Abstract: A spectroscopic ellipsometer system comprising a plurality of individual sources which are sequentially energized to provide a sequence of beams, each of different polarization state but directed along a common locus toward a sample. The preferred spectroscopic ellipsometer system has no parts which move during data collection, and it provides a progressive plurality of sequentially discrete, rather than continuously varying, polarization states.

Abstract: Application of Xenon arc-lamps to provide UV/deep UV wavelengths in spectrophotometer, reflectometer, ellipsometer, polarimeter or the like systems.

Abstract: An ellipsometer having a light source for generating a probe beam along a probe beam path. A polarizing beam splitter passes the probe beam along the probe beam path, at least in part, as the probe beam passes through the beam splitter in a first direction, and diverts the probe beam along a detection path, at least in part, as the probe beam passes through the beam splitter in a second direction that is substantially opposite of the first direction. A compensator variably retards at least portions of the probe beam along at least one axis of the compensator, thereby changing an orientation of the light passing through the compensator. Optics focus the probe beam on a spot on a substrate. A concave mirror receives the probe beam from the spot on the substrate as it travels along the probe beam path in the first direction, and sends the probe beam back along the probe beam path in the second direction. A detector receives the probe beam along the detection path.

Abstract: A method and apparatus for measuring Mueller matrix parameters from scattered light. The apparatus is advantageous for use in countering bioterrorism by detecting information concerning airborne pathogens, particularly microorganism in aerosol form. The system provided is portable, more efficient, and less sensitive to wavelength changes. The method uses variation in retardation over wavelength as opposed to variation in retardation with time.

Abstract: Use of spectroscopic data obtained by investigation of a witness sample having a relatively thick dielectric on a surface thereof during deposition of a thin film onto the witness sample and onto a process sample having no, or a relatively thin dielectric on its surface, in characterizing thin film deposited onto the process sample.

Abstract: In an embodiment, a method of time-domain simulation for simulating scattering spectra is described. The method may provide for computing spatial derivatives including computing spectral derivatives in some portion of the domain and finite difference derivatives in some other portion of the domain; forming an equation for non-reflecting boundary conditions; and computing a time-stepping scheme using a high-order unconditionally stable computation method.

Abstract: A sensor measuring properties of a substrate in which radiation is projected onto the substrate by a radiation projector that has a first part configured such that the radiation projection can project onto the substrate linearly polarized radiation oriented in a first direction and a second part configured such that the radiation projector can project onto the substrate linearly polarized radiation oriented in a second direction orthogonal to the first direction.

Abstract: Method of analyzing the visual properties of a paint film comprising effect pigments illuminated by a light source, characterized in that a first polarizing filter is located between the light source and the paint film and a second polarizing filter is located between the paint film and an imaging detector, and in that the polarization axis of at least one of the polarizers is moved between an orientation substantially at right angles to the orientation of the polarization axis of the other polarizer and an orientation in which the angle between the two polarization axes is smaller.

Abstract: A system and method of preventing substrate backside reflected components in a beam of electromagnetic radiation caused to reflect from the surface of a sample in an ellipsometer or polarimeter system, involving placing a mask adjacent to the surface of the sample which allows electromagnetic radiation to access the sample over only a limited area, wherein the mask can include detector elements for collecting electromagnetic radiation reflected from the sample backside.

Abstract: A sample stage for performing measurements using an optical metrology system includes at least one sample section for retention of a sample, and components for controlling orientation of the sample section with relation to the optical metrology system. A method and a computer program product are provided.

Abstract: In one embodiment, a wafer alignment system, comprises a radiation source to generate radiation, a radiation directing assembly to direct at least a portion of the radiation onto a surface of a wafer, the radiation having a polarization state, an optical analyzer to collect at least a portion of the radiation reflected from the wafer, the wafer including at least a first region having a first grating pattern oriented in a first direction and at least a second region having a second grating pattern oriented in a second direction, different from the first direction.

