Abstract: In a method and a device for finishing an endless fabric, the endless fabric is transported past a rotating applicator roll that is wetted with a liquor, in order to apply the liquor onto the endless fabric. On the endless fabric that has been transported onwards, after drying, the thread add-on, or its change, is measured and evaluated on an ongoing basis by a sensor, in order to regulate the rotational speed of the application roll as a function of the measuring result. A device is suitable for implementing the method.

Abstract: A method is provided for manufacturing a high-precision mold whereby a feature matching a desired feature design is carved into a hard mold material (41) using, for example, a diamond grinding wheel and/or a diamond turning point. Inherent imprecision and errors (49) introduced by the use of the grinding wheel/turning point are measured to determine deviations from the desired feature design. An ultrafast shortpulse laser is then activated to desirably ablate the deviations, thereby correcting the errors and conforming the feature to the desired shape. Furthermore, a thin film (1602) may be formed over the feature either prior to or after the laser ablation process, where the error measurement and laser ablation processes detects and ablates errors on the surface of the thin film, respectively. Additionally, the laser ablation process may be applied directly to, for example, an optical lens (1400) formed from an imprecise mold to remove any errors and imperfections thereon.

Abstract: A method is provided for coating optical lenses and other optical articles with anti-reflection (AR) coatings. The lenses have low reflectivity, provide a substantially white light reflection and have a low stress AR coating and are ideally suited for optical lenses made using a molding procedure which provides a low stress lens substrate. In one aspect the method uses special coating compositions with one being a high index of refraction composition and the other being a low index of refraction composition. In another aspect a method is also disclosed using an optical monitor in conjunction with a conventional vapor deposition apparatus whereby an optical reference lens is used and a particular light frequency of reflected light is measured and this measurement is then used to determine when the desired optical coating is achieved. In a still further aspect the method also preferably calculates the optical thickness of each layer using a specific ratio of blue to green to red colors in the reflected light.

Abstract: A microdeposition system (20) and method deposits precise amounts of fluid material onto a substrate. A microdeposition head (50) includes a plurality of spaced nozzles. A positioning device controls a position of the microdeposition head relative to the substrate. A controller (22) includes a positioning module that communicates with the positioning device and that generates position control signals for the positioning device. A nozzle firing module communicates with the microdeposition head (50) and selectively generates nozzle firing commands to define features of at least one layer of an electrical device, such as resistors, traces and capacitors on a printed circuit board, polymer light emitting diodes, and light panels.

Abstract: A microdeposition system (20) and method deposits precise amounts of fluid material onto a substrate. A microdeposition head (50) includes a plurality of spaced nozzles that fire droplets having a deposited width when deposited on the substrate. A positioning device moves the microdeposition head (50) relative to the substrate at a head speed. A controller (22) generates over-clocking signals at a rate that is substantially greater than the head speed divided by the droplet width to improve resolution. The controller (22) includes a positioning module that generates position control signals for the positioning device. The controller (22) includes a nozzle firing module (114) that generates nozzle firing commands based on the over-clocking rate to fire the nozzles to form droplets that define features on the substrate.

Abstract: The plating method comprises the steps of dividing a region, to be plated, into a group of mesh-like zones, measuring a plating area of each of the zones, comparing the measurement values of the plating areas and judging whether or not the plating area has any variance, and conducting a design change, on patterns contained in this zone, to eliminate the variance.

Abstract: Solder paste application, inspection and correction. Following or during application of solder paste on a substrate, the result thereof is inspected and any detected errors are registered. Following an evaluation as to whether correction of these errors is required and if it would be worthwhile, the errors are corrected. The correction involves removing solder paste from locations where so required, and jetting of additional solder paste to locations where so required.

Abstract: A process for forming a thin film is described that enables automatic formation of thin films having constant optical properties reliably and in large quantities with excellent reproducibility suitable for mass production. An apparatus for performing the process is also described. Generally, a material for vapor deposition is vaporized by an electron gun and an antireflection film forms by vapor deposition on lenses held by a coat dome. The electric power applied to the electron gun is controlled so that the amount of transmitted or reflected light continuously measured by an optical film thickness meter during thin film formation is compared to a reference amount of measured light stored in a means for storing data until the measured and reference amounts of measured light are close to, or the same as, one another.

