Abstract: A non-volatile memory device includes a first electrode, a diode steering element, at least three resistivity switching storage elements, and a second electrode. The diode steering element electrically contacts the first electrode and the at least three resistivity switching storage elements. The second electrode electrically contacts only one of the at least three resistivity switching storage elements.

Abstract: Memory elements are provided that exhibit immunity to soft error upset events when subjected to radiation strikes such as high-energy atomic particle strikes. The memory elements may each have four inverter-like transistor pairs that form a bistable element and a pair of address transistors. There may be four nodes in the transistor each of which is associated with a respective one of the four inverter-like transistor pairs. There may be two control transistors each of which is coupled between the transistors in a respective one of the inverter-like transistor pairs. During data writing operations, the two control transistors may be turned off to temporarily decouple the transistors in two of the four inverter-like transistor pairs.

Abstract: A semiconductor integrated circuit device having a 6F2 layout is provided. The semiconductor integrated circuit device includes a substrate; a plurality of unit active regions disposed in the substrate and extending in a first direction; first and second access transistors including first and second gate lines disposed on the substrate and extending across the unit active regions in a second direction forming an acute angle with the first direction; a first junction area disposed in the substrate between the first and second gate lines and second junction areas disposed on sides of the first and second gate lines where the first junction area is not disposed; a plurality of bitlines disposed on the substrate and extending in a third direction forming an acute angle with the first direction; and a plurality of bitline contacts directly connecting the first junction area and the bitlines.

Abstract: A method for forming a memory structure, includes: forming an array of individual memory cells arranged in a network of bit lines and word lines, each individual memory cell further comprising a resistive memory device that is capable of being programmed to a plurality of resistance states, each of the resistive memory devices coupled to one of the bit lines at a first end thereof; configuring a rectifying element in series with each of the resistive memory devices at a second end thereof; configuring an access transistor associated with each of the individual memory cells, the access transistors activated by a signal applied to a corresponding one of the word lines, with each access transistor connected in series with a corresponding rectifying element; and forming a common connection configured to short neighboring rectifying devices together along a word line direction, in groups of two or more.

Abstract: A measurement apparatus disclosed that has a radiation source configured to provide a measurement beam of radiation such that an individually controllable element of an array of individually controllable elements capable of modulating a beam of radiation, is illuminated by the measurement beam and redirects the measurement beam, and a detector arranged to receive the redirected measurement beam and determine the position at which the redirected measurement beam is incident upon the detector, the position at which the redirected measurement beam is incident upon the detector being indicative of a characteristic of the individually controllable element.

Abstract: Apparatus and methods are disclosed, such as those involving array/port consolidation and/or swapping. One such apparatus includes a plurality of port pads including a plurality of contacts; a plurality of memory arrays; and a plurality of master data lines. Each of the master data lines extends in a space between one of the port pads and a respective one of the memory arrays. Each of the master data lines is electrically connectable to the contacts of a respective one of the port pads. The apparatus further includes a plurality of local data lines, each of which extends over a respective one of the memory arrays. Each of the local data lines is electrically connectable to a respective one of the master data lines. At least one of the local data lines extends over at least two of the memory arrays. This configuration allows memory array consolidation and/or swapping without increasing die space for additional routing and adversely affecting performance of the apparatus.

Abstract: A read only memory cell for storing a multiple bit value is disclosed. The read only memory cell comprises: at least three output lines, each of the at least three output lines representing a different multiple bit value; a switching device connected between a single one of the three output lines and a voltage source. The switching device provides an electrical connection between the voltage source and the single one of the three output lines in response to a switching signal, a voltage of the connected output line switching value in response to connection to the predetermined voltage and the multiple bit value represented by the output line is thereby selected. There is also an output device provided for outputting the selected multiple bit value.

Abstract: A semiconductor memory device includes a first inverter and a second inverter each having an input and an output, the output of each of the first and second inverters being connected to the input of the other so that data is stored, a CMOS switch configured to connect the input of the first inverter and a write bit line, a read MOS transistor having a gate connected to the output of the first inverter, and a MOS switch configured to connect the read MOS transistor to a read bit line. The first and second inverters have different sizes and are connected to different source power supplies.