Abstract: An apparatus for detecting residual oxide or scale present on a metal surface following pickling or mechanical processing of the metal surface to remove scale makes use of laser light that is reflected off of the metal surface, a reflection detector that detects the absolute reflectivity and polarization of the reflecting laser light, a roughness measurement sensor, and a computerized control system that uses combinations of the information from the three sensors to provide an indication of the scale remaining on the metal surface.

Abstract: Application of a spatial filter equivalent constructed from a converging lens and an optical fiber in rotating compensator ellipsometer systems, after a sample system. The purpose is to eliminate a radially outer annulus of a generally arbitrary Profile beam that presents with low intensity level irregular content, so that electromagnetic beam intensity is caused to quickly decay to zero as a function of radius.

Abstract: A structure having a number of traces passing through a region is evaluated by using a beam of electromagnetic radiation to illuminate the region, and generating an electrical signal that indicates an attribute of a portion (also called “reflected portion”) of the beam reflected from the region. The just-described acts of “illuminating” and “generating” are repeated in another region, followed by a comparison of the generated signals to identify variation of a property between the two regions. Such measurements can identify variations in material properties (or dimensions) between different regions in a single semiconductor wafer of the type used in fabrication of integrated circuit dice, or even between multiple such wafers. In one embodiment, the traces are each substantially parallel to and adjacent to the other, and the beam has wavelength greater than or equal to a pitch between at least two of the traces. In one implementation the beam is polarized, and can be used in several ways, including, e.g.

Abstract: Systems and methods for measuring one or more characteristics of patterned features on a specimen are provided. One system includes an optical subsystem configured to acquire measurements of light scattered from the patterned features on the specimen at multiple angles of incidence, multiple azimuthal angles, and multiple wavelengths simultaneously. The system also includes a processor configured to determine the one or more characteristics of the patterned features from the measurements. One method includes acquiring measurements of light scattered from the patterned features on the specimen at multiple angles of incidence, multiple azimuthal angles, and multiple wavelengths simultaneously. The method also includes determining the one or more characteristics of the patterned features from the measurements.

Abstract: Optical systems and methods that simultaneously measure optical constants (n, k) and thickness of thin films. The systems and methods use of differential polarimetry (differential analysis of spectroscopic multi-angle reflection and ellipsometric data) to measure optical constants (n k) and thickness of ultra-thin films.

Abstract: A substantially achromatic multiple element compensator system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems. Multiple total internal reflections enter retardance into an entered beam of electromagnetic radiation, and the elements are oriented to minimize changes in the net retardance vs. the input beam angle resulting from changes in the position and/or rotation of the system of elements.

Abstract: An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.

Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.

Abstract: A polarimeter for receiving input electromagnetic radiation characterized by a polarization state and for determining the polarization state. The polarimeter includes a refractive arrangement for refracting the input electromagnetic radiation so as to provide a spatial pattern corresponding to the polarization state, and an image analysis arrangement for receiving the spatial pattern, producing an electronic image of the spatial pattern, and for determining the polarization state of the input electromagnetic radiation according to the electronic image of the spatial pattern.

Abstract: This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.

Abstract: Maintenance of information content in a focused beam of electromagnetic radiation when the intensity thereof is attenuated by application of an aperture-like element.

Abstract: An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter, a first polarization parameter, a second polarization parameter, and a third polarization parameter.

Abstract: A system for probing a DUT is provided, the system comprising a tunable or CW laser source, a modulator for modulating the output of the laser source, a beam optics designed to point a probing beam at a designated location on the DUT, optical detector for detecting the reflected beam, and collection and signal processing electronics. The system deciphers perturbations in the reflected beam by detecting beat frequency between operation frequency of the DUT and frequency of the modulation. In an alternative embodiment, the laser is CW and the modulation is applied to the optical detector.

Abstract: Signal modules and methods for electrically interfacing with an electronic device are provided. The signal module includes a dielectric and a conductor extending through a surface of the dielectric. The surface of the dielectric is located away from perpendicular relative to an axis of the conductor and is located based on an electromagnetic field produced as a result of a signal flowing through the conductor.

