Abstract: There is disclosed a resist protective film composition for forming a protective film on a photoresist film, comprising: at least a polymer including a repeating unit having one or more groups selected from a carboxyl group and ?-trifluoromethyl alcohol groups; and an amine compound. There can be provided a resist protective film composition that makes it possible to provide more certainly rectangular and excellent patterns when a protective film is formed on a photoresist film.

Abstract: Disclosed is a water- and oil-repellent agent comprising the following fluorine-containing copolymer (A). The fluorine-containing copolymer (A) comprises: (a1) a fluoroalkyl group-containing polymerizable monomer of the formula: wherein Y is a divalent organic group [for example, an aliphatic group having 1 to 10 carbon atoms, an aromatic or cycloaliphatic group having 6 to 10 carbon atoms, a —SO2N(R1)R2— group (in which R1 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R2 is an alkylene group having 1 to 10 carbon atoms), a —CON(R1)R2— group (in which R1 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R2 is an alkylene group having 1 to 10 carbon atoms), or a —CH2CH(OY1)CH2— group (in which Y1 is a hydrogen atom or an acyl group having 1 to 4 carbon atoms)]; and Rf is a linear or branched fluoroalkyl or fluoroalkenyl group having 1 to 6 carbon atoms; and (a2) vinylidene chloride.

Abstract: A coating composition having (i) an aqueous dispersion of fluoropolymer particles comprising a non-melt processible polymer of tetrafluoroethylene, (ii) a fluorinated surfactant, (iii) a non-ionic non-fluorinated surfactant and (iv) a non-fluorinated polymer, wherein the fluorinated surfactant is selected from fluorinated carboxylic acids or salts thereof of the general formula (I): [Rf—O-L-COO?]iXi+??(I) wherein L represents a linear partially or fully fluorinated alkylene group or an aliphatic hydrocarbon group, Rf represents a linear partially or fully fluorinated aliphatic group or a linear partially or fully fluorinated aliphatic group interrupted with one or more oxygen atoms, Xi+ represents a cation having the valence i and i is 1, 2 or 3.

Abstract: The present invention relates to a polymerizable acrylate compound represented by the general formula (1): (in the formula, R1 represents a hydrogen atom, halogen atom, hydrocarbon group or fluorine-containing alkyl group, R2 and R3 may be different or identical, and each of them independently is a hydrogen atom, fluorine atom, hydrocarbon group optionally branched, fluorine-containing alkyl group, aromatic group, or cyclic structure containing an aliphatic group and may contain oxygen or carbonyl bond) and a polymer compound obtained by using the same.

Abstract: A compound represented by general formula (a-i) below, and a polymeric compound having a structural unit represented by general formula (a-ii) below (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X represents a divalent organic group represented by general formula (x-1) below; and R1 represents an organic group having a fluorine atom).

Abstract: A protective coating composition comprising a polymer of acyl-protected hexafluoroalcohol structure as a base polymer, optionally in admixture with a second polymer containing sulfonic acid amine salt in recurring units is applied onto a resist film. The protective coating is transparent to radiation of wavelength up to 200 nm.

Abstract: A method for polymerizing, in an aqueous medium, at least one fluorinated monomer in the presence of a non-copolymerizable, non-fluorinated surfactant. The surfactant is generally selected from a non-ionic surfactant, a primary anionic surfactant, or a combination thereof. Fluorinated surfactants are not utilized. The resulting partially fluorinated polymer in the aqueous medium is either a semi-crystalline polymer or a crystalline polymer.

Abstract: A PTFE resin does not require the hot coining method and is more difficult to deform than conventional PTFE resins. A polytetrafluoroethylene molded body is obtained from a crosslinking polytetrafluoroethylene that possesses at least one type of reactive functional group selected from the group that comprises cyano group (—CN), a first functional group and a second functional group. The first functional group is represented by: The second functional group is represented by (where R1 and R2 are independently selected from a hydrogen atom, a halogen atom, —OR3, —N(R3)2, and —R3, and where R3 is an alkyl group of from 1 to 10 carbon atoms that optionally contains fluorine or hydrogen atoms). The polytetrafluoroethylene substantially does not flow even when heated up to or above its melting point, and is baked after it is compression molded.

