Hitachi Global Storage Technologies, Netherlands B.V.
    Inventors: Wen-Chien Hsiao, Terence Lam, Yinshi Liu, Michael Yang, Samuel Yuan
  • Publication number: 20090059421
    Abstract: A method of manufacturing thin closure magnetic read/write heads, such as magnetic tape heads is provided. The method provides improved flexural strength of the closure so that the closure breakage during fabrication of the heads is mitigated and closure thickness is reduced. An array of chips is fabricated on a wafer. The array is closed, with a closure strip bonded to each row of the array. Closures span only the length of a row, so that the closures are not subjected to flexure during processing and breakage due to flexure is mitigated. Side bars are bonded to the array to form a column with dimensions similar to prior art columns. This allows columns manufactured by the invention to undergo additional processing using existing processes.
    Type: Application
    Filed: August 30, 2007
    Publication date: March 5, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert G. Biskeborn, Calvin S. Lo
  • Patent number: 7497008
    Abstract: An embodiment of the invention is a magnetic head with overlaid lead pads that contact the top surface of the sensor between the hardbias structures and do not contact the hardbias structures which are electrically insulated from direct contact with the sensor. The lead pad contact area on the top of the sensor is defined by sidewall deposition of a conductive material to form leads pads on a photoresist prior to formation of the remainder of the leads. The conductive material for the lead pads is deposited at a shallow angle to maximize the sidewall deposition on the photoresist, then ion-milled at a high angle to remove the conductive material from the field while leaving the sidewall material. An insulation layer is deposited on the lead material at a high angle, then milled at a shallow angle to remove insulation from the sidewall.
    Type: Grant
    Filed: August 24, 2005
    Date of Patent: March 3, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Tsung Yuan Chen, Frederick Hayes Dill, James Mac Freitag, Kuok San Ho, Wipul Pemsiri Jayasekara, Kim Y. Lee, Mustafa Michael Pinarbasi, Ching Hwa Tsang, Patrick Rush Webb
  • Publication number: 20090038143
    Abstract: A method is provided for manufacturing a magneto-resistive device. The magneto-resistive device is for reducing the deterioration in the characteristics of the device due to annealing. The magneto-resistive device has a magneto-resistive layer formed on one surface side of a base, and an insulating layer formed of two layers and deposited around the magneto-resistive layer. The layer of the insulating layer closest to the base is made of a metal or semiconductor oxide. This layer extends over end faces of a plurality of layers made of different materials from one another, which make up the magneto-resistive device, and is in contact with the end faces of the plurality of layers with the same materials.
    Type: Application
    Filed: September 24, 2008
    Publication date: February 12, 2009
    Applicant: TDK CORPORATION
    Inventors: Takeo Kagami, Tetsuya Kuwashima, Norio Takahashi
  • Patent number: 7472469
    Abstract: A method is disclosed for fabricating a read sensor for a magnetic head for a hard disk drive having a read sensor stack and two lateral stacks. The method of fabrication includes forming lateral stacks on a gap layer, surrounding a groove to form a template. The read sensor stack is then formed in the groove, which defines the lateral dimensions of the read sensor stack, and lead layers are then formed on the lateral stacks. Also disclosed is a read head for a disk drive having a sensor stack defined by pre-established lateral stacks, and a disk drive having the read head.
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: January 6, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: David Eugene Heim, Kim Y. Lee, Tsann Lin, Jih-Shiuan Luo, Chun-Ming Wang
  • Patent number: 7472471
    Abstract: A method of manufacturing a magnetic head for perpendicular magnetic recording that includes a pole layer and a pole-layer-encasing layer. The method includes the steps of: forming a nonmagnetic layer that will be formed into the pole-layer-encasing layer; forming a polishing stopper layer on the top surface of the nonmagnetic layer, the polishing stopping layer being made of a nonmagnetic conductive material and having a penetrating opening with a shape corresponding to the plane geometry of the pole layer; forming a groove in the nonmagnetic layer by selectively etching a portion of the nonmagnetic layer exposed from the opening; forming a magnetic layer to be the pole layer such that the groove is filled; and polishing the magnetic layer until the polishing stopper layer is exposed, so that the magnetic layer is formed into the pole layer.
    Type: Grant
    Filed: September 18, 2007
    Date of Patent: January 6, 2009
    Assignee: Headway Technologies, Inc.
