Abstract: A plastic structure comprising:a plastic media, such as a plastic card; anda thin film amorphous inorganic or DLC coating on the plastic media, the coating being hard, transparent or semi-transparent, and wear resistant.

Abstract: This invention relates to a method of making fiber optic interferometers. First, a plurality of optical fibers are bundled and placed into a sleeve. The bundle is then encased in the sleeve and the fiber ends are cut and polished. An area of cladding is stripped back from the polished fiber ends and layers of material are deposited on the fiber ends. These layers of material have varying indexes of refraction and form a grating. The bundle of optical fibers is then removed from encasing in the sleeve.

Abstract: A patterned multiple antibody substrate for use in biosensors or immunosensors is produced by (1) coating an antibody-adsorbent substrate with a material that resists antibody adsorption, (2) using ion beam sputtering, laser ablation, or mechanical scribing to remove the coating at specific sites on the substrate, and then (3) adsorbing specific antibodies at the sites. The substrate is capable of detecting multiple chemical species simultaneously.

Abstract: An article and a method of making surface modified synthetic diamond substes at temperatures below 500.degree. C. for electronic packaging applications are described. The article consists of a synthetic diamond substrate, the surface of which has been modified by providing an adherent thin coating of a ceramic (alumina) material so as to enable metallization of synthetic diamond by current industrial methods. The method of surface modification comprises deposition of a thin transition metal layer on the synthetic diamond substrate prior to low temperature reactive vapor deposition of aluminum followed by annealing in an oxygen atmosphere.

Abstract: A method of growing an oxide film in which the upper surface of a semiconductor substrate is cleaned and the semiconductor substrate is dipped into an acidic solution to remove any native oxide from the upper surface. The substrate is then directly transferred from the acidic solution to an oxidation chamber. The oxidation chamber initially contains an inert ambient maintained at a temperature of less than approximately 500.degree. C. The transfer is accomplished without substantially exposing the substrate to oxygen thereby preventing the formation of a native oxide film on the upper surface of the substrate. Thereafter, a fluorine terminated upper surface is formed on the semiconductor substrate. The temperature within the chamber is then ramped from the first temperature to a second or oxidizing temperature if approximately 700.degree. C. to 850.degree. C. The presence of the fluorine terminated upper surface substantially prevents oxidation of the semiconductor substrate during the temperature ramp.

Abstract: A process for the production of a carrier for surface plasmon resonance analysis comprising:A) depositing a preparatory layer on a surface, said preparatory layer comprising a metal selected from the group consisting of: nickel, titanium and chromium, wherein said preparatory layer is substantially uniform and has a thickness of 20-40 Angstroms,B) depositing a silver layer on said preparatory layer wherein said silver layer is substantially uniform and has a thickness of 500-600 Angstroms, andC) said carrier is suitable for surface plasmon resonance analysis.

Abstract: A CVD apparatus is equipped with a cleaning gas source, selectively connectable to a gas inlet of the chamber of the apparatus, structure, to supply a gas mixture of hydrogen and argon in which the hydrogen content is between 20 percent and 80 percent by volume. A selectively operable 450 MHz MF energy source is coupled to the chamber to energize a plasma in gas. A selectively operable 13.56 MHz HF energy source, controllable independently of the MF energy source and connected between the wafer support and a chamber anode biases a wafer on the support to less than 100 volts, preferably 15 to 35 volts, negative. A heater heats the wafer to temperature about 550.degree. C. Preferably, a turbo molecular pump is used to pump the cleaning gas while maintaining a pressure of between 1 mTorr and 10 Torr and at a rate of from 3 to 12 sccm.

Abstract: A method for sequentially depositing a barrier composition film as a barrier on a substrate. The film is useful for providing an effective barrier against gas permeability in containers and for extending shelf-life of containers, especially plastic evacuated blood collection devices.

