Abstract: Embodiments relate to a sense amplifier circuit and a data read method. The sense amplifier circuit includes: a first P-type transistor connected to a first signal terminal; a second P-type transistor connected to a second signal terminal; a first N-type transistor connected to a third signal terminal; a second N-type transistor connected to a fourth signal terminal; a first offset cancellation subcircuit configured to connect a first read bit line to a second complementary read bit line in response to a first offset cancellation signal; a second offset cancellation subcircuit configured to connect a first complementary read bit line to a second read bit line in response to a second offset cancellation signal; a first write-back subcircuit configured to connect the first complementary read bit line to the second complementary read bit line in response to a first write-back signal; and a second write-back subcircuit.

Abstract: The present disclosure provides a method of manufacturing a buried bit line structure and a buried bit line structure. The method of manufacturing a buried bit line structure includes: providing an initial structure, the initial structure including active region structures; forming an initial bit line trench, the initial bit line trench exposing the active region structure; forming a conductive structure, the conductive structure being located at the bottom of the initial bit line trench; forming a bit line contact structure, the bit line contact structure covering the conductive structure, and a top surface of the bit line contact structure being lower than a top surface of the active region structure; and forming an insulation structure, the insulation structure covering the bit line contact structure.

Abstract: The present application provides a sense amplifier, a memory, and a control method. The sense amplifier includes: an amplification module, configured to amplify a voltage difference between a bit line and a reference bit line when the sense amplifier is at an amplification stage; and a controlled power module, connected to the amplification module, and configured to: determine a drive parameter according to a rated compensation voltage range between the bit line and the reference bit line, and supply power to the amplification module according to the drive parameter, so as to control the amplification module to pull a compensation voltage between the bit line and the reference bit line to be a rated compensation voltage at an offset cancellation stage, where the rated compensation voltage is within the rated compensation voltage range.

Abstract: Embodiments relate to a test method, a computer apparatus, and a computer-readable storage medium. The test method includes: writing first data into a target memory cell; performing reverse writing on the target memory cell; reading second data stored in the target memory cell after the reverse writing; determining whether the second data are the same as the first data; and determining that write recovery time of the target memory cell fails when the second data are the same as the first data. The present disclosure can make an effective test of determining whether the write recovery time fails.

Abstract: The present invention provides a semiconductor device comprising a storage chip and a temperature detection module for detecting a temperature of the storage chip. When the temperature detected by the temperature detection module reaches a set threshold, the storage chip is activated. The present invention utilizes the temperature detection module to detect the temperature of the storage chip so as to provide a reference for the activation and operation of the storage chip, avoiding the activation and operation of the storage chip under low temperatures, shortening write time, and improving the stability of the storage chip write; the temperature detection module has a simple circuit structure and is easy for implementation, with a small occupied area, exerting no influence on the active area of the storage chip.

Abstract: Provided are a semiconductor structure and a method for manufacturing the semiconductor structure. The semiconductor structure includes a substrate in which a capacitor structure is formed, and the capacitor structure includes a lower electrode plate, a dielectric layer, an upper electrode plate and a protective layer. The lower electrode plate is located on the substrate. The dielectric layer covers a surface of the lower electrode plate. The upper electrode plate covers the dielectric layer. The protective layer is formed on a surface of the upper electrode plate parallel to the substrate.

Abstract: Provided are a semiconductor structure and a method for manufacturing the same. The semiconductor structure includes: a base; a bit line; and a semiconductor channel including a first doped region, a channel region, and a second doped region that are sequentially arranged, where the first doped region contacts the bit line, and the first doped region, the channel region, and the second doped region are doped with first-type doped ions. The channel region is further doped with second-type doped ions, enabling a concentration of majority carriers in the channel region to be less than a concentration of majority carriers in the first doped region and a concentration of majority carriers in the second doped region. The first-type doped ions are one of N-type ions or P-type ions, and the second-type doped ions are the other of N-type ions or P-type ions.

Abstract: A semiconductor structure and a manufacturing method thereof are provided, which relates to the field of the semiconductor. The method of manufacturing the semiconductor structure includes: providing a substrate; forming a gate trench on the substrate; forming a barrier layer at least covering the inner wall of the gate trench in the gate trench; removing chloride ions remaining in the barrier layer by a plasma ion implantation, and forming a first barrier layer and a second barrier layer by the barrier layer, the concentration of nitrogen ions in the first barrier layer is different from the concentration of nitrogen ions in the second barrier layer; and forming a gate structure in the gate trench.

Abstract: A semiconductor device and cleaning system are provided. The semiconductor device includes: a device chamber, supporting column and bearing platform in the device chamber, the supporting column being configured to support the bearing platform; and an air outlet, first and second air inlet assemblies on the device chamber, the first and second air inlet assemblies being configured to introduce clean gas into the device chamber, and the air outlet being configured to discharge gas in the device chamber. The first and second air inlet assemblies are separately provided on the device chamber on the upper and lower sides of a bearing surface of the bearing platform; and one of the first and second air inlet assemblies is configured to clean the device chamber on a side of the bearing surface away from the supporting column, and other is configured to clean a gap between the supporting column and device chamber.

Abstract: The present disclosure relates to a method of forming a sense amplifier and a layout structure of a sense amplifier. The method includes: providing a first active region pattern layer, the first active region pattern layer includes a bridge pattern, and a first active region pattern region and a second active region pattern region; the first active region pattern region includes a first active region pattern for defining a first pull-down transistor of a first memory cell structure; the second active region pattern region includes a first symmetrical active region pattern for defining a second pull-down transistor of a second memory cell structure; and the first active region pattern and the first symmetrical active region pattern are adjacent to each other and connected through the bridge pattern, a source of the first pull-down transistor and a source of the second pull-down transistor are electrically connected through the bridge pattern.

