Abstract: A multi-channel radio frequency (RF) generator module includes N power amplifiers, M drivers, a power supply module, and a control module. The N power amplifiers generate N RF outputs, respectively. The M drivers drive the N power amplifiers based on M driver control signals, respectively. The power supply module receives alternating current (AC) input power and applies L rail voltages to the N power amplifiers based on L rail voltage setpoints, respectively. The control module sets the L rail voltage setpoints and the M driver control signals. N is an integer greater than one, L and M are integers greater than zero, and M and L are less than or equal to N.

Abstract: An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.

Abstract: A tuner for matching impedance includes: a body having a tubular outer conductor and a tubular inner conductor coaxially provided in the outer conductor, the body forming a part of the microwave transmission path; an annular dielectric slug provided between the outer conductor and the inner conductor, the slug being movable along a longitudinal direction of the inner conductor; and a drive mechanism for moving the slug and including a drive part for applying a driving force; a drive transmission part for transmitting the driving force to the slug; a drive guide part for guiding movement of the slug; and a holding part for holding the slug at the drive transmission part, and wherein the drive transmission part, the drive guide part and the holding part are accommodated in the inner conductor.

Abstract: An electrodeless plasma lamp and a method of generating light are provided. The plasma lamp may comprise a power source to provide radio frequency (RF) power and a lamp body to receive the RF power. The lamp body may include a dielectric material having a relative permittivity greater than 2. A bulb is provided that contains a fill that forms a light emitting plasma when the RF power is coupled to the fill. Collection optics is provided to direct the light along an optical path to an aperture, wherein the optical path includes at least one reflective surface and at least two refractive surfaces.

Abstract: A closed drift ion source is provided, having an anode that serves as both the center magnetic pole and as the electrical anode. The anode has an insulating material cap that produces a closed drift region to further increase the electrical impedance of the source. The ion source can be configured as a round, conventional ion source for space thruster applications or as a long, linear ion source for uniformly treating large area substrates. A particularly useful implementation uses the present invention as an anode for a magnetron sputter process.

Abstract: A method of accelerating charged particles using a laser pulse fired through a plasma channel contained in a capillary, wherein the plasma waveguide has deviations along its length that cause deviations in the plasma density contained therein, the deviations in plasma density acting to promote charged particle injection into a wake of a passing laser pulse. A radiation source based on a laser-driven plasma accelerator in a plasma waveguide in which the plasma waveguide and/or laser injection process is/are controlled so as to produce an undulating path for the laser pulse through the waveguide, the undulation exerting a periodic transverse force on charged particles being accelerated in the wake of the laser pulse, the resulting charged particle motion causing controlled emission of high frequency radiation pulses.

Abstract: RF power is coupled with different phase offsets to different RF connection points on an electrode of a plasma chamber. Preferably, the number of different RF connection points and corresponding phase offsets is at least four, and the positions of the RF connection points are distributed along two orthogonal dimensions of the electrode. Preferably, power to each respective RF connection point is supplied by a respective RF power supply, wherein each power supply synchronizes its phase to a common reference RF oscillator.

Abstract: The microwave plasma generator is applied to transmission of electromagnetic field into plasma. The invention consists of the fact that the guiding part (3) has two outputs (4, 4?) between which an input (2) of microwave is placed generated from the microwave power source (5). The input (2) is in the distance (A) from the separation (10) of the first output (4) and in the distance (B) from the separation (10?) of the second output (4?) while the absolute value of the difference of the distances A-B or B-A equals ?/2 where ? is the wave length of the microwave and distances A and B correspond to the trajectory of microwave propagation. A microwave plasma generator including microwave power source (magnetron) (5) is connected to the input (2) of the guiding part (3) of the applicator (1).

Abstract: A device for coupling ionization energy into an ion or electron source, which is excited inductively or inductively-capacitively is provided. The device includes: a discharge vessel for a gas, which is to be ionized; a coupling coil, which is wound around the discharge vessel and feeds in a high frequency energy, which is required for plasma excitation; a coupling capacitor, which is electrically coupled to the coupling coil; a high frequency generator, which is electrically coupled to the coupling coil. The high frequency generator forms, together with the at least one coupling capacitor, a resonant circuit. The high frequency generator includes a PLL controller for automatic impedance matching of the resonant circuit, so that the resonant circuit can be driven at a resonant frequency.

