Side wall for reactor for manufacturing semiconductor

- Tokyo Electron Limited
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Description

FIG. 1 is front perspective view of a side wall for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top view thereof; and,

FIG. 7 is a bottom view thereof.

Claims

The ornamental design for side wall for reactor for manufacturing semiconductor, as shown and described.

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Patent History
Patent number: D655262
Type: Grant
Filed: Apr 13, 2011
Date of Patent: Mar 6, 2012
Assignee: Tokyo Electron Limited (Minato-Ku)
Inventors: Manabu Honma (Oshu), Katsuyuki Hishiya (Oshu)
Primary Examiner: Selina Sikder
Attorney: Burr & Brown
Application Number: 29/389,569