Abstract: A semiconductor device with an OTP memory cell includes a first MOS transistor having a first gate terminal connected to a first line, and a first terminal connected to a first node, a second MOS transistor having a second gate terminal connected to a second line, and a first terminal connected to the first node, and a third MOS transistor having a gate terminal connected to a three line, and a first terminal of the third MOS transistor connected to the first node.

Abstract: A memory device includes a plurality of read only memory cells, a precharge circuit, and a sense amplifier. A read only memory (ROM) cell of the plurality of ROM cells is coupled to a word line and a bit line. The ROM cell comprises a transistor having a first current electrode coupled to receive a reference voltage, a second current electrode selectively coupled to the bit line based on the programmed state of the ROM cell, and a control electrode coupled to the word line. The precharge circuit is coupled to the bit line. The precharge circuit precharges the bit line to a precharge voltage, wherein the precharge voltage is less than the reference voltage. The sense amplifier is coupled to the bit line and to a power supply voltage terminal for receiving a power supply voltage, wherein the reference voltage is less than the power supply voltage.

Abstract: The invention relates to a nonvolatile two-transistor semiconductor memory cell and an associated fabrication method, source and drain regions (2 ) for a selection transistor (AT) and a memory transistor (ST) being formed in a substrate (1). The memory transistor (ST) has a first insulation layer (3 ), a charge storage layer (4), a second insulation layer (5) and a memory transistor control layer (6), while the selection transistor (AT) has a first insulation layer (3 ?) and a selection transistor control layer (4*). By using different materials for the charge storage layer (4) and the selection transistor control layer (4*), it is possible to significantly improve the charge retention properties of the memory cell by adapting the substrate doping with electrical properties remaining the same.

Abstract: An integrated circuit including a plurality of bit lines, a memory array, and a bit line decoder. The memory array includes a plurality of memory cells, wherein each memory cell is respectively coupled to (i) two corresponding bit lines of the plurality of bit lines. During sensing of a state of a given memory cell, the bit line decoder (i) precharges a first bit line of the two corresponding bit lines to which the given memory cell is coupled to a first voltage potential, including precharging all other bit lines on a same side of the memory array as the first bit line to the first voltage potential, and (ii) precharges a second bit line of the two corresponding bit lines to a second voltage potential, including precharging all other bit lines on a same side of the memory array as the second bit line to the second voltage potential.

Abstract: An analog memory circuit, i.e. a sample and hold circuit, wherein the source and the gate of the switching transistor is maintained at a same potential prior and after the sampling process using a transistor circuitry. The analog memory circuit comprises a memory capacitor (102) connected at a first end to a first port (104), which is connected a reference potential (106). A drain of a first transistor (108) —switch transistor—is connected to a second end of the memory capacitor (102). A source of the first transistor (108) is connected to a second port (110), which is connected to circuitry (112) for providing an input signal for storage in the memory capacitor (102), and a gate of the first transistor (108) is connected to a third port (114), which is connected to a first current sink (116). A source of a second transistor (118) is connected to the source of the first transistor (108) and a drain of the second transistor (118) is connected to the gate of the first transistor (108).

Abstract: A high speed sensing scheme for a non-volatile memory array is disclosed. The memory array includes non volatile memory cells arranged in a complementary bitline configuration includes precharge circuits for precharging the bitlines to a first voltage level such as VSS, a reference circuits for applying a reference charge on the reference bitlines of the complementary bitline pairs, and bitline sense amplifiers for sensing a voltage differential between the complementary bitline pairs. A voltage on the data bitline being changed when a programmed non-volatile memory cell connected to an activated wordline couples the wordline voltage to the data bitline.

Abstract: An apparatus and method for providing a read-only memory (ROM) bit cell having one each of a PMOS transistor and an NMOS transistor, which has reduced static and dynamic electric power losses, are described. In particular, the bit cell does not require a pre-charge transistor. The sense amplifier for determining the voltages on ROM bit lines may be a digital inverter, address decoding may be simplified since there are no timing requirements with respect to transistor pre-charge, and chips containing a plurality of ROM bit cell may be readily programmed. In one embodiment of the invention, each bit cell includes one PMOS transistor having its source in electrical connection with a voltage source, its drain connected or unconnected to a bit line, and its gate connected to an inverted version of the word line signal; and one NMOS transistor having its source connected to a lower voltage source, its drain connected or disconnected to the bit line, and its gate connected to the word line.

