Abstract: An embodiment of the present invention is an SRAM memory array comprising memory cells with each cell containing six devices, the storage nodes which store the true and complement of the data are constructed from a four device, cross coupled flip-flop cell, wherein one internal storage node of this cell is connected through an access pass gate to one local bit line (LBL), the second internal storage node connected in a like manner to a second LBL, each LBL connected to a limited number, e.g. 8 to 32 of other similar storage cells, the two LBLs each connected to the gate of a separate read head nFET for discharging to ground one of two previously precharged global read lines so as to pass the inverse of the signal on the LBL and thus on the read head gate to a global read/write bit line.

Abstract: In a sense amplifier circuit having a plurality of sense amplifier portions arranged in order, each of the sense amplifier portions includes a transistor that supplies a bit line potential to a bit line pair in a corresponding column of a memory cell array and a gate electrode for supplying a precharge signal to a gate of the transistor. The gate electrode of the plurality of sense amplifier portions is provided as one piece as a whole and extends in a direction parallel to a row direction in the memory cell array. A gate electrode portion which is a connected portion between the gate electrode in a k-th sense amplifier portion and the gate electrode in a (k+1)-th sense amplifier portion is ring-shaped, where k is an odd number.

Abstract: For one disclosed embodiment, an integrated circuit may comprise a memory array on the integrated circuit and access control circuitry on the integrated circuit. The memory array may have a bit line with one or more resistors along the bit line and may have a plurality of memory cells coupled to the bit line at a plurality of locations along the bit line. At least one resistor along the bit line may be between two locations at which memory cells are coupled to the bit line. The access control circuitry may be to select a memory cell coupled to the bit line and to sense a signal on the bit line from the selected memory cell. Other embodiments are also disclosed.

Abstract: An SRAM cell. The SRAM cell includes a first CMOS inverter and a second CMOS inverter, an input of the first inverter connected to an output of the second inverter and an input of the second inverter connected to an output of the first inverter, a first MOSFET interposed between an output of the first CMOS inverter and a first plate of a first capacitor, a second plate of the first capacitor connected to a high voltage terminal of a power supply; a second MOSFET interposed between an output of the second CMOS inverter and a first plate of a second capacitor, a second plate of the second capacitor connected to the high voltage terminal of the power supply; and a control signal line connected to a gate of the first MOSFET and a gate of the second MOSFET.

Abstract: The invention proposes a Random Access Memory (1) with a plurality of symmetrical memory cells (2) which are connected in groups to complementary bit lines (blc, blt), and the complementary bit lines (blc, blt) are coupled through a cross coupled device (31, 32), and the groups of memory cells are connected to complementary global data lines (data_c, data_t) used to provide data to a selected cell of the group of memory cells. The Random Access Memory is characterized in that switches (33, 34) are provided that deactivate the cross coupled device, wherein the switches (33, 34) are driven by the complementary global data lines (data_c, data_t). The invention relates further on to a computer comprising such a Random Access Memory.

Abstract: One memory cell is formed of a first port access transistor, a second port access transistor and a storage transistor coupled commonly to these access transistors. The first port access transistor is coupled to a first electrode of the storage transistor, and the second port access transistor is coupled to a third electrode of the storage transistor. These first and second port access transistors enter a selected state when first and second port word lines are selected, respectively, to couple corresponding second and third electrodes of the corresponding storage transistor to first and second port bit lines, respectively. A dual-port memory cell of which scalability can follow miniaturization in a process can be provided.

Abstract: This semiconductor memory device comprises a plurality of sub-arrays with a plurality of memory cells arranged in matrix form. Each local bit line is connected to a plurality of memory cells that are arranged in column direction in the sub-arrays. In addition, a global bit line is connected to the plural local bit lines. A column decoder is connected to the global bit line. The global bit line extends from the column decoder toward the plurality of sub-arrays, and it is cut before the furthest sub-array formed in the furthest region from that column decoder.

