Abstract: An improved torch providing high visibility of the work zone to the operator, an increased viewing angle, and a reduced obstruction angle. The high visibility torch includes consumables adapted to maintain torch and consumables performance while reducing visual obstruction to the user, by coordinating, balancing, and optimizing design requirements and stack up tolerances. The invention also includes a related low-profile safety switch that promotes workpiece visibility and minimizes view obstruction.

Abstract: A single dielectric barrier plasma actuator is disclosed which includes a pair of offset electrodes and a dielectric barrier therebetween which includes a catalyst at least in the area adjacent one of the electrodes for enhancing the force created in the background gas by the actuator.

Abstract: A plasma generation device includes: a substrate having a first surface and a second surface; a stripline resonant ring disposed on the first surface of the substrate, and defining a discharge gap; a pair of electrode extensions connected to the stripline resonant ring at the discharge gap; a ground plane disposed on the second surface of the substrate; a gas flow element configured to flow gas between at least one of: (1) the discharge gap, and (2) the pair of electrode extensions; and a structure disposed adjacent the substrate to form an enclosure that substantially encloses at least a region including the discharge gap and the electrode extensions, the enclosure being adapted to contain a plasma.

Abstract: Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.

Abstract: A device for generating a radiofrequency plasma, that includes a voltage generator, and at least one ignition assembly that includes an ignition plug and a switch provided between a supply terminal of the plug and an output of the generator adapted for electrically connecting the output of the voltage generator to the plug upon reception of a control signal, and an electronic control unit generating the control signal. The electronic control unit measures values representative of evolution in time of the output voltage of the generator. The device further includes a mechanism varying the voltage and/or the frequency of the electric current applied to the supply terminal of the plug based on measured values. The evolution of the generator output voltage is representative of the condition of the plug (new or used).

Abstract: A workpiece is processed in a plasma reactor chamber using stabilization RF power delivered into the chamber, by determining changes in load impedance from RF parameters sensed at an RF source or bias power generator and resolving the changes in load impedance into first and second components thereof, and changing the power level of the stabilization RF power as a function one of the components of changes in load impedance.

Abstract: The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented.

Abstract: A method and apparatus for exciting gas that involves generating an alternating magnetic field unidirectionally through a magnetic core defining a gap, across the gap and through a plasma vessel that includes dielectric material. The magnetic field induces an electric field in the plasma vessel that generates the plasma.

Abstract: A system, method and apparatus for monitoring a processing system is disclosed. The method includes obtaining N parameter-value pairs that include a first parameter value and a second parameter value; obtaining, for each parameter-value pair, the product of the first parameter value and the complex conjugate of the second parameter value to obtain N products defined by a real part and an imaginary part; obtaining, for each parameter-value pair, a product of the second parameter value and the complex conjugate of the second parameter value to obtain N real numbers; calculating an average reflection coefficient by dividing an imaginary number by an average of the N real numbers, the real component of the imaginary number being equal to the average of the real parts of the N products and the imaginary part of the imaginary number being equal to an average of the imaginary parts of the N products.

Abstract: A system, method, and apparatus for stabilizing interactions between an electrical generator and a nonlinear load are described. One illustrative embodiment includes an impedance element that is coupled to an output of the generator and a power source coupled to the impedance element. The power source applies power to, or across, the impedance element so as to reduce energy loss that would ordinarily occur due to energy dissipation by way of the impedance element. In many variations, the power source operates within a defined bandwidth so that a stabilizing effect is achieved outside of this bandwidth.

Abstract: A method for generating radiation in a range of desired wavelengths in a direction of emission is provided. According to the method, initial radiation is produced by a radiation source, the wavelengths thereof including the desired range, and the initial radiation is filtered in such a way as to substantially eliminate the initial radiation beams having a wavelength outside the desired range. The inventive method is characterized in that the filtering is carried out by setting up a controlled distribution of the refractive index of the beams in a control region through which the initial radiation passes, in such a way as to selectively deviate the beams of the initial radiation according to the wavelength thereof and to recover the beams having desired wavelengths. The invention also relates to an associated device.