Abstract: Junction diodes fabricated in standard CMOS logic processes can be used as program selectors for One-Time Programmable (OTP) devices, such as electrical fuse, contact/via fuse, contact/via anti-fuse, or gate-oxide breakdown anti-fuse, etc. The diode can be constructed by P+ and N+ active regions on an N well as the P and N terminals of the diode. The OTP device has an OTP element coupled to the diode. The OTP device can be used to construct a two-dimensional OTP memory with the N terminals of the diodes in a row connected as a wordline and the OTP elements in a column connected as a bitline. By applying a high voltage between a selected bitline and a selected wordline to turn on a diode in a selected cell for suitable duration of time, a current flows through an OTP element in series with the program selector may change the resistance state. The cell data in the OTP memory can also be read by turning on a selected wordline and to couple a selected bitline to a sense amplifier.

Abstract: A semiconductor memory cell array includes an elongated continuous active region. First and second pass transistors are formed in the elongated continuous active region and form part of first and second adjacent memory cells, respectively, of a column of memory cells in the array. An isolation transistor is formed in the elongated continuous active region between the first and second pass transistors and biased in an off state. First and second word lines are coupled to the gates of the pass transistors for applying a reading voltage. The array includes a differential bit line pair including first and second bit lines, a first logic value being encoded into the memory cells by connecting the pass transistors to the first bit line and a second logic value being encoded into the memory cells by connecting the pass transistors to the second bit line.

Abstract: According to one exemplary embodiment, a one-time programmable memory cell includes an access transistor coupled to a shiftable threshold voltage transistor between a bitline and a ground, where the access transistor has a gate coupled to a wordline. The shiftable threshold voltage transistor has a drain and a gate shorted together. A programming operation causes a permanent shift in a threshold voltage of the shiftable threshold voltage transistor to occur in response to a programming voltage on the bitline and the wordline. In one embodiment, the access transistor is an NFET while the shiftable threshold voltage transistor is a PFET. In another embodiment, the access transistor is an NFET and the shiftable threshold voltage transistor is also an NFET. The programming voltage can cause an absolute value of the threshold voltage to permanently increase by at least 50.0 millivolts.

Abstract: Gate oxide breakdown anti-fuse suffers notorious soft breakdown that reduces yield and reliability. This invention discloses circuit and system to enhance electrical field by blocking LDD so that the electrical field is higher and more focused near the drain junction, to make electrical field in the channel more uniform by creating slight conductive or conductive in part or all of the channel, or to neutralize excess carriers piled up in the oxide by applying alternative polarity pulses. The embodiments can be applied in part, all, or any combinations, depending on needs. This invention can be embodied as a 2 T anti-fuse cell having an access and a program MOS with drain area in the program MOS, or 1.5 T anti-fuse cell without any drain in the program MOS. Similarly this invention can also be embodied as a 1 T anti-fuse cell having a portion of the channel made conductive or slightly conductive to merge the access and program MOS into one device with drain area, or 0.5 T anti-fuse cell without any drain.

Abstract: A memory device includes an array of transistors, a plurality of bit lines, and a plurality of source lines. The transistors include gate, drain and source terminals. The gate terminals are electrically coupled to word lines. The plurality of bit lines connect a power source to the drain terminals of the array of transistors and the plurality of source lines connect the power source to the source terminals of the array of transistors. The connections are made active during a standby mode, thereby limiting leakage current without entailing drawbacks associated with degraded memory access/cycle time.

Abstract: A method for operating a one-time programmable read-only memory (OTP-ROM) is provided. The OTP-ROM comprises a first gate and a second gate respectively disposed on a gate dielectric layer between a first doped region and a second doped region on a substrate, wherein the first gate is adjacent to the first doped region and coupled to the first doped region, the second gate is adjacent to the second doped region, the first gate is electrically coupled grounded, and the OTP-ROM is programmed through a breakdown effect. The method comprises a step of programming the OTP-ROM under the conditions that a voltage of the second doped region is higher than a voltage of the first doped region, the voltage of the second gate is higher than a threshold voltage to pass the voltage of the second doped region, and the first doped region and the substrate are at a reference voltage.

Abstract: A memory includes conductive layers provided to extend along the word lines, memory cells each including a diode having a cathode connected to the conductive layer and a source line reading data stored in the memory cells, wherein either the conductive layers or the bit lines are in floating states in a standby time.

