Plasma (e.g., Cold Plasma, Corona, Glow Discharge, Etc.) Patents (Class 427/535)
  • Publication number: 20140065445
    Abstract: A magnetic recording medium includes a substrate having sequentially formed thereon a magnetic layer; a protective layer having a thickness ranging from 1.0 nm to 2.5 nm and being composed of an amorphous metal layer having a thickness of at least 0.3 nm formed on the magnetic layer, and a carbon layer composed of amorphous carbon having a thickness of at least 0.3 nm formed on the amorphous metal layer; and a lubricating layer, wherein the carbon layer includes nitrogen atoms in a surface thereof in which a ratio of number of nitrogen atoms to total number of carbon atoms, nitrogen atoms, and oxygen atoms is 14 atomic % or less. Recording performance is improved by reducing the thickness of the protective layer thereof. A method of manufacturing the magnetic recording medium includes performing a nitrogen plasma treatment on a surface of the carbon layer that is effective to adjust the ratio.
    Type: Application
    Filed: August 12, 2013
    Publication date: March 6, 2014
    Applicant: FUJI ELECTRIC CO., LTD.
    Inventors: Tomonori KATANO, Akiyasu KUMAGAI, Katsumi TANIGUCHI, Hiromi ONO, Narumi SATO, Shinji UCHIDA
  • Publication number: 20140065913
    Abstract: Processes for preparing ultra-high molecular weight polyethylene yarns, and the yarns and articles produced therefrom. The surfaces of partially oriented yarns are subjected to a treatment that enhances the surface energy at the fiber surfaces and are coated with a protective coating immediately after the treatment to increase the shelf life of the treatment. The coated, treated yarns are then post drawn to form highly oriented yarns.
    Type: Application
    Filed: March 12, 2013
    Publication date: March 6, 2014
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventor: HONEYWELL INTERNATIONAL INC.
  • Publication number: 20140063854
    Abstract: Provided is an apparatus for manufacturing a light guiding plate. The apparatus for manufacturing a light guiding plate includes an unwinding unit unwinding a film formed of a flexible material and wound in a roll shape, a winding unit winding the film provided from the unwinding unit in a roll shape, a surface treatment unit disposed between the unwinding unit and the winding unit to treat a surface of the film transferred into the winding part into a hydrophobic surface, a pattern formation unit disposed between the surface treatment unit and the winding unit to form a micro lens pattern on the surface of the film of which the surface is treated, and a pattern curing unit disposed between the pattern formation unit and the winding unit to cure the pattern.
    Type: Application
    Filed: September 3, 2013
    Publication date: March 6, 2014
    Inventors: Kyoung Soo Park, Sung Jae Lee
  • Patent number: 8663752
    Abstract: A method of manufacturing carbon coated aluminum foil as a cathode of solid aluminum electrolytic capacitors Comprising the steps of: preparing an aluminum foil by setting the aluminum foil into a chamber; roughening at least one surface of the aluminum foil by introducing gas into the chamber and activating an electric field so that the gas is ionized and turned into a plasma; and depositing carbon atoms by introducing gas mixed with carbon atoms and turning on the electric field again so as to make the carbon atoms have positive charge thereby impacting into and attaching firmly to the rough surface of the aluminum foil to form a carbon film.
    Type: Grant
    Filed: March 14, 2011
    Date of Patent: March 4, 2014
    Inventor: Hung-Wen Tsai
  • Publication number: 20140057057
    Abstract: [Problem] To provide a process for manufacturing a laminated porous film in which wrinkling is suppressed and a covering layer is laminated on at least one surface of a polyolefin-based resin porous film. [Solution] A process for manufacturing a laminated porous film comprising layering a covering layer on at least one surface of a polyolefin-based resin porous film, wherein film tension (Ta) in a drying step is controlled at 40 N/m or less.
    Type: Application
    Filed: October 22, 2012
    Publication date: February 27, 2014
    Applicant: MITSUBISHI PLASTICS, INC.,
    Inventors: Tomohiko Terai, Satoru Momohira, Hirotaka Aria
  • Publication number: 20140055688
    Abstract: Touch screen structures may have an on cell resistive touch sensor made up of a a polarizer film or analyzer. The polarizer film has a first high resolution grid pattern printed on it by at least one master plate and a second flexible, optically isotropic transparent substrate carrying a second high resolution pattern may also be used and assembled to the first pattern. The patterns are plated with conductive material and assembled so that the first and the second conductive patterns engage when the substrate is pressed.
    Type: Application
    Filed: October 25, 2012
    Publication date: February 27, 2014
    Applicant: UNIPIXEL DISPLAYS, INC.
    Inventor: Robert J. Petcavich
  • Publication number: 20140055741
    Abstract: Embodiments of the technology relate to a contact lens having a core that is covalently coated by a hydrogel layer, and to methods of making such a lens. In one aspect, embodiments provide for a coated contact lens comprising a lens core comprising an outer surface; and a hydrogel layer covalently attached to at least a portion of the outer surface, the hydrogel layer adapted to contact an ophthalmic surface, wherein the hydrogel layer comprises a hydrophilic polymer population having a first PEG species and a second PEG species, the first PEG species being at least partially cross-linked to the second PEG species.
