Abstract: Memory devices are described herein along with method for operating the memory device. A memory cell as described herein includes a first electrode and a second electrode. The memory cell also comprises phase change material having first and second active regions arranged in series along an inter-electrode current path between the first and second electrode.

Abstract: A semiconductor device includes a memory cell array area, a peripheral circuit area on a periphery of the memory cell array area, and a boundary area having a specific width between the memory cell array area and the peripheral circuit area, the memory cell array area including a cell area including nonvolatile semiconductor memory cells, linear wirings extending from inside of the cell area to an area outside the cell area, and lower layer wirings in a lower layer than the linear wirings in the boundary area and electrically connected to the linear wirings, and wiring widths of the lower layer wirings being larger than widths of the linear wirings, the peripheral circuit area including a patterns electrically connected to the linear wirings via the lower layer wirings, the boundary area failing to be provided with the linear wirings and a wiring in same layer as the linear wirings.

Abstract: In an embodiment, a bit line sense amplifier of a semiconductor memory device with an open bit line structure includes sense amplifier blocks, first voltage drivers, and a second voltage driver. The sense amplifier blocks include a first sense amplifier and a second sense amplifier, each sensing and amplifying a signal difference between a bit line and a complementary bit line. The first voltage drivers apply a power source voltage to the first sense amplifier, and the second voltage driver applies a ground voltage to the second sense amplifier. The first voltage drivers are disposed for every two or more sense amplifier blocks in a bit line sense amplifier region in which the sense amplifier blocks are arranged, and the second voltage driver is disposed in a conjunction region in which a control circuit is located to control the sense amplifier blocks. Both capacitive noise and device size are minimized.

Abstract: A memory cell includes a pair of sub-cells, each including an access transistor, a storage transistor, and an isolation transistor that are serially coupled in sequence with their source/drain connected. The isolation transistor is shared with a sub-cell of an adjacent memory cell and always turned off, wherein the storage transistor is always turned on. A wordline is coupled to a gate of the access transistor of each sub-cell, and complementary bit lines are respectively coupled to sources/drains of the access transistors of the pair of sub-cells, such that data bit may be accessed between the bit line and the corresponding storage transistor through the corresponding access transistor.

Abstract: An object is to provide a semiconductor device having a novel structure, which can hold stored data even when not powered and which has an unlimited number of write cycles. A semiconductor device includes a memory cell including a widegap semiconductor, for example, an oxide semiconductor. The memory cell includes a writing transistor, a reading transistor, and a selecting transistor. Using a widegap semiconductor, a semiconductor device capable of sufficiently reducing the off-state current of a transistor included in a memory cell and holding data for a long time can be provided.

Abstract: The invention provides a semiconductor device that power is stabilized by suppressing power consumption as much as possible. The semiconductor device of the invention includes a logic portion and a memory portion each including a plurality of transistors, a detecting portion for detecting one or both of operation frequencies of the logic portion and the memory portion, a Vth control for supplying a Vth control signal to one or both of the logic portion and the memory portion, and an antenna. Each of the plurality of transistors has a first gate electrode which is input with a logic signal, a second gate electrode which is input with the Vth control signal, and a semiconductor film such that the second gate electrode, the semiconductor film, and the first gate electrode are provided in this order from the bottom.

Abstract: An object is to provide a semiconductor memory device which stores data with the use of a transistor having small leakage current between a source and a drain in an off state as a writing transistor. In a matrix including a plurality of memory cells, gates of the writing transistors are connected to writing word lines. In each of the memory cells, a drain of the writing transistor is connected to a gate of a reading transistor, and the drain is connected to one electrode of a capacitor. Further, the other electrode of the capacitor is connected to a reading word line. In the semiconductor memory device in which the memory cells are connected in series so as to have a NAND structure, gates of the reading transistors are provided alternately, and the reading word line and the writing word line are shared.

Abstract: A memory circuit includes a high voltage region providing storage of a nonvolatile bit, and a low voltage region providing at least partial storage of a volatile bit. The high and low voltage regions are isolated from one another and formed by a plurality of transistors in series between a current source and a bit line.

