Quality Control Patents (Class 700/109)
  • Patent number: 7038279
    Abstract: A system and method for measuring process parameters in a process machine is described. The system is synchronized to the operation of the process machine so that spurious process parameters events are filtered out.
    Type: Grant
    Filed: October 28, 2002
    Date of Patent: May 2, 2006
    Assignee: Credence Technologies, Inc.
    Inventors: Vladimir Kraz, Kirk Alan Martin
  • Patent number: 7039502
    Abstract: Quantitative Risk Analysis (QRA) can be applied to provide a more realistic assessment of the risk associated with vessel accumulation due to common mode scenarios. The QRA process takes the results of a traditional flare study and QRA inputs such as the frequencies of the common mode scenarios and the layers of protection that will tend to reduce the severity of the common mode scenario, and generates an system risk profile, such as an accumulation versus frequency relationship for each vessel discharging to the relief header. This relationship provides an estimate of the overall risk associated with the relief header system. The QRA program makes the above analysis process possible by automating the generation, execution, and interpretation of the many possible permutations that are required to characterize the system.
    Type: Grant
    Filed: December 29, 2003
    Date of Patent: May 2, 2006
    Assignee: Berwanger, Inc.
    Inventors: Patrick C. Berwanger, Robert A. Kreder, Alexander G. Martin
  • Patent number: 7035810
    Abstract: A feature centric method of and system for monitoring the development and release process of a product, monitoring the development and release of a product, where the product is characterized by having a plurality of features is described. The method steps, which the system is configured to carry out, include enumerating features to be included in the product, enumerating tasks, task milestones, and task milestone completions identified to the features; enumerating required task approvals and feature approvals and completed task approvals and feature approvals, and enumerating required associated activities and completed associated activities. The enumeration preferably includes information to show linkages, associations, priorities, milestones, and missed milestones.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: April 25, 2006
    Assignee: Siebel Systems, Inc.
    Inventor: Mark Robins
  • Patent number: 7016754
    Abstract: Presented are methods and apparatus for controlling the processing of a substrate during a process step that is sensitive to one or more process conditions. One embodiment includes a method performed with corresponding apparatus that includes a controller. One step includes constructing a perturbation model relating changes in control parameters for the apparatus to one or more resulting changes in the process. The method also includes the step of using the perturbation model with at least one of a performance objective and a constraint to derive optimized control parameters for the controller. Another step in the method includes operating the controller with the optimized control parameters. Another embodiment includes an apparatus for processing substrates where the apparatus comprises optimized control parameters.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: March 21, 2006
    Assignee: OnWafer Technologies, Inc.
    Inventors: Kameshwar Poolla, Costas J. Spanos
  • Patent number: 7013193
    Abstract: Interfaces are provided which integrate mistake-proofing concepts in a way easily understandable by the operator and easily configured by a manufacturing engineer. As mistake-proofing concepts are developed tables are populated and associated with specific assembly processes. Sensors are employed to monitor parts selection and tool usage. Sensors used for tool use and parts selection, error messages and actions to be performed or monitored are all defined and related in the tables and in turn to specific assembly orders. The tables are also populated with logic pointers, which are referenced by a Process Logic Control (PLC) unit that has been programmed to recall and carry out infinitely variable monitoring or control of the assembly process. For example when a particular order has been identified to the PLC by way of a scanned barcode or other means, a bill of material and assembly sequence is provided to the operator by appropriate means such as a CRT monitor.
    Type: Grant
    Filed: June 2, 2005
    Date of Patent: March 14, 2006
    Assignee: Deere & Company
    Inventors: Vern Richard Hoppes, Larry Linn Kriener, Matthew Jon Pipho, Joshua Mark Edgin, James Anthony Mitchell, Ibrahim Hussein Shehata, Anthony Nate Rath, Robert Joseph Mills, Michael Eugene Osborn, Mark Douglas Smith, Terry John Phillips, Kevin Dean Bortolazzo, Dave Anthony Sink, Joel Floyd Myers, Kenneth John Kresser, Gary Lee Miner, Lesley Ann McNaught
  • Patent number: 7013194
    Abstract: Interfaces are provided which integrate mistake-proofing concepts in a way easily understandable by the operator and easily configured by a manufacturing engineer. As mistake-proofing concepts are developed tables are populated and associated with specific assembly processes. Sensors are employed to monitor parts selection and tool usage. Sensors used for tool use and parts selection, error messages and actions to be performed or monitored are all defined and related in the tables and in turn to specific assembly orders. The tables are also populated with logic pointers, which are referenced by a Process Logic Control (PLC) unit that has been programmed to recall and carry out infinitely variable monitoring or control of the assembly process. For example when a particular order has been identified to the PLC by way of a scanned barcode or other means, a bill of material and assembly sequence is provided to the operator by appropriate means such as a CRT monitor.
