Abstract: A system for a computer-controlled measurement of workpieces has at least one measuring machine and a device for entering dimensions of workpieces to be produced as parameters into a database. The system is distinguished in that the measuring strategy of a measuring program can be generated by a computer in dependence on the parameters to be read in from the database and the generated measuring program is converted into a machine-dependent control program of the measuring machine.

Abstract: In one example, the method includes operating a process tool that has a plurality of sensors for sensing at least one parameter associated with the operation of the process tool, obtaining data from the sensors and determining at least one maintenance activity for the process tool based upon the data obtained from the sensors. In another example, data from the sensors is provided to a controller that analyzes the data and indicates desired variations in at least one maintenance activity to be performed on the process tool based upon the analysis of the data. In yet another example, the controller identifies a plurality of maintenance activities to be performed on the process tool based upon the analysis of the data.

Abstract: The profile of an integrated circuit structure is determined by obtaining a measured metrology signal and a first simulated metrology signal, which has an associated profile model of the structure defined by a set of profile parameters. When the two signals match within a first termination criterion, at least one profile parameter is selected from the set of profile parameters. A value for the selected profile parameter is determined. A second simulated metrology signal having an associated profile model of the structure defined by a set of profile parameters with at least one profile parameter equal or close to the determined value for the selected profile parameter is obtained. When the measured and the second simulated metrology signals match within a second termination criterion, values for one or more remaining profile parameters are determined from the set of profile parameters associated with the second simulated metrology signal.

Abstract: A disclosed device eliminates an error in a displacement amount measured value caused by changes over time in a characteristic of a displacement sensor, and can always maintain high accuracy of measurement. When a hydraulic valve, to which the displacement sensor is mounted, is positioned at predetermined positions, output signals from the displacement sensor are acquired as sample values. On the basis of the acquired sample values, a trend of changes over time in the characteristic of the displacement sensor is computed. Settings of a conversion table, which is used for displacement amount computation, are corrected in a direction along the computed trend of changes.

Abstract: A method and apparatus for tracing an edge contour of an object in three dimensional space is provided. The method and apparatus is utilized in a computer vision system that is designed to obtain precise dimensional measurements of a scanned object. In order to save focusing time during an automatic tracing measurement, multiple images may be collected and saved for a number of Z heights for a particular position of the XY stage. These saved images can later be used to calculate a focal position for each edge point trial location in the selected XY area rather than requiring a physical Z stage movement. In addition, a Z height extrapolation based on the Z heights of previous edge points can significantly speed up the searching process, particularly for objects where the Z height change of a contour is gradual and predictable.

Abstract: A method and apparatus for automating the measurement of straightness of linear stock material produced by the operation of a mill. As the linear stock material exits from the mill, sensors acquire a sequence of image or distance measurement pairs associated with the material at discrete longitudinal points over a segment of the material. A processing system utilizes the data pairs to determine a set of centroids for a segment of the material. A virtual axis is identified between centroids associated with the segment, and the processing system determines a measure of deviation of each remaining centroid in a segment from the virtual axis to identify a degree of concavity of the material within the segment, as well as to identify a measure of the angular orientation of the concavity about the virtual axis.

Abstract: The present invention relates to a radar level gauge (1) comprising an antenna (2), a tank sealing (3), an electronics unit (4) and a waveguide feed (5) between the electronics unit (4) and the antenna (2). The waveguide (5) is essentially straight and has a 90°-symmetric cross section and is further arranged to accommodate two essentially orthogonal waveguide modes. The waveguide (5) further has a length (I) below two times the range resolution of said radar level gauge (1). The present invention further relates to a method for improved radar level gauging using a radar level gauge (1) as above.

Abstract: A method for modeling diffraction includes constructing a theoretical model of the subject. A numerical method is then used to predict the output field that is created when an incident field is diffracted by the subject. The numerical method begins by computing the output field at the upper boundary of the substrate and then iterates upward through each of the subject's layers. Structurally simple layers are evaluated directly. More complex layers are discretized into slices. A finite difference scheme is performed for these layers using a recursive expansion of the field-current ratio that starts (or has a base case) at the lowermost slice. The combined evaluation, through all layers, creates a scattering matrix that is evaluated to determine the output field for the subject.