Abstract: Provided is a semiconductor structure, a memory cell and a memory array. An nT-MRAM can be realized by a relatively simple structure. Transistors connected to multiple MTJs are connected by connecting pads.

Abstract: A semiconductor manufacturing method includes: providing a semiconductor substrate, in which the semiconductor substrate includes an array region and a peripheral circuit region, in the array region, multiple capacitor contact holes are on the semiconductor substrate, and a first conductive layer is deposited on a bottom of each of the capacitor contact hole, and in the peripheral circuit region, a device layer is on the semiconductor substrate; treating the first conductive layer to increase its roughness; forming wire contact holes exposing the semiconductor substrate in the peripheral circuit region; forming a transition layer that at least covers a surface of the first conductive layer and a surface of the semiconductor substrate exposed by the wire contact holes; and forming a second conductive layer that covers the transition layer, and fills the capacitor contact holes and the wire contact holes.

Abstract: A memory and a method for manufacturing the same are provided. The memory includes a substrate; at least one pair of transistors on a surface of the substrate, in which conductive channels of the transistors extend in a direction perpendicular to the surface of the substrate; storage layers, which each are located, in the direction perpendicular to the surface of the substrate, on a side surface of each of the transistors, the storage layers are interconnected with the conductive channels of the transistors, any one of the storage layers is located between the pair of transistors, and the storage layers are configured to store electric charges and transfer the electric charges between the storage layers and the conductive channels interconnected therewith.

Abstract: A method for forming a semiconductor structure includes: providing a substrate, where a sacrificial layer and an active layer located on the sacrificial layer are formed on the substrate; patterning the active layer and the sacrificial layer to form a groove, where the active layer and the sacrificial layer are divided into a plurality of active regions by the groove; forming a first isolation layer surrounding the active regions in the groove; patterning the active layer in the active regions to form a plurality of separate active patterns, where at least one of side walls or ends of the active patterns is connected to the first isolation layer; removing the sacrificial layer along an opening located between two adjacent one of the active patterns to form a gap between a bottom of the active patterns and the semiconductor substrate; and forming a bit line in the gap.

Abstract: The disclosure relates to a semiconductor storage device and a forming method thereof. The semiconductor storage device includes a substrate; a plurality of active region structures provided on the substrate; a shallow trench isolation structure provided within the substrate, the shallow trench isolation structure surround the plurality of active region structures; a plurality of conductive line structures, extending parallel to each other along a first direction, the conductive line structure include a first region and a second region, the first region being located over each of the plurality of active region structures, the second region is located over the shallow trench isolation structure; in a direction perpendicular to the substrate, the depth of the first region is greater than the depth of the second region.

Abstract: The present invention relates to the field of semiconductor manufacturing technologies, in particular to a semiconductor device and a method of forming the same. The method of forming the semiconductor device includes the following steps: forming a substrate with a trench, a gate dielectric layer covering an inner wall of the trench, a barrier layer covering a portion of a surface of the gate dielectric layer, and a first gate layer filled on an surface of the barrier layer being disposed in the trench; removing a portion of the barrier layer to form an groove located between the first gate layer and the gate dielectric layer; forming a channel dielectric layer at least covering an inner wall of the groove and a top surface of the first gate layer; and forming a second gate layer at least partially filling an interior of the groove.

Abstract: A semiconductor structure and a method for manufacturing same are provided. The semiconductor structure includes: a doped conductive layer, doped with dopant ions; a metal conductive layer, located above the doped conductive layer; a nitrogen-containing dielectric layer, located above the metal conductive layer; a first molybdenum nitride layer, located between the doped conductive layer and the metal conductive layer and configured to be electrically connected to the doped conductive layer and the metal conductive layer; and a second molybdenum nitride layer, located between the metal conductive layer and the nitrogen-containing dielectric layer, where an atomic ratio of nitrogen atoms in the second molybdenum nitride layer is greater than an atomic ratio of nitrogen atoms in the first molybdenum nitride layer.

Abstract: This application relates to a data transmission circuit, a method making it, and a storage device. The circuit includes a mode register data storage unit and an array area data storage unit. The mode register data storage unit outputs mode register data in response to a first clock signal; the output terminal of the array area data storage unit and the output terminal of the mode register data storage unit are both connected to the first node, the array area data storage unit receives array area data in response to the first pointer signal, and outputs the array area data in response to the second pointer signal. This technic can accurately control the mode register data and the array area data to output through the respective output channels in turn.

Abstract: A method includes the following operations for preparing a semiconductor structure, a semiconductor, and a semiconductor memory. A first dielectric layer and a first barrier layer are deposited on a substrate including an active area in sequence. A first mask including a first etching pattern is formed on the first barrier layer, and includes a groove extending in a first direction and uniformly distributed etching holes. Herein, the groove penetrates through the etching hole, and the depth of the etching hole is larger than that of the groove. Etching is performed along the first etching pattern, to remove the first barrier layer and etch the first dielectric layer to form a conductive channel.

Abstract: Embodiments of the present application provide a process monitoring method and a process monitoring system. The process monitoring method includes: acquiring a semiconductor structure on which an etch process is performed in an etch chamber, and forming a corresponding test structure based on the semiconductor structure; acquiring first theoretical mass of the test structure after the etch process is theoretically performed; placing the test structure in the etch chamber to actually perform the etch process, and acquiring first residual mass of the test structure after the etch process is actually performed; and determining, based on the first theoretical mass and the first residual mass, whether an etch state of the etch process performed in the etch chamber is normal.