Imaged Product Patents (Class 430/9)
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Publication number: 20090311614Abstract: A charge director material for charging a liquid toner, the charge director material comprising (a) nanoparticles of a simple salt and (b) a sulfosuccinate salt of the general formula MAn, wherein M is a metal, n is the valence of M, and A is an ion of the general formula (I) [R1—O—C(O)CH2CH(SO3?)C(O)—O—R2],??(I) wherein each of R1 and R2 is an alkyl group; said charge director material being substantially free of acids of the general formula (I), wherein one or both of R1 and R2 is hydrogen, and if only one of them is hydrogen, the other is an alkyl group,Type: ApplicationFiled: May 10, 2006Publication date: December 17, 2009Applicant: Hewlett-Packard Development Company, L.P.Inventors: Yaacov Almog, Avi Koller, Elliad Silcoff, Albert Teishev, Yaffa Israeli, Gary Larson, Lufei Lin
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Patent number: 7582404Abstract: A photosensitive paste composition is provided. The photosensitive paste composition contains conductive powder, an inorganic binder, and an organic vehicle, wherein, assuming that 10% by weight of the particles consisting the conductive powder have a diameter less than D10 and 90% by weight of the particles have a diameter greater than D90, a difference between D10 and D90 is about 2.0 ?m or less. The photosensitive paste composition solves problems arising with use of conductive powder having a broad particle diameter distribution and satisfy requirements for an electrode's main characteristics, such as resistance, the anti-sanding property of terminal portions, and withstanding voltage characteristic. In addition, a PDP electrode using the photosensitive paste composition and a PDP including the PDP electrode can be manufactured.Type: GrantFiled: June 22, 2005Date of Patent: September 1, 2009Assignee: Samsung SDI Co., Ltd.Inventors: Beom-Wook Lee, Dong-Hee Han, Sang-Wook Sin, Jin-Hwan Jeon
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Publication number: 20090208854Abstract: Disclosed is a photosensitive resin composition used to form spacers of a liquid crystal display device. The photosensitive resin composition comprises [A] an alkali-soluble resin, [B] a reactive unsaturated compound, [C] a photopolymerization initiator and [D] a solvent wherein the alkali-soluble resin [A] is a copolymer including structural units represented by Formulae 1 to 3, which are described in the specification. Column spacers formed using the photosensitive resin composition exhibit high compressive displacement, elastic recovery and residual film ratio.Type: ApplicationFiled: April 27, 2009Publication date: August 20, 2009Applicant: Cheil Industries Inc.Inventors: Jung Sik CHOI, Jae Sun HAN, Jeong Min HONG, Kil Sung LEE
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Patent number: 7544448Abstract: A method for laser marking a substrate which method comprises exposing a composition comprising a tetrabenzodiazadiketoperylene pigment to laser radiation to produce a fluorescent marking readily apparent under UV light is disclosed. Many of the tetrabenzodiazadiketoperylenes herein are novel. This method can yield fluorescent markings which are not readily apparent under ambient light. A method for producing non-fluorescent laser marked substrates containing tetrabenzodiazadiketoperylene dyes is also disclosed.Type: GrantFiled: October 30, 2006Date of Patent: June 9, 2009Assignee: Ciba Specialty Chemicals CorporationInventors: Damien Thurber Cole, Joseph E. Sarver, Colin Dennis Campbell
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Patent number: 7524610Abstract: An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.Type: GrantFiled: June 26, 2007Date of Patent: April 28, 2009Assignee: Samsung Electronics Co., LtdInventors: Kyu-sik Kim, Jin-baek Kim, Young-ung Ha, Byung-ha Park, Ji-young Park, Su-min Kim
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Patent number: 7523603Abstract: A thermally diluted exothermic reactor system is comprised of numerous orifices distributed within a combustor by distributed perforated contactor tubes or ducts. The perforated contactors deliver and mix diluent fluid and one or more reactant fluids with an oxidant fluid. Numerous micro-jets about the perforated tubes deliver, mix and control the composition of reactant fluid, oxidant fluid and diluent fluid. The reactor controls one or more of composition profiles, composition ratio profiles and temperature profiles in one or more of the axial direction and one or two transverse directions, reduces temperature gradients and improves power, efficiency and emissions.Type: GrantFiled: January 22, 2004Date of Patent: April 28, 2009Assignee: Vast Power Portfolio, LLCInventors: David L. Hagen, Gary Ginter, Bill Goheen, Allan McGuire, Janet Rankin
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Patent number: 7429413Abstract: In one embodiment, a nonmetallic, tamper-indicating, multi-layer label with a metallic appearance is described. The label comprises a pearlescent layer, a film layer, a patterned release layer, and a pigmented adhesive layer with the provisos that (i) the pigmented adhesive layer is an exterior layer of the label and is substantially free of pearlescent pigment, and (ii) the patterned release layer is an interior layer of the label. Each layer has first and second opposing planar surfaces, and each layer is in intimate contact with the layer or layers immediately adjacent to it. In another embodiment, two layers, one layer comprising a non-pearlescent pigment and the other layer comprising the adhesive, replace the pigmented adhesive layer.Type: GrantFiled: March 13, 2006Date of Patent: September 30, 2008Assignee: Brady Worldwide, Inc.Inventors: Paul C. Adair, Jeana S. Kemppainen