Abstract: A process for producing a polyfluoroalkyl (meth)acrylate, which comprises isolating, from a reaction mixture containing a polyfluoroalkyl (meth)acrylate obtained by reacting a polyfluoroalkyl iodide of the formula CnF2n+1(CH2)mI (wherein n is an integer of from 2 to 7, and m is an integer of from 1 to 4) with a metal (meth)acrylate in tert-butanol, said polyfluoroalkyl (meth)acrylate by the following steps (1) to (3): (1) a step of taking out a crude liquid from the reaction mixture by solid-liquid separation; (2) a step of distilling the crude liquid to separate it into compound group A of compounds having a lower boiling point than the polyfluoroalkyl (meth)acrylate and compound group B of the polyfluoroalkyl (meth)acrylate and compounds having a higher boiling point than the polyfluoroalkyl (meth)acrylate; and (3) a step of distilling and purifying the polyfluoroalkyl (meth)acrylate from the compound group B in the presence of a polymerization inhibitor.

Abstract: The invention relates to a method of treatment of a retroreflective sheet with a treatment composition that comprises a fluorinated compound having one or more silyl groups and an auxiliary compound selected from the group consisting of (i) one or more non-fluorinated compounds of an element M selected from Si, Ti, Zr, B, Al, Ge, V, Pb and Sn and (ii) an organic compound having a Si—H group. The invention also relates to compositions comprising (i) a fluorinated compound comprising one or more silyl groups and (ii) an auxiliary compound selected from the group consisting of organic compounds having a Si—H group.

Abstract: An ink composition is provided that includes a perfluoroalkyl group-containing polymer, a polymerizable monomer, and a radical polymerization initiator, in which at least 80 wt % of the polymerizable monomer is a monofunctional polymerizable monomer selected from the group consisting of a monofunctional acrylate, a monofunctional methacrylate, a monofunctional vinyloxy compound, a monofunctional N-vinyl compound, a monofunctional acrylamide, and a monofunctional methacrylamide.

Abstract: A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.

Abstract: A process comprising polymerizing at least one fluorinated monomer in an aqueous medium containing initiator and polymerization agent to form an aqueous dispersion of particles of fluoropolymer, the polymerization agent comprising: fluoropolyether acid or salt thereof having a number average molecular weight of at least about 800 g/mol; and fluorosurfactant having the formula: [R1—On-L-A?] Y+ wherein: R1 is a linear or branched partially or fully fluorinated aliphatic group which may contain ether linkages; n is 0 or 1; L is a linear or branched alkylene group which may be nonfluorinated, partially fluorinated or fully fluorinated and which may contain ether linkages; A? is an anionic group selected from the group consisting of carboxylate, sulfonate, sulfonamide anion, and phosphonate; and Y+ is hydrogen, ammonium or alkali metal cation; with the proviso that the chain length of R1—On-L- is not greater than 6 atoms.

Abstract: A tool for use in forming moulded articles, the tool comprising a tool body formed of a foamed material, a resinous material on the tool body and elastomeric material between said tool body and resinous material to inhibit the movement of resin from the resinous material into the tool body. The invention also provides a method of manufacturing a tool, a method of moulding articles using such a tool, and elastomeric material for use in forming a tool. One particular application of the tools of the present invention is in the formation or manufacture of moulded articles using curable, resinous composite materials.

Abstract: A material having properties required for a chromatic aberration-free lens and excellent in moldability and impact resistance, which material is an amorphous fluoropolymer containing a carbon atom chain as a main chain and containing a fluorinated atom-bonded carbon atom as a carbon atom of the main chain, wherein vd>75, ?gF>0.50, and ??gF>0.03, where vd represents an Abbe number, ?gF represents a relative partial dispersion of a g-F line, and ??gF represents a deviation from a standard line of the relative partial dispersion of the g-F line.