Abstract: A system for reducing reflections of a beam of electromagnetic radiation from the opposite, back, surface of an anisotropic sample, including methodology for investigating the incident, front, surface thereof with electromagnetic radiation, and analyzing the data as if the sample is isotropic.

Abstract: A method for implementing ellipsometry for an ultrathin film includes directing a polarized light beam incident upon a sample surface, receiving an initial reflected beam from the sample surface and redirecting the initial reflected beam back upon said sample surface one or more times so as to produce a final reflected beam. The final reflected beam is received through an analyzer and at a detector so as to determine characteristics of the ultrathin film.

Abstract: An exposure system includes an exposure tool configured to project grating patterns oriented in different directions onto test areas by a linearly polarized light, respectively, each of the grating patterns having a space width preventing higher order diffracted lights from an image formation, a data collector configured to collect sets of test optical intensity data on the test areas, and a polarization direction monitor configured to monitor a polarization direction of the linearly polarized light by comparing the sets of the test optical intensity data.

Abstract: A wiring pattern inspection apparatus comprises a light source, a parallel light guiding section which guides light from the light source substantially in parallel, and a light extraction section which extracts a transverse wave light component crossing the light guiding direction at right angles from the light guided by the parallel light guiding section and which converts the transverse wave light component into a specific polarized component and which irradiates a work with the specific polarized component and which extracts a vertical wave light component from reflected light obtained by reflecting the emitted specific polarized component by the work.

Abstract: Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.

Abstract: A periodic structure is illuminated by polychromatic electromagnetic radiation. Radiation from the structure is collected and divided into two rays having different polarization states. The two rays are detected from which one or more parameters of the periodic structure may be derived. In another embodiment, when the periodic structure is illuminated by a polychromatic electromagnetic radiation, the collected radiation from the structure is passed through a polarization element having a polarization plane. The element and the polychromatic beam are controlled so that the polarization plane of the element are at two or more different orientations with respect to the plane of incidence of the polychromatic beam. Radiation that has passed through the element is detected when the plane of polarization is at the two or more positions so that one or more parameters of the periodic structure may be derived from the detected signals.

Abstract: In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180° of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, asymmetry of the scatterometer can be corrected.

Abstract: Methods for characterizing a semiconductor material using optical metrology are disclosed. In one respect, a electromagnetic radiation source may be directed in a direction substantially parallel to patterns on a semiconductor material. A polarized spectroscopic reflectivity may be obtained, and a critical point data may be determined. Using the critical point data, physical dimensions of the patterns may be determined. In other respects, using optical metrology techniques, a critical point data relating to electron mobility may be determined.

Abstract: This method comprises the steps of transmitting a beam of light onto a surface (17) of an element (1) comprising a fissile material, passing the beam of light reflected by the surface into a polarisation analyser (27) having a modifiable analysis direction, transmitting the beam from the polarisation analyser (27) to a device (31) for acquiring digital images, acquiring at least one digital image (31) of the surface (17) of the element (1) and processing the digital image acquired in order to measure the anisotropy. Use, for example, in controlling particles of nuclear fuel for an HTR/VHTR type reactor.

Abstract: In one embodiment, the present invention is directed to a multi-energy polarization imaging method consisting of a multi-fusion, dual-rotating retarder/multiple-energy complete Mueller matrix-based polarimeter and dual-energy capabilities. By subtracting polarimetric parameters such as degree of polarization, degree of linear polarization, degree of circular polarization, respectively, obtained with interrogation light beams of wavelengths ?1, and ?2, the system of the present invention can obtain, in one embodiment, enhanced imaging.

Abstract: A nonlinear birefringent waveguide is used for four wave mixing, wavelength conversion, Raman amplification, etc. In order to adjust the polarization of the input light to such waveguide 14, a polarization controller 10 is provided. And at the output side of the waveguide 14, a polarization beam splitter is provided. The polarization beam splitter splits one of orthogonal polarizations which is not desired to be passed through. The power of the split light is detected at photodiode 13. The detection signal of the photodiode 13 is fed back to the polarization controller 10. The polarization controller 10 controls the polarization of input light so that the power of light detected at the photodiode 13 is minimized.