    Type: Grant
    Filed: June 2, 2005
    Date of Patent: March 14, 2006
    Assignee: Deere & Company
    Inventors: Vern Richard Hoppes, Larry Linn Kriener, Matthew Jon Pipho, Joshua Mark Edgin, James Anthony Mitchell, Ibrahim Hussein Shehata, Anthony Nate Rath, Robert Joseph Mills, Michael Eugene Osborn, Mark Douglas Smith, Terry John Phillips, Kevin Dean Bortolazzo, Dave Anthony Sink, Joel Floyd Myers, Kenneth John Kresser, Gary Lee Miner, Lesley Ann McNaught
  • Patent number: 7010374
    Abstract: A method for controlling a semiconductor processing apparatus including a vacuum processing chamber, a plasma apparatus for generating plasma inside the vacuum processing chamber, and a process controller for controlling a process by holding a process recipe including plasma cleaning of inside of the vacuum processing chamber constant, comprises the steps of detecting process abnormality of the process on the basis of sensor data detected by sensors arranged in the semiconductor processing apparatus, and executing a recovery step for removing deposition deposited inside the vacuum processing chamber when abnormality is detected.
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: March 7, 2006
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Junichi Tanaka, Hideyuki Yamamoto, Shoji Ikuhara, Akira Kagoshima
  • Patent number: 7010375
    Abstract: Interfaces are provided which integrate mistake-proofing concepts in a way easily understandable by the operator and easily configured by a manufacturing engineer. As mistake-proofing concepts are developed tables are populated and associated with specific assembly processes. Sensors are employed to monitor parts selection and tool usage. Sensors used for tool use and parts selection, error messages and actions to be performed or monitored are all defined and related in the tables and in turn to specific assembly orders. The tables are also populated with logic pointers, which are referenced by a Process Logic Control (PLC) unit that has been programmed to recall and carry out infinitely variable monitoring or control of the assembly process. For example when a particular order has been identified to the PLC by way of a scanned barcode or other means, a bill of material and assembly sequence is provided to the operator by appropriate means such as a CRT monitor.
    Type: Grant
    Filed: June 2, 2005
    Date of Patent: March 7, 2006
    Assignee: Deere & Company
    Inventors: Vern Richard Hoppes, Larry Linn Kriener, Matthew Jon Pipho, Joshua Mark Edgin, James Anthony Mitchell, Ibrahim Hussein Shehata, Anthony Nate Rath, Robert Joseph Mills, Michael Eugene Osborn, Mark Douglas Smith, Terry John Phillips, Kevin Dean Bortolazzo, Dave Anthony Sink, Joel Floyd Myers, Kenneth John Kresser, Gary Lee Miner, Lesley Ann McNaught
  • Patent number: 7006878
    Abstract: A computer-implemented method for analyzing problem statements. The method includes focusing the problem statement into an operation definition and then assigning a level indicator to the operation definition. The method further includes analyzing the problem statement based on the operational definition and the level indicator in a cost and time effective manner and without the need for an expert to customize an analysis schedule for each problem.
    Type: Grant
    Filed: February 5, 2004
    Date of Patent: February 28, 2006
    Assignee: Ford Motor Company
    Inventors: Evelitsa Schweizerhof, Katherine McRae
  • Patent number: 7006877
    Abstract: A method and a system for automatically recording an intervention in a production facility (1) controlled by a control program (14). The production facility (1) includes a number of facility components (3, 4, 5, 6, 7, 8, 9a–9e). According to the method and the system, information about a status of the facility component(s) (3–5, 6–8, 9a–9e) and information on whether this status exists in accordance with the control program (14) is retrieved from the control program (14, 15) and is recorded if this status does not exist according to the control program.
    Type: Grant
    Filed: August 23, 2004
    Date of Patent: February 28, 2006
    Assignee: Siemens Aktiengesellschaft
    Inventors: Harald Hammon, Werner Hoefler
  • Patent number: 7006948
    Abstract: A method for use in a system for diagnosing the causes of manufacturing defects involves process characterization. A set of forms is identified for a workpiece and for a piece of manufacturing equipment that acts upon the workpiece. The forms for the workpiece are preferably a hierarchic set of geometric forms. Each such geometric form corresponds to an aspect of the action of the manufacturing equipment upon the workpiece. A plurality of measurements is made on a defective workpiece following the hierarchical order of forms. The measurements are compared to a reference datum, and a deviation from the datum is computed. If the deviation exceeds a preselected threshold, an alert condition results, attributable to the action of the manufacturing equipment. Targeted adjustment corresponding to the action that caused the defect can then be made to the equipment.