Abstract: A method and apparatus for reducing fluorine and other sorbable contaminants in plasma reactor used in chemical vapor deposition process such as the deposition of silicon oxide layer by the reaction of TEOS and oxygen. According to the method of the present invention, plasma of an inert gas is maintained in plasma reactor following chamber clean to remove sorbable contaminants such as fluorine. The plasma clean is typically followed by seasoning of the reactor to block or retard remaining contaminants. According to one embodiment of the invention, the combination of chamber clean, plasma clean, and season film is conducted before PECVD oxide layer is deposited on wafer positioned in the plasma reactor.

Abstract: The present invention relates to a novel method for the plasma assisted high vacuum vapor coating of parts with wear resistant coatings where the method comprises at least the process steps heating and conditioning and where the process step conditioning comprises heating. A protective gas is used for the heating. It is circulated at a pressure of at least 0.01 bar. Significant advantages are realized over state of the art methods using radiation heating. The method is preferentially carried out in an apparatus conceived for it, which comprises a blower (3), protective shields (8) and gas flow management sheets(9).

Abstract: A method of manufacturing a semiconductor device comprising the steps of heating a substrate at a temperature not less than 200.degree. C., for example 800.degree. C., for a sufficient period; cooling the substrate down to room temperature; coating a chemically amplified resist film on the surface of the substrate; exposing a patterning region of the resist film; developing the resist film to form a resist pattern; and etching the surface of the substrate by a certain thickness, employing the resist pattern as a mask. In forming fine resist pattern using chemically amplified resist, resolution can be improved.

Abstract: A method for forming an in-situ doped amorphous or polycrystalline silicon thin film on a substrate is provided. The method includes placing the substrate in a reaction chamber of a CVD reactor and introducing a silicon gas species into the reaction chamber. The flow of the silicon gas species is continued for a time period sufficient to dehydrate the substrate and form a thin layer of silicon. Following formation of the thin layer of silicon, a dopant gas species is introduced into the reaction chamber and continued with the flow of the silicon gas species to form the doped silicon thin film. In an illustrative embodiment a phosphorus doped amorphous silicon thin film for a cell plate of a semiconductor capacitor is formed in a LPCVD reactor.

Abstract: A method for cleaning solder bumps on a substrate that may be employed in a flip-chip design, for example, is described. The method of cleaning includes placing the substrate having the solder bumps into a plasma reactor, introducing a source gas including nitrogen trifluoride gas into the plasma reactor, striking a plasma from the source gas in the plasma reactor, and forming a fluoride compound on the surface of the solder bump.

Abstract: A method of using an amorphous carbon-based coating to extend the operating life of a fuel injector having a needle operating within a valve body, the valve body, the valve and body having steel surfaces subject to repeated impact and sliding friction contact over the operating life of the injector. The method comprises (a) providing the steel surfaces of at least one of the needle and body with an ion implanted stabilized amorphous carbon-based coating in a thickness of 1-10 micrometers, the coating having low internal stresses and low coefficient of friction independent of humidity and being stabilized by the presence of up to 30% by weight of carbide forming material selected from the group of silicon, titanium and tungsten, and (b) repeatedly and rapidly actuating the fuel injector in time periods of 0.5-1.

Abstract: A method for cleaning solder bumps on a substrate that may be employed in a flip-chip design, for example, is described. The method of cleaning includes placing the substrate having the solder bumps into a plasma reactor, introducing a source gas including nitrogen trifluoride gas into the plasma reactor, striking a plasma from the source gas in the plasma reactor, and forming a fluoride compound on the surface of the solder bump.

Abstract: A thin fluoropolymer film is covalently bonded to a microporous ptfe film to make a bilayer for separation, filtration or reverse osmosis, by exposing the microporous film to perfluorocyclohexane under plasma. The perfluorocyclohexane molecules undergo scission and the fragments combine on the substrate to make a fluoropolymer film wherein the pores of the substrate have not been completely closed by the coating.