Abstract: A memory cell includes diffusion regions formed in a substrate. Each of the diffusion regions extends along a vertical direction in a layout view at a substrate level. A first gate electrode structure at a gate electrode level is generally dogleg shaped. The first gate electrode structure extends in an oblique direction, turns to a horizontal direction, extends over and crosses the diffusion regions in the horizontal direction. A first contact structure at a contact level is generally rectangular shaped in the layout view of the cell. The first contact structure electrically connects a first source/drain region of the first diffusion region to the first gate electrode structure and the first source/drain region of the second diffusion region. The first contact structure extends from the first source/drain region of the first diffusion region to the first source/drain region of the second diffusion region at the contact level.

Abstract: A memory array includes first and second sets of conductors and a plurality of memory-diodes, each connecting in a forward direction a conductor of the first set with a conductor of the second set. An electrical potential is applied across a selected memory-diode, from higher to lower potential in the forward direction, intended to program the selected memory-diode. During this intended programming, each other memory-diode in the array has provided thereacross in the forward direction thereof an electrical potential lower than its threshold voltage. The threshold voltage of each memory-diode can be established by applying an electrical potential across that memory-diode from higher to lower potential in the reverse direction. By so establishing a sufficient threshold voltage, and by selecting appropriate electrical potentials applied to conductors of the array, problems related to current leakage and disturb are avoided.

Abstract: Structures and methods of adding metal-to-metal capacitors to static memory cells to reduce susceptibility to SEUs. The addition of metal-to-metal capacitors is particularly suited to programmable logic devices (PLDs), because of the relatively large area required to implement an effective metal-to-metal capacitor, compared (for example) to the size of the static memory cell itself. The configuration memory cells of PLDs are typically placed next to other logic (e.g., the configurable elements controlled by the configuration memory cells) that can be overlain by the metal-to-metal capacitors. Therefore, metal-to-metal capacitors can be used in PLD configuration memory cells where they might be impractical in simple memory arrays. However, metal-to-metal capacitors can also be applied to integrated circuits other than PLDs.

Abstract: A semiconductor memory device and a dummy line biasing method in which in the semiconductor memory device of a diode structure including a plurality of memory cells each having one variable resistance device and one diode device, the memory device includes a plurality of normal word lines, a plurality of normal bit lines, at least one or more dummy word lines and at least one or more dummy bit lines. The plurality of normal word lines are each arrayed in a first direction as a length direction. The plurality of normal bit lines are each arrayed in a second direction as a width direction, intersected with the first direction, so that the plurality of normal bit lines are intersected with the normal word lines. At least one or more dummy word lines are arrayed in the same structure as the normal word lines in the first direction, the at least one or more dummy word lines having a constant level of applied voltage.

Abstract: A semiconductor memory device and a layout structure of word line contacts, in which the semiconductor memory device includes an active region, a plurality of memory cells, and word line contacts. The active region is disposed in a first direction as a length direction on a semiconductor substrate and is used as a word line. The plurality of memory cells are disposed in the first direction on the active region and are each constructed of one variable resistance device and one diode device. In the word line contacts, at least one each is disposed between respective units, wherein each unit is constructed of predetermined numbers of memory cells on the active region. A bridge effect, such as a short-circuit between adjacent word lines, can be prevented or substantially reduced.

Abstract: Systems and methods for reducing the latency of data transfers between memory cells by enabling data to be transferred directly between sense amplifiers in the memory system. In one embodiment, a memory system uses a conventional DRAM memory structure having a pair of first-level sense amplifiers, a second-level sense amplifier and control logic for the sense amplifiers. Each of the sense amplifiers is configured to be selectively coupled to a data line. In a direct data transfer mode, the control logic generates control signals that cause the sense amplifiers to transfer data from a first one of the first-level sense amplifiers (a source sense amplifier) to the second-level sense amplifier, and from there to a second one of the first-level sense amplifiers (a destination sense amplifier.) The structure of these sense amplifiers is conventional, and the operation of the system is enabled by modified control logic.