Abstract: A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode being arranged within the housing and having a first side facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply for providing a gas into the housing.

Abstract: In various exemplary embodiments, an electrodeless plasma lamp includes a bulb configured to be coupled to a source of radio frequency (RF) power. The bulb contains a fill that forms a plasma when the RF power is coupled to the fill. An electrically-conductive convex shield is positioned proximate to the bulb with a convex surface of the shield being distal to the bulb. A resonant structure having a quarter wave resonant mode includes a lamp body having a dielectric material having a relative permittivity greater than 2 with an inner conductor and an outer conductor. The source of RF power is configured to provide RF power to the lamp body at about a resonant frequency for the resonant structure.

Abstract: A plasma generator for delivering a generated plasma to an area that is a distance from the area where the plasma is initially generated, including a dielectric tube portion extending from a gas inlet to a discharge aperture; an anode formed at least substantially around a portion of the discharge tube, wherein the anode is electrically coupled, via an electrical connection, to a power supply; a cathode formed at least substantially around a portion of the discharge tube, wherein the cathode is electrically coupled, via an electrical connection, to the power supply; and an elongate discharge tube attached or coupled to the discharge aperture such that when a generated plasma is produced, the generated plasma flows through the discharge tube.

Abstract: A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.

Abstract: An apparatus and method for controlling electron flow within a plasma to produce a controlled electron beam is provided. A plasma is formed between a cathode and an acceleration anode. A control anode is connected to the plasma and to the acceleration anode via a switch. If the switch is open, the ions from the plasma flow to the cathode and plasma electrons flow to the acceleration anode. With the acceleration anode suitably transparent and negatively biased with a DC high voltage source, the electrons flowing from the plasma are accelerated to form an electron beam. If the switch is closed, the ions still flow to the cathode but the electrons flow to the control anode rather than the acceleration anode. Consequently, the electron beam is turned off, but the plasma is unaffected. By controlling the opening and closing of the switch, a controlled pulsed electron beam can be generated.

Abstract: A method for treating a workpiece. The method includes directing a first ion beam to a first region of a workpiece, wherein the first ion beam has a first ion angular profile of first ions extracted through an aperture of an extraction plate. The method also includes directing a second ion beam to the first region of the workpiece, wherein the second ion beam has a second ion angular profile different than the first ion profile of second ions extracted through the aperture of the extraction plate.

Abstract: A plasma detector system may include a high frequency generator arranged to send incident electromagnetic radiation through a plasma chamber of a plasma system; and a high frequency detection system arranged to detect signal intensity of high frequency radiation sent from the high frequency generator and transmitted through the plasma chamber.

Abstract: An EUV light source is disclosed herein which may comprise a droplet generator producing a stream of target material droplets, a first optical gain medium amplifying light on a first beam path without a seed laser providing a seed laser output to the first beam path, a second optical gain medium amplifying light on a second beam path without a seed laser providing a seed laser output to the second beam path, and a beam combiner combining light from the first beam path and the second beam path for interaction with a target material droplet to produce EUV light emitting plasma.

Abstract: Apparatuses and methods for treating wounds are disclosed. An apparatus for treating wounds is disclosed comprising an instrument for generating a low temperature, atmospheric pressure plasma, a means of flowing gas through the instrument, and a means of contacting the wound with the reactive gases flowing out of the instrument. A method for treating wounds using reactive gases is disclosed. The use of atmospheric pressure plasmas for treating wounds is also disclosed.

Abstract: A DC steam plasma torch includes front, middle and rear sections. The front section includes a first amount and a first electrode attached to the first amount, thus defining co-axial first internal and external coolant channels. The middle section includes a second mount and a second electrode co-axially connected to the second mount, thus defining co-axial second internal and external coolant channels. The rear section includes an insulating transient element connected to the second electrode, a window frame connected to the insulating transient element and a window provided in the window frame. A first swirl generator is provided between the first and second sections to receive primary working gas and generating a swirl in the same. A second swirl generator is provided between the middle and rear sections to receive auxiliary working gas and generating a swirl in the same.