Abstract: A bit-line voltage generator is provided. The bit-line voltage generator includes a discharge enhanced bias source and a switch unit.

Abstract: Memory employing a plurality of five-transistor memory bit cells in a memory matrix and a power supply control circuit that is configured to provide a simultaneous full clear to all of the memory bit cells is described herein.

Abstract: Data is stored in a quantum-well type structure with double gate control. According to an example embodiment, a transistor-based data storage circuit includes a gate, a back gate and a semiconductor channel between the gate and the back gate. Carriers are stored in a storage pocket structure in the channel, in response to biases applied to the gate and back gate. Current passing through the channel is sensed and used to detect the stored carriers and, correspondingly, a memory state of the storage circuit.

Abstract: Memory devices are described herein along with method for operating the memory device. A memory cell as described herein includes a first electrode and a second electrode. The memory cell also comprises phase change material having first and second active regions arranged in series along an inter-electrode current path between the first and second electrode.

Abstract: Embodiments provide improved memory bitcells, memory arrays, and memory architectures. In an embodiment, a memory cell comprises a transistor having drain, source, and gate terminals; and a plurality of program nodes, with each of the program nodes charged to a pre-determined voltage and coupled to a respective one of a plurality of bit lines.

Abstract: In an illustrative embodiment, a memory cell comprises a first and a second MOSFET, wherein the first MOSFET undergoes a process to modify the threshold voltage such that a modified threshold voltage represents a first stored logic value. By determining which one of the first and the second MOSFETs has an altered threshold voltage, the stored logic value is determinable. The threshold voltage of the first MOSFET is altered by supplying current through a MOSFET gate, causing a gate heating effect that results in a threshold voltage shift.

Abstract: A memory is so formed that, in a first block and a second block each including a prescribed number of the bit lines arranged therein, positions of the bit lines simultaneously selected in the first and second blocks with reference to ends of the first and second blocks respectively are different from each other.

Abstract: A transistor-based fuse structure is realized in a semiconductor device having a semiconductor substrate, transistor devices formed on the semiconductor substrate, and the transistor-based fuse structure formed on the semiconductor substrate. The transistor-based fuse structure includes a plurality of transistor-based fuses, and the method begins by selecting, from the plurality of transistor-based fuses, a first target fuse to be programmed for operation in a low-resistance/high-current state, the first target fuse having a first source, a first gate, a first drain, and a first gate insulator layer between the first gate and the semiconductor substrate. The method applies a first set of program voltages to the first source, the first gate, and the first drain to cause breakdown of the first gate insulator layer such that current can flow from the first source to the first gate through the first gate insulator layer, and from the first gate to the first drain through the first gate insulator layer.

Abstract: According to one exemplary embodiment, a one-time programmable memory cell includes an access transistor coupled to a shiftable threshold voltage transistor between a bitline and a ground, where the access transistor has a gate coupled to a wordline. The shiftable threshold voltage transistor has a drain and a gate shorted together. A programming operation causes a permanent shift in a threshold voltage of the shiftable threshold voltage transistor to occur in response to a programming voltage on the bitline and the wordline. In one embodiment, the access transistor is an NFET while the shiftable threshold voltage transistor is a PFET. In another embodiment, the access transistor is an NFET and the shiftable threshold voltage transistor is also an NFET. The programming voltage can cause an absolute value of the threshold voltage to permanently increase by at least 50.0 millivolts.

Abstract: Methods and systems for split threshold voltage programmable bitcells are disclosed and may include selectively programming bitcells in a memory device by applying a high voltage to a gate terminal of the bitcells, where the programming burns a conductive hole in an oxide layer above a higher threshold voltage layer in a memory device. The bitcells may comprise an oxide layer and a doped channel, which may comprise a plurality of different threshold voltage layers. The plurality of different threshold voltage layers may comprise at least one layer with a higher threshold voltage and at least one layer with a lower threshold voltage. The oxide may comprise a gate oxide. The bitcell may comprise an anti-fuse device. The layer with a higher threshold voltage may be separated from an output terminal of the bitcell by the at least one layer with a lower threshold voltage.