Abstract: To provide a water/oil repellent composition which can give water/oil repellency to a surface of an article and has excellent durability (wash durability and heavy-rain durability), a method for producing such a composition, and an article which has water/oil repellency and is less susceptible to deterioration of water/oil repellency when it is washed or in heavy rain. A water/oil repellent composition which comprises a copolymer having polymerized units derived from monomer (a), polymerized units derived from monomer (b) and polymerized units derived from monomer (c). Here, monomer (a) is a compound represented by the formula: (Z—Y)nX; wherein Z is a C1-6 perfluoroalkyl group or the like; Y is a bivalent organic group or a single bond; n is 1 or 2; and X is a polymerizable unsaturated group; monomer (b) is a (meth)acrylate having no polyfluoroalkyl group and having an C20-30 alkyl group; and monomer (c) is vinylidene chloride.

Abstract: Lactone-containing compounds having formula (1) are novel wherein A1 is a polymerizable functional group having a double bond, R1 is a monovalent C1-C10 hydrocarbon group in which some or all hydrogen atoms are substituted by fluorine atoms, and W is CH2, O or S. They are useful as monomers to produce polymers for the formulation of radiation-sensitive resist compositions which have high transparency to radiation of up to 500 nm and exhibit good development properties. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography.

Abstract: Polymers for use in photoresist compositions include a repeat unit having a formula of: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm2/s.

Abstract: The optical element of the present invention has a first member and a second member which have been joined in close contact, and has nd1>nd2 and (nF1?nC1)<(nF2?nC2), where the first member is formed of a resin having both a benzene ring and a fluorine atom, or the second member is formed of a resin having an alicyclic structure. It also makes use of an optic-purpose resin precursor composition prepared by mixing a first resin precursor having nd<1.50 and (nF?nC)>0.003 in an uncured state and a second resin precursor having nd<1.62 and (nF?nC)>0.010.

Abstract: To provide a carrier film for a fuel cell production process which is excellent in a recycling property and sufficient handling property in the fuel cell production process. A carrier film for a fuel cell production process, which is made of a fluororesin and has a tensile elastic modulus of at least 1,500 MPa in the machine direction, as measured in accordance with ASTM D882 and a tensile elastic modulus of at least 100 MPa in the machine direction at 150° C., and which preferably has a thickness of from 10 to 300 ?m.

Abstract: A butyl rubber ionomer having improved adhesion to substrates whose surfaces have polar functional groups. Examples of such substrate materials include stainless steel, glass, mylar or Teflon®. The adhesion of the butyl rubber ionomer to the substrate is at least 25% greater than the adhesion of a non-ionomeric butyl rubber to the same substrate surface and with certain substrates is more than 150% greater. The adhesion is improved with increasing levels of multiolefin content in the butyl rubber ionomer. The adhesion is greatest for butyl rubber ionomers having a high multiolefin content (at least 3.5 mol% of multiolefin monomers or at least 1.5 mol % of residual multiolefins). By taking advantage of these high adhesion levels, a composite article can be formed between the butyl rubber ionomer and the substrate.

Abstract: This invention relates to semi-batch type copolymerization processes. More specifically, the processes of the present invention are directed to the production of compositionally uniform copolymers, including the production of such copolymers from dissimilar monomers, e.g., from monomers with significantly different reactivity ratios.

Abstract: The present invention provides a fluorinated surfactant having the general formula: [Rf—(O)t—CQH—CF2—O]n—R—G??(I) wherein Rf represents a partially or fully fluorinated aliphatic group optionally interrupted with one or more oxygen atoms, Q is CF3 or F, R is an aliphatic or aromatic hydrocarbon group, G represents a carboxylic or sulphonic acid or salt thereof, t is 0 or 1 and n is 1, 2 or 3. The surfactant is particularly useful in polymerizing fluorinated monomers in an aqueous emulsion polymerization.

Abstract: Fluoroacrylates comprise the reaction product of: (a) at least one fluorochemical alcohol represented by the formula: CnF2n+1—X—OH wherein: n=1 to 4, R=hydrogen or an alkyl group of 1 to 4 carbon atoms, m=2 to 8, Rf=CnF2n+1, y=0 to 6, and q=1 to 8; (b) at least one unbranched symmetric diusocyanate; and (c) at least one hydroxy-terminated alkyl (meth)acrylate or 2-fluoro acrylate monomer having 2 to about 30 carbon atoms in its alkylene portion.

