Semiconductor wafer heater

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Description

FIG. 1 is a perspective view 1 of a semiconductor wafer heater showing our new design

FIG. 2 is a perspective view 2 thereof,

FIG. 3 is a front elevational view thereof,

FIG. 4 is a rear elevational view thereof,

FIG. 5 is a left side elevational view thereof,

FIG. 6 is a right side elevational view thereof,

FIG. 7 is a top plan view thereof,

FIG. 8 is a bottom plan view thereof; and,

FIG. 9 is a sectional view taken along line 9-9 thereof.

Claims

The ornamental design for a semiconductor wafer heater as shown and described.

Referenced Cited
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Other references
  • SGL Carbon Silicon and SiC Epitaxy. Found online May 26, 2026 at sglcarbon.com. Reference dated Apr. 19, 2019. Retrieved from https://web.archive.org/web/20190419002201/https://www.sglcarbon.com/en/markets-solutions/applications/silicon-and-sic-epitaxy/ (Year: 2019).
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  • Inventors: Umetsu et al., U.S. Appl. No. 29/995,368, filed Mar. 26, 2025; Corresponds to JP1794204.
  • Inventors: Suzuki et al., U.S. Appl. No. 29/942,788, filed May 17, 2024; Corresponds to JP1766094.
Patent History
Patent number: D1153102
Type: Grant
Filed: Jul 25, 2025
Date of Patent: Oct 13, 2026
Assignee: NuFlare Technology, Inc. (Kanagawa)
Inventors: Takuto Umetsu (Kamakura), Kunihiko Suzuki (Sunto-gun)
Primary Examiner: Amanda Christensen
Application Number: 30/015,054