Top plate for reactor for manufacturing semiconductor

- Tokyo Electron Limited
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Description

FIG. 1 is front perspective view of a top plate for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom view thereof;

FIG. 8 is a reference front view indicating the plane upon which a sectional view is taken; and,

FIG. 9 is a sectional view taken along line 9-9-9 of FIG. 8.

The broken lines are shown for illustrative purposes only and form no part of the claimed design.

Claims

The ornamental design for top plate for reactor for manufacturing semiconductor, as shown and described.

Referenced Cited
U.S. Patent Documents
7235139 June 26, 2007 Boguslavskiy et al.
D614593 April 27, 2010 Lee et al.
D615937 May 18, 2010 Sato
D616392 May 25, 2010 Sato
D616393 May 25, 2010 Sato
D639757 June 14, 2011 Root et al.
Patent History
Patent number: D654883
Type: Grant
Filed: Apr 13, 2011
Date of Patent: Feb 28, 2012
Assignee: Tokyo Electron Limited (Minato-Ku)
Inventors: Manabu Honma (Oshu), Katsuyuki Hishiya (Oshu)
Primary Examiner: Selina Sikder
Attorney: Burr & Brown
Application Number: 29/389,558