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Patent number: 7405028Abstract: A bottom antireflective coating for photolithography at 157 nm or less, where the bottom antireflective coating includes a crosslinkable polymer which contains cinnamic acid derivatives.Type: GrantFiled: January 28, 2005Date of Patent: July 29, 2008Assignee: Infineon Technologies, AGInventor: Christoph Hohle
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Publication number: 20080176152Abstract: Methods of forming an integrated circuit device may include forming a resist pattern on a layer of an integrated circuit device with portions of the layer being exposed through openings of the resist pattern. An organic-inorganic hybrid siloxane network film may be formed on the resist pattern. Portions of the layer exposed through the resist pattern and the organic-inorganic hybrid siloxane network film may then be removed. Related structures are also discussed.Type: ApplicationFiled: March 5, 2008Publication date: July 24, 2008Inventors: Jung-hwan Hah, Hyun-Woo Kim, Mitsuhiro Hata, Sang-gyun Woo
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Patent number: 7403651Abstract: A process for the production of a multi-color image is described. Preferably a transfer film is used which has a laser-sensitive layer (4). The laser-sensitive layer (4) comprises a three-component mixture. The components are coloring agents which are bleachable with laser radiation, in particular pigments, for example cyan pigment, magenta pigment and yellow pigment. With the process the procedure is such that in the individual steps only a respective one of the pigment components is bleached insofar as the laser conditions which are respectively specific to the various pigment components are set. This means that in the case of the three-component mixture only a first component is bleached by laser treatment of a given location in a first step by laser irradiation and only one other component is bleached in an optional second step and only one third component is bleached in an optional third step.Type: GrantFiled: November 2, 2001Date of Patent: July 22, 2008Assignee: Leonhard Kurz GmbH & Co. KGInventors: Norbert Lutz, Gerhard Zinner
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Patent number: 7364829Abstract: The present invention provides a resist pattern thickening material which can thicken a resist pattern to be thickened regardless of a material or a size thereof so as to form a fine space pattern, exceeding an exposure limit of exposure light. The resist pattern thickening material comprises: a resin; a crosslinking agent; and a nitrogen-containing compound. In a process for forming a resist pattern of the present invention, the resist pattern thickening material is applied on a surface of a resist pattern to be thickened, thereby forming a resist pattern. A process for manufacturing a semiconductor device of the present invention includes: applying the thickening material on a surface of a resist pattern to be thickened which is formed on an underlying layer, so as to thicken the resist pattern to be thickened and form a resist pattern; and patterning the underlying layer by etching using the resist pattern.Type: GrantFiled: July 30, 2003Date of Patent: April 29, 2008Assignee: Fujitsu LimitedInventors: Miwa Kozawa, Koji Nozaki, Takahisa Namiki, Junichi Kon
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Patent number: 7361450Abstract: A photosensitive resin (A) consisting substantially of a product obtained by reacting a polyester (c) which is a reaction product of a polyol (a) with a tetrabasic acid dianhydride (b) with a compound (d) having an ethylenically unsaturated group and an epoxy group in the molecule; an alkali-soluble photosensitive resin (AA) obtained by reacting the photosensitive resin (A) with a di- or tri-basic acid mono-anhydride (e); photosensitive resin compositions prepared by incorporating the above photosensitive resin with a diluent (XX), a crosslinking agent (B) and/or a photopolymerization initiator (C); products of curing of the compositions; and articles equipped with these products. The resins and resin compositions give cured articles which are suitable for the formation of optical waveguides and excellent in processability, transparency, developability, close adhesion, resistance to soldering heat, and so on.Type: GrantFiled: February 25, 2003Date of Patent: April 22, 2008Assignee: Nippon Kayaku Kabushiki KaishaInventors: Hiroo Koyanagi, Koji Nakayama, Chie Umeyama, Yoshihiro Kawada, Minoru Yokoshima
