Abstract: A method for testing a polarization state of polarized light includes forming a test photosensitive film on a test wafer, the test wafer having a flat surface and a grid pattern in which reflectance changes depending on a polarization direction of the polarized light, exposing the test photosensitive film to the polarized light, measuring a change of a property of the test photosensitive film caused by the polarized light, and determining a polarization state of the polarized light, based on the change.

Abstract: A system and method for inspection a substrate for various defects is herein disclosed. Polarizing filters are used to improve the contrast of polarization dependent defects such as defocus and exposure defects, while retaining the same sensitivity to polarization independent defects, such as pits, voids, cracks, chips and particles.

Abstract: A surface profile measuring apparatus includes a light source assembly, a spatial light modulator, a spectroscope, a wave-front sensor, and a control-processing device. The light source assembly has a liquid crystal display pixel structure and is configured for providing parallel light. The spatial light modulator is positioned to receive the light from the light source assembly. The spectroscope is positioned to receive the light from the spatial light modulator. The wave-front sensor is positioned to receive the light from the spectroscope. The control-processing device is electrically connected to the spatial light modulator and the wave-front sensor. The surface profile measuring apparatus can measure the surface profile of an object and not contact the surface of the object in cooperation with the spatial light modulator, the spectroscope and the wave-front sensor. Therefore, the surface of the object is protected from being damaged.

Abstract: The present invention relates to a method of aligning comprising providing a support, applying a transparent layer, patterning at least the transparent layer to produce a pattern and an alignment feature capable of scattering light, illuminating the support and the transparent layer with oblique lighting, providing an analysis system capable of sensing scattered light from the alignment feature and referencing, sensing the scattered light from the alignment feature; referencing the scattered light from the alignment feature to a position on said support; and aligning a second operation to the position.

Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract: An optical system includes both a microspot broadband spectroscopic ellipsometer and a photoacoustic film thickness measurement system that are supplied laser light by the same laser light source. One of the systems makes a measurement, the result of which is used to adjust a parameter of the other system; e.g. the ellipsometer measures thickness and the photoacoustic system uses the thickness result to measure the speed of sound. In one version, the ellipsometer converts the laser beam to a broad-spectrum beam that provides higher intensity.

Abstract: Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab.

Abstract: A reflectometer, ellipsometer, polarimeter or the like system with aperture, focusing means, sample and optionally detector planes oriented so that the Scheimpflug condition is substantially met on incident and/or, optionally, reflection sides of a sample. In addition beneficial aperture hole aspect ratio and aperture plane orientation is described.

Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

Abstract: A food inspection apparatus 1 or 2 includes a light source or a plurality of light sources 10 that outputs near infrared light L1, and a detector unit 20 that measures a diffuse reflectance spectrum of light which is the near infrared light L1 and is diffusively reflected from an object 50 from among. The light source 10 and a detector unit 20 are arranged such that an angle defined by an optical path L2, along which the near infrared light is regularly reflected at a surface of the object, or an optical path L5, along which the near infrared light is transmitted through the object, and a straight line L3 or L6 connecting an irradiation position P1 or P2 on the surface of the object irradiated with the near infrared light and the detector unit 20, is 45 degrees or greater.

Abstract: The present invention provides a method for reducing spreading of a pulse in a transmission line, said spreading being as a result of polarization mode dispersion, comprising inducing predetermined polarization rotations of particle or wave components of the pulse in the transmission line.

Abstract: Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems.

Abstract: Metrology systems and methods that measure thin film thickness and or index of refraction of semiconductor wafers with at least one deposited or grown thin film layer. The present invention measures near normal incidence and grazing angle of incidence reflection (using reflected broadband UV, visible, and near infrared electromagnetic radiation) from a small region on a sample. Embodiments of the system selectively comprise a near-normal incidence spectrometer/ellipsometer, a high angle of incidence spectrometer/ellipsometer, or a combination of the two.

Abstract: Apparatus and methods for detecting and analyzing spectral polarimetric images are disclosed. Spectral polarimetric images are detected by selecting spectral bands of light within light received from a light source and capturing polarimetric images of the selected spectral bands of light. Spectral polarimetric images are analyzed by converting spectral polarimetric images to Stokes images and selecting two or more of the Stokes images for analysis.

Abstract: In an apparatus for detecting a position of a substrate in a film thickness measuring apparatus, an image pickup area on a substrate by an image pickup device of an imaging part is rotated by a rotation mechanism of a position detecting part. With this operation, an image of an edge of the substrate can be easily picked up at a plurality of image pickup positions around a central axis to detect a position of the substrate, without providing a mechanism for rotating a stage holding the substrate. As a result, it is possible to suppress upsizing of a structure for detecting a position of the substrate in the film thickness measuring apparatus and to achieve high-speed and high precision-position detection of the substrate, as compared with a conventional apparatus where a mechanism for rotating a substrate is provided above a mechanism for moving the substrate in a horizontal direction.

