Ionized Gas Utilized (e.g., Electrically Powered Source, Corona Discharge, Plasma, Glow Discharge, Etc.) Patents (Class 427/533)
  • Patent number: 7449210
    Abstract: A method for electrostatic loading of drugs on an implantable medical device is disclosed.
    Type: Grant
    Filed: August 15, 2005
    Date of Patent: November 11, 2008
    Assignee: Advanced Cardiovascular Systems, Inc.
    Inventors: Shamim Malik, Syed F. A. Hossainy
  • Patent number: 7399507
    Abstract: A method of preparation of a Lithographic Printing Plate comprising the steps of, selecting a substrate for making of the printing plate from a natural or synthetic polymeric sheet element material having a tensile strength in the range of 400 to 3000 Kgm/cm2 and thickness ranging from 75 microns to 250 microns; shrinking the said substrate to have shrinkage in the range of 0.2 to 2.0% by exposing the substrate to heat of temperatures ranging from 140 to 180 degrees Celsius for 8 to 12 minutes; subbing the substrate to alter the surface energy of the substrate; forming a hydrophilic lithographic coating by reacting a hydrophilic binder with a cross linking agent, an accelerator, at least one pigment, at least one cationic surfactant and particulate silica having micron size ranging between 1 to 5 microns and a pore volume ranging between 0.2 ml/gm to 1.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: July 15, 2008
    Inventors: Jivan Gulabrai Bhatt, Thyagarajan Anantharaman Iyer
  • Patent number: 7389580
    Abstract: A method and system for fabricating solid-state energy-storage devices including fabrication films for devices without an anneal step. A film of an energy-storage device is fabricated by depositing a first material layer to a location on a substrate. Energy is supplied directly to the material forming the film. The energy can be in the form of energized ions of a second material. Supplying energy directly to the material and/or the film being deposited assists in controlling the growth and stoichiometry of the film. The method allows for the fabrication of ultrathin films such as electrolyte films and dielectric films.
    Type: Grant
    Filed: March 27, 2007
    Date of Patent: June 24, 2008
    Assignee: Cymbet Corporation
    Inventors: Mark L. Jenson, Victor H. Weiss
  • Publication number: 20080145565
    Abstract: A method for preparing one or more lubricated surfaces of an article to reduce the break-out force and sliding frictional force. A lubricant is applied to one or more surfaces, and the lubricant-coated surface is treated by exposing the surface to an energy source, wherein the energy source is an ionizing gas plasma at about atmospheric pressure, gamma radiation, or electron beam radiation. One or more of the surfaces may be exposed to the ionizing gas plasma at about atmospheric pressure prior to application of the lubricant. Another aspect of the invention is articles produced using one or more methods of the invention.
    Type: Application
    Filed: January 23, 2008
    Publication date: June 19, 2008
    Inventors: Vinay G. Sakhrani, Joel L. Williams, Charles Tomasino, Paul M. Vernon
  • Patent number: 7384684
    Abstract: The invention relates to an aqueous coating composition which comprises a mixture of polyvinylpyrrolidone, a surfactant and optionally an adhesion-promoting polymer. This mixture is suitable for inline coating of biaxially oriented polyester films. The thus obtained films feature a characteristic hydrophilic surface which prevents the fogging of the films with water droplets.
    Type: Grant
    Filed: October 4, 2005
    Date of Patent: June 10, 2008
    Assignee: Mitsubishi Polyester Film GmbH
    Inventors: Matthias Konrad, Dagmar Klein, Herbert Peiffer, Gottfried Hilkert
  • Patent number: 7378356
    Abstract: A biased pulse DC reactor for sputtering of oxide films is presented. The biased pulse DC reactor couples pulsed DC at a particular frequency to the target through a filter which filters out the effects of a bias power applied to the substrate, protecting the pulsed DC power supply. Films deposited utilizing the reactor have controllable material properties such as the index of refraction. Optical components such as waveguide amplifiers and multiplexers can be fabricated processes performed on a reactor according to the present inention.
    Type: Grant
    Filed: March 16, 2002
    Date of Patent: May 27, 2008
    Assignee: SpringWorks, LLC
    Inventors: Hongmei Zhang, Mukundan Narasimhan, Ravi B. Mullapudi, Richard E. Demaray
  • Publication number: 20080118751
    Abstract: The invention describes a double-sided pressure-sensitive adhesive tape of the kind which can be used in particular for achieving very durable bonds at high temperatures. These adhesive tapes, especially adhesive assembly tapes for the permanent fixing of articles to substrates, are preferably of multilayer construction. The inventive double-sided pressure-sensitive adhesive tapes are characterized in that the viscoelastic carrier layer is composed of a photoinitiator-free, thermally homogeneously crosslinked acrylate hotmelt. They are further characterized in that these homogeneously thermally crosslinked acrylate hotmelts have crosslinking sites by way of urethane units. This viscoelastic carrier layer is covered on both sides in each case by adhesive layers, preferably pressure-sensitive adhesive layers. These layers are connected by chemical reaction to the viscoelastic carrier layer.