Abstract: A semiconductor device includes an active region defined in a semiconductor substrate, and gate electrodes crossing over the active region. Source/drain regions are defined in the active region on two sides of the gate electrode. At least one of the source/drain regions is a field effect source/drain region generated by a fringe field of the gate. The other source/drain region is a PN-junction source/drain region having different impurity fields and different conductivity than the substrate. At least one of the source/drain regions is a field effect source/drain region. Accordingly, a short channel effect is reduced or eliminated in the device.

Abstract: A method for programming a first memory cell in a memory array. In a specific embodiment, each memory cell has a drain, a source, a channel, and a control gate overlying a charge storage material and the channel. The source of the first memory cell is coupled to the drain of a second memory cell. A voltage is applied to the drain of the first memory cell, and the source of the second memory cell is grounded. The method includes floating the drain of the second memory cell and the source of the first memory cell and turning on the channels of the first and second memory cells, effectively forming an extended channel region. Hot carriers are injected to the charge storage material of the first cell to program the first memory cell. The extended channel lowers electrical fields and reduces punch through leakage in unselected memory cells.

Abstract: A semiconductor device that can transmit and receive data without contact is popular partly as some railway passes, electronic money cards, and the like; however, it has been a prime task to provide an inexpensive semiconductor device for further popularization. In view of the above current conditions, a semiconductor device of the present invention includes a memory with a simple structure for providing an inexpensive semiconductor device and a manufacturing method thereof. A memory element included in the memory includes a layer containing an organic compound, and a source electrode or a drain electrode of a TFT provided in the memory element portion is used as a conductive layer which forms a bit line of the memory element.

Abstract: A high-density dynamic memory device with compact sense amplifier circuit is described. The memory device achieves high density through the use of a compact sense amplifier circuit that employs a single transistor to sense stored dynamic data. Functionality of the device is enabled by an architecture and method of operation that support a compact sense amplifier circuit. Enabling techniques include sequential sensing of memory columns, a two-pass write operation, a two-step refresh operation, a reference scheme that uses reference data stored in regular memory cells, and the application of digital signal processing to determine sensed data and cancel crosstalk noise.

Abstract: In a matrix including a plurality of memory cells, each in which a drain of a writing transistor is connected to a gate of a reading transistor and the drain is connected to one electrode of a capacitor, a gate of the writing transistor is connected to a writing word line, a source of the writing transistor and a source of the reading transistor is connected to a bit line, and a drain of the reading transistor is connected to a reading word line. A conductivity type of the writing transistor is different from a conductivity type of the reading transistor. In order to increase the integration degree, a bias line may be substituted with a reading word line in another row, or memory cells are connected in series so as to have a NAND structure, and a reading word line and a writing word line may be shared.

Abstract: A semiconductor device includes a plurality of drain lines each being commonly connected to first nodes of a plurality of memory cells, a plurality of bit lines respectively connected to second nodes of the memory cells, a source line, a transistor that connects the drain lines to the source line, and a transistor that connects the source line to a ground potential in response to an access to the memory cell. Under control in which the memory cells are all deactivated, the semiconductor device controls the drain line to a drain potential that is higher than the ground potential, and controls the source line to be in a floating state by deactivating the transistors.

Abstract: A semiconductor memory device according to an aspect of the invention includes plural writing word lines; first and second writing bit lines that intersect with the writing word lines; and plural memory cells that are provided at portions in which the plural writing word lines and the first and second writing bit lines intersect with each other. In the semiconductor memory device, the memory cell includes a flip-flop circuit that includes first and second nodes of a complementary pair; a first transfer transistor that is connected between the first writing bit line and the first node, a gate of the first transfer transistor being connected to the writing word line; and a second transfer transistor that is connected between the second writing bit line and the second node, a gate of the second transfer transistor being connected to the writing word line. The first and second writing bit lines are in a floating state whenever data is not written in the memory cell.

Abstract: A matrix is formed using a plurality of memory cells in each of which a drain of the writing transistor is connected to a gate of a reading transistor and one electrode of a capacitor. A gate of the writing transistor, a source of the writing transistor, a source of the reading transistor, and a drain of the reading transistor are connected to a writing word line, a writing bit line, a reading bit line, and a bias line, respectively. In order to reduce the number of wirings, a writing word line to which the gate of the writing transistor is not connected is substituted for the reading word line. Further, the writing bit line is substituted for the reading bit line.