Abstract: A plasma generating system, related method and device are disclosed. The plasma generation system includes a plasma generation device, a source of ionizable gas and a driver network. The plasma generation device includes a housing, an electrode, and a resonant circuit. The housing includes a passage defined therein and directs a flow of ionizable gas therethrough. The electrode is coupled to the ionizable gas flowing through the passage of the housing. The resonant circuit includes a capacitor and an inductor connected together in series. The resonant circuit has a resonance frequency and is coupled to the electrode. The resonant circuit receives an AC signal. The driver network provides the AC signal such that the AC signal has a frequency and excites the ionizable gas flowing through the passage of the housing to a plasma.

Abstract: A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to a fuel release area that is associated with the first electrode and the second electrode, and a fuel release configured to induce release of fuel, supplied by the fuel supply, from the fuel release area. The fuel release area is spaced-apart from the first electrode and from the second electrode.

Abstract: A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.

Abstract: An apparatus for generating plasma is provided. The apparatus may include a vacuum chamber and a plasma source part. The plasma source part may include a dielectric part, an upper electrode, and an inductive coil. The dielectric part may be installed to protrude upward along a circumference of a through-hole provided at a top of the vacuum chamber. The upper electrode may be coupled to seal an opened top of the dielectric part. The inductive coil may spirally extend along an outer circumference surface of the dielectric part.

Abstract: A radio frequency plasma generator power supply, including: an interface that receives a request to determine an optimal control frequency; an output interface configured to be connected to a plasma generation resonator; a power supply module configured to apply a voltage at a set point frequency to the output interface, the voltage, depending on its frequency, selectively unable to allow generation of plasma of the resonator on receipt of a request during a phase optimizing power supply frequency of the generator and able to allow generation of plasma of the resonator during an operating phase; an interface that receives an electrical measurement of power supply of the resonator; a module that determines optimal control frequency, successively provides various set point frequencies to the power supply module on receipt of a request, and determines an optimal control frequency depending on electrical measurements received by the reception interface.

Abstract: In an electonic key associated with a device for skin treatment there is a housing and an integrated circuit, the integrated circuit is positioned within the housing, wherein the device for treating human tissue comprises a surgical instrument having a gas conduit terminating in a plasma exit nozzle, and an electrode associated with the conduit, and a radio frequency power generator coupled to the instrument electrode and arranged to deliver radio frequency power to the electrode in single or series of treatment pulses for creating a plasma from gas fed through the conduit, the pulses having durations in the range of from 2 ms to 100 ms.

Abstract: An apparatus for producing light includes a chamber that has a plasma discharge region and that contains an ionizable medium. The apparatus also includes a magnetic core that surrounds a portion of the plasma discharge region. The apparatus also includes a pulse power system for providing at least one pulse of energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region that forms a secondary circuit of a transformer. The plasma has a localized high intensity zone.

Abstract: A continuously variable microwave circuit capable of being tuned to operate under a plurality of distinct operating conditions, comprising: a waveguide comprising an adjustable tuning element having a core configured to protrude into the waveguide; an actuator in operative communication with the adjustable tuning element, wherein the actuator is operable to selectively vary a length of the core that is protruding into the waveguide so as to minimize reflected microwave power in the plasma asher; and a controller in operative communication with the actuator, wherein the controller is configured to selectively activate the actuator upon a change in the plurality of operating conditions.

Abstract: A flange, which forms a portion of a vacuum container, has a rectangular opening surrounded by an insulating frame. A plate-shaped radio-frequency antenna conductor 13 is provided so as to cover the opening, with the insulating frame clamped thereby. In this structure, a radio-frequency power source is connected via a matching box to one end along the length of the radio-frequency antenna conductor, the other end is connected to ground, and electric power is supplied so that a radio-frequency current flows from one end of the radio-frequency antenna conductor to the other. By this method, the impedance of the radio-frequency antenna conductor can be lowered, and high-density plasma with a low electron temperature can be efficiently generated.

Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

Abstract: A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.

Abstract: A system and method for preventing formation of a plasma-inhibiting substance within a plasma chamber is provided. In one embodiment, an apparatus that includes a barrier component configured to be disposed within a plasma chamber. The barrier component includes a wall that defines a plasma formation region where a chemically-reducing species is formed from a fluid. A portion of the wall is formed of a substance that is substantially inert to the chemically-reducing species. The wall prevents the chemically-reducing species from interacting with an inner surface of the plasma chamber to form a conductive substance. The barrier component also includes an opening in fluid communication with the plasma formation region. The fluid is introduced into the plasma formation region via the opening.