    Type: Application
    Filed: September 9, 2005
    Publication date: May 22, 2008
    Applicant: Tesa AG
    Inventors: Stephan Zollner, Sven Hansen, Kay Brandes, Jorg Speer
  • Patent number: 7354630
    Abstract: A granular perpendicular magnetic recording medium, comprising: (a) a non-magnetic substrate having a surface; and (b) a layer stack on the substrate surface, the layer stack including a granular perpendicular magnetic recording layer formed by: (1) reactively sputtering a target comprised of a magnetic alloy in an atmosphere containing at least one ionized oxygen species derived from a source gas comprised of a compound of oxygen and at least one other non-metallic element; and (2) oxidizing an exposed upper surface of the granular perpendicular magnetic recording layer by generating a plasma containing at least one ionized oxygen species derived from a source gas comprised of a compound of oxygen and at least one other non-metallic element and treating the exposed upper surface of the granular perpendicular magnetic recording layer with the plasma.
    Type: Grant
    Filed: November 6, 2003
    Date of Patent: April 8, 2008
    Assignee: Seagate Technology LLC
    Inventors: Rajiv Ranjan, Thomas Patrick Nolan
  • Patent number: 7341792
    Abstract: A biaxially oriented saturated polyester film made by a biaxial orientation method, includes a heat-seal side formed in at least one of two sides of the film, the heat-seal side being made by applying a low-temperature plasma treatment to a film surface so that the film surface has a composition ratio of the number of oxygen atoms to the number of carbon atoms, the composition ratio being not less than 105% and not more than 115% of a theoretical value and so that the heat-seal side is heat sealable at a heating temperature ranging from 100° C. to 200° C.
    Type: Grant
    Filed: August 18, 2004
    Date of Patent: March 11, 2008
    Assignee: AMT Laboratory Corporation
    Inventors: Takeshi Zinbo, Miya Minamigawa
  • Patent number: 7338683
    Abstract: A method of forming a superconductive device is provided, including providing a substrate having a dimension ratio of not less than about 102, depositing a buffer film to overlie the substrate by ion beam assisted deposition utilizing and ion beam, monitoring spatial ion beam density of the ion beam over a target area, and depositing a superconductor layer to overlie the buffer film. Monitoring may be carried out by utilizing an ion detector having an acceptance angle of not less than 10°.
    Type: Grant
    Filed: May 10, 2004
    Date of Patent: March 4, 2008
    Assignee: Superpower, Inc.
    Inventors: Venkat Selvamanickam, Xuming Xiong
  • Patent number: 7307772
    Abstract: A method of producing an electrochromic device, includes the steps of: providing a first electron conducting layer on a substrate, providing a working electrode in communication with the first electron conducting layer, providing an ion conducting layer in communication with the working electrode, providing an ion storage electrode in communication with the ion conducting layer, and providing a second electron conducting layer in communication with the ion storage electrode, wherein at least one and less than all of the providing steps include(s) plasma chemical vapor deposition. An electrochromic device produced by the method of the invention is disclosed, as is an apparatus adapted to perform the method of the invention, including plasma CVD devices and vacuum sputtering devices.
    Type: Grant
    Filed: September 11, 2006
    Date of Patent: December 11, 2007
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Diwakar Garg, Philip Bruce Henderson
  • Patent number: 7276266
    Abstract: Method and system for functionalizing a collection of carbon nanotubes (CNTs). A selected precursor gas (e.g., H2 or F2 or CnHm) is irradiated to provide a cold plasma of selected target particles, such as atomic H or F, in a first chamber. The target particles are directed toward an array of CNTs located in a second chamber while suppressing transport of ultraviolet radiation to the second chamber. A CNT array is functionalized with the target particles, at or below room temperature, to a point of saturation, in an exposure time interval no longer than about 30 sec.
    Type: Grant
    Filed: December 13, 2002
    Date of Patent: October 2, 2007
    Assignee: United States of America as represented by the Administrator of the National Aeronautics and Space Administration (NASA)
    Inventors: Bishun N. Khare, Meyya Meyyappan
  • Patent number: 7264741
    Abstract: A coater having a substrate cleaning device is disclosed. Also disclosed are methods of processing substrates in a coater equipped with a substrate cleaning device. The substrate cleaning device comprises an ion gun (i.e., an ion source) that is positioned beneath a path of substrate travel (e.g., beneath a substrate support) extending through the coater and that is adapted for treating a bottom major surface of a substrate. Certain embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device. In some embodiments of this nature, the upward coating apparatus is configured for depositing a photocatalytic coating upwardly onto the bottom major surface of the substrate. Certain embodiments of the invention involve a downward coating apparatus, wherein the substrate cleaning device is further along the path of substrate travel than the downward coating apparatus.