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Patent number: 7348110Abstract: A photothermographic material having a Dmin and Dmax optical density. The material includes a support having hereon one or more thermally-developable imaging layers which are developable to produce an image when the photothermographic material is thermally processed; and an area disposed along a length of at least one edge of the photothermographic material, wherein the area has an optical density less than the Dmax and greater than the Dmin of the photothermographic material.Type: GrantFiled: December 11, 2006Date of Patent: March 25, 2008Assignee: Carestream Health, Inc.Inventors: James C. Vanous, Bryan V. Hunt, Robert R. Brearey, Steven H. Kong, Mark C. Skinner, Thomas C. Geisler
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Patent number: 7332210Abstract: Various manufacturing techniques may be employed to construct an appliqué for use in an instrument cluster. In one commonly employed technique, an appliqué may be formed by applying different colored ink layers onto a surface of a polycarbonate sheet using a silk screen printing. In some instance, an edge of an underlying ink layer may cause a visible step line on the face of the appliqué. To reduce or eliminate these visible step lines, an outer boundary area of the printing layers invention are defined as a dispersing dot pattern.Type: GrantFiled: March 12, 2004Date of Patent: February 19, 2008Assignees: Denso International America Inc., Denso Manufacturing Tennessee, Inc.Inventors: Christopher A Arms, Joel Stooksbury
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Publication number: 20080008943Abstract: The present invention provides an ink composition comprising a compound having a fragment containing a cyclic ether group having at least one bicyclo or tricyclic substituent.Type: ApplicationFiled: June 28, 2007Publication date: January 10, 2008Applicant: FUJIFILM CORPORATIONInventor: Kotaro WATANABE
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Patent number: 7303853Abstract: 3-D structures which are fabricated by gray-tone exposure of a class of thick negative photo-sensitized epoxy resists from the substrate side of a transparent substrate, using development methods that rely upon a physical distinction between polymerized (solid) and unpolymerized (liquid) photoresist at elevated temperatures Such structures may exhibit smoothly-varying topographic features with thicknesses as great as 2 mm.Type: GrantFiled: September 17, 2003Date of Patent: December 4, 2007Inventor: Martin A. Afromowitz
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Patent number: 7252923Abstract: A method of producing a pattern-forming body with high accuracy with no need for a post-exposure treatment and without allowing any photocatalyst to remain in the resultant pattern-forming body and whereby any problematic effect of the photocatalyst in the pattern-forming body is eliminated. The method includes providing a photocatalyst-containing layer-sided substrate and a pattern-forming body substrate having a characteristic-changeable layer, which is changed by the effect of the photocatalyst in the photocatalyst-containing layer, and a light-shading part formed as a pattern in such a manner that the photocatalyst-containing layer and the characteristic-changeable layer are brought into contact with each other, followed by exposure on the side of the pattern-forming body substrate to change the characteristics of the characteristic-changeable layer of the exposed part, followed by removing the photocatalyst-containing layer-sided substrate.Type: GrantFiled: October 16, 2002Date of Patent: August 7, 2007Assignee: Dai Nippon Printing Co., Ltd.Inventor: Hironori Kobayashi
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Patent number: 7232648Abstract: A photosensitive resin composition comprising a resin (A1) having fluorine atom-containing groups, silicon atom-containing groups and ethylenic double bonds, a radical initiator (B) and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule. Further, a photosensitive resin composition comprising a resin (A2) having fluorine atom-containing groups and ethylenic double bonds, a resin (A3) having silicon atom-containing groups and ethylenic double bonds, a radical initiator (B), and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule.Type: GrantFiled: September 7, 2005Date of Patent: June 19, 2007Assignee: Asahi Glass Company, LimitedInventors: Hideyuki Takahashi, Kenji Ishizeki
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Patent number: 7211369Abstract: The invention relates to using VLSI techniques to store information on a substrate. One embodiment of a die with text deposited upon the die uses semiconductor processing techniques during fabrication. Included in the die are a substrate, a first paragraph and a second paragraph. The first and second paragraphs are in contact with the substrate. The second paragraph is aligned with the first paragraph in a column.Type: GrantFiled: December 3, 2003Date of Patent: May 1, 2007Inventors: Pawan Sinha, Pamela R. Lipson, Keith R. Kluender
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Patent number: 7195857Abstract: A resist curable resin material composed mainly of a curable prepolymer (for example, a photocurable resin material comprising a photosensitive prepolymer having an ethylenically unsaturated terminal group originating in an acrylic monomer (A), a compound having an ethylenically unsaturated group excluding the photosensitive prepolymer (B), and a photopolymerization initiator (C)) and a flame-retarding agent containing a hydrated metal compound and a brominated epoxy compound are mixed to produce a resist curable resin composition. Alternatively, the resist curable resin material described above and a hydrated metal compound surface-treated with a surface treating agent having an amphipathic property and a polarity are mixed to produce a resist curable resin composition.Type: GrantFiled: June 28, 2002Date of Patent: March 27, 2007Assignee: Showa Denko K.K.Inventors: Kenji Tamura, Motoyuki Hirata, Eikichi Kogure, Kenichi Yamada
