Abstract: A diffracting x-ray optic for accepting and redirecting x-rays. The optic includes at least two layers, the layers having a similar or differing material composition and similar or differing crystalline orientation. Each of the layers exhibits a diffractive effect, and their collective effect provides a diffractive effect on the received x-rays. In one embodiment, the layers are silicon, and are bonded together using a silicon-on-insulator bonding technique. In another embodiment, an adhesive bonding technique may be used. The optic may be a curved, monochromating optic.

Abstract: A two-dimensional x-ray scattering camera includes a source, an optic, a detector, and a pair of collimating blocks. The source emits x-ray beams that are reflected by the optic towards a sample. The detector detects scattering from the sample, the pair of collimating blocks is positioned between the optic and the detector to collimate the beam. A bottom surface of one block is substantially parallel a top surface of the other block, and the blocks are rotatable relative to the beam about a pivot. The system forms a two-dimensional beam that is symmetric about the primary beam axis at the detector position, regardless how the beam is collimated by the collimating blocks. The system therefore eliminates smearing and can be used for anisotropic small angle scattering at high resolution and low Qmin.

Abstract: An x-ray optical system for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic. Accordingly, the system may use a source that has a circular emission profile or a large source to provide increased flux to a sample.

Abstract: Enhanced methods and a device enabling a plurality of tools for implementing a plurality of procedures for the accurate alignment and calibration of multiple components of the experimental set up at a synchrotron beam line are provided. The device includes an alignment pin or needle for centering a sample rotation axis. The device includes a YAG crystal for visualization of the beam and beam alignment and a metal foil for transmission or fluorescence measurements used for the monochromator calibration. The same, or different foils, or powders, or polymers, can be used for obtaining powder rings for finding the direct beam coordinates, for centering the beamstop on the direct beam and for calibration of the sample-to-detector distance.

Abstract: A Method for X-ray wavelength measurement and an X-ray wavelength measurement apparatus capable of determining absolute wavelength easily and carrying out wavelength measurement having high precision with a simple structure are provided. The present invention is a Method for X-ray wavelength measurement carried out by using a channel-cut crystal for wavelength measurement (20) in which two opposing cut planes are formed and the lattice constant of which is known, and the method diffracts X-ray in respective arrangements (?, +) and (+, ?) of the channel-cut crystal for wavelength measurement (20), to determine the absolute wavelength of the X-ray from the difference between crystal rotation angles in respective arrangements. This makes the alignment simpler, and, when only a channel-cut crystal suitable for measurement can be prepared, X-ray wavelength measurement can be carried out easily and with high precision.

Abstract: An X-ray lens assembly, a device including the X-ray lens assembly and a method of manufacturing the X-ray lens assembly are described. The X-ray assembly comprises a tube member (50) including an inlet opening (90) for X-rays and an outlet opening (94) for X-rays. Additionally, the assembly comprises a capillary X-ray lens (28) mounted inside the tube member (50). The X-ray lens (28) may be mounted inside the tube member (50) by a stabilizing agent and/or by one or more separate mounting structures (96A, 96B).

Abstract: An x-ray optical device delivers an x-ray beam with variable convergence. The convergence or the divergence of the x-ray beams varies over different parts of the reflector. The device may include an adjustable aperture to further select the convergence or divergence. The adjustable aperture selects the convergence angle by selectively occluding a portion of the x-ray beams.

Abstract: The invention relates to a monochromator device for selecting at least one wavelength band from incident radiation in a given wavelength range. The monochromator device may include at least one optical layer of a monocrystalline material having a crystallographic line that is adapted to the at least one wavelength band to be selected; and a mechanical substrate. The at least one optical layer and the mechanical substrate are assembled by molecular bonding.

Abstract: Phase contrast imaging is achieved using a sample mask 8 and a detector mask (6). X-rays emitted from x-ray source (2) are formed into individual beams (16) by sample mask which pass through sample (14) and arrive at individual pixels (12) of the detector (4) through detector mask (6). The individual x-ray beams are arranged to hit the pixel edge (20) of individual rows of pixels, individual columns of pixels or individual pixels. Small deviations ? in the individual beams (16) cause a significant increase or decrease in the signal hitting the exposed area (22) of the pixel resulting in a significant phase contrast signal.