    Type: Grant
    Filed: November 23, 2004
    Date of Patent: February 28, 2006
    Assignee: Red X Holdings LLC
    Inventor: John R. Allen
  • Patent number: 6999833
    Abstract: The invention provides a computer system for realtime control of machines. The computer system continually switches between a realtime programs EP providing control of peripheral devices A1, An, including control and/or regulation, and other programs within the realtime clock periods. The computer system has communications system KS and a a control system SS connected to the peripheral devices A1, An, particularly motor driver devices, over the communications system KS. A realtime clock signal T is generated from an independent cyclic communications clock T2 of the communications system KS, which has a communications processor KP that operates in realtime. When the control processor SP is remote from the communications processor KP, the realtime clock T may be regenerated an incoming bus clock signal B by a counter Z having upper and lower thresholds K2 and K1.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: February 14, 2006
    Assignee: Siemens Aktiengesellschaft
    Inventors: Jens Jähnicke, Rolf-Dieter Pavlik, Manfred Zäh
  • Patent number: 6993404
    Abstract: A graphical user interface for enabling a user to graphically observe on a displaying mechanism a statistical measure of the process quality of a manufacturing process provides for the display of an icon representing a workpiece. The location and color of the icon on the displaying mechanism indicates the process quality of the manufacturing process for the represented workpiece.
    Type: Grant
    Filed: July 11, 2003
    Date of Patent: January 31, 2006
    Assignee: MKS Instruments, Inc.
    Inventors: Uzi Lev-Ami, Guenter Sifnatsch, Mark Attwood
  • Patent number: 6993408
    Abstract: Paper quality is controlled in the production of a paper web, where paper stock is fed from the headbox of the paper machine onto the wire section, whereby the paper stock is formed into a paper web. The headbox flow rate and consistency are measured from the paper stock fed into the headbox, and the water quantities removed on the wire section during the formation of the paper web are measured on the wire section. In the method, a filler distribution model is established, into which data on the wire section geometry, measured headbox flow rate and consistency and on the water quantities removed on the wire section are entered, and the model is used for establishing an estimate of the filler distribution, and the running values of the paper machine are adjusted on the basis of the estimated filler distribution.
    Type: Grant
    Filed: May 1, 2003
    Date of Patent: January 31, 2006
    Assignee: Metso Paper, Inc.
    Inventor: Ari Puurtinen
  • Patent number: 6993457
    Abstract: A method for determining which component of a multi-component product is responsible for a problem with the product features dismantling first and second products—one exhibiting the problem and one not. One different component from each of the original two samples is then used in building a plurality of new products. The new products are then comparatively tested to determine which component or components caused the problem.
    Type: Grant
    Filed: December 17, 2003
    Date of Patent: January 31, 2006
    Assignee: DaimlerChrysler Corporation
    Inventors: Dale S. Zajac, Todd E. Kerkstra
  • Patent number: 6990383
    Abstract: Interfaces are provided which integrate mistake-proofing concepts in a way easily understandable by the operator and easily configured by a manufacturing engineer. As mistake-proofing concepts are developed tables are populated and associated with specific assembly processes. Sensors are employed to monitor parts selection and tool usage. Sensors used for tool use and parts selection, error messages and actions to be performed or monitored are all defined and related in the tables and in turn to specific assembly orders. The tables are also populated with logic pointers, which are referenced by a Process Logic Control (PLC) unit that has been programmed to recall and carry out infinitely variable monitoring or control of the assembly process. For example when a particular order has been identified to the PLC by way of a scanned barcode or other means, a bill of material and assembly sequence is provided to the operator by appropriate means such as a CRT monitor.
    Type: Grant
    Filed: January 29, 2004
    Date of Patent: January 24, 2006
    Assignee: Deere & Company
    Inventors: Vern Richard Hoppes, Larry Linn Kriener, Matthew Jon Pipho, Joshua Mark Edgin, James Anthony Mitchell, Ibrahim Hussein Shehata, Anthony Nate Rath, Robert Joseph Mills, Michael Eugene Osborn, Mark Douglas Smith, Terry John Phillips, Kevin Dean Bortolazzo, Dave Anthony Sink, Joel Floyd Myers, Kenneth John Kresser, Gary Lee Miner, Lesley Ann McNaught
  • Patent number: 6988017
    Abstract: A method is provided, the method comprising sampling at least one parameter characteristic of processing performed on a workpiece in at least one processing step, and modeling the at least one characteristic parameter sampled using an adaptive sampling processing model, treating sampling as an integrated part of a dynamic control environment, varying the sampling based upon at least one of situational information, upstream events and requirements of run-to-run controllers. The method also comprises applying the adaptive sampling processing model to modify the processing performed in the at least one processing step.