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Patent number: 7192688Abstract: A composition comprising a polymer according to Structure 1 wherein R is H, Me, Et or C6H5; R? is H or Me; R? is H or Me; n=1 to 100; and Z=1 to 3, is disclosed. The composition can be cured and used in a wide range of articles such as a photopolymer printing plate, sealant, caulk, encapsulent, road marking paint, photoresist, binder, impact modifier, polymer modifier, oxygen or water vapor barrier coating, conformal coating, solder mask, pigment dispersion, stereolithograph, laminating resin, grafted co-polymer, composite, optical fiber coating, paper coating, metal coating, glass coating, plastic coating, wood coating, waterproofing material, electrical insulating material, automotive belt or hose, tire, engine mount, gasket, golf ball core, and rubber roll.Type: GrantFiled: September 10, 2004Date of Patent: March 20, 2007Assignee: Sartomer Technology, Inc.Inventors: Jeffrey A. Klang, Yuhong He, Gary W. Ceska, James P. Horgan
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Patent number: 7150906Abstract: A display panel includes a transparent image recording sheet having electrophotographically formed thereon at least a background portion, wherein space factor of pinholes per unit area of the background portion is no greater than 1×10?2%. A method of manufacturing the display panel is also disclosed. The background portion has a transparent optical density of 3.0 or greater and an image portion has a transparent optical density of 1.0 or less, and preferably 0.1 to 1. A toner used for electrophotographically forming the background portion and the image portion has a number average molecular weight of 1,000 to 6,000 and a weight average molecular weight of 30,000 to 150,000 as measured by gel permeation chromatography with respect to a portion of the toner dissolved in tetrahydrofuran, and has respective molecular weight distribution peaks in molecular weight ranges of 1000 to 10,000 and 100,000 to 1,500,000.Type: GrantFiled: June 12, 2002Date of Patent: December 19, 2006Assignees: Denso Corporation, Fuji Xerox Co., Ltd.Inventors: Teruhiko Iwase, Seki Yamaguchi, Yoshifumi Iida, Masanori Ichimura, Yoko Tomita, Yasuyuki Kobayashi
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Patent number: 7105256Abstract: A photosensitive conductive composition including a silver powder having an X-ray diffraction pattern in which a half width of a silver (111) peak is at least about 0.15°, an organic binder, a photopolymerizable monomer, a photopolymerization initiator and a lead-free glass.Type: GrantFiled: August 23, 2004Date of Patent: September 12, 2006Assignee: Taiyo Ink Mfg. Co., Ltd.Inventor: Kazunobu Fukushima
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Patent number: 7022440Abstract: A device pattern of a semiconductor device. The pattern is defined by a plurality of non-straight lines that are inwardly arched and are formed from plural segments of plural ellipses that are arranged to surround the pattern.Type: GrantFiled: September 13, 2004Date of Patent: April 4, 2006Assignee: NEC Electronics CorporationInventor: Mami Takeuchi
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Patent number: 7018752Abstract: A display panel includes a transparent image recording sheet having electrophotographically formed thereon at least a background portion, wherein space factor of pinholes per unit area of the background portion is no greater than 1×10?2%. A method of manufacturing the display panel is also disclosed. The background portion has a transparent optical density of 3.0 or greater and an image portion has a transparent optical density of 1.0 or less, and preferably 0.1 to 1. A toner used for electrophotographically forming the background portion and the image portion has a number average molecular weight of 1,000 to 6,000 and a weight average molecular weight of 30,000 to 150,000 as measured by gel permeation chromatography with respect to a portion of the toner dissolved in tetrahydrofuran, and has respective molecular weight distribution peaks in molecular weight ranges of 1000 to 10,000 and 100,000 to 1,500,000.Type: GrantFiled: November 22, 2004Date of Patent: March 28, 2006Assignee: Fuji Xerox Co., Ltd.Inventors: Teruhiko Iwase, Seki Yamaguchi, Yoshifumi Iida, Masanori Ichimura, Yoko Tomita, Yasuyuki Kobayashi