Abstract: A high precision posture control method for sustaining the posture of an X-ray optical element constantly at 1 ?rad or less. A longitudinal condensation mirror (5) and a lateral condensation mirror, each having a condensation plane band (7) consisting of an elliptical reflective surface, are arranged perpendicularly to each other to form a K-B mirror arrangement. Fresnel mirrors are respectively constituted of a pair of planar reflective surfaces (9, 10) formed in the vicinities of the incident side end and the exit side end of the condensation plane band of each condensation mirror. Interference fringe (13) by the Fresnel mirror of each condensation mirror is independently monitored at a position insusceptible to a condensation beam by the condensation plane band, and variation in interference fringe is detected electrically and its detection signal is used as a feedback signal for posture control of each condensation mirror.

Abstract: A method for obtaining a concentrated, monochromatic x-ray beam from a standard x-ray tube or other source of polychromatic emission. X-rays from the anode of the x-ray tube fluoresce an adjoining, independent target that produces a monochromatic spectrum, a portion of which is focused by the x-ray optical system. This two-stage method gives the system considerably versatility without undue loss in signal. The two-stage concentrator makes practical the use of focusing optics in hand-held and portable instruments.

Abstract: Provided is a method of bright-field imaging using x-rays in a sample to reveal lattice defects as well as structural inhomogeneities, the method comprising: (a) disposing a sample on a holder in the Laue transmission geometry and setting the sample to a single reflection in the Bragg diffraction; (b) projecting a beam of monochromatic x-rays on the sample; and (c) obtaining transmitted radiographic images and reversed diffracted images of the projected beam of monochromatic x-rays by the sample, respectively.

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced, the source spot requiring alignment along a transmission axis passing through the sample spot. A first housing section is provided, to which the x-ray tube is attached, including mounting features for adjustably mounting the x-ray tube therein such that the source spot coincides with the transmission axis. A second housing section includes a second axis coinciding with the transmission axis; and at least one x-ray optic attached to the second housing section for receiving the diverging x-ray beam and directing the beam toward the sample spot. Complimentary mating surfaces may be provided to align the first and second sections, and the optics, to the transmission axis. A third housing section may also be provided, including an aperture through which the x-ray beam passes, and to which a detector may be attached.

Abstract: An x-ray imaging system includes an optical device having at least one point-focusing, curved monochromating optic for directing x-rays from an x-ray source towards a focal point. The at least one point-focusing, curved monochromating optic provides a focused monochromatic x-ray beam directed towards the focal point, and a detector is aligned with the focused monochromatic x-ray beam. The optical device facilitates x-ray imaging of an object when the object is located between the optical device and the detector within the focused monochromatic x-ray beam. In various embodiments: each point-focusing, curved monochromatic optic has an optical surface that is doubly-curved; the optical device facilitates passive image demagnification or magnification depending upon placement of the object and detector relative to the focal point; and at least one second point-focusing, curved monochromatic optic can be employed to facilitate refractive index or polarized beam imaging of the object.

Abstract: A detector apparatus is disclosed that includes a housing and a multilayer disposed within the housing. The multilayer defining a leading edge and a trailing edge and is adapted to interact with a plurality of high-energy photons, impingent from the leading edge, to permit passage of photons of at least one selected energy. The multilayer is secured to a first securement adjacent to the leading edge. The multilayer is secured to a second securement bracket adjacent to the trailing edge. At least one detector is disposed adjacent to the trailing edge of the multilayer to detect the impingent high-energy photons. An adjustment mechanism operatively connects to the second securement bracket to adjust the position of the second securement bracket, thereby altering an angular position of the multilayer.

