Heterojunction Patents (Class 438/94)
  • Patent number: 5766981
    Abstract: Methods for defect-free impurity-induced laser disordering (IILD) of AlGaInP and AlGaAs heterostructures. Phosphorus-doped or As-doped films are used in which silicon serves as a diffusion source and silicon nitride acts as a barrier for selective IILD. High-performance, index-guided (AlGa).sub.0.5 In.sub.0.5 P lasers may be fabricated with this technique, analogous to those made in the AlGaAs material system. The deposition of the diffusion source films preferably is carried out in a low pressure reactor. Also disclosed is a scheme for reducing or eliminating phosphorus overpressure during silicon diffusion into III-V semiconducting material by adding a pre-diffusion anneal step. Defects produced during intermixing are also reduced using a GaInP or GaInP/GaAs cap.
    Type: Grant
    Filed: January 4, 1995
    Date of Patent: June 16, 1998
    Assignee: Xerox Corporation
    Inventors: Robert L. Thornton, Ross D. Bringans, G. A. Neville Connell, David W. Treat, David P. Bour, Fernando A. Ponce, Noble M. Johnson, Kevin J. Beernink
  • Patent number: 5756375
    Abstract: Molecular beam epitaxy (202) with growing layer thickness and doping control (206) by feedback of sensor signals such as spectrosceopic ellipsometer signals based on a process model. Examples include III-V compound structures with multiple AlAs, InGaAs, and InAs layers as used in resonant tunneling diodes and hetrojunction bipolar transistors with doped and undoped GaAs layers, AlGaAs and InGaAs.
    Type: Grant
    Filed: June 14, 1996
    Date of Patent: May 26, 1998
    Assignee: Texas Instruments Incorporated
    Inventors: Francis G. Celii, Walter M. Duncan, Tae S. Kim
  • Patent number: 5663075
    Abstract: A photo FET device having a large area backside optical energy reception surface is disclosed. The photo FET device is fabricated in the source gate and drain upward configuration and then inverted onto a new permanent substrate member and an original surrogate substrate member removed in order to expose the active area backside optical energy reception surface. Electrical characteristics including curve tracer electrical data originating in both dark and illuminated devices and devices of varying size and both depletion mode and enhancement mode operation are also disclosed. Fabrication of the device from gallium arsenide semiconductor material and utilization for infrared energy transducing in a number of differing electronic applications are also disclosed.
    Type: Grant
    Filed: July 14, 1994
    Date of Patent: September 2, 1997
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventor: Gerald D. Robinson
  • Patent number: 5630905
    Abstract: A quantum bridge structure including wires of a semiconductor material such as silicon which are formed by selectively etching a superlattice of alternating layers of at least two semiconductor materials. The quantum bridge is useful as a photo emission device, a photo detector device, and a chemical sensor. The wires exhibit improved electrical conduction properties due to decreased Coulomb scattering.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: May 20, 1997
    Assignee: The Regents of the University of California
    Inventors: William T. Lynch, Kang L. Wang, Martin O. Tanner