    Type: Application
    Filed: August 26, 2013
    Publication date: February 27, 2014
    Inventors: Karen L. Havenstrite, Victor Wayne McCray, Brandon McNary Felkins, Douglas Michael Ackermann, Garrett Cale Smith, Paul A. Cook, Evan S. Luxon, Andrew A. McGibbon
  • Patent number: 8658259
    Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The nanolayer deposition process is a cyclic sequential deposition process, comprising the first step of introducing a first plurality of precursors to deposit a thin film with the deposition process not self-limiting, then a second step of purging the first set of precursors and a third step of introducing a second plurality of precursors to modify the deposited thin film. The deposition step in the NLD process using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film such as a modification of film composition, a doping or a removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: February 25, 2014
    Assignee: ASM International N.V.
    Inventors: Tue Nguyen, Tai Dung Nguyen
  • Patent number: 8658258
    Abstract: An improved method for forming a self-assembled monolayer on a substrate is disclosed. The method comprises plasma treatment of the substrate prior to formation of the self-assembled monolayer.
    Type: Grant
    Filed: October 21, 2009
    Date of Patent: February 25, 2014
    Assignee: Aculon, Inc.
    Inventor: Eric L. Hanson
  • Publication number: 20140044886
    Abstract: The present invention relates to a process for synthesizing a nanostructured composite material and to an implementation device associated with this process. The device (100) comprises a chamber (3) for synthesizing said material comprising a system (13, 13a, 13b) for depositing the matrix on a target surface (15); a system (1, 4, 5, 9) for generating a jet of nanoparticles in a carrier gas comprising an expansion chamber (1) equipped with an outlet orifice (7) for the nanoparticles toward the synthesis chamber (3, 3?) and, in addition, means (21, 22, 23) for adjusting the distance L between the outlet orifice (7) of the expansion chamber and the target surface (15).
    Type: Application
    Filed: August 9, 2013
    Publication date: February 13, 2014
    Inventors: Olivier Sublemontier, Harold Kintz, Yann Leconte
  • Publication number: 20140044887
    Abstract: Apparatus for atomic layer deposition on a surface of a sheeted substrate, comprising: an injector head comprising a deposition space provided with a precursor supply and a precursor drain; said supply and drain arranged for providing a precursor gas flow from the precursor supply via the deposition space to the precursor drain; the deposition space in use being bounded by the injector head and the substrate surface; a gas bearing comprising a bearing gas injector, arranged for injecting a bearing gas between the injector head and the substrate surface, the bearing gas thus forming a gas-bearing; a conveying system providing relative movement of the substrate and the injector head along a plane of the substrate to form a conveying plane along which the substrate is conveyed.
    Type: Application
    Filed: January 30, 2012
    Publication date: February 13, 2014
    Applicant: Nederlandse Organisatie Voor Toegpast- Natuurwetenschappelijk Onderzoek TNO
    Inventor: Adrianus Johannes Petrus Maria Vermeer
  • Publication number: 20140042662
    Abstract: The invention provides a laminate of an inorganic layer, a resin layer, and a coupling agent treatment layer interposed therebetween, which different delamination strengths between the inorganic layer and the resin layer to form a prescribed pattern. The invention also provides a production method comprising (1) treating an inorganic layer with a coupling agent; (2) performing a patterning process to form strong adhesion sections and easily separated sections; and (3) forming a resin layer by drying and heat-treating a coated solution layer obtained by coating a resin solution or a resin precursor solution onto the surface of the inorganic layer that was treated with a coupling agent and then patterned.
    Type: Application
    Filed: April 13, 2012
    Publication date: February 13, 2014
    Applicant: TOYOBO CO., LTD.
    Inventors: Masahiro Tamada, Toshiyuki Tsuchiya, Tetsuo Okuyama, Kazuyuki Ouya, Satoshi Maeda
  • Publication number: 20140038484
    Abstract: A composite material is described. The composite material has a layer of polymeric piezoelectric material, where such polymeric piezoelectric layer has a first surface and a second surface, a textile substrate, and a first electrode disposed on the first surface of the polymeric piezoelectric layer. Conductors are provided on a surface of the textile substrate turned towards the second surface of the layer of polymeric piezoelectric material.
    Type: Application
    Filed: September 4, 2012
    Publication date: February 6, 2014
    Inventor: Giuseppe Pezzini
  • Publication number: 20140037938
    Abstract: Methods are generally provided for forming a coated substrate having a plurality of carbon nanoparticles, along with the resulting coated substrates. In one embodiment, the method includes oxidizing the carbon nanoparticles to form oxygen containing end groups on the surfaces of the carbon nanoparticles; dispersing the oxidized carbon nanoparticles into a polymeric media to form an ink; and depositing the ink onto a substrate to form a coating. Generally, the coating includes the oxidized carbon nanoparticles dispersed within the polymeric material.