Abstract: An extension unit provided adjacent to an amp unit comprises a measurement data accumulation memory, a measurement data acquiring part for acquiring measurement data coming through a transmission line and accumulating it in the above memory, a data analyzing part for analyzing an accumulated series of measurement data according to predetermined algorithm, a determining part for determining a data analyzed result, and an output part for outputting a control signal corresponding to a determined result to the outside. A plurality of process programs in which measurement algorithm is segmentalized are incorporated in the extension unit and a process program is selected according to a command from a personal computer and the selected process program is performed in a predetermined order.

Abstract: A profile model for use in optical metrology of structures in a wafer is selected based on a template having one or more parameters including characteristics of process and modeling attributes associated with a structure in a wafer. The process includes performing a profile modeling process to generate a profile model of a wafer structure based on a template having one or more parameters including characteristics of process and modeling attributes. The profile model includes a set of geometric parameters associated with the dimensions of the structure. The generated profile model may further be tested against termination criteria and the one or more parameters modified. The process of performing a modeling process to generate a profile model and testing the generated profile model may be repeated until the termination criteria are met.

Abstract: A method of analyzing structural characteristics of sidewall spacers fabricated on a wafer is disclosed. A grating bar having a plurality of grating targets is provided. A theoretical optical scatterometry spectrum is generated by subjecting the grating targets to optical scatterometry. An experimental optical scatterometry spectrum is generated by subjecting the sidewall spacers on the wafer to optical scatterometry. The structural characteristics of the sidewall spacers are equated with the structural characteristics of the grating targets when the theoretical optical scatterometry spectrum substantially matches the experimental optical scatterometry spectrum.

Abstract: A system for assisting shoe selection can select and present a shoe type that fits a customer by estimating the anatomical characteristics of a foot from the state of the foot. The system includes the following: a measured data input portion for measuring and inputting data that show the state of a foot of a person to be measured; a normalization processing portion for normalizing the data input from the measured data input portion and storing the normalized data at least temporarily; a shoe catalog database for storing information of a plurality of types of shoes; and a selection portion for estimating the anatomical characteristics of the foot of the person based on the normalized data, referring to the shoe catalog database based on the anatomical characteristics, and selecting and presenting a shoe type that fits the person.

Abstract: Determining a displacement of a substantially rigid item relative to a frame of reference between a first time and a second time is described. At the first time, a first set of pointwise measurements of a physical property of the item taken at a plurality of fixed locations relative to the frame of reference is acquired. At the second time, a second set of pointwise measurements of the physical property taken at the plurality of fixed locations is acquired. A first matrix derived from the first set of pointwise measurements is compared to a second matrix derived from the second set of pointwise measurements to determine the displacement.

Abstract: Systems and methods that improve process control in semiconductor manufacturing are disclosed. According to an aspect of the invention, conditions in a cluster tool environment and/or a wafer therein can be monitored in-situ via, for example, a scatterometry system, to determine whether parameters associated with wafer production are within control limits. A cluster tool environment can include, for example, a lithography track, a stepper, a plasma etcher, a cleaning tool, a chemical bath, etc. If an out-of-control condition is detected, either associated with a tool in the cluster tool environment or with the wafer itself, compensatory measures can be taken to correct the out-of-control condition. The invention can further employ feedback/feed-forward loop(s) to facilitate compensatory action in order to improve process control.

Abstract: A method and system for analyzing the security of a facility. The security system evaluates whether the elements of a facility comply with security requirements and provides a graphical representation of the facility with the results of the evaluation displayed. The security system provides a user interface through which security personnel can provide information describing the characteristics of each element of a facility. The security system then applies a rule for each security requirement to determine whether each element complies with the security requirement. The security system then displays a map of the facility with elements highlighted to indicate whether they comply with the security requirements.

Abstract: An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter that characterizes the change in intensity of light when reflected on the structure and a polarization parameter that characterizes the change in polarization states of light when reflected on the structure.