Abstract: Generated amount of active species is increased, and dew formation or moisture attachment hardly occurs on a dielectric layer. A plasma generating apparatus including a pair of electrodes, wherein a dielectric layer is arranged on at least one of surfaces of the electrodes facing each other, plasma discharge occurs as a predetermined voltage is applied to the electrodes, and a coating film is arranged on a surface of the dielectric layer.

Abstract: A process for the in-flight surface treatment of powders using a Dielectric Barrier Discharge Torch operating at atmospheric pressures or soft vacuum conditions is described herein. The process comprising feeding a powder material into the Dielectric Barrier Discharge Torch yielding powder particles exhibiting a reduced powder agglomeration feature; in-flight modifying the surface properties of the particles; and collecting coated powder particles. An apparatus for surface treating micro- and nanoparticles comprising a Dielectric Barrier Discharge Torch operating at atmospheric pressure or soft vacuum conditions is also described herein.

Abstract: A plasma source for a substrate is provided. The plasma source may include a source electrode and an impedance box. The source electrode receives a source Radio Frequency (RF) from the external and generates plasma based on capacitive coupling within a vacuum chamber. The impedance box connects at one end to an outer circumference surface of the source electrode, and is grounded at the other end to the vacuum chamber, and controls an electric current flowing from the source electrode to the vacuum chamber by the source RF.

Abstract: A device for sustaining a plasma in a torch is provided. In certain examples, the device comprises a first electrode configured to couple to a power source and constructed and arranged to provide a loop current along a radial plane of the torch. In some examples, the radial plane of the torch is substantially perpendicular to a longitudinal axis of the torch.

Abstract: Systems and methods may be provided for cylindrical Hall thrusters with independently controllable ionization and acceleration stages. The systems and methods may include a cylindrical channel having a center axial direction, a gas inlet for directing ionizable gas to an ionization section of the cylindrical channel, an ionization device that ionizes at least a portion of the ionizable gas within the ionization section to generate ionized gas, and an acceleration device distinct from the ionization device. The acceleration device may provide an axial electric field for an acceleration section of the cylindrical channel to accelerate the ionized gas through the acceleration section, where the axial electric field has an axial direction in relation to the center axial direction. The ionization section and the acceleration section of the cylindrical channel may be substantially non-overlapping.

Abstract: A plasma source includes upper and lower portions. In a first aspect, an electrical power source supplies greater power to the upper portion than to the lower portion. In a second aspect, the plasma source includes three or more power couplers that are spaced apart vertically, wherein the number of plasma power couplers in the upper portion is greater than the number of plasma power couplers in the lower portion. The upper and lower portions of the plasma source can be defined as respectively above and below a horizontal geometric plane that bisects the vertical height of the plasma source. Alternatively, the upper and lower portions can be defined as respectively above and below a horizontal geometric plane that bisects the combined area of first and second workpiece positions.

Abstract: Provided is a complex plasma generating device which makes it possible to enhance an explosion power in such a way that electromagnetic waves are guided to intensively emit to the gas ionized by means of corona discharge by designing a waveguide with electromagnetic waves flowing therein in a spiral curve shape depending on Fibonacci sequence and in such a way that vapor obtained by vaporizing sea water is sprayed.

Abstract: A system and method for generating a plasma. An embodiment of the system for generating a plasma may include a first electrode; a second electrode disposed adjacent the first electrode; a first power supply for supplying power at the second electrode; a second power supply for generating a magnetic field; and a sequencer for coordinating a discharge of power from the first power supply and a discharge of power from the second power supply. The first power supply may be configured such that the discharge of power from the first power supply generates a plasma between the first electrode and the second electrode. The second power supply may be configured such that the magnetic field generated by the discharge of power from the second power supply rotates the plasma.

Abstract: The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device at least two consecutive pulses (9, 18) are applied within a time interval of each electrical discharge onto said surface(s). With this measure, the collectable conversion efficiency is increased compared to the use of only one single energy pulse within each electrical discharge.

