Abstract: A substrate containing a natural polymeric material is modified by: A) treating the substrate containing the natural polymeric material with a modifying agent selected from the group consisting of organo-functional coupling agents and multi-functional amine containing organic compounds; and B) optionally exposing the substrate containing natural polymeric material with one or more treatments selected from the consisting of: i) subjecting the substrate to extraction with a solvent to reduce the content of extractable materials associated with the natural polymeric material prior to or during treatment with the modifying agent; ii) treatment with a physical field selected from static physical fields, high-frequency alternating physical fields and combinations of two or more thereof either prior to, during or after treatment with the modifying agent; and iii) oxidation of at least part of the natural polymeric material prior to or during treatment with the modifying agent.

Abstract: A method of modifying a polymeric material which comprises the steps of activation-treatment and a hydrophilic polymer-treatment, or comprises the steps of activation-treatment, a hydrophilic polymer-treatment, and monomer grafting in this order, or comprises the step of a solvent-treatment followed by these steps. Thus, the polymeric material, e.g., polyolefin, is improved in hydrophilicity, adhesion, etc. without lowering the practical strength thereof. The polymeric material thus improved in adhesion and other properties can be used in many applications where water absorption and adhesion are required, such as an absorption material, e.g., a wiping/cleansing material, a water retention material, a material for microorganism culture media, a separator for batteries (or cells), a synthetic paper, a filter medium, a textile product for clothing, a medical/sanitary/cosmetic supply, and reinforcing fibers for composite materials.

Abstract: A method for electroplated metal annealing process. First, a semiconductor structure is provided, wherein the semiconductor structure has a plurality of semiconductor components, such as a gate electrode, a source region and a drain region, and a field oxide region. Second, a dielectric layer is formed over the semiconductor structure, and a via which exposes a part of the semiconductor structure is formed in the dielectric layer by the use of conventional lithographic and etching processes and an electroplated metal layer is formed over the dielectric layer; meanwhile, the via is filled with the electroplated metal layer. The electroplated metal layer is then annealed by a NH3 plasma process performed by plasma enhanced chemical vapor deposition (PECVD).

Abstract: A method for treating a silicon substrate is described. The silicon substrate is placed into a sputtering equipment. A sputtering step is performed to simultaneously dry clean and amorphize the silicon substrate surface by using the sputtering equipment. A titanium film is deposited on the silicon substrate by the sputtering equipment.

Abstract: Disclosed are implantable medical devices with enhanced patency. Expanded polytetrafluoroethylene small caliber vascular grafts coated with polymer bound bio-active agents that exhibit enhanced patency are disclosed. The polymer bound bio-active agents can include anti-thrombogenic agents, antibiotics, antibacterial agents and antiviral agents. Methods of preparing same are also provided.

Abstract: A method for forming an adhesion/barrier liner with reduced fluorine contamination to improve adhesion and a specific contact resistance of metal interconnects including providing a semiconductor wafer having a process surface including an etched opening extending through a dielectric insulating layer thickness and in closed communication with a conductive underlayer surface; pre-heating the semiconductor wafer in a plasma reactor to a pre-heating temperature of at least about 400° C.; cleaning the etched opening according to a plasma assisted reactive pre-cleaning process (RPC) comprising nitrogen trifluoride (NF3); and, blanket depositing at least a first adhesion/barrier layer over the etched opening substantially free of fluorine containing residue.

Abstract: A method of forming a thin film on the surface of a substrate such as silicon, in which a gas cluster (which is a massive atomic or molecular group of a reactive substance taking the gaseous form at room temperature under atmospheric pressure) is formed and then ionized, and the cluster ions are then irradiated onto a substrate surface under an acceleration voltage to cause a reaction. It is possible to form a high quality ultra-thin film having a very smooth interface, without causing any damage to the substrate, even at room temperature.

Abstract: A medical device comprising a substrate having a plasma polymerized functionally bonded to at least a portion of the substrate. A superoxide dismutase mimic agent having a complimentary functional group to the plasma polymerized functionality is bonded to the portion of the substrate by bonding to the plasma polymerized functionality.

Abstract: The present invention involves the hydrothermal treatment of nanostructured films to form high k PMOD™ films for use in applications that are temperature sensitive, such as applications using a polymer based substrate. After a PMOD™ precursor is deposited and converted on a substrate, and possibly after other process steps, the amorphous, nanoporous directly patterned film is subjected to low temperature hydrothermal treatment to densify and possibly crystallize the resulting high dielectric PMOD™ film. A post hydrothermal treatment bake is then performed to remove adsorped water.