Abstract: Disclosed are a precharge circuit employing an inactive weak precharging and equalizing scheme, a memory device including the same and a precharging method. The inactive weak precharging and equalizing scheme equalizes a non-selected bit line and complementary bit line while sensing and amplifying memory cell data delivered to a selected bit line and complementary bit line to evaluate the voltage difference between the selected bit line and complementary bit line. Then, the scheme precharges the selected bit line and complementary bit line and the non-selected bit line and complementary bit line. This does not require high precharge driving capability for inactivated bit line and complementary bit line equalized to a predetermined voltage level so that precharge current and operating current can be reduced.

Abstract: A semiconductor memory device including a memory cell array, a first row decoder adjacent the memory cell array, and a second row decoder adjacent the memory cell array. A memory cell array may include first and second memory cell blocks on respective first and second semiconductor layers. The first memory cell block may include a first word line coupled to a first row of memory cells on the first semiconductor layer, the second memory cell block may include a second word line coupled to a second row of memory cells on the second semiconductor layer, and the first word line may be between the first and second semiconductor layers. The first row decoder may be configured to control the first word line, and the second row decoder may be configured to control the second word line. A first wiring may electrically connect the first row decoder and the first word line, and a second wiring may electrically connect the second row decoder and the second word line.

Abstract: An access circuit selectively couples an externally accessible terminal to each of a plurality of isolated DRAM wells in which respective DRAM arrays are fabricated. The access circuit for each well includes first and second transistors fabricated in respective wells coupled between the externally accessible terminal and a respective one of the DRAM wells. The well of the first transistor is coupled to the externally accessible terminal, and the well of the other transistor is coupled to a respective DRAM well. A control circuit applies select signals to gate electrodes of the first and second transistors. The control circuit includes respective shunt transistors that shunt the gate electrodes to the source regions of the first and second transistors when the transistors are turned off to isolate the respective DRAM wells from the external terminal regardless of the magnitude and polarity of a test voltage applied to the externally accessible terminal.

Abstract: A memory includes a volume of phase change material, a first transistor coupled to the volume of phase change material for accessing a first storage location within the volume of phase change material, and a second transistor coupled to the volume of phase change material for accessing a second storage location within the volume of phase change material.

Abstract: A data write transfer gate and a write driver transistor are connected to a data latch circuit for storing data, thereby producing a write data path. The data path is controlled by a word line and a data write bit line. In addition, a read drive transistor and a read transfer gate are connected to the latch circuit, thereby producing a read data path. The data path is controlled by a word line, a read bit line, and the data in the data latch circuit.

Abstract: A memory device includes a memory cell array block including memory cells, a word line driver block adjacent the memory cell array block disposed in a direction in which word lines of the memory cells are arranged, a sense amplifier block adjacent the memory cell array block disposed in a direction in which bit lines of the memory cells are arranged, a conjunction block disposed at an intersection of the word line driver block and the sense amplifier block, an equalizer for equalizing a pair of local data lines, the equalizer disposed in the conjunction block, and a local data line sense amplifier configured to sense and amplify signals on a pair of local data lines, and having transistors of a first type disposed in the conjunction block and transistors of a second type disposed in the sense amplifier block.

Abstract: An apparatus and method for operating a sense amplifier connecting/disconnecting circuit arrangement, in particular for a semiconductor memory device, including a switching device for connecting/disconnecting a sense amplifier to/from a bit line of a first cell field region, and for connecting/disconnecting the sense amplifier to/from from a bit line of a second cell field region, as a function of the state of control signals applied at control lines. Driver devices drive the control signal. Additional switches change the state of the control signals.

Abstract: Disclosed is a semiconductor memory device capable of realizing reduction in an SRAM unit cell area. Using as a standard configuration a parallel-type SRAM unit cell having each pair of load transistors, driver transistors and transfer transistors, all or a part of the gate electrodes and active regions configuring at least any one of the pairs of the transistors, for example, the pair of the transfer transistors are configured obliquely in a predetermined direction from the standard configuration. As a result, a size in a cell outside part including the driver transistor and the transfer transistor is reduced. At the same time, a distance between the load transistors in the central part is reduced as compared with that in the standard configuration. Thus, area reduction in the whole SRAM unit cell is realized.