    Type: Application
    Filed: July 30, 2013
    Publication date: February 6, 2014
    Inventors: Chen Li, Xinyu Huang, Xianming Dai, Fanghao Yang
  • Patent number: 8642136
    Abstract: A substrate processing method includes performing a deposition process of depositing a thin film on the substrate while depressurizing the inside of the processing chamber and introducing the gas thereinto; and, while the deposition process is being performed, irradiating light, which is transmitted through a monitoring window installed at the processing chamber, toward the inside of the processing chamber through the monitoring window, and monitoring a reflection light intensity of reflection light by receiving the reflection light through the monitoring window. The substrate processing method further includes measuring a temporal variation in the reflection light intensity during the deposition process and calculating a termination time of the deposition process based on a measurement value of the temporal variation; and terminating the deposition process by setting the termination time as an end point of the deposition process.
    Type: Grant
    Filed: October 7, 2009
    Date of Patent: February 4, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Masato Kushibiki, Eiichi Nishimura, Akitaka Shimizu
  • Publication number: 20140030533
    Abstract: To manufacture a coating for an article for a semiconductor processing chamber, the coating is applied to the article by a method including applying a sol-gel coating of Y2O3 over the article, and curing the sol-gel coating on the article by heating the article with the sol-gel coating and exposing the article with the sol-gel coating to plasma in a semiconductor manufacturing chamber.
    Type: Application
    Filed: February 5, 2013
    Publication date: January 30, 2014
    Applicant: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Dmirty Lubomirsky, Vahid Fioruzdor
  • Publication number: 20140023794
    Abstract: Provided are methods and apparatus for low temperature atomic layer deposition of a densified film. A low temperature film is formed and densified by exposure to one or more of a plasma or radical species. The resulting densified film has superior properties to low temperature films formed without densification.
    Type: Application
    Filed: July 23, 2013
    Publication date: January 23, 2014
    Inventors: Maitreyee Mahajani, Steven D. Marcus, Li-Qun Xia, Mihaela Balseanu, Victor Nguyen, Ning Li, Jingjing Liu, Sukti Chatterjee, Timothy W. Weidman
  • Publication number: 20140023840
    Abstract: Provided is an antireflection film obtained by laminating, in succession, a transparent substrate, a first layer, and a second layer having a lower refractive index than the refractive index of the first layer. The first layer is obtained by curing a film containing an ionizing radiation-curable material, a quaternary ammonium salt material, a leveling agent, and a solvent, and has a structure wherein a middle layer, hard coating layer and recoating layer are laminated in succession from the transparent substrate side. The recoating layer does not contain a quaternary ammonium salt. The hard coating layer contains a quaternary ammonium salt, and the concentration of the quaternary ammonium salt in the hard coating layer gradually increases from the middle layer side to the recoating layer side.
    Type: Application
    Filed: September 26, 2013
    Publication date: January 23, 2014
    Applicant: Toppan Printing Co., Ltd.
    Inventors: Naoyuki SHIBAYAMA, Toshiaki YOSHIHARA
  • Publication number: 20140023881
    Abstract: Provided is a liquid crystal polymer film based copper-clad laminate characterized in that a surface of one side or each of both sides of a liquid crystal polymer film has a nitrogen atom content of 10 at % or more, and a metal conductor layer formed by dry plating and/or wet painting is provided on the surface of the liquid crystal polymer film having the nitrogen atom content of 10 at % or more. The liquid crystal polymer film based copper-clad laminate is characterized by having arithmetic average roughness Ra of 0.15 ?m or less and a root-mean-square roughness Rq of 0.20 ?m or less as surface roughness of the liquid crystal polymer film. Also provided is a method for producing a liquid crystal polymer film based copper-clad laminate characterized by performing plasma processing on the surface of the liquid crystal polymer film under a nitrogen atmosphere at a gas pressure of 2.6 to 15 Pa, followed by forming the metal conductor layer by dry plating and/or wet plating.
    Type: Application
    Filed: February 15, 2012
    Publication date: January 23, 2014
    Applicant: JX NIPPON MINING & METALS CORPORATION
    Inventors: Kazuhiko Sakaguchi, Hajime Inazumi, Hisakazu Yachi
  • Patent number: 8632859
    Abstract: The invention relates to a method for improving the properties of coatings on transparent materials by plasma treatment, preferably by an atmospheric pressure plasma.
    Type: Grant
    Filed: August 27, 2008
    Date of Patent: January 21, 2014
    Assignee: Siemens Aktiengesellschaft
    Inventors: Florian Eder, Rudolf Gensler
  • Publication number: 20140018194
    Abstract: The invention provides a method of manufacturing golf balls which includes the step of printing specific markings on the surface of a golf ball by pad printing. Prior to the printing step, the surface of the ball is subjected to heat and pressure treatment.
