Abstract: The present invention relates to planarization materials and methods of using the same for substrate planarization in photolithography. A planarization layer of a planarization composition is formed on a substrate. The planarization composition contains at least one aromatic monomer and at least one non-aromatic monomer. A substantially flat surface is brought into contact with the planarization layer. The planarization layer is cured by exposing to a first radiation or by baking. The substantially flat surface is then removed. A photoresist layer is formed on the planarization layer. The photoresist layer is exposed to a second radiation followed by development to form a relief image in the photoresist layer. The relief image is then transferred into the substrate.

Abstract: Disclosed is a blue resin composition for a color filter that includes a colorant including an azaporphyrin-based dye and a blue pigment, an acrylic-based binder resin, a reactive unsaturated compound, a polymerization initiator, and a solvent.

Abstract: Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Abstract: A photosensitive resin composition which includes (A) a cyclic olefin; (B) at least either one of a monomer having a cyclic ether group and an oligomer having a cyclic ether group, having a refractive index different from that of the component (A); and (C) a photoacid generator, is provided.

Abstract: Positive-working imageable elements can be used to prepare lithographic printing plates. These elements have at least two layers (inner and outer) arranged on a suitable substrate. The inner layer that is closer to the substrate includes one or more polymeric binders that include pendant oxazoline groups and acid groups that are reactive with the oxazoline groups during a post-baking step after development. The resulting imageable elements are more quickly baked in this manner to provide improved run length and resistant to press chemicals.

Abstract: The invention provides a dispersed composition including: (A) titanium black; (B) a polymer compound including a constituent component having a side chain structure to which an acidic group is linked via a linking group; and (C) a solvent. The (B) polymer compound is a polymer having a structure in which an acidic group is linked to a main chain part via a linking group.

Abstract: The present invention relates to a resist composition with a hardener and a solvent, and a method for forming a pattern using the resist composition. The hardener has a thermal-decomposable core part, and a first photosensitive bond art. The solvent has a low-molecular resin, and a second photosensitive bond part.

Abstract: An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 ?m of the film thickness at a wavelength of 350 to 375 nm.

Abstract: A positive-type photosensitive resin composition includes (A) a phenol resin modified by a compound having an unsaturated hydrocarbon group having 4 to 100 carbon atoms; (B) a compound that produces an acid by light; (C) a thermal crosslinking agent; and (D) a solvent. The positive-type photosensitive resin composition according to the present invention can be developed by an alkaline aqueous solution, and an effect thereof is that a resist pattern having sufficiently high sensitivity and resolution, excellent adhesion, and good thermal shock resistance can be formed.

Abstract: Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a ?max in the range of from about 450 to about 750 nm and having an absorption that is lower than 10% with respect to the absorption of the radiation absorbing compound in the element at the wavelength used for exposure. The contrast dye is present in sufficient H-aggregation such that less than 40% of the entire absorption spectrum from the contrast dye is contributed by it in non-H-aggregated form.

Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.

Abstract: The present invention relates to a polyester film produced by melt-extruding a polyester composed of a dicarboxylic acid unit and a diol unit, wherein 1 to 80 mol % of the diol unit is a unit containing a cyclic acetal skeleton, and the polyester film has an in-plane retardation of 20 nm or less at a wavelength of 550 nm. The polyester film is an optically isotropic polyester film which is easily produced by an extrusion-molding method and has an economical advantage. The polyester film is useful for production of optical members or optical products such as phase difference films, protective films for polarizing plates, light diffusion films, lens sheets, anti-reflection films and optical information recording media.

Abstract: A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.

Abstract: A photosensitive resin composition comprising: a photosensitive polyimide of formula (I); an acrylate monomer; and a photoinitiator, wherein A, B, D, J, m, and n are as defined in the specification.

Abstract: Flexographic printing plates are produced by thermal development by a process in which an imagewise exposed flexographic printing element is developed by heating and removing the softened, unpolymerized parts of the relief-forming layer, the flexographic printing element containing a styrene/butadiene block copolymer as a mixture with a plasticizer, and the proportion of butadiene which is present in 1,2-linked form being from 15 to 50% by weight, based on the block copolymer.

Abstract: The present invention related to a pigment dispersion composition, a color resist composition including the same, and a color filter fabricated by using the color resist composition. The pigment dispersion composition includes [A] a pigment, [B] a dispersing agent, [C] a cardo-based binder resin, and [D] a solvent.