Abstract: An illumination device provides light to a flowing gaseous sample. The device includes a structure including a cavity configured to have a microplasma disposed therein. The cavity substantially encircles a cross-section of a channel that is configured to pass the flowing gaseous sample therethrough. The cavity is defined in part by an interior wall of the structure separating the cavity from the channel. The interior wall includes at least one orifice passing therethrough configured to provide to the flowing gaseous sample light generated by the microplasma. At least one electrode is configured to supply energy to the microplasma within the cavity.

Abstract: The objective of the present invention is to provide a target exchange type plasma generating apparatus in which the positions of two targets can be adjusted independent of each other. A target exchanging mechanism (6) of a plasma generating apparatus for generating plasma by vacuum arc discharge comprises a main holder (32) driven half a rotation by a main motor (M), containing sections (32a, 32b) arranged opposite to each other across the diameter of the main holder, auxiliary holders (16, 18) rotatably contained in the containing sections (32a, 32b), two auxiliary motors (M1, M2) for spinning the auxiliary holders, sliders (S1, S2) for vertically moving the auxiliary holders (16, 18) in the direction of the spinning shafts of the auxiliary holders, and targets (T1, T2) fitted to the auxiliary holders (16, 18). The positions of the targets (T1, T2) are exchanged by rotating the main holder (32) by half a rotation.

Abstract: A system and method are disclosed for implementing a power source including a power amplifier that generates a radio-frequency power signal with an adjustable operating frequency. The power amplifier also generates a reference phase signal that is derived from the radio-frequency power signal. An impedance match provides the radio-frequency power signal to a plasma coil that has a variable resonance condition. A phase probe is positioned adjacent to the plasma coil to generate a coil phase signal corresponding to the adjustable operating frequency. A phase-locked loop then generates an RF drive signal that is based upon a phase relationship between the reference phase signal and the coil phase signal. The phase-locked loop provides the RF drive signal to the power amplifier to control the adjustable operating frequency, so that the adjustable operating frequency then tracks the variable resonance condition.

Abstract: A plasma processing apparatus includes a chamber for carrying out plasma processing inside, a top plate made of a dielectric material for sealing the upper side of this chamber, and an antenna section that serves as a high frequency supply for supplying high frequency waves into the chamber via this top plate. The top plate is provided with reflecting members inside thereof. The sidewalls of the reflecting members work as wave reflector for reflecting high frequency waves that propagate inside the top plate in the radius direction. Alternatively, no reflecting members may be provided in a manner in which the sidewalls of a recess of the top plate serve as a wave reflector means.

Abstract: The present disclosure provides for a plasma system. The plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.

Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

Abstract: An apparatus for producing plasma, includes a container provided with at least one discharge electrode and a power supply unit that has at least one coupling electrode that can be capacitively coupled to the discharge electrode. The power supply unit is adapted to be removable from the container. The at least one coupling electrode is disposed beneath an insulating layer. In this way, the user can not come into direct contact with a coupling electrode after removing the power supply unit.

Abstract: A magnetic mirror plasma source includes a gap separating a substrate from a cathode. A mirror magnetic field extends between the substrate and the cathode through the gap. The magnetic field lines at a proximal surface of the substrate are at least two times as strong as those field lines entering the cathode. An anode is disposed such that a closed loop electron Hall current containment region is formed within the magnetic field.

Abstract: A pulsed plasma thruster provides for an advanced lightweight design with solid propellant and predominately electromagnetic thrust in a coaxial geometry. Electromagnetic forces are generated in a plasma by current flowing from a small central electrode to an electrically conducting diverging nozzle electrode. The thruster employs a series of electric current pulses of limited duration and varying frequency between the pair of electrodes creating a series of electric arcs. The electric arcs pass over a propellant surface located between the electrodes, forming a plasma, which is then exhausted from the device to produce thrust. The thruster maintains a low plasma resistance and cavity pressure, which in turn yields strong electromagnetic body forces, resulting in a high efficiency and consistent pulse-to-pulse performance.

Abstract: A pulsed plasma thruster provides for an advanced lightweight design with solid propellant and predominately electromagnetic thrust in a coaxial geometry. Electromagnetic forces are generated in a plasma by current flowing from a small central electrode to an electrically conducting diverging nozzle electrode. The thruster employs a series of electric current pulses of limited duration and varying frequency between the pair of electrodes creating a series of electric arcs. The electric arcs pass over a propellant surface located between the electrodes, forming a plasma, which is then exhausted from the device to produce thrust. The thruster maintains a low plasma resistance and cavity pressure, which in turn yields strong electromagnetic body forces, resulting in a high efficiency and consistent pulse-to-pulse performance.