    Type: Grant
    Filed: December 31, 2003
    Date of Patent: September 4, 2007
    Assignee: Cardinal CG Company
    Inventor: Klaus Hartig
  • Patent number: 7258811
    Abstract: A wafer stage including an electrostatic chuck and a method for dechucking a wafer using the wafer stage are provided, wherein, the wafer stage includes an electrostatic chuck support, an electrostatic chuck, a lifting means, and a grounding means including a device for connecting the interconnections for grounding the lifting means. According to the method for dechucking a wafer, when a lifting means is in contact with a rear side of the wafer, the lifting means is grounded. Then, an electrostatic chuck is neutralized by supplying power to electrostatic electrodes, and the wafer is neutralized by supplying plasma to the wafer.
    Type: Grant
    Filed: June 10, 2004
    Date of Patent: August 21, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Chang-woong Chu, Kyeong-koo Chi, Ji-soo Kim, Seung-pil Chung, Sang-hun Seo
  • Patent number: 7241478
    Abstract: The present invention relates to an apparatus and process for producing a thin organic film on a substrate using an ultrasonic nozzle to produce a cloud of micro-droplets in a vacuum chamber. The micro-droplets move turbulently within the vacuum chamber, isotropically impacting and adhering to the surface of the substrate. The resulting product has a smooth, continuous, conformal, and uniform organic thin film, when the critical process parameters of micro-droplet size, shot size, vacuum chamber pressure, and timing are well-controlled, and defects such as “orange peel” effect and webbing are avoided. The apparatus includes an improved ultrasonic nozzle assembly that comprises vacuum sealing and a separate, independent passageway for introducing a directed purging gas.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: July 10, 2007
    Assignee: BAE Systems Information and Electronic Systems Integration Inc.
    Inventors: Allister McNeish, Edmund Popp, Mark Brown, Mark W. Leiby, James J. Cerul, Harvey L. Berger
  • Patent number: 7241490
    Abstract: A metallized polyimide film includes: a polyimide film; an intermediate layer formed in the polyimide film, the intermediate layer extending 20 nm or less from a surface of the polyimide film, and the intermediate layer including at least one element selected from the group consisting of Mo, Cr, Ni, and Si injected into the polyimide film; and a conductive layer that is made of copper or a copper alloy formed on the intermediate layer, wherein the amount of the at least one element injected into the intermediate layer is between 0.3 and 15 mg/m2.
    Type: Grant
    Filed: January 26, 2005
    Date of Patent: July 10, 2007
    Assignee: Mitsubishi Shindoh Co., Ltd.
    Inventor: Masayuki Aida
  • Patent number: 7241472
    Abstract: The method produces a plastic lens with an antireflection film which have the advantages of good adhesion of the antireflection film to any type of hard coat film that underlies it and good abrasion resistance and provides a plastic lens with an antireflection film. The method includes the steps of applying water or an aqueous solution to a plastic lens with an organosilicon compound-containing hard coat film to form a liquid film of water or the aqueous solution on the surface of the hard coat film, then allowing ozone gas to contact with the liquid film to treat the surface of the hard coat film with the ozone gas, and thereafter forming an antireflection film on the surface of the hard coat film through vapor deposition.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: July 10, 2007
    Assignee: Hoya Corporation
    Inventor: Akiko Arai
  • Patent number: 7229675
    Abstract: The invention relates to metallurgy and mechanical engineering, in particular to the development of methods for providing metallic pieces with protective coatings with a view to improving the performance characteristics thereof. In accordance with the inventive method, a multilayer coating is formed by combining and simultaneously or consecutively using of various technologies including ion-plasma evaporation diffusive metallization and controlled atmosphere thermal treatment. The obtained coatings possess superior characteristics with respect to overall properties and are used for gas turbine construction, in particular, for manufacturing gas turbine vanes of aircraft engines.
    Type: Grant
    Filed: April 10, 2000
    Date of Patent: June 12, 2007
    Inventors: Anatoly Nikolaevich Paderov, Jury Genrikhovich Vexler
  • Patent number: 7220461
    Abstract: A method for forming a silicon oxide film includes disposing a silicon oxide film on a surface of a target substrate, and performing a reformation process on the silicon oxide film. The reformation process is performed by annealing the silicon oxide film while exposing the silicon oxide film to oxygen radicals and hydroxyl group radicals.
