Doping Of Semiconductive Channel Region Beneath Gate Insulator (e.g., Adjusting Threshold Voltage, Etc.) Patents (Class 438/289)
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P-TYPE MOS TRANSISTOR, METHOD OF FORMING THE SAME AND METHOD OF OPTIMIZING THRESHOLD VOLTAGE THEREOF
Publication number: 20080128832Abstract: The present invention discloses a method of optimizing threshold voltage of P-type MOS transistor, including: providing a semiconductor substrate; forming a P-type MOS transistor on the semiconductor substrate; and performing a second N-type ion implantation in the source and drain extension regions. A P-type MOS transistor and a method for forming the same are also provided, the method includes: providing a semiconductor substrate including a region I and a region II being concentric with the region I and occupying 15% to 25% of the area of the whole semiconductor substrate; forming a P-type MOS transistor on the semiconductor substrate; and performing a second N-type ion implantation in the source and drain extension regions of the region II. Therefore, the reduction in threshold voltage of the P-type MOS transistors in region II of the semiconductor substrate is suppressed.Type: ApplicationFiled: October 19, 2007Publication date: June 5, 2008Applicant: Semiconductor Manufacturing International (Shanghai) CorporationInventors: Xiaohui ZHUANG, Shengfen Chiu, Peng Sun -
Patent number: 7381621Abstract: A MOSFET includes an insulated gate electrode on a surface of a semiconductor substrate having an impurity region of first conductivity type therein that extends to the surface. Source and drain regions of second conductivity type are provided in the impurity region. The source region includes a highly doped source contract region that extends to the surface and a lightly doped source extension. The lightly doped source extension extends laterally underneath a first end of the insulated gate electrode and defines a source-side P-N junction with the well region. The drain region includes a highly doped drain contact region that extends to the surface and a lightly doped drain extension. The lightly doped drain extension extends laterally underneath a second end of the insulated gate electrode and defines a drain-side P-N junction with the well region. This well region, which extends within the impurity region and defines a non-rectifying junction therewith, is more highly doped than the impurity region.Type: GrantFiled: January 5, 2007Date of Patent: June 3, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Sun-hak Lee, Kwang-dong Yoo
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Patent number: 7368356Abstract: A transistor and method of manufacture thereof. A semiconductor workpiece is doped before depositing a gate dielectric material. Using a separate anneal process or during subsequent anneal processes used to manufacture the transistor, dopant species from the doped region of the workpiece are outdiffused into the gate dielectric, creating a doped gate dielectric. The dopant species fill vacancies in the atomic structure of the gate dielectric, resulting in a transistor having increased speed, reduced power consumption, and improved voltage stability.Type: GrantFiled: December 6, 2005Date of Patent: May 6, 2008Assignee: Infineon Technologies AGInventor: Hong-Jyh Li
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Patent number: 7364974Abstract: A method of fabricating a double gate FET on a silicon substrate includes the steps of sequentially epitaxially growing a lower gate layer of crystalline rare earth silicide material on the substrate, a lower gate insulating layer of crystalline rare earth insulating material, an active layer of crystalline semiconductor material, an upper gate insulating layer of crystalline rare earth insulating material, and an upper gate layer of crystalline rare earth conductive material. The upper gate layer and the upper gate electrically insulating layer are etched and a contact is deposited on the upper gate layer to define an upper gate structure. An impurity is implanted into the lower gate layer to define a lower gate area aligned with the upper gate structure. A source and drain are formed in the active layer and contacts are deposited on the source and drain, respectively.Type: GrantFiled: March 18, 2005Date of Patent: April 29, 2008Assignee: Translucent Inc.Inventor: Petar B. Atanackovic
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Patent number: 7361562Abstract: Provided is a method of manufacturing a semiconductor device capable of forming a thin high-quality gate oxide layer by suppressing occurrence of recoiled oxygen due to ion implanting. The method of manufacturing a semiconductor device includes steps of: removing an oxide layer from a semiconductor substrate; forming a well region in the substrate by performing a first ion implanting process; removing a native oxide layer from the substrate; adjusting a threshold voltage by performing a second ion implanting process on the substrate; and forming a gate oxide layer on the substrate.Type: GrantFiled: December 27, 2004Date of Patent: April 22, 2008Assignee: Dongbu Electronics Co., Ltd.Inventor: Hak-Dong Kim