Abstract: Systems which utilize electromagnetic radiation to investigate samples and include at least one spatial filter which has an aperture having a hole therethrough with a non-unity aspect ratio.

Abstract: The invention is directed to find a false defect from defect candidates and obtain a threshold with which the false defect can be eliminated by the smallest number of review times. Defect candidates are reviewed and selected as a defect or a false defect. By deleting a defect candidate having a characteristic quantity equal to or less than that of the false defect from a map or displaying it in another sign, the false defect can be determined visually. Since the defect candidate having the characteristic quantity equal to or less than that of the selected false defect is deleted from the map or displayed in another sign, the defect candidates unnecessary to set a threshold are not reviewed. The number of defect candidates to be reviewed can be largely reduced as compared with that in the conventional technique. Further, by repeating the above work, the threshold is automatically calculated, and an inspection result map with the threshold is displayed, so that a re-inspection is unnecessary.

Abstract: A method for ascertaining and monitoring the fill level of a medium in a container according to the travel-time measuring method, wherein, via a first coupling element of an antenna, high-frequency transmission signals are transmitted with a predetermined polarization plane (11) of the electric field, wherein the polarization plane of an electric field of the transmission signal is oriented essentially at a plane angle (?) of approximately 45° to a plane (NL), which contains a propagation vector (kS) of the transmission signal and the surface normal of an inner wall of the container or the surface normal of a disturbance element in the container, and wherein the fill level is ascertained on the basis of the reflection signal coupled back into the first coupling element.

Abstract: A position detecting apparatus for detecting position of an object disposed in a first space by receiving light from the object with a light receiving element disposed outside said first space, said position detecting apparatus includes an optical system for directing light from the object to the light receiving element, and a first optical element transmitting light from the object, disposed in a partitioning member for partitioning said first space and space outside said first space, wherein said first optical element is located on a position on or near a pupil plane or a plane conjugate to the pupil plane of said optical system.

Abstract: A polishing end point detection method is to detect a polishing end point of a workpiece having a multilayer structure. The method is performed by emitting a first light and a second light to a surface of the workpiece at a first angle of incidence and a second angle of incidence, respectively, receiving the first light and the second light reflected from the surface through a polarizing filter, performing a first analyzing process of analyzing a brightness and a saturation of the surface from the first light received, performing a second analyzing process of analyzing a brightness and a saturation of the surface from the second light received, and determining removal of the upper layer based on changes in the brightness and the saturation of the surface.

Abstract: A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

Abstract: A sample stage for performing measurements using an optical metrology system includes at least one sample section for retention of a sample, and components for controlling orientation of the sample section with relation to the optical metrology system. A method and a computer program product are provided.

Abstract: A method and apparatus for accurately retrieving the position of an optical feature. The method uses the optical properties of biaxial crystals to conically refract the optical feature and transform the image of the optical feature to a circular ring structure. The position of the optical feature is then calculated by locating a center point associated with the circular ring structure.

Abstract: An electromagnetic beam chromatic shifting and directing means for use in reflectively directing a spectroscopic beam of electromagnetic radiation while simultaneously de-emphasizing intensity in a first range of wavelengths, (eg. the Visible wavelengths), and simultaneously relatively emphasizing intensity in another wavelength range, (eg. UV wavelengths).

Abstract: A spectroscopic ellipsometer has a polarized light generating part for generating elliptically polarized lights of a plurality of wavelengths included in a predetermined measurement wavelength band from white light and directing the elliptically polarized lights to a measurement surface of a substrate, a rotating analyzer where reflected light reflected on the measurement surface enters, and a spectrometer for acquiring spectral intensity of light from the rotating analyzer. A polarization state acquiring part in a control part acquires a polarization state at each wavelength in the measurement wavelength band of the reflected light.

Abstract: A receiver including an analyzer and a detector coupled to the output of the analyzer. The analyzer selects a polarized component of a return beam for input to the detector. The analyzer may be linear, circular or elliptical. Coupled with a laser adapted to output a polarized beam, the receiver provides an active optical target detector. An arrangement may be included for compensating for rotation and ellipticity in the returned beam. In one embodiment, the arrangement for compensating for rotation of the orientation of linear polarization in the returned beam includes a Faraday rotator positioned between the transmitter and the analyzer. An arrangement is disclosed for varying the rotation in the returned beam using a Faraday rotator until a maximum transmittance is achieved. In an alternative embodiment, the arrangement for compensating for ellipticity in the returned beam includes an electro-optical modulator positioned between the transmitter and the analyzer.