Abstract: An x-ray system or method for exciting a sample under x-ray analysis, using a curved monochromating optic for directing a monochromatic x-ray beam from an x-ray source towards a first focal area. A second optic is positioned within, and receives, the monochromatic x-ray beam, and directs a focused x-ray beam towards a second focal area on the sample. A detector is positioned near the sample to collect radiation from the sample as a result of the focused x-ray beam. The curved monochromating optic produces a beam spot size at the first focal area larger than a beam spot size produced by the second optic at the second focal area, therefore, a beam spot size on the sample is thereby reduced using the second optic. Doubly-curved monochromating optics, and polycapillary optics, are disclosed as possible implementations of the optics.

Abstract: For reducing absorption in a refractive element, the present invention relates to a refractive element (10, 20), suitable for refracting x-rays, comprising a body with low-Z material having a first end adapted to receive rays emitted from a ray source and a second end from which the rays received at the first end emerge. The refractive element comprises columns of stacked substantially identical prisms (21). The invention also relates to lens element.

Abstract: An X-ray optical system provides selectively a linear X-ray beam and a point X-ray beam while using an X-ray source which generates an X-ray beam having a linear section. When the point X-ray beam is selected, an X-ray intensity per unit area becomes higher. The X-ray optical system has an X-ray source, a parabolic multilayer mirror to which an aperture slit plate is attached, an optical-path selection slit device, a polycapillary optics and an exit-width restriction slit. The polycapillary optics and the exit-width restriction slit are detachably inserted into a path of a parallel beam coming from the parabolic multilayer mirror, and thus they can be removed from the path and a Soller slit and a divergence slit can be inserted instead.

Abstract: According to one embodiment a broad-angle multilayer (ML) mirror system is disclosed. The ML mirror includes a multiple layer structure configured to provide uniform reflectivity over a wide range of angles with small phase shifts.

Abstract: An X-ray imaging system is provided that includes a target for emitting X-rays and having at least one target focal spot, and an array of multilayer optic devices for transmitting X-rays through total internal reflection. The array of multilayer optics devices are in optical communication with the at least one target focal spot. Further, a method for imaging an object with an X-ray imaging machine is provided. Also, a method for forming a stack of multilayer optic devices is provided.

Abstract: An x-ray focusing device generally includes a slide pivotable about a pivot point defined at a forward end thereof, a rail unit fixed with respect to the pivotable slide, a forward crystal for focusing x-rays disposed at the forward end of the pivotable slide and a rearward crystal for focusing x-rays movably coupled to the pivotable slide and the fixed rail unit at a distance rearward from the forward crystal. The forward and rearward crystals define reciprocal angles of incidence with respect to the pivot point, wherein pivoting of the slide about the pivot point changes the incidence angles of the forward and rearward crystals while simultaneously changing the distance between the forward and rearward crystals.

Abstract: A method and apparatus for constructing a 3-dimensional image of the internal organs invisible by the conventional method is provided.

Abstract: A diffractometer, having variable center and suitable for performing analysis on hidden or hardly accessible bodies or specimens is described. Said variable center diffractometer is equipped with an analytical unit that comprises: a circle arc structure, called Euler cradle; a radiation beam source and a detector of the said radiation beam; devices for the pointing of the analytical unit; devices for the movements of said analytical unit in the space; devices for rotation of said source and detector along the Euler cradle; characterized by the fact that it comprises also: devices able to rotate said source and detector with respect to an orthogonal axis to the plane containing the Euler cradle; collimators or deflectors firmly placed on the said radiation source and detector.

Abstract: A multilayer film reflector capable of simply correcting a wavefront phase and a method of forming the reflector are disclosed. For this purpose, a reflector using reflection by a multilayer film is disclosed. This multilayer film is formed in a number of cycles larger than that necessary to substantially saturate a reflectance, and a wavefront phase of emerging rays is adjusted by cutting away the multilayer film in accordance with an amount of adjustment of the wavefront phase. Further, the formation of a correction film as well as the formation of a multilayer larger than necessary to substantially saturate the reflectance permits the correction of a phase by cutting away also the multilayer film when the phase cannot be corrected only by cutting away the correction film, whereby the phase can be corrected more accurately.

