Abstract: The invention provides methods of immobilizing an active agent to a substrate surface, including the steps of, depositing a primer compound on a substrate, thereby forming a primed substrate, contacting the primed substrate with a solution of a compound including a trihydroxyphenyl group, thereby forming a trihydroxyphenyl-treated primed substrate, and contacting the trihydroxyphenyl-treated primed substrate with a solution of an active agent, thereby immobilizing the active agent on the substrate. Further provided are methods of immobilizing an active agent on a substrate, including the steps of providing a substrate, combining a solution of a compound including a trihydroxyphenyl group with a solution of an active agent, thereby forming a solution of an active agent-trihydroxyphenyl conjugate, and contacting the primed substrate with the solution of the active agent-trihydroxyphenyl conjugate, thereby immobilizing the active agent on the substrate.

Abstract: A pretreatment method is performed before a graphene grows by performing a CVD method on a catalyst metal layer formed on a workpiece. The method includes a plasma treatment process in which the catalyst metal layer is activated by applying plasma of a treatment gas including a reducing gas and a nitrogen-containing gas on the catalyst metal layer.

Abstract: Functionalized multilayer structures are manufactured by a process whereby a substrate material is treated with a reactive-gas plasma to form an activated layer on the surface thereof, and then by depositing a liquid functional monomer on the activated layer to form a self-assembled functional layer. Any excess liquid monomer must be allowed to re-evaporate in order to obtain optimal functionality on the surface of the resulting structure. The deposition of the liquid layer is preferably carried out with high kinetic energy to ensure complete penetration of the monomer throughout the body of the substrate. For particular applications, prior to formation of the reactive layer the substrate may be coated with a high glass-transition temperature polymer or a metallic layer.

Abstract: Provided is a transparent carbon nanotube (CNT) electrode comprising a net-like (i.e., net-shaped) CNT thin film and a method for preparing the same. More specifically, a transparent CNT electrode comprises a transparent substrate and a net-shaped CNT thin film formed on the transparent substrate, and a method for preparing a transparent CNT electrode, comprising forming a thin film using particulate materials and CNTs, and then removing the particulate materials to form a net-shaped CNT thin film. The transparent CNT electrode exhibits excellent electrical conductivity while maintaining high light transmittance. Therefore, the transparent CNT electrode can be widely used to fabricate a variety of electronic devices, including image sensors, solar cells, liquid crystal displays, organic electroluminescence (EL) displays, and touch screen panels, that have need of electrodes possessing both light transmission properties and conductive properties.

Abstract: A method providing for the replacement of the traditional release layer of transfer foils uses a plasma treatment to chemically modify the foil side surface of a PET substrate of the transfer foils. The chemically modified surface of the PET substrate provides the necessary low surface energy and release characteristics to allow for the controlled release of the foil from the PET carrier film. Accordingly, plasma treated transfer foils can be made without a release layer.

Abstract: Systems and methods deposit a film on a substrate by introducing a precursor gas into a reaction volume of a processing chamber. A substrate is arranged in the reaction volume. After a predetermined soak period, the precursor gas is purged from the reaction volume. The substrate is exposed with plasma gas using a remote plasma source.

Abstract: Provided are a method of manufacturing a substrate for chip packages and a method of manufacturing a chip package, the method of manufacturing the substrate including: forming a lower adhesive layer in a lower part of an insulation film; forming an upper adhesive layer in an upper part of the insulation film to form a base material; forming via holes in the base material; and forming a circuit pattern layer on the upper adhesive layer, so it is effective to improve adhesion power between the molding resin and the insulation film at the time of manufacturing a chip package later.

Abstract: A substrate support apparatus for a plasma processing system includes a layer of dielectric material having a top surface and a bottom surface. The top surface is defined to support a substrate in exposure to a plasma. The substrate support apparatus also includes a number of optical fibers each having a first end and a second end. The first end of each optical fiber is defined to receive photons from a photon source. The second end of each optical fiber is oriented to project photons received from the photon source onto the bottom surface of the layer of dielectric material.