    Type: Grant
    Filed: October 12, 2004
    Date of Patent: May 22, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Kazuhide Hasebe, Atsushi Endoh, Daisuke Suzuki, Keisuke Suzuki
  • Patent number: 7175878
    Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4?), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
    Type: Grant
    Filed: November 26, 2001
    Date of Patent: February 13, 2007
    Assignee: Essilor International
    Inventors: Yvon Helmstetter, Jean-Daniel Bernhard, Frederic Arrouy
  • Patent number: 7172792
    Abstract: A method of forming a silicon nitride film is described. According to the present invention, a silicon nitride film is deposited by thermally decomposing a silicon/nitrogen containing source gas or a silicon containing source gas and a nitrogen containing source gas at low deposition temperatures (e.g., less than 550° C.) to form a silicon nitride film. The thermally deposited silicon nitride film is then treated with hydrogen radicals to form a treated silicon nitride film.
    Type: Grant
    Filed: December 20, 2002
    Date of Patent: February 6, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Shulin Wang, Errol Antonio C. Sanchez, Aihua Chen
  • Patent number: 7166342
    Abstract: A heat-shrinkable resin film which has heat shrinkage in the maximum shrinkage direction of 20% or higher when a 10 cm×10 cm square sample cut out thereof is immersed in hot water at 85° C. for 10 seconds, pulled out, subsequently immersed in water at 25° C. for 10 seconds, and then pulled out, characterized in that a content of nitrogen atoms in a surface of the film is 0.1% to 3.0% and the surface of the film has wet tension of 36 mN/m or higher; and a film roll obtained by winding up the heat-shrinkable resin film characterized in that when the rolled film is sampled at a first sampling part located up to 2 m apart from the end of the rolled film and at other sampling parts located after the first sampling part at intervals of about 100 m and an average content of nitrogen atoms of each sample is calculated, then the content of nitrogen atoms of each sample is within the ±0.8% range based on the above average content of nitrogen atoms.
    Type: Grant
    Filed: December 26, 2002
    Date of Patent: January 23, 2007
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Satoshi Hayakawa, Norimi Tabota, Hiroshi Nagano
  • Patent number: 7150844
    Abstract: A method of manufacturing a stamper/imprinter for use in patterning of a recording medium comprises sequential steps of: (a) providing a substrate/workpiece comprising a topographically patterned surface including a plurality of projections and depressions corresponding to a pattern to be formed in a surface of the recording medium; (b) forming a thin release layer in conformal contact with the topographically patterned surface by means of a dry process; (c) forming a thicker layer of a material in conformal contact with the thin passivation layer on the topographically patterned surface; and (d) separating the thicker layer of material from the topographically patterned surface to form therefrom a stamper/imprinter including an imprinting surface having a negative image replica of the topographically patterned surface, separation of the thicker layer of material from the topographically patterned surface being facilitated by the thin release layer formed by the dry process.
    Type: Grant
    Filed: October 16, 2003
    Date of Patent: December 19, 2006
    Assignee: Seagate Technology LLC
    Inventors: Neil N. Deeman, Hong Ying Wang, Gennady Gauzner, Nobuo Kurataka
  • Patent number: 7125583
    Abstract: A method for improving thickness uniformity and throughput of a carbon doped oxide deposition process is described. That method comprises removing pre-deposition steps in a deposition phase. Moreover, helium plasma is added to a pre-clean phase to eliminate the production of dummy wafers.
    Type: Grant
    Filed: May 23, 2002
    Date of Patent: October 24, 2006
    Assignee: Intel Corporation
    Inventors: Ebrahim Andideh, Kevin L. Peterson, Jeff Bielefeld
  • Patent number: 7125587
    Abstract: A system and method to expose a material to an ion beam during a continuous material production process may include a vacuum fixture to form the ion beam and a slit in the fixture to allow at least a portion of the ion beam to exit the fixture through the slit. The material can be placed in contact with an exterior area of the fixture so as to cover the slit. With the material in place, the vacuum within the fixture may be maintained and the ion beam formed. The material over the slit can be exposed to the ion beam. As the continuous process moves material past the slit, the vacuum within the vacuum fixture may help to maintain the material in contact with the fixture.
    Type: Grant
    Filed: May 20, 2002
    Date of Patent: October 24, 2006
    Assignee: Varian Semiconductor Equipment Associates Inc.