Abstract: This non-volatile semiconductor storage device includes a flip-flop in which two inverters, each consisting of a load transistor and a storage transistor connected in series, are cross-connected; and two gate transistors, each respectively connected to a node of the flip-flop on a side thereof. The storage transistors of the inverters are constituted by storage transistors which can be threshold voltage controlled by injection of electrons into the neighborhood of their gates. This non-volatile semiconductor storage device further includes two bit lines, each of which is connected to a respective one of the two gate transistors; a word line which is connected to both of the gate electrodes of the two gate transistors; a first voltage supply line which is connected to the sources of the storage transistors of the inverters; and a second voltage supply line which is connected to the sources of the load transistors of the inverters.

Abstract: An integrated circuit device (e.g., a logic device or a memory device) having a memory cell array including a plurality of bit lines (e.g., first and second bit lines) and a plurality of bit line segments (e.g., first and second bit line segments) wherein each bit line segment is coupled to an associated bit line. The memory cell array further includes a plurality of memory cells, wherein each memory cell includes a transistor having a first region, a second region, a body region, and a gate coupled to an associated word line via an associated word line segment. A first group of memory cells is coupled to the first bit line via the first bit line segment and a second group of memory cells is coupled to the second bit line via the second bit line segment. A plurality of isolation circuits, disposed between each bit line segment and its associated bit line, responsively connect the associated bit line segment to or disconnect the associated bit line segment from the associated bit line.

Abstract: A conductive structure for gate lines and local interconnects in microelectronic devices. The conductive structure can be used in memory cells for SRAM devices or other types of products. The memory device cell can comprise a first conductive line, a second conductive line, a first active area, a second active area, a third active area, and a fourth active area. The first conductive line includes a first gate, a second gate, a first contact and a second contact. The second conductive line includes a third gate, a fourth gate, a third contact and a fourth contact. The first active area is electrically coupled to the first gate and the third contact; the second active area is electrically coupled to the second gate and the fourth contact; the third active area is electrically coupled to the third gate and the first contact; and the fourth active area is electrically coupled to the fourth gate and the second contact. The memory cell device, for example, can be a cell for an SRAM device.

Abstract: An exemplary dynamic random access memory includes a first transistor (210), a second transistor (220) and a comparator (230). The first transistor includes a first gate electrode (211), a first source electrode (213) and a first drain electrode (215). The second transistor includes a second gate electrode (221), a second source electrode (223) and a second drain electrode (225). The first source electrode is connected with the second source electrode. The first drain electrode is an input terminal for inputting a message. The comparator is connected to the second drain electrode, and preconfigured with a reference current. The comparator compares the reference current and a current through the second drain electrode to define a state of the current read from the comparator.

Abstract: An access circuit selectively couples an externally accessible terminal to each of a plurality of isolated DRAM wells in which respective DRAM arrays are fabricated. The access circuit for each well includes first and second transistors fabricated in respective wells coupled between the externally accessible terminal and a respective one of the DRAM wells. The well of the first transistor is coupled to the externally accessible terminal, and the well of the other transistor is coupled to a respective DRAM well. A control circuit applies select signals to gate electrodes of the first and second transistors. The control circuit includes respective shunt transistors that shunt the gate electrodes to the source regions of the first and second transistors when the transistors are turned off to isolate the respective DRAM wells from the external terminal regardless of the magnitude and polarity of a test voltage applied to the externally accessible terminal.

Abstract: A semiconductor memory device that can achieve high-speed operation or that is highly integrated and simultaneously can achieve high-speed operation is provided. Transistors are disposed on both sides of diffusion layer regions to which capacitor for storing information is connected and other diffusion layer region of each transistor is connected to the same bit line. When access to a memory cell is made, two transistors are activated and the information is read. When writing operation to the memory cell is carried out, two transistors are used and electric charges are written to the capacitor.

