Abstract: A method and system for overly measurement is disclosed. The overlay measurement is performed based on moiré effect observed between structured illumination grids and overlay targets. A structured illumination is used to illuminate a first overlay target and a second overlay target. Upon obtaining an image of the first overlay target illuminated by the structured illumination and an image of the second overlay target illuminated by the structured illumination, relative displacement between the first overlay target and the structured illumination and relative displacement between the second overlay target and the structured illumination are measured. The overlay between the first overlay target and the second overlay target is then measured based on their relative displacements with respect to the structured illumination.

Abstract: Film grain simulation within a receiver occurs by first obtaining at least one block of pre-computed transformed coefficients. The block of pre-computed transformed coefficients undergoes filtering responsive to a frequency range that characterizes a desired pattern of the film grain. In practice, the frequency range lies within a set of cut frequencies fHL, fVL, fHH and fVH of a filter in two dimensions that characterizes a desired film grain pattern. Thereafter, the filtered set of coefficients undergoes an inverse transform to yield the film grain pattern.

Abstract: The present invention relates to the field of alignment of an ordered stack of images from a sliced specimen. According to the present method and apparatus, the ordered stack of images is aligned by successively determining, for at least two already aligned images of the ordered stack, the respective misalignments with an unaligned image which is to be aligned next, selecting from the at least two aligned images as a reference image that aligned image with which the unaligned image has the smallest amount of misalignment, and aligning the unaligned image with the selected reference image. This is intended to provide a robust and computationally cheap aligning method and apparatus.

Abstract: In a shadow mask-substrate alignment method, a substrate is provided that includes a grate having a plurality of spaced bars and a shadow mask is provided that includes a grate having a plurality of spaced bars. Also provided is a light source-light receiver pair that defines a path of light therebetween. The grate of the substrate and the grate of the shadow mask are caused to be positioned in the path of the light. Thereafter, the orientation of the substrate, the shadow mask, or both are caused to be adjusted to position the grate of the substrate, the grate of the shadow mask, or both until a predetermined amount of light or a predetermined range of an amount of light on the path passing through the grates is received by the light receiver.

Abstract: One embodiment relates to an apparatus for alignment measurement. A laser source generates an incident laser beam which is directed to a two-dimensional target grating on a target substrate such that multiple diffracted beams are created. A beam splitter transmits a first plurality of the multiple diffracted beams onto a first optical path and directs a second plurality of the multiple diffracted beams onto a second optical path. Each of the two optical paths includes a reference grating and a detector. Another embodiment relates to a method of measuring alignment of a target substrate. Other embodiments, aspects and features are also disclosed.

Abstract: An optical imaging system is to be aligned with its optical axis in relation to a given alignment axis. For this, a radiation beam is emitted from one side of the imaging system along the alignment axis. In the direction of beam propagation, there is located behind the imaging system a pair of diaphragm elements, whose apertures are each covered by a piece of material transparent to the radiation, carrying a plurality of sensor elements arranged in a matrix. The sensor elements furnish information about the measured radiation intensity to a signal processing unit, which can graphically illustrate the current alignment status of the imaging system on a monitor and/or produce an automatic adjustment of the imaging system.

Abstract: An exclusion region of interest imaging overlay target includes a self-symmetric target structure including two or more pattern elements, and an additional target structure including two or more pattern elements, wherein each of pattern elements of the additional target structure is contained within a boundary defined by one of the pattern elements of the self-symmetric target structure, wherein the self-symmetric target structure is characterized by a composite exterior region of interest, wherein the composite exterior region of interest is formed by removing two or more exclusion zones corresponding with the pattern elements of the additional target structure from an exterior region of interest encompassing the self-symmetric target structure, wherein each of the pattern elements of the additional target structure is characterized by an interior region of interest, wherein the self-symmetric target structure and the additional target structure are configured to have a common center of symmetry upon alignme

Abstract: A drive system drives a movable body, based on measurement results of a first measurement system which measures the position of the movable body in an XY plane by irradiating a measurement beam from an arm member on a grating placed on a surface parallel to the XY plane of the movable body. In this case, because a configuration in which the arm member irradiates a measurement beam on the grating is employed, there is no adverse effect due to the drive of the moving body, unlike the case when an encoder system is arranged on a stage surface plate. Accordingly, it becomes possible to drive the movable body with good precision.