Abstract: A method of calibrating an analogue probe (10) having a stylus (12) with a workpiece-contacting tip (14) or a non-contact probe (26). A calibration artefact such as a calibration sphere (16) is mounted on a coordinate measuring machine (CMM) (18). The probe (10,26) is mounted on an arm (8) of the CMM and the probe is moved along a path whilst continually scanning the surface of the calibration artefact such that the probe is exercised throughout its working range. For an analogue probe (10) having a workpiece-contacting stylus (12), the path is such that the deflection of the stylus varies along the path. For a non-contact probe (26) the path is such that there is variation of the radial distance between the path and the calibration artefact. The probe path may comprise a path parallel to a chord of the calibration sphere or a curved, e.g. a sinusoidal, path.

Abstract: A portable coordinate measurement machine comprises an articulated arm having jointed arm segments. The arm includes a measurement probe having an integrated line laser scanner rotatably mounted thereon.

Abstract: The inherent smoothing in bending stiffness measurement of wood boards as occurs in the machine grading of lumber can mask the effect of knots and other local characteristics affecting structural value. Improved estimates of local (pointwise) stiffness will be useful in decisions about further processing and use of a tested board. Measured compliance is reciprocally related to measured stiffness and is the convolution of local compliance and a “span function”. Span function is specific to the bending span configuration used and can change during measurement of a board. A general procedure for computing span function, which heretofore has been known only for simple bending spans, is disclosed. A Kalman filter uses this and other available information to optimally estimate local compliance from an observed relationship between local compliance and state variables of a state-space model. Method for linear algebraic determination of local compliance also depends on span functions and is disclosed.

Abstract: A reduced multicubic database interpolation method is provided. The interpolation method is designed to map a function and its associated argument into an interpolated value using a database of points. The database is searched to locate an interpolation cell that includes the function argument. The interpolation cell is used to transform the function argument to reflect translation of the interpolation cell to a unit cell. The interpolated value is then generated as a cubic function using the data points that correspond to vertices of the unit cell. All of the derivatives in the cubic function are simple and the interpolation accuracy order is higher than first-order.

Abstract: A method for modeling optical scattering includes an initial step of defining a zero-th order structure (an idealized representation) for a subject including a perturbation domain and a background material. A Green's function and a zero-th order wave function are obtained for the zero-th order structure using rigorous coupled wave analysis (RCWA). A Lippmann-Schwinger equation is constructed including the Green's function, zero-th order wave function and a perturbation function. The Lippmann-Schwinger equation is then evaluated over a selected set of mesh points within the perturbation domain. The resulting linear equations are solved to compute one or more reflection coefficients for the subject.

Abstract: Systems and methods for measuring a contour match between adjacent components are disclosed. In one embodiment, at least two pressure sensors are located between adjacent components. Each pressure sensor is adapted to obtain a pressure measurement at a location a predetermined distance away from the other pressure sensors, and to output a pressure measurement for each sensor location. An output device is adapted to receive the pressure measurements from at least two pressure sensors and display the pressure measurements. In one aspect, the pressure sensors include flexible thin film pressure sensors. In accordance with other aspects of the invention, a method is provided for measuring a contour match between two interfacing components including measuring at least one pressure applied to at least one sensor between the interfacing components.

Abstract: A coordinate measuring apparatus includes probe pin(s) fixed to a probe head displaceable in coordinates. The probe pin includes probe shafts having respective ends to which probe balls are attached. At least two of the probe shafts are differently oriented when the probe pins are fixed to the probe head. A control and evaluation unit controls the course of measurement and evaluates the measuring points recorded. At least one probe shaft is determined for measuring a geometric element on a workpiece by determining at least one characteristic piece of directional information for the points to be measured of a geometric element to be measured on the workpiece, either on the basis of the measured measuring points or according to predefined nominal data of the geometric element. At least one probe shaft for measuring the measuring points is determined from the directional information.

Abstract: The present invention is concerned with a computer-aided method for the provision, identification and description of molecules exhibiting a desired behaviour, more particularly in the pharmaceutical sector, employing a molecular modelling step, a combinatorial library building step and a step of selecting potentially useful molecules, said method including a step whereby the candidate molecules are filtered using a dynamic filter representing constraints of conformational variations which the molecules must satisfy in order to exhibit said activity.