Abstract: An object is to provide a semiconductor device with a novel structure, which can hold stored data even when not powered and which has an unlimited number of write cycles. A semiconductor device is formed using a material capable of sufficiently reducing the off-state current of a transistor, such as an oxide semiconductor material that is a widegap semiconductor. The use of a semiconductor material capable of sufficiently reducing the off-state current of a transistor allows data to be held for a long time. In addition, the timing of potential change in a signal line is delayed relative to the timing of potential change in a write word line. This makes it possible to prevent a data writing error.

Abstract: A device includes a first region including a plurality of first memory elements and a plurality of first vertical transistors, the first vertical transistors comprising a plurality of first selective transistors and a first switching transistor, each of the first selective transistors including an upper electrode coupled to a corresponding one of the first memory elements and a lower electrode, the first switching transistor including an upper electrode and a lower electrode coupled in common to the lower electrodes of the first selective transistors through a first signal line, a second region arranged to make a first line with the first region in a first direction and including a plurality of second memory elements and a plurality of second vertical transistors, the second vertical transistors comprising a plurality of second selective transistors and a second switching transistor, and a third region sandwiched between the first and the second regions.

Abstract: The present invention provides a semiconductor storage circuit that may suppress a data read characteristic from being deteriorated due to influence of characteristic change of a sense amplifier, in a multi-bit-type memory cell. The semiconductor storage circuit includes a memory cell array that has plural multi-bit-type memory cells, two multiplexers, and two sense amplifiers. The first multiplexer connects a main bit line connected to an R-side electrode of the even-numbered memory cell in a row direction to the first sense amplifier, and connects a main bit line connected to an L-side electrode of the odd-numbered memory cell to the second sense amplifier. The second multiplexer connects a main bit line connected to an L-side electrode of the even-numbered memory cell to the first sense amplifier, and connects a main bit line connected to an R-side electrode of the odd-numbered memory cell to the second sense amplifier.

Abstract: A matrix is formed using a plurality of memory cells in each of which a drain of the writing transistor is connected to a gate of a reading transistor and one electrode of a capacitor. A gate of the writing transistor, a source of the writing transistor, a source of the reading transistor, and a drain of the reading transistor are connected to a writing word line, a writing bit line, a reading bit line, and a bias line, respectively. The other electrode of the capacitor is connected to a reading word line. In order to decrease the number of wirings, the writing bit line is substituted for the reading bit line. The reading bit line is formed so as to be embedded in a groove-like opening formed over a substrate.

Abstract: The present disclosure relates to the heating of memory cells.

Abstract: A semiconductor memory device having an open bitline memory structure from which an edge dummy memory block is removed, the semiconductor memory device includes a memory block, an edge sense amplification block including a first sense amplifier having a first bitline, a first complementary bitline, and a first amplification circuit comprising a first transistor having a first size, a central sense amplification block including a second sense amplifier having a second bitline, a second complementary bitline, and a second amplification circuit comprising a second transistor having a second size different from the first size, a capacitor block electrically connected to the edge sense amplification block.

Abstract: A semiconductor device includes a first signal line, a second signal line, a memory cell, and a potential converter circuit. The memory cell includes a first transistor including a first gate electrode, a first source electrode, a first drain electrode, and a first channel formation region; a second transistor including a second gate electrode, a second source electrode, a second drain electrode, and a second channel formation region; and a capacitor. The first channel formation region and the second channel formation region include different semiconductor materials. The second drain electrode, one electrode of the capacitor, and the first gate electrode are electrically connected to one another. The second gate electrode is electrically connected to the potential converter circuit through the second signal line.

Abstract: A symmetrical blocking transient voltage suppressing (TVS) circuit for suppressing a transient voltage includes an NPN transistor having a base electrically connected to a common source of two transistors whereby the base is tied to a terminal of a low potential in either a positive or a negative voltage transient. The two transistors are two substantially identical transistors for carrying out a substantially symmetrical bi-directional clamping a transient voltage. These two transistors further include a first and second MOSFET transistors having an electrically interconnected source. The first MOSFET transistor further includes a drain connected to a high potential terminal and a gate connected to the terminal of a low potential and the second MOSFET transistor further includes a drain connected to the terminal of a low potential terminal and a gate connected to the high potential terminal.