Abstract: Circuits and methods to design and to fabricate said circuits to accomplish a two-level DRAM cell or a multilevel DRAM cell using a natural transistor have been achieved. The usage of a natural transistor, having a threshold voltage of close to zero, as a pass transistor reduces the amount of current required for a read operation significantly. The usage of a natural transistor in a multi-level DRAM is enabling to implement easily a high number of voltage levels, and thus more information, in one DRAM cell and is reducing the amount of output current required as well. The fabrication of said DRAM cells in an integrated circuit, comprising a natural transistor and standard transistors, include masking of the natural transistor during the ion implantation to avoid impurities increasing the threshold voltage.

Abstract: A high resistor SRAM memory cell to reduce soft error rate includes a first inverter having an output as a first memory node, and a second inverter having an output as a second memory node. The second memory node is coupled to an input of the first inverter through a first resistor. The first memory node is coupled to an input of the second inverter through a second resistor. A pair of access transistors are respectively coupled to a pair of bit lines, a split word line and one of the memory nodes. The resistors are prepared by coating a layer of silicide material on a selective portion of the gate structure of the transistors included in the first inverter, and connecting a portion of the gate structure that is substantially void of the silicide material to the drain of the transistors included in the second inverter.

Abstract: Systems and methods of managing memory devices provide for reduced power consumption and better thermal management through enhanced memory throttling. In one embodiment a memory unit includes a memory device and a temperature measurement module coupled to the memory device. The temperature measurement device measures the internal temperature of the memory device. Memory throttling can therefore be implemented based on more accurate measurements and with a much shorter response time.

Abstract: Structures and methods of adding metal-to-metal capacitors to static memory cells to reduce susceptibility to SEUs. The addition of metal-to-metal capacitors is particularly suited to programmable logic devices (PLDs), because of the relatively large area required to implement an effective metal-to-metal capacitor, compared (for example) to the size of the static memory cell itself. The configuration memory cells of PLDs are typically placed next to other logic (e.g., the configurable elements controlled by the configuration memory cells) that can be overlain by the metal-to-metal capacitors. Therefore, metal-to-metal capacitors can be used in PLD configuration memory cells where they might be impractical in simple memory arrays. However, metal-to-metal capacitors can also be applied to integrated circuits other than PLDs.

Abstract: A BLT can include a different channel length, channel width, or both to compensate for bit line loading effects. The channel length and/or channel width of the transistor structure can be configured so as to achieve a desired loading. Thus, the bit line transistor structure can improve global metal bit line loading uniformity and provide greater uniformity in bit line bias. Additionally, the greater uniformity in bit line bias can improve reliability.

Abstract: The invention disclosed herein is a non-volatile memory device. The non-volatile memory device comprises: a first transistor connected between a first voltage and a control node, and controlled by a second voltage; a second transistor connected between the first voltage and the control node, and controlled by a third voltage, and a word line driver for driving a word line in responsive to a voltage of the control node. The second voltage is set to a ground voltage during an erase operation. The third voltage is set to a power voltage during the erase operation.

Abstract: A system and methods for addressing unique locations in a matrix. According to some embodiments, the system includes a plurality of uniquely addressable locations. A plurality of virtual columns that include a plurality of serially connected switch elements provide addressable access to the locations. The plurality of switch elements may be one of a plurality of responsive types and responsive to at least one of a plurality of possible switching signal types.

Abstract: A memory/logic cell layout structure includes a pair of memory/logic cells formed on a substrate. Each memory/logic cell (102, 104) can include a pair of memory areas to store data (106-0/106-1, 106-2/106-3), and a logic portion (108-0, 108-1) that receives the data stored therein. Memory areas and the logic portions of each memory/logic cell can be arranged on the substrate in a shape of an L, U, S, T, or Z to form a pair of interlocking memory/logic cells.

Abstract: A dynamic RAM incorporates a plurality of dynamic memory cells, each of which comprises a MOSFET having a gate set as a select terminal, one source and drain set as input/output terminals, and the other source and drain connected to storage nodes of a capacitor, a plurality of word lines respectively connected to the select terminals of the plurality of dynamic memory cells, a plurality of complementary bit line pairs respectively connected to the input/output terminals of the plurality of dynamic memory cells, and a sense amplifier array comprising a plurality of latch circuits which respectively amplify differences in voltage between the complementary bit line pairs placed so as to extend in directions opposite to each other from each pair of input/output terminals. Power supply lines are provided in mesh form inclusive of a portion above word drivers.