    Type: Application
    Filed: July 12, 2012
    Publication date: January 16, 2014
    Applicant: BRIDGESTONE SPORTS CO., LTD.
    Inventor: Toshiro WACHI
  • Publication number: 20140017454
    Abstract: One aspect of the invention relates to a method of forming a micro- or nano-pattern on the surface of a composite material. The pattern may be a herringbone pattern with a jog angle of greater than or less than 90° or a graded wrinkled pattern. The micro- or nano-patterns on composite materials produced by the methods may be used to modulate, confer or control thin film material properties; as the basis for thickness measurements; to enhance light extraction in OLED; to enhance light harvest in opto-electronic devices; to tune adhesion properties, wetting, and friction of surfaces; to reduce fluid flow drag; and for anti-fouling purposes.
    Type: Application
    Filed: March 12, 2013
    Publication date: January 16, 2014
    Applicant: Massachusetts Institute of Technology
    Inventors: Mary Cunningham Boyce, Karen K. Gleason, Jose Luis Yague, Jie Yin, Shabnam Raayai Ardakani
  • Publication number: 20140010969
    Abstract: An apparatus and method for treating layers are provided that use a plasma zone sealed from the outer atmospheric pressure. The apparatus includes a plasma reactor with a substrate carrier in form of a container receiving device and a closing element that is joined with the substrate carrier by a lifting device.
    Type: Application
    Filed: January 17, 2012
    Publication date: January 9, 2014
    Applicant: SCHOTT AG
    Inventors: Matthias Bicker, Manfred Lohmeyer, Harmut Bauch
  • Patent number: 8623471
    Abstract: A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed generally between a powered electrode and a grounded plate, a processing space separated from the plasma cavity by the grounded plate, and a substrate support in the processing space for holding the workpiece. A direct plasma is generated in the plasma cavity. The grounded plate is adapted with openings that remove electrons and ions from the plasma admitted from the plasma cavity into the processing space to provide a downstream-type plasma of free radicals. The openings may also eliminate line-of-sight paths for light between the plasma cavity and processing space. In another aspect, the volume of the processing chamber may be adjusted by removing or inserting at least one removable sidewall section from the chamber lid.
    Type: Grant
    Filed: January 19, 2012
    Date of Patent: January 7, 2014
    Assignee: Nordson Corporation
    Inventors: James S. Tyler, James D. Getty, Robert S. Condrashoff, Thomas V. Bolden, II
  • Patent number: 8623468
    Abstract: Methods of fabricating a metal hard mask and a metal hard mask fabricated by such methods are described. The method includes flowing at least one metal reactant gas into a reaction chamber configured to perform chemical vapor deposition (CVD), wherein the at least one metal reactant gas includes a metal-halogen gas or a metal-organic gas. The method further includes depositing a hard mask metal layer by CVD using the at least one metal reactant gas.
    Type: Grant
    Filed: January 5, 2012
    Date of Patent: January 7, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Su-Horng Lin, Lin-Jung Wu, Chi-Ming Yang, Chin-Hsiang Lin
  • Publication number: 20140004274
    Abstract: Described are methods of depositing a metal film by chemical reaction on a substrate. The method comprises: exposing the substrate to flows of a first reactant gas comprising a group 2 metal and a second reactant gas comprising a halide to form a first layer containing a metal halide on the substrate; exposing the substrate to a third reactant gas comprising an oxidant to form a second layer containing a metal peroxide or metal hydroxide on the substrate during; exposing the substrate to heat or a plasma to convert the metal peroxide or metal hydroxide to metal oxide. The method may be repeated to form the metal oxide film absent any metal carbonate impurity.
    Type: Application
    Filed: June 21, 2013
    Publication date: January 2, 2014
    Inventor: David Thompson
  • Publication number: 20140004271
    Abstract: A method for preparing a protective coating against oxidation on at least one surface of at least one part made of at least one material capable of being oxidized, wherein the following successive steps are carried out: a) each of the particles of a powder made of a first ceramic selected from refractory ceramics and ceramics which resist oxidation, is coated with at least one layer selected from layers made of a refractory ceramic, layers made of a ceramic which resist oxidation, and layers made of a refractory metal, provided that the coating comprises at least one ceramic which resists oxidation, and at least one refractory ceramic or metal; b) the powder is deposited onto the surface to be coated of the part; c) sintering of the powder is achieved on the surface of the part by a Spark Plasma Sintering (SPS) Method; d) the part is cooled; e) the cooled part, coated on at least one of its surfaces with a protective refractory monolayer coating against oxidation, with a three-dimensional microstructure, i
    Type: Application
    Filed: October 25, 2011
    Publication date: January 2, 2014
    Applicants: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
    Inventors: Alexandre Allemand, Olivier Szwedek, Luc Bianchi, Yann Le Petitcorps
  • Publication number: 20140004273
    Abstract: A alloy surface treatment includes dewaxing and deoiling to an alloy surface via a cleaning process; sealing holes on the alloy surface with an organic material; forming a first coating on the alloy surface with a UV curing material; providing a plasma treatment to activate the alloy surface, then providing a PVD process to form a second coating outside the alloy; forming a third coating on the alloy surface with another UV curing material which further includes a toner therein, then forming a fourth coating on the alloy surface with the UV curing material, wherein the toner is provided to match the color of hexavalent-chromium to obtain a hexavalent-chromium imitated product.