Abstract: The number of wirings per unit memory cell is reduced by sharing a bit line by a writing transistor and a reading transistor. Data is written by turning on the writing transistor so that a potential of the bit line is supplied to a node where one of a source electrode and a drain electrode of the writing transistor and a gate electrode of the reading transistor are electrically connected, and then turning off the writing transistor so that a predetermined amount of charge is held in the node. Data is read by using a reading signal line connected to one of a source electrode and a drain electrode of the reading transistor so that a predetermined reading potential is supplied to the reading signal line, and then detecting a potential of the bit line.

Abstract: An object of the present invention is to provide a technique of reducing the power consumption of an entire low power consumption SRAM LSI circuit employing scaled-down transistors and of increasing the stability of read and write operations on the memory cells by reducing the subthreshold leakage current and the leakage current flowing from the drain electrode to the substrate electrode. Another object of the present invention is to provide a technique of preventing an increase in the number of transistors in a memory cell and thereby preventing an increase in the cell area. Still another object of the present invention is to provide a technique of ensuring stable operation of an SRAM memory cell made up of SOI or FD-SOI transistors having a BOX layer by controlling the potentials of the wells under the BOX layers of the drive transistors.

Abstract: The circuit arrangement comprises a symmetrically constructed comparator (3), a non-volatile memory cell (10) and a reference element (20). The comparator (3) exhibits a latching function, and is connected in a differential current path that joins the power supply terminal (9) to a reference potential terminal (8). The non-volatile memory cell (10) is connected in a first branch (35) of the differential current path, and the reference element (20) is connected in a second branch (55) of the differential current path.

Abstract: A semiconductor memory device comprises a cell array having a plurality of SRAM cells arranged in a bit line direction and a word line direction orthogonal to said bit line direction in a matrix; and a peripheral circuit arranged adjacent to the cell array in the bit line direction. The cell array includes first P-well regions and first N-well regions shaped in stripes extending in the bit line direction and arranged alternately in the word line direction. The SRAM cell is formed point-symmetrically in the first P-well region and the first N-well regions located on both sides thereof. The peripheral circuit includes second P-well regions and second N-well regions extending in the bit line direction and arranged alternately in the word line direction.

Abstract: An object is to provide a semiconductor device in which stored data can be retained even when power is not supplied, and there is no limitation on the number of write cycles. The semiconductor device includes a source line, a bit line, a first signal line, a second signal line, a word line, a memory cell connected between the source line and the bit line, a first driver circuit electrically connected to the bit line, a second driver circuit electrically connected to the first signal line, a third driver circuit electrically connected to the second signal line, and a fourth driver circuit electrically connected to the word line and the source line. The first transistor is formed using a semiconductor material other than an oxide semiconductor. The second transistor is formed using an oxide semiconductor material.

Abstract: According to one embodiment, a memory cell array includes memory cells arranged at crossing points of bit lines and word lines. The bit lines include first, second, third, and fourth bit lines sequentially arranged. A first sense circuit is arranged on a first end side of the memory cell array, electrically connected to the first and third bit lines. A second sense circuit is arranged on a second end side of the memory cell array, electrically connected to the second and fourth bit lines. A first hookup region is arranged between the memory cell array and the first sense circuit and includes a first transfer transistor connected to the first bit line and the first sense circuit. A second hookup region is arranged between the first hookup region and the first sense circuit and includes a second transfer transistor connected to the third bit line and the first sense circuit.

Abstract: A high-density memory device is fabricated three-dimensionally in layers. To keep points of failure low, address decoding circuits are included within each layer so that, in addition to power and data lines, only the address signal lines need be interconnected between the layers.

Abstract: An interconnection architecture for multilayer circuits includes an array of vias and a CMOS layer configured to selectively access the array of vias according to an address. The interconnection architecture also includes a crossbar stack which includes layers of intersecting wire segments with programmable crosspoint devices interposed between intersecting wire segments. The vias are connected to the wire segments such that each programmable crosspoint device is uniquely addressed and every address within a contiguous address space accesses a programmable crosspoint device.