Abstract: The apparatus for processing an in-process substrate by generating a plasma have a processing chamber with an observation window, in which the in-process substrate is disposed; plasma generating means for generating a plasma in the inside of the processing chamber; irradiation means for projecting a light beam into the inside of the processing chamber through the observation window; detection means for detecting the light projected and reflected from the inside wall of the chamber by the irradiation means; and data processing means for obtaining information on the state of contamination of the inside wall of the processing chamber by processing signals obtained through detection of the reflected light by the detection means, and thereby permitting simultaneously monitoring of both the state of contamination of an inside wall of the processing chamber and foreign materials suspended in the processing chamber, with a single observation window and an optical system composed of one unit.

Abstract: A process for color matching a metallic paint by taking a color measurement reading at a single angle using a regular spectrophotometer or colorimeter is provided. The preferred type of metallic pigment to be utilized in preparing the matching color can be selected by microscopic evaluation of the metallic pigment in the target metallic paint to identify its size, shape and probable composition.

Abstract: Within a method of making an optical interference filter, sample spectra and measurements of a predetermined characteristic associated with respective spectra are provided. Upon selection of an initial number of filter layers and a thickness for each layer, a transmission spectrum is determined. Each sample spectrum is applied to a regression formula that relates interaction of light with the transmission spectrum to a regression value. A comparison relationship between the calculated regression values and the sample measurements is defined and optimized, wherein thickness of each layer is an optimization variable.

Abstract: A method and an apparatus for characterizing an uncertainty factor relating to processing workpieces. A first processing step is performed upon a workpiece. A first uncertainty factor associated with the first processing step is calculated. A final uncertainty factor associated with an end-of-line parameter relating to the workpiece is calculated based upon the first uncertainty factor. A process control function based upon the final uncertainty factor is performed.

Abstract: A method of producing a finish for a selected wood substrate, wherein the finish provides the selected wood substrate with a color that matches the color of a target object. In accordance with the method, calculations are performed to determine the quantities of at least one group of colorants required to produce a semitransparent wood stain from a vehicle, wherein when the semitransparent wood stain is applied to the selected wood substrate, the selected wood substrate will have a color that matches the target object. The calculations are performed using reflectance measurements of the target object obtained using a spectrophotometer and previously obtained spectral data of the colorants as applied to at least one type of wood. The colorants used to form the semitransparent wood stain do not include a white colorant.

Abstract: Method for manufacturing a workpiece by a vacuum treatment process includes providing a vacuum treatment system with first second parts in a vacuum chamber. Either a sensor or an adjusting element with first signal connection is mounted on the second part. An electronic unit in the chamber has a reference potential and a second electric signal connection. The first part is connected to a system reference potential. A workpiece goes into the chamber and the method includes operating the second part at a further electric potential different from the system reference potential by at least 12 V. The method includes connecting the first electric signal connection to the second electric signal connection and maintaining the reference connection during operation on the further electric potential by metallically connecting the reference connection to the second part.

Abstract: An apparatus for continuously monitoring a photopolymerization reaction in real time by optical pyrometry includes a housing having a chamber; a sample mount that may be disposed within the chamber; a light source for supplying light to induce a photopolymerization reaction in a monomer sample disposed on the sample mount; and an optical pyrometer that may be attached to the housing for measuring temperature of the monomer sample. The temperature of the sample with respect to time is used to monitor progress of the reaction. Another apparatus for monitoring a photopolymerization reaction combines optical pyrometry and infrared spectroscopy. The apparatus includes a sample mount disposed in a beam of an infrared spectrometer a light source for supplying light to induce a photopolymerization reaction in a monomer sample disposed on the sample mount and an optical pyrometer for measuring temperature of the monomer sample.

Abstract: Method of measuring extent of cure of a coating comprising operating a metal-containing substrate coating operation to provide a coated metal-containing substrate; positioning an investigative apparatus near the coated metal-containing substrate; and operating the investigative apparatus to obtain an extent of cure reading, the reading corresponding to an area on the coated metal-containing substrate.

Abstract: A process and apparatus is disclosed for preparation of a no-jam vending machine card wherein the card is treated with a suitably adhering powder to have a residual powder layer on the card to reduce generation of an electrical static charge upon each card as the card is dispensed by the vending machine. The process comprises applying a suitable dusting powder and testing the dusted card for the necessary residual powder layer. The apparatus comprises a powder dusting device and a card powder layer testing device.