Abstract: According to one embodiment, a control apparatus configured to control a plasma processing apparatus including an electrode on which a substrate is disposed in a process room, a first power supply circuit, a plasma generation unit in the process room, a second power supply circuit, including a detection unit configured to detect parameters output from the first power supply circuit, and a control unit configured to control the first power and the second power supplied from the first power supply circuit and the second power supply circuit such that the parameters correspond to target values.

Abstract: A novel ion source for ambient mass spectrometry (switched ferroelectric plasma ionizer or “SwiFerr”), which utilizes the ambient pressure plasma resulting from a sample of barium titanate [001] whose polarization is switched by an audio frequency electric field. High yields of both anions and cations are produced by the source and detected using an ion trap mass spectrometer. Protonated amines and deprotonated volatile acid species, respectively, are detected in the observed mass spectra. Aerodynamic sampling is employed to analyze powders of drug tablets of loperamide and ibuprofen. A peak corresponding to the active pharmaceutical ingredient for each drug is observed in the mass spectra. Pyridine is detected at concentrations in the low part-per-million range in air. The low power consumption of the source is consistent with incorporation into field portable instrumentation for detection of hazardous materials and trace substances in a variety of different applications.

Abstract: The plasma generator of our invention comprises of the induction coil which is symmetric with respect to the reference plane between two terminal ends. Plasma processing gas is supplied to a predetermined space, and high frequency electricity is supplied to the induction coil, thereby the plasma generator generates plasma in the space. The reference plane passes between the two terminal ends and through longitude axis of the induction coil. The plasma generator can generate plasma with high quality of homogeneous.

Abstract: The current invention involves a desorption corona beam ionization source/device for analyzing samples under atmospheric pressure without sample pretreatment. It includes a gas source, a gas flow tube, a gas flow heater, a metal tube, a DC power supply and a sample support/holder for placing the samples. A visible corona beam is formed at a sharply pointed tip at the exit of the metal tube when a stream of inert gas flows through the metal tube that is applied with a high DC voltage. The gas is heated for desorbing the analyte from solid samples and the desorbed species are ionized by the energized particles embedded in the corona beam. The ions formed are then transferred through an adjacent inlet into a mass spectrometer or other devices capable of analyzing ions. Visibility of the corona beam in the current invention greatly facilitates pinpointing a sampling area on the analyte and also makes profiling of sample surfaces possible.

Abstract: A plasma jet system includes a housing with a single opening. A plasma generator is coupled to ionize a fluid in the housing. An electromagnetic accelerator is coupled to generate an electric field that accelerates ionized fluid in the housing toward the opening. A controller can modulate the frequency of the electric field to cause the ionized fluid to form a plasma vortex flow through the opening. A magnetic field is applied normal to the direction of the plasma vortex flow to mitigate the momentum of the electrons. The electrons slowed by the magnetic field can be collected and conducted to a location where they are re-inserted into the plasma vortex flow to maintain charge neutrality.

Abstract: According to the plasma treatment on an object accommodated in the processing room, the plasma treatment is carried out as follows. The discharge detecting sensor detects a signal of potential change caused with change in plasma discharge. Receiving the signal, the signal recording section temporarily records the signal as signal data indicating potential change. Referencing the signal data, the signal analysis section extracts index data. The index data shows a condition of plasma discharge, for example, as a count value for discharge-start waves, a count value for abnormal discharge, a count value for feeble arc discharge. The device control section judges a condition of plasma discharge by monitoring the index data and carries out the retry process, the accumulative plasma process, and the maintenance judgment process for performing plasma treatment operations properly.

Abstract: A plasma actuator incorporates a power source, a first electrode in contact with a first dielectric layer, a second electrode in contact with a second dielectric layer, and a ground electrode. The power source drives the first electrode with a first ac voltage pattern with respect to the ground electrode to produce a first plasma discharge, and a first electric field pattern in the flow region, and drives the second electrode with a second ac voltage pattern with respect to the ground electrode to produce a second plasma discharge in the flow region and a second electric field pattern in the flow region. The first and second electrodes are offset along the direction of flow and the first voltage pattern and the second voltage pattern have a phase difference such that the first and second electric fields drive flow in different portions of the flow region at different times.

