Scatter Analysis Patents (Class 378/86)
  • Patent number: 4426718
    Abstract: The X-ray diffraction apparatus of the invention includes means capable of detecting the position and intensity distribution of the diffracted X-ray with respect to a thin bundle X-ray and means for moving the former means to a position at which the former means is capable of detecting the diffracted X-ray, and makes it possible to reliably and easily carry out rough detection of the position of the diffracted X-ray and fine detection of the intensity distribution of the diffracted X-ray without increasing the size of the diffracted X-ray detecting means.
    Type: Grant
    Filed: August 27, 1981
    Date of Patent: January 17, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Hayashi, Shinji Sakata, Tasuku Shimizu