Abstract: The invention relates to an apparatus for devices for determining properties of thin layers applied on a substrate. This apparatus comprises two changing magazines wherein one magazine is provided for crystal resonators and the other magazine for test glasses. The changing magazine for crystal resonators has the form of a disk and is encompassed by the annular magazine for test glasses. Both can be rotated independently of one another. Each position of the magazines can be reproduced with the aid of sensors and evaluation devices. Consequently, it is possible to carry out multiple coatings.

Abstract: An apparatus for controlling the voltage applied to a shield interposed between an induction coil powered by a power supply via a matching network, and the plasma it generates, comprises a shield, a first feedback circuit, and a second feedback circuit. The power supply powers the shield. The first feedback circuit is connected to the induction coil for controlling the power supply. The second feedback circuit is connected to the shield for controlling the voltage of the shield. Both first and second feedback circuits operate at different frequency ranges. The first feedback circuit further comprises a first controller and a first sensor. The first sensor sends a first signal representing the power supplied to the inductive coil to the first controller. The first controller adjusts the power supply such that the power supplied to the inductor coil is controlled by a first set point. The second feedback circuit further comprises a second sensor, a second controller, and a variable impedance network.

Abstract: A method is provided for coating optical lenses and other optical articles with anti-reflection (AR) coatings. The lenses have low reflectivity, provide a substantially white light reflection and have a low stress AR coating and are ideally suited for optical lenses made using a molding procedure which provides a low stress lens substrate. In one aspect the method uses special coating compositions with one being a high index of refraction composition and the other being a low index of refraction composition. In another aspect a method is also disclosed using an optical monitor in conjunction with a conventional vapor deposition apparatus whereby an optical reference lens is used and a particular light frequency of reflected light is measured and this measurement is then used to determine when the desired optical coating is achieved. In a still further aspect the method also preferably calculates the optical thickness of each layer using a specific ratio of blue to green to red colors in the reflected light.

Abstract: A method and device for layer thickness determination allows for the layer thickness to be determined in situ during the coating process. This is achieved using a sensor which has an electrical property which, as a result of the coating process, changes in a manner which is representative of the layer thickness which has been reached. As such, this property can be measured.

Abstract: A method for calculating the refractive index and the extinction coefficient for materials relates the physical parameters being calculated to the scattering caused by interband states in the material using a model which includes a quantum mechanical transition equation for transitions between valence and/or conduction bands and interband states of the material. The method can be used for material engineering, process control for processes affecting the interband states in the material, and in estimation of the amount of interband states which have been introduced into a material as a result of such a process. Apparatus for implementing the method are also disclosed.

Abstract: The optical thickness of a film formed on a substrate is controlled precisely to manufacture an optical filter having an accurate optical thickness. Time is counted during a film being formed on a substrate to note time points t with respect to a reference time set in advance. At least one of two optical characteristics of energy transmittance and energy reflectance when the film being formed on the substrate is irradiated with monitoring light is expressed by a function f(t) of the time points t based on a theoretical formula of the optical characteristic. The optical characteristic is measured by irradiating the film with the monitoring light at the time points t. A designed thickness achieving time at which the optical thickness of the film designed thickness is predicted. The film formation is stopped at the designed thickness achieving time, thereby obtaining the optical filter.

Abstract: Methods and apparatuses estimate and control optical fiber primary coating diameter for wet-on-wet optical fiber manufacturing. The primary coating diameter for a particular length of optical fiber is calculated based upon a measurement of the weight of primary and/or secondary coating material consumed during optical fiber manufacturing. Control of the primary coating diameter is effected by a coating controller which can increase or decrease the primary coating diameter through control of glass temperature, coating viscosity and/or other parameters during wet-on-wet fiber manufacture.

Abstract: A substrate processing apparatus is provided with five inspection devices that perform inspections of different kinds to a substrate. Among the five kinds of inspections, the film quality is measured after resist coating, and before post-coating heat-treatment. As the film quality, the amount of solvent remaining in a resist film is measured. The film thickness is measured after heat-treatment following resist coating and before exposure. Meanwhile, the line width and the superposition precision are measured and macroscopic defect inspection is performed after post-development heat-treatment and before the substrate is returned to an indexer.