Abstract: A semiconductor memory device to an exemplary aspect of the present invention includes a plurality of memory cells, a plurality of word lines, a plurality of bit line pairs, a plurality of column selectors, a common signal line pair including one common line commonly connected to one of each of the plurality of bit line pairs, and the other common line commonly connected to the other of each of the plurality of bit line pairs, a sense amplifier amplifying the potential difference of the common signal line pair, and a plurality of capacitance adding circuits that balance with parasitic capacitances of the column selectors which are not selected, the capacitance adding circuits being provided respectively between the one of each of the bit line pairs and the other common line and between the other of each of the bit line pairs and the one common line.

Abstract: The present invention provides an improved SRAM cell. Specifically, the present invention provides an SRAM cell having one or more sets of stacked transistors for isolating the cell during a read operation. Depending on the embodiment, the SRAM cell of the present invention can have eight or ten transistors. Regardless, the SRAM cell of the present invention typically includes separate/decoupled write word and read word lines, a pair of cross-coupled inverters, and a complimentary pair of pass transistors that are coupled to the write word line. Each set of stacked transistors implemented within the SRAM cell has a transistor that is coupled to a bit line as well as the read word line.

Abstract: A semiconductor device including: a first memory cell including a non-volatile first variable resistance element that stores data by varying a resistance value and a selection transistor that selects the first variable resistance element; a first memory layer provided with more than one such first memory cell arranged in a plane; a second memory cell including a non-volatile second variable resistance element that stores data by varying a resistance value and a selection diode that selects the second variable resistance element; and a second memory layer provided with more than one such second memory cell arranged in a plane; wherein more than one such second memory layer is stacked over the first memory layer.

Abstract: In an embodiment, a bit line sense amplifier of a semiconductor memory device with an open bit line structure includes sense amplifier blocks, first voltage drivers, and a second voltage driver. The sense amplifier blocks include a first sense amplifier and a second sense amplifier, each sensing and amplifying a signal difference between a bit line and a complementary bit line. The first voltage drivers apply a power source voltage to the first sense amplifier, and the second voltage driver applies a ground voltage to the second sense amplifier. The first voltage drivers are disposed for every two or more sense amplifier blocks in a bit line sense amplifier region in which the sense amplifier blocks are arranged, and the second voltage driver is disposed in a conjunction region in which a control circuit is located to control the sense amplifier blocks. Both capacitive noise and device size are minimized.

Abstract: The SRAM cell is formed by an inverter circuit (P1, N1) using a storage node V2 as an input and a storage node V1 as an output, a load transistor P2 connected between a power source VDD and the storage node V2 using the storage node V1 as an input and the storage node V2 as an output, an access transistor N3 connected between a read bit line RBL and the storage node V1, and an access transistor N4 connected between a write bit line WBL and the storage node V2. When the access transistor N4 is controlled by a write word line WWL, the access transistor N4 can be used as holding control means and writing means for the memory cell, making it possible to obtain a semiconductor device capable of operating at a high speed with a small number of elements.

Abstract: A semiconductor memory device having a hierarchical bit line structure includes memory cells and an amplification circuit for amplifying a signal read from one of the memory cells via a bit line. A cell N-well region in which the P-channel transistors of the memory cell are formed and an amplification-circuit N-well region in which the P-channel transistors of the amplification circuit are formed are formed continuously.

Abstract: In a semiconductor integrated circuit device having a volatile memory high-speed operation is enabled and the density of the memory can be enhanced. The volatile memory includes a word line, a complementary bit line having bit lines, a plurality of common source lines, and a memory cell that is coupled with the word line and the complementary bit lines. The memory cell includes transistors. The gate electrodes of the transistors are coupled with the word line, and the drain electrode of one of the transistors is coupled with one of the bit lines. The drain electrode of the other transistor is coupled with the other bit line. The respective source electrodes of the transistors are coupled with any one of the common source lines, or brought in a floating state, thereby storing storage information in the memory cell.

