Target profile for a physical vapor deposition chamber target

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;

FIG. 2 is a bottom perspective view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a front elevational view thereof;

FIG. 8 is a back elevational view thereof; and,

FIG. 9 is an enlarged cross sectional view taken along line 9-9 in FIG. 4.

The dashed lines of the cut line showing the plane upon which FIG. 9 is taken in FIG. 4 forms no part of the claimed design.

Claims

The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

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Patent History
Patent number: D851613
Type: Grant
Filed: Oct 5, 2017
Date of Patent: Jun 18, 2019
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: William Johanson (Gilroy, CA), Kirankumar Savandaiah (Bangalore), Anthony Chih-Tang Chan (Sunnyvale, CA), Siew Kit Hoi (Singapore), Prashant Prabhakar Prabhu (Karwar)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/621,221