Abstract: A double-sided maskless exposure system and method consists of light sources which includes two light wavelength segments, maskless optical engines in which a 2D spatial light modulation (spatial light modulator) device, such as DMD, is generating a plurality of pixel array of the pattern, vision system, moving substrate and computer control system. The double-sided maskless exposure system at least includes two maskless optical engines with auto-calibration function which can correct any alignment error in-line. Each optical engine is for each side of the substrate. The optical engines are aligned each other in pairs and are simultaneously patterning on each side of the moving substrate. The system also includes a manipulator for moving, stepping or scanning the optical engines, relative to the substrate so that it can create a contiguous whole image on the both sides of the subject.

Abstract: A method is used to estimate a value representative for a level of alignment mark deformation on a processed substrate using an alignment system. The alignment sensor system is able to emit light at different measuring frequencies to reflect from an alignment mark on the substrate and to detect a diffraction pattern in the reflected light in order to measure an alignment position of the alignment mark. The two or more measuring frequencies are used to measure an alignment position deviation per alignment mark associated with each of the two or more measuring frequencies relative to an expected predetermined alignment position of the alignment mark. A value is determined representative for the spread in the determined alignment position deviations per alignment mark in order to estimate the level of alignment mark deformation.

Abstract: In a measuring probe (40) according to the present invention, measuring light is split into a two or more through a split optical system (12), and, when each split light is received by a light-receiving sensor (13B, 13B, 15B) through an interference filter (13A, 14A, 15A) serving as a color filter, the split light is introduced into the interference filter (13A, 14A, 15A) through a collecting lens group (123C, 14C, 15C) formed as a substantially bilateral telecentric system. The interference filter (13A, 14A, 15A) is formed to obtain a transmittance characteristic corresponding to a measurement parameter, depending on a condition of an intensity distribution with respect to incidents angles of light incident on the interference filter (13A, 14A, 15A). Thus, the measuring probe (40) according to the present invention can reduce an influence of a deviation in the transmittance characteristic due to incident angles, even using the interference filter (13A, 14A, 15A).

Abstract: The present invention provides a method and device for acquiring real-time video images of a terminal, sad method comprising: acquiring light intensity of an existing environment when the terminal acquires the real-time video images; comparing the light intensity of the existing environment with a light intensity threshold value set by the terminal system; acquiring images preset by the terminal and sending the preset images to an existing receiver which is communicating with the terminal if the light intensity of the existing environment is lower than the light intensity threshold value set by the terminal system. The present invention can ensure the quality of video conversation when the light intensity is weak, save power energy, improve the user experience, and is beneficial to promote the video communication terminal.

Abstract: A method and an apparatus are provided to measure a position of a mark with a less measurement error caused by a variation in a wafer process condition. The mark is illuminated with light and an image of the mark is formed, via an optical system, in a light receiving surface of a sensor. The image of the mark is sensed and image data thereof is acquired by the sensor. Correction data of a fundamental frequency and a high harmonic of the image data is set based on information associated with a shape of the mark, an imaging magnification of the optical system, and an imaging area of the sensor. The image data is corrected using the correction data, and the position of the mark is calculated using the corrected image data.

Abstract: According to one embodiment, a measurement mark includes: a first line pattern, first lines extending in a first direction, the first lines arranged in a second direction in the first line pattern, the first line pattern capable of forming a first moire pattern by overlapping with an arrangement pattern including a pattern, and a first polymer and a second polymer being alternately arranged in the pattern; a second line pattern, second lines extending in the first direction, the second lines being arranged in the second direction in the second line pattern, the second line pattern capable of forming a second moire pattern by overlapping with the arrangement pattern; and a reference pattern with a reference position configured to assess a first shift amount from the reference position of the first moire pattern and a second shift amount from the reference position of the second moire pattern.