    Inventor: Gary L. Viviani
  • Patent number: 7106488
    Abstract: A method of producing an electrochromic device, includes the steps of: providing a first electron conducting layer on a substrate, providing a working electrode in communication with the first electron conducting layer, providing an ion conducting layer in communication with the working electrode, providing an ion storage electrode in communication with the ion conducting layer, and providing a second electron conducting layer in communication with the ion storage electrode, wherein at least one and less than all of the providing steps include(s) plasma chemical vapor deposition. An electrochromic device produced by the method of the invention is disclosed, as is an apparatus adapted to perform the method of the invention, including plasma CVD devices and vacuum sputtering devices.
    Type: Grant
    Filed: March 23, 2004
    Date of Patent: September 12, 2006
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Diwakar Garg, Philip Bruce Henderson
  • Patent number: 7097884
    Abstract: A method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions, and reactive gas is introduced to the ion beam to saturate dangling bonds on the surface. Another method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions and quenched with a reactive component to saturate dangling bonds on the surface.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: August 29, 2006
    Assignee: International Business Machines Corporation
    Inventors: Alessandro C. Callegari, Praveen Chaudhari, Fuad E. Doany, James P. Doyle, Eileen A. Galligan, James H. Glownia, Gareth G. Hougham, James A. Lacey, Shui-Chih Lien, Minhua Lu, Alan E. Rosenbluth, Kei-Hsiung Yang
  • Patent number: 7087269
    Abstract: The present invention relates to a multi-component composite separate membrane and a method for preparing the same, and to a multi-component composite membrane comprising a support layer and active layers, wherein the support layer is located between the active layers.
    Type: Grant
    Filed: June 22, 2001
    Date of Patent: August 8, 2006
    Assignee: LG Chemical Co., Ltd.
    Inventors: Sang-Young Lee, Byeong-In Ahn, Soon-Yong Park, You-Jin Kyung, Heon-Sik Song
  • Patent number: 7045175
    Abstract: A method for manufacturing a magnetic recording medium includes forming a first protective layer of first material over a magnetic film provided on a substrate. The first protective layer has a thickness of about 0.2 nm to about 2 nm. A second protective layer of second material is formed over the first protective layer by driving ions of the second material into the first protective layer. The first protective layer is configured to prevent the ions of the second material from penetrating into the magnetic film.
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: May 16, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Shigehiko Fujimaki, Toru Yatsue, Yuuichi Kokaku, Toshinori Ono
  • Patent number: 7033647
    Abstract: Method of synthesizing carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during, and/or after formation of the carbon nano tubes for modifying the physical, chemical, and/or conductive properties of the carbon nanotubes.
    Type: Grant
    Filed: November 20, 2002
    Date of Patent: April 25, 2006
    Assignees: Electrovac, Fabrikation Elektrotechnischer Spezialartikel Gesellschaft M.B.H., IMS-Ionen Mikrofabrikationas Systeme
    Inventors: Xinhe Tang, Klaus Mauthner, Ernst Hammel, Hans Löschner, Elmar Platzgummer, Gerhard Stengl
  • Patent number: 6982240
    Abstract: A superconducting device operable at temperatures in excess of 30° K. and a method for making the device are described. A representative device is an essentially coplanar SQUID device formed in a single layer of high Tc superconducting material, the SQUID device being operable at temperatures in excess of 60° K. High energy beams, for example ion beams, are used to convert selected portions of the high Tc superconductor to nonsuperconductive properties so that the material now has both superconductive regions and nonsuperconductive regions. In this manner a superconducting loop having superconducting weak links can be formed to comprise the SQUID device.
    Type: Grant
    Filed: May 9, 1991
    Date of Patent: January 3, 2006
    Assignee: International Business Machines Corporation
    Inventors: Gregory John Clark, Richard Joseph Gambino, Roger Hilsen Koch, Robert Benjamin Laibowitz, Allan David Marwick, Corwin Paul Umbach
  • Patent number: 6962613
    Abstract: A method and system for fabricating solid-state energy-storage devices including fabrication films for devices without an anneal step, especially a cathode anneal of thin-film batteries. A film of an energy-storage device is fabricated by depositing a first material layer to a location on a substrate. Energy is supplied directly to the material forming the film. The energy can be in the form of energized ions of a second material. Supplying energy directly to the material and/or the film being deposited assists the growth of the crystalline structure of film. For lithium-ion energy-storage devices, the first material is an intercalation material, which releasably stores lithium ions therein. Supercapacitors and energy-conversion devices are also fabricated according the methods.
    Type: Grant
    Filed: March 23, 2001
    Date of Patent: November 8, 2005
    Assignee: Cymbet Corporation
    Inventor: Mark L. Jenson
  • Patent number: 6951377
    Abstract: A flexible package, and method for manufacturing same, that provides for the presentation of graphics inside the package using existing converter and vertical form and fill packaging machine technology. The invention involves pre-treating an area with ionized gases prior to the addition of the graphic to allow the graphic to adhere to the surface.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: October 4, 2005
    Assignee: Frito-Lay North America, Inc.