Abstract: A lithographic printing plate precursor comprising: a support; and at least one layer comprising an image-recording layer, the image-recording layer comprising (A) an infrared absorber, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer, wherein the image recording layer is capable of being removed with at least one of a printing ink and a fountain solution, wherein at least one of said at least one layer comprises a copolymer having (a1) a unit comprising at least one ethylenically unsaturated bond, and (a2) a unit comprising at least one functional group interacting with a surface of the support. And a lithographic printing method in which the lithographic printing plate precursor is used. The copolymer preferably has a hydrophilic segment. The copolymer preferably is contained in an undercoat layer formed between the support and the image-recording layer.

Abstract: A lithographic printing plate precursor includes a support; and an image forming layer formed from a photosensitive composition, wherein the photosensitive composition includes: a photopolymerization initiator; a polymerizable compound; and a binder polymer including a graft chain, and the graft chain is a hydrophilic graft chain including a hydrophilic group.

Abstract: New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.

Abstract: Compounds of the formula (I), wherein R1, R2 and R3 for example are hydrogen, halogen, CN, C1-C18alkyl, C1-C10 haloalkyl, (CO)R8, (CO)OR4, or (CO)NR5R6; Y is O, S or CO; D2, D3 and D4 for example are a direct bond, O, S, NR7, CO, O(CO), (CO)O, S(CO), (CO)S, NR7(CO), (CO)NR7, SO, SO2, or OSO2, C1-C18alkylene, C3-C30cycloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, Ar1; Ar1, Ar2 and Ar3 are for example phenylene, R4, R5, R6, R7 and R8 are for example hydrogen, C3-C30-cycloalkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1C3-alkyl; X? is Formulae (IA), (IB) or (IC); R10 is for example C1-C18alkyl, C1-C10haloalkyl, camphoryl, phenyl-C1-C3alkyl, C3-C30cycloalkyl; and R11, R12, R13, R14 and R15 are for example C1-C10haloalkyl; are useful as polymerizable photolatent acids.

Abstract: A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.

Abstract: A negative-type photosensitive resin composition which is good in sensitivity and resolution, a pattern forming method by the use thereof wherein a pattern which can be developed in an alkali aqueous solution, is excellent in sensitivity, resolution and heat resistance and has a good shape is obtained, and highly reliable electronic parts are provided. The negative-type photosensitive rein composition includes (a) a polymer that has a phenolic hydroxyl group at a terminal and is soluble in the alkali aqueous solution, (b) a compound that generates an acid by irradiating active light, and (c) a compound that can be crosslinked or polymerized by an action of the acid.

Abstract: A photosensitive resin composition, a photosensitive resin laminate, and a method for forming a pattern capable of realizing high hardness while using an epoxy group-containing acrylic resin are provided. In a photosensitive resin composition including (A) an epoxy group-containing acrylic resin, (B) a photopolymerization initiator, and (C) a sensitizer, an onium salt having a specific structure is used as the component (B), and at least one kind selected from 1,5-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, and 2,6-dihydroxynaphthalene is used as the component (C).

Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

Abstract: Provided is a photoresist that includes a polymer having a backbone that is breakable and a photo acid generator that is free of bonding from the polymer. Further, provided is a method of fabricating a semiconductor device. The method includes providing a device substrate. A material layer is formed over the substrate. A photoresist material is formed over the material layer. The photoresist material has a polymer that includes a backbone. The photoresist material is patterned to form a patterned photoresist layer. A fabrication process is then performed to the material layer, wherein the patterned photoresist layer serves as a mask in the fabrication process. Thereafter, the patterned photoresist layer is treated in a manner that breaks the backbone of the polymer. The patterned photoresist layer is then removed.

Abstract: Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.

Abstract: Disclosed is a photosensitive resin composition for flexographic printing plates containing a thermoplastic elastomer (A), a polymer (B) mainly composed of butadiene, a photopolymerizable unsaturated monomer (C) and a photopolymerization initiator (D) (which composition substantially contains no hydrophilic polymers). In this photosensitive resin composition for flexographic printing plates, the number average molecular weight of the polymer (B) is not less than 10,000 and not more than 60,000, and the 1, 2 vinyl content in the total double bonds of the polymer (B) is not more than 25%.

Abstract: A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 ?m on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that displays increased alkali solubility under the action of acid, and (C) an alkali-soluble resin, wherein the component (B) comprises a resin formed from a copolymer containing a structural unit (b1) with a specific structure.