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Publication number: 20080090363Abstract: A method of manufacturing a semiconductor device forms an N? diffusion layer to be a source/drain region of a grooved transistor simultaneously with an N? diffusion layer of a channel region directly under a gate electrode of an antifuse element. The formation of the N? diffusion layer directly under the gate electrode of the antifuse element stabilizes electrical connection between the gate electrode and the source/drain diffusion region even during writing with a low write voltage.Type: ApplicationFiled: September 12, 2007Publication date: April 17, 2008Applicant: ELPIDA MEMORY, INC.Inventors: Kazutaka MANABE, Eiji KITAMURA
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Publication number: 20080087969Abstract: A planar-type semiconductor device including a plurality of device isolation areas defining an active area formed over a semiconductor substrate; at least one drift area formed in the semiconductor substrate; a well region formed in the semiconductor substrate; a gate pattern formed over the semiconductor substrate and between the plurality of device isolation areas; a pair of source regions and a drain area formed in the semiconductor substrate adjacent sides of the gate pattern; at least one drift region formed in the well region; a drain region formed in the drift region; and a silicide layer formed over the source regions, the drain region, and partially over the gate pattern.Type: ApplicationFiled: October 1, 2007Publication date: April 17, 2008Inventor: Yong-Keon Choi
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Patent number: 7354833Abstract: This invention provides a method for improving threshold voltage stability of at least one metal-oxide-semiconductor (MOS) device. In one embodiment of the invention, at least one well is formed on a semiconductor substrate. A gate dielectric layer is formed on the well of the semiconductor substrate. A gate conductive layer is formed on the gate dielectric layer. Ions are implanted into the well to from at least one first buried doped region beneath the gate dielectric layer, and one or more second buried doped regions beneath at least one location of the well that is earmarked for forming a lightly doped drain (LDD) region.Type: GrantFiled: June 10, 2005Date of Patent: April 8, 2008Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventor: Jhon Jhy Liaw
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Publication number: 20080079050Abstract: Semiconductor devices and methods for fabricating the same are provided. An exemplary embodiment of a semiconductor device comprises a substrate with a plurality of isolation structures formed therein, defining first and second areas over the substrate. A transistor is formed on a portion of the substrate in the first and second areas, respectively, wherein the transistor in the second area is formed with merely a pocket doping region in the substrate adjacent to a drain region thereof. A first dielectric layer is formed over the substrate, covering the transistor formed in the first and second areas. A plurality of first contact plugs is formed through the first dielectric layer, electrically connecting a source region and a drain region of the transistor in the second area, respectively. A second dielectric layer is formed over the first dielectric layer with a capacitor formed therein, wherein the capacitor electrically connects one of the first contact plugs.Type: ApplicationFiled: September 28, 2006Publication date: April 3, 2008Inventors: Kuo-Chyuan Tzeng, C.Y. Shen, Kuo-Chi Tu, Kuo-Ching Huang, Chih-Yang Chang
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Patent number: 7351637Abstract: A method of forming a channel in a semiconductor device including forming an opening in a masking layer to expose a portion of an underlying semiconductor layer through the opening is provided. The method further includes disposing a screening layer and implanting a first type of ions in the portion of the underlying semiconductor layer through the screening layer and through the opening in the masking layer. A second type of ions are implanted in the portion of the underlying semiconductor layer through the screening layer and through the opening in the masking layer at an oblique ion implantation angle wherein a lateral spread of second type ions is greater than a lateral spread of first type ions. Semiconductor devices fabricated in accordance to above said method is also provided.Type: GrantFiled: April 10, 2006Date of Patent: April 1, 2008Assignee: General Electric CompanyInventor: Jesse Berkley Tucker
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Patent number: 7344947Abstract: Methods fabricate DEMOS devices having varied channel lengths and substantially similar threshold voltages. A threshold voltage is selected for first and second devices. First and second well regions are formed. First and second drain extension regions are formed within the well regions. First and second back gate regions are formed within the well regions according to the selected threshold voltage. First and second gate structures are formed over the first and second well regions having varied channel lengths. A first source region is formed in the first back gate region and a first drain region is formed in the first drain extension region. A second source region is formed in the second back gate region and a second drain region is formed in the drain extension region.Type: GrantFiled: April 27, 2006Date of Patent: March 18, 2008Assignee: Texas Instruments IncorporatedInventors: Victor Ivanov, Jozef Czeslaw Mitros