    Inventors: Yoshitaka Sasaki, Hironori Araki, Shigeki Tanemura, Takehiro Horinaka
  • Patent number: 7469468
    Abstract: A read/write head for a disk drive having a shorting conductor from a shield of the read element to a conductor that runs from the write element to an external electrical contact pad. This allows for the measurement of the electrical isolation between the read sensor and the read shield via the external contact pads. Such a capability allows the electrical isolation to be measured both during the lapping process and subsequent to the heads being diced into separate sliders. This shorting conductor may be in the form of an internal shorting stud or in the form of an interim conductor that passes through the parting zone between adjacent heads. In the latter case, the shorting conductor is broken when the heads are diced so that a head of this embodiment can only be measured for electrical isolation prior to dicing.
    Type: Grant
    Filed: January 18, 2006
    Date of Patent: December 30, 2008
    Assignee: Maxtor Corporation
    Inventors: Ralph W. Cross, Chris Broussalian
  • Patent number: 7467458
    Abstract: Methods of making a read sensor with a selectively deposited lead layers are disclosed. In one illustrative example, the method includes the acts of forming a plurality of read sensor layers over a wafer; forming a monolayer photoresist to mask the plurality of read sensor layers in a central region; ion milling to remove the unmasked plurality of read sensor layers in side regions to thereby form a read sensor in the central region; depositing longitudinal bias layers in the side regions; and depositing a silicon reactant layer over the longitudinal bias layers in the side regions. After removing the monolayer photoresist, a silicon reduction process and a hydrogen reduction process are sequentially performed for the selective depositions of the lead material.
    Type: Grant
    Filed: February 17, 2004
    Date of Patent: December 23, 2008
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Tsann Lin
  • Patent number: 7467459
    Abstract: A current in plane giant magnetoresistive (GMR) sensor having a hard bias layer that extends along the back edge (strip height) of the sensor rather than from the sides of the sensor. The hard bias layer preferably extends beyond the track width of the sensor. Electrically conductive leads, which may be a highly conductive material such as Cu, Rh or Au, or may be an electrically conductive magnetic material extend from the sides of the sensor stack. The bias layer is separated from the sensor stack and from the leads by thin layer of electrically conductive material, thereby preventing current shunting through the hard bias layer.
    Type: Grant
    Filed: April 18, 2005
    Date of Patent: December 23, 2008
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hardayal Singh Gill, Kuok San Ho
  • Publication number: 20080276448
    Abstract: A method of forming a perpendicular magnetic recording write head having a trailing shield (TS) with a precisely defined throat height (TH) on an air-bearing slider includes depositing an electrical lapping guide (ELG) layer on the substrate adjacent to and spaced from the write pole (WP) layer. A nonmagnetic TS pad layer is deposited on both the gap layer and the ELG layer, with the TS pad layer patterned to have a front edge extending across the both the ELG layer and the gap layer and recessed from the line where the substrate will be later cut to form the slider. An ELG protection layer is patterned on the ELG layer, the TS pad layer material is removed from the ELG layer in the region recessed from the TS pad layer front edge, and the ELG layer is removed in regions not covered by the ELG protection layer.
    Type: Application
    Filed: May 10, 2007
    Publication date: November 13, 2008
    Applicant: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
    Inventor: Aron Pentek
  • Patent number: 7444739
    Abstract: A magnetic head fabrication process in which a stencil layer is deposited upon a plurality of sensor layers. A photoresist mask in the desired read track width is fabricated upon the stencil layer. A reactive ion milling step is then conducted to remove the unmasked portions of the stencil layer. Where the stencil layer is composed of an organic compound, such as Duramide and/or diamond-like-carbon, a reactive ion milling step utilizing oxygen species produces a stencil of the present invention having exceptionally straight side walls with practically no undercuts. Thereafter, an ion milling step is undertaken in which the sensor layers that are not covered by the stencil are removed. The accurately formed stencil results in correspondingly accurately formed side walls of the remaining central sensor layers. A magnetic head sensor structure having a desired read track width and accurately formed side walls is thus fabricated.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: November 4, 2008
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventors: Michael Feldbaum, Wipul Pemsiri Jayasekara, Mustafa Michael Pinarbasi
  • Patent number: 7444740
    Abstract: A method and system for manufacturing a pole for a magnetic recording head. The method and system include providing an insulator and fabricating at least one hard mask on the insulator. The at least one hard mask has an aperture therein. The method and system also include removing a portion of the insulator to form a trench within the insulator. The trench is formed under the aperture. The method and system further include depositing at least one ferromagnetic material. The pole includes a portion of the ferromagnetic material within the trench.