Abstract: A screen printing apparatus prints cream solder through a pattern hole of a mask plate, to which a substrate is brought into contact, by sliding a squeegee head. A three dimensional detector, such as a laser, is used to determine the extent to which the pattern hole is filled with the cream solder. Based on the determination result, the printing operation is modified, with respect to the positioning of the mask plate and substrate, to maintain the printing quality.

Abstract: A method of constructing optical filters using alternating layers of materials with “low” and “high” indices of refraction and deposited with atomic layer control. The multilayered thin film filter uses, but is not limited to, alternating layers of single crystal, polycrystalline or amorphous materials grown with self-limiting epitaxial deposition processes well known to the semiconductor industry. The deposition process, such as atomic layer epitaxy (ALE), pulsed chemical beam epitaxy (PCB E), molecular layer epitaxy (MLE) or laser molecular beam epitaxy (laser MBE) can result in epitaxial layer by layer growth and thickness control to within one atomic layer. The alternating layers are made atomically smooth using a Chemical Reactive-Ion Surface Planarization (CRISP) process. Intrinsic stress is monitored using an in-situ cantilever based intrinsic stress optical monitor and adjusted during filter fabrication by deposition parameter modification.

Abstract: A material deposition sensor includes a heater and a temperature sensor separated from one another. In operation, the sensor is disposed within a deposition chamber, and material is deposited onto the sensor. When a particular material thickness is deposited, a direct thermally conductive path is created between the heater and temperature sensor, and heat from the heater conducts directly to the temperature sensor. By predetermining a deposition thickness necessary to create the direct thermally conductive path, the deposition thickness can be controlled and/or predicted.

Abstract: In a process and apparatus for coating the front and/or rear facets of semiconductor laser diodes with antireflection layers of minimal reflectivity, the coating material is deposited on the facets while at least one laser parameter is monitored, in-situ, for determining the coating thickness of the individual antireflection layers resulting in the minimum reflectivity of the coating and the respective coating procedure is terminated when the laser parameter indicates that such coating thickness has been reached.

Abstract: With extremely-thin-film and thin-film measurement, models are formed based upon a combination of film thickness, optical constants obtained using the dispersion formula, incident angle, etc., and the model and measured spectrums are fit by BLMC for a single layer of a structure with a certain number of iterations, obtaining information regarding the single layer. With thin-film multi-layer-structure measurement, models are formed for multiple layers of a thin-film multi-layer structure likewise, and fit by BLMC or EBLMC, obtaining information regarding the thin-film multi-layer structure. In either measurement, light is cast onto a thin film on a substrate to be measured while changing the wavelength as a parameter in order to obtain the spectrums &psgr;E(&lgr;i) and &Dgr;E(&lgr;i) for each wavelength &lgr;i, representing the change in polarization between the incident and reflected light. The measured spectrums are fit, obtaining the best model. The results are confirmed and stored, as necessary.

Abstract: A substrate processing apparatus comprises a chamber 28 capable of processing a substrate 20. A radiation source 58 provides radiation that is at least partially reflected from the substrate in the chamber. A radiation detector 62 is provided to detect the reflected radiation and generate a signal. A controller 100 is adapted to receive the signal and determine a property of the substrate 20 in situ during processing, before an onset of during or after processing of a material on the substrate 20.

Abstract: A device for placing a curable liquid coating material onto a surface to produce a peel-off protective layer. The device includes a spray nozzle adapted to spray the curable liquid coating material onto an area of the surface. The spray nozzle and the surface are movable relative to each other. An applicator nozzle is positioned adjacent to the spray nozzle. The applicator nozzle and the surface are movable relative to each other. The applicator nozzle applies the curable liquid coating material onto the surface adjacent to a lateral edge of the area.

Abstract: A method of manufacturing an electronic device including a step of giving a droplet 12 of a liquid containing a formation material of a member that constitutes the electronic device to a plurality of portions on a substrate 1 while said substrate 1 and a droplet ejecting portion 7 are moved relatively in an in-surface direction of said substrate 1, wherein the droplet 12 is given while a position on a droplet given surface to which the droplet is given is corrected in accordance with the distribution of distances between the ejecting portion 7 and the droplet 12 given surface on the substrate which occurs when the substrate 1 and the ejecting portion 7 are relatively moved. Thereby forming the member constituting the electronic device accurately at the plural portion on the substrate 1, and thus forming plural electronic device of same charactoristics.