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Patent number: 7344966Abstract: A manufacturing method for a power device integrated on a semiconductor substrate with double thickness of a gate dielectric layer is described, which comprises the following steps: forming first dielectric portions having a first thickness; forming on the whole semiconductor substrate a first dielectric layer thinner than the first dielectric portions; forming a conductive layer on the first dielectric layer; forming a second dielectric layer on the conductive layer; performing an etching step of the second dielectric layer and of the conductive layer to form first spacers and a gate electrode, to define, between the gate electrode and the substrate, second dielectric portions in the first dielectric layer, the second dielectric portions being auto-aligned with the first portions.Type: GrantFiled: July 29, 2004Date of Patent: March 18, 2008Assignee: STMicroelectronics S.r.l.Inventor: Giuseppe CurrĂ²
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Patent number: 7344934Abstract: A CMOS device with transistors having different gate dielectric materials and a method of manufacture thereof. An aluminum-based material is used as a gate dielectric material of a PMOS device, and a hafnium-based material is used as a gate dielectric material of an NMOS device. A thin layer of silicon a few monolayers or a sub-monolayer thick is formed over the gate dielectric materials, before forming the gates. The thin layer of silicon bonds with the gate dielectric material and pins the work function of the transistors. A gate material that may comprise a metal in one embodiment is deposited over the thin layer of silicon. A CMOS device having a symmetric Vt for the PMOS and NMOS FETs is formed.Type: GrantFiled: December 6, 2004Date of Patent: March 18, 2008Assignee: Infineon Technologies AGInventor: Hong-Jyh Li
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Publication number: 20080054369Abstract: Embodiments discussed herein relate to processes of producing a field stop zone within a semiconductor substrate by implanting dopant atoms into the substrate to form a field stop zone between a channel region and a surface of the substrate, at least some of the dopant atoms having energy levels of at least 0.15 eV below the energy level of the conduction band edge of semiconductor substrate; and laser annealing the field stop zone.Type: ApplicationFiled: August 31, 2006Publication date: March 6, 2008Applicant: INFINEON TECHNOLOGIESInventors: Hans-Joachim Schulze, Frank Pfirsch, Stephan Voss, Franz-Josef Niedernostheide
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Patent number: 7339235Abstract: A fine semiconductor device having a short channel length while suppressing a short channel effect. Linearly patterned or dot-patterned impurity regions 104 are formed in a channel forming region 103 so as to be generally parallel with the channel direction. The impurity regions 104 are effective in suppressing the short channel effects. More specifically, the impurity regions 104 suppress expansion of a drain-side depletion layer, so that the punch-through phenomenon can be prevented. Further, the impurity regions cause a narrow channel effect, so that reduction in threshold voltage can be lessened.Type: GrantFiled: August 9, 2000Date of Patent: March 4, 2008Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Hisashi Ohtani, Jun Koyama, Takeshi Fukunaga
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Patent number: 7335563Abstract: An apparatus and method for manufacturing rotated field effect transistors. The method comprises providing a substrate including a first gate structure and a second gate structure, which are not parallel to each other. The method further includes performing a first ion implant substantially orthogonal to an edge of the first gate structure to form a first impurity region and performing a second ion implant at a direction different than that of the first ion implant and substantially orthogonal to an edge of the second gate structure to form a second impurity region under the edge of the second gate structure.Type: GrantFiled: November 9, 2005Date of Patent: February 26, 2008Assignee: International Business Machines CorporationInventors: Brent A. Anderson, Andres Bryant, Myung-hee Na, Edward J. Nowak
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Publication number: 20080035994Abstract: A semiconductor device and a method of manufacturing the same are provided, capable of minimizing a size of the semiconductor device and inhibiting punch through. According to an embodiment, at least one conductive bar is formed in a substrate between source and drain regions. Thereby, punch through can be inhibited to the utmost to increase breakdown voltage, and thus the electrical properties of the device can be improved. Further, because the punch through is inhibited, the size of the device can be minimized without degrading the electrical properties of the device.Type: ApplicationFiled: July 25, 2007Publication date: February 14, 2008Inventor: Duck Ki Jang
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Patent number: 7323404Abstract: A field effect transistor (FET) and related manufacturing method are disclosed, wherein an active region of a semi-conductor substrate is embossed by a first trench structure. A second trench structure and filling shallow trench insulator laterally defines the active region. Sidewalls of the trenches forming the first trench structure descend to a bottom face with a positive sloped, such that the intersection of the respective sidewalls with the bottom face form an obtuse angle.Type: GrantFiled: March 3, 2005Date of Patent: January 29, 2008Assignee: Samsung Electronics Co., Ltd.Inventor: Jung-Sok Lee