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Patent number: 7005245Abstract: An optical element, such as a waveguide, is formed by utilizing a plasma deposited precursor optical material wherein the plasma deposition is a two-component reaction comprising a silicon donor, which is non-carbon containing and non-oxygenated, and an organic precursor, which is non-silicon containing and non-oxygenated. The plasma deposition produces a precursor optical material that can be selectively photo-oxidized by exposure to electromagnetic energy in the presence of oxygen to produce photo-oxidized regions that have a selectively lower index of refraction than that of the non-photo-oxidized regions whereby transmission of a light signal through selected non-photo-oxidized and photo-oxidized regions can be controlled. Subsequent photo-oxidation or variable photo-oxidation can be used to produce various discrete regions with different indexes of refraction for fabrication, optimization or repair of photonic structures.Type: GrantFiled: March 4, 2002Date of Patent: February 28, 2006Inventor: Ronald M. Kubacki
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Patent number: 6929899Abstract: A photosensitive composition having low absorption loss at 1,300-1,610 nm and is suitable for practical waveguide devices. The composition comprises at least one (meth)acrylate prepared from a fluorinated monomer or polymer having minimum two hydroxyl groups, at least one multifunctional non-fluorinated (meth)acrylate and at least one photoinitiator. An optical coating on a variety of substrates is obtained by exposing the photosensitive composition to actinic radiation such as UV light. An optical waveguide device is fabricated by patterning the photosensitive composition on a substrate.Type: GrantFiled: January 18, 2002Date of Patent: August 16, 2005Assignee: E. I. du Pont de Nemours and CompanyInventors: Indira S. Pottebaum, Chuck C. Xu, Chris E. Osuch, Deepti Pant, Louay A. Eldada
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Patent number: 6908728Abstract: By irradiating a laser beam onto an X-ray film that includes a support layer having disposed thereon an emulsion layer, the emulsion layer is melted, numerous minute air bubbles are generated in the emulsion layer, and the emulsion layer becomes convex, whereby a visible dot pattern is formed. The irradiation time and wavelength of the laser beam are selected so that separation is not generated between the support layer and the emulsion layer. By defocusing and irradiating the laser beam, the X-ray film may substantially uniformly receives energy of the laser beam. Moreover, an undersurface layer may also be formed, and the laser beam may be irradiated onto the undersurface layer to form a dot pattern on the undersurface layer. A device and a method for forming a marking pattern representing identification information on a rolled photosensitive material and cutting the photosensitive material into sheets are disclosed.Type: GrantFiled: April 15, 2003Date of Patent: June 21, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Keisuke Endo, Hiroyuki Nishida
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Patent number: 6900000Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 ?m or smaller) features.Type: GrantFiled: June 28, 2002Date of Patent: May 31, 2005Assignee: Brewer Science Inc.Inventors: Ram W. Sabnis, Douglas J. Guerrero, Terry Brewer, Mary J. Spencer
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Patent number: 6890628Abstract: A self-adhering image made by the steps comprising: forming an imaged receiver sheet (140) having an image (230), a first thermoplastic layer (304), and a first support layer (150); laminating an imageless receiver sheet (160) with a second thermoplastic layer (308) and a second support layer (170) with the imaged receiver sheet (140) thereby encapsulating the image (230) between the first thermoplastic layer (304) and the second thermoplastic layer (308); removing the first support layer (150); removing the second support layer (170); and forming an encapsulated image capable of self-adhering to a surface.Type: GrantFiled: May 9, 2003Date of Patent: May 10, 2005Assignee: Eastman Kodak CompanyInventor: Roger S. Kerr
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Patent number: 6855466Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.Type: GrantFiled: September 15, 2001Date of Patent: February 15, 2005Assignee: Shipley Company, L.L.C.Inventors: Edward K. Pavelchek, Timothy G. Adams, Manuel doCanto, Suzanne Coley, George G. Barclay
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Patent number: 6846599Abstract: An image structure formed on a medium. The image structure is so formed that an angular distribution of surface reflection light beams under the condition that a surface of an image G formed on a medium is irradiated with a slit-transmitted light beam satisfies the following three characteristics: (1) an angle A corresponding to a half value of a reflected light peak is not smaller than unity but not larger than twice as large as a reference angle A0; (2) the ratio ?XGWS/?XGWS0 of the value of WS of center-of-gravity fluctuation to the value of reference WS0 of center-of-gravity fluctuation is not larger than 10; and (3) an angle B at which the quantity of reflected light becomes {fraction (1/10)} as large as the peak value is in a range of from 3×A0 to 6×A0, both inclusively.Type: GrantFiled: February 27, 2003Date of Patent: January 25, 2005Assignee: Fuji Xerox Co., Ltd.Inventor: Osamu Ide