    Type: Application
    Filed: March 15, 2013
    Publication date: January 2, 2014
    Inventors: Zi-bao Wu, Shui Yu, Yu-Ting Zhang, Min-Zen Lee
  • Publication number: 20130340830
    Abstract: A solar cell backsheet, which is arranged in contact with a sealing material of a cell-side substrate on which a photovoltaic element is sealed with the sealing material, the solar cell backsheet including a polyester film base material and at least one polymer layer arranged thereon, wherein the polyester film base material has a carboxyl group content of from 1 eq/ton to 15 eq/ton, a minute endothermic peak temperature Tmeta (° C.) of 220° C. or lower as determined by differential scanning calorimetry, and an average elongation retention ratio of 10% or more as determined after being left to stand for 72 hours under conditions of a temperature of 125° C. and a relative humidity of 100% RH; and the at least one polymer layer comprises at least a fluorocarbon-based polymer, has a crosslinked structure derived from at least one crosslinking agent selected from carbodiimide-based compounds and oxazoline-based compounds and is formed by coating.
    Type: Application
    Filed: September 5, 2013
    Publication date: December 26, 2013
    Applicant: FUJIFILM Corporation
    Inventors: Yohei ARITOSHI, Akira HATAKEYAMA
  • Publication number: 20130344349
    Abstract: A method for producing a thermal barrier in a multilayered system for protecting a metal part made of superalloy, by producing a thermal treatment by flash sintering protection materials in layers superposed on the metal part in an SPS machine enclosure. The layers contain, on a superalloy substrate, at least two layers of zirconium-based refractory ceramics. A metal part is produced according to a SPS flash sintering method and contains a superalloy substrate, a metal sub-layer, a TGO oxide layer and the thermal barrier formed by the method. A first ceramic is an inner ceramic designed to have a substantially higher expansion coefficient. An outer ceramic is designed to have at least lower thermal conductivity, and at least one of a sintering temperature or maximum operating temperature that is substantially higher. The thermal barrier has a composition and porosity gradient from the metal sub-layer to the outer ceramic.
    Type: Application
    Filed: March 7, 2012
    Publication date: December 26, 2013
    Applicants: SNECMA, UNIVERSITE PAUL SEBATIER-TOULOSE III (UPS), INSTITUT NATIONAL POLYTECHNIQUE DE TOULOUSE (INPT), CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
    Inventors: Juliette Hugot, Mathieu Boidot, Daniel Monceau, Djar Oquab, Claude Estournes
  • Publication number: 20130333923
    Abstract: A layer of silicon nitride having a thickness from 0.5 nanometers to 2.4 nanometers is deposited on a substrate. A plasma nitridation process is carried out on the layer. These steps are repeated for a plurality of additional layers of silicon nitride, until a predetermined thickness is attained. Such steps can be used to provide a multilayer silicon nitride dielectric formed on a substrate having an upper surface of dielectric material with Cu and other conductors embedded within, and a plurality of steps. The multilayer silicon nitride dielectric has a plurality of individual layers each having a thickness from 0.5 nanometers to 2.4 nanometers, and the multilayer silicon nitride dielectric conformally covers the steps of the substrate with a conformality of at least seventy percent. A multilayer silicon nitride dielectric, and a multilevel back end of line interconnect wiring structure using same, are also provided.
    Type: Application
    Filed: June 13, 2012
    Publication date: December 19, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Mihaela Balseanu, Stephan A. Cohen, Alfred Grill, Thomas J. Haigh, JR., Son V. Nguyen, Mei-Yee Shek, Hosadurga Shobha, Li-Qun Xia
  • Publication number: 20130337186
    Abstract: The present invention provides a reactor and a method for the production of high purity silicon granules. The reactor includes a reactor chamber; and the reaction chamber is equipped with a solid feeding port, auxiliary gas inlet, raw material gas inlet, and exhaust gas export. The reaction chamber is also equipped with an internal gas distributor; a heating unit; an external exhaust gas processing unit connected between a preheating unit and a gas inlet. The reaction chamber is further equipped with a surface finishing unit, a heating unit and a dynamics generating unit. The reaction is through decomposition of silicon-containing gas in densely stacked high purity granular silicon layer reaction bed in relative motion, and to use remaining heat of exhaust gas for reheating. The present invention achieves a large scale, efficient, energy saving, continuous, low cost production of high purity silicon granules.