Abstract: Methods of forming dielectric layers on a copper substrate are disclosed herein. In one embodiment, a method of depositing a dielectric layer can include positioning a copper substrate in a process chamber, forming and delivering the cleaning plasma to the substrate to form a cleaned surface on the substrate, forming and delivering the adhesion plasma to the surface of the substrate to form a copper compound thereon and depositing a dielectric layer over the copper compound. In another embodiment, a method of depositing a dielectric layer can include positioning a copper substrate in a process chamber, delivering an adhesion plasma to the copper substrate to form a copper compound and flowing a deposition gas into the process chamber to deposit a dielectric layer over the copper compound, wherein the flow between the adhesion plasma and the deposition gas is continuous.

Abstract: According to certain techniques, a system for coating a substrate includes a preparation component, a coating component, and a curing component. The preparation component includes a plasma applicator that irradiates the substrate with plasma to form a prepared substrate. The coating component coats the prepared substrate with a coating medium to form a coated substrate. The coating component includes a coating head that receives the coating medium from a reservoir and applies the coating medium to the prepared substrate to form the coated substrate. The coating component includes a vacuum that removes an excess amount of the coating medium from the coated substrate. The curing component includes at least one ultraviolet emitter and irradiates the coated substrate with ultraviolet energy to form a cured substrate.

Abstract: In a method for manufacturing an electronic component, when conductive paste used to form outer electrodes is applied to a component body, a side surface of the component body is subjected to an affinity-reducing process to reduce an affinity for solvent, and then an end surface of the component body is dipped into the conductive paste. Accordingly, spreading of the conductive paste stops at ridge portions of the component body, and the conductive paste is applied to a large thickness. After that, the end surface of the component body is dipped deeper into the conductive paste. Also in this step, the affinity-reducing process prevents upward spreading of the conductive paste along the side surface.

Abstract: The invention relates to methods of gas detonation deposition (gas detonation explosion) applying coatings, especially layers of materials for electrochemical devices for use as electrodes in electrochemical energy generation and storage devices such as batteries, supercapacitors, photovoltaic cells, and the like. In the method of the gas detonation deposition the powders of the materials, which are deposited, are subjected to detonation with the explosion products flow. As a result, the powder particles gain a high kinetic energy and are deposited on a substrate, forming a high quality coating.

Abstract: Provided is nano thermoelectric powder with a core-shell structure. Specifically, the nano thermoelectric powder of the core-shell structure of the present invention forms coating layer on the surface of nano powder prior to sintering of the nano powder. An advantage of some aspects of the present invention is that it provides thermoelectric elements having reduced thermal conductivity and enhanced thermoelectric efficiency without affecting electrical conductivity using the nano thermoelectric powder with the core-shell structure.

Abstract: The invention relates to a process for obtaining a hydrophobic coating on a substrate, preferably consisting of a glass material, a ceramic or a glass-ceramic, said process being characterized in that it comprises: a) a first deposition step, consisting in applying a primer first layer essentially consisting of the silicon oxycarbide SiOxCy type on said substrate, said primer layer having an RMS surface roughness of greater than 4 nm; b) an activation step, in which said SiOxCy primer layer is activated by a plasma of a gas chosen from the noble gases of the Ar or He type and the gases N2, O2 or H2O or by a plasma of a mixture of these gases; and c) a second deposition step, in which a hydrophobic coating comprising at least one fluorocompound, preferably a fluoroalkylsilane, is deposited on said first layer. The invention also relates to hydrophobic glazing comprising or formed by a substrate as defined above, this glazing being in particular used as glazing for transport vehicles or for buildings.

Abstract: Methods and apparatus for processing using a remote plasma source are disclosed. The apparatus includes an outer chamber, a remote plasma source, and a showerhead. Inert gas ports within the showerhead assembly can be used to alter the concentration and energy of reactive radical or reactive neutral species generated by the remote plasma source in different regions of the showerhead. This allows the showerhead to be used to apply a surface treatment to different regions of the surface of a substrate. Varying parameters such as the remote plasma parameters, the inert gas flows, pressure, and the like allow different regions of the substrate to be treated in a combinatorial manner.