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Patent number: 6815126Abstract: A PWB or multilayer board with circuit traces is treated by a process that serves to reduce the incident of failure of the board. The process includes the steps of applying a thin commoning layer of copper onto a catalyzed surface of the board substrate and the circuit lines. A photoresist is then applied over the commoning layer after which the photoresist is removed only from the commoning material over the circuit lines. A thin layer of a more noble metal, such as nickel, is electrodeposited over the exposed conductive layer. This is followed by a gold layer electrodeposited over the nickel in close registry therewith. The process provides the traces with a conforming nickel/gold layer that extends down the side of the traces. This reduces the tendency of a subsequent copper etch step from undercutting the nickel/gold, thereby causing slivers that could cause short circuiting between adjacent circuit patterns.Type: GrantFiled: April 9, 2002Date of Patent: November 9, 2004Assignee: International Business Machines CorporationInventors: Edmond Otto Fey, Raymond Thomas Galasco, Thomas Richard Miller, Anita Sargent
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Patent number: 6806925Abstract: The irregularities of coloring concentration which is generated between dyed media when a color filter substrate which is prepared in a manufacturing method of a liquid crystal display device is manufactured by supplying ink to dyed media formed on a main surface of the color filter substrate using an ink jet method. In the present invention, as color filter ink which is supplied to the dyed media formed on the color filter substrate using the inkjet method, liquid which contains dye which colors the dyed media, solvent (for example, water) which has an affinity for the dye, a volatility-adjusting agent (for example, glycerin) which lowers the volatility of the ink to a level below the volatility of the solvent, and a dyeing-promoter agent (for example, N-methyl-2-pyrrolidone) which exhibits a higher affinity for the dye and the dyed media than the volatility adjusting agent. Then, the dyed media is colored with this ink.Type: GrantFiled: September 14, 2001Date of Patent: October 19, 2004Assignees: Hitachi, Ltd., Hitachi Device Engineering Co., Ltd.Inventors: Akira Ishii, Miyo Shimizu, Shigeru Matsuyama
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Patent number: 6794098Abstract: A capacitor is formed utilizing a plasma deposited capacitor dielectric wherein the plasma deposition is a two-component reaction comprising a silicon donor, which is non-carbon containing and non-oxygenated, and an organic precursor, which is non-silicon containing and non-oxygenated. The plasma deposition produces a capacitor dielectric that can exhibit a low dielectric constant and, in selected depositions, a response to photo-oxidation induced by exposure to radiated electromagnetic energy in the presence of oxygen. Photo-oxidation of selected depositions can be used to alter the dielectric constant of the capacitor dielectric after the capacitor has been fabricated. The capacitor may be used in precision filter applications.Type: GrantFiled: January 22, 2002Date of Patent: September 21, 2004Inventor: Ronald M. Kubacki
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Publication number: 20040180292Abstract: The present invention relates generally to a method and apparatus for converting a precursor material, preferably organometallic, to a film, preferably metal-containing, that is adherent to at least a portion of a substrate. Both method and apparatus include a pre-conversion step or section, and a step or section for substantial conversion of a portion of material from the pre-conversion step or section into the form of a predetermined pattern, wherein this substantial conversion results in a metal-containing patterned layer on the substrate.Type: ApplicationFiled: October 29, 2003Publication date: September 16, 2004Applicant: EKC Technology, Inc.Inventors: Wai M. Lee, David J. Maloney, Paul J. Roman, Michael A. Fury, Ross H. Hill, Clifford Henderson, Sean Barstow
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Patent number: 6764812Abstract: A selective wetting material is formed by plasma depositing a film on a substrate from a two-component reaction of a silicon donor and organic precursor, and photo-oxidizing selected regions of the deposited film to form wetting regions to which a liquid will selectively adhere. When the liquid is an electrically conductive material, the process may be used to form printed circuits on a circuit board. When the substrate is optically transparent and the non-photo-oxidized regions of the film are removed, the process may be used to form a photomask.Type: GrantFiled: January 14, 2002Date of Patent: July 20, 2004Inventor: Ronald M. Kubacki
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Publication number: 20040126696Abstract: Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent. The resin compositions have excellent resolution, electrical insulating properties and thermal shock properties. Cured products of the invention are obtained by curing these resin compositions, and they show good adhesive properties.Type: ApplicationFiled: October 23, 2003Publication date: July 1, 2004Inventors: Katsumi Inomata, Takashi Nishioka, Atsushi Itou, Masayoshi Suzuki, Shin-ichirou Iwanaga