Abstract: The present invention relates to a method of determining the growth of trees based on first and second measurement data obtained at different moments of time by utilizing a laser scanner located above the measured trees. In order to determine the growth of a large number of trees as fast and as easy as possible, said method comprises: processing said first measurement data in order to determine the location of tree locations (A), processing said second measurement data in order to determine the location of tree locations (B), determining the locations which are tree locations according to the results of both said first and second processing (C), and calculating the growth of trees at said determined locations by determining the difference in the size indicated by the second measurement data as compared to the size indicated by said first measurement data (D).

Abstract: A pagewidth printhead assembly (1) includes at least one pagewidth printhead received in a printhead supporting shell (4). The shell comprises a longitudinal laminated structure defining an interior space and formed from continuous layers of at least two materials (10,11). The layers are odd in number and disposed symmetrically about a central layer (10).

Abstract: A method of substrate eccentricity detection includes includes determining at least three positions on a perimeter of a first substrate, grouping the at least three perimeter positions to define one or more circles, estimating a location of a center of the first substrate as the location of a center of a predetermined circle approximated from the at least three perimeter positions, and determining an eccentricity vector as a difference between the estimated location and a reference position on a substrate transport mechanism on which the first substrate rests.

Abstract: A setting device for a vehicle having a mechanically adjustable part in which a sensor assigned to the mechanically adjustable part generates sensor signals corresponding to the positions of the part. An initial range of the sensor values is assigned to an inoperative position of the part and covers the varying initial positions of the part. An evaluation device stores a longer constant signal in the initial range as an intermediate value. A longer constant sensor signal is compared with the intermediate value after the initial range is exceeded and after the subsequent return into this range. If it is established that both values are approximately of the same magnitude, the evaluation device stores this value as an initial value. As a result, the inoperative position of the part is reliably verified without the use of additional auxiliary components or steps.

Abstract: A non-contact measurement system employing a non-contact optical sensor and an edge detection sensor with a positioning system for moving the sensors over the surface and edges of a part (A) held in a predetermined, fixed position. The part is aligned in a co-ordinate system for obtaining accurate measurements of the part's surface (S) and edges (E). For parts smaller than the optical sensor's field of view, the part is rotated about an axis so both sides of the part are viewed by the sensor. If required, the part can also be shifted linearly along a horizontal axis (X) parallel to the sensor. For parts larger in size than the sensor's field of view, the part is moved along a vertical axis (Y) in predetermined segments so all of the part is exposed to viewing by the sensor.

Abstract: A method and apparatus describing a device for tracking moving objects or persons are taught. The invention is an embedded system using a series of sensors such as light sensors along a passageway to determine some movement characteristics such as number, size, direction, speed and position of objects or people along the passageway. One embodiment of this invention is in fare gates for public transport systems. Another aspect of this invention is the algorithm that determines the movement characteristics using the overlaps or intersections of rising edge, on state, falling edge and off state of signals from the sensors to determine the movement characteristics of objects or humans. The simplicity and robustness of the algorithm allow implement of the invention with inexpensive programmable logical controllers without the need of control by expensive computers. This invention also avoids the attendant disadvantages of other systems using cameras, computer vision or mechanical sensors.

Abstract: A computerized method is disclosed for determining the size and location effects of simulated or manufactured features on an object, determining the transformation of a pattern of features, determining usable feature size within a pattern of features, and determining the remaining feature tolerances. The simulated or manufactured position of a pattern of features is used to determine how to translate a tolerance zone framework. Positional errors and remaining feature tolerances are determined relative to the translated design framework.

Abstract: A thermographic infrared apparatus and method for seeing, and thus measuring, a foot inside of a shoe. The apparatus includes one or more thermographic instruments aimed at a base for capturing one or more thermographic images or fields of view of a shoe on the base and thus the heat transferred to the shoe from the foot. The apparatus further includes a display mounted above the base and aimed at the eye level of a person standing on the base such that the person can determine from the thermographic image how well the shoe or shoes fit. The method includes one or more of the steps of taking a thermal infrared image of a shoe on a foot, taking a thermal infrared image of a foot having no shoe thereon, taking a thermal infrared image of a shoe having no foot therein, taking a thermal infrared image from a first direction, taking a thermal infrared image from a second direction to capture surfaces hidden from the first direction, and then comparing one or more of the thermal infrared images.