Abstract: Methods and apparatuses for combinatorial processing are disclosed. Methods include introducing a substrate into a processing chamber. Methods further include forming a first film on a surface of a first site-isolated region on the substrate and forming a second film on a surface of a second site-isolated region on the substrate. The methods further include exposing the first film to a plasma having a first source gas to form a first treated film on the substrate and exposing the second film to a plasma having a second source gas to form a second treated film on the substrate without etching the first treated film in the processing chamber. In addition, methods include evaluating results of the treated films post processing.

Abstract: Provided are processes for the low temperature deposition of silicon-containing films using activated SiH-containing precursors. The SiH-containing precursors may have reactive functionality such as halogen or cyano moieties. Described are processes in which halogenated or cyanated silanes are used to deposit SiN films. Plasma processing conditions can be used to adjust the carbon, hydrogen and/or nitrogen content of the films.

Abstract: A method for grafting a porous element for leucodepletion by adsorption and/or filtration of a biological fluid, such as blood or a blood component, which method comprises the steps of impregnating the porous element with a solution containing a poly(ethylene oxide) having identical or different functional end groups; and applying an ionizing treatment to the impregnated porous element so as to ensure covalent cross-linking between the poly(ethylene oxide) and the porous element.

Abstract: An aspect of the present embodiment, there is provided a gas supply member includes a body, and a gas supply path penetrating into the body, the gas supply path including a first channel at an inlet side and a second channel connected to the first channel at an outlet side, the first channel having a first diameter and a diameter of the second channel being monotonically increased towards the outlet side from the first diameter to a second diameter, wherein an alumina film is provided on a first sidewall of the first channel, an yttrium-containing film is provided on a second sidewall of the second channel and a surface of the body at the outlet side.

Abstract: An atomic layer deposition method for forming metal films on a substrate comprises a deposition cycle including: a) contacting a substrate with a vapor of a metal-containing compound described by formula 1 for a first predetermined pulse time to form a first modified surface: MLn ??(1) wherein: n is 1 to 8; M is a transition metal; L is a ligand; b) contacting the first modified surface with an acid for a second predetermined pulse time to form a second modified surface; and c) contacting the second modified surface with a reducing agent for a third predetermined pulse time to form a metal layer.

Abstract: The pretreatment method for carbon nanotube formation according to the present invention comprises a first plasma treatment process in which catalytic metal fine particles are formed by applying plasma to a catalytic metal layer and atomizing the catalytic metal, and a second plasma treatment process in which the catalytic metal fine particles are activated by applying plasma of a gas mixture, in which a hydrogen-containing gas and a nitrogen gas are mixed, to the catalytic metal fine particles. A co-catalyst layer formed of nitride such as TiN and TaN is preferably disposed below the catalytic metal layer. The co-catalyst layer is nitrated by the plasma of the gas mixture including the hydrogen-containing gas and the nitrogen gas and the activation ratio of the catalytic metal fine particles is increased.

Abstract: An apparatus for applying segmented ceramic coatings includes means for supporting and moving one or more substrates; one or more heat sources disposed proximate to one or more substrates, wherein at least one of the heat sources is positioned to apply a heat stream to pre-heat a thermal gradient zone on a surface of a substrate; a material deposition device disposed proximate to one or more heat sources, wherein the material deposition device is positioned to deposit a material on a deposition area located behind the thermal gradient zone on the surface; and means for monitoring a surface temperature of one or more substrates.

Abstract: [Problem] An object is to provide a magnetic recording medium with improved HDI characteristics, such as impact resistance, and its manufacturing method. [Solution] A typical structure of a magnetic recording medium 100 according to the present invention includes, on a base, at least a magnetic recording layer 122, a protective layer 126, and a lubricating layer 128, wherein the magnetic recording layer 122 includes, in an in-plane direction, a magnetic recording part 136 configured of a magnetic material and a non-recording part 134 magnetically separating the magnetic recording part 136, and a surface corresponding to the non-recording part 134 protuberates more than a surface corresponding to the magnetic recording part 136.