    Type: Grant
    Filed: March 8, 2005
    Date of Patent: January 17, 2006
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Alexander James Pasadyn, Anthony John Toprac, Michael Lee Miller
  • Patent number: 6985786
    Abstract: A method for building a product tracking data history has steps that include installing a remotely operable diagnostic tool on the product which may be remotely operated during the product manufacture process to report certain product specification data. The method also has steps of placing product assembly specifications and performance testing protocols on a central data repository for remote access by the product assembler, thereby reducing data transfer associated costs and efforts and eliminating uncertainties regarding which assembly specifications and performance test protocols are being used by an assembler.
    Type: Grant
    Filed: April 25, 2001
    Date of Patent: January 10, 2006
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventor: Jason Richard Wright
  • Patent number: 6980875
    Abstract: A method is provided for detecting or predicting an undesired deviation in variability of at least one parameter being monitored, wherein the variation in the parameter is incrementally recorded. The method comprises establishing the number of subsets of a dataset that have a range of the difference between any two datapoints within the dataset, and computing a control chart for the range based thereon. The method accurately detects changes in variability in real time. The true distribution of the data is reflected, and the desired result is achieved without requiring an inordinate number of computations.
    Type: Grant
    Filed: April 5, 2004
    Date of Patent: December 27, 2005
    Assignee: University of Kentucky Research Foundation
    Inventor: Arnold J. Stromberg
  • Patent number: 6975974
    Abstract: In the manufacturing of VLSI circuits, production of overlay is a critical step. To obtain a higher resolution and alignment accuracy in microlithographic process, overlay errors must be measured so that overlay errors can be reduced to a tolerable level. This invention provides an overlay error model and a sampling strategy. Utilizing the overlay model and sampling strategy, a device for measuring overlay errors is also designed.
    Type: Grant
    Filed: August 1, 2001
    Date of Patent: December 13, 2005
    Assignee: Macronix International Co., Ltd.
    Inventors: Chen-Fu Chien, Kuo-Hao Chang, Chih-Ping Chen, Shun-Li Lin
  • Patent number: 6975918
    Abstract: The present invention relates to a production system (1) for the series manufacture of products, comprising a processing device (2) which, as a function of control commands, actuates a tool for processing one of the products, a measuring device (3) for the automatic measuring of a geometric actual dimension at one of the processed products, a correcting device (4) which is coupled to the processing device (2) and to the measuring device (3) and which compares the actual dimension with a preset target dimension which lies within a tolerance interval. The correcting device intervenes in a corrective manner in the control commands of the tool if the actual dimension lies outside an intervention interval which lies within the tolerance interval.
    Type: Grant
    Filed: September 10, 2003
    Date of Patent: December 13, 2005
    Assignee: ALSTOM Technology LTD
    Inventor: Christoph Bender
  • Patent number: 6973363
    Abstract: A method of assisting analysis of a production process assisting work for analyzing the relationship between quality factors and characteristic of a product and a program product and a recording medium for the same, comprising receiving a designation of a factor from a user at a computer, arranging images corresponding to said image data related to the received factor in a virtual space in a display device connected to the computer (S13), displaying the virtual space in which the images are arranged in the display device (S14), repeating the designation reception, arrangement, and display until the user judges that there is similarity between adjoining images in the displayed images, receiving designation of at least one image by the user from images having similarity between adjoining images (S15), automatically extracting common factors among factors of the designated image (S16), receiving a hypothesis of a relationship between the common factors designated by the user and quality of products, and verifyin
    Type: Grant
    Filed: May 24, 2005
    Date of Patent: December 6, 2005
    Assignee: Fujitsu Limited
    Inventors: Daiki Masumoto, Yusuke Uehara, Susumu Endo, Shuichi Shiitani, Takayuki Baba, Shigemi Nagata
  • Patent number: 6970759
    Abstract: A process and installation for automatic optimal location of a servicing operation on an integrated circuit. The accessible polygons are retrieved on the basis of topographic descriptive data and data representing the electrical circuit. For each step, different execution options are determined, each corresponding to each of the different accessible polygons, and a rating is calculated and assigned to each execution option as a function of the depth of each possible initial polygon with respect to the access surface, and of accessibility parameters of each possible initial polygon, and the optimal execution option to be used for executing each step of the servicing operation is determined automatically by a numerical optimization calculation using the ratings assigned to the different execution options of each step of the servicing operation.