Abstract: A method for detecting a mass density image of an object. An x-ray beam is transmitted through the object and a transmitted beam is emitted from the object. The transmitted beam is directed at an angle of incidence upon a crystal analyzer. A diffracted beam is emitted from the crystal analyzer onto a detector and digitized. A first image of the object is detected from the diffracted beam emitted from the crystal analyzer when positioned at a first angular position. A second image of the object is detected from the diffracted beam emitted from the crystal analyzer when positioned at a second angular position. A refraction image is obtained and a regularized mathematical inversion algorithm is applied to the refraction image to obtain a mass density image.

Abstract: An energy beam is irradiated onto a target from an energy beam source, thereby generating an X-ray with an irradiating area to be irradiated onto an object. Then, the X-ray is introduced into a spectrometer, thereby generating an X-ray with parallelism through the selection of wavelength and wavelength range.

Abstract: The invention relates to a monochromator device for selecting at least one wavelength band from incident radiation in a given wavelength range. The monochromator device may include at least one optical layer of a monocrystalline material having a crystallographic line that is adapted to the at least one wavelength band to be selected; and a mechanical substrate. The at least one optical layer and the mechanical substrate are assembled by molecular bonding.

Abstract: Disclosed is an X-ray diffraction apparatus that irradiates a sample with X-ray emitted from an X-ray source by resting the X-ray using a divergence slit and detects diffracted X-ray generated from the sample using an X-ray detector. The divergence angle of the divergence slit is a fixed value, and the divergence slit is a slit that restricts the X-ray irradiation width in the sample width direction. The sample is arranged in a longitudinally-elongated manner in which its sample width is smaller than a standard sample width and its sample height is the same as a standard sample height. X-ray intensity calculated based on an output of the X-ray detector is compensated based on an effective divergence angle calculated based on the sample width to thereby obtain true X-ray intensity.

Abstract: An x-ray source comprises a structured anode that has a thin top layer made of the desired target material and a thick bottom layer made of low atomic number and low density materials with good thermal properties. In one example, the anode comprises a layer of copper with an optimal thickness deposited on a layer of beryllium or diamond substrate. This structured target design allows for the use of efficient high energy electrons for generation of characteristic x-rays per unit energy deposited in the top layer and the use of the bottom layer as a thermal sink. This anode design can be applied to substantially increase the brightness of stationary, rotating anode or other electron bombardment-based sources where brightness is defined as number of x-rays per unit area and unit solid angle emitted by a source and is a key figure of merit parameter for a source.

Abstract: A zone plate multilayer structure includes a substrate carrying a plurality of alternating layers respectively formed of tungsten silicide (WSi2) and silicon (Si). The alternating layers are sequentially deposited precisely controlling a thickness of each layer from a minimum thickness of a first deposited layer adjacent the substrate to a maximum thickness of a last deposited layer. The first minimum thickness layer has a selected thickness of less than or equal to 5 nm with the thickness of the alternating layers monotonically increasing to provide a zone plate multilayer structure having a thickness of greater than 12 ?m (microns). The x-rays are diffracted in Laue transmission geometry by the specific arrangement of silicon and tungsten silicide.

Abstract: The invention relates to an optical device intended to treat an incident X-ray beam. The optical device comprises a monochromator and an optical element for conditioning the incident beam. The reflective surface of the optical element is able to produce a two-dimensional optical effect in order to adapt a beam in destination of the monochromator. The reflective surface of the optical element comprises a multilayer structure type surface that is reflective to X-rays. In particular, the reflective surface consists of a single surface shaped according to two curvatures corresponding to two different directions.

Abstract: A method for producing X-ray optics includes providing a wafer of crystalline material having front and rear surfaces and a lattice spacing suitable for reflecting incident X-rays of a given wavelength. A thin film is deposited on the front surface of the wafer so as to generate compressive forces in the thin film sufficient to impart a concave curvature to the rear surface of the wafer with at least one radius of curvature selected for focusing the incident X-rays.