Abstract: An excess region on a chip plane is eliminated to reduce a chip size. A plurality of data pads, which input/output data, are arranged near one side of an outer periphery of a substrate in parallel with the aforementioned one side, and a plurality of data pads, which input/output data, are arranged on an inner side of the plurality of data pads in parallel with the plurality of data pads. NMOSs, which output data, are arranged between the data pads, and PMOSs, which output data, are arranged at positions where they face the NMOSs near the data pads.

Abstract: A memory apparatus, a controller, and a method thereof for programming non-volatile memory cells are provided. The memory apparatus includes a plurality of memory cells, wherein each memory cell shares a source/drain region with a neighboring memory cell. The method utilizes a compensation electron flow applied into a source/drain region between two memory cells to provide enough electron flow to program one of the two memory cells, even under the circumstances that the other memory cell has a greater threshold voltage, such that the dispersion of the programming speed of the memory cells is reduced.

Abstract: A piezo-effect transistor (PET) device includes a piezoelectric (PE) material disposed between first and second electrodes; and a piezoresistive (PR) material disposed between the second electrode and a third electrode, wherein the first electrode comprises a gate terminal, the second electrode comprises a common terminal, and the third electrode comprises an output terminal such that an electrical resistance of the PR material is dependent upon an applied voltage across the PE material by way of an applied pressure to the PR material by the PE material.

Abstract: To include an input circuit block to which a plurality of bits are input and a processing circuit block that processes an internal signal output from the input circuit block. The input circuit block includes a plurality of unit input circuits arranged in an X direction to which the bits are input, respectively. Each of the unit input circuits includes an input wiring pattern that extends in a Y direction and a transistor of which a control electrode is connected to a corresponding one of the input wiring pattern. Coordinates of the input wiring pattern and the transistor corresponding to the input wiring pattern in the X direction do not overlap with each other. With this arrangement, by sharing the input wiring pattern between circuit blocks adjacent to each other in the Y direction, it is possible to reduce the number of pre-decode wirings.

Abstract: A phase change memory device includes a substrate, a plurality of cell arrays stacked above the substrate and each including a matrix layout of a plurality of memory cells, each the memory cell storing therein as data a resistance value determinable by a phase change, a write circuit configured to write a pair cell constituted by two neighboring memory cells within the plurality of cell arrays in such a manner as to write one of the pair cell into a high resistance value state and write the other into a low resistance value state, and a read circuit configured to read complementary resistance value states of the pair cell as a one bit of data.

Abstract: A method of operating a non-volatile memory (NVM) cell structure that utilizes gated diode is provided. The cell architecture, utilizing about 4-10 um2 per bit, includes gated diodes that are used to program the cells while consuming low programming current. The cell architecture also allows a large number of cells to be programmed at the same time, thereby reducing the effective programming time per bit. Erase and read mode bias conditions are also provided.

Abstract: Disclosed is a semiconductor memory device capable of realizing reduction in an SRAM unit cell area. Using as a standard configuration a parallel-type SRAM unit cell having each pair of load transistors, driver transistors and transfer transistors, all or a part of the gate electrodes and active regions configuring at least any one of the pairs of the transistors, for example, the pair of the transfer transistors are configured obliquely in a predetermined direction from the standard configuration. As a result, a size in a cell outside part including the driver transistor and the transfer transistor is reduced. At the same time, a distance between the load transistors in the central part is reduced as compared with that in the standard configuration. Thus, area reduction in the whole SRAM unit cell is realized.

Abstract: A memory cell that includes a first magnetic layer, the magnetization of which is free to rotate under the influence of spin torque; a tunneling layer comprising a magnetic resonant tunneling diode (MRTD); and a second magnetic layer, wherein the magnetization of the second magnetic layer is pinned, wherein the tunneling layer is between the first magnetic layer and the second magnetic layer.

Abstract: A MOS transistor includes plural transistor cell blocks arranged adjacently in parallel to one another, wherein the plural transistor cell blocks are configured to have plural transistor cells, plural boundaries that are parallel to the plural transistor cells, and plural back gates arranged at the plural boundaries, each of the plural transistor cell blocks has two boundaries of the plural boundaries, wherein the plural transistor cells have a substantially striped shape, and each of the plural transistor cell blocks includes: at least one drain; plural sources; and plural extended gates, wherein each of the plural transistor cells is formed from one of the plural extended gates sandwiched by one of at least one drain and one of the plural sources, one of the plural sources is adjacent to one of two boundaries, and another one of the plural sources is adjacent to another one of two boundaries.