    Type: Grant
    Filed: April 6, 2001
    Date of Patent: November 29, 2005
    Assignee: Centre National D'Etudes Spatiales (C.N.E.S.)
    Inventors: Romain Desplats, Bruno Benteo
  • Patent number: 6968251
    Abstract: A defect analysis sampling control system comprising a base setting module, a lot setting module, and a work in process (WIP) prediction module. The base setting module is used for choosing and setting a corresponding sampling rule in accordance with different semiconductor products and the lot setting module is used for choosing and setting a corresponding lot sampling rule in accordance with a product lot. The work in process (WIP) prediction module records all WIP products to provide status and progress of the WIP product. The present invention can be applied to a variety of products so as to control and adjust the sampling rule for all products more conveniently and arrange the sampling rules more flexibly.
    Type: Grant
    Filed: August 16, 2004
    Date of Patent: November 22, 2005
    Assignee: Grace Semiconductor Manufacturing Corporation
    Inventors: Chin-Hsiang Lin, Ching-Cheng Shih
  • Patent number: 6968250
    Abstract: A data integrity module and method for evaluating data in a process information database. A neural network generates statistical patterns for specifying patterns for the data being evaluated. A fuzzy expert rules base specifies rules for evaluating the data. A processor, responsive to the rules base and the statistical patterns, identifies suspect data in the process information database by evaluating the data according to the rules base and the statistical patterns. A modification system modifies the suspect data in the process information database.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: November 22, 2005
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Walter Caswell Reade, Douglas Gordon Barron Barber, Paul D. Fuller, Melissa S. Klaips, Charles Earl Markham, Michael Roy Pokorny
  • Patent number: 6965808
    Abstract: A system and method for optimizing metrology sampling rates in an advanced process control (APC) application. A method is provided for processing a run of workpieces, the method comprising the steps of: providing a database comprising subgroups of data representing characteristics from previously processed workpieces; selecting a first subgroup of data having characteristics that satisfy a predetermined criteria; determining processing conditions for a processing tool corresponding to said first subgroup of data; processing the run of workpieces with the process tool using the determined processing conditions; and measuring the run of workpieces according to a sampling rate determined from the first subgroup of data.
    Type: Grant
    Filed: April 28, 2004
    Date of Patent: November 15, 2005
    Assignee: International Business Machines Corporation
    Inventors: Edward W. Conrad, Craig E. Schneider, John S. Smyth, Daniel B. Sullivan
  • Patent number: 6963782
    Abstract: The present invention includes a system and method for fine tuning the control of a manufacturing process. A material adjusting device is in communication with a PID controller and PID control loop, and is used to alter a flow of material used in the manufacturing process, so as to maintain a target physical property of the material at a setpoint. A measurement device captures measurements of the flow relevant to the physical property of interest. A change is introduced to the material adjusting device while the PID controller and PID control loop are disabled, and appropriate measurements of the flow are continually captured; a process that may be repeated several times. Once sufficient physical property measurement data has been captured, the data is loaded into an optimization program that outputs optimized controlled parameters that may be used by the PID controller and control loop to better control the physical property of the material.
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: November 8, 2005
    Assignee: Automation and Control Technology, Inc.
    Inventors: Steve Kieman, David Honigford
  • Patent number: 6961626
    Abstract: A method, system and medium are provided for enabling improved feedback and feedforward control. An error, or deviation from target result, is observed during manufacture of semi conductor chips. The error within standard deviation is caused by two components: a white noise component and a signal component (such as systematic errors). The white noise component is random noise and therefore is relatively non-controllable. The systematic error, in contrast, may be controlled by changing the control parameters. A ratio between the two components is calculated autoregressively. Based on the ratio and using the observed or measured error, the actual value of the error caused by the signal component is calculated utilizing an autoregressive stochastic sequence. The actual value of the error is then used in determining when and how to change the control parameters.
    Type: Grant
    Filed: May 28, 2004
    Date of Patent: November 1, 2005
    Assignee: Applied Materials, INC
    Inventor: Young Jeen Paik
  • Patent number: 6957116
    Abstract: A quality assurance system and method for use between a service provider having a sequence of process stages and a quality assurance stage, and a control center. The service provider performs a plurality of processes on goods at the process stages, transfers engineering data corresponding to the processes to the control center via Internet, and holds the goods at the quality assurance. The control center compares the engineering data with a standard specification, and transfers a confirmation message to the service provider if the engineering data conforms to the standard specification. The service provider may ship the goods to customers after the confirmation message is received.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: October 18, 2005
    Assignee: Taiwan Semiconductor Manufcturing Co., Ltd.