Abstract: A word line driver is provided for accessing a DRAM cell embedded in a conventional logic process. The DRAM cell includes a p-channel access transistor coupled to a cell capacitor. The word line driver includes an n-channel transistor located in a p-well, wherein the p-well is located in a deep n-well. The deep n-well is located in a p-type substrate. A word line couples the drain of the n-channel transistor to the gate of the p-channel access transistor. A negative boosted voltage supply applies a negative boosted voltage to the p-well and the source of the n-channel transistor. The negative boosted voltage is less than ground by an amount equal to or greater than the threshold voltage of the p-channel access transistor. The deep n-well and the p-type substrate are coupled to ground. The various polarities can be reversed in another embodiment.

Abstract: Thermal management and communication is described in the context of memory modules that contain several memory devices. In one example, the invention includes determining a temperature of a first memory device, the first memory device containing a plurality of memory cells, determining a temperature of a second memory device after determining the temperature of the first memory device, the second memory device containing a plurality of memory cells, and generating an alarm based on an evaluation of the first and the second temperatures. In another example, the invention includes detecting a thermal event on a memory device of a memory module that contains a plurality of memory devices, detecting the state of an event bus of the memory module, and sending an alert on the event bus if the event bus is in an unoccupied state.

Abstract: An area efficient stacked TCAM cell for fully parallel search. The TCAM cell includes a top half circuit portion interconnected with a replicated bottom half circuit portion such that there is a shared match line between each of the half circuit portions. Each TCAM cell includes a pair of memory elements that is connected to a pair of associated compare circuits such that the interconnections between the memory elements and the compare circuits are substantially vertical in active MOS layers and substantially horizontal in metal layers. The memory elements and the compare circuits are connected such that they facilitate shorter interconnections and sharing of terminals at the boundary of adjacent cells. The resulting stacked TCAM cell provides shorter match lines, shared bit lines, and reduced silicon area to facilitate improved routing and performance.

Abstract: Structures, systems and methods for transistors utilizing oxide nanolaminates are provided. One transistor embodiment includes a first source/drain region, a second source/drain region, and a channel region therebetween. A gate is separated from the channel region by a gate insulator. The gate insulator includes oxide insulator nanolaminate layers with charge trapping in potential wells formed by different electron affinities of the insulator nanolaminate layers.

Abstract: A semiconductor storage device in which a pair of wiring lines extending in a first direction are arranged repeatedly with a predetermined pitch, comprising: a group of pair transistors in which a plurality of pair transistors is arranged according to a repetition unit with a predetermined pattern, the pair transistors composed of a MOS transistor of which a gate is connected to one line of the pair of wiring lines and of another MOS transistor of which a gate is connected to the other line of the pair of wiring lines, wherein the repetition unit of the group of pair transistors includes a plurality of the pair transistors such that two MOS transistors are adjacent to each other in the first direction, and at least one pair of pair transistors such that two MOS transistors are not adjacent to each other and diagonally opposite to each other.

Abstract: A memory array architecture incorporates certain advantages from both cross-point and 1T-1Cell architectures during reading operations. The fast read-time and higher signal to noise ratio of the 1T-1Cell architecture and the higher packing density of the cross-point architecture are both exploited by using a single access transistor to control the reading of multiple stacked columns of memory cells, each column being provided in a respective stacked memory layer.

Abstract: The invention is directed to a layout of nonvolatile memory device. The memory cell has a gate electrode, a first doped electrode, and a second doped electrode. The first doped electrode is coupled to the bit line. The gate electrode is coupled to one separated word line. A shared coupled capacitor structure is coupled between all of memory cells of the adjacent bit lines from the second doped electrode. The capacitor structure has at least two floating-gate MOS capacitors. Each floating-gate MOS capacitor has a floating-gate transistor having a floating gate, a first S/D region and a second S/D region; and a MOS capacitor coupled to the floating gate. The first S/D region is coupled to the second doped electrode of the corresponding one of the transistor memory cells, and the second S/D region is shared with an adjacent one of the floating-gate transistor.