Abstract: A plasma processing apparatus including a sealable chamber that is sealable, a gas supply section that supplies a reactive material gas into the chamber, and a plurality of cathode and anode electrode pairs provided within the chamber, connected to an external power supply, and producing plasma discharges through the material gas, respectively, wherein the plurality of cathode and anode electrode pairs are provided at a distance from one another at which the plasma discharges are prevented from interfering with one another.

Abstract: An apparatus and method for controlling electron flow within a plasma to produce a controlled electron beam is provided. A plasma is formed between a cathode and an acceleration anode. A control anode is connected to the plasma and to the acceleration anode via a switch. If the switch is open, the ions from the plasma flow to the cathode and plasma electrons flow to the acceleration anode. With the acceleration anode suitably transparent and negatively biased with a DC high voltage source, the electrons flowing from the plasma are accelerated to form an electron beam. If the switch is closed, the ions still flow to the cathode but the electrons flow to the control anode rather than the acceleration anode. Consequently, the electron beam is turned off, but the plasma is unaffected. By controlling the opening and closing of the switch, a controlled pulsed electron beam can be generated.

Abstract: The present invention aims at providing a radio-frequency antenna unit capable of generating a high-density discharge plasma in a vacuum chamber. The radio-frequency antenna unit according to the present invention includes: a radio-frequency antenna through which a radio-frequency electric current can flow; a protective tube made of an insulator provided around the portion of the radio-frequency antenna that is in the vacuum chamber; and a buffer area provided between the radio-frequency antenna and the protective tube. The “buffer area” refers to an area where an acceleration of electrons is suppressed, and it can be formed, for example, with a vacuum or an insulator. Such a configuration can suppress an occurrence of an electric discharge between the antenna and the protective tube, enabling the generation of a high-density discharge plasma in the vacuum chamber.

Abstract: A measuring system measuring an impedance of an object to be measured, including an impedance measuring instrument; a casing formed of a grounded conductor and capable of locating the object to be measured therein; and a radially-shaped electrode connected to the impedance measuring instrument and capable of being connected to the object to be measured.

Abstract: The system includes a method and means of technological defense against violent atmospheric cyclones: tornadoes, hurricanes, others. The controlled meteorological missiles equipped with rocket servo-motors and magneto-gas-dynamic ionizers are used. The running out hot exhaust gases of rocket motors are converted into electro-conductive dashed plasma jets, which initiate and trigger multiple electro-shorting dischargers between contrary charged zones through ionized plasma jet segments of said dischargers. This disorders and de-energizes the cyclonic electrically saturated zones by multiple triple diverse and combined actions. The rotations slow down and end, and the cyclones get dispersed by own winds. The Guard can be used for preventing violent sky cyclones and severe lightning storms by preemptive operating into monitored over-saturated atmospheric electrostatic fields.

Abstract: The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure (1) having an inner surface of a first value (S1) and an extraction gate (2) having a surface of a second value (S2), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S2) over the first value (S1) being close to: D=1/? ?2?me/mi exp (?½), wherein: ? is the proportion of electrons of the plasma P, me the electron mass, and mi is the mass of positively charged ions.

Abstract: A micro discharge device (MDD) ionizer and a method for fabricating the MDD ionizer are disclosed. The MDD ionizer includes a dielectric barrier having a first open end connected to an electrically conductive capillary tube and a second open end connected to a sample collection capillary tube. A circular high voltage electrode can be positioned around the dielectric barrier in close linear proximity to the conductive capillary tube and sealed by a non-conductive epoxy. A plasma discharge can be formed in a flow path through the dielectric barrier when an AC potential is applied between the high voltage electrode and the electrically conductive capillary tube utilizing an electronic controller. Such a plasma discharge in the flow path of the sample achieves soft ionization of gaseous sample molecules. The high pressure region generally occurs in the plasma region (where the ionization occurs). The ions thus are drawn (i.e.