Abstract: A plasma choking method and a plasma choke coil. The plasma choking method includes steps of installing at least one conductive coil set in a closed space and filling a reaction fluid into the closed space. When a circuit is interfered with by external surge or the surge in the circuit, the surge applies an electric field or a magnetic field to the conductive coil. At this time, the conductive coil in the closed space generates an inductive reactance corresponding to the surge and carries out plasma reaction, whereby the surface particles of the conductive coil are ionized by the magnetic field or electric field into high-energy electrons, high-energy ions and high-energy neutral atoms so as to effectively eliminate or absorb the surge.

Abstract: For production of plasma from a medium gas mass in an elongated shape, electric field forming elements 3, 4 that form an electric field in the medium gas mass are provided. The electric field forming elements form an electric field so that partial discharge occurs from the electric field forming elements toward both sides in the longitudinal direction of the medium gas mass. Accordingly, plasma 5 is produced from the medium gas mass. The medium gas mass is formed by, for example, gas supply members 1,2 that guide medium gas, through an internal hollow, to the electric field forming elements. An electric field forming area includes, for example, at least one high-potential electrode 3 and a voltage applying unit 4 that applies a voltage to the high-potential electrode. Plasma limited in medium gas can be produced with high energy efficiency stably over a wide range of parameters through a simple configuration.

Abstract: There is provided a plasma processing apparatus including a plasma generating unit for generating a plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed. The plasma processing apparatus further includes a particle moving unit for electrostatically driving particles in a region above the substrate to be removed out of the region above the substrate in the processing chamber while the processing on the substrate is performed by using the plasma. In addition, there is provided a plasma processing method of a plasma processing apparatus including the steps of generating plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed; and performing the processing on the substrate by the plasma.

Abstract: The invention relates to a method for igniting and generating an expanding diffuse microwave plasma and to a device for carrying out such a method. The method is particularly suited for generating microwave plasmas for the purpose of carrying out plasma treatment of surfaces and substances, particularly three-dimensional objects as well as particles under atmospheric pressure. The aim of the invention is to provide a method for igniting and generating these plasmas that is, particularly under normal and high pressure, easy and operationally safe as well as, in principle, carried out without a flow of gas. The invention also relates to a method and device for carrying out plasma treatment of surfaces and substances by means of such a plasma, which makes an effective plasma treatment possible due to its high stability with regard to plasma generation and maintenance, low gas consumption and a high plasma volume.

Abstract: An electrodeless plasma lamp having a bulb containing a fill that forms a light-emitting plasma is described. The lamp includes a power amplifier to provide radio frequency power to the fill at a frequency in the range of about 50 MHz to 10 GHz and the power amplifier is configured to operate in at least two classes of operation. Control electronics of the lamp is configured to change the class of operation of the power amplifier during operation of the plasma lamp. For example, the power amplifier may be configured to operate as a class A/B amplifier during at least a first mode of operation and a class C amplifier during at least a second mode of operation.

Abstract: Apparatus and methods for generating and optimizing a plasma discharge are provided. The device includes a plasma generating device, one or more sensors, and at least one controller for adjusting the plasma in light of the sensed characteristics. Methods for optimizing a plasma, particularly a spatially disoriented plasma discharge include generating a plasma, sensing one or more plasma characteristics, modifying one or more plasma generating properties to optimize the plasma.

Abstract: A device for generating a cold, HF-excited plasma under atmospheric pressure conditions can be used advantageously for plasma treatment of materials for cosmetic and medical purposes. The device contains a metal housing functioning as a grounded electrode in the region of the emergent plasma, wherein an HF generator, an HF resonance coil having a closed ferrite core suitable for the high frequency, an insulating body acting as a gas nozzle, and a high-voltage electrode mounted in the insulating body are disposed in such a manner that they are permeated or circulated around by process gas. By integrating the plasma nozzle and required control electronics in a miniaturized handheld device, or by using a short high-voltage cable, the invention allows compliance with the electromagnetic compatibility directives and allows the power loss to be minimized and thus a mobile application to be implemented.