Abstract: A method of resetting the mirrors (11, 21) of the mirror elements of a digital micro-mechanical device (DMD) (10, 20). A bias voltage is applied to the mirror elements and the surface upon which they land, but is removed after the address voltage has been switched. (FIG. 4). Immediately before the bias is removed, a reset voltage is added to the bias voltage. The reset voltage signal is comprised of a number of pulses at a frequency that matches the resonant frequency of the mirrors. The magnitude of the reset voltage results in a total applied voltage that permits vibrational energy to build but that is insufficient to cause the mirrors to become unstuck until the end of the reset signal. In other words, the magnitude of the reset voltage is small relative to that of the bias voltage.

Abstract: A metalized polyester film for application to a substrate to be used as a trim component for automobiles and the like. The film is comprised of a thermally stable extensible polyester carrier for supporting multiple layers of metallic and thermoplastic coatings. Prior to application of a metallic coating, the film is cleaned by means of exposure to an inert gas such as argon in order to remove moisture and other impurities. A layer of aluminum or other metal is then deposited on the carrier film thereby forming a superior bond with the cleaned surface. A tie coat primer is applied over the aluminum which is followed by an adhesive. The metalized film is adhesively applied to a formable substrate which is configured into an end component part by means of vacuum forming or pressure forming. The formed laminated substrate is next attached to a piece of support plastic, wherein the composite part can be applied as trim. A protective lacquer coat is applied to the polyester film as a final step.

Abstract: A silicon nitride layer 12b is thermally grown on the topmost surface of the heat treatment jig 12 composed of silicon or silicon carbide in a nitrogen ambience. The silicon nitride layer 12b is thermally grown in a nitrogen ambience in the temperature range of 1,100.degree. C.-1,300.degree. C. It is desirable to remove slightly the surface of the jig by, for example, hydrogen etching before thermally growing the silicon nitride layer 12b. After the etching, a silicon oxide layer can be thermally grown on the jig surface in an oxygen ambience before thermally growing the silicon nitride layer 12b.

Abstract: A method of forming an electrical contact to a substrate includes, a) placing a substrate having a silicon node to which electrical connection is to be made within a chemical vapor deposition reactor; b) injecting a first titanium organometallic precursor to within the reactor having the substrate positioned therein, and maintaining the reactor at a temperature and a pressure which in combination are effective to deposit a first layer comprising titanium nitride onto the substrate over the node to a first thickness, the first layer of titanium nitride having incorporated carbon from the first titanium organometallic precursor, the first layer and silicon node defining a contact interface therebetween; c) after depositing the first layer, ceasing to inject the first titanium organometallic precursor into the reactor and first injecting a first component gas into the reactor and generating a first plasma from the first component gas within the reactor against the first layer, the first component gas and first p

Abstract: A film is applied to a substrate in accordance with a predetermined pattern by applying a solution of a copolymer of fluoropolymers dissolved in a solvent onto the surface of the substrate; curing and annealing the solution to boil off the solvent and form a copolymer film on the substrate; depositing a thin metal film on the copolymer film; patterning the thin metal film by a photoresist etching process to expose the underlying copolymer film in accordance with the predetermined pattern; removing the exposed copolymer film so that the underlying substrate is exposed in accordance with the predetermined pattern; removing any remaining thin metal film; depositing the film to the remaining copolymer film and exposed substrate; then removing the remaining copolymer film and any film applied thereon by ultrasonic cleaning.

Abstract: A composite metal membrane including a first metal layer of Group IVB met or Group VB metals, the first metal layer sandwiched between two layers of an oriented metal of palladium, platinum or alloys thereof is provided together with a process for the recovery of hydrogen from a gaseous mixture including contacting a hydrogen-containing gaseous mixture with a first side of a nonporous composite metal membrane including a first metal of Group IVB metals or Group VB metals, the first metal layer sandwiched between two layers of an oriented metal of palladium, platinum or alloys thereof, and, separating hydrogen from a second side of the nonporous composite metal membrane.

