Abstract: A pixel array substrate includes a substrate, a first patterned conductive layer, a pixel electrode layer, a semiconductor pattern layer, a first dielectric layer, a second patterned conductive layer, a second dielectric layer, and a common electrode layer. The first patterned conductive layer includes first and second scan lines, first and second gates, and first and second connection electrodes. The pixel electrode layer includes first and second pixel electrodes. The semiconductor pattern layer includes first and second patterns. The second patterned conductive layer includes first and second data lines, first and second sources, first and second drains, and a touch wire. The common electrode layer includes a common electrode and first and second transferring electrodes. The first transferring electrode is electrically connected to the first connection electrode and the first drain. The second transferring electrode is electrically connected to the second connection electrode and the second drain.

Abstract: A photo-detecting apparatus is provided. The photo-detecting apparatus includes: a substrate made by a first material or a first material-composite; an absorption layer made by a second material or a second material-composite, the absorption layer being supported by the substrate and the absorption layer including: a first surface; a second surface arranged between the first surface and the substrate; and a channel region having a dopant profile with a peak dopant concentration equal to or more than 1×1015 cm?3, wherein a distance between the first surface and a location of the channel region having the peak dopant concentration is less than a distance between the second surface and the location of the channel region having the peak dopant concentration, and wherein the distance between the first surface and the location of the channel region having the peak dopant concentration is not less than 30 nm.

Abstract: The present disclosure provides a semiconductor device including a first semiconductor structure, a first connecting structure positioned on the first semiconductor structure, a second connecting structure positioned on the first connecting structure, and a second semiconductor structure positioned on the second connecting structure. The first connecting structure includes a plurality of first connecting contacts and a plurality of first supporting contacts positioned in a first connecting insulating layer. The second connecting structure includes a plurality of second connecting contacts and a plurality of second supporting contacts positioned in the second connecting insulating layer positioned on the first connecting structure. The plurality of first connecting contacts contact the plurality of second connecting contacts, forming signal-transmitting contacts.

Abstract: A display apparatus includes a first display area including a first display unit configured to generate light and a first encapsulation unit disposed on the first display unit; a second display area including a second display unit configured to generate light and a second encapsulation unit disposed on the second display unit; and a through area disposed between the first display area and the second display area. The first encapsulation unit includes a first encapsulation layer covering a first side of an area of the first display unit corresponding to the through area. The second encapsulation unit includes a second encapsulation layer covering a second side of an area of the second display unit corresponding to the through area.

Abstract: Leadframe systems and related methods. Specific implementations of leadframe systems may include a die pad, a semiconductor die coupled to the die pad, where the semiconductor die has a perimeter. A leadframe may be coupled over the die pad and the semiconductor die where the leadframe has a solder dam coupled around the semiconductor die and, the solder dam has a perimeter that corresponds with the semiconductor die The die pad may have no groove adjacent to the semiconductor die.

Abstract: A light emitting device is disclosed. In an embodiment a light-emitting device includes a pixel comprising at least three sub-pixels, wherein a first sub-pixel includes a first conversion element having a green phosphor, wherein a second sub-pixel includes a second conversion element having a red phosphor and wherein a third sub-pixel is free of a conversion element, the third sub-pixel configured to emit blue primary radiation, wherein each sub-pixel has an edge length of at most 100 ?m, and wherein the light-emitting device is configured to enhance a gamut coverage of an emitted radiation.

Abstract: A light-receiving element includes an on-chip lens; an interconnection layer; and a semiconductor layer that is disposed between the on-chip lens and the interconnection layer. The semiconductor layer includes a first voltage application unit to which a first voltage is applied, a second voltage application unit to which a second voltage different from the first voltage is applied, a first charge detection unit that is disposed at the periphery of the first voltage application unit, a second charge detection unit that is disposed at the periphery of the second voltage application unit, and a charge discharge region that is provided on an outer side of an effective pixel region. For example, the present technology is applicable to a light-receiving element that generates distance information in a ToF method, or the like.

Abstract: A semiconductor package includes a base wafer including a first substrate and at least one first through via electrode extending through the first substrate, and a first semiconductor chip provided on the base wafer. The first semiconductor chip includes a second substrate; and at least one second through via electrode extending through the second substrate. The at least one second through via electrode is provided on the at least one first through via electrode to be electrically connected to the at least one first through via electrode. A first diameter of the at least one first through via electrode in a first direction is greater than a second diameter of the at least one second through via electrode in the first direction.

Abstract: Certain aspects of the present disclosure provide a structure for source or drain in a fin field-effect transistors (finFET) to increase a breakdown voltage between adjacent finFETs in a semiconductor device. One example semiconductor device generally includes a plurality of finFETs, each of the finFETs comprising a source and a drain, wherein at least the source or the drain in at least one finFET of the plurality of finFETs has a profile with at least one rounded tip to increase a breakdown voltage between the at least one finFET and an adjacent finFET in the plurality of finFETs.

Abstract: A stacked die semiconductor package includes a leadframe including a die pad and lead terminals on at least two sides of the die pad, a top die having circuitry coupled to bond pads, and bottom die having a back side that is attached by die attach material to the die pad and a top side having at least one redistribution layer (RDL) over and coupled to a top metal level including connections to input/output (IO) nodes on the top metal level. The RDL provides a metal pattern including wirebond pads that match locations of the bond pads of the top die. The bond pads on the top die are flip-chip attached to the wirebond pads of the bottom die, and the bond wires are positioned between the wirebond pads and the lead terminals.

