Abstract: Semiconductor devices and methods of manufacturing such devices are described herein. According to embodiments, the semiconductor device can be made by forming a dielectric layer at a first region and at a second region of a semiconductor substrate. A gate conductor layer is disposed over the dielectric formed in the first and the second regions of the semiconductor substrate, and the second region is masked. A split gate memory cell is formed in the first region of the semiconductor substrate with a first gate length. The first region is then masked, and the second region is etched to define a logic gate that has a second gate length. The first and second gate lengths can be different.

Abstract: A circuit, system, and method for measuring capacitance are described. A current may be received at an input of a conversion circuit. The current may be converted to a voltage signal which may be used to create a negative feedback current to the input of the conversion circuit and which may be demodulated digitally to provide a static digital output representative of a capacitance.

Abstract: Memory devices and methods for forming the same are disclosed. In one embodiment, the device includes a non-volatile memory (NVM) transistor formed in a first region of a substrate, the NVM transistor comprising a channel and a gate stack on the substrate overlying the channel. The gate stack includes a dielectric layer on the substrate, a charge-trapping layer on the dielectric layer, an oxide layer overlying the charge-trapping layer, a first gate overlying the oxide layer, and a first silicide region overlying the first gate. The device includes a metal-oxide-semiconductor transistor formed in a second region of the substrate comprising a gate oxide overlying the substrate in the second region, a second gate overlying the gate oxide, and second silicide region overlying the second gate. A strain inducing structure overlies at least the NVM transistor and a surface of the substrate in the first region of the substrate.

Abstract: A semiconductor device includes a substrate comprising a source region and a drain region, a bit storing element formed on the substrate, a memory gate structure, a first insulating layer formed on the substrate, a second insulating layer formed on the substrate, and a select gate structure formed on the first insulating layer. The second insulating layer is formed on the memory gate structure and the select gate structure and between the memory gate structure and the select gate structure.

Abstract: An embodiment of the present invention is directed to a memory cell. The memory cell includes a first trench formed in a semiconductor substrate and a second trench formed in said semiconductor substrate adjacent to said first trench. The first trench and the second trench each define a first side wall and a second sidewall respectively. The memory cell further includes a first storage element formed on the first sidewall of the first trench and a second storage element formed on the second sidewall of the second trench.

Abstract: A non-volatile memory that includes a shared source line configuration and methods of operating the same to reduce disturbs is provided. In one embodiment, the method includes coupling a first positive high voltage to a first global wordline in a first row of an array of memory cells, and coupling a second negative high voltage (VNEG) to a first bitline in a first column of the array to apply a bias to a non-volatile memory transistor in a selected memory cell to program the selected memory cell. A margin voltage having a magnitude less than VNEG is coupled to a second global wordline in a second row of the array, and an inhibit voltage coupled to a second bitline in a second column of the array.

Abstract: A stack processor using a non-volatile, ferroelectric random access memory (F-RAM) for both code and data space. The stack processor is operative in response to as many as 64 possible instructions based upon a 16 bit word. Each of the instructions in the 16 bit word comprises 3 five bit instructions and a 16th bit which is applicable to each of the 3 five bit instructions thereby making each instruction effectively 6 bits wide.

Abstract: A method of restoring an ECC syndrome in a non-volatile memory device having memory cells arranged in a plurality of sectors within a memory cell array, the method comprising identifying a first sector including at least one page having a disabled ECC (error correction code) flag; reading the value of all data bits in said at least one page; calculating values for ECC bits in said at least one page; and writing said data bit values and said calculated ECC bit values to a second sector in the memory cell array.

Abstract: Apparatuses and methods of distinguishing between a finger and stylus proximate to a touch surface are described. One apparatus includes a first circuit to obtain capacitance measurements of sense elements when a conductive object is proximate to a touch surface. The apparatus also includes a second circuit coupled to the first circuit. The second circuit is operable to detect whether the conductive object activates the first sense element, second sense element, or both, in view of the capacitance measurements. To distinguish between a stylus and a finger as the conductive object, the second circuit determines the conductive object as being the stylus when the second sense element is activated and the first sense element is not activated and determines the conductive object as being the finger when the first sense element and the second sense element are activated.

Abstract: A method of fabricating a memory device is described. Generally, the method includes forming a channel from a semiconducting material overlying a surface of a substrate, and forming dielectric stack on the channel. A first cap layer is formed over the dielectric stack, and a second cap layer including a nitride formed over the first cap layer. The first and second cap layers and the dielectric stack are then patterned to form a gate stack of a device. The second cap layer is removed and an oxidation process performed to form a blocking oxide over the dielectric stack, wherein the oxidation process consumes the first cap layer. Other embodiments are also described.

Abstract: Memory cells including embedded SONOS based non-volatile memory (NVM) and MOS transistors are described. The memory cell includes a substrate having a non-volatile memory (NVM) region and a plurality of metal-oxide-semiconductor (MOS) regions. A NVM transistor in the NVM region includes a tunnel dielectric on the substrate, a charge-trapping layer on the tunnel dielectric, and a blocking dielectric comprising a high-k dielectric material over the charge-trapping layer. The plurality of MOS regions include a number of MOS transistors. At least one of the MOS transistors includes a gate dielectric comprising a high-k dielectric material over a surface of the substrate. Generally, the blocking dielectric and the gate dielectric comprise the same high-k dielectric material. Other embodiments are also described.