Abstract: An apparatus directing x-rays along a predetermined axis includes an x-ray optic having one or more nested x-ray reflector rings positioned relative to a source generating broad spectrum x-rays so that generated x-rays moving away from the predetermined axis are collected by the reflector incident at or close to a Bragg angle to thereby reflect the collected x-rays into a conically parallel beam. A first diffractor is positioned relative to the x-ray optic to receive incident thereon the conically parallel beam, the first diffractor selected from a truncated cone and a cylinder and diffracting the conically parallel beam toward the predetermined axis. A second diffractor is positioned relative to the first diffractor and having a geometry effective to receive incident thereon and redirect the conically parallel beam along the predetermined axis as a collimated beam of substantially parallel x-rays.

Abstract: An x-ray mirror provides focusing and monochromatization while maintaining a high degree of reflectivity. The mirror has at least two mirror portions, one with a multilayer surface that provides the desired monochromating, and the other with a total external reflection surface. The multiple surfaces combine to provide the desired focusing of the x-rays from a source to a focus point. A variety of configurations may be used, each of which does the desired focusing and monochromatization with minimal energy loss. Relative positioning of the mirror portions may also allow for adjustment of the focus length.

Abstract: There is provided an illumination system for lithography with wavelengths of ?193 mn. The system comprises a first optical element, which is divided into first raster elements and lies in a first plane. The first plane defines an x-direction and a y-direction, the first raster elements each have an x-direction and a y-direction with an aspect ratio, and at least two of the first raster elements have aspect ratios of different magnitude.

Abstract: An x-ray imaging system uses particular emission lines that are optimized for imaging specific metallic structures in a semiconductor integrated circuit structures and optimized for the use with specific optical elements and scintillator materials. Such a system is distinguished from currently-existing x-ray imaging systems that primarily use the integral of all emission lines and the broad Bremstralung radiation. The disclosed system provides favorable imaging characteristics such as ability to enhance the contrast of certain materials in a sample, to use different contrast mechanisms in a single imaging system, and to increase the throughput of the system.

Abstract: A zone plate multilayer structure includes a substrate carrying a plurality of alternating layers respectively formed of tungsten silicide (WSi2) and silicon (Si). The alternating layers are sequentially deposited precisely controlling a thickness of each layer from a minimum thickness of a first deposited layer adjacent the substrate to a maximum thickness of a last deposited layer. The first minimum thickness layer has a selected thickness of less than or equal to 5 nm with the thickness of the alternating layers monotonically increasing to provide a zone plate multilayer structure having a thickness of greater than 12 ?m (microns). The x-rays are diffracted in Laue transmission geometry by the specific arrangement of silicon and tungsten silicide.

Abstract: Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.

Abstract: The material composition of a thin film formed on a substrate or covered by a cap layer that shares one or more elements with the thin film can be determined by combining characteristic material data, such as characteristic x-ray data, from a material composition analysis tool, such as an electron probe-based x-ray metrology (EPMA) operation, with thickness data and (optionally) possible material phases for the thin film. The thickness data and/or the material phase options can be used to determine, for example, the penetration depth of a probe e-beam of the EPMA tool. Based on the penetration depth and the thin film thickness, the characteristic x-ray data from the EPMA operation can be analyzed to determine the composition (e.g., phase or elemental composition) of the thin film. An EPMA tool can include ellipsometry capabilities for all-in-one thickness and composition determination.

Abstract: To obtain an image that uses both an accurate spatial differential of an object-caused phase shift and the phase shift as contrast at a small observation field of view and under a simplified apparatus configuration , , , . a spatial differential of the object-caused phase shift and the phase shift are arithmetically obtained from the diffraction images of the object formed by simultaneous X-ray diffraction of crystals.