Abstract: Reflectometer, ellipsometer, polarimeter or the like system, which functionally comprise means for providing gas confined in a mini-chamber near the surface of a sample, at a location at which a beam having UV, VUV, IR and NIR wavelengths of electromagnetic radiation is caused to be impinged thereupon.

Abstract: A receiver including an analyzer and a detector coupled to the output of the analyzer. The analyzer selects a polarized component of a return beam for input to the detector. The analyzer may be linear, circular or elliptical. Coupled with a laser adapted to output a polarized beam, the receiver provides an active optical ‘target detector. An arrangement may be included for compensating for rotation and ellipticity in the returned beam. In one embodiment, the arrangement for compensating for rotation of the orientation of linear polarization in the returned beam includes a Faraday rotator positioned between the transmitter and the analyzer. An arrangement is disclosed for varying the rotation in the returned beam using a Faraday rotator until a maximum transmittance is achieved. In an alternative embodiment, the arrangement for compensating for ellipticity in the returned beam includes an electro-optical modulator positioned between the transmitter and the analyzer.

Abstract: A method for determining a property of a layered structure includes receiving information defining a characteristic angle for a structure. The characteristic angle is such that, after performance of a process that changes a thickness of a first layer adjacent a second layer of the structure, light reflected from a beam that impinges at the characteristic angle on an interface that will be formed adjacent the second layer has predominantly a first polarization. After receiving the information and during the process, a light beam is directed onto the structure at the characteristic angle. The light beam includes at least a first component having the first polarization and a second component having a second polarization. Light that the structure reflects from the light beam is detected. A signal is generated upon detecting that a proportion of the reflected light that has the first polarization undergoes a change meeting a predefined criterion.

Abstract: Gas purge systems and methods and a spectroscopic ellipsometer are disclosed. A purge gas system may include an input beam optics housing, a collection optics housing and a gas purge manifold. The input beam optics housing may include a first gas flow path between a first gas inlet and an aperture in a first nose cone proximate a measurement position. The collection optics housing may include a second gas flow path between a second gas inlet and an aperture in a second nose cone proximate the measurement position. The gas purge manifold may be disposed between the input beam optics housing and the collection optics housing. The gas purge manifold has a third gas flow path between a third gas inlet and an aperture in the gas manifold proximate the measurement position. The ellipsometer may include input beam optics in the input beam optics housing and collection optics in the collection optics housing.

Abstract: Methods for the quantification of hydrophilic properties of a porous material, as well as determining a depth of damage of a porous material are disclosed. An example method includes performing a first ellipsometric measurement on the porous material using a first adsorptive having a first wetting angle. The example method further includes performing a second ellipsometric measurement on the porous material using a second adsorptive having a second wetting angle, wherein the first and second wetting angles are different towards the porous material. The hydrophilic properties of the porous material are determined based, at least in part, on the first and second ellipsometric measurements.

Abstract: The invention relates to an electronic polarimetric imaging system use in a colposcopy device for in vivo monitoring a cervix, which is provided with a light source for illuminating the observable cervix and at least visual means for monitoring said cervix, wherein the illumination optical path directed to the cervix and the image optical path coming back from the cervix are separated from each other on at least a portion of the paths thereof. The inventive system comprises a polarimetric adapter housing which is removable in the separated portion of the illumination and image optical paths and comprises a polarization state generator (PSG) positioned on the illumination optical path and a polarization analyser (PSA) positioned on the image optical path, wherein said polarization state generator (PSG) and polarization analyser (PSA) are designed in such a way that they are controllable. Said invention makes it possible to obtain several polarimetric characterisation levels.

Abstract: The present invention refers to the simultaneous measurement of four separately polarized beams upon diffraction from a substrate in order to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beam splitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.