Abstract: A monolithic, three dimensional NAND string includes a first memory cell located over a second memory cell, a select transistor, a first word line of the first memory cell, a second word line of the second memory cell, a bit line, a source line, and a select gate line of the select transistor. The first and the second word lines are not parallel to the bit line, and the first and the second word lines extend parallel to at least one of the source line and the select gate line.

Abstract: A memory cell of a static random access memory (SRAM) includes a pair of drive transistors, a pair of load transistors, a pair of write-only transfer transistors, a pair of read-only transfer transistors, a pair of read-only drive transistors, and a pair of column selection transistors. The memory cell also includes a word line, a pair of write bit lines, a pair of read bit lines, and a column selection line.

Abstract: Techniques for providing a direct injection semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as a direct injection semiconductor memory device including a first region connected to a bit line extending in a first orientation and a second region connected to a source line extending in a second orientation. The direct injection semiconductor memory device may also include a body region spaced apart from and capacitively coupled to a word line extending in the second orientation, wherein the body region is electrically floating and disposed between the first region and the second region. The direct injection semiconductor memory device may further include a third region connected to a carrier injection line extending in the second orientation, wherein the first region, the second region, the body region, and the third region are disposed in sequential contiguous relationship.

Abstract: Various embodiments are directed to an apparatus comprising a semiconductor memory array with non-volatile memory unit cells arranged into a NAND block. Each of the unit cells comprises a resistive sense element connected in parallel with a switching element. The resistive sense elements are connected in series to form a first serial path, and the switching elements are connected in series to form a second serial path parallel to the first serial path. Each resistive sense element is serially connected to an adjacent resistive sense element in the block by a tortuous conductive path having a portion that extends substantially vertically between said elements to provide operational isolation therefor.

Abstract: A memory arrangement comprises a first memory transistor (11) for non-volatile storage of a first bit, a second memory transistor (17) for non-volatile storage of the first bit in inverted form, and a word line (29) that is connected to a control terminal (12) of the first memory transistor (11) and a control terminal (18) of the second memory transistor (17). The memory arrangement further comprises a read amplifier (23) with a first input (24) that is coupled to the first memory transistor (11) for supplying a first bit line signal (BL1), a second input (25) that is coupled to the second memory transistor (17) for supplying a second bit line signal (BL2), and an output (26) for provision of an output signal (SOUT) as a function of the first bit line signal (BL1) and the second bit line signal (BL2).

Abstract: A semiconductor memory device (1) has a FET (10) (first field-effect transistor), a FET (20) (second field-effect transistor), a contact plug (32) (first conductive plug), contact plugs (34) (second conductive plugs), and a detection circuit (50). The FET (20) is provided in a double well (40). M (m is a natural number) contact plugs (32) are connected to a diffusion layer (22) of the FET (20) while n (n is a natural number) contact plugs (34) are connected to a diffusion layer (24). Here, m is smaller than n. The detection circuit (50) detects the difference between the output of the FET (10) and the output of the FET (20).

Abstract: A semiconductor memory includes a memory cell array area having a memory cell, a word line contact area adjacent to the memory cell array area, a word line arranged straddling the memory cell array area and the word line contact area, a contact hole provided on the word line in the word line contact area, and a word line driver connected to the word line via the contact hole. A size of the contact hole is larger than a width of the word line, and the lowest parts of the contact hole exist on a position lower than a top surface of the word line and higher than a bottom surface of the word line.

Abstract: Techniques for providing a direct injection semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for biasing a direct injection semiconductor memory device. The method may comprise applying a first voltage potential to a first N-doped region via a bit line and applying a second voltage potential to a second N-doped region via a source line. The method may also comprise applying a third voltage potential to a word line, wherein the word line is spaced apart from and capacitively coupled to a body region that is electrically floating and disposed between the first N-doped region and the second N-doped region. The method may further comprise applying a fourth voltage potential to a P-type substrate via a carrier injection line.