    Type: Grant
    Filed: January 31, 2005
    Date of Patent: November 4, 2008
    Assignee: Western Digital (Fremont), LLC
    Inventors: Ki Sup Chung, Kyusik Sin, Danning Yang, Yingjian Chen, Brant Nease
  • Patent number: 7444738
    Abstract: Methods and apparatus are provided for sensing physical parameters. The apparatus comprises a magnetic tunnel junction (MTJ) and a magnetic field source whose magnetic field overlaps the MTJ and whose proximity to the MTJ varies in response to an input to the sensor. A magnetic shield is provided at least on a face of the MFS away from the MTJ. The MTJ comprises first and second magnetic electrodes separated by a dielectric configured to permit significant tunneling conduction therebetween. The first magnetic region has its spin axis pinned and the second magnetic electrode has its spin axis free. The magnetic field source is oriented closer to the second magnetic electrode than the first magnetic electrode. The overall sensor dynamic range is extended by providing multiple electrically coupled sensors receiving the same input but with different individual response curves and desirably but not essentially formed on the same substrate.
    Type: Grant
    Filed: July 29, 2005
    Date of Patent: November 4, 2008
    Assignee: EverSpin Technologies, Inc.
    Inventors: Young Sir Chung, Robert W. Baird, Gregory W. Grynkewich
  • Patent number: 7441326
    Abstract: In a magnetic sensor, a lower terminal layer, a magnetosensitive layer, and a cover film are simultaneously patterned into substantially the same size. The opposing surface of the lower terminal layer, which opposes the magnetosensitive film is substantially superposed on one opposing surface of the magnetosensitive film. The opposing surface of the upper terminal layer, which opposes the magnetosensitive film is formed into a shape smaller than and included in the other opposing surface of the magnetosensitive film. This implements a magnetic sensor which uses a CPP structure and is yet readily processible and which includes a substantially accurate fine CPP structure in accordance with a desired output.
    Type: Grant
    Filed: August 17, 2006
    Date of Patent: October 28, 2008
    Assignee: Fujitsu Limited
    Inventors: Yoshihiko Seyama, Atsushi Tanaka
  • Patent number: 7443635
    Abstract: A multilayer film is placed on a subatrate. The multilayer film includes an antiferromagnetic layer, a pinned magnetic layer, a non-magnetic material layer, and a free magnetic layer. The multilayer film has recessed sections arranged in both side regions thereof, the recessed sections being formed by partly removing the multilayer film in a vacuum. The bottoms of the recessed sections are located between the upper face and lower face of the antiferromagnetic layer. Amorphous barrier layers with a thickness of ? are placed on the bottoms of the recessed sections, the amorphous barrier layers being formed in the same vacuum as that for forming the recessed sections sequentially to the step of forming the recessed sections.
    Type: Grant
    Filed: October 4, 2005
    Date of Patent: October 28, 2008
    Assignee: Alps Electric Co., Ltd.
    Inventors: Kenichi Tanaka, Eiji Umetsu, Masahiro Oshima, Naoya Hasegawa
  • Patent number: 7441323
    Abstract: A head suspension for supporting a head slider over a storage media in a dynamic storage device is provided with a head suspension component having a spring metal layer, an electrically conductive layer and a dielectric layer interposed between the metal layer and the electrically conductive layer. A plurality of electrically conductive traces with bond pads are formed in the electrically conductive layer. A feature datum is also formed in the electrically conductive layer on a detachable carrier strip. The feature datum defines a first edge in the electrically conductive layer parallel to an edge of the bond pads.
    Type: Grant
    Filed: January 18, 2005
    Date of Patent: October 28, 2008
    Assignee: Hutchinson Technology Incorporated
    Inventor: Raymond R. Wolter
  • Publication number: 20080244896
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes the formation of a write pole over a substrate. A non-magnetic side gap layer is deposited and an ion milling is used to remove a portion of the substrate to lower the floor of the substrate. A sacrificial fill layer can then be deposited. A chemical mechanical polishing process can be used to remove the mask structure remaining as a remnant of the formation of the write pole, and then the sacrificial fill layer can be removed. A non-magnetic, electrically conductive material can be deposited to form a trailing gap, and a magnetic material can then be deposited to form a wrap around trailing shield.
    Type: Application
    Filed: March 20, 2007
    Publication date: October 9, 2008
    Inventors: Christian Rene Bonhote, Quang Le, Neil Leslie Robertson, Petrus Antonius Van Der Heijden