Abstract: A polymerizable compound having a fluorinated substituent (Z) represented by the general formula (1), an adamantane structure and a polymerizable group (A) having the structure represented by the general formula (1), a production method thereof, and a photoresist composition, a thermocurable resin composition and a photocurable resin composition containing a polymer obtained using the polymerizable compound are provided. Use of the polymerizable compound with the adamantane structure and a resin composition thereof in the present invention provides in the field of photolithography the effect of preventing a liquid immersion medium from penetration and improving dry etching resistance in a liquid immersion exposure method as well as reducing adhesion to a mold and improving dry etching resistance in a nanoimprint method.

Abstract: To provide a novel fluoroadamantane derivative, a novel polymerizable fluoroadamantane derivative and a novel fluoropolymer, and processes for production thereof. To provide the following compound (3), the following compound (4), a polymer obtained by polymerizing the compound (4) and processes for production thereof: provided that Q represents —CHF— or —CF2— (provided that six Qs may be the same or different), Z represents —H, —F or —CH2OH (provided that three Zs may be the same or different), W represents —H or a C1-10 hydrocarbon group, R represents —H, —F, —CH3 or —CF3, and J represents —H, —F, —CHWOH or —CHWOCOCR?CH2 (provided that three Js may be the same or different).

Abstract: There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

Abstract: A process for producing a polymer by polymerizing at least one fluorinated monomer in the presence of a radical initiator and a surfactant in a polymerization medium containing essentially only carbon dioxide. The surfactant is a functional (per)fluoropolyether having recurring units (R1) and at least one functional group containing a heteroatom other than fluorine, the recurring units containing at least one ether linkage in the main chain and at least one fluorine atom. Molded article containing the polymer obtained from the process.

Abstract: The present invention relates to novel 1,4-bis(2-thienylvinyl)benzene derivatives, to conjugated polymers, dendrimers, blends, mixtures and formulations comprising same, and to the use thereof in electronic devices, in particular in polymeric organic light-emitting diodes.

Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.

Abstract: The present invention is directed to novel flame retardant monomers and polymers, wherein the flame retardant properties of the polymers are provided by functionality in pendant groups attached to a polymer backbone (as opposed to the polymer backbone itself possessing flame retardant properties. The present invention is also directed to methods of making such polymers and monomers, and articles of manufacture incorporating such monomers and polymers.

Abstract: An aqueous dispersion of non-melt-processible fluoropolymer, process for making same and concentrated dispersion and powder obtained from the dispersion. The fluoropolymer particles of the dispersion have a standard specific gravity (SSG) of less than 2.225 and comprise a core of high molecular weight polytetrafluoroethylene and a shell of lower molecular weight polytetrafluoroethylene or modified polytetrafluoroethylene. At least about 1.5 weight % of the fluoropolymer particles comprise substantially rod-shaped particles having a length to diameter ratio greater than about 5.

Abstract: A proton conductive graft polymer comprises at least a structure unit of a sulfonated polymer side chain covalently attached to a hydrophobic perfluorocyclobutane polymer main chain. The sulfonated condensation polymer side chain has a high local ion exchange capacity while the main polymer chain is substantially free of sulfonic acid group. A membrane made from the graft polymer can provide good mechanical properties and high proton conductivity at wide range of humidity and temperatures.

Abstract: An ionomer and a process for forming the ionomer such that the ionomer has (1) low equivalent weight (below 950, preferably between 625 and 850, and most preferably between 675 and 800) and (2) high conductivity (greater than 0.13 S/cm). In another embodiment, the invention is an ionomer having (1) low equivalent weight (below 950, preferably between 625 and 850, and most preferably between 675 and 800) and (2) acceptably low hydration (less than about 120 weight percent). These ionomers are capable of being processed into thin film and are extremely well-suited for low humidity or high temperature fuel cell applications.

Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.

Abstract: A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below: wherein R1 is a C1-C20 hydrocarbon group or a C1-C20 hetero hydrocarbon group including at least one hetero atom selected from the group consisting of nitrogen, fluorine and sulfur.