Abstract: A method for producing, by means of plasma, nanostructured thin layers particularly of the hierarchically organized type, and an apparatus for implementing the method, are described. At least a first chamber (10) is provide in which are present an injector (14) of a reagent gas, means (31, 31?) for feeding inert gases, and an antenna (16) for the creation of a plasma in said first chamber. Enclosing said first chamber is a second chamber (11) to which a pumping system is connected, containing a housing for the substrate (35) on which the nanostructured film is produced. A wall (12) separates said first chamber from said second chamber and has at least one opening (13). The injector and antenna are arranged in the first chamber with a geometry such that the distance between the outlet of said injector is at a distance of no more than 5 cm from the plane of the surface of said antenna farther from said wall, and said surface is at a distance of no more than 5 cm from said opening.

Abstract: One object is to provide a structure including a thin primer film formed by a dry process and tightly bound to a fluorine-containing silane coupling agent. In accordance with one aspect, a structure according to an embodiment of the present disclosure includes: a substrate; and a thin primer film containing at least one substance selected from the group consisting of silicon, titanium, aluminum, aluminum oxide, and zirconium and formed on a surface of the substrate by a dry process.

Abstract: Provided are a multi-layered film, a backsheet for a photovoltaic cell, a method of forming the same and a photovoltaic module. The multi-layered film may include a primer layer and a fluoropolymer coating layer formed by coating, and thus the fluoropolymer coating layer, which is a surface layer, may have excellent durability and weather resistance due to an inter-diffusion effect between materials in the respective layers, and a high interface adhesive strength with a substrate and the primer layer. In addition, in the preparation of the multi-layered film, a production cost may be reduced, productivity may be increased, and degradation in quality of a product caused by thermal transformation or heat shock may be prevented. The multi-layered film may be effectively used as a backsheet for various photovoltaic modules.

Abstract: A gas separation membrane, containing: a support; and a separating layer formed on the support, the separating layer containing a resin; the separating layer containing, at the side thereof opposite to the support, a hydrophilic modification treatment surface, the hydrophilic modification treatment surface involved in a layer having a film thickness of 0.1 ?m or less, and the hydrophilic modification treatment surface provided with a surface contact angle measured by using water thereon in the range of 60 degrees or less.

Abstract: Some embodiments relate to a method of processing a workpiece. The workpiece includes a first surface region having a first wettability coefficient, and a second surface region having a second wettability coefficient that differs from the first wettability coefficient. A liquid, which corresponds to an optical structure, is dispensed on the first and second surface regions of the workpiece, wherein the liquid self-aligns to the second surface region due to the difference between the first and second wettability coefficients. The self-aligned liquid is hardened to form the optical structure.

Abstract: The invention relates to a method for producing a printing plate for waterless offset printing. A method for producing a printing plate for waterless offset printing is proposed, having the following method steps:-providing a substrate;-applying an ink onto the substrate using an inkjet printing technique; and-fixing the applied ink on the substrate. The method is characterized in that the substrate has a surface tension of >35 mN/m, preferably >38 mN/m, and the ink has a surface tension of <30 mN/m, preferably <25 mN/m, when fixed on the substrate. The ink is applied into substrate regions which should not have printing ink during the offset printing process.

Abstract: The invention relates to a container (1) for holding fluid or particle compositions which container (1) comprises an inner lining (6) applied to an inner side (2) of the container (1), where the container (1) is provided with an inner lining (6) of a peel-able coating. The peel-able coating can be applied as water based, as Acetone based emulsion or as UV curable lacquer. The invention relates further to a method of manufacturing such a container (1), where the lining (6) is applied to the container (1) by following process steps:—Applying a peel-able coating to the inner side of the container (1):—Curing and/or drying the peel-able coating by heating, blowing or radiating by UV-light. Further the invention relates to the use of a peel-able coating as an inner lining (6) in a container (1) for fluid materials, such as paint or other materials able to leave residues on or in the container.

Abstract: A method and apparatus for acquiring a nanostructured coating on a metal surface by using an intense shock wave generated by continuous explosion of a laser-induced plasma is provided. The method comprises: irradiating a laser beam on a black paint surface of an upper opening of a high pressure resistant glass pipe having a black paint strip arranged therein; the black paint absorbing the light energy and producing a plasma; generating an initial plasma explosion shock wave; transmitting the initial plasma explosion shock wave in the high pressure resistant glass pipe; generating a plasma cloud reaching a lower opening of a glass catheter; and, the shock wave pressure outputted embedding nanoparticles into a surface of a workpiece. The apparatus comprises the high pressure-resistant glass pipe with a zigzagging switchback shape or a spiral and inverted cone shape.