Abstract: The invention provides a method for single-step surface modification, grafting and sterilization for bio-active coating on materials and biomaterials used in medical devices, such as catheters, tissue engineering scaffolds, or drug delivery carrier materials. This may include any medical device or implantable that could benefit from improved antithrombogenic and biocompatible surfaces. Other relevant device examples may include heparin or urokinase coated stents to reduce clotting and restenosis, dental or ophthamological implants. These materials may be comprised of a variety of polymeric compositions such as, polyurethane, polyester, polytetrafluoroethylene, polyethylene, polymethylmethacrylate, polyHEMA, polyvinyl alcohol, polysiloxanes, polylactic or glycolic acids, polycaprolactone, etc. The substrates can also be metal, ceramics or biologically derived materials.

Abstract: A photoresist-free method for making patterned films of metal oxides, metals, or other metal containing compounds is described. The method involves applying a thin film coating of a metal complex, resulting in the formation of a liquid crystal film. This film can be photolyzed resulting in a chemical reaction which deposits a metal or metal oxide film. The metal complex used is photoreactive and undergoes a chemical reaction in the presence of light of a suitable wavelength. The end product of the reactions depends upon the atmosphere in which the reactions take place. Metal oxide films may be made in air. Patterned films may be made by exposing only selected portions of the film to light. Patterns of two or more materials may be laid down from the same film by exposing different parts of the film to light in different atmospheres.

Abstract: A glass substrate is ion beam milled in order to smoothen the same and/or reduce or remove nano-cracks in the substrate surface before a coating system (e.g., diamond-like carbon (DLC) inclusive coating system) is deposited thereon. It has been found that such ion beam milling of the substrate prior to deposition of the coating system improves adherence of the coating system to the underlying milled substrate. Moreover, it has surprisingly been found that such ion beam milling of the substrate results in a more scratch resistant coated article when a DLC inclusive coating system is thereafter ion beam deposited on the milled substrate. Amounts sodium (Na) may also be reduced at the surface of the substrate by such milling.

Abstract: A magnetic read head with reduced side reading characteristics is described. This design combines use of a current channeling layer (CCL) with stabilizing longitudinal bias layers whose magnetization direction is canted relative to that of the free layer easy axis and that of the pinned layer (of the GMR). This provides several advantages: First, the canting of the free layer at the side region results in a reduction of side reading by reducing magnetic sensitivity in that region. Second, the CCL leads to a narrow current flow profile at the side region, therefore producing a narrow track width definition. A process for making this device is described. Said process allows some of the requirements for interface cleaning associated with prior art processes to be relaxed.

Abstract: A metallized polyimide film of the present invention comprises a polyimide film 1 which has undergone surface roughening treatment to produce a surface Ra value of 2 to 10 nm, an intermediate layer 2 formed from one, or two or more elements selected from a group consisting of molybdenum, silicon and silicon monoxide, which is formed on top of the surface which has undergone surface roughening treatment with an average thickness of 5 to 50% of the aforementioned Ra value, and a conductive metal layer 4 which is formed on top of the intermediate layer 2. This construction improves the bonding strength between the polyimide film and the metal layer.

Abstract: A method of applying a coating of NBC resistant material to a non-NBC resistant polymeric layer is provided comprising the steps of subjecting a surface of the polymeric layer to be coated to a high frequency and high voltage corona discharge to change said surface to provide a keying surface thereon; and applying the coating of NBC resistant material thereto. A material made by the method is also provided.

Abstract: A servo-patterned magnetic recording medium, comprising: a magnetic layer having a surface with substantially uniform topography, the magnetic layer including a data zone and a servo pattern, the servo pattern comprising: (a) a first patterned plurality of regions of first, higher values of magnetic coercivity Hc and magnetic remanence-thickness product Mrt; and (b) a second patterned plurality of ion-implanted regions of second, lower values of Hc. and Mrt; wherein the second, lower values of Hc and Mrt are sufficiently lower than the first, higher values of Hc and Mrt as to permit sensing for enabling accurate positioning of a read/write transducer head in the data zone but sufficiently high for providing the medium with thermal stability, high amplitude of magnetic transition, and high signal-to-noise ratio.

Abstract: A process or preparing a coating composition which involves forming a hydrolysis product is described.