Abstract: An object is reduction in power consumption of a semiconductor device including a memory circuit. In the semiconductor device including a memory circuit, the memory circuit includes a memory cell including a semiconductor element and a memory cell that does not include a semiconductor element in a region defined by a word line and a bit line which intersect with each other. A transistor formed using an oxide semiconductor so as to have extremely low off-state current is used as the semiconductor element, so that the reading precision is improved and thus low voltage operation can be performed. The memory cells store data high or data low. The memory cell comprising a semiconductor element stores minor data of high and low, and the memory cell that does not comprise the semiconductor element stores major data of high and low.

Abstract: A read-only memory for storing two data values using a single transistor includes a word line, a pair of bit lines, a select line, and a transistor to store data corresponding to each bit lines in the pair of bit lines. The gate terminal of the transistor is connected to the word line, a first diffusion terminal of the transistor is connected to one of the first bit line and the select line based on the first data value and a second diffusion terminal of the transistor is connected to one of the second bit line and the select line based on the second data value.

Abstract: A current detection circuit that can normally perform a current detection operation to detect a current in a memory cell of a memory device even if an applied power supply voltage is a low voltage, includes a current detection means which comprises first and second MOS transistors of a same channel type and third to sixth MOS transistors of a channel type different from the channel type of the first and second MOS transistors, and a MOS gate control means which supplies, to a control electrode of each of the first and second MOS transistors, a voltage which is obtained by subtracting an absolute value of a threshold voltage of each of the first and second MOS transistors from the power supply voltage when the power supply voltage is equal to or lower than the absolute value of the threshold voltage.

Abstract: This disclosure concerns a semiconductor memory device including bit lines; word lines; semiconductor layers arranged to correspond to crosspoints of the bit lines and the word lines; bit line contacts connecting between a first surface region and the bit lines, the first surface region being a part of a surface region of the semiconductor layers directed to the word lines and the bit lines; and a word-line insulating film formed on a second surface region adjacent to the first surface region, the second surface region being a part of out of the surface region, the word-line insulating film electrically insulating the semiconductor layer and the word line, wherein the semiconductor layer, the word line and the word-line insulating film form a capacitor, and when a potential difference is given between the word line and the bit line, the word-line insulating film is broken in order to store data.

Abstract: A memory cell comprises a variable resistance film; a first conductive film having one surface contacted with one surface of the variable resistance film; and a second conductive film having one surface contacted with another surface of the variable resistance film. A width of the first conductive film or the second conductive film in a direction orthogonal to a direction that a current flows in the first conductive film or the second conductive film is smaller than a width of the variable resistance film in a direction orthogonal to a direction that a current flows in the variable resistance film. The width of the first conductive film and the second conductive film is smaller than a width of the first line and the second line in a direction orthogonal to a direction that a current flows in the first line and the second line.

Abstract: A method of generating a ROM bit cell array layout is provided, the method comprising the steps of: inputting a predetermined memory architecture having a predetermined positioning of bit lines and virtual ground lines, said memory architecture comprising a plurality of columns of memory cells, each column of memory cells being located between its own associated bit line and its own associated virtual ground line, and adjacent memory cells in each column of memory cells sharing a common connection to either said associated bit line or said associated virtual ground line; evaluating a possible range of width of active area of each of said columns of memory cells, in dependence on said predetermined positioning of bit lines and virtual ground lines; selecting a final width of active area in dependence on at least one performance characteristic associated with said final width of active area; and generating said ROM bit cell array layout according to said final width of active area.

Abstract: Methods and apparatus for accessing modules on a flash memory package concurrently during testing are disclosed. According to one aspect of the present invention, a memory device for storing data includes a plurality of modules and a logic block. The plurality of modules each include a plurality of storage elements that hold the data. The logic block is arranged to enable the plurality of modules to be accessed in parallel, and is also arranged to enable the plurality of modules to be accessed serially.

Abstract: A Dynamic Random Access Memory (DRAM) cell comprising a leakage compensation circuit. The leakage compensation circuit allows a compensation current from a source to flow to the memory cell storage node of the DRAM cell to compensate the leakage current from the memory cell storage node of the DRAM cell to improve retention time.

Abstract: To provide a semiconductor memory device including an oxide semiconductor that can deal with instability of a threshold characteristic, in which writing is possible by a simple method. The semiconductor memory device functions by utilizing a characteristic that a threshold shifts when a thin film transistor including an oxide semiconductor is irradiated with ultraviolet light. Readout can be performed by setting a readout voltage between the threshold before the ultraviolet light irradiation and the threshold after irradiation. The threshold characteristic of an initial characteristic can be controlled by providing a back gate or by using two thin film transistors.