Abstract: The present invention provides a method for coating a metal alloy component of a medical implant, particularly a component of a heart valve made of a titanium base alloy, with a strongly adhered coating of diamond-like carbon. The method uses ion beam assisted deposition to form a gradient at the surface of the titanium alloy comprising metal alloy/metal-silicide/(silicon or germanium)/silicon- or germanium-carbide/DLC.

Abstract: Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO.sub.2 overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.

Abstract: A non-photolithographic, physical patterning process, which is useful for selectively etching of a substrate, is provided. The process comprises electrostatically charging liquid droplets which are selectively etchable with respect to the substrate, dispersing the droplets onto substrate in a pattern; and etching the substrate using the droplets as a mask.

Abstract: Uniform ion implantation and deposition onto cylindrical surfaces is achieved by placing a cylindrical electrode in coaxial and conformal relation to the target surface. For implantation and deposition of an inner bore surface the electrode is placed inside the target. For implantation and deposition on an outer cylindrical surface the electrode is placed around the outside of the target. A plasma is generated between the electrode and the target cylindrical surface. Applying a pulse of high voltage to the target causes ions from the plasma to be driven onto the cylindrical target surface. The plasma contained in the space between the target and the electrode is uniform, resulting in a uniform implantation or deposition of the target surface. Since the plasma is largely contained in the space between the target and the electrode, contamination of the vacuum chamber enclosing the target and electrodes by inadvertent ion deposition is reduced.

Abstract: A method of reducing carbon incorporation into films is disclosed which comprises the steps of depositing a layer on a substrate by CVD using organic precursors, the layer comprising hydrocarbons or carbides; and utlizing a reactive hydrogen plasma to displace the hydrocarbons or carbides away from the layer.

Abstract: This invention provides an improved process for surface modification of polymers, graphites and carbon-based composite materials, and improved surface-modified materials produced by the process. The preferred surface modification process of the present invention comprises the steps of: high dose single or multiple implantation of the substrate with energetic ions, including ions of at least one metal or semi-metal element able to form a stable, non-volatile oxide; and oxidative full or partial conversion of an upper portion of the implanted layer to a continuous, resistant oxide-enriched surface layer. The process may also comprise the additional implantation of a hardening non-metal element to participate in the formation of a glass-like surface layer or to form a carbonized, hardened sub-layer.

Abstract: A method for plating zinc substrates with 24K gold. The method includes precleaning the substrate; applying a paint base coat electrostatically; curing the base coat; plating the gold by vacuum metallization; applying a clear paint top coat; and curing the top coat.

Abstract: A method of making a gas-impermeable, chemically inert container wall structure comprising the steps of providing a base layer of an organic polymeric material; conducting a pair of reactive gases to the surface of the base layer preferably by pulsed gas injection; heating the gases preferably by microwave energy pulses sufficiently to create a plasma which causes chemical reaction of the gases to form an inorganic vapor compound which becomes deposited on the surface, and continuing the conducting and heating until the compound vapor deposit on the surface forms a gas-impermeable, chemically inert barrier layer of the desired thickness on the surface. Various wall structures and apparatus for making them are also disclosed.

Abstract: An abrasion wear resistant coated substrate product is described comprising a substrate and an abrasion wear resistant coating material comprising carbon, hydrogen, silicon, and oxygen. The abrasion wear resistant coating material has the properties of Nanoindentation hardness in the range of about 2 to about 5 GPa and a strain to microcracking greater than about 1% and a transparency greater than 85% in the visible spectrum. The coated products of the present invention are suitable for use in optical applications such as ophthalmic lenses or laser bar code scanner windows. In the method for making the products, the substrate is first chemically cleaned to remove contaminants. In the second step, the substrate is inserted into a vacuum chamber, and the air in said chamber is evacuated. In the third step, the substrate surface is bombarded with energetic ions and/or reactive species to assist in the removal of residual hydrocarbons and surface oxides, and to activate the surface.