Abstract: A very high density field programmable memory is disclosed. An array is formed vertically above a substrate using several layers, each layer of which includes vertically fabricated memory cells. The cell in an N level array may be formed with N+1 masking steps plus masking steps needed for contacts. Maximum use of self alignment techniques minimizes photolithographic limitations. In one embodiment the peripheral circuits are formed in a silicon substrate and an N level array is fabricated above the substrate.

Abstract: An embodiment of a memory device includes a plurality of memory cells; each memory cell includes a latch adapted to store an information bit. Said latch includes a first logic gate including a first input terminal and a first output terminal and a second logic gate including a second input terminal and a second output terminal. Said first input terminal is connected to said second output terminal and said first output terminal is connected to said second input terminal. The memory device further includes reading and writing means adapted to perform a read operation or a write operation of the information bit. Said first logic gate includes a pull-up branch coupled between a terminal for providing a supply voltage and the first output terminal, and a pull-down branch coupled between the first output terminal and a terminal for providing a reference voltage.

Abstract: Providing a serial array semiconductor architecture achieving fast program, erase and read times is disclosed herein. By way of example, a memory architecture can comprise a serial array of semiconductors coupled to a metal bitline of an electronic memory device at one end of the array, and a gate of a pass transistor at an opposite end of the array. Furthermore, a second metal bitline is coupled to a drain of the pass transistor. A sensing circuit that measures current or voltage at the second metal bitline, which is modulated by a gate potential of the pass transistor, can determine a state of transistors of the serial array. Because of low capacitance of the pass transistor, the serial array can charge or discharge the gate of the pass transistor quickly, resulting in read times that are significantly reduced as compared with conventional serial semiconductor array devices.

Abstract: A semiconductor memory includes a memory cell array area having a memory cell, a word line contact area adjacent to the memory cell array area, a word line arranged straddling the memory cell array area and the word line contact area, a contact hole provided on the word line in the word line contact area, and a word line driver connected to the word line via the contact hole. A size of the contact hole is larger than a width of the word line, and the lowest parts of the contact hole exist on a position lower than a top surface of the word line and higher than a bottom surface of the word line.

Abstract: Disclosed herein are memory devices and related methods and techniques. A cell in the memory device may be associated with an intervening transistor, the intervening transistor being configured to isolate the cell from adjacent cells under a first operating condition and to provide a current to a bit line associated with the cell under a second operating condition.

Abstract: Some embodiments include a device having a number of memory cells and associated circuitry for accessing the memory cells. The memory cells of the device may be formed in one or more memory cell dice. The associated circuitry of the device may also be formed in one or more dice, optionally separated from the memory cell dice.

Abstract: An object of the present invention is to provide a semiconductor device combining transistors integrating on a same substrate transistors including an oxide semiconductor in their channel formation region and transistors including non-oxide semiconductor in their channel formation region. An application of the present invention is to realize substantially non-volatile semiconductor memories which do not require specific erasing operation and do not suffer from damages due to repeated writing operation. Furthermore, the semiconductor device is well adapted to store multivalued data. Manufacturing methods, application circuits and driving/reading methods are explained in details in the description.

Abstract: A semiconductor memory device includes a memory cell array region in which vertical transistors each having a lower electrode connected to a bit line is regularly arranged with a predetermined pitch, including memory cells formed using at least the vertical transistors; a peripheral circuit region arranged adjacent to the memory cell array region in a bit line extending direction; and a predetermined circuit arranged overlapping the peripheral circuit region and the memory cell array region. In the semiconductor memory device, the vertical transistors each having an upper electrode connected to the predetermined circuit are included in an end region of the memory cell array region, in which no word line is provided.

Abstract: A nonvolatile storage device having a memory cell array composed of a plurality of memory cells. The plurality of memory cells include a bit line to which the drain terminals of the plurality of memory cells that have noncovalent connected gate terminals are commonly connected and a source line to which the source terminals of the plurality of memory cells that have commonly connected gate terminals are commonly connected and which extend perpendicularly to the bit line. The memory cell also includes a first source selector switch for connecting the source line to a source bias line.