    Inventors: Anthony Robert Knoerzer, Garrett William Kohl
  • Patent number: 6929784
    Abstract: A ClF3 gas generation system is provided with supply sources of chlorine (3) (for example a cylinder of compressed chlorine) and fluorine (4) (for example a fluorine generator) connected into a gas reaction chamber (2) enabling generation of ClF3 gas. The reaction chamber has a valved outlet (C) for the supply of the ClF3 gas to a process chamber for immediate local use.
    Type: Grant
    Filed: March 6, 2000
    Date of Patent: August 16, 2005
    Assignee: Surface Technology Systems plc
    Inventors: Jyoti Kiron Bhardwaj, Nicholas Shepherd, Leslie Michael Lea, Graham Hodgson
  • Patent number: 6899775
    Abstract: This invention relates to the printing of a substrate having a pre-printed “print pattern” with a “design layer” of ink where there is differential adhesion within and without the print pattern. The print pattern is receptive to an ink, and the design layer ink forms a durable image material with good bond to the print pattern, but the ink does not form a durable image material on the portions of the substrate outside the print pattern. The design layer ink is a UV-curable ink, and the print pattern may have a higher surface energy than the portions of the substrate outside the print pattern.
    Type: Grant
    Filed: January 23, 2003
    Date of Patent: May 31, 2005
    Assignee: Contra Vision Ltd.
    Inventors: George Roland Hill, Chris David Parry
  • Patent number: 6893731
    Abstract: This invention provides a water-based composition suitable for use on polyester-based substrates for increasing adhesion between the substrate and a topcoat or overcoat. The composition comprises: (1) a latex polymer formed from the polymerization of at least one monomer selected from the group consisting of bicyclic alkyl (meth)acrylates and aromatic (meth)acrylates and at least one monomer which imparts to the polymer the ability to be crosslinked; (2) a water soluble or water dispersible polymer selected from the group consisting of acrylate-based resins, sulfonated polyester-based resins and combinations thereof; and (3) a crosslinking agent.
    Type: Grant
    Filed: September 25, 2001
    Date of Patent: May 17, 2005
    Assignee: 3M Innovative Properties Company
    Inventor: William L. Kausch
  • Patent number: 6881492
    Abstract: A composition suitable for forming a primer layer on a polymer sheet comprising: a) polyethyleneimine; b) latex; wherein the latex has a Tg lower than 25° C. and c) a hydrophilic colloid material. A method of coating the composition is also disclosed.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: April 19, 2005
    Assignee: Eastman Kodak Company
    Inventors: Yuanqiao Rao, DeBasis Majumdar, Robert J. Kress, David E. Decker
  • Patent number: 6878418
    Abstract: A system and method for improving the durability and reliability of recording media used in hard drives is disclosed. A protective overcoat made by depositing a diamond like carbon (DLC) layer over a magnetic layer and then depleting a portion of the DLC protective layer of hydrogen before it is coated with a Perfluoropolyethers (PFPE) using an in-situ vapor lubrication technique. The portion of the DLC layer which is depleted can be data zone of the media so that the lubricant-bonding ratio is higher for the landing zone than it is for the data zone.
    Type: Grant
    Filed: March 27, 2003
    Date of Patent: April 12, 2005
    Assignee: Seagate Technology LLC
    Inventors: Xiaoding Ma, Michael Joseph Stirniman, Jing Gui
  • Patent number: 6878417
    Abstract: A method for mask-free molecular or atomic patterning of surfaces of reactive solids is disclosed. Molecules adsorb at surfaces in patterns, governed by the structure of the surface, the chemical nature of the adsorbate, and the adsorbate coverage at the surface. The surface is patterned and then imprinted with the pattern by inducing localized chemical reaction between adsorbate molecules and the surface of the solid, resulting in an imprint being formed in the vicinity of the adsorbate molecules. When the imprinted molecular patterns are conjugated chains containing ? bonds along which electrical charge can flow the molecular patterns constitute molecular wires or the imprinted molecules constitute a molecular-scale device. The surface of the substrate can be doped by including n- or p-type dopants in the adsorbate molecules. These molecular wires are anchored to the substrate by using conjugated chains which can be chemically bound at intervals along the chains to the substrates.
    Type: Grant
    Filed: May 18, 2001
    Date of Patent: April 12, 2005
    Inventors: John C. Polanyi, Duncan Rogers
  • Patent number: 6878404
    Abstract: Durability and/or longevity of a diamond-like carbon (DLC) layer can be improved by varying the voltage and/or ion energy used to ion beam deposit the DLC layer. For example, a relatively low voltage may be used to ion beam deposit a first portion of the DLC layer on the substrate, and thereafter a second higher voltage(s) used to ion beam deposit a second higher density portion of the DLC layer over the first portion of the DLC layer. In such a manner, ion mixing at the bottom of the DLC layer can be reached, and the longevity and/or durability of the DLC improved.