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Patent number: 7320920Abstract: In a non-volatile flash memory device, and a method of fabricating the same, the device includes a semiconductor substrate, a source region and a drain region disposed in the semiconductor substrate to be spaced apart from each other, a tunneling layer pattern, a charge trap layer pattern and a shielding layer pattern, which are sequentially stacked on the semiconductor substrate between the source region and the drain region, adjacent to the source region, a first channel region disposed in the semiconductor substrate below the tunneling layer pattern, a gate insulating layer disposed on the semiconductor substrate between the drain region and the first channel region, a second channel region disposed in the semiconductor substrate below the gate insulating layer, a concentration of the second channel region being different from that of the first channel region, and a gate electrode covering the shielding layer pattern and the gate insulating layer.Type: GrantFiled: April 4, 2005Date of Patent: January 22, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-Su Kim, Sung-Taeg Kang, In-Wook Cho, Jeong-Hwan Yang
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Patent number: 7319061Abstract: In a method for fabricating an electronic device including a transistor with a drain extension structure, a correspondence between a size of a gate electrode of the transistor and ion implantation conditions or heat treatment conditions for forming the drain extension structure is previously obtained. This correspondence satisfies that the transistor has a given threshold voltage. After formation of the gate electrode and measurement of the size of the gate electrode, ion implantation conditions or heat treatment conditions for forming the drain extension structure are set based on the previously-obtained correspondence and the measured size of the gate electrode. Ion implantation or heat treatment for forming the drain extension structure is performed under the ion implantation conditions or heat treatment conditions that have been set.Type: GrantFiled: October 26, 2006Date of Patent: January 15, 2008Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Satoshi Shibata, Fumitoshi Kawase, Hisako Kamiyanagi, Emi Kanazaki
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Patent number: 7309635Abstract: Integrated circuit field effect transistors are manufactured by forming a pre-active pattern on a surface of a substrate, while refraining from doping the pre-active pattern with phosphorus. The pre-active pattern includes a series of interchannel layers and channel layers stacked alternately upon each other. Source/drain regions are formed on the substrate, at opposite ends of the pre-active pattern. The interchannel layers are then selectively removed, to form tunnels passing through the pre-active pattern, thereby defining an active channel pattern including the tunnels and channels including the channel layers. The channels are doped with phosphorus after selectively removing the interchannel layers. A gate electrode is then formed in the tunnels and surrounding the channels.Type: GrantFiled: April 11, 2007Date of Patent: December 18, 2007Assignee: Samsung Electronics Co., LtdInventor: Jin-Jun Park
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Publication number: 20070278565Abstract: In one embodiment, a semiconductor device is formed having sub-surface charge compensation regions in proximity to channel regions of the device. The charge compensation trenches comprise at least two opposite conductivity type semiconductor layers. A channel connecting region electrically couples the channel region to one of the at least two opposite conductivity type semiconductor layers.Type: ApplicationFiled: May 30, 2006Publication date: December 6, 2007Inventors: Shanghui Larry Tu, Gordon M. Grivna
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Publication number: 20070275529Abstract: After protective insulating films are formed on first to third active regions, the protective insulating films formed on the first and third active regions are removed. Subsequently, an insulating film to be a first gate insulating film is formed on each of the first and third active regions, and then, the protective insulating film formed on the second active region is removed. Next, an insulating film to be a second gate insulating film is formed on the second active region, and then, the insulating film to be the first gate insulating film formed on the third active region is removed. Finally, an insulating film to be a third gate insulating film is formed on the third active region.Type: ApplicationFiled: February 6, 2007Publication date: November 29, 2007Inventors: Hideyuki Arai, Takashi Nakabayashi, Yasutoshi Okuno
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Patent number: 7297603Abstract: In one embodiment, a transistor is formed to conduct current in both directions through the transistor.Type: GrantFiled: March 31, 2005Date of Patent: November 20, 2007Assignee: Semiconductor Components Industries, L.L.C.Inventors: Stephen P. Robb, Francine Y. Robb, Robert F. Hightower