Abstract: Apparatuses are provided for controlling flow conductance of plasma formed in a plasma processing apparatus that includes an upper electrode opposite a lower electrode to form a gap therebetween. The lower electrode is adapted to support a substrate and coupled to a RF power supply. Process gas injected into the gap is excited into the plasma state during operation. The apparatus includes a ground ring that concentrically surrounds the lower electrode and has a set of slots formed therein, and a mechanism for controlling gas flow through the slots.

Abstract: The present invention relates to a membrane that includes a porous polymer material made of a polyimide with interconnected macropores and impregnated with protic ionic liquid conductors (CLIP), as well as to the method for manufacturing same and to the uses thereof. The membranes of the invention fulfil the need for membranes including CLIPs, which have good proton-conducting properties as well as good physical properties, in particular high thermal and mechanical stability, in addition to a wide range of electrochemical stability.

Abstract: A method for selectively removing portions of a protective coating from a substrate, such as an electronic device, includes removing portions of the protective coating from the substrate. The removal process may include cutting the protective coating at specific locations, then removing desired portions of the protective coating from the substrate, or it may include ablating the portions of the protective coating that are to be removed. Coating and removal systems are also disclosed.

Abstract: The present invention provides an advantageous method for producing a coating (3) increasing the coefficient of friction on a surface (5) of an element (6), wherein the method comprises the following steps: a) activating of hard particles (1) partially or completely covered by a bonding agent (2) in a non-thermal plasma (low-temperature plasma) at atmospheric pressure; and b) producing a layer (3) increasing the coefficient of friction on a surface (5) of the element (6) by depositing the hard particles (1), which are activated by the non-thermal atmospheric pressure plasma and which are coated with the bonding agent onto the surface (5) of the element (6). Specifically, for elements having a complicated shape or having a big size, this method is more efficient than known methods. No matrix or intermediate layers are necessary to fix the hard particles. The anchoring of the hard particles takes place directly in the joining surfaces themselves.

Abstract: A protective layer can be deposited on a surface of an porous polymer separator placing on a Li-metal electrode to protect against adverse electrochemical activity in a battery. The protective layer can be a multilayered structure including graphene oxide.

Abstract: The invention is a method for producing a porous coating on a glass surface, wherein an aqueous potassium silicate solution is applied to the glass surface and a porous silicate coating is formed on said glass surface. The pH of the potassium silicate solution is controlled and the formation of the silicate coating is carried out in a process atmosphere of which the relative humidity is controlled.

Abstract: Methods of reducing tack of edge faces of a roll of an adhesive coated substrate. The method includes reducing tack of the edge faces by subjecting the edge faces to a radiation source with radiant output at a wavelength of less than 200 nanometers.

Abstract: Disclosed are methods for forming a graphene pattern. The method includes forming a fine pattern defined by at least one trench on a substrate, applying a graphene solution on the fine pattern, and selectively forming a graphene layer on the fine pattern contacting the graphene solution.

Abstract: The metal part is one where a carboxyl group or an amino group, or a hydroxyl group is imparted onto the surface. On the other hand, the resin part is one into which an adhesiveness modifier containing an epoxy group is blended. A process for producing a composite of metal and resin, wherein the metal part and the resin part are bonded by interaction of the carboxyl group or the amino group, or the hydroxyl group with the epoxy group.

Abstract: One variation may include a method including providing a substrate having a layer comprising chrome thereon, the chrome having exposed surface; exposing the layer comprising chrome to a gas comprising ionized oxygen to activate the exposed surface of the chrome to provide an activated surface; applying a coating over the activated surface so that the coating is adhered to the layer comprising chrome, and wherein the coating is at least one of a primer, clear coat, tinted clear coat or opaque paint.

Abstract: The embodiments fill the need to enhance electro-migration performance, provide lower metal resistivity, and improve silicon-to-metal interfacial adhesion for copper interconnects by providing improved processes and systems that produce a silicon-to-metal interface. An exemplary method of preparing a substrate surface of a substrate to selectively deposit a layer of a metal on a silicon or polysilicon surface of the substrate to form a metal silicide in an integrated system is provided.