Abstract: Two memory areas on a wafer are coupled through pass transistors to double the memory capacity of each area and can be sawed to yield two memory chips each with single memory area. A pair of pass transistors are used to couple each dedicated functional pad in both memory areas, when the pass transistors are turned on. The connection between the pass transistor pair can be sawed through to yield single capacity memory dice. The memory capacity can be further increased by coupling more memory areas together with pass transistors.

Abstract: A dynamic random access memory (DRAM) unit includes pluralities of bit line pairs and word lines. Each bit line pair includes first and second bit lines aligned with each other in an end-to-end arrangement. The first bit lines are arranged substantially parallel and consecutively adjacent to one another. The second bit lines are arranged substantially parallel and consecutively adjacent to one another. Each word line is associated with either the first bit lines or the second bit lines. A first array is formed by the first bit lines and the associated word lines. A second array is formed by the second bit lines and the associated word lines. Each of a plurality of memory cells is associated with every other bit line along each word line. Each of a plurality of multiplexers is in communication with two adjacent bits lines within one of the first and second arrays.

Abstract: A semiconductor memory includes: a first node and a second node; a first MIS transistor, having first conductive carrier flows, including a source electrode connected to a first power supply, a drain electrode connected to the second node, and a gate electrode connected to the first node; a second MIS transistor, having second conductive carrier flows, including a source electrode connected to a second power supply, a drain electrode connected to the second node, and a gate electrode connected to the first node; and a resistance change element connected between the first node and the second node and having a variable resistance due to the direction in which a voltage is applied, wherein information is written in the resistance change element by applying a voltage between the first and the second node, and stored information is read out by applying a low or high input voltage to the first node and reading out a voltage difference in the second node.

Abstract: A nonvolatile memory device features a serial diode cell as a cross-point cell using a nonvolatile ferroelectric capacitor and a serial diode chain. The serial diode cell comprises a ferroelectric capacitor and a serial diode switch. The ferroelectric capacitor, located where a word line and a bit line are crossed, stores values of logic data. The serial diode switch is connected between the ferroelectric capacitor and the bit line and selectively switched depending on voltages applied to the word line. The nonvolatile memory device using a serial diode cell comprises a plurality of serial diode cell arrays, a plurality of word line driving units and a plurality of sense amplifiers. Each of the plurality of serial diode cell arrays each includes a single serial diode cell where a word line and a bit line are crossed. The plurality of word line driving units selectively drive the word line. The plurality of sense amplifiers sense and amplify data transmitted through the bit line.

Abstract: A memory device having an off-current (Ioff) robust precharge control circuit and a bit line precharge method are provided. The precharge control circuit may be embodied as a delay circuit unit which receives and delays a precharge enable signal for a predetermined delay time; a NAND gate which receives the precharge enable signal and the output of the delay circuit; and an inverter which inverts the output of the NAND gate. The precharge control circuit may enable the word lines before disabling the precharge signal.

Abstract: A 2-port SRAM includes a memory cell having: a latch circuit holding potential at storage nodes complementarily; access transistors arranged between the storage nodes and bit lines, respectively, and turned on in response to word lines being activated; a write access transistor and a storage level drive transistor arranged between the storage nodes, respectively, and a ground potential and turned on in response to a first one of the word lines being activated and a sub bit line, respectively, and a write access transistor turned on in response to a second one of the word line being activated and a storage level drive transistor turned on in accordance with a sub bit line.

Abstract: Line drivers that fit within a specified line pitch. One method of placing line drivers completely underneath a cross point array requires splitting the line driver up so that a portion of the line drivers is on a first side of the cross point array and the other portion is on the opposite side. However, using this technique requires that the width of the drivers is no larger than the width of the memory cells that are being driven. This can be accomplished by stacking transistors such that line drivers fit within a specified line pitch, but are as long as is necessary to include all the necessary circuitry.