    Type: Grant
    Filed: February 6, 2003
    Date of Patent: April 12, 2005
    Assignee: Guardian Industries Corp.
    Inventors: Vijayen S. Veerasamy, Scott V. Thomsen
  • Patent number: 6878405
    Abstract: A method is provided for treating diamond-like carbon (DLC) with a hot liquid and/or ion beam. This treatment can reduce the contact angle of the coating. In certain example embodiments, at least oxygen gas is used in an ion beam source(s) that generates the ion beam(s) used for the ion beam treatment.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: April 12, 2005
    Assignee: Guardian Industries Corp.
    Inventors: Joseph M. Bienkiewicz, Jeffrey D. Gordon, Vijayen S. Veerasamy, Scott V. Thomsen
  • Patent number: 6875327
    Abstract: The invention provides a biosensor comprising a support; a conductive layer composed of a electrical conductive material such as a noble metal, for example gold or palladium, and carbon; slits parallel to and perpendicular to the side of the support; working, counter, and detecting electrodes; a spacer which covers the working, counter, and detecting electrodes on the support; a rectangular cutout in the spacer forming a specimen supply path; an inlet to the specimen supply path; a reagent layer formed by applying a reagent containing an enzyme to the working, counter, and detecting electrodes, which are exposed through the cutout in the spacer; and a cover over the spacer. The biosensor can be formed by a simple method, and provides a uniform reagent layer on the electrodes regardless of the reagent composition.
    Type: Grant
    Filed: November 14, 2000
    Date of Patent: April 5, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shoji Miyazaki, Hiroyuki Tokunaga, Masaki Fujiwara, Eriko Yamanishi, Yoshinobu Tokuno
  • Patent number: 6863934
    Abstract: Disclosed is a method of surface treatment of a thermoplastic resin film (i) which comprises the steps of subjecting the thermoplastic resin film (i) to surface oxidation, coating the oxidized film with a surface modifier (A) and then stretching the coated film, and which is characterized in that: the surface modifier (A) is an aqueous dispersion prepared by dispersing an olefin copolymer (a) with an unsaturated carboxylic acid or its anhydride bonded thereto in water along with at least one dispersant (b) selected from the group consisting of nonionic surfactants, nonionic water-soluble polymers, cationic surfactants and cationic water-soluble polymers; the ratio by weight of (a)/(b) in terms of the solid content thereof falls between 100/1 and 100/30; and the mean particle size of the resin in the surface modifier (A) is at most 5 ?m. The method can provide a thermoplastic resin film of good melt thermal transfer printability and good offset printability capable of giving prints of good water resistance.
    Type: Grant
    Filed: December 22, 2003
    Date of Patent: March 8, 2005
    Assignee: Yupo Corporation
    Inventors: Seiichiro Iida, Hisashi Tani
  • Patent number: 6863933
    Abstract: Coating compositions, methods and articles of manufacture comprising a nanoparticle system employing same to impart surface modifying benefits for all types of soft surfaces, and in some cases, hard surfaces, are disclosed. In some embodiments, dispersement of nanoparticles in a suitable carrier medium allows for the creation of coating compositions, methods and articles of manufacture that create multi-use benefits to the modified surfaces. These surface modifications can produce long lasting or semi-permanent multi-use benefits that, in some embodiments, may include at least one of the following improved surface properties: cleaning, wettability, liquid strike-through, comfort, stain resistance, soil removal, malodor control, modification of surface friction, reduced damage to abrasion and color enhancement, relative to the surfaces unmodified with such nanoparticle systems.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: March 8, 2005
    Assignee: The Procter and Gamble Company
    Inventors: Ronald Dean Cramer, Robert Henry Rohrbaugh, John David Carter, Karl Edward Thuemmler, Ekaterina Anatolyevna Ponomarenko, Mattias Schmidt
  • Patent number: 6861087
    Abstract: A method for modifying surface of biodegradable porous polymer scaffold for tissue engineering using a low temperature plasma discharge apparatus, and particularly, a method for inducing the biodegradable porous polymer scaffold to be hydrophilic by graft polymerizing a hydrophilic monomer on the surface of the biodegradable porous polymer scaffold, which is made of polylactic acid, polyglycolic acid or poly(lactic acid-glycolic acid) copolymer, using a low temperature plasma. The surface-modified porous polymer scaffold according to the present invention has an enhanced cell compatibility in cell culture in vitro, and promote tissue growth when the cell is transplanted into a body.