    Type: Application
    Filed: August 17, 2013
    Publication date: December 19, 2013
    Inventor: Xi Chu
  • Publication number: 20130337236
    Abstract: A method for growing elongated nanostructures (7) only on the bottom (3) of a recessed structure (4), the method comprising: a. providing a substrate (5) comprising said recessed structure (4), said recessed structure (4) comprising: said bottom (3), and at least one sidewall (6), b. modifying the chemical nature of the surface of said at least one sidewall (6) so that said at least one sidewall (6) has a lower affinity than said bottom (3) for a catalyst film (2), c. providing said catalyst film (2) onto said bottom (3), d. thermally and/or plasma treating said film (2) so as to form said catalyst nanoparticles (1), and e. growing elongated nanostructures (7) in said recessed structure (4) using the catalyst nanoparticles (1).
    Type: Application
    Filed: June 14, 2013
    Publication date: December 19, 2013
    Inventors: Daire J. Cott, Silvia Armini
  • Patent number: 8609199
    Abstract: In the growth of carbon nanotubes, the aggregation of catalytic fine particles therefor is a problem. In order to realize the growth of carbon nanotubes into a high density, the carbon nanotube growing process includes a first plasma treatment step of treating a surface having catalytic fine particles with a plasma species generated from a gas which contains at least hydrogen or a rare gas without carbon element, a second plasma treatment step of forming a carbon layer on the surface of the catalytic fine particles by a plasma generated from a gas which contains at least a hydrocarbon after the first plasma treatment step, and a carbon nanotube growing step of growing carbon nanotubes by use of a plasma generated from a gas which contains at least a hydrocarbon after the second plasma treatment step.
    Type: Grant
    Filed: January 19, 2010
    Date of Patent: December 17, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yuichi Yamazaki, Tadashi Sakai, Naoshi Sakuma, Masayuki Katagiri, Mariko Suzuki, Shintaro Sato
  • Publication number: 20130327564
    Abstract: A circuit board and a manufacturing method thereof are provided. According to the method, a dielectric layer is formed on a dielectric substrate, and the dielectric layer contains active particles. A surface treatment is performed on a surface of the dielectric first conductive layer is formed on the activated surface of the dielectric layer. A conductive via is formed in the dielectric substrate and the dielectric layer. A patterned mask layer is formed on the first conductive layer, in which the patterned mask layer exposes the conductive via and a part of the first conductive layer. A second conductive layer is formed on the first conductive layer and conductive via exposed by the patterned mask layer. The patterned mask layer and the first conductive layer below the patterned mask layer are removed.
    Type: Application
    Filed: August 9, 2012
    Publication date: December 12, 2013
    Applicant: UNIMICRON TECHNOLOGY CORP.
    Inventors: Cheng-Po Yu, Shang-Feng Huang, Chang-Ming Lee, Young-Sheng Bai
  • Publication number: 20130330545
    Abstract: A method for producing a pressure-sensitive adhesive layer-carrying optical film includes the step of applying, over the optical film, a coating liquid for anchor layer comprising a mixed solvent comprising 10 to 100% by weight of water and 90 to 0% by weight of an alcohol, and a polyoxyalkylene-group-containing polymer so as to give an applied-coat thickness before drying of 20 ?m or less; and next drying the workpiece under drying conditions satisfying both of the following requirements (1) and (2): (1) the drying temperature T is from 40 to 70° C., and (2) a value obtained by multiplying the drying temperature T (° C.) by the drying period H (seconds), T×H, satisfies: 400?(T×H)?4000, thereby removing the mixed solvent to form the anchor layer.
    Type: Application
    Filed: June 7, 2013
    Publication date: December 12, 2013
    Inventors: Yuusuke Toyama, Masakuni Fujita, Atsushi Yasui, Tomoyuki Kimura
  • Publication number: 20130319924
    Abstract: A membrane distillation system is provided for distilling liquids. The membrane distillation system includes a heat generating means for heating a non-distilled liquid. The membrane distillation system further includes a microporous membrane that is asymmetric and vapor permeable. The microporous membrane includes a hydrophilic layer and a hydrophobic layer. The membrane distillation system further includes a supply means for delivering the heated non-distilled liquid to the hydrophilic layer of the microporous membrane. A collection means is further provided for collecting distilled liquid from the hydrophobic layer of the microporous membrane. A method of fabricating the microporous membrane for use in the membrane distillation system is also provided.
    Type: Application
    Filed: June 5, 2012
    Publication date: December 5, 2013
    Applicant: General Electric Company
    Inventors: Yit-Hong Tee, Vishal Bansal, Christopher Keller
  • Publication number: 20130321922
    Abstract: The disclosure is directed to a coating consisting of a binary metal fluoride coating consisting a high refractive index metal fluoride layer on top of a substrate, a low refractive index metal fluoride layer on top of the high refractive index layer and layer of SiO2 or F—SiO2 containing 0.2 wt % to 4.5 (2000 ppm to 45,000 ppm) F on top of the low refractive index layer. In one embodiment the F content of F—SiO2 is in the range of 5000 ppm to 10,000 ppm F. The high index and low index materials are each deposited to a thickness of less than or equal to 0.9 quarter wave, and the capping material is deposited to a thickness in the range of 5 nm to 25 nm. The disclosure is also directed to optical elements having the foregoing coating and a method of making the coating.