Abstract: The present invention discloses a method for coating diamond-like carbon on heads and head drums of a video cassette recorder (VCR) by physical vapor deposition-arc method, and VCR heads coated with diamond-like carbon.

Abstract: A method of depositing, by microwave plasma enhanced chemical vapor deposition, a modified, silicon oxide, barrier coating atop a temperature sensitive substrate; said barrier coating having barrier properties to at least gaseous oxygen and water vapor. The precursor gaseous mixture includes at least a silicon-hydrogen containing gas, an oxygen containing gas and a gas containing at least one element selected from the group consisting of germanium, tin, phosphorus, and boron. The method requires introducing a sufficient flow rate of oxygen-containing gas into the precursor gaseous mixture to eliminate the inclusion of silicon-hydrogen bonds into the deposited coating. The preferred modifier is germanium. Also, a composite material having a microwave-plasma-enhanced-chemical-vapor-deposited silicon oxide (modified or non-modified) barrier coating. The barrier coating has barrier properties to at least gaseous oxygen and water vapor and is substantially free of Si--H bonds.

Abstract: A process for preparing coating compositions of a commingled hydrogel of a polyurethane-polyurea polymer hydrogel and a poly(N-vinylpyrrolidone) polymer hydrogel; a process for making materials composed of a polymeric plastic or rubber substrate or a metallic substrate, with a coating of the commingled hydrogel thereon; and a process for making medical devices with a coating of the commingled hydrogel thereon, are disclosed. The coating compositions tenaciously adhere to the substrate materials and medical devices to which they are applied due to bonding of a tie coat to a reactive substrate surface and due to the commingling of the two hydrogel components. The coating compositions and coated materials and medical devices are non-toxic and biocompatible, making them ideally suited for use in applications such as for catheters, catheter balloons and stents.

Abstract: A chemical vapor deposition method of providing a layer of material atop a semiconductor wafer using an organic precursor includes, a) positioning a wafer within a chemical vapor deposition reactor; b) injecting an organic precursor to within the reactor having the wafer positioned therein, and maintaining the reactor at a temperature and a pressure which in combination are effective to deposit a first layer of material onto the wafer which incorporates carbon from the organic precursor; and c) after depositing the first layer, ceasing to inject the organic precursor into the reactor and injecting a component gas into the reactor and generating a plasma within the reactor against the first layer, the component gas and plasma generated therefrom having a component which is effective when in an activated state to interact with a component of the deposited first layer to remove carbon from the first layer and produce gaseous products which are expelled from the reactor.

Abstract: A process for coating a substrate with a metal giving a polished effect, the substrate being of a material that is dimensionally stable at temperatures up to at least 120.degree. C. The process includes the steps of cleaning the substrate or forming a top coating on the substrate by burning on a powdered lacquer, coating the cleaned or coated substrate with a metal giving a polished effect by plasma deposition within a vacuum chamber, and applying a top coating by burning on a powdered lacquer.

Abstract: Method and apparatus for treating a workpiece implantation surface by causing ions to impact the workpiece implantation surface. An implantation chamber defines a chamber interior into which one or more workpieces can be inserted. A support positions one or more workpieces within an interior region of the implantation chamber so that implantation surfaces of the workpieces are facing the interior region. A dopant material in the form of a gas is injected into the implantation chamber to cause the gas to occupy a region of the implantation chamber in close proximity to the one or more workpieces. A plasma of implantation material is created within the interior region of the implantation chamber. First and second conductive electrodes positioned within the implantation chamber include conductive surfaces in proximity to the chamber interior occupied by the one or more workpieces. A voltage source outside the chamber relatively biases the first and second conductive electrodes.

Abstract: The invention relates to methods of making an improved stimulation electrode for cardiac pacing and defibrillating. Specifically, the electrodes of the invention by virtue of the methods of manufacturing and using, demonstrate improved capabilities of stimulating and sensing neuromuscular tissues. The electrodes have enhanced electrically-accessible surface areas which are coated with oxides of valve and noble metals.