    Type: Grant
    Filed: October 16, 2002
    Date of Patent: March 1, 2005
    Assignees: Korea Institute of Science and Technology, Solco Biomedical Co., Ltd.
    Inventors: Dong Keun Han, Kwang Duk Ahn, Young Min Ju, Saeyoung Ahn
  • Patent number: 6849305
    Abstract: The invention is directed to a photoresist-free method for depositing films composed of metals, such as copper or silica, or their oxides from metal complexes. More specifically, the method involves applying an amorphous film of a metal complex to a substrate. The metal complexes have a metal and a photo-degradable ligand. A preferred ligand is acac or alkyl-acac, expecially in combination with acetate ligands. These films, upon, for example, thermal, photochemical or electron beam irradiation may be converted to the metal or its oxides. By using either directed light or electron beams, this may lead to a patterned metal or metal oxide film in a single step. Low temperature baking may be used to remove residual organics from the deposited film. If silica is the metal, the deposited film has excellent smoothness and dielectric properties.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: February 1, 2005
    Assignee: EKC Technology, Inc.
    Inventors: Juan-Pablo Bravo-Vasquez, Ross H. Hill
  • Patent number: 6838184
    Abstract: An aromatic polyimide film for producing an electro-conductive sealing element of a packaged semi-conductor device, has a thickness of 20 to 60 ?m, a moisture vapor transmission coefficient of 0.05 to 0.8 g/mm/m2·24 hrs, a water absorption ratio of 2.0% or less, and an elastic modulus in tension of 5,000 MPa or more, in which a surface of the polyimide film has been treated with reduced-pressure plasma discharge.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: January 4, 2005
    Assignee: Ube Industries, Ltd.
    Inventors: Takuji Takahashi, Toshihiko Anno, Kohji Narui, Shozo Katsuki
  • Patent number: 6830784
    Abstract: A substrate containing a natural polymeric material is modified by: A) treating the substrate containing the natural polymeric material with a modifying agent selected from the group consisting of organo-functional coupling agents and multi-functional amine containing organic compounds; and B) optionally exposing the substrate containing natural polymeric material with one or more treatments selected from the consisting of: i) subjecting the substrate to extraction with a solvent to reduce the content of extractable materials associated with the natural polymeric material prior to or during treatment with the modifying agent; ii) treatment with a physical field selected from static physical fields, high-frequency alternating physical fields and combinations of two or more thereof either prior to, during or after treatment with the modifying agent; and iii) oxidation of at least part of the natural polymeric material prior to or during treatment with the modifying agent.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: December 14, 2004
    Assignee: Commonwealth Scientific and Industrial Research Organisation
    Inventors: Wojciech Stanislaw Gutowski, Lee Joy Russell, Alexander Bilyk, Pamela Maree Hoobin, Sheng Li, Can Filippou, Mark Spicer
  • Patent number: 6830782
    Abstract: A method of modifying a polymeric material which comprises the steps of activation-treatment and a hydrophilic polymer-treatment, or comprises the steps of activation-treatment, a hydrophilic polymer-treatment, and monomer grafting in this order, or comprises the step of a solvent-treatment followed by these steps. Thus, the polymeric material, e.g., polyolefin, is improved in hydrophilicity, adhesion, etc. without lowering the practical strength thereof. The polymeric material thus improved in adhesion and other properties can be used in many applications where water absorption and adhesion are required, such as an absorption material, e.g., a wiping/cleansing material, a water retention material, a material for microorganism culture media, a separator for batteries (or cells), a synthetic paper, a filter medium, a textile product for clothing, a medical/sanitary/cosmetic supply, and reinforcing fibers for composite materials.
    Type: Grant
    Filed: August 27, 2001
    Date of Patent: December 14, 2004
    Inventor: Hitoshi Kanazawa
  • Patent number: 6827835
    Abstract: A method for electroplated metal annealing process. First, a semiconductor structure is provided, wherein the semiconductor structure has a plurality of semiconductor components, such as a gate electrode, a source region and a drain region, and a field oxide region. Second, a dielectric layer is formed over the semiconductor structure, and a via which exposes a part of the semiconductor structure is formed in the dielectric layer by the use of conventional lithographic and etching processes and an electroplated metal layer is formed over the dielectric layer; meanwhile, the via is filled with the electroplated metal layer. The electroplated metal layer is then annealed by a NH3 plasma process performed by plasma enhanced chemical vapor deposition (PECVD).
    Type: Grant
    Filed: March 26, 2002
    Date of Patent: December 7, 2004
    Assignee: United Microelectronics Corp.
    Inventors: Neng-Hui Yang, Kuo Feng Huang, Tsung-Tang Hsieh