    Type: Application
    Filed: March 15, 2013
    Publication date: December 5, 2013
    Applicant: Corning Incorporated
    Inventors: Michael Jerome Cangemi, Paul Gerard Dewa, Joseph D. Malach, Paul Francis Michaloski, Horst Schreiber, Jue Wang
  • Publication number: 20130316071
    Abstract: Implementations described and claimed herein provide systems and methods for adding a chosen functional coating on an optical surface of a spectacle lens. In one implementation, it is determined if identified features of the optical surface of the spectacle lens are compatible with the chosen functional coating according to a first set of rules. The features of the optical surface are identified based on an analysis of a quality of the optical surface. Manufacturing information for the chosen functional coating is generated based on the determined compatibility. The manufacturing information includes information for depositing the chosen functional coating on the optical surface where the identified features are compatible with the chosen functional coating and on a modified optical surface where the identified features are not compatible with the chosen functional coating.
    Type: Application
    Filed: May 24, 2013
    Publication date: November 28, 2013
    Applicant: Essilor International (Compagnie Generale d'Optique)
    Inventors: Frederic Arrouy, Philip Miller
  • Patent number: 8592606
    Abstract: The present invention is related to a family of liquid group 4 precursors represented by the formula: (pyr*)M(OR1)(OR2)(OR3) wherein pyr* is an alkyl substituted pyrrolyl, wherein M is group 4 metals include Ti, Zr, and Hf; wherein R1-3 can be same or different and selected from group consisting of linear or branched C1-6 alkyls; preferably C1-3 alkyls; R4 is selected from the group consisting of C1-6 alkyls, preferably branched C3-5 alkyls substituted at 2, 5 positions to prevent the pyrrolyl coordinated to the metal center in ?1 fashion; n=2, 3, 4. Most preferably the invention is directed to (2,5-di-tert-butylpyrrolyl)(tris(ethoxy)titanium, (2,5-di-tert-amylpyrrolyl)(tris(ethoxy)titanium, and (2,5-di-tert-amylpyrrolyl)(tris(iso-propoxy)titanium. The invention is also directed to (cyclopentadienyl)(2,5-di-methylpyrrolyl)(bis(ethoxy))titanium. Deposition methods using these compounds are also contemplated.
    Type: Grant
    Filed: November 19, 2010
    Date of Patent: November 26, 2013
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Xinjian Lei, John Anthony Thomas Norman, Daniel P. Spence
  • Patent number: 8592003
    Abstract: The present invention relates to a method for the preparation of a novel hybrid electrochromic coating material with superior performance in terms of transparency, electrochromic contrast, coloration efficiency, and adhesion, for a use in electrochromic devices for applications where a high transparency is required in the bleached state.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: November 26, 2013
    Assignees: Fraunhofer-Gesellschaft zur forderung der angewandten Forschung e.V., Universita Degli Studi di Milano-Bicocca
    Inventors: Ayse Cochet, Uwe Posset, Gerhard Schottner, Giorgio Pagani, Ricardo Ruffo, Luca Beverina, Claudio Maria Mari, Giorgio Patriarca, Alessandro Abbotto
  • Patent number: 8592015
    Abstract: In order to improve the emptying of residual contents from containers, such as pharmaceutical packaging, the invention provides corresponding substrates with a hydrophobic coating. Provided for this purpose is a composite material which comprises a substrate and a coating deposited on it, which forms at least a part of the surface of the coated substrate, with the coating having a compound containing the elements C, O, and H, with further elements, apart from Si, C, H, having a content of less than 10 at %, preferably less than 5 at %, characterized in that this compound has a composition SiOxCyHz, in which x is at most 1.2.
    Type: Grant
    Filed: December 12, 2007
    Date of Patent: November 26, 2013
    Assignee: Schott AG
    Inventors: Matthias Bicker, Hartmut Bauch, Andreas Hahn, Stefan Bauer, Manfred Lohmeyer, Robert Hormes
  • Publication number: 20130309450
    Abstract: Provided are methods for preparing a mold for making a superhydrophobic surface, comprising contacting a surface of a thermoplastic material with a plasma; coating the surface with a metal; and heating the thermoplastic material to shrink the surface such that the coated metal forms a texture. Also provided are methods of preparing a superhydrophobic surface, as well as a superhydrophobic surface that includes a hydrophilic portion prepared by plasma treatment.