Abstract: An in-line, in-process or in-situ and non-destructive metrology system, apparatus and method provides composition, quality and/or thickness measurement of a thin film or multi-layer thin film formed on a substrate in a thin film processing system. Particularly, the subject invention provides a spectroscopic ellipsometer performing spectroscopic ellipsometry while the wafer is in a thin film processing system. In one form, the spectroscopic ellipsometer is associated with a wet bench system portion of the thin film processing system. The spectroscopic ellipsometer obtains characteristic data regarding the formed thin film to calculate penetration depth (Dp) for a thin film formed on the substrate. Particularly, the ellipsometer obtains an extinction coefficient (k) which is used to calculate penetration depth (Dp). Penetration depth (Dp), being a unique function of the extinction coefficient (k) provides the information for the composition, quality and/or thickness monitoring of the thin film.

Abstract: A small and high-speed polarization analysis device and ellipsometer having no driving section are provided by overlapping one polarizer array rendered by arranging a plurality of polarizer regions of mutually different optical axis directions in the form of stripes and one wavelength plate array rendered by arranging a plurality of wavelength plate regions of fixed retardation and mutually different optical axis directions in the form of stripes so that the respective stripes of the plurality of polarizer regions and of the plurality of wavelength plate regions intersect one another and by disposing a light-receiving element array so that the intensities of light that has passed through the matrix-like intersection parts can be individually measured.

Abstract: An optical measurement system having a spectrophotometer and a ellipsometer is calibrated, the spectrophotometer and the ellipsometer first being calibrated independently of one another. A spectrophotometer layer thickness (dphoto) of a specimen is then determined at an initial angle of incidence (?init) using the spectrophotometer. An ellipsometer layer thickness (delli) of the specimen is then determined using the layer thickness determined with the ellipsometer. The spectrophotometer and the ellipsometer are matched to one another by varying the initial angle of incidence (?init) until the absolute value of the difference between the spectrophotometer layer thickness (dphoto) and the ellipsometer layer thickness (delli) is less than a predefined absolute value.

Abstract: Disclosed is an optical sensing device including a source unit providing a beam of light with continuously modulated phase retardation between p- and s-polarization components of the light by employing a LCM; a reference unit receiving a first part of the light to provide a reference signal; a SPR sensing unit receiving a second part of the light to induce a phase retardation change between the p- and s-polarization components due to SPR associated with a sample; a probe unit receiving the light after SPR to provide a probe signal; and a detection unit connected to the reference unit and the probe unit to detect characteristics of the sample by comparing the reference signal with the probe signal. By using active phase modulation technologies and differential phase measurement, it is possible to fulfill chemical and biological detection.

Abstract: An illumination subsystem configured to provide illumination for a measurement system includes first and second light sources configured to generate light for measurements in different wavelength regimes. The illumination subsystem also includes a TIR prism configured to be moved into and out of an optical path from the first and second light sources to the measurement system. If the TIR prism is positioned out of the optical path, light from only the first light source is directed along the optical path. If the TIR prism is positioned in the optical path, light from only the second light source is directed along the optical path. Various measurement systems are also provided. One measurement system includes an optical subsystem configured to perform measurements of a specimen using light in different wavelength regimes directed along a common optical path. The different wavelength regimes include vacuum ultraviolet, ultraviolet, visible, and near infrared wavelength regimes.

Abstract: A method for classifying defects of an object includes irradiating lights having different polarizations onto the object to create an inspection spot on the object, collecting scattered lights generated by the irradiated lights scattering from the inspection spot, and classifying defects of the object by type of defect by analyzing the scattered lights. An apparatus for classifying defects of an object includes light creating means emitting lights having different polarizations to create an inspection spot on the object, and a detecting member for collecting scattered lights that are created from the lights scattering from the inspection spot, wherein the scattered lights are analyzed and classified in accordance with defects positioned on the inspection spot of the object.

Abstract: A scanner device includes a support surface for the measured object and a drive unit for moving a color measuring head across the support surface in at least one dimension thereof and for adjusting the height of the color measuring head in the direction perpendicular to the support surface, as well as a measuring and drive control unit activating the drive unit and cooperating with the color measuring head (MH). The color measuring head (MH) is equipped with at least an illuminating channel (IC) and a collection channel (CC). The illuminating channel (IC) has a light source (10) and optical means (12-22) for illuminating the measured object (S) at a measurement site at a mean angle of incidence of 45 E.