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Publication number: 20070252205Abstract: By introducing a atomic species, such as carbon, fluorine and the like, into the drain and source regions, as well as in the body region, the junction leakage of SOI transistors may be significantly increased, thereby providing an enhanced leakage path for accumulated minority charge carriers. Consequently, fluctuations of the body potential may be significantly reduced, thereby improving the overall performance of advanced SOI devices. In particular embodiments, the mechanism may be selectively applied to threshold voltage sensitive device areas, such as static RAM areas.Type: ApplicationFiled: December 13, 2006Publication date: November 1, 2007Inventors: Jan Hoentschel, Andy Wei, Joe Bloomquist, Manfred Horstmann
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Patent number: 7268040Abstract: Disclosed herein is a method of manufacturing a flash memory device.Type: GrantFiled: April 8, 2005Date of Patent: September 11, 2007Assignee: Hynix Semiconductor Inc.Inventor: Keon Soo Shim
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Patent number: 7265012Abstract: Wells are formed in a substrate where standard Vt and low Vt devices of both a first and second type are to be fabricated. Wells defining the locations of first type standard Vt devices are masked, and a first voltage threshold implant adjustment is performed within wells defining the second type standard Vt devices, and each of the first and second type low Vt devices. Wells that define the locations of second type standard Vt devices are masked, and a second voltage threshold implant adjustment is performed to the wells defining the first type standard Vt devices, and each of the first and second type low Vt devices. Doped polysilicon gate stacks are then formed over the wells. Performance characteristics and control of each device Vt is controlled by regulating at least one of the first and second voltage threshold implant adjustments, and the polysilicon gate stack doping.Type: GrantFiled: August 31, 2005Date of Patent: September 4, 2007Assignee: Micron Technology, Inc.Inventors: Mark Helm, Xianfeng Zhou
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Patent number: 7262095Abstract: A semiconductor device includes a substrate, a memory cell formed on the substrate, and a contact to the substrate. The contact is formed in an area away from the memory cell and functions to raise the potential of the substrate.Type: GrantFiled: June 7, 2005Date of Patent: August 28, 2007Assignee: Spansion LLCInventors: Ashot Melik Martirosian, Zhizheng Liu, Mark Randolph
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Patent number: 7262104Abstract: Multiple semiconductor devices are formed with different threshold voltages. According to one exemplary implementation, first and second semiconductor devices are formed and doped differently, resulting in different threshold voltages for the first and second semiconductor devices.Type: GrantFiled: June 2, 2004Date of Patent: August 28, 2007Assignee: Advanced Micro Devices, Inc.Inventors: Haihong Wang, Shibly S. Ahmed, Bin Yu
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Patent number: 7259072Abstract: A method is described to fabricate a MOSFET device with increased threshold voltage stability. After the pad oxide and pad nitride are deposited on the silicon substrate and shallow trenches are patterned and the pad nitride removed. As+ or P+ species are then implanted using low energy ions of approximately 5 keV into the pad oxide. Conventional As+ or P+ implant follows the shallow implant to form the n-wells. With this procedure of forming a sacrificial shallow implantation oxide layer, surface dopant concentration variation at pad oxide:silicon substrate interface is minimized; and threshold voltage stability variation of the device is significantly decreased.Type: GrantFiled: April 21, 2004Date of Patent: August 21, 2007Assignee: Chartered Semiconductor Manufacturing Ltd.Inventors: Yisuo Li, Francis Benistant, Kim Hyun Sik, Zhao Lun
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Patent number: 7259098Abstract: Semiconductor devices and methods for fabricating a semiconductor devices are disclosed. A disclosed method comprises: forming a first gate electrode functioning as a flash memory; forming first spacers on sidewalls of the first gate electrode; forming a second gate electrode functioning as a normal gate electrode; forming a source/drain region with a shallow junction by performing a first ion implantation process using at least one of the first spacers as a mask; forming second spacers on a sidewall of the first spacer and on sidewalls of the second gate electrode; forming a source/drain region with a deep junction by performing a second ion implantation process using the second spacers as a mask.Type: GrantFiled: December 29, 2003Date of Patent: August 21, 2007Assignee: Dongbu Electronics Co., Ltd.Inventors: Seok Su Kim, Chee Hong Choi
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Patent number: 7256093Abstract: A method of forming a device (and the device so formed) comprising the following steps. A structure having a gate structure formed thereover is provided. Respective low doped drains are formed within the structure at least adjacent to the gate structure. A pocket implant is formed within the structure. The structure adjacent the gate structure is etched to form respective trenches having exposed side walls. Respective first liner structures are formed at least over the exposed side walls of trenches. Respective second liner structures are formed over the first liner structures. Source/drain implants are formed adjacent to, and outboard of, second liner structures to complete formation of device.Type: GrantFiled: October 11, 2005Date of Patent: August 14, 2007Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chiu Hung Yu, Yang Chung-Heng, Wu Lin-June