Abstract: A multilayer coating of fullerene molecules is deposited on a substrate, and layers of the multilayer coating are removed leaving an approximate monolayer coating of fullerene molecules on the substrate. In some embodiments, a beam generator, such as an ion beam, electron beam or laser generator, produces a beam arranged to break the weaker fullerene-to-fullerene intermolecular bond of the multilayer coating and inadequate to break the stronger fullerene-to-substrate association/bond of the coating. The beam is directed at the multilayer coating to break the fullerene-to-fullerene intermolecular bond. In other embodiments, the monolayer of fullerene molecules is formed by applying a solvent to the multilayer coating to break the fullerene-to-fullerene intermolecular bond of the multilayer coating.

Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, in which process in a first step: a) the inorganic or organic substrate is subjected to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, the radiation or discharge is then discontinued, in a further step: b) at least one electron- or H-donor, each containing at least one ethylenically unsaturated group, is applied to the inorganic or organic substrate in vacuo or at normal pressure and reacted with the free radicals formed there, and c1) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and a photoinitiator, and the coating is cured by means of electromagnetic and/or ionizing radiation; or c2) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligo

Abstract: A method for preparing carbon molecular sieve membrane is invented. A thin carbon-containing film is first deposited on a porous substrate. The thin film is then bombarded by high energy ions for surface modification. The surface modified film is then baked or calcined at a high temperature. The carbon molecular sieve membrane prepared according to the present invention can be used for gas separation as well as liquid separation, ions or solvents, etc., exhibiting improved permeance and improved selectivity simultaneously in gas separation. The ion bombardment includes generating plasma and ions in a gas phase, and applying a negative bias voltage to the substrate.

Abstract: Ion-induced, UV-induced, and electron-induced sequential chemical vapor deposition (CVD) processes are disclosed where an ion flux, a flux of ultra-violet radiation, or an electron flux, respectively, is used to induce the chemical reaction in the process. The process for depositing a thin film on a substrate includes introducing a flow of a first reactant gas in vapor phase into a process chamber where the gas forms an adsorbed saturated layer on the substrate and exposing the substrate to a flux of ions, a flux of ultra-violet radiation, or a flux of electrons for inducing a chemical reaction of the adsorbed layer of the first reactant gas to form the thin film. A second reactant gas can be used to form a compound thin film. The ion-induced, UV-induced, and electron-induced sequential CVD process of the present invention can be repeated to form a thin film of the desired thickness.

Abstract: A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.

Abstract: A magnetic recording medium is provided in which film thickness of the DLC layer is 5 nm or less. A tangential force of the magnetic head is small. The magnetic recording medium has excellent durability to sliding property. A magnetic storage device can be realized that is capable of stable floating of the magnetic head at 10 nm or less. The magnetic recording medium has a primary coat layer, a magnetic layer, and an overcoat layer on a substrate, wherein the overcoat layer is composed of a DLC film, and in an area in which depth from the surface of the DLC film is 13 Å or less, there is formed a CN bond.

Abstract: The invention is directed to a photoresist-free method for depositing films composed of metals, such as copper, or its oxides from metal complexes. More specifically, the method involves applying an amorphous film of a metal complex to a substrate. The metal complexes have the formula MfLgXh, wherein M is selected from the group consisting of Ti, V, Cr, Au, Mn, Fe, Co, Ni, Cu, Zn, Si, Sn, Li, Na, K, Ba, Sr, Mo, Ru, Pd, Pt, Re, Ir, and Os; L is a ligand of the formula (R2NCR′2CR″2O), wherein R, R′ and R″ are independently selected from H, CnHm, and CnHmAxBy, wherein A and B are independently selected from main group elements and f, g, h, n, m, x and y represent integers; and X is an anion independently selected from N3, NCO, NO3, NO2, Cl, Br, I, CN, OH, H and CH3. These films, upon, for example, thermal, photochemical or electron beam irradiation may be converted to the metal or its oxides.

Abstract: A liquid crystal display device includes an alignment layer with constituent materials. The constituent materials have a stoichiometric relationship configured to provide a given pretilt angle. Liquid crystal material is provided in contact with the alignment layer. A method for forming an alignment layer for liquid crystal displays includes forming the alignment layer on a substrate by introducing an amount of material to adjust a stoichiometric ratio of constituent materials wherein the amount is determined to provide a given pretilt angle to the alignment layer. Ions are directed at the alignment layer to provide uniformity of the pretilt angle.