Abstract: Copolymers prepared by copolymerization of at least one fluorinated vinyl ether are provided. In one embodiment, the at least one fluorinated vinyl ether comprises ethylene directly substituted at an olefinic carbon atom with a moiety —OR* and optionally substituted with one, two, or three additional nonhydrogen substituents, wherein R* comprises a fluorinated alkyl moiety substituted with a protected or unprotected hydroxyl group, and further wherein an atom within R* may be (i) taken together with one of the additional nonhydrogen substituents, if present, or (ii) directly bound to an olefinic carbon atom, to form a ring. The polymers are useful, for example, in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions.

Abstract: Disclosed is a positive photosensitive resin composition that includes: (A) a polybenzoxazole precursor including a repeating unit represented by the Chemical Formula 1, a repeating unit represented by the Chemical Formula 2, or a combination thereof, and a thermally polymerizable functional group at least one terminal end of the polybenzoxazole precursor; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound including a cross-linking functional group; and (E) a solvent.

Abstract: A lithographic printing plate precursor is provided and has a porous aluminum support, (1) a layer containing a water-soluble polymer resin having a hydrophilic substituent adsorbable to a surface of the porous aluminum support and a sulfonic acid, and (2) an image recording layer from which unexposed areas can be removed by supplying an oil-based ink and an aqueous component thereonto on a printing machine without being subjected to development after exposure. The layer containing the water-soluble polymer resin, which has come in contact with the oil-based ink and the aqueous component, has a sulfonic acid group left therein.

Abstract: The present invention provide a composition for forming a layer to be plated, including a solution in which from 1% by mass to 20% by mass of a polymer having a functional group that forms an interaction with a plating catalyst or a precursor thereof and a radical polymerizable group, and a water-insoluble photopolymerization initiator are dissolved in a mixed solvent comprising from 20% by mass to 99% by mass of a water-soluble flammable liquid and water; a method of producing a metal pattern material using the composition for forming a layer to be plated; and a metal pattern material produced by the method.

Abstract: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises an alkaline soluble polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye. The plate is imagewise exposed with a violet or ultraviolet laser at a dosage of less than 300 ?J/cm2, and then developed with an aqueous alkaline developer. Higher monomer to polymer weight ratio is advantageously used. A pigment is preferably incorporated into the photosensitive coating solution as a liquid dispersion. The exposed plate is preferably developed on a processor with an alkaline developer coupled with a replenisher having higher pH.

Abstract: Provided is a new photo-curable resin composition which can be used in a photo nanoimprinting technology available for a photo nanoimprinting technology by which a substrate is processed with high accuracy. The photo-curable resin composition contains a photo-curable resin material essentially containing a (meth)acrylate, a reactive diluent, and a photo initiator. Preferably, the (meth)acrylate has a structure containing a benzene ring structure in its skeleton.

Abstract: A photosensitive composition includes a cyanine dye that has, on a methine chain thereof, a substituent which is a cation moiety of an onium salt structure.

Abstract: An ink composition is provided that includes (A) one type of compound (monomer (A)) selected from the group consisting of a difunctional (meth)acrylic acid ester or amide having an alkylene group of 6 to 12 carbons, and a difunctional vinyl ether having an alkylene group of 6 to 12 carbons, (B) a polymerization initiator, and (C) a colorant. There is also provided an inkjet recording method that includes a step (a) of discharging the ink composition onto a recording medium and a step (b) of irradiating the discharged ink composition with actinic radiation so as to cure the ink composition. Furthermore, a process for producing a lithographic printing plate is provided that includes a step (a?) of discharging the ink composition onto a hydrophilic support and a step (b?) of irradiating the discharged ink composition with actinic radiation so as to cure the ink composition, thus forming a hydrophobic image on the hydrophilic support by curing the ink composition.

Abstract: A lithography method includes forming a photosensitive layer on a substrate, exposing the photosensitive layer, baking the photosensitive layer, and developing the exposed photosensitive layer. The photosensitive layer includes a polymer that turns soluble to a base solution in response to reaction with acid, a plurality of photo-acid generators (PAGs) that decompose to form acid in response to radiation energy, and a plurality of quenchers having boiling points distributed between about 200 C and about 350 C. The quenchers also have molecular weights distributed between 300 Dalton and about 20000 Dalton, and are vertically distributed in the photosensitive layer such that a first concentration C1 at a top portion of the photosensitive layer is greater than a second concentration C2 at a bottom portion of the photosensitive layer.