Abstract: A process for preparing a halogenated polymer in a medium comprising liquid or supercritical carbon dioxide, comprising a step involving the radical polymerization of at least one halogenated monomer and at least one step involving cross-flow filtration; and a cross-flow filtration device.

Abstract: A composition comprising (A) at least one fluorinated vinylcyclopropane according to Formula (I) wherein R1 is H or —CO—O—(CH2CH2)p—R7; R2 is H or forms together with R6 a —CH2—C(R9)(R10)—CH2— residue; R3 is H; R4 is H or forms together with R5—CH2—C(R9)(R10)—CH2— residue; R5 is H, —CO—O—R8, —CO—O—(CH2CH2)p—R7 or forms together with R4—CH2—C(R9)(R10)—CH2— residue; R6 is H, —CO—O—R8, —CO—O—(CH2CH2)p—R7 or forms together with R2 a —CH2—C(R9)(R10)—CH2— residue; R7 is perfluorinated C2-C20 aliphatic or alicyclic group; R8 is H, phenyl, benzyl, or a linear or branched C1-C12 aliphatic or alicyclic group; R9 is a H, benzoyl, acetyl or a C1-C5-alkyl group; R10H or a —CO—O—R8; p is 1, 2, 3, or 4, provided that the compound of Formula (I) comprises at least one —CO—O—(CH2CH2)p—R7 residue; (B) at least one non-fluorinated vinylcyclopropane derivative; (C) a bisphenol-A-ether di(meth)acrylate according to Formula (II) wherein R18 is H or CH3, R19 is CH3 or CF3, Y is a C2-C5-alkylen residue which can be substitu

Abstract: The combination of a hinge and an insulated wire is provided, wherein the hinge is capable of closing and opening to an angle of at least 90°, the insulated wire being secured by the hinge so as to fold when said hinge is closed and to unfold when said hinge is opened, the insulation on the wire comprising fluoropolymer, such as tetrafluoroethylene/-hexafluoropropylene copolymer or tetrafluoroethylene/perfluoro(methyl vinyl ether)/perfluoro(propyl vinyl ether) copolymer, each polymer having a melting point of 260 to 290° C. and MIT Flex Life of at least about 15,000 cycles, the hinge being useful in such electronic devices as a laptop computer or a clamshell cell phone, attaching the keyboard and screen portion to one another, the insulation being capable of repeated opening and closing of the hinge without cracking of the insulation.

Abstract: A fluorine-containing photocurable composition containing a (meth)acrylate having a fluorinated alkyl group (A) and a photopolymerization initiator (B). The (meth)acrylate (A) includes a group represented by general formula (1) and two or more (meth)acryloyl groups, and a fluorine atom content in one molecule of the acrylate is 25% by weight or more, and molecular weight of the (meth)acrylate is 500 to 4000 (in the general formula (1), R represents a hydrogen atom or alkyl group having 1 to 4 carbon atoms; X represents an alkylene chain, which may have a hetero atom, or a connecting group represented by the following general formula (2); and Rf represents a fluorinated alkyl group) (in the formula (2), Y represents an oxygen atom or a sulfur atom, m and n are an integer of 1 to 4 which may be the same as or different from each other; and Rf1 is a fluorinated alkyl group).

Abstract: Biomedical devices formed from a polymerization product of a monomeric mixture comprising one or more monomers comprising at least two trifluorovinyl groups are provided. Also provided are biomedical devices formed from a network of a polymer comprising one or more perfluorocyclobutane rings in the polymer backbone wherein the network is formed by crosslinks in the polymer.

Abstract: An ionomer and a process for forming the ionomer such that the ionomer has (1) low equivalent weight (below 950, preferably between 625 and 850, and most preferably between 675 and 800) and (2) high conductivity (greater than 0.13 S/cm). In another embodiment, the invention is an ionomer having (1) low equivalent weight (below 950, preferably between 625 and 850, and most preferably between 675 and 800) and (2) acceptably low hydration (less than about 120 weight percent). These ionomers are capable of being processed into thin film and are extremely well-suited for low humidity or high temperature fuel cell applications.