Abstract: A multifunctional hard x-ray nanoprobe instrument for characterization of nanoscale materials and devices includes a scanning probe mode with a full field transmission mode. The scanning probe mode provides fluorescence spectroscopy and diffraction contrast imaging. The full field transmission mode allows two-dimensional (2-D) imaging and tomography. The nanoprobe instrument includes zone plate optics for focusing and imaging. The nanoprobe instrument includes a stage group for positioning the zone plate optics. The nanoprobe instrument includes a specimen stage group for positioning the specimen. An enhanced laser Doppler displacement meter (LDDM) system provides two-dimensional differential displacement measurement in a range of nanometer resolution between the zone-plate optics and the sample holder. A digital signal processor (DSP) implements a real-time closed-loop feedback technique for providing differential vibration control between the zone-plate optics and the sample holder.

Abstract: The object of the invention is to provide a transmission filter for EUV radiation which has a sufficiently narrow transmission window to characterize EUV radiation in a narrowly defined spectral region. This object is met by providing a transmission layer system having at least one uranium-containing layer.

Abstract: A method for detecting an enhanced image of an object by independently analyzing, detecting, digitizing, and combining images acquired on a high and a low angle side of a rocking curve of a crystal analyzer. An x-ray beam generated by a line x-ray source is collimated by a crystal monochromator including two non-matching crystals to form an x-ray area beam. The x-ray area beam is transmitted through an object to be imaged and onto an image detector and the image is digitized. The digitized images are simultaneously solved, preferably on a pixel-by-pixel basis, to derive an enhanced image which has dramatically improved contrast and spatial resolution over an image acquired through conventional radiology methods.

Abstract: A multiple wavelength X-ray source includes an electron-generating cathode and an anode with multiple target regions, each of which emits X-rays at a different characteristic wavelength in response to the electrons. The different X-ray radiation outputs are focused by different focusing sections of a focusing optic. The multiple focusing sections are in different respective locations, and each focuses its respective X-ray radiation onto a sample. The focusing sections may be side-by-side mirrors in a Kirkpatrick-Baez configuration, or in a single-bounce, doubly curved elliptical configuration.

Abstract: An X-ray optical element for and influencing of X-ray beam characteristics in two dimensions includes two reflective, curved elements arranged side-by-side to receive X-ray radiation from an X-ray beam source so that the radiation is directed onto both reflective elements and then reflected from one element onto the other element, wherein the two reflective elements are curved at different angles and have different focal lengths.

Abstract: A phase-contrast x-ray computed tomography scanner, a monochromatic diffraction computed tomography scanner, a rotatable monochromatic diffraction computed tomography scanner, and a combination phase-contrast and monochromatic computed tomography scanner are provided. In addition, a method of identifying an unknown sample is provided.

Abstract: To provide an optical thin film structure capable of efficiently dissipating heat in an optical thin film which is generated upon irradiating a surface of an X-ray mirror made up of the optical thin film with an X-ray. The optical thin film having an isotope purity higher than a natural isotope abundance ratio is formed on a mirror to increase heat conductivity of the optical thin film itself and quickly dissipate heat accumulated in the thin film to the outside of an optical system. Consequently, the mirror having high reflectively can be obtained, in which a fine structure of the optical thin film is by no means broken.

Abstract: In an x-ray lens for focusing x-rays over a large energy range wherein the lens comprises a large number of lens elements, the lens elements have a quasi-parabolic profile Y(x) according to the equation Y(x)=x2/2[(r+f(x))] Wherein x represents the parabola axis, l/2r represents the half parameter of the parabola and f(x) represents a function different from zero.

Abstract: In a method for X-ray reflectance measurement in which an intensity of a reflected X-ray is observed for each incident angle, a measuring scale for the incident angle ? is corrected, before the reflectance measurement, using an analyzer crystal. In the corrective operation, the aperture width of the receiving slit is made wider than in the X-ray reflectance measurement, and the analyzer crystal is inserted in the reflection path, and then the reflected X-ray intensity is detected. In this condition, the incident angle ? of the incident X-ray to the sample surface can be determined accurately, and thus the measuring scale for the incident angle can be corrected. Thereafter, the analyzer crystal is removed from the reflection path, and the X-ray reflectance measurement for the sample surface is carried out.

Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation ? from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation ? produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation ?. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.