    Inventors: Jung-Yi Tsai, Chao-Yu Chang, Chui-Chung Chiu, Shu-Jung Tseng
  • Patent number: 6947803
    Abstract: A method and an apparatus for affecting dispatch and/or disposition of a workpiece. A process step upon a workpiece is performed based upon a predetermined routing plan. An end-of-line parameter is modeled based upon the process performed upon the workpiece. A workpiece routing/disposition process is performed based upon modeling an end-of-line (EOL) parameter. The workpiece routing/disposition process includes using a controller to modify the routing plan.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: September 20, 2005
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Christopher A. Bode, Alexander J. Pasadyn
  • Patent number: 6946343
    Abstract: A manufacturing method of an integrated chip. The integrated chip includes at least two devices with different functions. The method uses a first production line to form a first device on a semiconductor wafer and then uses a second production line to form a second device on the semiconductor wafer so as to complete the integrated chip.
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: September 20, 2005
    Assignee: United Microelectronics Corp.
    Inventor: Fu-Tai Liou
  • Patent number: 6944516
    Abstract: A method for error proofing body shop component begins by scheduling the production of a vehicle body using an assembly plant controller. A version of a sheet metal component is then selected. The version of the sheet metal component determines what body type will be produced. To insure that the proper body type is being produced, the assembly plant controller verifies the version of the sheet metal component by using a plurality of sensors. If the wrong sheet metal component is detected, then the body shop process is stopped and the wrong sheet metal part is replaced with the correct sheet metal part. Once all correct sheet metal parts are in place, they are spot welded together to produce a vehicle body.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: September 13, 2005
    Assignee: Ford Global Technologies, LLC
    Inventors: Dave Roy Collins, Steve Wendland
  • Patent number: 6941185
    Abstract: A vacuum processing apparatus and method wherein a plurality of processing units are for conducting processing, a transfer processing unit is connected with the plurality of processing units for carrying wafers to the processing units, a transfer device is disposed in the transfer processing unit and carries the wafers and cassettes for containing the wafers, and a control unit is provided for conducting transfer control for transferring the wafers from respective cassettes to the transfer processing unit. The wafers are processed by using the plural processing units, and at least two of the cassettes are used. Parallel processing is conducted of applying same processing to the wafers contained on each of the cassettes by applying the same recipe and the wafers, after applying the parallel processing, are returned to the original cassette.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: September 6, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Kouji Nishihata, Kazuhiro Joo, Shoji Ikuhara, Tetsuya Tahara, Shoji Okiguchi
  • Patent number: 6937965
    Abstract: A method for creating a guardband that incorporates statistical models for test environment, system environment, tester-to-system offset and reliability into a model and then processes a final guardband by factoring manufacturing process variation and quality against yield loss.
    Type: Grant
    Filed: March 7, 2000
    Date of Patent: August 30, 2005
    Assignee: International Business Machines Corporation
    Inventors: Mark R. Bilak, Joseph M. Forbes, Curt Guenther, Michael J. Maloney, Michael D. Maurice, Timothy J. O'Gorman, Regis D. Parent, Jeffrey S. Zimmerman
  • Patent number: 6934595
    Abstract: In a system and method to reduce wafer breakages in a wafer handling system, the position of a wafer on a platen is monitored and closing of the platen on a vacuum chamber is prevented if a misaligned wafer is detected. In one embodiment the wafer position is monitored by monitoring the air pressure in vacuum channels of a platen faceplate.
    Type: Grant
    Filed: February 26, 2003
    Date of Patent: August 23, 2005
    Assignee: National Semiconductor Corp.
    Inventor: Allan Daniel O'Brien
  • Patent number: 6934671
    Abstract: A method of performing model to hardware correlation that simulates models based upon design criteria and manufactures devices based upon the design criteria. The method evaluates features of the devices during the manufacturing to produce in-line test parametric data, compares the models to the in-line test parametric data to obtain correlation data, and modifies the simulating according to the correlation data.
    Type: Grant
    Filed: May 29, 2001
    Date of Patent: August 23, 2005
    Assignee: International Business Machines Corporation
    Inventors: John E. Bertsch, Daniel S. Coops, David M. Fried
  • Patent number: 6934596
    Abstract: A manufacturing system has an inspection data collecting apparatus that is capable of carrying out, upon receipt of a signal containing measurement data in different formats according to the type of inspection or a measuring instrument, processing in accordance with the signal and the format of data to create data in a certain format, and of transmitting a signal for giving an instruction to the measuring instrument in association with the format compatible with the measuring instrument. All data obtained by the inspections in all steps for manufacturing a product is accumulated as inspection data and exchanged among the steps.