Abstract: A sample investigation system (ES) in functional combination with an alignment system (AS), and methodology of enabling very fast, (eg. seconds), sample height, angle-of-incidence and plane-of-incidence adjustments, with application in mapping ellipsometer or the like systems.

Abstract: The invention provides a method for acoustically and optically characterizing an immersed object of interest by generating a serial plurality of acoustic and optical illumination pulses through a liquid. In addition to the spectral analyses/imaging of objects/environment made possible by the white-light illumination, a target material can be ablated, generating an ionized plume to spectrally identify the target's constituent atoms.

Abstract: This invention concerns the in-situ and real-time determination of thickness, optical properties and quality of transparent inorganic thin films (oxides, nitrides) and organic materials during their growth and during modification of transparent polymeric materials, with the use of Spectroscopic Ellipsometry, with measurements in the spectral region of Vis-FUV from 1.5-6.5 eV, and IR from 0.1-0.49 eV (900-4000 cm?1). This method can be used in-line for the monitoring and/or control of the processes in air and in vacuum, that concern substrates on which the thin films will be grown, and of the growth processes of transparent oxides, nitrides and other inorganic and organic films with final result the production of integrated systems with desirable properties.

Abstract: System for, and method of ellipsometric investigation of and analysis of samples which have, for instance, a non-random effectively “regular” textured surface, and/or a surface characterized by an irregular array of faceted structures.

Abstract: Quasi-achromatic multi-element lens(es), the elements of which are mounted with respect to one another in a temperature controlled mounting system, and the application thereof in focusing, (and/or colliminating), a spectroscopic electromagnetic beam into a very small, chromatically relatively undispersed, area spot on a material system, and application thereof in ellipsometer, polarimeter and the like systems.

Abstract: Image data is acquired, processed, and/or displayed in accordance with an embodiment of the present disclosure to display, monitor, and/or demonstrate the progress of an experiment substantially in real-time and with high sensitivity. In one embodiment, at least one time-resolved value of spatially distributed polarization change data is provided and displayed. Advantageously, real-time processing and display of data is provided such that discussion and collaboration about the experiment may occur, time-resolved data is not lost, and resources are not wasted.

Abstract: A method of configuring a system for introducing a relative phase retardation into orthogonally polarized components of an electromagnetic beam entered thereinto, wherein the system involves a substantially achromatic multiple element retarder system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems.

Abstract: A confocal scanning microscope system (10) using cross polarization effects and an enhancement agent (acetic acid) to enhance confocal microscope reflectance images of the nuclei of BCCs (basal cell carcinomas) and SCCs (squamous cell carcinomas) in the confocal reflectance images of excised tumor slices. The confocal scanning microscope system having a laser (11) for generating an illumination beam (12), a polygon mirror (18) for scanning the beam to a tissue sample (22) and for receiving a returned beam from the tissue sample and detector (28) for detecting the returned beam to form an image. The system further includes a half-wave plate (13) having a rotatable stage (14) and a quarter-wave plate (21) having a rotatable stage (20) disposed in the optical path of the illumination beam and at least a linear polarizer (24) having a rotatable stage (25) disposed in the optical path of the returned beam from the tissue sample.

Abstract: An optical technique to improve the imaging of a target inside suspensions of scattering particles includes the illumination of the scattering particles with circularly polarized light. The backscattered light from the host medium preserves the helicity of incident light, while the backscattered light reflected from the target is predominated with light of opposite helicity. Based on the observed helicity difference in the emerging light that originated at the target and that backscattered from the medium, the present optical technique improves the image contrast using circular polarization. This approach makes use of polarization memory which leads to the reflected light from the target accompanied by weak diffusive backscattered light. Using the present technique, improved imaging of the artery wall is achieved and plaque composition can be assessed through a blood field associated with the artery.

Abstract: To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure.

Abstract: A surface inspection device includes an illumination optical system that illuminates, with a linearly polarized light, a surface of a wafer where a repeated pattern is formed; an alignment stage that holds the wafer; a pick-up optical system that picks up an image of reflected light from the surface of the wafer; an image storage unit that stores the image picked up by the pick-up optical system; an image processing unit that performs predetermined image processing on the image stored in the image storage unit and detects a defect of the repeated pattern; and an image output unit that outputs the results of the image processing by the image processing unit. The orientation of the transmission axis of a second polarizing plate is set to be inclined at 45 degrees with respect to the transmission axis of a first polarizing plate.