Abstract: A tester including a laser transmitter, a laser receiver, a zero reference plane located between the laser transmitter and the laser receiver, a tower reference plane located between the laser transmitter and the laser receiver, wherein the tower reference plane defines an aperture, and a controller. The controller is configured to measure a pitch static attitude of a head stack assembly by at least determining a zero axis, determining a first horizontal position of the aperture and a second horizontal position of the aperture, determining a mid-point of a first slider of the head stack assembly, determining a first vertical position of the aperture, determining a first horizontal line, and generating a pitch static attitude reference line corresponding to a pitch static attitude of the first slider based on a least squares approximation using the mid-point of the first slider and the first horizontal line.

Abstract: A method of aligning an upper substrate and a lower substrate is provided. The upper and lower substrates are oppositely arranged, and the aligning method includes the following steps: providing an optical image capturing module; emitting light rays to a third surface of a first prism; filtering the light rays, so that the light rays are divided into light rays at the first wavelength range and light rays at the second wavelength range, wherein the light rays at the first wavelength range irradiate a pattern on the upper substrate, and light rays at the second wavelength range irradiate a pattern on the lower substrate; reflecting a pattern image on the upper substrate to an image capturing apparatus; reflecting a pattern image on the lower substrate to the image capturing apparatus; and determining locations of the patterns of the upper and lower substrate that are on the image capturing apparatus.

Abstract: Alignment of a near field transducer (NFT) optical input coupler and a light emitting device involves providing excitation radiation from an excitation light source through an optical input coupler to the NFT and filtering output radiation from the NFT using a short wavelength pass optical filter. The optical input coupler is scanned through multiple positions while the photoluminescent radiation is detected. A first alignment position between the NFT input coupler and the excitation light source is identified based on the detected photoluminescent radiation. A light emitting device is scanned through multiple positions the light output is detected by a detector. A second alignment position between the light emitting device and the detector is identified. The first and second alignment positions are used to align the light emitting device with the optical input coupler.

Abstract: To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and ? of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.

Abstract: In a lithographic apparatus, a slip of a patterning device relative to a support, the support constructed to support the patterning device, may be provided by measuring a position of the support relative to a first structure of the lithographic apparatus; measuring a position of the patterning device relative to a second structure of the lithographic apparatus; determining a correlation between the position of the patterning device and the position of the support from the measured position of the support, the measured position of the patterning device, and the mutual positions of the first and second structures; and deriving from the correlation a slip of the patterning device relative to the support. The structure may include a projection system to project a radiation beam patterned by the patterning device. The projection system may be connected to a frame, such as a metrology frame of the lithographic apparatus.

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract: An optical reader for interrogating an optical analyte sensor includes a housing, comprising in its interior: at least one light source, a detector, and a programmable logic device. The housing has a registration feature configured to align the optical reader with an optical analyte sensor. Methods for confirming alignment of such optical readers are also disclosed.

Abstract: An exposure apparatus for forming a predetermined pattern on a substrate by using exposure light, includes a stage apparatus which is movable with respect to an optical axis of the exposure light; a light-transmissive member provided at the stage apparatus, wherein a liquid is supplied on an upper surface of the light-transmissive member; and a measurement device which is settable below the light-transmissive member when measurement using the measurement device is performed. Leakage or entrance of a liquid used for exposure into an optical measurement device such as a wavefront aberration measurement device can be prevented, thereby enabling preferable optical adjustment such as imaging performance or optical characteristics.

Abstract: A spectroscopy system for auto-aligning a biopsy collecting device is presented. The spectroscopy system includes an illumination subsystem configured to emit an illumination light towards the biopsy collecting device, whereas the biopsy collecting device includes an activator unit and a needle unit and wherein the needle unit includes a cannula and a stylet having a biopsy specimen. Also, the spectroscopy system includes a fixation subsystem capable of holding the biopsy collecting device and configured to place the needle unit comprising the biopsy specimen across the illumination light. Further, the spectroscopy system includes a detection subsystem configured to receive a light comprising at least one of an attenuated illumination light and a re-emitted light from the needle unit. In addition, the detection subsystem is configured to send a control signal to align the needle unit at a predetermined position in the spectroscopy system based on the received light.