Abstract: There is disclosed a process for electroless plating of a conductive metal layer onto the surface of a non-conductive substrate, in which the substrate surface is prepared for receiving a coating of activator using conventional methods, and the coating of activator is applied by contacting the substrate surface with a stabilized sensitizing solution comprising ions of at least one Group VIII and IB transition metal, preferably palladium chloride, stannous ions in a molar concentration in excess of that of the transition metal ions, an acid, and a buffering salt; followed by contacting the sensitized substrate surface with a noble metal activating solution to catalyze the substrate surface for subsequent electroless plating. The sensitized and activated substrate is then contacted with an aqueous dry film photoresist, which is then imaged and developed to form a predetermined electrical circuit pattern, using conventional methods.

Abstract: A method and apparatus for generating plasmas adapted for chemical vapor deposition, etching and other operations, and in particular to the deposition of large-area diamond films, wherein a chamber defined by sidewalls surrounding a longitudinal axis is encircled by an axially-extending array of current-carrying conductors that are substantially transverse to the longitudinal axis of the chamber, and a gaseous material is provided in the chamber. A high-frequency current is produced in the conductors to magnetically induce ionization of the gaseous material in the chamber and form a plasma sheath that surrounds and extends along the longitudinal axis and conforms to the sidewalls of the chamber. A work surface extending in the direction of the longitudinal axis of the chamber is positioned adjacent a sidewall, exposed to the plasma sheath and treated by the plasma.

Abstract: The coated substrate product finds particular application in eyeglass and sunglass lenses, architectural glass, analytical instrument windows, automotive windshields and laser bar code scanners for use in retail stores and supermarkets. The product has greatly improved wear resistance for severe abrasive environments and comprises a substantially optically transparent substrate, a chemically vapor deposited first interlayer bonded to the substrate and a chemically vapor deposited outer layer of substantially optically transparent diamond-like carbon bonded to the interlayer and away from the substrate.

Abstract: A method is described for grading the electrical field at the surface of an electrode by depositing a semiconductive coating thereon. An electrode substrate is powered at a preselected temperature and power. A mixture of gases is then passed through an electrical discharge to ionize at least a portion thereof to form the semiconductive coating on the surface of the electrode. Also described is the plasma enhanced chemical vapor deposition of a diamondlike carbon (DLC) film onto a substrate. A substrate is maintained at a preselected DLC forming temperature and is negatively biased at a first preselected voltage. A first gaseous mixture of hydrocarbons and argon is then passed through an electrical discharge to at least partially ionize the hydrocarbons to form DLC film on the substrate. The substrate is then negatively biased at a second preselected voltage lower than the first preselected voltage.

Abstract: This method and apparatus provide for uniformly coating a hot elongate member with a powder coating. The elongate member and power carry an electrostatic charge which aids in providing the uniform powder coating. This method and apparatus electrostatically charge and heat the elongated member prior to entering a powder coating booth. In the booth, we sequentially discharge the powder coating, electrostatically charge the powder coating and then coat the elongated member with the charged powder coating. In one development, this method and apparatus uniformly powder coats window lineals directly on a pultrusion line.

Abstract: An abrasion wear resistant coated substrate product is described comprising a substrate and an abrasion wear resistant coating material comprising carbon, hydrogen, silicon, and oxygen. The abrasion wear resistant coating material has the properties of Nanoindentation hardness in the range of about 2 to about 5 GPa and a strain to microcracking greater than about 1% and a transparency greater than 85% in the visible spectrum. The coated products of the present invention are suitable for use in optical applications such as ophthalmic lenses or laser bar code scanner windows. In the method for making the products, the substrate is first chemically cleaned to remove contaminants. In the second step, the substrate is inserted into a vacuum chamber, and the air in said chamber is evacuated. In the third step, the substrate surface is bombarded with energetic ions and/or reactive species to assist in the removal of residual hydrocarbons and surface oxides, and to activate the surface.