Abstract: The present invention provides an optically clear, hydrophilic coating upon the surface of a silicone medical device by sequentially subjecting the surface of the lens to plasma polymerization in a hydrocarbon-containing atmosphere and then covalently attaching a preformed hydrophilic polymer to the surface of the carbon coating. The invention is especially useful for forming a biocompatible coating on a silicone contact lens.

Abstract: An electron emitting device includes at least a first electrode and an electron emitting section provided on the first electrode. The electron emitting section is formed of a particle or an aggregate of particles. The particle contains a carbon material having a carbon six-membered ring structure. The carbon material having a carbon six-membered ring structure contains, for example, graphite or a carbon nanotube as a main component.

Abstract: A method of manufacturing a copper metal wiring in a semiconductor device, by which a plasma process is performed before a diffusion barrier layer is formed and a chemical pre-process using a chemical enhancer is performed so that copper is deposited to form a metal wiring by a chemically enhanced chemical vapor deposition (CECVD) method. The method allows the chemical enhancer to be adhered on the diffusion barrier layer uniformly and stably; therefore, improving the deposition property of a copper thin film.

Abstract: One embodiment of the invention involves introducing at least two metals into a chamber for forming an alloy layer over a substrate. This is accomplished by a variety of methods. In one embodiment, at least two metals are mixed and introduced into a chamber in which a focused ion beam contacts the two metals to form at least one alloy layer over a substrate. In another embodiment, at least two precursor gas sources are introduced into the chamber in which each precursor gas source contains a metal. The focused ion beam contacts the two precursor gases to form an alloy layer over the substrate. In yet another embodiment, a second metal layer is formed over a first metal layer to form a multi-metal layer. Thereafter, thermal treatment or introducing a focused ion beam to at least a portion of the multi-metal layer is performed to create at least one alloy layer over the substrate.

Abstract: A process includes coating a substrate with a hydrophobic coating system including highly tetrahedral amorphous carbon that is a form of diamond-like carbon (DLC). In certain embodiments, the coating system is deposited on the substrate in a manner to increase its hydrophobicity. In certain embodiments, the coating system is deposited in a manner such that it has an average hardness of at least about 10 GPa, more preferably from about 20-80 GPa. In certain embodiments, the coating system includes first and second DLC inclusive layers that are deposited using one or more ion beam deposition devices, wherein different gases are used to deposit the respective DLC inclusive layers such that the overlying layer has greater scratch resistance characteristics than the underlying layer which functions as an anchoring layer.

Abstract: A method of modifying surfaces of a device, for example, a medical device, is disclosed. The method includes modifying a surface of a device by providing a device, exposing the device to a reactive gas and plasma energy to create a plasma deposited surface on the device, and quenching the device with the reactive gas. The device exhibits changes in its surface properties thereby making it more desirable for an intended use.

Abstract: The present invention provides an optically clear, hydrophilic coating upon the surface of a silicone medical device by sequentially subjecting the surface of the lens to plasma polymerization in a hydrocarbon-containing atmosphere and then covalently attaching a preformed hydrophilic polymer to the surface of the carbon coating. The invention is especially useful for forming a biocompatible coating on a silicone contact lens.

Abstract: Ion-induced, UV-induced, and electron-induced sequential chemical vapor deposition (CVD) processes are disclosed where an ion flux, a flux of ultra-violet radiation, or an electron flux, respectively, is used to induce the chemical reaction in the process. The process for depositing a thin film on a substrate includes introducing a flow of a first reactant gas in vapor phase into a process chamber where the gas forms an adsorbed saturated layer on the substrate and exposing the substrate to a flux of ions, a flux of ultra-violet radiation, or a flux of electrons for inducing a chemical reaction of the adsorbed layer of the first reactant gas to form the thin film. A second reactant gas can be used to form a compound thin film. The ion-induced, UV-induced, and electron-induced sequential CVD process of the present invention can be repeated to form a thin film of the desired thickness.

Abstract: The invention provides a method for single-step surface modification, grafting and sterilization for bio-active coating on materials and biomaterials used in medical devices, such as catheters, tissue engineering scaffolds, or drug delivery carrier materials. This may include any medical device or implantable that could benefit from improved antithrombogenic and biocompatible surfaces. Other relevant device examples may include heparin or urokinase coated stents to reduce clotting and restenosis, dental or ophthamological implants. These materials may be comprised of a variety of polymeric compositions such as, polyurethane, polyester, polytetrafluoroethylene, polyethylene, polymethylmethacrylate, polyHEMA, polyvinyl alcohol, polysiloxanes, polylactic or glycolic acids, polycaprolactone, etc. The substrates can also be metal, ceramics or biologically derived materials.