Abstract: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

Abstract: An alignment device for bicycle handlebars that enables them to be accurately aligned relative to the front wheel. The device may include a unitary body and a laser beam emitter. The laser beam emitted may create a visible point of light wherever the beam makes contact with the front wheel, or the bicycle frame, or another component attached to the bicycle frame. The laser beam can be perpendicular to the handlebars. The laser beam emitter is preferably able to be changed by the user. Using the laser beam, and by adjusting the beam's angle of declination or inclination, the user can preferably make fine adjustments to the alignment of the handlebars, relative to the front wheel, and/or another component that is mounted on the bicycle frame, relative to the bicycle frame.

Abstract: Disclosed is a system for aligning a collimator tube with an alignment ring used to hold a film or sensor aligned with the collimator tube. The disclosed alignment system includes a light source, a light detector, and a reflective surface, where, when the collimator and alignment ring are aligned, light emitted from the light source reflects off the reflective surface and is received by the light detector.

Abstract: A device having an overlay mark over a substrate and a method of adjusting multi-layer overlay alignment using the overlay mark for accuracy are disclosed. The overlay mark includes a first feature in a first layer, having a plurality of first alignment segments substantially parallel to each other extending only along an X direction; a second feature in a second layer over the first layer, having a plurality of second alignment segments substantially parallel to each other extending along a Y direction different from the X direction; and a third feature in a third layer over the second layer, having a plurality of third alignment segments substantially parallel to each other extending along the X direction and a plurality of fourth alignment segments substantially parallel to each other extending along the Y direction.

Abstract: An exposure method comprises: a first detection step of detecting a position of a first mark by a first scope; a second detection step of detecting a position of a second mark by a second scope having a magnification higher than the first scope; a first calculation step of calculating a first correction value based on the detection results obtained in the first and second detection steps; a third detection step of detecting a position of a third mark by the second scope after the substrate is aligned based on the first correction value calculated in the first calculation step; a second calculation step of calculating a second correction value based on the detection results obtained in the second and third detection steps; and an exposure step of exposing the substrate after the substrate is aligned based on the second correction value calculated in the second calculation step.

Abstract: A target space ratio of a monitor pattern on a substrate for inspection is determined to be different from a ratio of 1:1. A range of space ratios in a library is determined to include the target space ratio and not include a space ratio of 1:1. The monitor pattern is formed on a film to be processed by performing predetermined processes on the substrate for inspection. Sizes of the monitor pattern are measured. The sizes of the monitor pattern are converted into sizes of a pattern of the film to be processed having a space ratio of 1:1, and processing conditions of the predetermined processes are compensated for based on the sizes of the converted pattern of the film to be processed. After that, the predetermined processes are performed on a wafer under the compensated conditions to form a pattern having a space ratio of 1:1 on the film to be processed.

Abstract: Within area where of four heads installed on a wafer stage, heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the wafer stage is driven based on positional information which is obtained using the first head group, as well as obtain the displacement (displacement of position, rotation, and scaling) between the first and second reference coordinate systems corresponding to the first and second head groups using the positional information obtained using the first and second head groups. By using the results and correcting measurement results obtained using the second head group, the displacement between the first and second reference coordinate systems is calibrated, which allows the measurement errors that come with the displacement between areas on scale plates where each of the four heads face.

Abstract: A beam deflection device including an aluminum disc containing a plurality of lasers, each laser projecting a laser beam substantially along one of the ‘X’, ‘Y’, and ‘Z’ axes of a structural beam to which the device is attached. Wiring is attached to each of the plurality of lasers to provide power and transmit data. Passageways are provided in the solid disc to route the wiring to the exterior. A suction cup on a surface of the device allows it to be attached to the beam by pressing the device against a flat surface area of the beam.

Abstract: An example embodiment relates to an alignment device including an optical aligner system including a plurality of aligners configured to measure a position of a workpiece having a plurality of alignment marks, and an optical member. The optical member is configured to diverge alignment beams reflected from neighboring alignment marks of the plurality of alignment marks and transmit the beams to neighboring aligners of the plurality of aligners respectively if a distance between the neighboring aligners is greater than a distance between the neighboring alignment marks.