Abstract: Techniques for providing a direct injection semiconductor memory device having ganged carrier injection lines are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus including a first region coupled to a bit line and a second region coupled to a source line. The apparatus may also comprise a body region spaced apart from and capacitively coupled to a word line, wherein the body region is electrically floating and disposed between the first region and the second region. The apparatus may further comprise a third region coupled to a constant voltage source via a carrier injection line configured to inject charges into the body region through the second region.

Abstract: A semiconductor storage device includes a memory cell array, a plurality of word lines, a plurality of bit lines, a first gate wiring element 3a, 3b, a second gate wiring element 3c, 3d, a first connector 5a, 5b, and a second connector 5c, 5d. Each memory cell 10 has first and second sets having a driver transistor 11, a load transistor 12, and an access transistor 13. The word lines are arranged in parallel to each other along a first direction. The bit lines are arranged in parallel to each other along a second direction perpendicular to the first direction. The first gate wiring element comprises a gate electrode of the first driver transistor and the first load transistor, and has a rectangular shape having straight line on opposite sides. The second gate wiring element comprises a gate electrode of the access transistor and has a rectangular shape having straight line on opposite sides.

Abstract: A variable resistance memory array, programming a variable resistance memory element and methods of forming the array. A variable resistance memory array is formed with a plurality of word line transistors surrounding each phase change memory element. To program a selected variable resistance memory element, all of the bitlines are grounded or biased at the same voltage. A top electrode select line that is in contact with the selected variable resistance memory element is selected. The word line having the word line transistors surrounding the selected variable resistance memory element are turned on to supply programming current to the element. Current flows from the selected top electrode select line through the variable resistance memory element into the common source/drain region of the surrounding word line transistors, across the transistors to the nearest bitline contacts. The word lines are patterned in various lattice configurations.

Abstract: Conductive stripes laterally abutting the dielectric lines are formed over a thin semiconductor layer on a gate dielectric. Angled halo ion implantation is performed to implant p-type dopants on the side of the drains of pull-down transistors and a first source/drain region of each pass gate transistor. The dielectric lines are removed and the pattern of the conductive stripes is transferred into the semiconductor layer to form gate electrodes. The resulting pass gate transistors are asymmetric transistors have a halo implantation on the side of the first source/drain regions, while the side of a second source/drain regions does not have such a halo implantation. As such, the pass gate transistors provide enhanced readability, writability, and stability.

Abstract: Disclosed are methods, systems and devices, including a device having a digit line and a plurality of transistors each having one terminal connected to the digit line and another terminal disposed on alternating sides of the digit line. In some embodiments, each transistor among the plurality of transistors comprises a fin.

Abstract: The present disclosure relates to the heating of memory cells.

Abstract: A metal supplying an N well voltage is provided in a first metal interconnection layer. The metal is electrically coupled to an active layer provided in an N well region by shared contacts so that the N well voltage is supplied to the N well region. A metal supplying a P well voltage is provided in a third metal interconnection layer. The metal supplying the N well voltage is formed using a metal in the first metal interconnection layer and thus does not require a piling region to the underlayer, and only a piling region to the underlayer of the metal for the P well voltage needs to be secured. Therefore, the length in the Y direction of a power feed cell can be reduced thereby reducing the layout area of the power feed cell.

Abstract: A semiconductor device includes a plurality of word lines, a plurality of bit lines, a plurality of memory cells provided at the intersections of the plurality of word lines and the plurality of bit lines and each of that includes a MIS transistor and a memory element, a decoder circuit for selecting a plurality of word lines, and a sense-amplifier circuit for determining information that is read from any of the plurality of memory cells to any of the plurality of bit lines, wherein a twist connector for switching the wiring order of the plurality of word lines is provided and level-stabilizing circuits, for supplying the potential level of a non-selected state to the plurality of word lines in the non-selected state are arranged in the area below the twist connector.

Abstract: An integrated circuit including an array of memory cells and method. In one embodiment, each memory cell includes a resistively switching memory element and a selection diode for selecting one cell from the plurality of memory cells. The memory element is coupled with its top to a first selection line and with its bottom side to the selection diode, the diode further being coupled to the bottom side of a second selection line.