Abstract: A method for implementing ellipsometry for an ultrathin film includes directing a polarized light beam incident upon a sample surface, receiving an initial reflected beam from the sample surface and redirecting the initial reflected beam back upon said sample surface one or more times so as to produce a final reflected beam. The final reflected beam is received through an analyzer and at a detector so as to determine characteristics of the ultrathin film.

Abstract: This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.

Abstract: An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.

Abstract: Systems and methodology for orienting the tip/tilt and vertical height of samples, preferably automated, as applied in ellipsometer and the like systems.

Abstract: Metrology systems and methods that measure thin film thickness and or index of refraction of semiconductor wafers with at least one deposited or grown thin film layer. The present invention measures near normal incidence and grazing angle of incidence reflection (using reflected broadband UV, visible, and near infrared electromagnetic radiation) from a small region on a sample. Embodiments of the system selectively comprise a near-normal incidence spectrometer/ellipsometer, a high angle of incidence spectrometer/ellipsometer, or a combination of the two.

Abstract: Disclosed is a method for characterizing a sample having a structure disposed on or within the sample, comprising the steps of applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in the sample, applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample, sensing from a reflection of the second pulse a change in optical response of the sample, and relating a time of occurrence of the change in optical response to at least one dimension of the structure.

Abstract: In a spectroscopic ellipsometer, reflected light reflected on a measurement surface of a substrate is divided into a first polarized light being a linearly polarized component and a second polarized light being a linearly polarized component in a polarization direction perpendicular to the first polarized light, by an analyzer. A polarization state at each wavelength of the reflected light is measured with the first polarized light, and the size and shape of the irradiation region on the measurement surface are detected with the second polarized light. In the spectroscopic ellipsometer, detection of the size and shape of the irradiation region is performed with the second polarized light not used in measurement of the polarization state, out of the reflected light. Therefore, it is possible to detect the size and shape of the irradiation region with high accuracy with highly maintaining the measurement accuracy of the polarization state.

Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.

Abstract: In an apparatus for detecting a position of a substrate in a film thickness measuring apparatus, an image pickup area on a substrate by an image pickup device of an imaging part is rotated by a rotation mechanism of a position detecting part. With this operation, an image of an edge of the substrate can be easily picked up at a plurality of image pickup positions around a central axis to detect a position of the substrate, without providing a mechanism for rotating a stage holding the substrate. As a result, it is possible to suppress upsizing of a structure for detecting a position of the substrate in the film thickness measuring apparatus and to achieve high-speed and high precision-position detection of the substrate, as compared with a conventional apparatus where a mechanism for rotating a substrate is provided above a mechanism for moving the substrate in a horizontal direction.

Abstract: In a spectroscopic ellipsometer, light emitted from a light source enters a measurement surface of a substrate through an optical system in a lighting part so as to incline to the measurement surface to be directed to a light receiving device, and ellipsometry is performed based on spectral intensity of reflected light reflected on the measurement surface, the spectral intensity being acquired by the light receiving device. In focusing of the spectroscopic ellipsometer, a focus position of the measurement surface is obtained based on a total light amount in a predetermined wavelength band of the reflected light, the total light amount being obtained by the light receiving device. In the spectroscopic ellipsometer, since the optical system for ellipsometry and the optical system for focusing are common, it is possible to eliminate influences of change of the optical systems by temperature change or the like and to achieve high accurate focusing.

Abstract: The invention relates to a device for determining the concentration of a substance present in a solution, using ellipsometry. Said device is used for determining the rate of precipitation, which is a measure of the concentration of the substance to be determined The object of the invention is to provide an improved measuring technique based on optical ellipsometry or another technique for measuring the mass bonded to a solid surface (substrate), such as “surface plasmon resonance” (SPR), “quartz crystal microbalance” (QCM) etc, by means of which the concentration of a substance present in a liquid, which liquid is in contact with the substrate, can be measured with a higher degree of accuracy.

Abstract: A surface inspection apparatus includes units illuminating repetitive patterns formed on a surface of a suspected substance and measuring a variation in an intensity of regular reflection light caused by a change in shapes of the repetitive patterns, units illuminating the repetitive patterns with linearly polarized light, setting an angle formed between a repetitive direction of the repetitive patterns and a direction of a plane of vibration of the linearly polarized light at a tilt angle, and measuring a variation in a polarized state of the regular reflection light caused by the change in the shapes of the repetitive patterns, and a unit detecting a defect of the repetitive patterns based on the variation in the intensity and the variation in the polarized state of the regular reflection light.

Abstract: A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.