Abstract: A tester including a laser transmitter, a laser receiver, a zero reference plane located between the laser transmitter and the laser receiver, a tower reference plane located between the laser transmitter and the laser receiver, wherein the tower reference plane defines an aperture, and a controller. The controller is configured to measure a pitch static attitude of a head stack assembly by at least determining a zero axis, determining a first horizontal position of the aperture and a second horizontal position of the aperture, determining a mid-point of a first slider of the head stack assembly, determining a first vertical position of the aperture, determining a first horizontal line, and generating a pitch static attitude reference line corresponding to a pitch static attitude of the first slider based on a least squares approximation using the mid-point of the first slider and the first horizontal line.

Abstract: Method for determining wheel alignment of a vehicle, which vehicle comprises at least one wheel axle (12, 13, 14) having an axle end with at least one wheel member (2a-b, 3a-b, 4a-b) at a respective longitudinal side of the vehicle. The method comprises steps for determining the out of square of the wheel axle in relation to the longitudinal geometric centerline of the vehicle. A system for carrying out the method is also described.

Abstract: In a method for determining alignment between an optical fiber and a converging or diverging lens, light is directed into an optical fiber of an optical connector with a lens element. The lens element has a front surface forming a lens and a back surface defining a recess, the optical fiber is inserted into the recess and points at the lens, to form a light spot on the front surface. An image of the front surface of the lens is captured and a coordinate system is established. Coordinate values of the center of the lens and of the light spot in the coordinate system are measured. The respective coordinate values of the center of the lens and of the center of the light spot are compared for matching or otherwise to determine correct alignment or otherwise.

Abstract: A method of monitoring combustion properties in an interior of a boiler of the type having walls comprising a plurality of parallel steam tubes separated by a metal membrane. First and second penetrations are provided in the metal membrane between adjacent tubes on opposite sides of the boiler. A beam of light is projected through a pitch optic comprising a pitch collimating lens and a pitch relay lens, both residing outside the boiler interior. The pitch relay lens projects the beam through a penetration into the boiler interior. The beam of light is received with a catch optic substantially identical to the pitch optic residing outside the boiler interior. The strength of the collimated received beam of light is determined. At least one of the pitch collimating lens and the catch collimating lens may then be aligned to maximize the strength of the collimated received beam.

Abstract: Systems and methods for thermal gradient compensation for ring laser gyroscopes are provided. In one embodiment, a method for producing bias compensated angular rate measurements from a ring laser gyroscope comprises: sampling an angle measurement output from a laser block sensor to obtain an angular rate measurement; obtaining an laser block temperature measurement (Tblock) for the laser block sensor; obtaining a temperature gradient measurement (Tdiff) for at least one gradient line across a portion of the laser block sensor; calculating a rate bias error by applying parameters produced from the temperature measurement (Tblock) and the temperature gradient measurement (Tdiff) to a thermal gradient compensation model, wherein the thermal gradient compensation model includes at least one coefficient corresponding to the temperature gradient measurement (Tdiff); and calculating a difference between the angle rate measurement and the rate bias error to produce a bias compensated angular rate measurement.

Abstract: A method and system align a laser diode on a first substrate to a waveguide on a second substrate. The first substrate includes an edge and a first surface adjoining the edge. The laser diode has an emission exit on the edge. The second substrate includes a back side and a side edge. The waveguide has a waveguide input on the back side and directs light along the side edge. A first alignment mark set on the first substrate is aligned to a second alignment mark set on the second substrate. The first alignment mark set corresponds to the emission exit, is formed on the first surface and is visible from the edge. The second alignment mark set corresponds to the waveguide input, is formed on the side edge, and is visible from the back side. The first substrate's edge is affixed to the second substrate's back side.

Abstract: Consistent with the present disclosure, an apparatus for producing a control signal for a laser source is provided, comprising an etalon configured to receive light from the laser source and control circuitry that provides the control signal, wherein the control signal is indicative of a comparison of (a) a difference between a forward transmission signal of the etalon and a backward reflection signal of the etalon and (b) the light received by the etalon from the laser source. Alternatively, the control signal is indicative of a comparison of (a) a difference between a forward transmission signal of the etalon and a backward reflection signal of the etalon and (b) a combination of the forward transmission signal of the etalon and the backward reflection signal of the etalon.

