Top plate for reactor for manufacturing semiconductor
Latest Tokyo Electron Limited Patents:
- Substrate processing monitoring apparatus based on imaging video data, substrate processing apparatus, substrate processing monitoring method, and storage medium
- Monitoring system for a sealing apparatus having a substrate treatment apparatus in a housing utilizing a laser sensor installed in a space between the housing and the substrate treatment apparatus and that scans a detection region therein
- Methods to provide uniform wet etching of material within high aspect ratio features provided on a patterned substrate
- Substrate holding method and substrate processing apparatus
- Systems for etching a substrate using a hybrid wet atomic layer etching process
Description
Claims
The ornamental design for top plate for reactor for manufacturing semiconductor, as shown and described.
Referenced Cited
Patent History
Patent number: D654884
Type: Grant
Filed: Apr 13, 2011
Date of Patent: Feb 28, 2012
Assignee: Tokyo Electron Limited (Minato-Ku)
Inventors: Manabu Honma (Oshu), Katsuyuki Hishiya (Oshu)
Primary Examiner: Selina Sikder
Attorney: Burr & Brown
Application Number: 29/389,562
Type: Grant
Filed: Apr 13, 2011
Date of Patent: Feb 28, 2012
Assignee: Tokyo Electron Limited (Minato-Ku)
Inventors: Manabu Honma (Oshu), Katsuyuki Hishiya (Oshu)
Primary Examiner: Selina Sikder
Attorney: Burr & Brown
Application Number: 29/389,562
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)