    Type: Grant
    Filed: January 14, 2003
    Date of Patent: August 23, 2005
    Assignee: Seiko Epson Corporation
    Inventors: Yoshifumi Yoshida, Koichi Kojima, Yuya Ichikawa, Atsushi Hirai, Hideo Torii
  • Patent number: 6915177
    Abstract: The present invention provides systems and methods that facilitate performing fabrication process. Critical parameters are valued collectively as a quality matrix, which weights respective parameters according to their importance to one or more design goals. The critical parameters are weighted by coefficients according to information such as, product design, simulation, test results, yield data, electrical data and the like. The invention then can develop a quality index which is a composite “score” of the current fabrication process. A control system can then do comparisons of the quality index with design specifications in order to determine if the current fabrication process is acceptable. If the process is unacceptable, test parameters can be modified for ongoing processes and the process can be re-worked and re-performed for completed processes. As such, respective layers of a device can be customized for different specifications and quality index depending on product designs and yields.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: July 5, 2005
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Khoi A. Phan, Bhanwar Singh, Bharath Rangarajan, Ramkumar Subramanian
  • Patent number: 6909926
    Abstract: A production control method manages the development progress of a plurality of products transmitted from production terminals of a plurality of producers, by analyzing components of the products based on standard values, and evaluating the progress in producing the products.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: June 21, 2005
    Assignee: Fujitsu Limited
    Inventor: Kenichi Yoshioka
  • Patent number: 6909933
    Abstract: In the case of a method for the computer-aided monitoring and controlling of a manufacturing process of a plurality of physical objects, the physical objects are subjected to at least one manufacturing step and at least one of the processed physical objects is marked according to a deterministic selection criterion in such a way that it can be subjected to a test measurement. Furthermore, the manufacturing process is controlled on the basis of the result of the test measurement of the marked object.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: June 21, 2005
    Assignee: Infineon Technologies AG
    Inventor: Jörn Maeritz
  • Patent number: 6904384
    Abstract: A complex multivariate analysis system is provided. The system has a storage module, a selecting module, an analyzing module, a correlation searching module and a reporting module. The storage module includes a first database and a second database. The first database records at least two data sets, each of the data sets including a plurality of items associated with a manufacturing process and data of the items. The second database records correlations of the items between the two data sets. The selecting module selects a first item from a first data set. The analyzing module analyzes the first item selected by the selecting module and determines whether the data of the first item conform to specifications or not. The correlation searching module searches the second database when the analyzing module determines that the data of the first item do not conform to the specifications, and selects a second item correlated to the first item from a second data set.
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: June 7, 2005
    Assignee: Powerchip Semiconductor Corp.
    Inventor: Hung-En Tai
  • Patent number: 6898482
    Abstract: The present invention relates to integrated processing and information handling method for poultry items. As the poultry items are conveyed they are assigned to a processing station where they are processed and thereafter assigned to a predetermined collecting bins, which is connected to a computer system. The information related to the number, the weight and the quality of poultry segments are registered and also the processing time. This information is important not only for the operators but also for the control and management where the status of each processing line can be monitored and refined.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: May 24, 2005
    Assignee: Marel hf.
    Inventors: Bjorn Thorvaldsson, Haraldur Gudlaugsson, Petur Gudjonsson, Magnus Rognvaldsson
  • Patent number: 6898478
    Abstract: System, including apparatus and method, for processing a material involves automatically measuring the length of a work piece and calculating an optimal plan for cutting the work piece to fulfill cut list requirements.
    Type: Grant
    Filed: August 20, 2003
    Date of Patent: May 24, 2005
    Assignee: Precision Automation, Inc.
    Inventors: Spencer B. Dick, David Lee, David A. Morgan
  • Patent number: 6895293
    Abstract: Fault detection of a semiconductor processing tool employs several techniques to improve accuracy. One technique is sensor grouping, wherein a fault detection index is calculated from a group of tool operational parameters that correlate with one another. Another technique is sensor ranking, wherein sensors are accorded different weights in calculating the fault detection index. Improved accuracy in fault detection may be accomplished by employing a variety of sensor types to predict behavior of the semiconductor processing tool. Examples of such sensor types include active sensors, cluster sensors, passive/inclusive sensors, and synthetic sensors.