Abstract: A method of predicting a displacement range of a wire harness, includes the steps of: designing a basic route of the wire harness; fixing the wire harness at least two different fixing points on the basic route; computing a displacement range of the wire harness between the fixing points, based on a length of the basic route between the fixing points including a dimensional tolerance, fixing positions and fixing directions of the wire harness at the fixing points, and a minimum bending radius of the wire harness; and displaying the displacement range of the wire harness in three dimensions.

Abstract: The present invention relates to determining the location of a defect source which results in a localized elevation on the surface topography of a substrate such as, for example, a silicon wafer. The wafer is placed on a chuck of a semiconductor process tool such as, for example, a photolithographic tool. The upper surface of the wafer is processed by the photolithographic tool to obtain topography measurements. The topography measurements are analyzed to detect the presence of the localized elevation on the upper surface of the wafer. Once the presence of the localized elevation is detected, calculations are performed using the topography measurements to determine whether the source of the localized elevation results from the chuck.

Abstract: A portable coordinate measurement machine comprises an articulated arm having jointed arm segments. The arm includes a measurement probe having an integrated line laser scanner rotatably mounted thereon.

Abstract: The present invention includes a system and method for fine tuning the control of a manufacturing process. A material adjusting device is in communication with a PID controller and PID control loop, and is used to alter a flow of material used in the manufacturing process, so as to maintain a target physical property of the material at a setpoint. A measurement device captures measurements of the flow relevant to the physical property of interest. A change is introduced to the material adjusting device while the PID controller and PID control loop are disabled, and appropriate measurements of the flow are continually captured; a process that may be repeated several times. Once sufficient physical property measurement data has been captured, the data is loaded into an optimization program that outputs optimized controlled parameters that may be used by the PID controller and control loop to better control the physical property of the material.

Abstract: The present invention relates to a method for measuring the shape of a foot by means of comparing the shape of the foot with the shape of the reference foot. This is done by fitting a reference shoe to the foot, locating the area wherein the foot and the reference shoe do not coincide, selecting appropriate filler units for the located area and attaching the filler unit to a corresponding area of a shoe last and reforming the shape of the reference shoe by fitting the reference shoe to the shoe last. This is repeated until the reference shoe and the foot fit together.

Abstract: An apparatus, method, and system for determining the shape of a three dimensional object. In a preferred embodiment, the apparatus includes an array of sensors and elastic connections between the sensors within the array. When placed over a three dimensional object, the array of sensors deforms to conform to the surface topology of the three dimensional object. The sensors are connected to a data processor in which the data from the sensors is taken to construct a three-dimensional representation of the actual physical three dimensional object.

Abstract: A reduced multicubic database interpolation method is provided. The interpolation method is designed to map a function and its associated argument into an interpolated value using a database of points. The database is searched to locate an interpolation cell that includes the function argument. The interpolation cell is used to transform the function argument to reflect translation of the interpolation cell to a unit cell. The interpolated value is then generated as a cubic function using the data points that correspond to vertices of the unit cell. All of the derivatives in the cubic function are simple and the interpolation accuracy order is higher than first-order.

Abstract: A method of generating a library of simulated-diffraction signals (simulated signals) of a periodic grating includes obtaining a measured-diffraction signal (measured signal). Hypothetical parameters are associated with a hypothetical profile. The hypothetical parameters are varied within a range to generate a set of hypothetical profiles. The range to vary the hypothetical parameters is adjusted based on the measured signal. A set of simulated signals is generated from the set of hypothetical profiles.

Abstract: A method uses three dimensional feature metrology for implementation of critical image control and feedback of lithographic focus and x/y tilt. The method is for measuring 3 dimensional profile changes in a photo sensitive film and feeding back compensatory exposure tool focus corrections to maintain a stable lithographic process. The measured focus change from the optimal tool focus offset is monitored directly on the critical product images for both contact hole and line images. Z Focus corrections and x/y tilt corrections are fed back independently of dose to maintain critical dimension (CD) control. Additionally, the method can be used to diagnose problems with the focusing system by measuring the relationship between line edge width and barometric pressure.