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Patent number: 6756174Abstract: A process for forming a three dimensional decorative pattern on a product substrate uses electrostatic forces placed on dielectric fibers and electrostatic latent images written either onto an intended product substrate or onto a transfer surface, or both, to assemble three dimensional composite structures of fibers or rod-shaped components in a matrix of a second dielectric material. The fibers or other rod-shaped components may extend from the matrix to form a surface that is either plush or relatively smooth. The transfer surface may be a photoconductor with an electrostatic latent image that is written with controlled light or it can be made of a dielectric material and be rigid and conforming to the intended product substrate or flexible and made to conform to the intended product substrate.Type: GrantFiled: November 14, 2001Date of Patent: June 29, 2004Inventors: James A. Van Vechten, J. Dustin Hultine
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Publication number: 20040101784Abstract: A process and related structure are disclosed for using photo-definable layers that may be selectively converted to insulative materials in the manufacture of semiconductor devices, including for example dynamic random access memories (DRAMs), synchronous DRAMs (SDRAMs), static RAMs (SRAMs), FLASH memories, and other memory devices. One possible photo-definable material for use with the present invention is plasma polymerized methylsilane (PPMS), which may be selectively converted into photo-oxidized siloxane (PPMSO) through exposure to deep ultra-violet (DUV) radiation using standard photolithography techniques. According to the present invention, structures may be formed by converting exposed portions of a photo-definable layer to an insulative material and by using the non-exposed portions in a negative pattern scheme, or the exposed portions in a positive pattern scheme, to transfer a pattern into to an underlying layer.Type: ApplicationFiled: November 6, 2003Publication date: May 27, 2004Applicant: Micron Technology, Inc.Inventor: Bradley J. Howard
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Patent number: 6740458Abstract: A printmaking process that utilizes phosphorescent transfer plates as the method for producing prints is disclosed. Specifically, this invention uses an engraved plate, which is coated with viscous phosphorescent paint. Once the paint on the plate is dry, the plate is exposed to light, causing the paint to become light-emitting. The plate is then placed in contact with photo-sensitive emulsion. After the proper exposure time, the photo-sensitive emulsion is developed, thereby producing a print. This invention can generate a wide array of prints. For example, black and white prints can be created under this invention. Further, prints containing a variation of tones between black and white and/or prints containing texture can be manufactured under this invention. Finally, color prints can be produced under this invention.Type: GrantFiled: August 12, 2002Date of Patent: May 25, 2004Inventor: Caroline D'Offay
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Publication number: 20040086805Abstract: A substrate material for LIGA applications w hose general composition is Ti/Cu/Ti/SiO2. The SiO2 is preferably applied to the Ti/Cu/Ti wafer as a sputtered coating, typically about 100 nm thick. This substrate composition provides improved adhesion for epoxy-based photoresist materials, and particularly the photoresist material SU-8.Type: ApplicationFiled: October 31, 2002Publication date: May 6, 2004Inventor: Paul M. Dentinger
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Publication number: 20040072085Abstract: A method for rendering durable, matte-finish images on a stone or masonry substrate, comprising: providing a stone or masonry substrate presenting a substantially flat image-receiving surface or otherwise shaped to accept an image, the image-receiving surface having a specular reflectivity suitable for accepting an image; applying a polymer to the image-receiving surface and curing the polymer thereto, the polymer being characterized by an avoidance of coloration or discoloration over time and a degree of clarity sufficient that the specular reflectivity of the image-receiving surface of the stone or masonry substrate is substantially unaltered, and the natural appearance thereof substantially unchanged, after cure of the polymer thereto, the polymer further being characterized by a cure hardness such that a transferable sublimable ink image carried on the image-receiving surface after transfer of the image into the cured polymer, is not eroded from the image-accepting surface by effects of weather, wear, abrType: ApplicationFiled: October 15, 2002Publication date: April 15, 2004Inventors: John Walter Horne, George Evan Bybee
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Patent number: 6720120Abstract: A substrate includes fine lines. The fine lines are obtained according to a fine-line forming process, which includes a process of projecting light from above the substrate onto predetermined regions on a photosensitive material provided on the substrate and a developing process after the light projection process. A narrow-width portion is provided at an end portion of each of the fine lines in a longitudinal direction of the fine line. The width of the narrow-width portion is smaller than the width of a portion adjacent to the narrow-width portion.Type: GrantFiled: December 6, 2001Date of Patent: April 13, 2004Assignee: Canon Kabushiki KaishaInventors: Yoshimi Uda, Kazuya Ishiwata, Shinsaku Kubo, Yasuyuki Watanabe