Abstract: A control circuit supplies a word line drive voltage to one of m word lines which corresponds to a memory cell to which data is to be written, during a word line drive period including a first period and a second period following the first period, to decrease current capabilities of first and second load transistors included in the memory cell during the first period, and increase the current capabilities of the first and second load transistors during the second period.

Abstract: Memory arrays having folded architectures and methods of making the same. Specifically, memory arrays having a portion of the transistors in a row that are reciprocated and shifted with respect to other transistors in the same row. Trenches formed between the rows may form a weave pattern throughout the array, in a direction of the row. Trenches formed between legs of the transistors may also form a weave pattern throughout the array in a direction of the row.

Abstract: To provide a semiconductor device including switch transistor provided between a sub-data line and a main data line. Upon transferring data, the semiconductor device supplies a potential of a VPP level to a gate electrode of the switch transistor when causing the switch transistor to be a conductive state, and supplies a potential of a VPERI level to the gate electrode when causing the switch transistor to be a non-conductive state. According to the present invention, because a potential of the gate electrode is not decreased to a VSS level when causing the switch transistor to be a non-conductive state, it is possible to reduce a current required to charge and discharge a gate capacitance of the switch transistor. Furthermore, because the VPP level is supplied to the gate electrode when causing the switch transistor to be a conduction state, a level of a signal after transfer never drops down by the amount of the threshold voltage.

Abstract: A nonvolatile memory array architecture includes a resistive element between each common source/drain (intermediate) node and data line (or bit line), in an otherwise virtual ground-like memory array having serially-connected transistors coupled to the same word line. However, every N+1 transistors the corresponding resistive element is omitted (or generally kept in a low resistance state) to form transistor strings. This achieves an array density of 4F2*(N+1)/N, which approaches 4F2 array density for reasonable values of N. Such memory arrays are well suited for use in a three-dimensional memory array having distinct memory planes stacked above each other on multiple levels above a substrate.

Abstract: A metal supplying an N well voltage is provided in a first metal interconnection layer. The metal is electrically coupled to an active layer provided in an N well region by shared contacts so that the N well voltage is supplied to the N well region. A metal supplying a P well voltage is provided in a third metal interconnection layer. The metal supplying the N well voltage is formed using a metal in the first metal interconnection layer and thus does not require a piling region to the underlayer, and only a piling region to the underlayer of the metal for the P well voltage needs to be secured. Therefore, the length in the Y direction of a power feed cell can be reduced thereby reducing the layout area of the power feed cell.

Abstract: An integrated circuit has a transistor with an active gate structure overlying an active diffusion area formed in a semiconductor substrate. A dummy gate structure is formed over a diffusion area and separated from the active gate structure by a selected distance (d2). A stress layer overlying the transistor array produces stress in a channel region of the transistor.

Abstract: According to one embodiment, a semiconductor storage device includes a first memory cell, a second memory cell and a third memory cell. The first memory cell forms a connection path used for storage of data. The second memory cell varies a connection place from a connection place of the connection path formed in the first memory cell, and stores data different from the data stored in the first memory cell is stored. The third memory cell varies a connection place from the connection place of the connection path formed in the second memory cell, and stores data same as the data stored in the first memory cell is stored.

Abstract: A storage device including a memory and a reading circuit is disclosed. The memory includes a plurality of word lines, a first bit line, a second bit line, a third bit line, and a plurality of cells. The word lines are sequentially disposed in parallel. The first, the second, and the third bit lines are sequentially disposed in parallel and vertical with the word lines. Each cell corresponds to one word line and one bit line. The word line, which corresponds to the cell corresponding to the first bit line, differs from the word line, which corresponds to the cell corresponding to the second bit line. The read circuit is coupled to the memory for reading the data stored in the memory.

Abstract: A memory device may include a cathode, an anode, a link connected to the anode, and a first connection element that connects the link to the cathode. The link and the anode may be located in a position lower than that of the cathode or the link and the anode may be located in a position higher than that of the cathode. Also, the cathode, the anode, the link, and the first connection element may be formed on the same plane.