Abstract: Provided is a process by which an electret material having excellent thermal resistance of charge retentivity can be obtained. The process for producing an electret material of the invention includes an irradiation step, a formation step, and a charging step. In the irradiation step, a dispersion containing fine polytetrafluoroethylene particles is irradiated with ? rays. In the formation step, the dispersion which has been irradiated with ? rays is applied to an electrode plate and then dried, and the fine polytetrafluoroethylene particles are sintered to form a polytetrafluoroethylene layer on the electrode plate. In the charging step, the surface of the polytetrafluoroethylene layer is subjected to a charging treatment.

Abstract: Method for increasing the adhesive power of a pressure-sensitive adhesive layer having an upper and a lower surface, wherein at least one surface of the pressure-sensitive adhesive layer is subjected to a physical process, said physical process being selected from among the group comprising corona discharge, dielectric barrier discharge, preliminary flame treatment, or plasma treatment.

Abstract: Provided are a gas barrier film that is simply and economically manufactured, and has high hardness and strength, excellent gas blocking properties, controllable refraction index and transparency, and a compositionally gradient structure, and a method of producing the same. The gas barrier film includes a base material; and an organic/inorganic hybrid gas barrier layer that is formed on the base material and has a composition-gradient structure. The organic/inorganic hybrid gas barrier layer has a network structure having —O—Si—O— linkages. The network structure contains an organic functional group having a carbon atom directly linked to a silicon atom of the —O—Si—O— linkages, and other element that exists in an oxide form in the interstitial location of the network structure or that is linked to an oxygen atom of the —O—Si—O— linkages, wherein the other element comprises at least one selected from alkali metal, alkaline earth metal, transition metal, post transition metal, metalloid, boron, and phosphorous.

Abstract: An apparatus and method of coating and/or lining of the interior of pipes and tubular goods with a performance enhancing layer of metal alloy using a 360° radiant heat source. The use of the disclosed apparatus and methods facilitates the capability to metallurgically bond a layer of metal alloy or composite material to the interior of a steel pipe or similar metal based tubular good with a primary diameter ranging typically from 1.5? to 8?. The disclosed apparatus and methods are especially useful to produce piping used in the conveyance and/or transportation of hot, corrosive and/or abrasive fluids in the oil and gas, and mining Industries.

Abstract: A transparent porous SiO2-coating for a transparent substrate material has improved optical properties. These properties can be obtained, in particular, by plasma treatment.

Abstract: Disclosed is nanocoupling of a polymer onto a surface of a metal substrate for improving coating adhesion of the polymer on the metal substrate, and in vivo stability and durability of the polymer. In accordance with the present invention, the polymers can be grafted via a chemical bonding on the surface of the metal substrate by the nanocoupling, by which adhesion, biocompatibility and durability of a polymer-coated layer which is to be formed later on the metal substrate were remarkably improved; therefore, the nanocoupling according to the present invention can be applied to surface modification of a metal implant, such as stents, mechanical valves, and an articular, a spinal, a dental and an orthopedic implants.

Abstract: The disclosure provides a graphene electrode, an energy storage device employing the same, and a method for fabricating the same. The graphene electrode includes a metal foil, a non-doped graphene layer, and a hetero-atom doped graphene layer. Particularly, the hetero-atom doped graphene layer is separated from the metal foil by the non-doped graphene layer.

Abstract: An encapsulation material is described that prevents moisture or oily substances from penetrating into a protected region or device. The encapsulation material includes alternating layers of a hydrophobic and oleophobic first layer and a hydrophilic second layer. The second hydrophilic layer traps water molecules, preventing them from migrating. By alternating hydrophobic/oleophobic layers with hydrophilic layers (including hydrophobic layers having a thickness of approximately that of a water molecule or a hydroxyl ion), the encapsulation material forms multiple, finite energetic wells at the hydrophilic layers. These potential wells confine water molecules, oxygen molecules, and hydroxyl ions preventing migration of through the encapsulation material.