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Publication number: 20040067360Abstract: Microstructured taggant particles, their applications and methods of making the same are described. Precisely formed taggant particles can be formed, in the range of 500&mgr; and smaller, from either inert polymers or biodegradable materials bearing information indicia, such as through specific shape, size, color, reflectivity, refractive index, surface geometry, imprinting, optical effect or properties, and electromagnetic properties, to uniquely tag, identify or authenticate articles.Type: ApplicationFiled: May 19, 2003Publication date: April 8, 2004Inventors: Richard A. Steenblik, Mark J. Hurt, Michael E. Knotts, Brian S. Martin
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Publication number: 20040048186Abstract: Disclosed is a thermally sensitive imagable article and compositions therefor. The imagable article comprises a coating on a substrate, the coating comprising an amino acid or amide, and a compound capable of generating an acid upon heating. The coating optionally comprises a radiation absorbing compound. When imagewise exposed the coating has the property that exposed regions become relatively insoluble in a developer liquid whereas regions that have not been exposed remain relatively soluble in the developer and dissolve in the developer, leaving the exposed substrate in those regions.Type: ApplicationFiled: December 10, 2001Publication date: March 11, 2004Applicant: Kodak Polychrome Graphics LLC.Inventors: Gregory Turner, Denise Howard
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Publication number: 20040043308Abstract: A process for the production of a multi-color image is described. Preferably a transfer film is used which has a laser-sensitive layer (4). The laser-sensitive layer (4) comprises a three-component mixture. The components are coloring agents which are bleachable with laser radiation, in particular pigments, for example cyan pigment, magenta pigment and yellow pigment.Type: ApplicationFiled: August 25, 2003Publication date: March 4, 2004Inventors: Norbert Lutz, Gerhard Zinner
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Publication number: 20040029030Abstract: A method of forming a durable image including the steps of providing a substrate, depositing an image on the substrate, applying a curable coating over the image and curing the coating. The substrate may be formed from a plastics material, paper, card or any other suitable material. The image may be formed by ink, toner or the like. The coating is preferably curable by means of ultra violet light. The coating may be a transfer coating, transferred from a carrier. Alternatively the coating may be deposited by spraying onto the image. Apparatus for forming a durable image includes means for depositing an image on a substrate, means for applying a coating over the image and means for curing the coating.Type: ApplicationFiled: April 23, 2003Publication date: February 12, 2004Inventor: Nicholas John Murray
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Patent number: 6689542Abstract: A process for marking which enables a colored pattern formed by at least two different and contrasting colors to be created on a dark or black surface of a rubber article, which process includes preparing a light-colored rubber composition having at least one elastomer and at least two coloring agents of different light colors, giving the said composition its initial color, and then incorporating a dark or black masking agent into this colored composition in a limited proportion to darken or mask the initial color of the rubber composition. The process further includes causing a first laser beam of appropriate characteristics to interact in a first stage in order to reveal a first colored pattern part, followed in a second stage by a second laser beam of appropriate characteristics in order to reveal a second colored pattern part.Type: GrantFiled: July 19, 2001Date of Patent: February 10, 2004Assignee: Michelin Recherche et Technique S.A.Inventor: Monique Boissonnet
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Publication number: 20030224256Abstract: By irradiating a laser beam onto an X-ray film that includes a support layer having disposed thereon an emulsion layer, the emulsion layer is melted, numerous minute air bubbles are generated in the emulsion layer, and the emulsion layer becomes convex, whereby a visible dot pattern is formed. The irradiation time and wavelength of the laser beam are selected so that separation is not generated between the support layer and the emulsion layer. By defocusing and irradiating the laser beam, the X-ray film may substantially uniformly receives energy of the laser beam. Moreover, an undersurface layer may also be formed, and the laser beam may be irradiated onto the undersurface layer to form a dot pattern on the undersurface layer. A device and a method for forming a marking pattern representing identification information on a rolled photosensitive material and cutting the photosensitive material into sheets are disclosed.Type: ApplicationFiled: April 15, 2003Publication date: December 4, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Keisuke Endo, Hiroyuki Nishida