Abstract: A correction matrix for use with non-rectangular touch arrays is described. In one embodiment, a sensing device may include a memory and a processing element coupled to the memory. The memory may store a set of touch sense values corresponding to a measured characteristic of at least one unit cell of plurality of unit cells of a non-rectangular touch array and may store a correction matrix. The correction matrix may define an active region and an inactive region of the non-rectangular touch array. The processing element may modify touch sense values of a subset of the plurality of unit cells that are not completely within the active region defined by correction values of the correction matrix.

Abstract: Memory cells including embedded SONOS based non-volatile memory (NVM) and MOS transistors and methods of forming the same are described. Generally, the method includes: forming a gate stack of a NVM transistor in a NVM region of a substrate including the NVM region and a plurality of MOS regions; and depositing a high-k dielectric material over the gate stack of the NVM transistor and the plurality of MOS regions to concurrently form a blocking dielectric comprising the high-k dielectric material in the gate stack of the NVM transistor and high-k gate dielectrics in the plurality of MOS regions. In one embodiment, a first metal layer is deposited over the high-k dielectric material and patterned to concurrently form a metal gate over the gate stack of the NVM transistor, and a metal gate of a field effect transistor in one of the MOS regions.

Abstract: A frequency-shift keying (FSK) demodulator includes a digital phase-locked loop (DPLL) based frequency estimator to convert a phase signal to a frequency signal, a frequency offset estimator to estimate and track direct current (DC) component of the frequency signal, and an average filter communicatively coupled to the frequency offset estimator to perform an accumulate-and-dump operation to improve a symbol-level signal to noise ratio (SNR) of the frequency signal.

Abstract: A semiconductor device and method of manufacturing the same are provided. In one embodiment, method includes forming a first oxide layer over a substrate, forming a silicon-rich, oxygen-rich, oxynitride layer on the first oxide layer, forming a silicon-rich, nitrogen-rich, and oxygen-lean nitride layer over the oxynitride layer, and forming a second oxide layer on the nitride layer. Generally, the nitride layer includes a majority of charge traps distributed in the oxynitride layer and the nitride layer. Optionally, the method further includes forming a middle oxide layer between the oxynitride layer and the nitride layer. Other embodiments are also described.

Abstract: A system including a memory architecture is described. In one embodiment, the memory architecture includes an array of non-volatile memory cells, a first independently controlled voltage generation circuit, a plurality of register bits to store programmable values used by the independently controlled voltage generation circuit and a control circuit coupled to the first independently controlled voltage generation circuit. The first independently controlled voltage generation circuit is coupled to supply a positive voltage to the array during program and erase operations so that a magnitude of the positive voltage is applied across a storage node of an accessed memory cell of the array. The plurality of register bits to store programmable values used by the independently controlled voltage generation circuit to control the magnitude of the positive voltage. The control circuit controls a duration of the positive voltage. Other embodiments are also described.

Abstract: A current detector circuit includes a current sense amplifier, coupled to a sense resistor, to receive a pair of input voltages and to output a first indicator signal responsive to a sensed input voltage difference produced by a sensed current passing through the sense resistor. The current detector circuit includes a comparator coupled to the current sense amplifier, the comparator to compare the first indicator signal to a reference voltage signal and output an interrupt signal responsive to the first indicator signal exceeding the reference voltage signal; and a reference voltage generator circuit coupled to the comparator, the reference voltage generator circuit to select the reference voltage signal from a plurality of reference voltages according to a first selector signal received from a configuration channel of a serial bus connector device.

Abstract: An example memory device includes a channel positioned between and electrically connecting a first diffusion region and a second diffusion region, and a tunnel dielectric layer, a multi-layer charge trapping layer, and a blocking dielectric layer disposed between the gate structure and the channel. The multi-layer charge trapping layer includes a first dielectric layer disposed abutting a second dielectric layer and an anti-tunneling layer disposed between the first and second dielectric layers. The anti-tunneling layer includes an oxide layer. The first dielectric layer includes oxygen-rich nitride and the second dielectric layer includes oxygen-lean nitride.

Abstract: Disclosed are methods, circuits, apparatuses and systems for providing power to a dynamic load such as a non-volatile memory array. According to embodiments, a voltage source may be adapted to generate and output a supply current at substantially a target voltage through a regulating transistor whose channel is in series between an output terminal of said charge pump and an input terminal of said NVM array. A discharge circuit branch coupled to an output terminal of the regulating transistor may be adapted to drain away current from the regulating transistor output terminal when a voltage at the regulating transistor output terminal exceeds a first defined threshold voltage. A bulk regulating circuit branch coupled to a bulk of the regulating transistor may be adapted to reduce a bulk-voltage of the regulating transistor when a voltage at the regulating transistor output terminal exceeds a defined threshold voltage.

Abstract: A system made up of a first device which includes a communication interface and a processing device and a second device which includes a touch sensor assembly and a controller, where the controller uses the touch sensor assembly to communicate with the processing device through a capacitor that is jointly formed by the touch sensor assembly and a conductive portion of the communications interface.