Abstract: A resistance variable element comprises a first electrode (2), a second electrode (4), and a resistance variable layer (3) which is disposed between the first electrode and the second electrode, and electrically connected to the first electrode and the second electrode, wherein the resistance variable layer comprises material including TaOX (1.6?X?2.2), an electric resistance between the first electrode and the second electrode is lowered by application of a first voltage pulse having a first voltage between the first electrode and the second electrode, and the electric resistance between the first electrode and the second electrode is increased by application of a second voltage pulse having a second voltage of the same polarity as the first voltage, between the first electrode and the second electrode.

Abstract: A ROM array is provided, comprising a plurality of columns of memory cells, wherein each column of memory cells is coupled to a shared bit line which is shared by that column of memory cells and an adjacent column of memory cells. Each column of memory cells has its own associated reference line, which is selectively coupled to a reference potential. Each reference line is coupled to the reference potential when a read operation is performed on a memory cell of the associated column of memory cells. Each reference line is decoupled from the reference potential when a read operation is performed on a memory cell of the adjacent column of memory cells. Both reference lines associated, via their columns of memory cells, to a shared bit line are decoupled from the reference potential when the shared bit line is being pre-charged prior to the read operation. The present invention thus provides a ROM array in which both leakage reduction and speed increase benefits result, whilst providing a high density design.

Abstract: A bit line decoder for sensing states of memory cells of a memory array includes D control devices that selectively communicate with (D?1) bit lines of the memory array. (D?2) of the D control devices are arranged in a first level and two of the D control devices are arranged in a second level of the bit line decoder. The (D?2) control devices are connected to each other in series forming (D?3) junctions. (D?3) of the (D?1) bit lines are directly connected to the (D?3) junctions. Log2(D?2) is an integer greater than 2. A control module generates first control signals that deselect a predetermined number of the D control devices and that select two of the (D?1) bit lines that communicate with one of the memory cells. An isolation circuit to isolate the first level from the second level includes a plurality of isolation devices having first ends that communicate with the (D?2) control devices of the first level and second ends that communicate with the two control devices of the second level.

Abstract: A nonvolatile memory device includes a semiconductor substrate of a first conductivity type, a plurality of word lines on the semiconductor substrate, each the plurality of word lines including a floating gate of a second conductivity type. A ground select line and a string select line are disposed on respective sides of word lines. An impurity region of the second conductivity type underlies a first word line adjacent the ground select line. The device may further include a second impurity region of the second conductivity type underlying a second word line adjacent the string select line. In still further embodiments, the device may further include third impurity regions of the second conductivity type underlying respective third word lines between the first word line and the second word line. Methods of forming such devices are also provided.

Abstract: A method of converting a static random access memory cell to a read only memory cell and the cell thus converted is disclosed. The cell to be converted comprises a data retention portion powered by a higher and lower voltage supply line and four transistors arranged as two cross coupled inverters. It is converted to a read only memory cell by severing a connection between at least one of said transistors within a first of said two inverters and one of said voltage supply lines such that when powered said first inverter outputs a predetermined value.

Abstract: A semiconductor memory cell array is disclosed which comprises an elongated continuous active region, a first transistor formed in the elongated continuous active region, the first transistor forming a first single-transistor memory cell, a second transistor also formed in the elongated continuous active region, the second transistor forming a second single-transistor memory cell and being the closest memory cell to the first single-transistor memory cell along the elongated direction, and an isolation gate formed on the elongated continuous active region between the first and second transistor, wherein the isolation gate has substantially the same structure as gates of the first and second transistor, and is supplied with a predetermined voltage to shut off any active current across a section of the elongated continuous active region beneath the isolation gate.

Abstract: A semiconductor memory cell array includes an elongated continuous active region. First and second pass transistors are formed in the elongated continuous active region and form part of first and second adjacent memory cells, respectively, of a column of memory cells in the array. An isolation transistor is formed in the elongated continuous active region between the first and second pass transistors and biased in an off state. First and second word lines are coupled to the gates of the pass transistors for applying a reading voltage. The array includes a differential bit line pair including first and second bit lines, a first logic value being encoded into the memory cells by connecting the pass transistors to the first bit line and a second logic value being encoded into the memory cells by connecting the pass transistors to the second bit line.