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Publication number: 20070173023Abstract: After gate insulating film formation films are formed in an element formation region of a semiconductor substrate, a gate electrode formation film is formed on the gate insulating film formation films. A fluorine-containing insulting film is formed on the gate electrode formation film. Then, thermal treatment is performed to diffuse and introduce the fluorine contained in the fluorine-containing insulating film to interfaces between the semiconductor substrate and the gate insulting film formation films.Type: ApplicationFiled: October 2, 2006Publication date: July 26, 2007Inventors: Gen Okazaki, Naoki Kotani, Tokuhiko Tamaki, Akio Sebe
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Patent number: 7247541Abstract: A semiconductor device comprises a plurality of gate structures formed on a substrate, a gate spacer formed on a sidewall of the gate structures, a semiconductor pattern formed on the substrate between the gate structures, a first impurity region and a second impurity region formed in the semiconductor pattern and at surface portions of the substrate, respectively, wherein the first and second impurity regions include a first conductive type impurity, and a channel doping region surrounding the first impurity region, wherein the channel doping region includes a second conductive type impurity.Type: GrantFiled: June 30, 2005Date of Patent: July 24, 2007Assignee: Samsung Electronics Co., Ltd.Inventors: Jin-Woo Lee, Cheol-Ju Yun, Hyeoung-Won Seo
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Patent number: 7238563Abstract: A trench isolation region is formed in a surface region of a semiconductor substrate to form a MOS type element region. A mask layer having an opening portion is formed on the semiconductor layer, the opening portion continuously ranging on the entire surface of the MOS type element region and on part of the trench isolation region provided around the MOS type element region. A first impurity ion is implanted into the entire surface via the mask layer to form a peak of the impurity profile is situated in the semiconductor layer under the bottom surface of the shallow trench isolation region. A second impurity ion is implanted into the entire surface via the mask layer to form a peak of the impurity profile is situated on the midway of the depth direction of the trench isolation region. Then, the first and second impurity ions are activated.Type: GrantFiled: March 8, 2004Date of Patent: July 3, 2007Assignee: Kabushiki Kaisha ToshibaInventors: Norihisa Arai, Takeshi Nakano, Koki Ueno, Akira Shimizu
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Patent number: 7235468Abstract: FinFET devices formed with a Silicon On Insulator (SOI) technology with reduced Drain Induced Barrier Lowering (DIBL) characteristics and methods for producing the same. The methods involve dopant implants into the insulator layer, thereby creating borophosphosilicate glass (BPSG) diffusion sources within the insulation layer underlying the active regions of the SOI wafer. Backend high temperature processing steps induce diffusion of the dopants contained in the diffusion source into the active regions, thereby forming a retrograde dopant profile extending towards the channel region. The method can be selectively applied to selected portions of a wafer to tailor device characteristics, such as for memory cells.Type: GrantFiled: August 10, 2005Date of Patent: June 26, 2007Assignee: Micron Technology, Inc.Inventor: Chandra V. Mouli
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Patent number: 7235438Abstract: In one aspect the present invention provides a method for manufacturing a silicon carbide semiconductor device. A layer of silicon dioxide is formed on a silicon carbide substrate and nitrogen is incorporated at the silicon dioxide/silicon carbide interface. In one embodiment, nitrogen is incorporated by annealing the semiconductor device in nitric oxide or nitrous oxide. In another embodiment, nitrogen is incorporated by annealing the semiconductor device in ammonia. In another aspect, the present invention provides a silicon carbide semiconductor device that has a 4H-silicon carbide substrate, a layer of silicon dioxide disposed on the 4H-silicon carbide substrate and a region of substantial nitrogen concentration at the silicon dioxide/silicon carbide interface.Type: GrantFiled: May 5, 2005Date of Patent: June 26, 2007Assignees: Vanderbilt University, Auburn UniversityInventors: Gilyong Chung, Chin-Che Tin, John R. Williams, Kyle McDonald, Massimiliano Di Ventra, Robert A. Weller, Socrates T. Pantelides, Leonard C. Feldman
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Patent number: 7229884Abstract: Integrated circuit field effect transistors are manufactured by forming a pre-active pattern on a surface of a substrate, while refraining from doping the pre-active pattern with phosphorus. The pre-active pattern includes a series of interchannel layers and channel layers stacked alternately upon each other. Source/drain regions are formed on the substrate, at opposite ends of the pre-active pattern. The interchannel layers are then selectively removed, to form tunnels passing through the pre-active pattern, thereby defining an active channel pattern including the tunnels and channels including the channel layers. The channels are doped with phosphorus after selectively removing the interchannel layers. A gate electrode is then formed in the tunnels and surrounding the channels.Type: GrantFiled: November 29, 2004Date of Patent: June 12, 2007Assignee: Samsung Electronics Co., Ltd.Inventor: Jin-Jun Park