Abstract: A method of modifying a surface of an ophthalmic lens, includes the steps of: generating plasma at an atmospheric pressure between electrodes of a plasma generating device; and blowing the plasma from the plasma generating device by introducing a gas between the electrodes. The ophthalmic lens, which is located outside the plasma generating device, is irradiated with the plasma blown out from the plasma generating device to modify the surface of the ophthalmic lens to form a final ophthalmic lens product.

Abstract: The invention provides a method of treating a material to cause the material to evolve from one phase to a more ordered phase, the method comprising an operation of irradiating the material in which the irradiating particles are suitable, by their nature and by their energy, for inducing displacements of the atoms in the material towards positions that favor ordering of the material. Advantageously, the invention also provides apparatus for magnetically recording information, the apparatus comprising a material deposited on a substrate at a temperature of less than 350° C. and that has been subjected to irradiation with irradiating particles that are suitable, by their nature and their energy, for inducing displacements of the atoms in the material towards positions that favor relaxation of the material.

Abstract: A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.

Abstract: A non-linear optical silica thin film (22) whose main material is SiO2—GeO2 is formed by irradiating positive or negative polar particles and polarization orientation is carried out in the silica thin film. For example, by repeating, while forming the silica thin film (22), forming the thin film in a state of irradiating positive particles, forming the thin film in a neutral state, such as irradiation of neutral particles or non-irradiation of particles, forming the thin film in a state of irradiating negative particles, and forming the thin film in a neutral state, a plurality of regions (22-1, 22-2, and 22-3) in different states of polarization orientation are formed in a direction of film thickness of the silica thin film (22). Distribution of charges arises in the silica thin film (22) being formed by irradiation of polar particles and polarization orientation is automatically carried out in the silica thin film (22).

Abstract: A method for improving the electrical conductivity of a substrate of metal, metal alloy or metal oxide comprising depositing a small or minor amount of metal or metals from Group VIIIA metals (Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt) or from Group IA metals (Cu, Ag, Au) on a substrate of metal, metal alloys and/or metal oxide from Group IVA metals (Ti, Zr, Hf), Group VA metals (V, Nb, Ta), Group VIA metals (Cr, Mo, W) and Al, Mn, Ni and Cu and then directing a high energy beam onto the substrate to cause an intermixing of the deposited material with the native oxide of the substrate metal or metal alloy. The native oxide layer is changed from electrically insulating to electrically conductive. The step of depositing can be carried out, for example, by ion beam assisted deposition, electron beam deposition, chemical vapor deposition, physical vapor deposition, plasma assisted, low pressure plasma and plasma spray deposition and the like.

Abstract: A process for producing a homogeneous oxide layer on metal components includes uniformly heating the components, in all their regions, in a vacuum chamber and, after a predetermined temperature has been reached, exposing the components to an oxygen-containing gas for a predetermined period and at a predetermined pressure. The metal components are coated with MCrAlY or PtAl. The preheating temperature is between 750 and 850° C., preferably, approximately 800° C. Preferably, the thickness of the homogeneous oxide layer is between 0.01 and 5 &mgr;m. The heating is preferably by electron radiation. The predetermined period is approximately 10 minutes, and the predetermined pressure is between 1×10−3 and 8×10−2 mbar.

Abstract: The oxide coated fine metal particles include fine core metal particles that are covered with a coating layer including an oxygen-containing compound of a dissimilar element that do not contain as a main component a metal element which is the main component of the fine core metal particles, or a complex oxide or a complex salt of the oxide, the complex oxide or the oxy-acid salt and an oxide of the metal element. A metal powder material is mixed with an oxide powder material of the oxygen-containing compound to obtain a powder material mixture. The powder material mixture is supplied into a thermal plasma to make a vapor-phase mixture and then the vapor-phase mixture is quenched to form the oxide coated fine metal particles comprising the fine core metal particles that are finer than the metal powder material and which are covered with the coating layer including the oxygen-containing compound.

Abstract: A bonded laminate structure which is obtainable by bonding a PBN layer (or PBT layer) to a thermoplastic resin layer without the use of an adhesive material. The bonded laminate structure comprises: a first layer comprising at least one of polybutylene naphthalate (PBN) and polybutylene terephthalate (PBT) as an essential component and having a surface subjected to an electric discharge treatment such as a plasma treatment; and a second layer comprising an amine-rich resin as an essential component and bonded to the surface of the first layer.