    Type: Grant
    Filed: April 11, 2001
    Date of Patent: May 17, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Terry Reiss, Dimitris P. Lymberopoulos
  • Patent number: 6895295
    Abstract: A method for controlling a processing tool having a plurality of chambers includes processing a wafer in a first chamber of the processing tool; measuring a characteristic of the wafer; and modifying an operating recipe of one of the plurality of chambers based on the measured characteristic. A system for processing semiconductor wafers includes a processing tool, a metrology tool, and a process controller. The processing tool includes a plurality of chambers. The metrology tool is adapted to measure a characteristic of a wafer processed in a first chamber of the processing tool. The process controller is adapted to modify an operating recipe of one of the plurality of chambers based on the measured characteristic.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: May 17, 2005
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Jason A. Grover, Sam H. Allen, Jr., Michael R. Conboy
  • Patent number: 6885904
    Abstract: A control feedback system and method for industrial processes using automated particle or object analysis is disclosed. The control feedback system and method includes a particle characteristic measuring unit to obtain first measured characteristics of a first sample and second measured characteristics of a second sample, the first sample having a substantially different characteristic than the second sample; an optimal characteristic definition for comparison with the first and second measured characteristics; a corrective action database to define and select actions to be taken in response to a comparison of the first and second measured characteristics with the optimal characteristic definition; and a control line network to transfer control signal to a plurality of processing units in response to a selected action to be taken. Other methods and apparatuses are also described.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: April 26, 2005
    Assignee: Advanced Vision Particle Measurement, Inc.
    Inventors: Kenneth John Lieber, Ian B. Browne, John Tuttle
  • Patent number: 6885906
    Abstract: A vacuum processing method and apparatus having one cassette containing wafers which are to be transferred in a preset transferring order to a processing unit via a transfer unit, and another cassette containing wafers to be processed on an emergency basis. Automatic control of processing a wafer from the one cassette is effected, and in response to a request for emergency processing of a water of the another cassette, the automatic processing control of the one wafer from the one cassette is temporarily stopped while completing processing of the wafer of the one cassette returning the same to the one cassette. Emergency processing is initiated by transferring a wafer from the another cassette to the vacuum processing unit via the transfer unit. The processing of the emergency wafer is completed and the processed emergency wafer is returned to the another cassette.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: April 26, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Kouji Nishihata, Kazuhiro Joo, Shoji Ikuhara, Tetsuya Tahara, Shoji Okiguchi
  • Patent number: 6871111
    Abstract: A plasma processing apparatus has a plasma processing chamber having a plasma excitation electrode, a radiofrequency generator connected to the plasma excitation electrode, and a matching circuit for matching the impedance between the plasma processing chamber and the radiofrequency generator. The loss capacitance CX1 at a later time t1 after delivery is measured between the plasma excitation electrode and ground potential positions which are grounded. The performance is evaluated by whether or not the loss capacitance CX1 is less than 26 times the plasma electrode capacitance Ce1 at the later time t1 between the plasma excitation electrode and a counter electrode which cooperate with each other.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: March 22, 2005
    Assignees: Alps Electric Co., Ltd.
    Inventors: Akira Nakano, Tadahiro Ohmi
  • Patent number: 6871113
    Abstract: An interface for a semiconductor fabrication facility which includes a real time dispatch system that provides near real time information regarding processing of semiconductor wafers and a middleware component. The interface includes a real time dispatcher application program interface coupled between the fabrication facility and the middleware component. The real time dispatcher application program interface provides a common interface which provides information to the middleware component.
    Type: Grant
    Filed: November 26, 2002
    Date of Patent: March 22, 2005
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Carmen Adriana Maxim, Donald Craig Likes, Noel Curtis Rives, Marwane Jawad Yazback
  • Patent number: 6868301
    Abstract: A method for operation of an exposure tool in the fabrication of an integrated circuit to control registration between a preceding layer of and a succeeding layer. The preceding layer having a first alignment mark and a first registration mark. The succeeding layer is aligned to the preceding layer using an exposure tool. The succeeding layer has a second alignment mark and a second registration mark. The exposure tool measures alignment of the first alignment mark relative to the second alignment mark. After additional process steps are performed, a measurement tool measures registration relating to relative positions of the first registration mark and the second registration mark. Both the alignment information from the exposure tool and the registration information from the measurement tool is analyzed to determine corrections to improve registration between the layers, and the operation of the exposure tool is altered to improve registration.
    Type: Grant
    Filed: February 11, 2003
    Date of Patent: March 15, 2005
    Assignee: KLA-Tencor Corporation
    Inventor: Moshe E. Preil