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Patent number: 7223660Abstract: The present disclosure relates to a rapid thermal processing system that may be useful for processing semiconductor devices. A flash lamp may be utilized to provide pulse heating of a semiconductor for annealing or other purposes. A sensor may be provided to sense a characteristic of a semiconductor when a pre-pulse is applied to the semiconductor. Subsequent pulses may then be adjusted based on the characteristic sensed by the sensor.Type: GrantFiled: July 31, 2002Date of Patent: May 29, 2007Assignee: Intel CorporationInventor: Jack Hwang
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Patent number: 7220645Abstract: Disclosed is a method of manufacturing a semiconductor device. A plurality of device separation regions are formed in an SOI layer of an SOI substrate, a desired impurity is implanted into a body portion of an Si active layer region, and thereafter a gate electrode is formed with a gate insulation film therebetween. Thereafter, an impurity is implanted into the Si active layer region to form extension portions of source/drain portions, and then an impurity different in polarity from the impurity in the source/drain portions is halo-implanted to form a reverse-characteristic layer. In the halo implantation, the range of projection is set to reach the inside of a buried oxide film. With this configuration, in a fully depleted SOI-MOSFET or the like provided with a thin film SOI layer, it is made possible to simultaneously achieve an improvement of roll-off characteristic and a reduction in parasitic resistance and to secure a sufficient driving capability.Type: GrantFiled: April 15, 2005Date of Patent: May 22, 2007Assignee: Sony CorporationInventor: Kazuhide Koyama
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Patent number: 7217612Abstract: A semiconductor device including: a first gate insulating film which is pattern-formed on an N type well region within a P type semiconductor substrate; a second gate insulating film which is formed on the semiconductor substrate except for this first gate insulating film; a gate electrode, which is formed in such a manner that this gate electrode is bridged over the first gate insulating film and the second gate insulating film; a P type body region which is formed in such a manner that this P type body region is located adjacent to the gate electrode; an N type source region and a channel region, which are formed within this P type body region; and an N type drain region which is formed at a position separated from the P type body region.Type: GrantFiled: March 25, 2004Date of Patent: May 15, 2007Assignee: Sanyo Electric Co., Ltd.Inventors: Eiji Nishibe, Shuichi Kikuchi
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Patent number: 7217627Abstract: The present disclosure provides an example of a semiconductor device. In addition, a method for fabricating a semiconductor device is outlined. The semiconductor device may be fabricated by providing a semiconductor substrate, forming a gate over the substrate, forming diffusion barrier ion regions, forming halo regions, forming a source, and forming a drain.Type: GrantFiled: September 17, 2004Date of Patent: May 15, 2007Assignee: Dongbu Electronics Co., Ltd.Inventor: Hak-Dong Kim
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Patent number: 7217624Abstract: The present invention relates to a non-volatile memory device having conductive sidewall spacers and a method for fabricating the same. The non-volatile memory device includes: a substrate; a gate insulation layer formed on the substrate; a gate structure formed on the gate insulation layer; a pair of sidewall spacers formed on sidewalls of the gate structure; a pair of conductive sidewall spacers for trapping/detrapping charges formed on the pair of sidewall spacers; a pair of lightly doped drain regions formed in the substrate disposed beneath the sidewalls of the gate structure; and a pair of source/drain regions formed in the substrate disposed beneath edge portions of the pair of conductive sidewall spacers.Type: GrantFiled: December 30, 2004Date of Patent: May 15, 2007Assignee: Hynix Semiconductor Inc.Inventors: Kwan-Yong Lim, Heung-Jae Cho, Yong-Soo Kim, Se-Aug Jang, Hyun-Chul Sohn
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Patent number: 7214591Abstract: A HV-MOS device is described, including a substrate, a gate dielectric layer and a gate, a channel region, two doped regions as a source and a drain, a field isolation layer between the gate and at least one of the two doped regions, a drift region and a modifying doped region. The drift region is located in the substrate under the field isolation layer and connects with the channel region and the at least one doped region. The modifying doped region is at the periphery of the at least one doped region.Type: GrantFiled: June 1, 2005Date of Patent: May 8, 2007Assignee: United Microelectronics Corp.Inventor: Jen-Yao Hsu