Abstract: In a programmable circuit making use of fuse cells, a snapback NMOS or NPN transistor or SCR without reversible snapback capability is used as an anti-fuse, and programming comprises biasing the control electrode of the transistor to cause the transistor to go into snapback mode.

Abstract: One-time programmable (OTP) nonvolatile fuse memory cells are disclosed that do not require decoding or addressing for reading their data content. Each fuse memory cell has its content latched at its output and available at all times and can be used, for example, for code storage memories, serial configuration memories, and as individual fuse bits for ID (identification), trimming, and other post-fabrication System-on-Chip (SoC) customization needs. Means are also provided for temporary data storage for design testing, etc. In alternative embodiments, using two differentially programmed fuses in a single memory cell, the selection and programming circuitry are merged.

Abstract: A memory structure includes a first memory cell and a second memory cell located at an identical bit line and adjacent to the first memory cell. Each memory cell includes a substrate, a source, a drain, a charge storage device, and a gate. A method for programming the memory structure includes respectively providing a first gate biasing voltage and a second gate biasing voltage to the gates of the first memory cell and the second memory cell, boosting an absolute value of a channel voltage of the first memory cell to generate electron and hole pairs at the drain of the second memory cell through gate-induced drain leakage or band-to-band tunneling, and injecting the hole of the generated electron and hole pairs into the charge storage device of the first memory cell to program the first memory cell.

Abstract: A read only memory cell for storing a multiple bit value is disclosed. The read only memory cell comprises: at least three output lines, each of the at least three output lines representing a different multiple bit value; a switching device connected between a single one of the three output lines and a voltage source. The switching device provides an electrical connection between the voltage source and the single one of the three output lines in response to a switching signal, a voltage of the connected output line switching value in response to connection to the predetermined voltage and the multiple bit value represented by the output line is thereby selected. There is also an output device provided for outputting the selected multiple bit value.

Abstract: An array of masked memory cells including a first memory cell in a first column and a second memory cell in a second different column, wherein the first memory cell is capable of being accessed, so as to output, dependent on a first binary mask signal, a first binary value at a first output and a second binary value at a second output or vice versa, wherein the second memory cell is capable of being accessed, so as to output, dependent on a second binary mask signal, a first binary value at a third output and a second binary value at a fourth output or vice versa, and wherein the second and the third outputs of the memory cells are connected to an identical bit line of the memory array.

Abstract: Device for storing a binary state defined by a first binary value and a second binary value complementary thereto, the device capable of being queried by a query signal so as to output, in dependence on a binary masking state, the first binary value at a first output and the second binary value at a second output or vice versa.

Abstract: An electronic fuse (“E-fuse”) has a silicide filament link extending along a gap between polysilicon structures formed on a silicon substrate. The silicide filament link extends across diffusions formed in the gap. A P-N junction between terminals of the E-fuse provides high resistivity after programming (fusing) the silicide filament link.

Abstract: According to one exemplary embodiment, a one-time programmable memory cell includes an access transistor coupled to a shiftable threshold voltage transistor between a bitline and a ground, where the access transistor has a gate coupled to a wordline. The shiftable threshold voltage transistor has a drain and a gate shorted together. A programming operation causes a permanent shift in a threshold voltage of the shiftable threshold voltage transistor to occur in response to a programming voltage on the bitline and the wordline. In one embodiment, the access transistor is an NFET while the shiftable threshold voltage transistor is a PFET. In another embodiment, the access transistor is an NFET and the shiftable threshold voltage transistor is also an NFET. The programming voltage can cause an absolute value of the threshold voltage to permanently increase by at least 50.0 millivolts.

Abstract: A memory circuit includes a plurality of bit lines. A first memory cell and a second memory cell are coupled in series. Each of the first memory cell and the second memory cell is capable of storing a first type datum. The first memory cell and the second memory cell share a first common source/drain (S/D) region. The first common S/D region is electrically isolated from all of the bit lines.

Abstract: A read-only data storage and retrieval device is presented having no moving parts and requiring very low power. Addressing can be accomplished sequentially where the address increments automatically or can be accomplished randomly. High density storage is achieved through the use of a highly symmetric diode matrix that is addressed in both coordinate directions; its symmetry makes the Dual-addressed Rectifier Storage (DRS) Array very scaleable, particularly when made as an integrated circuit. For even greater storage flexibility, multiple digital rectifier storage arrays can be incorporated into the device, one or more of which can be made removable and interchangeable.