Abstract: A method for fabricating semiconductor device includes the steps of: forming a substrate having a magnetic tunneling junction (MTJ) region and a logic region; forming a MTJ on the MTJ region; forming a top electrode on the MTJ; forming an inter-metal dielectric (IMD) layer around the MTJ; removing the IMD layer directly on the top electrode to form a recess; forming a first hard mask on the IMD layer and into the recess; removing the first hard mask and the IMD layer on the logic region to form a contact hole; and forming a metal layer in the recess and the contact hole to form a connecting structure on the top electrode and a metal interconnection on the logic region.

Abstract: The present invention provides semiconductor devices with super junction drift regions that are capable of blocking voltage. A super junction drift region is an epitaxial semiconductor layer located between a top electrode and a bottom electrode of the semiconductor device. The super junction drift region includes a plurality of pillars having P type conductivity, formed in the super junction drift region, which are surrounded by an N type material of the super junction drift region.

Abstract: A stacked semiconductor microcooler includes a first and second semiconductor microcooler. Each microcooler includes silicon fins extending from a silicon substrate. A metal layer may be formed upon the fins. The microcoolers may be positioned such that the fins of each microcooler are aligned. One or more microcoolers may be thermally connected to a surface of a coolant conduit that is thermally connected to an electronic device heat generating device, such as an integrated circuit (IC) chip, or the like. Heat from the electronic device heat generating device may transfer to the one or more microcoolers. A flow of cooled liquid may be introduced through the conduit and heat from the one or more microcoolers may transfer to the liquid coolant.

Abstract: A stacked semiconductor microcooler includes a first microcooler and a second microcooler. The microcoolers may be positioned such that the fins of each microcooler are vertically aligned. The microcoolers may include an inlet passage to accept coolant and an outlet passage to expel the coolant. One or more microcoolers may be thermally connected to an electronic device heat generating device, such as an integrated circuit (IC) chip, or the like. Heat from the electronic device heat generating device may transfer to the one or more microcoolers. A flow of cooled liquid may be introduced through the passages and heat from the one or more microcoolers may transfer to the liquid coolant.

Abstract: A method of forming a semiconductor structure includes forming a first top electrode (TE) layer over a magnetic tunnel junction (MTJ) layer and performing a smoothing treatment on the first TE layer. The smoothing treatment is performed in situ after the forming first TE layer. The smoothing treatment removes spike point defects from the first TE layer. Additional TE layers may be formed over the first TE layer.

Abstract: In an embodiment, a method includes: forming a first recess and a second recess in a substrate; growing a first epitaxial material stack in the first recess, the first epitaxial material stack including alternating layers of a first semiconductor material and a second semiconductor material, the layers of the first epitaxial material stack being undoped; growing a second epitaxial material stack in the second recess, the second epitaxial material stack including alternating layers of the first semiconductor material and the second semiconductor material, a first subset of the second epitaxial material stack being undoped, a second subset of the second epitaxial material stack being doped; patterning the first epitaxial material stack and the second epitaxial material stack to respectively form first nanowires and second nanowires; and forming a first gate structure around the first nanowires and a second gate structure around the second nanowires.

Abstract: A semiconductor package is provided. The semiconductor package includes a first substrate, a first semiconductor chip arranged on the first substrate, a first group of at least one solder ball arranged on a side surface of the first semiconductor chip, an interposer arranged on the first semiconductor chip and the first substrate and being in contact with the first group of at least one solder ball, and an adhesive layer arranged between the first semiconductor chip and the interposer and configured to expose at least a portion of un upper surface of the first semiconductor chip, wherein a first height from an upper surface of the first substrate to the upper surface of the first semiconductor chip is greater than a second height of the first group of at least one solder ball.

Abstract: An integrated circuit device includes a static random access memory (SRAM) array, and the SRAM array includes first to fourth active fins extending parallel to each other in a first direction, a first gate line overlapping the second to fourth active fins, a second gate line spaced apart from the first gate line in the first direction and overlapping the first to third active fins, a third gate line spaced apart from the first gate line in the first direction and overlapping the fourth active fin, a fourth gate line spaced apart from the second gate line in the first direction and overlapping the first active fin, a first field isolation layer contacting one end of the second active fin, and a second field isolation layer contacting one end of the third active fin. The first to fourth gate lines extend in a second direction intersecting the first direction.

Abstract: A package includes a device die, a molding material encircling the device die, wherein a top surface of the molding material is substantially level with a top surface of the device die, and a bottom dielectric layer over the device die and the molding material. A plurality of redistribution lines (RDLs) extends into the bottom dielectric layer and electrically coupling to the device die. A top polymer layer is over the bottom dielectric layer, with a trench ring penetrating through the top polymer layer. The trench ring is adjacent to edges of the package. The package further includes Under-Bump Metallurgies (UBMs) extending into the top polymer layer.

Abstract: A display device includes a substrate, a first wiring and a second wiring positioned on the substrate, a thin film transistor (“TFT”) connected to the first wiring and the second wiring, and a pixel electrode connected to the TFT and including a transverse branch part, a longitudinal branch part, minute branches extending from the transverse branch part and the longitudinal branch part, and an outer branch part connecting end parts of the minute branches and adjacent to the storage electrode line, where a shortest distance from a center part of at least one side of the outer branch part to at least one side of the first wiring is different from a shortest distance from an edge part of at least one side of the outer branch part to at least one side of the first wiring.