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Patent number: 7208385Abstract: A structure for making a LDMOS transistor (100) includes an interdigitated source finger (26) and a drain finger (21) on a substrate (15). Termination regions (35, 37) are formed at the tips of the source finger and drain finger. A drain (45) of a second conductivity type is formed in the substrate of a first conductivity type. A field reduction region (7) of a second conductivity type is formed in the drain and is wrapped around the termination regions for controlling the depletion at the tip and providing higher voltage breakdown of the transistor.Type: GrantFiled: April 11, 2005Date of Patent: April 24, 2007Assignee: Semiconductor Components Industries, L.L.C.Inventors: Zia Hossain, Mohamed Imam, Joe Fulton
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Patent number: 7205185Abstract: A double-gate transistor has front (upper) and back gates aligned laterally by a process of forming symmetric sidewalls in proximity to the front gate and then oxidizing the back gate electrode at a temperature of at least 1000 degrees for a time sufficient to relieve stress in the structure, the oxide penetrating from the side of the transistor body to thicken the back gate oxide on the outer edges, leaving an effective thickness of gate oxide at the center, aligned with the front gate electrode. Optionally, an angled implant from the sides of an oxide enhancing species encourages relatively thicker oxide in the outer implanted areas and an oxide-retarding implant across the transistor body retards oxidation in the vertical direction, thereby permitting increase of the lateral extent of the oxidation.Type: GrantFiled: September 15, 2003Date of Patent: April 17, 2007Assignee: International Busniess Machines CorporationInventors: Omer H. Dokumaci, Bruce B. Doris, Kathryn W. Guarini, Suryanarayan G. Hegde, MeiKei Ieong, Erin Catherine Jones
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Patent number: 7202131Abstract: A method of fabricating a semiconductor device is provided, by which leakage current is reduced by minimizing electron or hole density in a source/drain forming a P/N junction with a transistor channel area. The method includes forming a gate insulating layer on a semiconductor substrate, forming a channel ion area in the substrate, forming a gate electrode on the gate insulating layer, forming a sidewall insulating layer on the gate electrode, forming lightly doped regions in the substrate adjacent to the channel ion area and aligned with the gate electrode, forming a spacer insulating layer on the sidewall insulating layer, forming spacers on sidewalls of the gate electrode, and forming heavily doped regions in the substrate aligned with the spacer.Type: GrantFiled: December 29, 2004Date of Patent: April 10, 2007Assignee: Dongbu Electronics Co., Ltd.Inventor: Ki Wan Bang
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Patent number: 7202517Abstract: A multiple gate semiconductor device. The device includes at least two gates. The dopant distribution in the semiconductor body of the device varies from a low value near the surface of the body towards a higher value inside the body of the device.Type: GrantFiled: July 16, 2004Date of Patent: April 10, 2007Assignee: Interuniversitair Microelektronica Centrum (IMEC vzw)Inventors: Abhisek Dixit, Kristin De Meyer
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Patent number: 7195980Abstract: The invention provides a semiconductor device exhibiting a stable and high breakdown voltage, which is manufactured at a low manufacturing cost. The semiconductor device of the invention includes an n-type silicon substrate; a p-type base region in the surface portion of substrate; an n-type drain region in the surface portion of n-type substrate; a p-type offset region in the surface portion of n-type substrate; an n-type source region in the surface portion of p-type base region; a p-type contact region in the surface portion of p-type base region; a gate electrode above the extended portion of p-type base region extending between n-type source region and n-type substrate (or p-type offset region), with a gate insulation film interposed therebetween; an insulation film on gate electrode and p-type offset region; a source electrode on n-type source region; and a drain electrode on n-type drain region.Type: GrantFiled: January 6, 2005Date of Patent: March 27, 2007Assignee: Fuji Electric Co., Ltd.Inventors: Kazuo Matsuzaki, Naoto Fujishima, Akio Kitamura, Gen Tada, Masaru Saito
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Patent number: 7195981Abstract: A method of forming an integrated circuit employable with a power converter. In one embodiment, the method of forming the integrated circuit includes forming a power switch of a power train of the power converter on a semiconductor substrate, and forming a driver switch of a driver configured to provide a drive signal to the power switch and embodied in a transistor. The method of forming the transistor includes forming a gate over the semiconductor substrate, and forming a source/drain by forming a lightly doped region adjacent a channel region recessed into the semiconductor substrate and forming a heavily doped region adjacent the lightly doped region. The method of forming the transistor further includes forming an oppositely doped well within the channel region, and forming a doped region with a doping concentration profile less than the heavily doped region between the heavily doped region and the oppositely doped well.Type: GrantFiled: August 23, 2004Date of Patent: March 27, 2007Assignee: Enpirion, Inc.Inventors: Ashraf W. Lotfi, Jian Tan