Abstract: A process for producing a peel-off protective layer for surfaces, especially for painted surfaces of motor vehicle bodies. A curable liquid coating material is sprayed by a spray nozzle onto the surface to be protected, where it forms a two-dimensional protective layer which cures. Coating material emerging essentially as a continuous strand or strip of material from an applicator nozzle is applied to the surface to be coated at the edges of the areas of the coating material which has been sprayed onto the surface.

Abstract: A vapor deposition process for depositing TiO2 and a vapor desposition process for depositing SiO2 are alternately repeated in a multi-layer film forming process. A refractive index that a thin film formed by each vapor depositing will provide is individually determined prior to each relative vapor depositing, and vapor deposition control data is prepared based on such a refractive index. Each vapor deposition is controlled by using a relative vapor deposition control data thus prepared. Therefore, each vapor deposition process can be accurately controlled according to the refractive index of a thin film even if repeated vapor deposition processes change the refractive index. Accordingly, a multilayer film having desired optical characteristics can be formed.

Abstract: A method of filming a luminescent screen is disclosed which improves the light output of CRTs that contain printed phosphor lines. The method incorporates both the application and film formulation requirements and optionally includes in-line diagnostic techniques. The novel film formulation contains a lacquer and solvents, wherein one of the solvents is a non-solvent for the lacquer. The optional diagnostic technique include surface gloss measurements to characterize and monitor the process and provide predictive capability of CRT performance with respect to light output.

Abstract: A narrow band ellipsometer is used to monitor and control the formation of thin layers in an multilayer, thin film interference filter. Optical interference filters used for DWDM application have a large number of thin layers deposited on a substrate. The thickness of the layers must be precisely controlled. An ellipsometer is used to monitor the deposition process and control the layer formation in situ, on a real time basis.

Abstract: A resin coating method for applying resin to a predetermined region of a wiring board includes the steps of imaging an external appearance of the resin extruded from a resin application device; and automatically adjusting an amount of the resin extruded from the resin application device based on the external appearance of the resin obtained in the imaging step.

Abstract: A method and apparatus for determining the profile of a coating layer of a paper or board web (2). The method comprises application of a coating slip to at least one surface of the web (2) at the coating head (1) of a coating machine, the measurement of the transverse temperature profile of the web (2) surface in at least a measurement point (7, 8) fitted after the coating head (1), and the determination of the profile of the web's (2) coating layer on the basis of the temperature profile measured in at least the measuring point (7, 8) fitted after the coating head (1), whereupon a change in the temperature of the web's (2) coating layer or in the difference of the temperature between the coating layer and the base web (2) is at least almost proportional to the change in the coat weight.

Abstract: A method for forming an optical component includes (i) depositing optical layers on a base, and (ii) controlling a thickness of a tuning layer by (a) depositing the tuning layer on the optical layers, (b) measuring a first optical characteristic, (c) measuring a second optical characteristic after continued deposition of the tuning layer, (d) determining whether the second optical characteristic has decreased compared to the first optical characteristic, (e) when the second optical characteristic has not decreased, continuing deposition of the tuning layer and returning to steps (ii)(b)-(e), when the second optical characteristic has decreased, terminating the depositing and removing a portion of the tuning layer formed during a period of time defined from when an increase/decrease of the second optical characteristic is stopped to when the second optical characteristic is changed to be decreased, and (f) adding a layer of a lower refractive index on the tuning layer.

Abstract: The object of the present invention is to provide a phosphor ink applying device that can apply phosphor ink in a plurality of lines to an intricately-shaped surface of a back panel of a PDP while preventing phosphor colors mixing. A valve is provided for the aperture of each nozzle of the phosphor ink applying device and the opening and closing of each valve is controlled according to the shape of the portion of the surface to which ink is to be applied. In this way, mixing of colors can be prevented on an intricately-shaped back panel such as that with auxiliary barrier ribs.