Abstract: A pulse plasma matching system includes an RF matching box configured to receive an RF power pulse generated by an RF power source, configured to perform a plasma impedance matching, and configured to apply the RF power pulse to a process chamber, and a network analyzer configured to measure an impedance of plasma generated in a process chamber. A controller is configured to generate a capacitance control signal corresponding to a plasma impedance value measured by the network analyzer, configured to supply the capacitance control signal to the RF matching box, and configured to generate an impedance matching compensation pulse, and a phase shifter is configured to receive the impedance matching compensation pulse and to shift a phase of the impedance matching compensation pulse to synchronize the impedance matching compensation pulse to the RF power pulse.

Abstract: The present invention provides a device and a method for controlling a DC bias of a RF discharge system. Said device comprises a DC bias detection module (302), a mode selection module (301), a DC bias controlling module (303) and a RF power providing module (304). The mode selection module (301) receives a parameter and a type of the parameter. If the type of the parameter is representative of voltage, the DC bias controlling module (303) calculates a power value according to the voltage-related representative parameter and the detected DC bias value, and the RF power providing module (304) provides power according to the calculated power value. If the type of the parameter is representative of power, the RF power providing module (304) provides power according to the power-related representative parameter.

Abstract: A device includes a first substrate having a principal surface having a plurality of sample sites having a corresponding sample; a second substrate having a principal surface facing and spaced apart from the principal surface of the first substrate, the second substrate having a plurality of ultraviolet emission sites corresponding to the sample sites of the first substrate, each of the ultraviolet emission sites being spaced apart from and facing a corresponding one of the sample sites of the first substrate, each of the ultraviolet emission sites being configured to emit ultraviolet light to a corresponding one of the sample sites on the first substrate, and to ionize at least a portion of a sample provided at each sample site; and an ion extraction device configured to extract ions from a gap between the first substrate and the structure.

Abstract: A system and method for over-voltage protection is described. In one embodiment of the invention, an apparatus includes an output port configured to deliver power to a plasma chamber to ignite a plasma. The apparatus also includes a shunt switch in parallel with the output port and a processor configured to receive an indicator of an arc in the plasma. The processor is configured to close the shunt switch for a period of time to divert current away from the arc. The processor is also configured to trigger a pulse of the shunt switch to limit a voltage of an increasing voltage condition associated with the arc.

Abstract: An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

Abstract: The invention relates to a vapor plasma burner (6) comprising a burner handle (6a) and a burner base (6b). Inside the burner base (6b), a liquid feed pipe (32), a heating device (26), a burner chamber (27), a cathode (22), connected to a cathode support (28), and an anode (24) which is configured as a nozzle (23) and has an exit opening (25) are arranged. The invention also relates to a cathode (22) and to a nozzle (23) for such a vapor plasma burner (6). The aim of the invention is to provide a vapor plasma burner (6) that can be optimally ignited and the wearing parts of which can be easily removed.

Abstract: A method and apparatus for initiating and maintaining an abnormal glow volumetric sonoplasma discharge (VSPD). With certain parameters of the electrical discharge and of the intensity of elastic vibrations, it is possible to initiate VSPD within a cavitating liquid medium. The mechanism for the initiation of VSPD is related to the breakdown of gas phase microchannels formed by growth cavitation bubbles. The method for continuous processing uses elastic vibrations in the frequency range 1-100 kHz with enough intensity for the development of cavitation phenomena; these vibrations are introduced into the liquid phase working medium, and a source of direct, alternating, high frequency and ultrahigh frequency electric field in liquid provides the initiation and stable glow of VSPD. Resulting VSPD is characterized by volumetric glow in the frequency range of visible light and ultraviolet radiation in the entire cavitational-electric field and has a rising volt-ampere characteristic curve.

Abstract: Methods and apparatus for gas delivery into plasma processing chambers are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber having a processing volume, a substrate support disposed in the processing volume, an inductively coupled plasma source to generate an electric field within the processing volume that includes one or more regions of local maxima in the magnitude of the electric field, and one or more gas injectors to selectively direct a predominant portion of a process gas flowed through the one or more gas injectors into the one or more regions of local maxima.