Abstract: A physiological monitoring system may determine a probe-off condition. A physiological sensor may be used to emit one or more wavelengths of light. A received light signal may be processed to obtain a light signal corresponding to the emitted light and an ambient signal. The signals may be analyzed to identify similar behavior. The system may determine whether the physiological sensor is properly positioned based on the analysis.

Abstract: An exemplary aligning module for aligning a lens with a light-emitting diode (LED) chip includes a controlling module, a first image sensing module and a second image sensing module controlled by the controlling module, and a gripping module controlled also by the controlling module. The controlling module controls the first image sensing module and the second image sensing module to sense the light center of the LED chip and the geometric center of the lens, respectively. The controlling module controls the gripping module to bring the geometry center of lens to be aligned precisely with the light center of the LED chip according to a coordinate of the light center the LED and a coordinate of the geometric center of the lens. The present disclosure also relates to a method for aligning a lens with a light emitting diode chip.

Abstract: Exemplary embodiments of the invention relate to an alignment apparatus including a source unit providing an electromagnetic signal, a receiving unit detecting the provided electromagnetic signal, and a polarization element positioned between the source unit and the receiving unit and having a transmissive axis fixed in a predetermined direction. A substrate may be positioned between the source unit and the receiving unit, and may be formed with a polarizer including a plurality of metal lines with a minute linear pattern. The luminance or intensity of the electromagnetic signal may be detected by the receiving unit while rotating the substrate.

Abstract: The invention relates to a system and method for positioning and passively aligning at least one optical component as close as possible to an electromagnetic radiation detector. This system comprises supporting wedges (37) for Z positioning of the optical component (35) as close as possible to the detector (21) and passive X and Y alignment means via holding wedges and/or holding balls (36), the X, Y and Z axes being axes perpendicular to each other.

Abstract: A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets and small targets which are for measuring overlay. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.

Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.

Abstract: Example embodiments are directed to a maskless exposure device and an alignment method. The alignment method performs an overlay of each layer of a plurality of layers on a substrate using a virtual mask in a maskless exposure technique. The maskless exposure device and the alignment method use a virtual mask instead of a physical mask used in a conventional mask exposure, a virtual target mark instead of an alignment mark used in the conventional mask exposure, and perform an overlay per layer, such that the deposition exposure can be achieved in the maskless exposure.

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

Abstract: An alignment feature disposed on a substrate, the alignment feature including a first lithographic pattern having a first aggregate geometric center point defined by a first sub-pattern comprising alignment marks having a first sub-pattern geometric center point arranged a distance (d0) in a first direction from the first aggregate geometric center point, and a second sub-pattern comprising alignment marks having a second sub-pattern geometric center point arranged the distance d0 in a reciprocal direction of the first direction from the first aggregate geometric center point.

Abstract: An optical connector is structured so as to include a fiber connection structure therein. A multi-core fiber is included inside a ferrule, and affixed to the ferrule substrate. One end surface of the multi-core fiber is exposed to an end surface of the ferrule. The other end of the multi-core fiber passes through and is affixed to a capillary. A plurality of optical fiber pass through a capillary that faces the capillary, and are affixed thereto the capillary in the same manner. Seven optical fiber cores of the same diameter are joined in a close-packed arrangement in the fiber connection structure.

Abstract: A device having an overlay mark over a substrate and a method of adjusting multi-layer overlay alignment using the overlay mark for accuracy are disclosed. The overlay mark includes a first feature in a first layer, having a plurality of first alignment segments substantially parallel to each other extending only along an X direction; a second feature in a second layer over the first layer, having a plurality of second alignment segments substantially parallel to each other extending along a Y direction different from the X direction; and a third feature in a third layer over the second layer, having a plurality of third alignment segments substantially parallel to each other extending along the X direction and a plurality of fourth alignment segments substantially parallel to each other extending along the Y direction.