Abstract: In a film forming method for forming an optical multilayer filter by detecting the thickness of each layer by means of an optical thickness monitor (OTM) 15 and by controlling a film forming apparatus 11 based on the OTM detected output: the light source of the OTM 15 is formed by a variable wavelength light source whose wavelength is variable over the range of &lgr;1 nm to &lgr;2nm, including &lgr; nm; the optical thickness of each of &lgr;/4-oriented layers is optimized within the range of &lgr;1/4 nm to &lgr;2/4 nm; the wavelength of the variable wavelength light source 12 for each layer is selected so that its transmittance reaches an extreme value at the optical thickness of each layer; and the formation of each layer is stopped upon detection of the extreme value of the transmittance.

Abstract: In an annealing process in which laser light is irradiated to a semiconductor thin film, a refractive index of the semiconductor thin film after laser light irradiation is measured and conditions for the next laser light irradiation are adjusted based on the measured refractive index value. For example, laser light irradiation conditions are adjusted so that semiconductor thin films always have the same refractive index. As a result, the annealing can be performed under the same conditions at every laser light irradiation even if the laser light irradiation conditions vary unavoidably.

Abstract: A coating unit for coating a substrate with a treatment solution and a peripheral aligner, which has a mounting table rotatable and movable in at least one direction and irradiates the peripheral portion of the substrate on the mounting table with light from an irradiating portion to expose a coating film on the substrate, are provided in a substrate processing system. The peripheral aligner has film thickness measuring means provided with a sensor member for measuring a film thickness of the coating film. It is not necessary to separately provide a unit for measuring the film thickness outside of the system, thus preventing the substrate from being contaminated or dropped to be damaged when the film thickness is measured.

Abstract: A capacitive fingerprint sensor includes a polymeric protective coating defining a sensing surface and having conductive particles suspended therein. The conductive particles act as parallel strings of series capacitors to couple the capacitance the fingerprint-bearing skin of a user's finger applied to the sensing surface to capacitive sensing elements beneath the protective coating. The polymeric material of the coating is durable and scratch resistant. The conductive particles enable use of a protective coating of 10 to 20 microns in thickness while providing a high degree of sensitivity and image resolution.

Abstract: One aspect of the invention relates to a metal fill process and systems therefor involving providing a standard calibration wafer having a plurality of fill features of known dimensions in a metalization tool; depositing a metal material over the standard calibration wafer; monitoring the deposition of metal material using a sensor system, the sensor system operable to measure one or more fill process parameters and to generate fill process data; controlling the deposition of metal material to minimize void formation using a control system wherein the control system receives fill process data from the sensor system and analyzes the fill process data to generate a feed-forward control data operative to control the metalization tool; and depositing metal material over a production wafer in the metalization tool using the fill process data generated by the sensor system and the control system. The invention further relates to tool characterization processes and systems therefor.

Abstract: A method of coating a support with a liquid composition having an aqueous or an organic solvent and a surfactant eliminates defects in the coated layer. Temperature gradients between successive zones of the coating layer are eliminated by the application of coating having a preselected surfactant.

Abstract: A method and device for layer thickness determination allows for the layer thickness to be determined in situ during the coating process. This is achieved using a sensor which has an electrical property which, as a result of the coating process, changes in a manner which is representative of the layer thickness which has been reached. As such, this property can be measured.

Abstract: A detection method of coating film thickness and an ion implantation equipment using the detection method. The detection method comprises providing on a surface of materials, such as disk (11) of a wafer support on which a coating film comprising a low conductive material, an electrical measurement sensor (18) having a coating film comprising the same material, and detecting thickness change of the coating film on the surface of the materials by irradiation with particle beams in the form of a signal from the sensor (18). The ion implantation equipment comprises an electrical measurement sensor provided on a disk and having a sample piece that forms a coating film of the same material as that of a surface coating of the disk, and means to monitor thickness change of the coating film by sensor signal from the measurement sensor.

Abstract: A method for adhering a resistive coating to a substrate for use in process fluids employed in the semiconductor processing industry in clean, particle-free, nonreactive, non-trapping, ultra-pure, thermally tolerant, sealed systems. In one arrangement, the method may include the steps of selecting a substrate having a wall, modifying a surface of the wall to provide a roughened texture suitable for mechanically securing a coating thereto, and applying a conductive coating that is configured to be electrically resistive, to extend over at least a portion of the roughened texture, and to adhere thereto throughout variations in operational temperatures thereof.