Abstract: A colored photopolymerizable composition including a pigment, a dispersant, a solvent, a polymerizable compound and a photopolymerization initiator, the solvent further including a solvent (A) having a boiling temperature of from 100° C. to 200° C. and a solvent (B) having a boiling temperature of from 150° C. to 330° C. and an SP value according to the Okitsu method of from 9.5 (cal/cm3)1/2 to 11(cal/cm3)1/2, the solvent (B) being included in an amount of at least 5 parts by mass with respect to 100 parts by mass of the colored photopolymerizable composition; a color filter using the colored photopolymerizable composition; and a method for producing a color filter.

Abstract: A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 ?m on top of a support, including (A) a compound that generates acid on irradiation with active light or radiation, and (B) a resin that displays increased alkali solubility under the action of acid, wherein the component (B) comprises a resin containing a structural unit (b1) with a specific structure, and another resin containing a structural unit (b2) with a specific structure.

Abstract: A photosensitive resin composition comprising a (A) binder polymer, a (B) photopolymerizing compound having ethylenic unsaturated bonds in the molecule, a (C) photopolymerization initiator and a (D) polymerization inhibitor, wherein the (C) photopolymerization initiator comprises an acridine compound, and the content of the (D) polymerization inhibitor is 20-100 ppm by weight.

Abstract: Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with —COOH, —SO3H, —P03H2 and/or —PO4H2 in the side chains, wherein the polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, and (ii) a salt with an inorganic or organic cation, wherein the modified polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, said layer being soluble in aqueous alkaline developer, but is rendered insoluble in aqueous alkaline developer by IR radiation.

Abstract: Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.

Abstract: There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.

Abstract: (1) A packaged body of lithographic printing plate precursors, wherein an image-recording layer or a protective layer of the outermost surface layer contains an inorganic layered compound. (2) A lithographic printing plate precursor having a protective layer containing an inorganic layered compound, and an image-recording layer containing a binder polymer. (3) A lithographic printing plate precursor having a protective layer containing an inorganic layered compound, and an image-recording layer containing an infrared absorber and an iodonium compound.

Abstract: Embodiments of the present invention involve printing members that utilize a particle-fusion imaging mechanism but avoid susceptibility to handling damage. In particular, printing plates in accordance with the invention may utilize two phases, and these may originate, during manufacture, as two particle systems. Both systems are initially dispersed in a single coating applied as a layer, or in multiple coatings applied as adjacent layers, on a substrate. The second particle system exhibits a glass-transition or thermal coalescing temperature well above room temperature and also above the temperature at which the coating is dried. The coalescing temperature of the first particle system is below the drying temperature. As a result, when the coating is dried, the first particle system coalesces and forms a binder that entrains the second particle system, which has not coalesced.

Abstract: A photosensitive resin composition for a laser engravable printing substrate, comprising resin (a) having a polymerizable unsaturated group whose number average molecular weight is in the range of 1000 to 20×104, organic compound (b) having a polymerizable unsaturated group whose number average molecular weight is <1000 and organosilicon compound (c) having at least one Si—O bond in each molecule and having no polymerizable unsaturated group in molecules, wherein the content of organosilicon compound (c) is in the range of 0.1 to 10 wt. % based on the whole of photosensitive resin composition.

Abstract: Lithographic printing plate precursors have been designed so that they can be stored, shipped, and used in stacks without interleaf paper between individual precursors. This is achieved by incorporating polymeric particles having an average diameter of from about 3 to about 20 ?m into the outermost precursor layer such as an imageable layer or topcoat. The polymeric particles comprise a core of a crosslinked polymer and have grafted hydrophilic polymeric surface groups that are grafted onto the particle surfaces by polymerizing hydrophilic monomers in the presence of the crosslinked polymeric particles. The lithographic printing plates can be either negative- or positive-working elements.

Abstract: A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.

Abstract: To provide a negative photosensitive fluorinated aromatic resin composition having a low relative permittivity, low water absorptivity, high heat resistance and high productivity. A negative photosensitive fluorinated aromatic resin composition comprising the following fluorinated aromatic prepolymer, a photosensitizer and a solvent.

Abstract: Provided are new resins that comprise lactone units and photoresist compositions that comprise such resins.