Abstract: A film laminate is disclosed and comprises a biaxially oriented polyester film and another film laminated onto the polyester film, where the polyester film comprises a base layer at least 80% by weight of which is composed of a thermoplastic polyester, at least one cover layer and a metallic or ceramic layer located on the cover layer, where the cover layer is composed of a polymer or of a copolymer or of a mixture of polymers which comprises at least 40% by weight of ethylene 2,6-naphthalate units, up to 40% by weight of ethylene terephthalate units and, if desired, up to 60% by weight of units of other aliphatic, cycloaliphatic or aromatic diols and/or carboxylic acids, with the proviso that the Tg2 value of the polyester film is greater than the Tg2 value of the base layer but smaller than the Tg2 value of the cover layer.

Abstract: The method of manufacturing the magnetic medium for data storage comprising magnetic segments (5) for data storage which alternate regularly with nonmagnetic segments, which method comprises deposition on a substrate (1) from a nonmagnetic material a material having low or zero initial magnetization and capable of varying its magnetic characteristics under the effect of irradiation. The mentioned material is laid on the substrate (1) as a layer (2) in a thickness corresponding to one of the overall size values of any one of the magnetic segment (5) being formed. Then the applied layer (2) is selectively irradiated so as to vary the magnetic characteristics of the material of the layer (2) on the irradiated segments before forming the magnetic segments (5) each having a maximum overall size the ratio between which and any other overall size of this magnetic segment is from 3.5:1 to 15:1.

Abstract: An adherent antimicrobial coating and method of making same comprising hydrogenated amorphous carbon and a dispersion of antimicrobial metal ions adapted to maintain a therapeutically effective zone of inhibition.

Abstract: A film laminate for printing comprises a polyolefin film in which at least one side is surface-modified and an anchor layer formed on the surface-modified side of the polyolefin film and containing an oxazoline group-modified resin. The film laminate is prepared by subjecting at least one side of a longitudinally oriented polyolefin film to a corona discharge treatment, forming an ethylene-acrylic acid type copolymer layer on the corona discharge-treated side of the film, laterally orienting the film, and then forming an anchor layer comprising a binder resin, and an oxazoline group-modified resin, on the modified surface of the surface-modified polyolefin film subjected to the corona discharge treatment. The film laminate for printing is excellent in its transparency and it is also excellent in the adhesion to a coated layer.

Abstract: A surface hardening method for resins and a surface hardened resin, capable of reforming the surface of a plastic disk substrate at low energy in a short time, and a production device of such a resin is disclosed. The formation of an ion-implanted layer 11 by implanting equal to or more than 1017 carbon ions per cm2 into the surface of a plastic disk substrate 10 at equal to or less than 20 KeV and the formation of a thin film 12 of high hardness on the ion-implanted layer 11 can be performed alternately or simultaneously, and the hardening rate is increased further by using a bias device.

Abstract: A substrate is coated with a coating system including diamond-like carbon (DLC) and at least one fluoro-alkyl silane (FAS) compound. In certain embodiments, a method of making a coated article includes providing a substrate; and forming a coating system on said substrate in a manner such that the coating system includes each of diamond-like carbon (DLC) and at least one fluoro-alkyl silane (FAS) compound.

Abstract: The present invention relates to a field emission device comprising an anode and a cathode, wherein said cathode includes carbon nanotubes which have been treated with an ion beam. The ion beam may be any ions, including gallium, hydrogen, helium, argon, carbon, oxygen, and xenon ions. The present invention also relates to a field emission cathode comprising carbon nanotubes, wherein the nanotubes have been treated with an ion beam. A method for treating the carbon nanotubes and for creating a field emission cathode is also disclosed. A field emission display device containing carbon nanotube which have been treated with an ion beam is further disclosed.

Abstract: The invention relates to a method and device for improving the coating surface of a coating mass deposited on or applied to a paper web (8, 23) by a film press. An anionic aqueous coating mass or an anionic paper web are provided with an opposite electric charge by an electric charger, whereby the applied coating is attracted to the oppositely charged paper (8, 23) in a nip exit area of the film press. The electric charger is, for example, a corona generator (13, 17) or a direct current voltage source (9) that is connected to the paper (8, 23) and coating slip by electrodes (5, 5a, 7, 7a).