Abstract: A process for coating metal substrates including cleaning, degreasing and activating the substrate wherein a strongly adhering bonding agent layer is deposited on the substrate. The bonding agent layer comprises a thickness of aluminum. The bonding agent layer is deposited at a temperature not exceeding 300.degree. C.

Abstract: This invention provides methods and compositions for the temporary protection of activated plastic surfaces. The methods involve application of protective coating compositions to activated surfaces thereby protecting the surfaces from oxidation, soiling and mechanical damage. The coatings may be easily washed off leaving a clean activated surface suitable for overcoating.

Abstract: There is provided a process for the preparation of composite semi-permeable membrane superior in selectivity and permeability, capable of improving bonding strength between a porous support layer and a reinforcement and mechanical strength of semi-permeable membrane.The composite semi-permeable membrane is prepared by subjecting woven fabric or non-woven fabric to corona discharge with a discharge power of approximately 10 to approximately 15 watt for a period of approximately 20 to approximately 40 seconds, spraying water over one surface of the fabric, casting porous support substance on the other surface of the fabric when a time of approximately 5 to approximately 10 seconds has elapsed after the spray, and laminating a crosslinked polyamide ultrathin film on the porous support substance, the polyamide ultrathin film being synthesized by interfacial polycondensation of a multifunctional amine solution and a multifunctional halogen solution.

Abstract: A chemical vapor deposition method of providing a layer of material atop a semiconductor wafer using an organic precursor includes, a) injecting an organic precursor and a carrier gas into a reactor having a wafer positioned therein, and maintaining reactor conditions which are effective to deposit a first layer onto the wafer which incorporates carbon from the organic precursor; b) after depositing the first layer, ceasing to inject the organic precursor into the reactor and first injecting hydrogen gas into the reactor and generating a first reactive hydrogen plasma within the reactor against the first layer, the hydrogen effectively diffusing into the first layer and reacting with carbon therein to produce gaseous products which diffuse outwardly of the first layer and are expelled from the reactor; an additional reactive component can be provided; c) after the first reactive hydrogen plasma treatment, injecting the organic precursor and carrier gas to within the reactor, and maintaining the reactor at con

Abstract: A process for preparing coating compositions of a commingled hydrogel of a polyurethane-polyurea polymer hydrogel and at least one other polymer hydrogel of a polymer different from polyurethane-polyurea; a process for making materials composed of a polymeric plastic or rubber substrate or a metallic substrate, with a coating of the commingled hydrogel thereon; and a process for making medical devices with a coating of the commingled hydrogel thereon, are disclosed. The coating compositions tenaciously adhere to the substrate materials and medical devices to which they are applied due to bonding of a tie coat to a reactive substrate surface and due to the commingling of the two hydrogel components. The coating compositions and coated materials and medical devices are non-toxic and biocompatible, making them ideally suited for use in applications such as for catheters, catheter balloons and stents.

Abstract: In a plasma-CVD method and apparatus, plasma is formed from a film material gas in a process chamber and, in the plasma, a film is deposited on a substrate disposed in the process chamber. Formation of the plasma from the material gas is performed by application of an rf-power prepared by effecting an amplitude modulation on a basic rf-power having a frequency in a range from 10 MHz to 200 MHz. A modulation frequency of the amplitude modulation is in a range from 1/1000 to 1/10 of the frequency of the basic rf-power. Alternatively, the rf-power is prepared by effecting on the basic rf-power a first amplitude modulation at a frequency in a range from 1/1000 to 1/10 of the frequency of the basic rf-power, and additionally effecting a second amplitude modulation on the modulated rf-power. A modulation frequency of the second amplitude modulation is in a range from 1/100 to 100 times the modulation frequency of the first amplitude modulation.