    Type: Application
    Filed: May 9, 2013
    Publication date: November 21, 2013
    Inventors: Michelle Khine, Lauren Freschauf, Jolie McLane
  • Publication number: 20130309505
    Abstract: A multi-layered film, a backsheet for photovoltaic modules, a method of manufacturing the same, and a photovoltaic module are provided. The multi-layered film having excellent reliability and adhesive strength under high heat/moisture conditions and also showing excellent weather resistance and durability may be provided by forming a primer layer including an oxazoline group-containing polymer on a substrate and forming a resin layer including a fluorine-based polymer on the primer layer. The primer layer and resin layer of the multi-layered film may be manufactured at a low cost under a low drying temperature using a solvent having a low boiling point, so that the manufacturing costs can be reduced and the quality of the product can be prevented from being deteriorated by thermal deformation or thermal shock.
    Type: Application
    Filed: July 24, 2013
    Publication date: November 21, 2013
    Applicant: LG CHEM, LTD.
    Inventors: Hyun Cheol KIM, Yoon Kyung Kwon
  • Publication number: 20130302531
    Abstract: A flow field plate for fuel cell applications includes a metal with a non-crystalline carbon layer disposed over at least a portion of the metal plate. The non-crystalline carbon layer includes an activated surface which is hydrophilic. Moreover, the flow field plate is included in a fuel cell with a minimal increase in contact resistance. Methods for forming the flow field plates are also provided.
    Type: Application
    Filed: July 17, 2013
    Publication date: November 14, 2013
    Inventors: Gayatri Vyas DADHEECH, Thomas A. TRABOLD, Youssef M. MIKHAIL, Mahmoud H. ABD ELHAMID
  • Patent number: 8574435
    Abstract: Disclosed herein is an advanced treatment system processing contaminated water or fouled water/waste water, and particularly, a system for membrane fouling control and reduction in the amount of sludge producing in a membrane combined-type fouled water/waste water advanced treatment system, and more particularly, a system capable of making sludge soluble using plasma and then re-utilizing cell byproducts of destructed sludge as a supply source of external carbon source, and possibly capable of removing a cake layer formed on a membrane using each kind of radical and ozone generated by plasma.
    Type: Grant
    Filed: November 22, 2010
    Date of Patent: November 5, 2013
    Assignees: Hoseo University Academic Cooperation Foundation, Kumkang Environmental Engineering Co., Ltd.
    Inventors: In Soung Chang, Ji Sun Lee, Seun Young Joung, Cheol Ku Lee
  • Publication number: 20130284245
    Abstract: A multi-layered film, a backsheet for photovoltaic modules, a method of manufacturing the same, and a photovoltaic module are provided. The multi-layered film can be configured so that a resin layer including a fluorine-based polymer and an oxazoline group-containing polymer is formed on a substrate. As a result, the resin layer including the fluorine-based polymer can have excellent durability and weather resistance, and show high interfacial adhesive strength to the substrate. During the preparation of the multi-layered film, a drying process can also be performed at a relatively low temperature, so that the manufacturing costs can be reduced and the quality of the product can be prevented from being deteriorated by thermal deformation or thermal shock. The multi-layered film may be effectively used as the backsheet in a variety of photovoltaic modules.
    Type: Application
    Filed: June 26, 2013
    Publication date: October 31, 2013
    Inventors: Hyun Cheol KIM, Yoon Kyung Kwon
  • Publication number: 20130286609
    Abstract: Systems and methods for shielding circuitry from interference with conformal coating are disclosed. Systems having conformal EMI shields according to embodiments are provided by applying insulating and conductive layers to areas of a printed circuit board (PCB). This produces systems that may be thinner and also smaller in surface area, and that may be suitable as part of electronic devices.
    Type: Application
    Filed: April 30, 2012
    Publication date: October 31, 2013
    Applicant: APPLE INC.
    Inventor: Nicholas Merz
  • Publication number: 20130280485
    Abstract: Described herein are methods of preparing superhydrophobic and oleophobic surfaces by grafting poly(perfluoroalkyl acrylate) chains on silicon substrates with initiated chemical vapor deposition. The grafting enhances the formation of the crystalline phase. The crystalline structures reduce the polymer chain mobility, resulting in nonwetting surfaces with respect to both water and mineral oil.
    Type: Application
    Filed: March 5, 2013
    Publication date: October 24, 2013
    Applicant: Massachusetts Institute of Technology
    Inventors: Anna Maria Coclite, Karen K. Gleason, Yujun Shi
  • Publication number: 20130280438
    Abstract: A method for producing a polarizing film includes a step (1) of preparing a lyotropic liquid crystalline solution having electric conductivity of not more than 50 ?S/cm (expressed in terms of 0.05% by weight) and containing a dichroic dye and a solvent, a step (2) of preparing a base material having at least one surface subjected to a hydrophilization treatment, and a step (3) of coating the solution prepared in the step (1) on the hydrophilized surface of the base material prepared in the step (2) at a coating rate of not less than 100 mm/second, and drying the solution. The polarizing film produced in the method has a dichroic ratio of 25 or more at a wavelength of 600 nm.
    Type: Application
    Filed: June 25, 2013
    Publication date: October 24, 2013
    Inventors: Yasuko Iwakawa, Shuusaku Nakano, Tetsuo Inoue, Shouichi Matsuda