Abstract: Disclosed are methods, systems and devices including local data lines. In some embodiments, the device includes a local data line connected to a plurality of access devices, at least a portion of a capacitor plate connected to the plurality of access devices, and a global data line connected to the local data line by the capacitor plate.

Abstract: A multi-port memory device having a storage node, a precharge node, a first, second, third, and fourth transistor, and a control module. The first transistor includes a current electrode connected to the storage node, another current electrode connected to a first bit line, and a gate connected to a first wordline. The second transistor includes a current electrode connected to the storage node, another current electrode connected to a second bit line, and a gate connected to a second wordline. The third transistor includes a current electrode connected to the reference node, another current electrode connected to the first bit line, and a gate. The fourth transistor includes a current electrode connected to the precharge node, another current electrode connected to the second bit line, and a gate. The control module deactivates the fourth transistor in response to a dummy access of the first storage module at the second transistor.

Abstract: A local interconnect is formed with a gate conductor line that has an exposed sidewall on an active area of a semiconductor substrate. The exposes sidewall comprises a silicon containing material that may form a silicide alloy upon silicidation. During a silicidation process, a gate conductor sidewall silicide alloy forms on the exposed sidewall of the gate conductor line and an active area silicide is formed on the active area. The two silicides are joined to provide an electrical connection between the active area and the gate conductor line. Multiple sidewalls may be exposed on the gate conductor line to make multiple connections to different active area silicides.

Abstract: In a semiconductor integrated circuit device, from a first power source strap supplying a potential to a first standard cell receiving a supply of the potential, the potential is supplied via a first cell power source line having a constant width. The width of the first cell power source line is determined in accordance with power consumed by the first standard cell and with the number of standard cells that can be placed between the first power source strap and a third power source strap.

Abstract: In one embodiment, a memory circuit comprises a pair of cross-coupled inverters configured to store a bit of data and a first transistor coupled to a first node of the pair of cross-coupled inverters. A plurality of transistors that form the pair of inverters have a first nominal threshold voltage. The first transistor is coupled to a first bit line, and has a second nominal threshold voltage that is lower than the first nominal threshold voltage. More specifically, in one embodiment, the first transistor is a write transistor and another write transistor having the second nominal threshold voltage is coupled to the other node of the pair of cross-coupled inverters.

Abstract: A static random access memory (SRAM) cell is disclosed which comprises a cross-couple inverter latch coupled between a positive supply voltage and ground, and having at least a first storage node, and a first and second switching device serially connected between the first storage node and a predetermined voltage source, wherein the first switching device is controlled by a word select signal, and the second switching device is controlled by a first bit select signal, wherein either the word select signal or the first bit select signal is only activated during a write operation.

Abstract: A semiconductor memory device has a simple layout pattern of a sub hole region. The semiconductor memory device includes a segment input/output line, a first local input/output line and a second local input/output line corresponding to the segment input/output line, an input/output switch configured to selectively connect the segment input/output line and the first local input/output line in response to a first switch control signal, and a dummy input/output switch which is connected to a second local input/output line but is not connected to the segment input/output line.

Abstract: A cache memory having valid bits, where a circuit configuration in a memory cell of a valid bit is improved so as to perform invalidation at high speed. The invention provides a cache memory including a memory cell that has a function to perform invalidation at high speed. One mode of the invention is a semiconductor device including a memory cell of a valid bit, where two inverters are connected in series to form a loop, a drain of an N-channel transistor is connected to an output signal line of one of the inverters, a gate thereof is connected to a reset signal line of a CPU, and a source thereof is connected to a ground line. The initial value of the memory cell is determined by inputting a reset signal of the CPU to the gate.

Abstract: A cross-point semiconductor memory device includes: a plurality of first wirings extending in a first direction; a plurality of second wirings positioned on a layer different from the first wirings to extend in a second direction different from the first direction; and memory parts provided in overlap areas of the first wirings and the second wirings, wherein the odd-numbered first wirings and the even-numbered first wirings are arranged on different insulating interlayers in an up-down direction.