Abstract: A microwave introducing mechanism 43 includes a cylindrical container 50; an inner conductor 52, coaxially provided in the container 50, a microwave transmission path being defined between the container 50 and the inner conductor 52; a tuner 44 for adjusting an impedance of the microwave transmission path 53; and an antenna section 45 including an antenna 51 for radiating to the chamber a microwave transmitted through the microwave transmission path 53. The tuner 44 includes a pair of slugs 58 made of a dielectric material and movable along the inner conductor 52; an actuator 59 for moving the slugs 58; and a controller 60. The controller 60 controls both the slugs 58 to move together in a range of a ½ wavelength of the microwave and one of the slugs 58 to move in a range of a ¼ wavelength of the microwave with regard to the other slug.

Abstract: A surface wave plasma (SWP) source is described. The SWP source comprises an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. The EM wave launcher comprises a slot antenna having a plurality of slots. The SWP source further comprises a first recess configuration formed in the plasma surface, wherein the first recess configuration is substantially aligned with a first arrangement of slots in the plurality of slots, and a second recess configuration formed in the plasma surface, wherein the second recess configuration is either partly aligned with a second arrangement of slots in the plurality of slots or not aligned with the second arrangement of slots in the plurality of slots. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma.

Abstract: Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.

Abstract: A plasma lighting system comprises a resonator, a bulb received in the resonator and containing a discharge material therein for emitting light in accordance with the discharge material is exited as a plasma state, and a dielectric mirror disposed at one side of the bulb and formed of a spontaneous reflective material for spontaneously reflecting light generated from the bulb. The dielectric mirror can be included or excluded, and can smoothly reflect light without an additional reflection coating layer. The dielectric mirror is prevented from being damaged even in a high temperature, and thus a lowering of an optical efficiency is prevented when used for a long time.

Abstract: This invention relates to enhancing a gas-phase reaction in a plasma comprising: creating plasma (104) by at least one plasma source (106), and wherein that the method further comprises: generating ultrasonic high intensity and high power acoustic waves (102) having a predetermined amount of acoustic energy by at least one ultrasonic high intensity and high power gas-jet acoustic wave generator (101), where said ultrasonic high intensity and high power acoustic waves are directed to propagate towards said plasma (104) so that at least a part of said predetermined amount of acoustic energy is absorbed into said plasma (104), and where a sound pressure level of said generated ultrasonic high intensity and high power acoustic waves (102) is at least substantially 140 dB and where an acoustic power of said generated ultrasonic high intensity and high power acoustic waves (102) is at least substantially 100 W.

Abstract: Provided are plasma-aided gas storage methods and apparatus. In one embodiment, a porous powder bed assembly equipped with corona discharge electrodes is used to generate a non-equilibrium plasma of negatively ionized gas molecules which absorb onto porous particles, e.g., activated charcoal, to form a gas storage entity. Gas adsorbed onto the particles is desorbed at moderate temperatures by aid of ultraviolet light illumination.

Abstract: A strongly-ionized plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. An output of a pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply comprising solid state switches that are controlled by micropulses generated by drivers. At least one of a pulse width and a duty cycle of the micropulses is varied so that the power supply generates a multi-step voltage waveform at the output having a low-power stage including a peak voltage and a rise time that is sufficient to generate a plasma from the feed gas and a transient stage including a peak voltage and a rise time that is sufficient to generate a more strongly-ionized plasma.

Abstract: A system and methods are provided for mitigating or removing workpiece surface contaminants or conditions. Methods of the invention provide treatment of the wafer surface to provide a known surface condition. The surface condition can then be maintained during and following implantation of the workpiece surface with a dopant.

Abstract: A plasma source is described. The source includes a reactive impedance element formed from a plurality of electrodes. By providing such a plurality of electrodes and powering adjacent electrodes out of phase with one another, it is possible to improve the characteristics of the plasma generated.

Abstract: Provided is a plasma apparatus using a valve, which comprises a discharge device with an electrode exposed to the combustion chamber installed in a cylinder head, an antenna installed on the valve face of a valve head, an electromagnetic wave transmission line installed in a valve stem with one end connected to the antenna and the other end covered with an insulator or dielectric and extending to a power-receiving portion positioned at a location fitting into the guide hole in the valve stem, and an electromagnetic wave generator for feeding an electromagnetic waves to the power-receiving portion. At the compression stroke when the combustion chamber side opening of an intake port or an exhaust port is closed with the valve head, discharge is generated with the electrode of the discharge device and the electromagnetic waves fed from the electromagnetic wave generator through the electromagnetic wave transmission line are radiated from the antenna.