Abstract: Electron beam lithography tool image quality evaluating and correcting including a test pattern with a repeated test pattern cell, an evaluation method and correction program product are disclosed. The test pattern cell includes a set of at least three elongated spaces with each elongated space having a different width than other elongated spaces in the set such that evaluation of a number of space widths in terms of tool image quality and calibration can be completed. The evaluation method implements the test pattern cell in a test pattern in at least thirteen sub-field test positions across an exposure field, which provides improved focus and astigmatism corrections for the lithography tool. The program product implements the use of corrections from the at least thirteen sub-field test positions to provide improved corrections for any selected sub-field position.

Abstract: A device includes a shape measuring section 350 for measuring shape data from a pair of stereovision images of an object taken with an image taking section 2209 a memory section 340 for storing target data related to the images of the object; an image display section 330 for superposing the paired stereovision images of the object and the stereovision target data image based on the target data and for displaying the images; and a comparison display processing section 360 for comparing the shape data of the object measured by the shape measuring section 350, with the target data and reflecting the results of the comparison on the superposed display on the image display section 330.

Abstract: The back-and-forth length and right-to-left width of the head of a helmet wearer are input to a computer and data-processed, so that the type of a helmet size that matches the helmet wearer and its matching data are selected and displayed on a computer window or the like. A helmet of a size that matches the helmet wearer can be obtained easily together with its matching data. Even when a helmet wearer having a head shape different from an average human head shape is to wear a helmet, the helmet can be matched to the head of the helmet wearer substantially optimally by only performing comparatively simple size adjusting operation in accordance with the matching data.

Abstract: A method for determining roll density in connection with a web reel. A known relation between the length (l), diameter (D), basis weight (b) and density (?) of the wound roll, formula (1) is used. Distortions caused in the measurement results by noise and other disturbances are eliminated by using a recursive time variant least squares method in the processing of the measurement results l=??(D2?D20)/4b.

Abstract: A tire plus-sizing software program for receiving data input and displaying data output for six different screens that can be used to correctly determine and convert tire and wheel information to correctly select proper tires and wheels for plus-sizing personal vehicles. The program provides information regarding the types of tires that can be used to “plus-size” tires for a given vehicle, i.e., to increase the wheel diameter without changing the tire diameter. The resulting vehicle with the “plus-sized” tires has improved vehicle performance, handling and appearance when compared with the original equipment wheels and tires.

Abstract: A method uses three dimensional feature metrology for implementation of critical image control and feedback of lithographic focus and x/y tilt. The method is for measuring 3 dimensional profile changes in a photo sensitive film and feeding back compensatory exposure tool focus corrections to maintain a stable lithographic process. The measured focus change from the optimal tool focus offset is monitored directly on the critical product images for both contact hole and line images. Z Focus corrections and x/y tilt corrections are fed back independently of dose to maintain critical dimension (CD) control thereby achieving improved semiconductor wafer printing. Additionally, the method can be used to diagnose problems with the focusing system by measuring the relationship between line edge width and barometric pressure.

Abstract: A method for determining the centroid of a wafer target. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a target set formed therein. Next, a signal is passed over the target set and over a material separating target shapes in the target set. Then a return signal is reflected, and received, from the surface of the target shapes and the material separating them. A location of at least one maxima point of the return signal is identified. Finally, a centroid is determined as the median of the locations of at least one maxima point.

Abstract: A method and system for testing a target object for compliance with existing geometric dimension and tolerance requirements includes: measuring a selected feature of the target and entering the existing geometric dimension and tolerance requirements into a user interface. Entering includes selecting an icon containing a graphic symbol representative of a geometric dimension and tolerance characteristic.

Abstract: An apparatus for measuring a shape of lens frames capable of measuring precisely the shape of lens frames by changing a rotational speed or rotational direction of a measuring element (feeler) 216 in accordance with the shape of lens frames. The measuring element 216 contacts with V-shaped grooves (grooves for lens frames) 51 provided in lens frames LF and RF of an eyeglass frame MF. An arithmetic control circuit 270 controls variably the rotational speed or rotational direction of the measuring element 216.