Abstract: Compositions of fluoroelastomers containing copolymerized units of tetrafluoroethylene, propylene, a first cure site selected from the group consisting of i) trifluoroethylene, ii) 3,3,3-trifluoropropene-1, iii) 1,2,3,3,3-pentafluoropropylene, iv) 1,1,3,3,3-pentafluoropropylene, and v) 2,3,3,3-tetrafluoropropene, and a second cure site selected from the group consisting of i) copolymerized units of a brominated cure site monomer, ii) copolymerized units of an iodinated cure site monomer, iii) copolymerized units of a chlorinated cure site monomer, iv) brominated endgroups, v) iodinated endgroups and vi) a combination of any of i)-v) are readily curable with polyhydroxy curing systems. The resulting cured articles have a combination of excellent resistance to alkaline fluids, superior tensile properties and compression set resistance, and excellent adhesion to metal substrates. Optionally, the fluoroelastomers may be dual cured by both a polyhydroxy system and an organic peroxide system.

Abstract: A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by a general formula (c-1) shown below that is decomposable in an alkali developing solution: wherein R1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(?O)— group in general formula (c-1); and R2 represents an organic group having a fluorine atom.

Abstract: A polymerizable optical composition includes first and second monomers. The weight ratio of the first monomer to the second monomer is from 1:9 to 9:1. The second monomer contains at least one acryl functional group. The first monomer is represented by a formula [A]: wherein R1 is selected from one of O and S atoms; R2 is a bivalent functional group of (C2H4O)n, where n is an integer from 1 to 10; and R3 is selected from one of H and CH3.

Abstract: The present invention relates to a process for preparing a fluoropolymer containing at least one kind of fluoroolefin, which comprises carrying out polymerization in the presence of a surfactant represented by the formula (1): (wherein R1 and R2 may be the same or different respectively, and represent an alkyl group or an alkenyl group, R3 is a hydrogen atom, an alkyl group or an alkenyl group, the total carbon number of R1 to R3 is 2 to 25, L? is a group represented by —SO3?, —OSO3?, —PO3?, —OPO3? or —COO?, and M+ is a monovalent cation). Thereby, polymerization can be carried out with excellent production efficiency in the presence of a small amount of a surfactant, and a fluoropolymer can be prepared without lowering various physical properties such as water resistance by the surfactant.

Abstract: The present invention provides a fluorinated polymer excellent in the crosslinking reactivity, crosslinked rubber physical properties and chemical resistance, and its crosslinked rubber. A fluorinated polymer comprising repeating units (a) based on at least one monomer selected from the group consisting of ethylenic unsaturated compounds each having a hydroxyphenyl group, repeating units (b) based on at least one fluoromonomer selected from the group consisting of tetrafluoroethylene, hexafluoropropylene, vinylidene fluoride, 3,3,3-trifluoropropene, 1,3,3,3-tetrafluoropropene, 1,1,2-trifluoroethylene, vinyl fluoride, 1,2-difluoroethylene and CF2?CF—O—Rf (wherein Rf is a C1-8 saturated perfluoroalkyl group or a perfluoro(alkoxyalkyl) group) and, if necessary, repeating units (c) based on at least one hydrocarbon monomer selected from the group consisting of ethylene, propylene and CH2?CH—O—R1.

Abstract: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

Abstract: A membrane comprising at least two distinct polymeric layers, where one layer includes a fluorine-containing polymer.

Abstract: The present invention relates to a fluoropolymer comprising repeating units derived from one or more gaseous fluorinated olefins and having one or more cure sites comprising (a) a halogen capable of participating in a peroxide cure reaction or (b) a nitrile group, said fluoropolymer further comprising repeating units derived from one or more fluorinated allyl ethers of the formula: CF2?CF—CF(Z)—O—Rf??(I) wherein Z represents F or CF3 and Rf represents a fluorinated alkyl group that may contain one or more catenary oxygen atoms. The fluoropolymer can be cured to a fluoroelastomer. The invention also relates to a curable fluoroelastomer composition comprising the fluoropolymer and a curing agent.